CN102419479B - Two-stage beam shrinkage system based on photonic crystal resonant cavity - Google Patents

Two-stage beam shrinkage system based on photonic crystal resonant cavity Download PDF

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Publication number
CN102419479B
CN102419479B CN 201110452774 CN201110452774A CN102419479B CN 102419479 B CN102419479 B CN 102419479B CN 201110452774 CN201110452774 CN 201110452774 CN 201110452774 A CN201110452774 A CN 201110452774A CN 102419479 B CN102419479 B CN 102419479B
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photonic crystal
guide
resonant cavity
photon crystal
wave
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CN102419479A (en
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王维彪
梁中翥
梁静秋
崔乃迪
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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Abstract

The invention relates to a two-stage beam shrinkage system based on a photonic crystal resonant cavity. The system consists of a first-stage photonic crystal waveguide, a photonic crystal resonant cavity, a second-stage photonic crystal waveguide and a nanowire waveguide which are closely connected and arranged in turn, wherein the second-stage photonic crystal waveguide is a W1-type photonic crystal waveguide, and the light passing width of the second-stage photonic crystal waveguide is less than that of the first-stage photonic crystal waveguide; the photonic crystal resonant cavity is formed by adding point defects into a photonic crystal, a row of medium columns are distributed at the joint between the photonic crystal resonant cavity and the first-stage photonic crystal waveguide, and a coupling area is formed by the row of medium columns; coupling medium columns are distributed at the joint between the photonic crystal resonant cavity and the W1-type photonic crystal waveguide and at a position corresponding to the point defects; and the whole system is integrated on a substrate. Due to the adoption of a two-stage compression structure, a light beam has a high compression ratio and a small emitting light spot; the photonic crystal resonant cavity is used as a medium, so that the system has high coupling efficiency and low consumption; and the whole system is integrated on the substrate, and has a small volume and a high integration level.

Description

Two-stage contracting beam system based on photonic crystal resonant cavity
Technical field:
The invention belongs to optical technical field, relate to a kind of microstructure photonic crystal element, specifically a kind of two-stage contracting beam system based on photonic crystal resonant cavity.
Background technology:
Photonic crystal is by the material with differing dielectric constant, arranges the artificial microstructure formed in space periodicity.In recent years, photoelectric functional device based on photon crystal material has obtained paying close attention to widely, utilize forbidden photon band and the photon Local Characteristic of photonic crystal, the photonic crystal photoelectric devices such as photon crystal wave-guide, wave filter, photoswitch, coupling mechanism have been seen in report, for the realization integrated and all-optical network of extensive photoelectricity in future is laid a good foundation.
Photonic crystal is the artificial microstructure that the medium period arrangement by different refractivity forms, and when electromagnetic wave is propagated therein, due to Bragg diffraction, electromagnetic wave can be modulated and form band structure, and this band structure is called photonic band gap.Between photonic band gap, band gap, i.e. photon band gap may appear.Owing to existing without any state in band gap, the electromagnetic wave that frequency drops in band gap is prohibited to propagate.If introducing dielectric defect or dielectric are unordered in photonic crystal, there will be photon local phenomenon, will form corresponding defect level in photon band gap, the light of characteristic frequency can occur in this defect level.By in complete 2 D photon crystal, introducing defect, destroy forbidden photon band, introduce defect state, can be used to make the 2 D photon crystal function element.In 2 D photon crystal, the inlead defect removes number row medium post, the electromagnetic wave of corresponding frequencies just can only be propagated in this line defect so, leaving line defect will decay rapidly, can make photon crystal wave-guide by inlead defect in 2 D photon crystal.Be different from the principles of internal reflection of traditional optical waveguide, the photon crystal wave-guide basic principle is different directions Defect Modes resonance coupling, therefore photon crystal wave-guide is not limited by corner in theory, bending loss is minimum, can be for making low-loss turning waveguide.
