CN102402134A - Fixed shaft type stabilizing device for gyroscope on workpiece platform of photoetching machine - Google Patents
Fixed shaft type stabilizing device for gyroscope on workpiece platform of photoetching machine Download PDFInfo
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- CN102402134A CN102402134A CN2011103777757A CN201110377775A CN102402134A CN 102402134 A CN102402134 A CN 102402134A CN 2011103777757 A CN2011103777757 A CN 2011103777757A CN 201110377775 A CN201110377775 A CN 201110377775A CN 102402134 A CN102402134 A CN 102402134A
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Abstract
The invention provides a fixed shaft type stabilizing device for a gyroscope on a workpiece platform of a photoetching machine, belonging to a manufacture technology of a semiconductor by means of optical lithography. A balance mass block which can parallelly move is arranged on a base table, an X-directional first linear electric motor stator and an X-directional second linear electric motor stator are respectively arranged along with two sides of an X axle of the balance mass block, an X-directional first linear electric motor rotor and an X-directional second linear electric motor rotor are respectively arranged on the X-directional first linear electric motor stator and the X-directional second linear electric motor stator in a suspension way, a Y-directional guide rail with a Y-directional linear electric motor stator is rigidly and fixedly arranged between the X-directional first linear electric motor rotor and the X-directional second linear electric motor rotor, a Y-directional linear electric motor rotor is arranged on the Y-directional guide rail in a suspension way, a silicon slice support table is fixed on the lateral part of the Y-directional linear electric motor rotor, a silicon slice support seat which is connected on the base table in a suspension way is rigidly connected with the silicon slice support table, and four groove pits arranged at four corners of the balance mass block are respectively and fixedly provided with a first gyroscope stabilizing device, a second gyroscope stabilizing device, a third gyroscope stabilizing device and a forth gyroscope stabilizing device. Therefore, in the device, the torsion tendency can be resisted timely, the torsion capacity can be reduced, the accuracy of momentum conservation can be guaranteed, and the positioning precision can be improved.
Description
Technical field
The invention belongs to semiconductor optical photolithographic fabrication technical field, relate generally to the ultra-fine silicon motion locating system in the litho machine, particularly have the high speed work stage positioning system of balance mass vibration absorber.
Background technology
Optical lithography techniques is the mainstream technology in the semi-conductor chip manufacturing industry, and with respect to other photoetching techniques, optical lithography techniques has throughput rate height, bearing accuracy advantages of higher.As one of most important operation in the preceding road of the IC chip production run; Its ultimate principle is that utilization is conversion, transfer and the processing that intermediary is realized figure with the photoresist; Finally be delivered to image information on the silicon chip; The design circuit figure that is about on the mask plate is transferred to a kind of technological process on the semi-conductor chip according to certain reduced scale, and this operation equipment needed thereby is called litho machine.
The growth of number of transistors purpose is constantly dwindled with the getable characteristic line breadth of photoetching technique and is promoted on the single semiconductor chip.Live width is also referred to as processing procedure, is meant in the chip link width of lead between the transistor.The 45nm processing procedure CPU of INTEL Corp.'s production has at present obtained widespread use, and the CPU of 32nm processing procedure also puts on market.Along with to the improving constantly of requirements such as lithographic line width, alignment precision, throughput rate, location and vibration damping as the ultraprecise high speed work stage of one of core component of litho machine are required also to improve constantly.Because the bearing accuracy of photo-etching machine work-piece platform has directly determined after the transfer printing live width of circuit size on the silicon chip.The whole world three big lithographic equipment manufacturers: Dutch ASML, Japanese NIKON, Japanese CANON in the research and development of product line separately, has all made big quantity research to photo-etching machine work-piece platform, and the combination actual production process is constantly improved.They have generally used the balance mass damping technology in its product, because the photo-etching machine work-piece platform freedom of motion that mainly has three directions, i.e. and X, Y and reverse along the Z axle.So mainly consider vibration suppression and bearing accuracy on this three degree of freedom direction.
The vibration that produces in the litho machine course of work mainly is made up of internal vibration and external vibration two parts.In the production technology in early days, the silicon chip diameter is not more than 200mm and lower to live width and productive rate requirement, and the influence of litho machine internal vibration is less, and external vibration is eliminated in main consideration.The silicon chip of 300mm diameter is used widely at present, and productive rate also improves constantly.The internal vibration of litho machine is increasing to the influence of items of equipment index, especially serious to having improved constantly of lithographic accuracy and speed restrictive function.
