CN102404928A - 用于消弧的设备和系统以及装配方法 - Google Patents
用于消弧的设备和系统以及装配方法 Download PDFInfo
- Publication number
- CN102404928A CN102404928A CN2011102838594A CN201110283859A CN102404928A CN 102404928 A CN102404928 A CN 102404928A CN 2011102838594 A CN2011102838594 A CN 2011102838594A CN 201110283859 A CN201110283859 A CN 201110283859A CN 102404928 A CN102404928 A CN 102404928A
- Authority
- CN
- China
- Prior art keywords
- plasma gun
- melts
- diameter
- gun
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008030 elimination Effects 0.000 title claims abstract description 10
- 238000003379 elimination reaction Methods 0.000 title claims abstract description 10
- 238000000034 method Methods 0.000 title abstract description 13
- 239000000155 melt Substances 0.000 claims description 24
- 238000010891 electric arc Methods 0.000 claims description 15
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 description 9
- 230000015556 catabolic process Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003058 plasma substitute Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000289 melt material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T2/00—Spark gaps comprising auxiliary triggering means
- H01T2/02—Spark gaps comprising auxiliary triggering means comprising a trigger electrode or an auxiliary spark gap
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Arc Welding In General (AREA)
Abstract
Description
100 | 等离子体枪 |
102 | 杯 |
104 | 腔室 |
106 | 第一部分 |
108 | 第二部分 |
110 | 第一直径 |
112 | 第二直径 |
114 | 盖 |
116 | 基座 |
118 | 喷嘴 |
120 | 开口端 |
122 | 第一枪电极 |
124 | 第二枪电极 |
126 | 第一端(第一枪电极) |
128 | 第二端(第二枪电极) |
130 | 电弧 |
132 | 等离子体 |
200 | 等离子体枪 |
202 | 腔室 |
204 | 第一部分 |
206 | 第二部分 |
208 | 第一直径 |
210 | 第二直径 |
212 | 开口端 |
214 | 喷嘴 |
300 | 电弧检测和消除系统 |
302 | 主电弧装置 |
304 | 主电极 |
306 | 主电极 |
308 | 主间隙 |
310 | 电源电路的电气上不同的部分 |
312 | 电源电路的电气上不同的部分 |
314 | 偏置电压 |
316 | 触发电路 |
318 | 消融等离子体 |
320 | 电弧 |
322 | 逻辑电路 |
324 | 传感器 |
326 | 断路器 |
328 | 箱 |
330 | 排出口 |
332 | 外盖 |
334 | 冲击防护机构 |
336 | 内腔室 |
400 | 流程图 |
402 | 将主电极耦合到电路 |
404 | 在杯中形成腔室 |
406 | 在盖中形成喷嘴 |
408 | 将盖安装到基座上 |
410 | 将枪电极的第一端和第二端插入腔室 |
412 | 相对于主电极来定位等离子体枪 |
414 | 将枪电极耦合到触发电路 |
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/883,329 US8330069B2 (en) | 2010-09-16 | 2010-09-16 | Apparatus and system for arc elmination and method of assembly |
US12/883329 | 2010-09-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102404928A true CN102404928A (zh) | 2012-04-04 |
CN102404928B CN102404928B (zh) | 2016-02-03 |
Family
ID=44582678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110283859.4A Active CN102404928B (zh) | 2010-09-16 | 2011-09-16 | 用于消弧的设备和系统以及装配方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8330069B2 (zh) |
EP (1) | EP2432087B1 (zh) |
JP (1) | JP2012064577A (zh) |
KR (1) | KR20120029354A (zh) |
CN (1) | CN102404928B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103490403A (zh) * | 2012-06-12 | 2014-01-01 | 通用电气公司 | 用于排放来自电气故障的能量的方法及系统 |
CN103796408A (zh) * | 2012-10-30 | 2014-05-14 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN103796409A (zh) * | 2012-10-30 | 2014-05-14 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN104023462A (zh) * | 2013-02-22 | 2014-09-03 | 通用电气公司 | 用于消弧的系统和装置 |
CN110463356A (zh) * | 2017-04-04 | 2019-11-15 | 株式会社富士 | 等离子体发生装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9036309B2 (en) * | 2010-09-16 | 2015-05-19 | General Electric Company | Electrode and plasma gun configuration for use with a circuit protection device |
JP6790265B2 (ja) | 2017-06-30 | 2020-11-25 | 三菱電機株式会社 | 太陽光発電装置、太陽電池パドル、宇宙構造物および太陽光発電装置の製造方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4521666A (en) | 1982-12-23 | 1985-06-04 | Union Carbide Corporation | Plasma arc torch |
US4780591A (en) * | 1986-06-13 | 1988-10-25 | The Perkin-Elmer Corporation | Plasma gun with adjustable cathode |
US4959520A (en) | 1988-02-15 | 1990-09-25 | Daihen Corporation | Detection means for an electric arc torch nozzle |
US5157240A (en) * | 1989-09-13 | 1992-10-20 | Chow Loren A | Deposition heaters |
US5124525A (en) | 1991-08-27 | 1992-06-23 | Esab Welding Products, Inc. | Plasma arc torch having improved nozzle assembly |