Yet want existing photon crystal device is integrated on same substrate and but is faced with logical optical width difference and the low inferior many difficulties of coupling efficiency between device, therefore can be in the linkage function device, realize that the contracting bundle device of the efficient minute-pressure contracting of light beam and microfocus is had to very important meaning to multi-photon crystal function element integrated.The important technological parameters of contracting bundle device is spot size, compressibility and transfer efficiency.Compressibility refers to the ratio of incident beam and outgoing beam halfwidth, and its numerical value is the bigger the better according to designing requirement.Transfer efficiency is the ratio of exit end and incident end light intensity, and the height of transfer efficiency directly affects the efficiency of system.Tapered waveguide can realize that device connects and light beam is controlled, yet the variation of tapered waveguide width can cause serious reflection loss and mode mismatch, thereby affects transfer efficiency.So the gradual change angle of tapered waveguide is usually smaller and length is longer, is difficult to reduced volume and is applied in the integrated and all-optical network of photoelectricity.The loss brought in order to reduce wide variety, researching and proposing of having introduces parabolic lens or the Galileo telescope optical system increases the gradual change angle, in order to can under less length, complete the control of width of light beam.But the introducing of optical device can make the structure complicated of tapered waveguide simultaneously, reduce the integrated level of device.In addition, at optical communicating waveband photon crystal device yardstick, be under submicron-scale, the diffraction effect of geometric optics is very obvious, has limited the application of above-mentioned two kinds of methods.So, in the urgent need to a kind of can the realization, under submicron-scale, light beam is regulated, and the contracting bundle device with high-transmission efficiency is propagated to realize optical information low-loss coupling between device.
Summary of the invention:
The technical problem to be solved in the present invention is to provide a kind of can the realization and under submicron-scale, light beam is regulated, and has high-transmission efficiency, can realize the optical information two-stage contracting beam system based on photonic crystal resonant cavity that the low-loss coupling is propagated between device.
In order to solve the problems of the technologies described above, the two-stage contracting beam system based on photonic crystal resonant cavity of the present invention sequentially connects airtight arrangement by one-level photon crystal wave-guide, photonic crystal resonant cavity, secondary photon crystal wave-guide and Nanowire Waveguides and forms; Described secondary photon crystal wave-guide is W1 type photon crystal wave-guide, and its logical optical width is less than the one-level photon crystal wave-guide; Photonic crystal resonant cavity adopts and in photonic crystal, adds point defect to form, and photonic crystal resonant cavity and one-level photon crystal wave-guide joining place distribution a line medium post, and this row medium post forms coupled zone; Photonic crystal resonant cavity and W1 type photon crystal wave-guide joining place, and be distributed with one or more couplant posts with the point defect correspondence position; Whole system is integrated in a substrate.
The electromagnetic wave of characteristic frequency (1550nm) is from the one-level photon crystal wave-guide incident in left side, and through the coupling of photonic crystal resonant cavity, light beam is coupled to the secondary photon crystal wave-guide; Because the logical optical width of secondary photon crystal wave-guide is less than the one-level photon crystal wave-guide, light beam completes the one-level compression.Light beam in W1 type photon crystal wave-guide is through the efficient coupling of W1 type photon crystal wave-guide and Nanowire Waveguides, and the less Nanowire Waveguides outgoing from clear aperature completes the two-stage compression of light beam.
Described one-level photon crystal wave-guide can be W7 type photon crystal wave-guide, W5 type photon crystal wave-guide or W3 type photon crystal wave-guide.
The medium column radius that forms one-level photon crystal wave-guide, photonic crystal resonant cavity and secondary photon crystal wave-guide agent structure is r.
The defect area of described one-level photon crystal wave-guide is r by radius 1the medium post form, r 1be greater than or less than r.
Point defect in described photonic crystal resonant cavity is r by radius 3one or more medium posts form, r 3be greater than or less than r.
Described point defect also can be in photonic crystal removes the space that one or more medium posts form.
The radius of described photonic crystal resonant cavity coupled zone medium post is r 2, r 2be greater than or less than r.
