CN101206409B - Balance mass orientation system for workpiece platform - Google Patents
Balance mass orientation system for workpiece platform Download PDFInfo
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- CN101206409B CN101206409B CN200710172427XA CN200710172427A CN101206409B CN 101206409 B CN101206409 B CN 101206409B CN 200710172427X A CN200710172427X A CN 200710172427XA CN 200710172427 A CN200710172427 A CN 200710172427A CN 101206409 B CN101206409 B CN 101206409B
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Abstract
The invention provides a workpiece console quality balancing and locating system, which is used to reduce the vibration of the workpiece console in a lithography machine comprises a system frame, a basic frame, a silicon chip loading microchecker, an air floatation system, a rectifying and antishifting device and a motion limitation device. The system frame moves relatively to the basic frame via the air floatation system; the motion limitation device is arranged at the four corner points of the system frame and is used to round the limit position of a locating system on the basic frame for plane motion; an X axis long stroke module and a Y axis long stroke module enables the silicon chip loading microchecker to move independently in the X and Y directions relatively to the system frame; the rectifying and antishifting device is used to complete the compensation and the zero-returning control on the workpiece console quality balancing and locating system. The quality balancing and locating system of the invention is simple in structure; the rectifying and antishifting device in a special design can completely decouple the motion and is easy to prepare the follow-up control policy, which can further improve the acceleration of the silicon chip loading microchecker for big stroke motion in combination with a X torque compensation device axis and a Y axis torque compensation device.
Description
Technical field
The present invention relates to a kind of balance mass orientation system for workpiece platform that is applied in the litho machine, particularly have the balance mass orientation system for workpiece platform of correction and means for preventing driftage.
Background technology
Photoetching is meant the technological process that the graphics chip on a series of masks is transferred to successively the complexity on the silicon chip equivalent layer by exposure system.Whole photoetching process approximately consumes 60% of the preceding road of chip manufacturing time, nearly 40% the cost that occupies that entire chip makes.And these a series of complexity, costliness, photo-etching technological process consuming time concentrate on and finish on the group for photo etching machine of pipeline production line correspondence before the chip, so the lithographic accuracy of litho machine and productive rate height directly affect the integrated level and the manufacturing cost of chip.And productive rate and lithographic accuracy are a pair of paradox, and the client should system improve productive rate, improves the exposure quality and the exposure accuracy of system again.
When the silicon chip diameter is not more than 200mm, when live width was not less than 100nm, in order to improve productive rate, work stage generally adopted counter-force to draw mode outward.And the motion counter-force in above-mentioned acceleration and deceleration stage is a major reason that causes system vibration, must be handled, to reduce and to avoid its influence to etching system exposure quality.Present way is that the motion counter-force with long stroke motor is drawn out on the basic framework, and by a cover active damping system exposing unit is carried out vibration damping and vibration isolation, to guarantee the accuracy requirement of system.
The silicon chip that present lithographic diameters is 300mm has become the mainstream technology of preceding road field of lithography.In the litho machine system, especially to carrying the large-mass workpiece platform system of this diameter silicon chip, the load quality of workpiece director stroke module, speed, acceleration all should have greatly mutually to be increased, and counter-force is drawn mode outward can not satisfy the demand of litho machine system to vibration damping again.And when lithographic line width during less than 100nm, any microvibration is disturbed and all can be brought fatal influence to system's photoetching quality in the machine system.
The balance mass technology occurs under this condition just.By the balance mass technology, the acting force that work stage passes to basic framework can significantly reduce, and this has reduced the vibration damping difficulty of litho machine system to a great extent, has avoided the interference of motion counter-force to system's exposure.
