CN102345095A - 涂层、具有该涂层的被覆件及该被覆件的制备方法 - Google Patents
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- 238000000576 coating method Methods 0.000 title claims abstract description 46
- 239000011248 coating agent Substances 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 239000011159 matrix material Substances 0.000 claims abstract description 39
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- XTYUEDCPRIMJNG-UHFFFAOYSA-N copper zirconium Chemical compound [Cu].[Zr] XTYUEDCPRIMJNG-UHFFFAOYSA-N 0.000 claims description 9
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 229910052786 argon Inorganic materials 0.000 claims description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 5
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 5
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 description 10
- 239000010949 copper Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002114 nanocomposite Substances 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910026551 ZrC Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 235000019628 coolness Nutrition 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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Abstract
本发明提供一种涂层，该涂层包括一ZrCuCN沉积层。该涂层具有高硬度、良好的韧性及耐磨性。本发明还提供一种具有上述涂层的被覆件。该被覆件包括一基体、形成于该基体的一ZrCu结合层及形成于该ZrCu结合层上的一所述涂层。另外，本发明还提供了上述被覆件的制备方法。
Description
技术领域
本发明涉及一种涂层、具有该涂层的被覆件及该被覆件的制备方法，特别涉及一种以真空镀膜的方式形成的涂层、具有该涂层的被覆件及该被覆件的制备方法。
背景技术
真空镀膜工艺在工业领域有着广泛的应用，其中，TiN薄膜镀覆在刀具或模具表面能大幅提高刀具和模具的使用寿命。然而，随着金属切削加工朝高切削速度、高进给速度、高可靠性、长寿命、高精度和良好的切削控制性方面发展，对表面涂层的性能提出了更高的要求。传统的TiN涂层在硬度、韧性等方面已经不能满足要求。
ZrN薄膜由于其硬度与韧性均优于TiN薄膜而受到人们的广泛关注。但单一的ZrN薄膜在硬度、韧性及耐磨性等方面几乎已经没有提高的空间，很难满足现代工业的需求。
中国专利CN100480043C中提到在金属、硬质合金或陶瓷的基体上沉积ZrN/Al2(O1-xNX)3纳米复合涂层，这种纳米复合涂层的硬度超过30GPa，但其耐磨性并没有提高。
发明内容
有鉴于此，有必要提供一种具有高硬度、良好的韧性及耐磨性的涂层。
另外，还有必要提供一种应用上述涂层的被覆件。
另外，还有必要提供一种上述被覆件的制备方法。
一种涂层，包括一沉积层，该沉积层为一ZrCuCN层。
一种被覆件，包括一基体、形成于该基体的一结合层及形成于该结合层上的一涂层。该涂层包括一沉积层，该结合层为一ZrCu层，该沉积层为一ZrCuCN层。
一种被覆件的制备方法，包括以下步骤：
提供一基体；
将该基体放入一镀膜机的真空室内，使用锆铜合金靶，设置氩气流量为100～300sccm，对基体施加-100～-300V的偏压，通过磁控溅射镀膜方法在该基体上形成一结合层，该结合层为一ZrCu层；
通入流量为10～200sccm的氮气及流量为10～100sccm乙炔气体，加热真空室温度至100～200℃，于该结合层上形成一沉积层，该沉积层为一ZrCuCN层。
相较于现有技术，本发明在形成ZrCuCN沉积层时，N原子优先与Zr原子形成ZrN晶粒，Cu原子则以独立形式偏聚在晶界上形成Cu相，其可抑制ZrN晶粒的长大，因而使得沉积层中的ZrN晶粒的粒径维持在纳米级，该纳米级的ZrN晶粒可有效提高所述涂层的硬度和韧性。所述涂层的硬度及韧性的提高，可在一定程度上提高所述涂层的耐磨性。
附图说明
图1为本发明一较佳实施例的涂层的剖视图；
图2为本发明一较佳实施例的被覆件的剖视图；
图3为本发明一较佳实施例的被覆件的制备方法的流程图。
主要元件符号说明
基体 10
结合层 20
涂层 30
沉积层 31
颜色层 33
被覆件 40
具体实施方式
请参阅图1，本发明一较佳实施例的涂层30包括一沉积层31。该沉积层31为一氮碳化锆铜(ZrCuCN)层，其厚度为1～3μm，优选为2μm。该沉积层31通过磁控溅射法形成。
可以理解的，在该沉积层31的表面还可镀覆一颜色层33，以增强该涂层30的美观性。
请参阅图2，本发明一较佳实施例的被覆件40包括一基体10、形成于该基体10的一结合层20及形成于该结合层20上的所述涂层30。该基体10的材质可以为高速钢、硬质合金及不锈钢等。该被覆件40可以为各类切削刀具、精密量具及模具等。
该结合层20为一锆铜(ZrCu)层，其厚度为0.05～0.2μm，优选为0.1μm。该结合层20通过磁控溅射法沉积形成。该结合层20的化学稳定性与热膨胀系数介于基体10与沉积层31之间，因而可有效提高涂层30与基体10之间的结合力。
请进一步参见图3，该被覆件40的制备方法主要包括如下步骤：
S1：提供一基体10。
所述基体10的材质可以为高速钢、硬质合金、金属陶瓷及烧结金刚石等。
S2：对该基体10进行前处理。
将基体10放入盛装有乙醇及/或丙酮溶液的超声波清洗器中进行震动清洗，以除去基体10表面的杂质和油污等。清洗完毕后烘干备用。