The couplant column radius of described photonic crystal resonant cavity is r 4, r 4be greater than or less than r.
In the present invention, the logical optical width of one-level photon crystal wave-guide, W1 type photon crystal wave-guide and Nanowire Waveguides is different, and especially between one-level photon crystal wave-guide and Nanowire Waveguides, logical optical width differs larger.And for the W1 type photon crystal wave-guide of communication band, its logical optical width is hundreds of nanometers, comparatively approaching with the logical optical width of Nanowire Waveguides, therefore the present invention adopts W1 type photon crystal wave-guide and photonic crystal resonant cavity as intermediary, one-level photon crystal wave-guide and Nanowire Waveguides are coupled together, adopt the mode of twice compression to realize the control to width of light beam.Wherein the one-level compression section consists of one-level photon crystal wave-guide, photonic crystal resonant cavity and W1 type photon crystal wave-guide, and the two-stage compression part consists of W1 type photon crystal wave-guide and Nanowire Waveguides.Between I and II contracting bundle, by W1 type photon crystal wave-guide, connected.Because the logical optical width of one-level photon crystal wave-guide, W1 type photon crystal wave-guide and Nanowire Waveguides reduces successively, therefore, as long as realize the efficient coupling between the three, can realize the microcontroller to width of light beam.
Advantage of the present invention is to adopt the two stages of compression structure, makes light beam through one-level compression and twice compression of two-stage compression, thereby reaches higher ratio of compression and less outgoing hot spot.Particularly adopt photonic crystal resonant cavity as intermediary, the one-level photon crystal wave-guide is connected with W1 type photon crystal wave-guide, photonic crystal resonant cavity and one-level photon crystal wave-guide joining place distribution a line are as the medium post of coupled zone, photonic crystal resonant cavity and W1 type photon crystal wave-guide joining place and be distributed with the couplant post with the point defect correspondence position, greatly improved coupling efficiency, the loss that optical information is propagated between device is low.With respect to tapered waveguide, the present invention has reduced the volume of device greatly in addition, has improved the integrated level of device.
The accompanying drawing explanation:
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Fig. 1 is the two-stage contracting beam system main body floor map based on photonic crystal resonant cavity of the present invention.
Fig. 2 is one-level compression section schematic diagram.
Fig. 3 is two-stage compression part schematic diagram.
Fig. 4 is that coupling efficiency is with medium column parameter change curve.
Fig. 5 is the two-stage contracting beam system schematic three dimensional views based on photonic crystal resonant cavity of the present invention.
Fig. 6 is the required reticle schematic diagram of etching scribe line.
Fig. 7 a~7g is the required scribe line technological process schematic diagram of preparation scribing.
Fig. 8 a~8f is the technological process schematic diagram for preparing strontium titanates medium post.
Fig. 9 a~9f is the technological process schematic diagram of processing request dimensional accuracy higher than the medium post of 10nm.
The technological process schematic diagram in Figure 10 a~10e removal devices structural edge district.
Embodiment:
As shown in Figure 1, 2, 3, the two-stage contracting beam system based on photonic crystal resonant cavity of the present invention is connected airtight to arrange by one-level photon crystal wave-guide 4, photonic crystal resonant cavity 5, secondary photon crystal wave-guide 6 and Nanowire Waveguides 7 orders and forms; Described one-level photon crystal wave-guide 4 is W5 type photon crystal wave-guide, secondary photon crystal wave-guide 6 is W1 type photon crystal wave-guide, photonic crystal resonant cavity 5 adds point defect 14 to form in photonic crystal, and photonic crystal resonant cavity 5 and one-level photon crystal wave-guide 4 joining place distribution a line medium posts 13, this row medium post forms coupled zone; Photonic crystal resonant cavity 5 and W1 type photon crystal wave-guide joining place, and be distributed with couplant post 15 with point defect 14 correspondence positions; Whole system is integrated in a substrate.