Current work-piece platform balancing quality system mainly contains individual layer and two kinds of bilayers.A kind of work stage of litho machine of traditional employing individual layer balance quality system, be to utilize one deck balance mass framework to come the long stroke motor of balance at X, Y, the reacting force that is produced because of the motion acceleration and deceleration on three directions of Rz, and adopt two group of five linkage to realize physical connection between work-piece platform balancing quality system and basic framework.The initialization that two group of five linkage can be finished the work-piece platform balancing quality system returns zero, and under the motor pattern work-piece platform balancing quality system is followed the tracks of compensating action.Yet two groups of five-bar mechanisms have four control motors, four motor associating one tracking Control X, and Y, the Rz three degree of freedom, system needs decoupling zero, control strategy complexity.If generation control fault, five linkages are easy to be subjected to the impact of balance mass system and damage.
The work stage of the litho machine of the another kind of traditional double-deck balance mass of employing system, it adopt two-layer balance mass respectively the long stroke motor of balance at X, Y, the motion counter-force that is produced during acceleration and deceleration motion on three directions of Rz; The top layer balance mass is used for the motion counter-force that direction of linear motion of balance (X or Y) and Rz make progress and produced, be connected by small electromotor between top layer balance mass body and bottom balance mass body, in order to realize being synchronized with the movement and correction and compensating action of two balance mass bodies of top layer, this small electromotor is a straight line motor.Bottom balance mass body then is used for the motion counter-force that (Y or X) produced on the balance another one direction of linear motion.Above-mentioned double-deck balance mass system adopt three independently linear electric motors be used for realizing the effect that is connected between work-piece platform balancing quality system and basic framework, the stator of linear electric motors is installed on the basic framework, mover is installed in the work stage bottom balance mass system.Three linear electric motors are joined together to finish the initialization of work-piece platform balancing quality system and are returned zero, and under the motor pattern to the tracking compensating action of work-piece platform balancing quality system.Three linear electric motors can be to X, Y, and there is not the motion coupled problem in the independent control of Rz three degree of freedom, and system need not decoupling zero, and control strategy is simple.Yet, sideshake that these linear electric motors had and placement property, the generic linear motor does not have, and fetch long price.
Therefore, how overcoming the disappearance of above-mentioned prior art, and then make the simple in structure of balance mass orientation system, make its motion full decoupled, and be easy to formulate the tracking Control strategy, is the problem that needs to be resolved hurrily at present.
Summary of the invention
In view of the shortcoming of above-mentioned known techniques, fundamental purpose of the present invention provides a kind of balance mass orientation system, and is simple in structure, makes its motion full decoupled, and is easy to formulate the tracking Control strategy.
Another object of the present invention provides this balance mass orientation system, improves its acceleration of making big stroke motion and retarded velocity.
For reaching above-mentioned purpose, the present invention promptly provides a kind of balance mass orientation system for workpiece platform, be applied in the litho machine vibration damping to system's work stage, it comprises system framework, basic framework, silicon wafer bearing table, air-flotation system, and sports limiting device, this system framework is by this basic framework motion relatively of this air-flotation system, this sports limiting device is positioned at four corner location of this system framework and makes the extreme position of plane motion in order to draw a circle to approve this positioning system on this basic framework, wherein further comprise: X to Y to long stroke module, with realize above-mentioned silicon wafer bearing table with respect to the said system framework at X, self-movement on the Y both direction, and correction and means for preventing driftage, to finish tracking compensation control and time zero control to balance mass orientation system for workpiece platform; Wherein, this correction and means for preventing driftage comprise the slideway that connects firmly with this system framework rigidity, and the drive motor with the basic framework rigidity connects firmly with the rigidly connected crank of this drive motor rotating shaft, reaches directly and the hinged slide block of this crank.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this X to Y to long stroke module comprise Y to long stroke motor and X to long stroke motor.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this Y to long stroke motor and this X to long stroke motor further comprise Y1 to long stroke drive motor stator, Y1 to long stroke drive motor mover, X to long stroke drive motor stator, Y2 to long stroke drive motor mover, Y2 to long stroke drive motor stator, this X is installed together to the mover of two group leader's stroke motors to stator and this Y of long stroke motor.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this Y is 2 to the number of long stroke motor, this X is 1 to the number of long stroke motor.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this correction and means for preventing driftage further comprise X to Y to the torque compensation device, in order to compensation with offset the additional torque effect that the eccentric motion because of this silicon wafer bearing table brings, for above-mentioned correction and means for preventing driftage are shared the additional torque effect, thereby the acceleration that can make this silicon wafer bearing table make big stroke motion is further improved.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this X to Y to the torque compensation device comprise that the X, the Y that are installed in this system framework X, Y side respectively offsets the load support framework, and is installed in X, the Y that this X, Y offset on the load support framework to deflecting torque respectively and offsets load to deflecting torque to deflecting torque.