Photo-etching machine work-piece platform has higher acceleration of motion and movement velocity in the course of the work; Especially in high acceleration start-stop process; The impulsive force that work stage produces can produce bigger vibration to base station if can not get good buffering, and this is the main source of litho machine machine internal vibration.In addition, in the plane motion process, the acceleration and deceleration motion that departs from the axis can cause work stage along the reversing of Z axle to work stage at X, Y, and this can not be ignored for high-precision location, need take measures to suppress.
To above problem, relevant both at home and abroad manufacturer and research institution have carried out a large amount of research, and the major technique means of taking at present are to utilize principle of conservation of momentum, take the balance mass damper mechanism to weaken the litho machine internal vibration.
Patent US6885430B2, ZL200710045582, US7034920B2, ZL200410009257, ZL200710042417 all utilize this principle to design.
In patent US6885430B2, Nikon company has taked the form of two silicon chip platforms, and in the time of a silicon chip platform prealignment, another carries out photoetching.The silicon chip platform is based upon directions X and Y direction independently on two balance mass pieces; Linear motor stator electric has been installed on the balance mass piece and has been connected with pedestal through air-bearing; When linear electric motors drive the motion of silicon chip platform, act on reacting force on the motor stator and promoted balance mass piece move round about (momentum conservation).Because the balance mass piece is that air supporting is connected on the pedestal, this has just been avoided the direct impact of reacting force to pedestal, and vibration is able to weaken.Though X, Y are simple and compact for structure to the form that the balance mass piece separates, control is relatively easy, when the movement velocity of silicon chip platform constantly promotes; When departing from the axis acceleration and deceleration motion, because the nonconservation of angular momentum will cause rotation trend (the Rotation z along the Z axle; Be called for short Rz) increase; If do not compensate for, will cause the work stage vibration, influence precision positioning.
Shanghai Microelectronic Equipment Co., Ltd has taked on a kind of principle comparatively simple and direct vibration damping mode in its patent ZL200710045582; In the bottom of base station symmetric arrangement the identical motion of one cover and top moving cell (mainly comprise silicon chip platform, X to air-float guide rail, X to linear electric motors, Y 2 movers) to linear electric motors, and take opposite motion strategy to offset in the moving cell course of work of top reacting force to base station.Though this structure can be offset the acting force that base station receives on X, the Y in-plane preferably; But when the silicon chip off-axis is moved on top; The bottom symmetrical mechanism will move at the off-axis opposite side in the other direction, and the result produces the couple that the Z axle is reversed, than single moving cell; This scheme Rz doubles, and makes to suppress Rz difficulty more.In addition, this structure has been taked the identical equipment of two covers, complicated in mechanical structure, and complete machine is less economical.
Holland ASML company is in its patent US7034920B2, and litho machine balance mass piece is designed to be able to the general frame form of free translation on X, Y plane, and the balance mass piece is supported by air-bearing.On the balance mass piece, arranged a cover moving cell, 2 Y are rigidly fixed on the base station to the stator of linear electric motors, connect through air-float guide rail between moving cell and the balance mass.Ignoring pipeline involves; Resistances such as air supporting friction, linear electric motors act on the power opposite sign but equal magnitude on moving cell and the balance mass, and the balance mass piece is because of receiving the reacting force that linear electric motors are bestowed; To an opposite lateral movement, moving cell and balance mass remain momentum conservation.X, when Y axle linear electric motors move simultaneously; Make base station planar do two dimensional motion freely; Because the quality of base station can be designed to greater than moving cell, under the prerequisite that still satisfies momentum conservation, has avoided the adverse effect of the excessive movement travel of base station to the complete machine spatial design.This mode is significantly cushioned the high speed start-stop of moving cell, has avoided the direct impact to body.In order to offset Rz, this patent proposes to utilize swiveling wheel or the mechanical arm of contact to bestow base station moment and resists Rz.But the antitorque structure of the application of force of contact can balance mass and introduce the power that involves, and destroys momentum conservation and effectiveness in vibration suppression, increases labile factor.
