CN102436153A - Photosensitive rubber stripping agent for printing screen and stripping method - Google Patents
Photosensitive rubber stripping agent for printing screen and stripping method Download PDFInfo
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- CN102436153A CN102436153A CN2011103337032A CN201110333703A CN102436153A CN 102436153 A CN102436153 A CN 102436153A CN 2011103337032 A CN2011103337032 A CN 2011103337032A CN 201110333703 A CN201110333703 A CN 201110333703A CN 102436153 A CN102436153 A CN 102436153A
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- China
- Prior art keywords
- remover
- half tone
- stamp
- photoresists
- alcohol
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Abstract
The invention discloses a photosensitive rubber stripping agent for a printing screen and a stripping method, which belong to the field of textile printing. The invention is characterized in that: the stripping agent comprises 45-100 percent by mass of main stripping agent and 55-0 percent by mass of auxiliary stripping agent, wherein the main stripping agent is selected from any one of an inorganic peroxide, a compound containing a chlorine element with the oxidizing capability and a high-valence metal oxidant not containing any chlorine element; and the auxiliary stripping agent is selected from one or more of an anion surfactant containing a sodium sulfonate group, a polyethylene glycol nonionic surfactant and alcohol. Due to the adoption of the photosensitive rubber stripping agent disclosed by the invention, photosensitive rubber can be stripped from the printing screen without damaging the printing screen, recycling of the printing screen is realized, the production cost is saved, and the consumption of resources is lowered.
Description
Technical field:
The present invention relates to a kind of stamp half tone photoresists remover and stripping means, belong to the printing in textiles field.
Background technology:
China is global-type printing in textiles big country, and printing in textiles production total production is about hundred million meters of 50-60, and quantity occupies the hat in the whole world.In all kinds of printing technologies of textile, screen printing comprises that plain net, ROTARY SCREAM PRINTING product yield proportion are the highest, and wherein only ROTARY SCREAM PRINTING output accounts for 59% of total stamp product quantity.Distribution is seen from the area, and Spain, Portugal, the Italy in the India in Asia, Japan, Korea S and Thailand, Europe are main with PLATE SCREAM PRINTING then.
Along with people's is personalized with cloth for clothes, decoration etc., the changes in demand of fashion-orientation; Whole world textile trade also trends towards the direction of short run, many kinds, multi-color; The single order of screen printing enterprise that is caused thus, the processing capacity of pattern are more and more littler; It is also very low to return single rate simultaneously, causes enterprise's frequent change pattern, and the system net cost of every meter cloth rises; Therefore from economically, the ROTARY SCREAM PRINTING that PLATE SCREAM PRINTING and production efficiency are higher more embodies its tangible technical development advantage.
In textile screen printing process, after stamp half tone such as PLATE SCREAM PRINTING silk screen version or ROTARY SCREAM PRINTING nickel screen version stamp machined, traditional way was that the calcellation of stamp silk screen is abandoned, and printed nickel net then melts down again and melts making nickel net again.Clearly, traditional half tone processing mode especially is unfavorable for the reduction of short run, many kinds, multi-color stamp production system net cost, and therefore, seal half tone stripping glue is reused technology after the discussion screen printing, in the hope of reduction enterprise production cost.
Summary of the invention
For reusing behind the realization stamp screen printing, reduce production costs, first aspect purpose of the present invention provides a kind of stamp half tone photoresists remover.
The technical scheme that the present invention takes is following; A kind of stamp half tone photoresists remover; It is characterized in that: comprise main remover and help remover; Wherein main remover: helping the remover mass percent is 45%-100%:55%-0% (when helping remover content to be 0, promptly remover only contains main remover), and said main remover is selected from inorganic peroxide, has the chloride element compound of oxidability, any one of high valence elements burning agent of chloride element not; One or more of the said anionic surface active agent that helps remover to be selected to contain sodium group, polyoxyethylene-type non-ionic surfactant, alcohol.
Said inorganic peroxide is preferably hydrogen peroxide (H
2O
2), sodium peroxide (Na
2O
2), hydrogen peroxide closes sodium carbonate (2Na
2CO
33H
2O
2) wait any one;
Said chloride element and compound thereof are preferably KClO
3, KClO, HCIO, NaCIO, Ba (ClO
3)
2H
2O, Ca (ClO
3)
2H
2Any one of O etc.;
The high valence elements burning agent of said not chloride element is preferably KMnO
4, K
2Cr
2O
7Deng any one.
