CN102436153B - Photosensitive rubber stripping agent for printing screen and stripping method - Google Patents
Photosensitive rubber stripping agent for printing screen and stripping method Download PDFInfo
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- CN102436153B CN102436153B CN201110333703.2A CN201110333703A CN102436153B CN 102436153 B CN102436153 B CN 102436153B CN 201110333703 A CN201110333703 A CN 201110333703A CN 102436153 B CN102436153 B CN 102436153B
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- remover
- printing screen
- alcohol
- photoresists
- printing
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Abstract
The invention discloses a photosensitive rubber stripping agent for a printing screen and a stripping method, which belong to the field of textile printing. The invention is characterized in that: the stripping agent comprises 45-100 percent by mass of main stripping agent and 55-0 percent by mass of auxiliary stripping agent, wherein the main stripping agent is selected from any one of an inorganic peroxide, a compound containing a chlorine element with the oxidizing capability and a high-valence metal oxidant not containing any chlorine element; and the auxiliary stripping agent is selected from one or more of an anion surfactant containing a sodium sulfonate group, a polyethylene glycol nonionic surfactant and alcohol. Due to the adoption of the photosensitive rubber stripping agent disclosed by the invention, photosensitive rubber can be stripped from the printing screen without damaging the printing screen, recycling of the printing screen is realized, the production cost is saved, and the consumption of resources is lowered.
Description
Technical field:
The present invention relates to a kind of printing screen photoresists remover and stripping means, belong to the printing in textiles field.
Background technology:
China is global-type printing in textiles big country, and printing in textiles production total production is about hundred million meters of 50-60, and quantity occupies the hat in the whole world.In all kinds of printing technologies of textile, screen printing comprises that plain net, ROTARY SCREAM PRINTING product yield proportion are the highest, and wherein only ROTARY SCREAM PRINTING output accounts for 59% of total Printing quantity.Distribute from the area, the Spain in the India in Asia, Japan, Korea S and Thailand, Europe, Portugal, Italy are take PLATE SCREAM PRINTING as main.
Along with people are personalized with cloth for clothes, decoration etc., the changes in demand of fashion-orientation, whole world country textile trade also trends towards the direction of short run, many kinds, multi-color, the single order of screen printing enterprise that causes thus, the processing capacity of pattern are more and more less, return simultaneously single rate also very low, cause enterprise frequently to change pattern, the net cost processed of every meter cloth rises, therefore from economically, the ROTARY SCREAM PRINTING that PLATE SCREAM PRINTING and production efficiency are higher more embodies its obvious technical development advantage.
In textile screen printing process, after printing screen such as PLATE SCREAM PRINTING silk-screen plate or ROTARY SCREAM PRINTING nickel screen version stamp machined, traditional way was that the calcellation of stamp silk screen is abandoned, and printed nickel net again melts down and melts making nickel net again.Clearly, traditional half tone processing mode especially is unfavorable for the reduction of short run, many kinds, multi-color stamp production net cost processed, and therefore, after the discussion screen printing, seal half tone stripping glue is reused technology, to reducing enterprise's production cost.
Summary of the invention
For realizing reusing after the printing screen stamp, reduce production costs, a first aspect of the present invention purpose is to provide a kind of printing screen photoresists remover.
The technical scheme that the present invention takes is as follows, a kind of printing screen photoresists remover, it is characterized in that: comprise main remover and help remover, main remover wherein: helping the remover mass percent is that 45%-100%:55%-0%(is when helping remover content to be 0, be that remover only contains main remover), described main remover is selected from inorganic peroxide, has the chloride element compound of oxidability, any one of high valence elements metal onidiges of chloride element not; One or more of the described anionic surface active agent that helps remover to be selected to contain sodium group, Determination of Polyoxyethylene Non-ionic Surfactants, alcohol.
Described inorganic peroxide is preferably hydrogen peroxide (H
2O
2), sodium peroxide (Na
2O
2), hydrogen peroxide closes sodium carbonate (2Na
2CO
33H
2O
2) etc. any one;
Described chloride element and compound thereof are preferably KClO
3, KClO, HCIO, NaCIO, Ba (ClO
3)
2H
2O, Ca (ClO
3)
2H
2Any one of O etc.;
The high valence elements metal onidiges of described not chloride element is preferably KMnO
4, K
2Cr
2O
7Deng any one.
The described anionic surface active agent that contains sodium group is selected from any one of sodium n-alkylbenzenesulfonate, alpha-alkene sulfonate, alkyl sulfonate, fatty acid sulfoalkyl ester etc.; Particularly preferably sodium n-alkylbenzenesulfonate, fatty acid sulfoalkyl ester and sulfoalkyl amide-type anionic surfactant.
Described Determination of Polyoxyethylene Non-ionic Surfactants is selected from any one of high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene amine, polyoxyethylate amide etc.; The non-ionics of high-carbon fatty alcohol polyoxyethylene ether structure type particularly preferably.