For overcoming the above problems better, Tsing-Hua University proposes a kind of new departure in its patent ZL200410009257.At the barycenter place of base station, fixed a motor with coaxial the inlaying of Z axle, motor is connected to being supported, had on the swiveling wheel of certain mass by air supporting of a circle through shaft coupling.Angular-rate sensor is installed on base station, when sensor to Rz, motor is driven rotary wheel forward or reverse rotation just, utilizes the anti-torsional moment balance Rz of motor.This mode twisting force is direct, simple in structure.Be called momenttum wheel mechanism.
Shanghai Microelectronic Equipment Co., Ltd has proposed a kind of different structural forms in its patent ZL200710042417; To X, Y to the balance mass piece integrate; Make it to become a balance mass framework; On framework, have X, Y to linear electric motors and silicon chip platform, relaxed the free nargin of balance mass piece, promptly be similar to the balance mass block structure form among the patent US7034920B2.The balance mass piece connects pedestal through air supporting, can translation on X, Y plane, reverse along the Z axle, owing to there has not been the restriction reversed along the Z axle, angular momentum also is a conservation.Though the conservation of angular momentum has solved vibration problem, caused along the location deflection of Z axle, unfavorable to the location of silicon chip platform, offset reversing so need a cover mechanism along the Z axle.Different with the patent ZL200410009257 of Tsing-Hua University is that 2 momenttum wheel mechanisms of this scheme symmetric arrangement are installed in the balance mass piece.
The said structure effect is direct, and principle is simple, but owing to be passive detection; There is certain delay in control system, is difficult in time suppress Rz, and the balance mass piece often changes along the torsional direction of Z axle; Need frequent rotating speed and the sense of rotation that changes momenttum wheel, the real-time of control is poor.For the relation between balancing torque size and the response speed; The quality of the moment of torsion of motor and rotating speed, solid of revolution and transient equilibrium need accurately coupling; Otherwise the high speed rotating of solid of revolution will be brought extra vibration with frequent acceleration and deceleration, makes that the selection of motor is also difficult.
Summary of the invention
To the defective of prior art, the present invention has designed a kind of balancing and positioning system for workpiece platform of photoetching machine that has gyro fixed shaft type stabilising arrangement, reaches the purpose that improves work stage motion positions precision.
The objective of the invention is to realize like this:
Air-float guide rail connection balance mass piece is passed through in base station upper end at photo-etching machine work-piece platform; Described balance mass piece can free shift move in X, Y plane; Limit the movement travel of balance mass piece through boss at place, middle part, base station upper surface; The balance mass piece along on the position, X axle both sides respectively symmetry install X to first linear motor stator electric and X to second linear motor stator electric; X to first linear motor rotor and X to second linear motor rotor through air-float guide rail be installed in respectively X to first linear motor stator electric and X on second linear motor stator electric, X to first and second linear motor rotor and between rigidly fix Y to guide rail, Y is packed in Y on guide rail to linear motor stator electric; Y is installed in Y to linear motor rotor on guide rail through air-float guide rail; Silicon wafer bearing table is rigidly fixed in Y on the sidepiece of linear motor rotor, and silicon chip platform supporting base bottom is connected on the base station through air supporting, and the top and the silicon wafer bearing table of silicon chip platform supporting base are rigidly connected; Be arranged with four groove holes at four jiaos of places of balance mass piece; Mechanical gyroscope and the gyroscope holder that has a high speed rotary body by inside constitute first gyrostabilization unit, second gyrostabilization unit, the 3rd gyrostabilization unit, the 4th gyrostabilization unit along Y direction respectively rigidity be packed in four grooves holes; Gyroscope holder and groove hole are connected, and so far constitute photo-etching machine work-piece platform gyro fixed shaft type stabilising arrangement.
Gyrostabilization unit has utilized gyrostatic gyroscopic inertia principle: when gyrorotor with high speed rotating, can revolt the strength of any change rotor axial:
1, the moment of inertia of rotor is big more, and gyroscopic inertia is good more;
2, rotor velocity is big more, and gyroscopic inertia is good more.