The said anionic surface active agent that contains sodium group is selected from any one of sodium n-alkylbenzenesulfonate, alpha-alkene sulfonate, alkyl sulfonate, fatty acid sulfoalkyl ester etc.; Preferred especially sodium n-alkylbenzenesulfonate, fatty acid sulfoalkyl ester and sulfoalkyl amide-type anionic surfactant.
Said polyoxyethylene-type non-ionic surfactant is selected from any one of high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene amine, polyoxyethylate amide etc.; The non-ionics of preferred especially high-carbon fatty alcohol polyoxyethylene ether structure type.
Said alcohol be in the structure institute's carbon atom quantity between aliphatic alcohol or the aromatic alcohols of C1～C8.Preferably from any one of methyl alcohol, ethanol, propyl alcohol, phenmethylol, glycerine etc.
Another aspect of the present invention provides a kind of stripping means of stamp half tone photoresists; It is characterized in that; May further comprise the steps: by main remover: helping the remover mass percent is 45%-100%:55%-0% configuration remover; Then with remover: water is processed the solution that comes unstuck according to the mixed of mass percent 20%-100%:80%-0%, regulates with NaOH or HCI and comes unstuck pH value of solution to 4-12, then the stamp half tone is immersed in the solution that comes unstuck; And under 25 ℃～95 ℃ temperature, the stamp half tone come unstuck and handle 10～80min; Can all remove photoresists, can recycle the residual night that removes behind the photoresists behind contaminant filter, and the stamp half tone after coming unstuck is reused quality requirements through detecting to satisfy.
Beneficial effect of the present invention is following:
The present invention provides a kind of stamp half tone photoresists remover and stamp half tone photoresists lift-off technology through research; Adopt stamp half tone photoresists remover of the present invention; Be used for the photoresists lift-off processing that screen printing is used to complete stamp half tone afterwards; The appended photoresists of stamp half tone are all removed and do not damage the stamp half tone, the correlated performance that keeps the back half tone that comes unstuck is so that the recycling of half tone, thereby realizes the utilization again of stamp half tone; Practice thrift production cost, reduced the consumption of resource.Solve the common problem that at present general screen printing enterprise exists, therefore had significant social and economic worth.
Below in conjunction with embodiment the present invention is described further.
Embodiment:
Embodiment 1:
Main remover is a kind of in hydrogen peroxide, sodium hypochlorite, the potassium permanganate.Help remover formulated in the ratio of constituent mass shown in the table 1.
With main remover: help remover to be configured to remover by above-mentioned composition; Then with remover: water is processed the solution that comes unstuck according to the mixed of mass ratio 80:20; Come unstuck pH value of solution to 4-12 with HCI or NaOH adjusting; Then the stamp half tone is immersed in the solution that comes unstuck, and under 95 ℃ temperature, the stamp half tone is come unstuck and handle 15min, can all remove photoresists; Can recycle the residual night that removes behind the photoresists behind contaminant filter, and the stamp half tone after coming unstuck is reused quality requirements through detecting to satisfy.
According to table 1, the different proportionings of adjustment remover can obtain different embodiment, also can obtain same effect.
Table 1, help the configuration groups submeter of remover.
。
Stripping means embodiment under the different technology conditions is following:
Embodiment 2:
According to main remover: the mass ratio configuration remover that helps remover=100:0; Again according to remover: the ratio preparation degumming liquid of water=75:15; Adjustment degumming liquid pH=8.5 handles stamp silk screen version 60min under 80 ℃ of temperature conditions, stamp silk screen version photoresists all remove totally.
Embodiment 3:
According to main remover: help the mass ratio configuration remover of remover=98:2, again according to remover: the ratio preparation degumming liquid of water=75:15, adjustment degumming liquid pH=9.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=0:0:100.Under 60 ℃ of temperature conditions, handle stamp silk screen version 45min, stamp silk screen version photoresists all remove totally.