The electromagnetic wave of characteristic frequency (1550nm) is from left side W5 type photon crystal wave-guide incident, coupling through high-quality photonic crystal resonant cavity, light beam is coupled to W1 type photon crystal wave-guide from W5 type photon crystal wave-guide, because W1 type photon crystal wave-guide clear aperature size is less than W5 type photon crystal wave-guide, light beam completes the one-level compression.Light beam in W1 type photon crystal wave-guide is through the efficient coupling of W1 type photon crystal wave-guide and Nanowire Waveguides, and the less Nanowire Waveguides outgoing from clear aperature completes the two-stage compression of light beam.
The logical optical width of W5 type photon crystal wave-guide, W1 type photon crystal wave-guide and Nanowire Waveguides is different, and especially between W5 type photon crystal wave-guide and Nanowire Waveguides, logical optical width differs larger.And for the W1 type photon crystal wave-guide of communication band, its logical optical width is hundreds of nanometers, comparatively approaching with the logical optical width of Nanowire Waveguides, therefore the present embodiment adopts W1 type photon crystal wave-guide and photonic crystal resonant cavity as intermediary, W5 type photon crystal wave-guide and Nanowire Waveguides are coupled together, adopt the mode of twice compression to realize the control to width of light beam.Two-stage photonic crystal compressibility is comprised of one-level compression and two-stage compression two parts, wherein the one-level compression consists of W5 type photon crystal wave-guide, photonic crystal resonant cavity and W1 type photon crystal wave-guide, and two-stage compression consists of W1 type photon crystal wave-guide and Nanowire Waveguides.Between I and II contracting bundle, by W1 type photon crystal wave-guide, connected.Because the logical optical width of W5 type photon crystal wave-guide, W1 type photon crystal wave-guide and Nanowire Waveguides reduces successively, therefore, as long as realize the efficient coupling between the three, can realize the microcontroller to width of light beam.
As shown in Figure 2,3, medium post 11 radiuses of described formation one-level photon crystal wave-guide 4, photonic crystal resonant cavity 5 and secondary photon crystal wave-guide 6 agent structures are r.Photonic crystal resonant cavity 5 is r with one-level photon crystal wave-guide 4 joining place distribution a line radiuses 2coupled zone medium post 13, the point defect 14 in photonic crystal resonant cavity is r by a radius 3the medium post form; Photonic crystal resonant cavity 5 and W1 type photon crystal wave-guide joining place, and be distributed with a couplant post 15 with point defect 14 correspondence positions, the couplant column radius is r 4; Nanowire Waveguides width W=140nm, point defect 14 and Nanowire Waveguides 7 spacing d=1.05 μ m in photonic crystal resonant cavity.
As shown in Fig. 4 a, 4b, work as r=102nm, r 1=51nm, r 2=40nm, r 3=r 4=60nm, the time, outgoing efficiency can reach 94.6%; Work as r=102nm, r 1=51nm, r 2=175nm, r 3=r 4during=225nm, outgoing efficiency is 91.35%; Work as r=102nm, r 1=51nm, r 2=50nm, r 3=r 4during=250nm, outgoing efficiency is 83.6%.
In order to reach the purpose of contracting bundle, the present invention utilizes the efficient coupling of W5 type photon crystal wave-guide, high-quality photonic crystal resonant cavity and W1 type photon crystal wave-guide, and light beam is compressed.In manufacturing process, require respectively the coupled zone medium post of W5 type photon crystal wave-guide defect area medium post and photonic crystal resonant cavity, the medium post that forms point defect and the radius of couplant post to be optimized in complete photon crystal structure.Wherein, medium post and Nanowire Waveguides on contracting beam system main body are the strontium titanates structure, and strontium titanates medium post and strontium titanates Nanowire Waveguides are prepared in substrate.Strontium titanates medium post is the tetragonal structure, and its lattice period is 510nm.Strontium titanates medium post and strontium titanates Nanowire Waveguides height h=220nm, silicon dioxide buried regions 102 thickness h of substrate 2=3 μ m, substrate silicon 101 thickness h 3=600 μ m.