The balance mass piece quality that the present invention relates to is bigger; Need the strong mechanical gyroscope of gyroscopic inertia, major comonomer gyroscope volume is bigger, so symmetry has been installed 4 miniature gyroscope on the balance mass piece; When type selecting, need take all factors into consideration gyrostatic quality, rotating speed and volume.Under the equal in quality, the higher gyroscope gyroscopic inertia of rotating speed is strong.Under the same rotational speed, the gyroscope that quality is bigger, moment of inertia is big, and gyroscopic inertia is good, but relative volume is also bigger.And that the groove of balance mass piece can not design is too much, otherwise may influence the mechanical characteristic of balance mass piece, causes strain to increase such as insufficient rigidity, and resonant frequency changes or the like, all can impact bearing accuracy.
Gyrostatic gyroscopic inertia has guaranteed to take place when the Z axle reverses when the balance mass piece, can resist in real time to reverse the trend, and reduces torsional capacity, to improving bearing accuracy positive role is arranged.And because gyroscope arranges that along the Y axle balance mass piece is during along X, the translation of Y axle, gyroscope does not twist, and momentum conservation is not exerted an influence.Gyroscope is not introduced external force, has guaranteed the accuracy of momentum conservation.
Description of drawings
Fig. 1 is a general structure synoptic diagram of the present invention;
Fig. 2 is a balance mass block structure synoptic diagram;
Fig. 3 is the abutment structure synoptic diagram;
Fig. 4 is first, second, third and fourth gyrostabilization unit structural representation.
Among the figure: the 1-base station; 2-balance mass piece; 3-silicon chip platform supporting base; 4a, 4b, 4c, first, second, third and fourth gyrostabilization unit of 4d-; 5a, 5b-X are to first and second linear motor stator electric; 6a, 6b-X are to first and second linear motor rotor; 7-Y is to linear motor rotor; 8-Y is to guide rail; 9-Y is to linear motor stator electric; The 10-silicon wafer bearing table; 11-gyroscope holder; The 12-mechanical gyroscope; The 13-boss.
Embodiment
Below in conjunction with accompanying drawing embodiment of the present invention is described in detail.
Fig. 1 is a general structure synoptic diagram of the present invention, and base station 1 is connected to ground, and balance mass piece 2 is connected with base station 1 through air-float guide rail, in X, Y plane, can free shift slide, through the movement travel of the boss 13 limiting balance masses 2 in the middle of the base station 1; X has been installed to first, second linear motor stator electric 5a, 5b at balance mass piece 2 respectively along X axle both sides; X to first, second linear motor rotor 6a, 6b respectively air supporting to be installed in X last to first, second linear motor stator electric 5a, 5b; Between first and second linear motor rotor 6a and 6b, rigidly fixed Y to guide rail 8 at X; Y has fixed Y to linear motor stator electric 9 on guide rail 8, Y is installed in Y on guide rail 8 to linear motor rotor 7 through air-float guide rail, and silicon wafer bearing table 10 is rigidly fixed in Y on the sidepiece of linear motor rotor 7; The bottom air supporting of silicon chip platform supporting base 3 is connected on the base station 1, and top and silicon wafer bearing table 10 are rigidly connected.Y, can drive silicon wafer bearing table 10 and planar move with silicon chip platform supporting base 3 to linear motor stator electric 5a, 5b acting in conjunction to linear motor rotor 7 and X.Moving cell comprise silicon chip platform supporting base 3, Y to linear motor rotor 7, silicon wafer bearing table 10, Y to guide rail 8, Y to linear motor stator electric 9, X to linear motor rotor 6a, 6b.
Fig. 2 is a balance mass block structure synoptic diagram.Visible by figure; Four diagonal angle symmetries at balance mass piece 2 have been opened four grooves, and the mechanical gyroscope 12 that is had the high speed rotary body by inside and gyroscope holder 11 constitute first, second, third and fourth gyrostabilization unit 4a, 4b, 4c, 4d and be rigidly fixed in the bottom of four grooves respectively along Y direction, and gyroscope holder 11 is connected with groove; In the course of work; When silicon wafer bearing table 10 off-axis acceleration and deceleration motions cause that balance mass piece 2 reverses,, produced stronger gyroscopic inertia because there is the high speed rotary body gyroscope inside; Gyroscope can be resisted the trend of reversing, the amplitude that reduces to reverse.
Photo-etching machine work-piece platform gyrostabilization unit of the present invention not only can effectively reduce the vibration that the photo-etching machine work-piece platform high-speed motion produces.And creatively utilized gyrostatic gyroscopic inertia; Through on the balance mass piece, mechanical gyroscope being installed; Do not introducing external force; When the momentum conservation of X, Y direction not being exerted an influence, opposing balance mass piece reverses along the Z axle, can significantly improve the motion positions precision of photo-etching machine work-piece platform.