Described alcohol be in structure institute's carbon atom quantity between aliphatic alcohol or the aromatic alcohols of C1～C8.Preferably from any one of methyl alcohol, ethanol, propyl alcohol, phenmethylol, glycerine etc.
another aspect of the present invention is to provide a kind of stripping means of printing screen photoresists, it is characterized in that, comprise the following steps: by main remover: helping the remover mass percent is 45%-100%:55%-0% configuration remover, then with remover: water is mixed and made into according to the ratio of mass percent 20%-100%:80%-0% the solution that comes unstuck, regulate with NaOH or HCI and come unstuck pH value of solution to 4-12, then printing screen is immersed in the solution that comes unstuck, and at the temperature of 25 ℃～95 ℃, printing screen is carried out degumming process 10～80min, can all remove photoresists, can recycle the residual night that removes after photoresists after contaminant filter, printing screen after coming unstuck satisfies after testing reuses quality requirements.
Beneficial effect of the present invention is as follows:
The present invention provides a kind of printing screen photoresists remover and printing screen photoresists lift-off technology by research, adopt printing screen photoresists remover of the present invention, be used for the photoresists lift-off processing that screen printing is used to complete printing screen afterwards, the appended photoresists of printing screen are all removed and do not damage printing screen, keep the correlated performance of the rear half tone that comes unstuck so that the recycling of half tone, thereby realize the recycling of printing screen, save production cost, reduced the consumption of resource.Solve the common problem that at present general screen printing enterprise exists, therefore had significant society and economic worth.
The invention will be further described below in conjunction with embodiment.
Embodiment:
Embodiment 1:
Main remover is a kind of in hydrogen peroxide, sodium hypochlorite, potassium permanganate.Help remover formulated in the ratio of constituent mass shown in table 1.
With main remover: help remover to be configured to remover by above-mentioned composition, then with remover: water is mixed and made into according to the ratio of mass ratio 80:20 the solution that comes unstuck, regulate with HCI or NaOH and come unstuck pH value of solution to 4-12, then printing screen is immersed in the solution that comes unstuck, and at the temperature of 95 ℃, printing screen is carried out degumming process 15min, can all remove photoresists, can recycle the residual night that removes after photoresists after contaminant filter, and the printing screen after coming unstuck satisfies after testing reuses quality requirements.
According to table 1, adjust the different proportionings of remover, can obtain different embodiment, also can obtain same effect.
Table 1, help the configuration component table of remover.
Stripping means embodiment under different technology conditions is as follows:
Embodiment 2:
According to main remover: the mass ratio configuration remover that helps remover=100:0, again according to remover: the ratio preparation degumming liquid of water=75:15, adjust degumming liquid pH=8.5, process silk screen for embossing 60min under 80 ℃ of temperature conditions, the silk screen for embossing photoresists all remove totally.
Embodiment 3:
According to main remover: help the mass ratio configuration remover of remover=98:2, then according to the ratio preparation degumming liquid of remover: water=75:15, adjust degumming liquid pH=9.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=0:0:100.Process silk screen for embossing 45min under 60 ℃ of temperature conditions, the silk screen for embossing photoresists all remove totally.
Embodiment 4:
According to main remover and the ratio preparation remover that helps remover=50:50, then prepare degumming liquid according to the ratio of remover: water=100:0.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=0:0:100.Process silk screen for embossing 28min under 50 ℃ of temperature conditions, the silk screen for embossing photoresists all remove totally.
Embodiment 5:
According to main remover: help the mass ratio configuration remover of remover=95:5, then according to the ratio preparation degumming liquid of remover: water=100:0.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=0:10:90.Process silk screen for embossing 25min under 50 ℃ of temperature conditions, the silk screen for embossing photoresists all remove totally.
Embodiment 6:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size, according to main remover: help the mass ratio configuration remover of remover=85:15, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=10:60:30.According to the ratio preparation degumming liquid of remover: water=70:30, adjust degumming liquid pH=10.Process the printed nickel net 18min that has removed silently under 60 ℃ of temperature conditions, the printed nickel net photoresists all remove totally, and the rear nickel screen mesh that comes unstuck is clear.
Embodiment 7:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size, according to main remover: help the mass ratio configuration remover of remover=60:40, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=0:20:80.According to the ratio preparation degumming liquid of remover: water=70:30, adjust degumming liquid pH=10.Process the printed nickel net 15min that has removed silently under 50 ℃ of temperature conditions, the printed nickel net photoresists all remove totally.
Embodiment 8:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size, according to main remover: help the mass ratio configuration remover of remover=90:10, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=80:20:0.According to the ratio preparation degumming liquid of remover: water=75:25, adjust degumming liquid pH=9.Process the printed nickel net 35min that has removed silently under 60 ℃ of temperature conditions, the printed nickel net photoresists all remove totally.