Embodiment 4:
According to main remover and the ratio preparation remover that helps remover=50:50, again according to remover: the ratio preparation degumming liquid of water=100:0.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=0:0:100.Under 50 ℃ of temperature conditions, handle stamp silk screen version 28min, stamp silk screen version photoresists all remove totally.
Embodiment 5:
According to main remover: help the mass ratio configuration remover of remover=95:5, again according to remover: the ratio preparation degumming liquid of water=100:0.Wherein help each constituent mass of remover than being the anionic surface active agent that contains sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=0:10:90.Under 50 ℃ of temperature conditions, handle stamp silk screen version 25min, stamp silk screen version photoresists all remove totally.
Embodiment 6:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size; According to main remover: help the mass ratio configuration remover of remover=85:15, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=10:60:30.According to the ratio preparation degumming liquid of remover: water=70:30, adjustment degumming liquid pH=10.Processing has removed printed nickel net 18min silently under 60 ℃ of temperature conditions, and the printed nickel net photoresists all remove totally, and the back nickel screen mesh that comes unstuck is clear.
Embodiment 7:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size; According to main remover: help the mass ratio configuration remover of remover=60:40, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=0:20:80.According to the ratio preparation degumming liquid of remover: water=70:30, adjustment degumming liquid pH=10.Processing has removed printed nickel net 15min silently under 50 ℃ of temperature conditions, and the printed nickel net photoresists all remove totally.
Embodiment 8:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size; According to main remover: help the mass ratio configuration remover of remover=90:10, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=80:20:0.According to the ratio preparation degumming liquid of remover: water=75:25, adjustment degumming liquid pH=9.Processing has removed printed nickel net 35min silently under 60 ℃ of temperature conditions, and the printed nickel net photoresists all remove totally.
Embodiment 9:
In the stripping glue groove of the polyolefin plastics material suitable with the printed nickel net size; According to main remover: help the mass ratio configuration remover of remover=90:10, wherein help each constituent mass of remover than for containing the anionic surface active agent of sodium group: polyoxyethylene-type non-ionic surfactant: alcohol=0:30:70.According to the ratio preparation degumming liquid of remover: water=90:10, adjustment degumming liquid pH=10.5.Processing has removed printed nickel net 29min silently under 60 ℃ of temperature conditions, and the printed nickel net photoresists all remove totally.
Claims (10)
1. stamp half tone photoresists remover is characterized in that: comprise main remover, said main remover is selected from inorganic peroxide, has the chloride element compound of oxidability, any one of high valence elements burning agent of chloride element not.
2. a kind of stamp half tone photoresists remover according to claim 1; It is characterized in that: also comprise and help remover; One or more of the said anionic surface active agent that helps remover to be selected to contain sodium group, polyoxyethylene-type non-ionic surfactant, alcohol; Main remover: helping the remover mass percent is 45%-100%:55%-0%, and the aforementioned content of remover that helps does not comprise that its content is zero.
3. a kind of stamp half tone photoresists remover according to claim 1 and 2 is characterized in that: said inorganic peroxide is that hydrogen peroxide, sodium peroxide, hydrogen peroxide close any one of sodium carbonate.
4. a kind of stamp half tone photoresists remover according to claim 1 and 2, it is characterized in that: said chloride element and compound thereof are KClO
3, KClO, HCIO, NaCIO, Ba (ClO
3)
2H
2O, Ca (ClO
3)
2H
2Any one of O.
5. a kind of stamp half tone photoresists remover according to claim 1 and 2, it is characterized in that: the high valence elements burning agent of said not chloride element is KMnO
4, K
2Cr
2O
7Any one.
6. a kind of stamp half tone photoresists remover according to claim 2 is characterized in that: the said anionic surface active agent that contains sodium group is selected from any one of sodium n-alkylbenzenesulfonate, alpha-alkene sulfonate, alkyl sulfonate, fatty acid sulfoalkyl ester.
7. a kind of stamp half tone photoresists remover according to claim 2 is characterized in that: said polyoxyethylene-type non-ionic surfactant is selected from any one of high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene amine, polyoxyethylate amide.
8. a kind of stamp half tone photoresists remover according to claim 2 is characterized in that: said alcohol be in the structure institute's carbon atom quantity between aliphatic alcohol or the aromatic alcohols of C1～C8.