Fig. 6 is the required reticle schematic diagram of etching scribe line.Reticle is the square structure that the length of side is A=2cm, and square structure is divided into 16 square junior units, and each unit is elongated is a=0.5cm.Designed two-dimensional photonic crystal beam compression device is made in junior unit, through the scribing single exposure, can obtain 16 groups of two-stage contracting beam systems.
Two-stage contracting beam system of the present invention is made in substrate, is arranged with array and a strontium titanates Nanowire Waveguides that dozens of forms to hundreds of strontium titanates medium posts in substrate.Substrate consists of silicon dioxide buried regions (low-index layer) 102 and substrate silicon 101.Strontium titanates medium post array and Nanowire Waveguides contact with the silicon dioxide buried regions.
Concrete manufacturing process of the present invention is as follows:
The first step, the required scribe line of preparation scribing;
(A) to substrate silicon 101, be that 600 μ m are thick, on it, cleaning is carried out in the substrate (as shown in Figure 7a) of growth 3 μ m thick silicon dioxide buried regions 102;
(B) as shown in Figure 7b, on silicon dioxide buried regions 102, utilize sol-gal process to prepare one deck strontium titanate film 103;
(C) as shown in Figure 7 c, make the photoresist film 104 that a layer thickness is 2-3 μ m on strontium titanate film 103;
(D) structure step (C) completed is put into the baking oven front baking;
(E) as shown in Fig. 7 d, photoresist film 104 is carried out to uv-exposure, obtain the figure identical with the required reticle of etching scribe line;
(F), as shown in Fig. 7 e, through development, post bake, obtain making the required photoresist mask structure of scribe line;
(G) as shown in Fig. 7 f, the photoresist mask structure that step (F) is made carries out ICP (inductively coupled plasma etching) etching, and etching depth is 4 μ m; As shown in Fig. 7 g, remove photoresist film 104 and obtain the scribing structure with scribe line;
Second step, preparation ICP etching strontium titanates medium post array and the required mask of strontium titanates Nanowire Waveguides;
(H), as shown in Fig. 8 a, 8b, make the photoresist film 201 that a layer thickness is 100nm on the structure of the scribing with scribe line prepared in step (G);
(I) structure prepared by step (H) is put into the baking oven front baking;
(J) as shown in Figure 8 c, the photoresist film 201 prepared is carried out to electron beam exposure;
(K), as shown in Fig. 8 d, through development, post bake, obtain making strontium titanates medium post array and the required ICP photoresist mask structure of strontium titanates Nanowire Waveguides;
The 3rd step, the ICP photoresist mask structure that utilizes second step to prepare carries out the ICP etching, makes the two-stage contracting beam system agent structure based on photonic crystal resonant cavity;
(L) as shown in Fig. 8 e, the ICP photoresist mask structure that step (K) is made carries out the ICP etching, and etching depth is 220nm, obtains strontium titanates medium post array and strontium titanates Nanowire Waveguides;
(M), as shown in Fig. 8 f, the photoresist on strontium titanates medium post array and strontium titanates Nanowire Waveguides is removed, and cleaned;
The 4th step, process separately higher than the medium post of 10nm requiring dimensional accuracy;
(N), as shown in Fig. 9 a, 9b, apply one deck photoresist 301 on the structure obtained in step (M) as protective seam;
(O) as shown in Fig. 9 c, 9d, the photoresist 301 prepared is carried out to optical exposure, development, obtain the photoresist mask structure, come out in the strontium titanates medium post of needs processing (comprise one-level photonic crystal defect district medium post 12, photonic crystal resonant cavity coupled zone medium post 13, photonic crystal resonant cavity point defect medium post 14, photonic crystal resonant cavity couplant post 15, the medium post 14 of the needs of take in figure processing is example) region;
(P) as shown in Fig. 9 e, 9f, the strontium titanates medium post that utilizes focused ion beam (FIB) technique to process needs carries out high precision processing makes it reach required size, remove photoresist (figure medium post 11 is one-level photon crystal wave-guide 4, photonic crystal resonant cavity 5 and secondary photon crystal wave-guide 6 agent structure medium posts, for not needing the medium post of processing separately);
The 5th step, removal devices structural edge district;
(Q), as shown in Figure 10 a, 9b, the device architecture surface obtained in step (P) applies PMMA layer 401;
(R) as shown in Figure 10 c, 10d, PMMA layer 401 is carried out to synchrotron radiation X-ray exposure, development, make a protective seam on device architecture;
(S), according to the scribe line scribing, obtain 16 two-stage contracting beam system device main body structures based on photonic crystal resonant cavity that formed by strontium titanates medium post array and strontium titanates Nanowire Waveguides;
(T) as shown in Figure 10 e, the two-stage contracting beam system device architecture based on photonic crystal resonant cavity that step (S) is obtained is put into wafer lapping machine, carry out side grinding and polishing with different lapping liquids or polishing fluid respectively, remove marginarium and make the device architecture flat side down.