Embodiment 9:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size, according to main remover: help the mass ratio configuration remover of remover=90:10, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: Determination of Polyoxyethylene Non-ionic Surfactants: alcohol=0:30:70.According to the ratio preparation degumming liquid of remover: water=90:10, adjust degumming liquid pH=10.5.Process the printed nickel net 29min that has removed silently under 60 ℃ of temperature conditions, the printed nickel net photoresists all remove totally.
Claims (1)
1. printing screen photoresists remover, it is characterized in that: comprise main remover, help remover, main remover: helping the remover mass percent is 45%-100%:55%-0%, the aforementioned content of remover that helps does not comprise that its content is zero; Described main remover is selected from inorganic peroxide, has the chloride element compound of oxidability, any one of high valence elements metal onidiges of chloride element not; One or more of the described anionic surface active agent that helps remover to be selected to contain sodium group, Determination of Polyoxyethylene Non-ionic Surfactants, alcohol.
2, a kind of printing screen photoresists remover according to claim 1, it is characterized in that: described inorganic peroxide is any one of hydrogen peroxide, sodium peroxide, hydrogen peroxide and sodium carbonate.
3, a kind of printing screen photoresists remover according to claim 1, it is characterized in that: described chloride element compound is KClO
3, KClO, HCIO, NaCIO, Ba (ClO
3)
2H
2O, Ca (ClO
3)
2H
2Any one of O.
4, a kind of printing screen photoresists remover according to claim 1, it is characterized in that: the high valence elements metal onidiges of described not chloride element is KMnO
4, K
2Cr
2O
7Any one.
5, a kind of printing screen photoresists remover according to claim 1 is characterized in that: the described anionic surface active agent that contains sodium group is selected from any one of sodium n-alkylbenzenesulfonate, alpha-alkene sulfonate, alkyl sulfonate, fatty acid sulfoalkyl ester.
6, a kind of printing screen photoresists remover according to claim 1 is characterized in that: described Determination of Polyoxyethylene Non-ionic Surfactants is selected from any one of high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene amine, polyoxyethylate amide.
7, a kind of printing screen photoresists remover according to claim 1 is characterized in that: described alcohol be in structure institute's carbon atom quantity between aliphatic alcohol or the aromatic alcohols of C1～C8.
8, a kind of printing screen photoresists remover according to claim 1 is characterized in that: described alcohol is selected from any one of methyl alcohol, ethanol, propyl alcohol, phenmethylol, glycerine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110333703.2A CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110333703.2A CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102436153A CN102436153A (en) | 2012-05-02 |
| CN102436153B true CN102436153B (en) | 2013-06-19 |
Family
ID=45984265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110333703.2A Expired - Fee Related CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106274123A (en) * | 2016-08-16 | 2017-01-04 | 东莞市五株电子科技有限公司 | A kind of half tone regeneration method |
| CN106395921A (en) * | 2016-08-29 | 2017-02-15 | 金川集团股份有限公司 | Method used for producing nickel chloride products taking waste printing nickel screens as raw materials |
| CN107841383A (en) * | 2016-09-21 | 2018-03-27 | 仓和股份有限公司 | Half tone cleaning fluid and its application method |
| CN111100765A (en) * | 2019-12-23 | 2020-05-05 | 张艳 | Preparation method of degumming agent |
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|---|---|---|---|---|
| CN1308737A (en) * | 1998-07-10 | 2001-08-15 | 克拉里安特国际有限公司 | Composition for stripping photoresist and organic material from substrate surfaces |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| CN1653595A (en) * | 2002-04-16 | 2005-08-10 | 禧沛股份有限公司 | Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| CN1770404A (en) * | 2004-11-02 | 2006-05-10 | 海力士半导体有限公司 | Cleaning solution and method for cleaning semiconductor device by using the same |
| WO2007139315A1 (en) * | 2006-05-26 | 2007-12-06 | Lg Chem, Ltd. | Stripper composition for photoresist |
| CN101473272A (en) * | 2006-06-21 | 2009-07-01 | 出光兴产株式会社 | Resist remover |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4440689B2 (en) * | 2004-03-31 | 2010-03-24 | 東友ファインケム株式会社 | Resist stripper composition |
-
2011
- 2011-10-28 CN CN201110333703.2A patent/CN102436153B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308737A (en) * | 1998-07-10 | 2001-08-15 | 克拉里安特国际有限公司 | Composition for stripping photoresist and organic material from substrate surfaces |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| CN1653595A (en) * | 2002-04-16 | 2005-08-10 | 禧沛股份有限公司 | Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| CN1770404A (en) * | 2004-11-02 | 2006-05-10 | 海力士半导体有限公司 | Cleaning solution and method for cleaning semiconductor device by using the same |
| WO2007139315A1 (en) * | 2006-05-26 | 2007-12-06 | Lg Chem, Ltd. | Stripper composition for photoresist |
| CN101473272A (en) * | 2006-06-21 | 2009-07-01 | 出光兴产株式会社 | Resist remover |
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| CN102436153A (en) | 2012-05-02 |
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Granted publication date: 20130619 Termination date: 20211028 |