Above-mentioned balance mass orientation system for workpiece platform, it further comprises: this X to Y to the number of torque compensation device be 3.
In sum, balance mass orientation system for workpiece platform of the present invention has correction and means for preventing driftage, returns zero in order to the motion compensation and the initialization that realize balance mass orientation system for workpiece platform.Compared to known techniques, the present invention is simple in structure, and motion is not coupled, and the tracking Control strategy is formulated easily.In addition, introduce the motion load in the present invention, in order to compensate and to offset additional torque effect because of the eccentric motion generation of this silicon wafer bearing table, for the correction of this group and means for preventing driftage are shared the additional torque effect, thereby the acceleration that makes above-mentioned silicon wafer bearing table make big stroke motion is further improved.
Description of drawings
Fig. 1 is the front view of a kind of balance mass orientation system for workpiece platform of the present invention.
Fig. 2 is the correction of a kind of balance mass orientation system for workpiece platform of the present invention and the schematic diagram of means for preventing driftage.
Fig. 3 is a kind of correction of balance mass orientation system for workpiece platform of first preferred embodiment of the present invention and the side view of means for preventing driftage.
Fig. 4 is a kind of correction of balance mass orientation system for workpiece platform of second preferred embodiment of the present invention and the side view of means for preventing driftage.
Fig. 5 is the front view of a kind of balance mass orientation system for workpiece platform of first and second preferred embodiment of the present invention.
Embodiment
Below by particular specific embodiment explanation embodiments of the present invention, these those skilled in the art can understand other advantage of the present invention and effect easily by the content that this instructions disclosed.
In order to reduce the reacting force that the work stage motion time imposes on exposure system significantly, can adopt the mode of balance mass to reduce and offset the motion counter-force.Work-piece platform balancing quality system of the present invention belongs to individual layer balance close positioning system high in quality.Below will contrast Fig. 1 is described in detail each ingredient of balance mass orientation system for workpiece platform of the present invention.
As shown in Figure 1, this balance mass orientation system for workpiece platform comprise balance mass system framework 1, basic framework 4, X to Y to long stroke module (not marking figure number among the figure), silicon wafer bearing table 7, four 3,8,14,19, three groups of corrections of 2,9,13,20, four sports limiting devices of air-flotation system and means for preventing driftage 11,15,18.Above-mentioned X to Y to microscler become module mainly comprise 2 Y to long stroke motor and 1 X to long stroke motor, be specially: Y1 to long stroke drive motor stator 5, Y1 to long stroke drive motor mover 6, X to long stroke drive motor stator 12, Y2 to long stroke drive motor mover 16, Y2 to long stroke drive motor stator 17.
Said system framework 1 imposes on the reacting force of this stator 5,12,17 to be used for this X of balance, Y to long stroke motor.
Above-mentioned basic framework 4 has leveling capability, for said system framework 1 provides a solid and reliable workbench.The top of this basic framework 4 has a paving 10 (can be the marble raw material) in order to above-mentioned support air- flotation system 2,9,13,20 to be set.This system framework 1 is supported on this paving 10 by this support air- flotation system 2,9,13,20.This system framework 1 relative this basic framework 4 is done plane motion.
Above-mentioned long stroke module be used for the realization system X, Y to big stroke motion.Above-mentioned 2 Y need movement at the uniform velocity synchronously to realize that Y is to motion to motor movement.Above-mentioned X is installed together to these movers 6,16 of two group leader's stroke motors with above-mentioned Y to these stators 12 of long stroke motor, is connected with air-bearing between this slide block and its operation guide rail.
