CN102338692A - Device and method for measuring static extinction ratio - Google Patents
Device and method for measuring static extinction ratio Download PDFInfo
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- CN102338692A CN102338692A CN2010102285286A CN201010228528A CN102338692A CN 102338692 A CN102338692 A CN 102338692A CN 2010102285286 A CN2010102285286 A CN 2010102285286A CN 201010228528 A CN201010228528 A CN 201010228528A CN 102338692 A CN102338692 A CN 102338692A
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Abstract
The invention discloses a method and a device for measuring a static extinction ratio. The method comprises the following steps of: providing a laser, a polarizer, a polarization analyzer and a photoelectric sensing device which are arranged along an optical path; before mounting an optical element to be measured, rotating the polarization analyzer and measuring to obtain the minimum power value P0; mounting the optical element to be measured between the polarizer and the polarization analyzer, rotating the polarization analyzer and obtaining the maximum power value Pmax and the minimum power value Pmin by the photoelectric sensing device; and calculating the extinction ratio Ex of the optical element to be measured according to the Pmax and the Pmin. The method and the device for measuring the static extinction ratio, which are disclosed by the invention, have simple operation of measuring the static extinction ratio and high measuring accuracy.
Description
Technical field
The present invention relates to a kind of measuring method of measuring the optical element optical parameter measurement device and adopting this measurement mechanism measure static extinction ratio of being used to, particularly relate to a kind of static quenching ratio measuring method and be applicable to that the static quenching of this method compares measurement mechanism.
Background technology
The extinction ratio of optical mirror slip, crystal is to weigh the important parameter of its optical property, has reflected the defective that its inside possibly exist, like internal stress, optical heterogeneity etc.Its extinction ratio is exactly to weigh an important parameter of optical heterogeneity.
Regulation adopts: Pmax is illustrated in the highest luminous power of ellipse Gaussian beam long axis direction in the plane of vertical optical axis, and Pmin is illustrated in the minimum luminous power of ellipse Gaussian beam long axis direction in the plane of vertical optical axis.Then extinction ratio is defined as:
EX＝10lg(Pmax/Pmin) (1)
The unit of extinction ratio is: dB.
The test of extinction ratio has very important practical value in practical application.The accuracy that crystal extinction ratio is measured directly influences development, production and the application of crystal.
For the measuring method of optical element extinction ratio, only have some manufacturers that a capability and strength are arranged to carry out at present, or ready-made extinction ratio tester is measured on the purchase market, limitation is very big.Concerning the user of these optical elements, the reliability of its parameter can't effectively be verified, and it is relatively more expensive to buy the surveying instrument price, and cost pressure is too big.
In addition, the measuring method step of present electro-optic crystal material extinction ratio is following:
Step 1 a: laser instrument, the polarizer, crystal to be measured, an analyzer and an optoelectronic sensor of being provided with along light path are provided;
Step 2: rotate analyzer, make the polarization direction of the polarizer and analyzer vertical;
Step 3: rotate crystal to be measured, make optoelectronic sensor detect power maximal value P
⊥ max
Step 4: rotate analyzer, make the polarization direction of the polarizer and analyzer parallel;
Step 5: rotate crystal to be measured, make optoelectronic sensor detect power maximal value P
//max
Step 6: calculate extinction ratio EX, EX=10lg (P
//max/ P
⊥ max).
Said method needs the rotation optical element 4 times, and operation steps is very complicated.And said method both need rotate analyzer also need rotate crystal to be measured, makes the optical element of rotation too much, causes measuring accuracy to reduce.
Summary of the invention
In order to solve the problem that prior art extinction ratio measurement method step is complicated, measuring accuracy is lower, the present invention provides that a kind of step is simple, the higher static quenching ratio measuring method of measuring accuracy.
Simultaneously, also provide a kind of static quenching to compare measurement mechanism.
A kind of static quenching ratio measuring method, it comprises the steps: to provide a laser instrument, a polarizer, an analyzer and optoelectronic sensor that is provided with along light path; Install before the optical element to be measured, rotate said analyzer, record power minimum P0; Optical element to be measured is installed between the said polarizer and the analyzer, rotates said analyzer, find out power maximal value Pmax, power minimum Pmin through said optoelectronic sensor; Calculate the extinction ratio Ex of said optical element to be measured according to said Pmax and Pmin.
In one embodiment, said method is used to measure the electro-optic crystal material.
In one embodiment, calculate the static quenching ratio according to equation EX=10lg (Pmax/Pmin).
A kind of static quenching is than measurement mechanism, and it comprises that a laser instrument, polarizer, one are used to install the frock of optical element to be measured, an analyzer, an optoelectronic sensor, and said analyzer can rotate around optical axis independently.
In one embodiment, said static quenching also comprises a guide rail with a plurality of sliding seats than measurement mechanism, and at least one in said laser instrument, the polarizer, frock, analyzer, the optoelectronic sensor is arranged on the said sliding seat.
In one embodiment, said static quenching also comprises a beam expanding lens and a beam-shrinked mirror than measurement mechanism, and said laser instrument, the polarizer, beam expanding lens, frock, beam-shrinked mirror, analyzer, optoelectronic sensor are provided with along light path in regular turn.
In one embodiment, said static quenching also comprises the diaphragm of an adjustable bore than measurement mechanism, and it is arranged between said beam expanding lens and the frock.
In one embodiment, said static quenching also comprises an attenuator than measurement mechanism, and it is arranged between the said laser instrument and the polarizer.
Static quenching ratio measuring method of the present invention and static quenching only need rotate in the analyzer than measurement mechanism just can accomplish measurement, so this method is simple, convenient, and measuring accuracy is higher.