9. a kind of stamp half tone photoresists remover according to claim 8 is characterized in that: said alcohol is selected from any one of methyl alcohol, ethanol, propyl alcohol, phenmethylol, glycerine.
10. the stripping means of stamp half tone photoresists; It is characterized in that; May further comprise the steps: by main remover: helping the remover mass percent is 45%-100%:55%-0% configuration remover; Then with remover: water is processed the solution that comes unstuck according to the mixed of mass percent 20%-100%:80%-0%, regulates with NaOH or HCI and comes unstuck pH value of solution to 4-12, then the stamp half tone is immersed in the solution that comes unstuck; And under 25 ℃～95 ℃ temperature, the stamp half tone come unstuck and handle 10～80min, can all remove photoresists.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110333703.2A CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110333703.2A CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102436153A true CN102436153A (en) | 2012-05-02 |
| CN102436153B CN102436153B (en) | 2013-06-19 |
Family
ID=45984265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110333703.2A Expired - Fee Related CN102436153B (en) | 2011-10-28 | 2011-10-28 | Photosensitive rubber stripping agent for printing screen and stripping method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102436153B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106274123A (en) * | 2016-08-16 | 2017-01-04 | 东莞市五株电子科技有限公司 | A kind of half tone regeneration method |
| CN106395921A (en) * | 2016-08-29 | 2017-02-15 | 金川集团股份有限公司 | Method used for producing nickel chloride products taking waste printing nickel screens as raw materials |
| CN107841383A (en) * | 2016-09-21 | 2018-03-27 | 仓和股份有限公司 | Half tone cleaning fluid and its application method |
| CN111100765A (en) * | 2019-12-23 | 2020-05-05 | 张艳 | Preparation method of degumming agent |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308737A (en) * | 1998-07-10 | 2001-08-15 | 克拉里安特国际有限公司 | Composition for stripping photoresist and organic material from substrate surfaces |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| CN1653595A (en) * | 2002-04-16 | 2005-08-10 | 禧沛股份有限公司 | Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| US20050287480A1 (en) * | 2004-03-31 | 2005-12-29 | Masayuki Takashima | Photoresist stripper composition |
| CN1770404A (en) * | 2004-11-02 | 2006-05-10 | 海力士半导体有限公司 | Cleaning solution and method for cleaning semiconductor device by using the same |
| WO2007139315A1 (en) * | 2006-05-26 | 2007-12-06 | Lg Chem, Ltd. | Stripper composition for photoresist |
| CN101473272A (en) * | 2006-06-21 | 2009-07-01 | 出光兴产株式会社 | Resist remover |
-
2011
- 2011-10-28 CN CN201110333703.2A patent/CN102436153B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308737A (en) * | 1998-07-10 | 2001-08-15 | 克拉里安特国际有限公司 | Composition for stripping photoresist and organic material from substrate surfaces |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| CN1653595A (en) * | 2002-04-16 | 2005-08-10 | 禧沛股份有限公司 | Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| US20050287480A1 (en) * | 2004-03-31 | 2005-12-29 | Masayuki Takashima | Photoresist stripper composition |
| CN1770404A (en) * | 2004-11-02 | 2006-05-10 | 海力士半导体有限公司 | Cleaning solution and method for cleaning semiconductor device by using the same |
| WO2007139315A1 (en) * | 2006-05-26 | 2007-12-06 | Lg Chem, Ltd. | Stripper composition for photoresist |
| CN101473272A (en) * | 2006-06-21 | 2009-07-01 | 出光兴产株式会社 | Resist remover |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106274123A (en) * | 2016-08-16 | 2017-01-04 | 东莞市五株电子科技有限公司 | A kind of half tone regeneration method |
| CN106395921A (en) * | 2016-08-29 | 2017-02-15 | 金川集团股份有限公司 | Method used for producing nickel chloride products taking waste printing nickel screens as raw materials |
| CN107841383A (en) * | 2016-09-21 | 2018-03-27 | 仓和股份有限公司 | Half tone cleaning fluid and its application method |
| CN111100765A (en) * | 2019-12-23 | 2020-05-05 | 张艳 | Preparation method of degumming agent |
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| Publication number | Publication date |
|---|---|
| CN102436153B (en) | 2013-06-19 |
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