Above-mentioned Y is installed on the said system framework 1 to these stators 5,17 of two group leader's stroke motors.
Above-mentioned X is installed on these movers 6,16 of above-mentioned Y1, Y2 linear electric motors and realizes being rigidly connected to these stators 12 of long stroke motor, like this, above-mentioned long stroke module is only to realize that above-mentioned silicon wafer bearing table 7 is with respect to the self-movement of said system framework 1 on X, Y both direction.
Above-mentioned four groups of sports limiting devices 3,8,14,19 are installed on the above-mentioned basic framework 4, be positioned at said system framework 1 initialized four corner location, on above-mentioned basic framework 4, make the extreme position of plane motion in order to draw a circle to approve this balance mass orientation system, do not allow it to exceed the range of movement of its delineation.
The motion drift of balance mass system must be carried out corresponding compensation control, otherwise the stroke of counterbalance weight meeting overshoot and the monitoring range of laser interferometer cause system's operate as normal continuously.Shown in Fig. 1 and 2, these corrections have identical version with means for preventing driftage 11,15,18, its basic system form class is like a slider-crank mechanism, it has the slideway 111,151,181 that connects firmly with this system framework 1 rigidity, the drive motor 112,152,182 that connects firmly with basic framework 4 rigidity, with the rigidly connected crank 113,153,183 of these drive motor 112,152,182 rotating shafts, and directly and the hinged slide block 114,154,184 of this crank 113,153,183.This slide block 114,154,184 can be free to slide in this slideway 111,151,181, above-mentioned three groups of drive motor 112,152,182 are with different angular velocity (ω 112, ω 152, ω 182) collaborative work, to finish tracking compensation control and time zero control to balance mass orientation system.To lean on these three groups corrections and means for preventing driftage 11,15,18 synergy fully because of motion eccentric causes rotatablely moving of this balance mass orientation system, it could be controlled in the range of deflection that laser interferometer can operate as normal can catch.For the balance mass orientation system for workpiece platform of big quality, acceleration and retarded velocity that this silicon wafer bearing table 7 is made big stroke motion will be restricted.
As Fig. 3 and shown in Figure 5, in first preferred embodiment of the present invention, this correction and means for preventing driftage 11 or 15 or 18 have X to Y to the torque compensation device, motor support frame 25, the drive motor 26 that connects firmly with basic framework 4 rigidity, motor shaft end support case 27, interior raceway 28, raceway support frame 29, shaft end ring 30, outer raceway 31, the outer rolling ring 32 of bearing, connect to form with the rigidly connected rotary crankshaft 33 of these drive motor 26 rotating shafts, bent axle spring bearing 34, motor shaft 35, crankshaft crank rotation spring bearing 36 and fixation kit thereof.Wherein this motor bracing frame 25 is connected with this basic framework 4, and this raceway support frame 29 is connected with this system framework 1.This motor 26 drives this rotary crankshaft 33 and makes it rotation, cause that the roll sleeve on this bearing outer ring 32 rotates in this Internal and external cycle 28,31 of this raceway bracing frame 29, thus promote said system framework 1 and go up the installed device one with respect to above-mentioned basic framework 4 do X to, Y to motion.These corrections and means for preventing driftage system 11,15,18 be respectively applied for compensate this system framework 1 X to, Y to Rz to position excursion, make the formation of its not overshoot and the monitoring range of laser interferometer, make the continuous operate as normal of the present invention.Above-mentioned three groups of corrections and means for preventing driftage system 11 or 15 or 18 3 degree of freedom of motor 26 controls separately, relative motion is not coupled, and control is convenient.Rectify a deviation and means for preventing driftage 11,15,18 synergy for these three groups, can realize balance mass orientation system for workpiece platform do of the present invention plane (dx, dy, dRz) motion among a small circle.First preferred embodiment of Fig. 3 can be used separately, also can use in conjunction with Fig. 5.Among Fig. 5, this X to Y to the torque compensation device have Y to deflecting torque offset load 21, Y to deflecting torque offset load support framework 22, X to deflecting torque offset load 23, X offsets load support framework 24 to deflecting torque.This support frame 22,24 is installed in the side of X, the Y of this system framework 1 respectively, this load 21,23 is installed in this Y respectively and offsets on the load support framework 24 to deflecting torque to deflecting torque counteracting load support framework 22 and this X, in order to compensation with offset the additional torque effect that the eccentric motion because of this silicon wafer bearing table brings, for these three groups the correction and means for preventing driftage share the additional torque effect, thereby the acceleration that can make this silicon wafer bearing table make big stroke motion is further improved.