US5317126A (en) | 1992-01-14 | 1994-05-31 | Hypertherm, Inc. | Nozzle and method of operation for a plasma arc torch |
US5308949A (en) | 1992-10-27 | 1994-05-03 | Centricut, Inc. | Nozzle assembly for plasma arc cutting torch |
JPH07206414A (ja) * | 1994-01-18 | 1995-08-08 | Semiconductor Energy Lab Co Ltd | プラズマを用いたc60合成方法 |
US6278241B1 (en) | 1995-11-13 | 2001-08-21 | Tepla Ag | Four-nozzle plasma generator for forming an activated jet |
EP0903059A1 (en) | 1996-05-31 | 1999-03-24 | IPEC Precision, Inc. | Apparatus for generating and deflecting a plasma jet |
JP2990203B2 (ja) * | 1996-12-26 | 1999-12-13 | 工業技術院長 | ピンチプラズマの発生方法および装置 |
JPH11229124A (ja) * | 1998-02-12 | 1999-08-24 | Fuji Electric Corp Res & Dev Ltd | 炭素化合物の製造方法および装置 |
US6096992A (en) | 1999-01-29 | 2000-08-01 | The Esab Group, Inc. | Low current water injection nozzle and associated method |
US6121571A (en) | 1999-12-16 | 2000-09-19 | Trusi Technologies Llc | Plasma generator ignition circuit |
DE60238470D1 (de) | 2001-02-27 | 2011-01-13 | Yantai Longyuan Power Tech Co | Plasmazünder mit zusammengesetzter kathode |
CN101524633A (zh) * | 2002-10-25 | 2009-09-09 | 柏克德Bwxt爱达荷有限责任公司 | 热合成的装置 |
US7012214B2 (en) * | 2003-09-24 | 2006-03-14 | Nanotechnologies, Inc. | Nanopowder synthesis using pulsed arc discharge and applied magnetic field |
CN101966423B (zh) * | 2005-10-10 | 2012-08-22 | 韩国机械研究院 | 使用离子体反应器通过吸留催化剂降低NOx的装置 |
US7821749B2 (en) * | 2007-03-30 | 2010-10-26 | General Electric Company | Arc flash elimination apparatus and method |
US8742282B2 (en) * | 2007-04-16 | 2014-06-03 | General Electric Company | Ablative plasma gun |
WO2009018837A1 (en) * | 2007-08-06 | 2009-02-12 | Plasma Surgical Investments Limited | Pulsed plasma device and method for generating pulsed plasma |
US20090134129A1 (en) * | 2007-11-27 | 2009-05-28 | General Electric Company | Ablative plasma gun apparatus and system |
US8053699B2 (en) * | 2007-11-27 | 2011-11-08 | General Electric Company | Electrical pulse circuit |
CN102123558A (zh) * | 2010-12-22 | 2011-07-13 | 武汉天和技术股份有限公司 | 长寿命内空式阴极双压缩等离子体发生装置 |
-
2010
- 2010-09-16 US US12/883,329 patent/US8330069B2/en active Active
-
2011
- 2011-09-12 JP JP2011197781A patent/JP2012064577A/ja active Pending
- 2011-09-13 EP EP11181040.4A patent/EP2432087B1/en active Active
- 2011-09-15 KR KR1020110092975A patent/KR20120029354A/ko not_active Application Discontinuation
- 2011-09-16 CN CN201110283859.4A patent/CN102404928B/zh active Active
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103490403A (zh) * | 2012-06-12 | 2014-01-01 | 通用电气公司 | 用于排放来自电气故障的能量的方法及系统 |
CN103490403B (zh) * | 2012-06-12 | 2017-12-05 | 通用电气公司 | 用于排放来自电气故障的能量的方法及系统 |
CN103796408A (zh) * | 2012-10-30 | 2014-05-14 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN103796409A (zh) * | 2012-10-30 | 2014-05-14 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN103796409B (zh) * | 2012-10-30 | 2017-06-23 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN103796408B (zh) * | 2012-10-30 | 2017-07-07 | 通用电气公司 | 等离子体生成装置组件、电弧缓解装置和组装方法 |
CN104023462A (zh) * | 2013-02-22 | 2014-09-03 | 通用电气公司 | 用于消弧的系统和装置 |
CN104023462B (zh) * | 2013-02-22 | 2017-09-12 | 通用电气公司 | 用于消弧的系统和装置 |
CN110463356A (zh) * | 2017-04-04 | 2019-11-15 | 株式会社富士 | 等离子体发生装置 |
CN110463356B (zh) * | 2017-04-04 | 2022-01-11 | 株式会社富士 | 等离子体发生装置 |
Also Published As
Publication number | Publication date |
---|---|
US20120067854A1 (en) | 2012-03-22 |
JP2012064577A (ja) | 2012-03-29 |
KR20120029354A (ko) | 2012-03-26 |
US8330069B2 (en) | 2012-12-11 |
CN102404928B (zh) | 2016-02-03 |
EP2432087B1 (en) | 2017-08-09 |
EP2432087A3 (en) | 2014-02-26 |
EP2432087A2 (en) | 2012-03-21 |
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Effective date of registration: 20190801 Address after: Baden, Switzerland Patentee after: ABB Switzerland Co.,Ltd. Address before: American New York Patentee before: General Electric Co. |
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Effective date of registration: 20230223 Address after: Italy, Milan Patentee after: ABB A/S Address before: Swiss Baden Patentee before: ABB Switzerland Co.,Ltd. |
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