对经上述处理后的基体10的表面进行氩气等离子体清洗，进一步去除基体10表面的油污，以改善基体10表面与后续涂层的结合力。该等离子体清洗的具体操作及工艺参数可为：将基体10放入一磁控溅射镀膜机的真空室内，抽真空至真空度为8.0×10-3Pa，以300～600sccm(标准状态毫升/分钟)的流量向真空室中通入纯度为99.999％的氩气，施加-300～-800V的偏压于基体10，对基体10表面进行等离子体轰击，轰击时间为3～10min。
S3：于该基体10上形成一结合层20。该结合层20为一ZrCu层。
在对基体10进行等离子体清洗后，调节氩气流量至100～300sccm，优选为150sccm；调节偏压至-100～-300V，开启锆铜合金靶的电源，并设置锆铜合金靶的功率为7～11kw，优选为10kw，沉积结合层20。沉积该结合层20的时间为5～20min，优选10min。其中，所述锆铜合金靶中Zr的质量百分含量为30～70％。
S4：于该结合层20上形成一沉积层31。该沉积层31为一ZrCuCN层。
形成所述结合层20后，向真空室中通入流量为10～200sccm、纯度为99.999％的氮气及流量为10～100sccm、纯度为99.8％的乙炔气体，调节真空室温度至100～200℃，沉积沉积层31。沉积该沉积层31的时间为30～180min，优选为60min。
关闭负偏压及锆铜合金靶电流，停止通入氩气、氮气及乙炔气体，待所述结合层20冷却后，向真空室内通入空气，打开真空室门，取出镀覆有结合层20及沉积层31的基体10。
可以理解的，制备所述被覆件40的方法还可包括在该沉积层31的表面镀覆一颜色层33，以增强被覆件40的美观性。
本发明在形成沉积层31时，选择锆铜合金作为靶材，以氮气及乙炔气体作为反应性气体，由于Cu与Zr不能形成固溶体，且Cu不易与氮气反应，沉积过程中氮气中的N原子优先与Zr原子形成ZrN晶粒，Cu原子则以独立形式偏聚在晶界上形成Cu相，其可抑制ZrN晶粒的长大，因而使得沉积层31中的ZrN晶粒的粒径维持在纳米级，该纳米级的ZrN晶粒可显著地提高所述涂层30的硬度和韧性。
所述的被覆件40在基体10与沉积层31之间设置一ZrCu结合层20，由于该结合层20的化学稳定性与热膨胀系数介于基体10与沉积层31之间，因而可有效提高涂层30与基体10之间的结合力。所述涂层30的硬度、韧性的提高及涂层30与基体10之间结合力的增强，可在一定程度上提高所述涂层30的耐磨性。
Claims (10)
1.一种涂层，包括一沉积层，其特征在于：该沉积层为一ZrCuCN层。
2.如权利要求1所述的涂层，其特征在于：该沉积层的厚度为1～3μm。
3.如权利要求1所述的涂层，其特征在于：该涂层还包括一形成于该沉积层上的颜色层。
4.一种被覆件，包括一基体、形成于该基体的一结合层及形成于该结合层上的一涂层，该涂层包括一沉积层，其特征在于：该结合层为一ZrCu层，该沉积层为一ZrCuCN层。
5.如权利要求4所述的被覆件，其特征在于：该结合层的厚度为0.05～0.2μm。
6.如权利要求4所述的被覆件，其特征在于：该沉积层的厚度为1～3μm。
7.一种被覆件的制备方法，包括以下步骤：
提供一基体；
将该基体放入一镀膜机的真空室内，使用锆铜合金靶，设置氩气流量为100～300sccm，对基体施加-100～-300V的偏压，通过磁控溅射镀膜方法在该基体上形成一结合层，该结合层为一ZrCu层；
通入流量为10～200sccm的氮气及流量为10～100sccm乙炔气体，加热真空室温度至100～200℃，于该结合层上形成一沉积层，该沉积层为一ZrCuCN层。
8.如权利要求7所述的被覆件的制备方法，其特征在于：该结合层的沉积时间为5～20min。
9.如权利要求7所述的被覆件的制备方法，其特征在于：该锆铜合金靶中Zr的质量百分含量为30～70％。
10.如权利要求7所述的被覆件的制备方法，其特征在于：该沉积层的沉积时间为30～180min。
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| CN2010102447365A CN102345095A (zh) | 2010-08-04 | 2010-08-04 | 涂层、具有该涂层的被覆件及该被覆件的制备方法 |
| US13/007,707 US8541100B2 (en) | 2010-08-04 | 2011-01-17 | Coating, article coated with coating, and method for manufacturing article |
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| CN114293188A (zh) * | 2021-12-30 | 2022-04-08 | 中国重汽集团济南动力有限公司 | 一种多元涂层减振结构刀垫及其制备方法 |
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| CN101186992A (zh) * | 2006-11-16 | 2008-05-28 | 有限会社结城高周波 | 渗氮淬火制品及其制造方法 |
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| CN101186992A (zh) * | 2006-11-16 | 2008-05-28 | 有限会社结城高周波 | 渗氮淬火制品及其制造方法 |
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| JING QIN,ET AL: "Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu", 《CHIN.PHYS.LETT》, vol. 26, no. 8, 31 December 2009 (2009-12-31) * |
| P. ZEMAN,ET AL: "Structure and properties of hard and superhard Zr–Cu–N nanocomposite coatings", 《MATERIALS SCIENCE AND ENGINEERING》, vol. 289, 31 December 2000 (2000-12-31), pages 189 - 197 * |
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| CN114293188A (zh) * | 2021-12-30 | 2022-04-08 | 中国重汽集团济南动力有限公司 | 一种多元涂层减振结构刀垫及其制备方法 |
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| US8541100B2 (en) | 2013-09-24 |
| US20120034489A1 (en) | 2012-02-09 |
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