As Fig. 4 and shown in Figure 5, in second preferred embodiment of the present invention, the correction of this balance mass orientation system for workpiece platform and means for preventing driftage 11 or 15 or 18 motor are formed with aforesaid preferred embodiment basic identical, also be by this X to Y to the torque compensation device, this correction and the anti-motor support frame 25, this motor 26, this motor shaft end of floating support case 27, this rotary crankshaft 33, this bent axle spring bearing 34 and this motor shaft 35 and connect to form.Difference is that it further comprises: line slideway support frame 37, line slideway 38, bearing support block 39, end ring 40, crank throw bearing 41, slide block 42, ball 43.This motor 26 drives this rotary crankshaft 33 and makes it rotation and drive this slide block 42 motions, this slide block 42 drives rigidity and connects firmly this line slideway 38 on this system framework 1, thus promote said system framework 1 and go up the installed device one with respect to above-mentioned basic framework 4 do X to, Y to motion.Rectify a deviation and means for preventing driftage 11,15,18 synergy for these three groups, can realize balance mass orientation system for workpiece platform do of the present invention plane (dx, dy, dRz) motion among a small circle.Second preferred embodiment of Fig. 4 can be used separately, also can use in conjunction with Fig. 5.Among Fig. 5, this X to Y to the torque compensation device have Y to deflecting torque offset load 21, Y to deflecting torque offset load support framework 22, X to deflecting torque offset load 23, X offsets load support framework 24 to deflecting torque.This support frame 22,24 is installed in the side of X, the Y of this system framework 1 respectively, this load 21,23 is installed in this Y respectively and offsets on the load support framework 24 to deflecting torque to deflecting torque counteracting load support framework 22 and this X, in order to compensation with offset the additional torque effect that the eccentric motion because of this silicon wafer bearing table brings, for these three groups the correction and means for preventing driftage share the additional torque effect, thereby the acceleration that can make this silicon wafer bearing table make big stroke motion is further improved.
Balance mass orientation system for workpiece platform of the present invention has correction and means for preventing driftage, returns zero in order to the motion compensation and the initialization that realize balance mass orientation system for workpiece platform.Compared to known techniques, the present invention is simple in structure, and motion is not coupled, and the tracking Control strategy is formulated easily.In addition, introduce the motion load in the present invention, in order to compensate and to offset additional torque effect because of the eccentric motion generation of this silicon wafer bearing table, for the correction of this group and means for preventing driftage are shared the additional torque effect, thereby the acceleration that makes above-mentioned silicon wafer bearing table make big stroke motion is further improved.
The foregoing description only is illustrative principle of the present invention and effect thereof, but not is used to limit the present invention, that is the present invention in fact still can do other change.Therefore, knowing those skilled in the art all can make amendment to the foregoing description under spirit of the present invention and category.So the scope of the present invention, claim is listed as described later.
Claims (7)
1. balance mass orientation system for workpiece platform, be applied in the litho machine vibration damping to system's work stage, it comprises system framework, basic framework, silicon wafer bearing table, air-flotation system, reaches the sports limiting device, this system framework is by this basic framework motion relatively of this air-flotation system, this sports limiting device is positioned at four corner location of this system framework and makes the extreme position of plane motion in order to draw a circle to approve this positioning system on this basic framework, it is characterized in that further comprising:
X to Y to long stroke module, to realize that above-mentioned silicon wafer bearing table is with respect to the self-movement of said system framework on X, Y both direction; And
Rectify a deviation and means for preventing driftage for three groups, to finish tracking compensation control and time zero control to balance mass orientation system for workpiece platform;
Wherein, this correction and means for preventing driftage comprise the slideway that connects firmly with this system framework rigidity, the drive motor that connects firmly with the basic framework rigidity, with the rigidly connected crank of this drive motor rotating shaft, directly and the hinged slide block of this crank and X to Y to the torque compensation device.