Claims (1)
1. photo-etching machine work-piece platform gyro fixed shaft type stabilising arrangement; It is characterized in that: pass through air-float guide rail connection balance mass piece (2) in base station (1) upper end; Described balance mass piece (2) can free shift move in X, Y plane; Limit the movement travel of balance mass piece (2) through boss (13) at place, base station (1) middle part, upper surface; Balance mass piece (2) along on the position, X axle both sides respectively symmetry install X to first linear motor stator electric (5a) and X to second linear motor stator electric (5b); X to first linear motor rotor (6a) and X to second linear motor rotor (6b) be installed in respectively through air-float guide rail X to first linear motor stator electric (5a) and X on second linear motor stator electric (5b); Rigidly fix Y to guide rail (8) at X to first and second linear motor rotor (6a) and (6b); Y is packed in Y on guide rail (8) to linear motor stator electric (9), and Y is installed in Y on guide rail (8) to linear motor rotor (7) through air-float guide rail, and silicon wafer bearing table (10) is rigidly fixed in Y on the sidepiece of linear motor rotor (7); Silicon chip platform supporting base (3) bottom is connected on the base station (1) through air supporting, and the top of silicon chip platform supporting base (3) and silicon wafer bearing table (10) are rigidly connected; Be arranged with four groove holes at balance mass piece (2) Si Jiaochu; Mechanical gyroscope (12) and the gyroscope holder (11) that has a high speed rotary body by inside constitute first gyrostabilization unit (4a), second gyrostabilization unit (4b), the 3rd gyrostabilization unit (4c), the 4th gyrostabilization unit (4d) along Y direction respectively rigidity be packed in four grooves holes, gyroscope holder (11) is connected with the groove hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103777757A CN102402134A (en) | 2011-11-12 | 2011-11-12 | Fixed shaft type stabilizing device for gyroscope on workpiece platform of photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103777757A CN102402134A (en) | 2011-11-12 | 2011-11-12 | Fixed shaft type stabilizing device for gyroscope on workpiece platform of photoetching machine |
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| CN102402134A true CN102402134A (en) | 2012-04-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103777757A Pending CN102402134A (en) | 2011-11-12 | 2011-11-12 | Fixed shaft type stabilizing device for gyroscope on workpiece platform of photoetching machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103438994A (en) * | 2013-06-24 | 2013-12-11 | 京东方科技集团股份有限公司 | Automatic ultraviolet light irradiance measuring device |
| DE102021133003A1 (en) | 2021-12-14 | 2023-06-15 | ebm-papst neo GmbH & Co. KG | Stabilized analysis device for transient operation |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6509969B1 (en) * | 1999-08-16 | 2003-01-21 | Advantest Corp. | System for inspecting and/or processing a sample |
| JP2006084251A (en) * | 2004-09-15 | 2006-03-30 | Yokogawa Electric Corp | Xy stage |
| CN101075096A (en) * | 2007-06-22 | 2007-11-21 | 上海微电子装备有限公司 | System for balancing and positioning work table of photoetching device |
-
2011
- 2011-11-12 CN CN2011103777757A patent/CN102402134A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6509969B1 (en) * | 1999-08-16 | 2003-01-21 | Advantest Corp. | System for inspecting and/or processing a sample |
| JP2006084251A (en) * | 2004-09-15 | 2006-03-30 | Yokogawa Electric Corp | Xy stage |
| CN101075096A (en) * | 2007-06-22 | 2007-11-21 | 上海微电子装备有限公司 | System for balancing and positioning work table of photoetching device |
Non-Patent Citations (1)
| Title |
|---|
| 李鸿 等: "100nm步进扫描光刻机硅片台掩模台运动结构设计", 《微电子技术》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103438994A (en) * | 2013-06-24 | 2013-12-11 | 京东方科技集团股份有限公司 | Automatic ultraviolet light irradiance measuring device |
| DE102021133003A1 (en) | 2021-12-14 | 2023-06-15 | ebm-papst neo GmbH & Co. KG | Stabilized analysis device for transient operation |
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Application publication date: 20120404 |