CN102375349A - 显影液浓度的验证方法 - Google Patents
显影液浓度的验证方法 Download PDFInfo
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- CN102375349A CN102375349A CN2010102565944A CN201010256594A CN102375349A CN 102375349 A CN102375349 A CN 102375349A CN 2010102565944 A CN2010102565944 A CN 2010102565944A CN 201010256594 A CN201010256594 A CN 201010256594A CN 102375349 A CN102375349 A CN 102375349A
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CN2010102565944A CN102375349A (zh) | 2010-08-18 | 2010-08-18 | 显影液浓度的验证方法 |
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CN2010102565944A CN102375349A (zh) | 2010-08-18 | 2010-08-18 | 显影液浓度的验证方法 |
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CN102375349A true CN102375349A (zh) | 2012-03-14 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040236548A1 (en) * | 2003-01-21 | 2004-11-25 | Hiroko Nakamura | Computer implemented method for development profile simulation, computer program product for controlling a computer system so as to simulate development profile, and computer implemented method for mask pattern data correction |
CN1649086A (zh) * | 2004-01-29 | 2005-08-03 | 株式会社东芝 | 结构检查、图形形成、工艺条件确定及半导体器件制造方法 |
CN1664706A (zh) * | 2004-03-01 | 2005-09-07 | 西村保二 | 光阻用显影液浓度管理方法与管理装置 |
CN101308327A (zh) * | 2007-05-16 | 2008-11-19 | Jsr株式会社 | 放射线敏感性树脂组合物、层间绝缘膜和微透镜以及它们的形成方法 |
CN101634816A (zh) * | 2008-07-24 | 2010-01-27 | 北京京东方光电科技有限公司 | 显影液控制系统 |
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- 2010-08-18 CN CN2010102565944A patent/CN102375349A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040236548A1 (en) * | 2003-01-21 | 2004-11-25 | Hiroko Nakamura | Computer implemented method for development profile simulation, computer program product for controlling a computer system so as to simulate development profile, and computer implemented method for mask pattern data correction |
CN1649086A (zh) * | 2004-01-29 | 2005-08-03 | 株式会社东芝 | 结构检查、图形形成、工艺条件确定及半导体器件制造方法 |
CN1664706A (zh) * | 2004-03-01 | 2005-09-07 | 西村保二 | 光阻用显影液浓度管理方法与管理装置 |
CN101308327A (zh) * | 2007-05-16 | 2008-11-19 | Jsr株式会社 | 放射线敏感性树脂组合物、层间绝缘膜和微透镜以及它们的形成方法 |
CN101634816A (zh) * | 2008-07-24 | 2010-01-27 | 北京京东方光电科技有限公司 | 显影液控制系统 |
Non-Patent Citations (1)
Title |
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张洪波等: "Shipley光刻胶性能研究", 《徐州建筑职业技术学院学报》 * |
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