2. balance mass orientation system for workpiece platform as claimed in claim 1 is characterized in that: this X to Y to long stroke module comprise Y to long stroke motor and X to long stroke motor.
3. balance mass orientation system for workpiece platform as claimed in claim 2, it is characterized in that: this Y to long stroke motor and this X to long stroke motor further comprise Y1 to long stroke drive motor stator, Y1 to long stroke drive motor mover, X to long stroke drive motor stator, Y2 to long stroke drive motor mover, Y2 to long stroke drive motor stator, this X is installed together to the mover of two group leader's stroke motors to stator and this Y of long stroke motor.
4. balance mass orientation system for workpiece platform as claimed in claim 2 is characterized in that: this Y is 2 to the number of long stroke motor, and this X is 1 to the number of long stroke motor.
5. balance mass orientation system for workpiece platform as claimed in claim 1, it is characterized in that: described X to Y to the torque compensation device, in order to compensation with offset the additional torque effect that the eccentric motion because of this silicon wafer bearing table brings, for above-mentioned correction and means for preventing driftage are shared the additional torque effect, thereby the acceleration that can make this silicon wafer bearing table make big stroke motion is further improved.
6. balance mass orientation system for workpiece platform as claimed in claim 5, it is characterized in that: this X to Y to the torque compensation device comprise that the X, the Y that are installed in this system framework X, Y side respectively offsets the load support framework to deflecting torque, and be installed in X, the Y that this X, Y offset on the load support framework to deflecting torque respectively and offset load to deflecting torque.
7. balance mass orientation system for workpiece platform as claimed in claim 5 is characterized in that: this X to Y to the number of torque compensation device be 3.
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| CN200710172427XA CN101206409B (en) | 2007-12-17 | 2007-12-17 | Balance mass orientation system for workpiece platform |
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| CN200710172427XA CN101206409B (en) | 2007-12-17 | 2007-12-17 | Balance mass orientation system for workpiece platform |
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| CN101206409A CN101206409A (en) | 2008-06-25 |
| CN101206409B true CN101206409B (en) | 2011-06-15 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013039389A2 (en) * | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device |
| CN103809384B (en) * | 2012-11-12 | 2016-03-09 | 上海微电子装备有限公司 | Work stage and the public balance mass system of mask platform and litho machine |
| CN103279013B (en) * | 2013-05-20 | 2014-12-10 | 浙江大学 | Three-freedom-degree precise regulating device based on ball location |
| US10031427B2 (en) * | 2015-09-30 | 2018-07-24 | Applied Materials, Inc. | Methods and apparatus for vibration damping stage |
| CN114105243B (en) * | 2022-01-24 | 2022-04-15 | 智慧猫(东营)智能科技有限公司 | Totally-enclosed internal circulation micro-positive pressure air floatation system |
| CN115001235B (en) * | 2022-08-02 | 2022-10-14 | 上海隐冠半导体技术有限公司 | Two-dimensional movement device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1111469A2 (en) * | 1999-12-21 | 2001-06-27 | Asm Lithography B.V. | Lithographic apparatus with a balanced positioning system |
| CN101075096A (en) * | 2007-06-22 | 2007-11-21 | 上海微电子装备有限公司 | System for balancing and positioning work table of photoetching device |
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2007
- 2007-12-17 CN CN200710172427XA patent/CN101206409B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1111469A2 (en) * | 1999-12-21 | 2001-06-27 | Asm Lithography B.V. | Lithographic apparatus with a balanced positioning system |
| CN101075096A (en) * | 2007-06-22 | 2007-11-21 | 上海微电子装备有限公司 | System for balancing and positioning work table of photoetching device |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Co-patentee after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Co-patentee before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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