Because the PMMA refractive index is less than strontium titanate material, meet the total reflection condition on the vertical devices direction, therefore retain the protection structure of PMMA as device, increase the firmness of device, not fragile.
The invention is not restricted to above-mentioned embodiment, described one-level photon crystal wave-guide 4 can be W7 type photon crystal wave-guide, W5 type photon crystal wave-guide or W3 type photon crystal wave-guide.Therefore within every any simple deformation of making on the claims in the present invention 1 technical scheme basis all the invention is intended to protection domain.

Claims (7)

1. the two-stage contracting beam system based on photonic crystal resonant cavity, is characterized in that being connected airtight to arrange by one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5), secondary photon crystal wave-guide (6) and Nanowire Waveguides (7) order forming; Described secondary photon crystal wave-guide (6) is W1 type photon crystal wave-guide, and its logical optical width is less than one-level photon crystal wave-guide (4); Photonic crystal resonant cavity (5) adopts and in photonic crystal, adds point defect (14) to form, and photonic crystal resonant cavity (5) and one-level photon crystal wave-guide (4) joining place distribution a line medium post (13), this row medium post forms coupled zone; Photonic crystal resonant cavity (5) and W1 type photon crystal wave-guide joining place, and be distributed with one or more couplant posts (15) with point defect (14) correspondence position; Whole system is integrated in a substrate.
2. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, is characterized in that described one-level photon crystal wave-guide (4) is W5 type photon crystal wave-guide or W3 type photon crystal wave-guide.
3. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, medium post (11) radius that it is characterized in that forming one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5) and secondary photon crystal wave-guide (6) agent structure is r; The defect area of one-level photon crystal wave-guide (4) is r by radius 1medium post (12) form, r 1be greater than or less than r .
4. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, medium post (11) radius that it is characterized in that forming one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5) and secondary photon crystal wave-guide (6) agent structure is r; Point defect (14) in photonic crystal resonant cavity (5) is r by radius 3one or more medium posts form, r 3be greater than or less than r.
5. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, medium post (11) radius that it is characterized in that forming one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5) and secondary photon crystal wave-guide (6) agent structure is r; The space that point defect (14) forms for removing one or more medium posts in photonic crystal.
6. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, medium post (11) radius that it is characterized in that forming one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5) and secondary photon crystal wave-guide (6) agent structure is r; The radius of photonic crystal resonant cavity (5) coupled zone medium post (13) is r 2, r 2be greater than or less than r.
7. the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 1, medium post (11) radius that it is characterized in that forming one-level photon crystal wave-guide (4), photonic crystal resonant cavity (5) and secondary photon crystal wave-guide (6) agent structure is r; Couplant post (15) radius is r 4, r 4be greater than or less than r.
CN 201110452774 2011-12-30 2011-12-30 Two-stage beam shrinkage system based on photonic crystal resonant cavity Expired - Fee Related CN102419479B (en)

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