CN102392304A - 一种铜酸镧(La2CuO4)薄膜的制备方法 - Google Patents
一种铜酸镧(La2CuO4)薄膜的制备方法 Download PDFInfo
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- CN102392304A CN102392304A CN2011103749282A CN201110374928A CN102392304A CN 102392304 A CN102392304 A CN 102392304A CN 2011103749282 A CN2011103749282 A CN 2011103749282A CN 201110374928 A CN201110374928 A CN 201110374928A CN 102392304 A CN102392304 A CN 102392304A
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- silicon substrate
- la2cuo4
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- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- 229910002282 La2CuO4 Inorganic materials 0.000 title abstract 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 23
- 239000010703 silicon Substances 0.000 claims abstract description 23
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 claims abstract description 19
- 235000006408 oxalic acid Nutrition 0.000 claims abstract description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000003756 stirring Methods 0.000 claims abstract description 13
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 7
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000010949 copper Substances 0.000 claims description 15
- 150000002500 ions Chemical class 0.000 claims description 7
- 230000004913 activation Effects 0.000 claims description 6
- 238000013019 agitation Methods 0.000 claims description 6
- 150000002978 peroxides Chemical class 0.000 claims description 6
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical group C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 6
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract 2
- 238000001035 drying Methods 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 230000003213 activating effect Effects 0.000 abstract 1
- 239000002738 chelating agent Substances 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 abstract 1
- 239000012153 distilled water Substances 0.000 abstract 1
- 238000005242 forging Methods 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 23
- 239000000463 material Substances 0.000 description 4
- 239000002887 superconductor Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical class CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000010442 halite Substances 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Inorganic Compounds Of Heavy Metals (AREA)
- Silicon Compounds (AREA)
- Chemically Coating (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
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CN 201110374928 CN102392304B (zh) | 2011-11-23 | 2011-11-23 | 一种铜酸镧(La2CuO4)薄膜的制备方法 |
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CN 201110374928 CN102392304B (zh) | 2011-11-23 | 2011-11-23 | 一种铜酸镧(La2CuO4)薄膜的制备方法 |
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CN102392304A true CN102392304A (zh) | 2012-03-28 |
CN102392304B CN102392304B (zh) | 2013-12-25 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101186328A (zh) * | 2007-12-07 | 2008-05-28 | 北京工业大学 | 单晶类钙钛矿型氧化物La2CuO4纳微米棒的制备方法 |
CN101798103A (zh) * | 2010-01-29 | 2010-08-11 | 北京工业大学 | 一种制备三维大孔结构的正交晶相La2CuO4的胶质晶模板法 |
JP2011051826A (ja) * | 2009-09-01 | 2011-03-17 | Nippon Telegr & Teleph Corp <Ntt> | 複合酸化物及びその製造方法 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101186328A (zh) * | 2007-12-07 | 2008-05-28 | 北京工业大学 | 单晶类钙钛矿型氧化物La2CuO4纳微米棒的制备方法 |
JP2011051826A (ja) * | 2009-09-01 | 2011-03-17 | Nippon Telegr & Teleph Corp <Ntt> | 複合酸化物及びその製造方法 |
CN101798103A (zh) * | 2010-01-29 | 2010-08-11 | 北京工业大学 | 一种制备三维大孔结构的正交晶相La2CuO4的胶质晶模板法 |
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Effective date of registration: 20201119 Address after: No. 8 East 226600 Avenue Hyosung Haian County town of Jiangsu city of Nantong Province Patentee after: NANTONG HAIXIN INFORMATION TECHNOLOGY Co.,Ltd. Address before: No.8, Xiaoxing Avenue, Chengdong Town, Haian County, Shenzhen City, Guangdong Province Patentee before: Shenzhen Pengbo Information Technology Co.,Ltd. Effective date of registration: 20201119 Address after: No.8, Xiaoxing Avenue, Chengdong Town, Haian County, Shenzhen City, Guangdong Province Patentee after: Shenzhen Pengbo Information Technology Co.,Ltd. Address before: 710021 Shaanxi province Xi'an Weiyang University Park No. 1 Patentee before: SHAANXI University OF SCIENCE & TECHNOLOGY |
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Effective date of registration: 20221227 Address after: 276000 west of jiangouya village, Luoxi street, high tech Zone, Linyi City, Shandong Province Patentee after: SHANDONG GEXIN PRECISION CO.,LTD. Address before: 226600 No. 8, Xiao Xing Avenue, Chengdong Town, Haian County, Nantong, Jiangsu Patentee before: NANTONG HAIXIN INFORMATION TECHNOLOGY Co.,Ltd. |
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Granted publication date: 20131225 |