In addition, static quenching of the present invention owing to adopted beam expanding lens and beam-shrinked mirror, therefore can reduce the angle of divergence, and little dispersing (emission angle) can make Gaussian beam focus on better than measurement mechanism, makes that therefore measurement is more accurate.
In addition; Static quenching of the present invention than measurement mechanism owing to adopted above-mentioned guide rail, frock and sliding seat structure; Make it go for the measurement of multiple different optical element; Therefore measurement mechanism of the present invention has guaranteed also that in the while simple in structure, easy to operate, lower-cost it has wide range of applications, limitation is lower.
Description of drawings
Fig. 1 is the structural representation of optical parameter measurement device of the present invention.
Fig. 2 is a process flow diagram of measuring the measuring method of polaroid static quenching ratio.
Fig. 3 is a process flow diagram of measuring the measuring method of electro-optic crystal material static extinction ratio.
Embodiment
Introduce a preferred embodiments of optical parameter measurement device of the present invention below.
Please with reference to Fig. 1, Fig. 1 is the structural representation of measurement mechanism of the present invention.Measurement mechanism 1 comprises that the diaphragm 15, one of a laser instrument 11, attenuator 12, polarizer 13, beam expanding lens 14, an adjustable bore are used to install the frock 16 of optical element to be measured, beam-shrinked mirror 17, analyzer 18, an optoelectronic sensor 19 and a guide rail 10.Guide rail 10 comprises a plurality of sliding seats 101 that can slide along guide rail 10.Optical element 20 to be measured is installed on the frock 16.Laser instrument 11, attenuator 12, the polarizer 13, beam expanding lens 14, diaphragm 15, frock 16, beam-shrinked mirror 17, analyzer 18 and optoelectronic sensor 19 are installed on the sliding seat 101 in regular turn, and make the maintenance that they are as well as possible and the right alignment of light path.Wherein, Laser instrument 11, attenuator 12, the polarizer 13, beam expanding lens 14, diaphragm 15, beam-shrinked mirror 17 and optoelectronic sensor 19 can be fixedly mounted on the sliding seat 101; And frock 16 need be rotatably installed on the sliding seat 101 with analyzer 18, makes optical element 20 to be measured can rotate around optical axis with analyzer 18.Optoelectronic sensor 19 is a power meter.
As one for example; When utilizing measurement mechanism 1 tests polarization sheet extinction ratio; Frock 16 itself includes a rotation mirror holder and a Brewster angle inclined-plane; Polaroid to be measured can guarantee that after placing on this Brewster angle inclined-plane its geometric center, rotation mirror holder center all drop on the light path, and can let polaroid to be measured rotate around optical axis through this rotation mirror holder.
Give an example as another; When utilizing the extinction ratio of measurement mechanism 1 test 1/2 wave plate, PBS crystal or electro-optic crystal material; Frock 16 itself includes a rotation mirror holder; The geometric center of 1/2 wave plate to be measured, PBS crystal or electro-optic crystal material, rotation mirror holder center are all dropped on the light path, and can be let 1/2 wave plate to be measured, PBS crystal or electro-optic crystal material rotate around optical axis through this rotation mirror holder.
In other embodiment, beam-shrinked mirror 17 can be a reverse beam expanding lens of placing.Optoelectronic sensor 19 can also be selected from photodiode, photomultiplier etc.
In other embodiment, diaphragm 15 can also be arranged between the attenuator 12 and the polarizer 13, can also be between the attenuator 12 and the polarizer 13, and a diaphragm 15 is set respectively between beam expanding lens 14 and the frock 16 simultaneously.
Introduce the measuring method that adopts measurement mechanism of the present invention to measure optical element static quenching ratio below.
Embodiment one: measure polaroid static quenching ratio
Please see figures.1.and.2 in the lump, Fig. 2 is a process flow diagram of measuring the measuring method of polaroid static quenching ratio.
Step S1: preparation process;
Step S2: measuring process;
On frock 16, put into polaroid to be measured, slowly rotate polaroid to be measured, find out the power maximal value, note peak power average value P max through optoelectronic sensor 19; Continue half-twist again, find power minimum, note minimum power average value P min.
Step S3: calculation procedure;
The value of Pmax and Pmin for people's formula (1), can be drawn the extinction ratio Ex of tested polaroid.
Embodiment two, measurement 1/2 wave plate static quenching ratio
Because when 1/2 wave plate principal direction and linearly polarized light angle were 45 °, linearly polarized light changeed 90 ° through this wave plate after vibration direction; And 1/2 wave plate principal direction and linearly polarized light angle be when being 0 °, and linearly polarized light is constant through this wave plate after vibration direction, and method is basic identical with the method for measuring polaroid when therefore measuring 1/2 wave plate, and difference only is that the anglec of rotation is different among the step S3.Concrete grammar is following:
Step S1 ': preparation process;
Step S2 ': measuring process;
On frock 16, put into 1/2 wave plate to be measured, slowly rotate 1/2 wave plate to be measured, find out the power maximal value, note peak power average value P max through optoelectronic sensor 19; Continue to rotate 45 ° again, find power minimum, note minimum power average value P min.
Step S3 ': calculation procedure;
The value of Pmax and Pmin for people's formula (1), can be drawn the extinction ratio Ex of 1/2 wave plate to be measured.
Embodiment three, measurement PBS crystal static quenching ratio
Method during test PBS crystal extinction ratio is basic identical with the method for measuring the PBS crystal, and difference is that PBS crystal half-twist to be measured just can record extinction ratio among the step S3 '.Concrete grammar is following:
Step S1 ": preparation process;
Step S2 ": measuring process;
On frock 16, put into PBS crystal to be measured, slowly rotate PBS crystal to be measured, find out the power maximal value, note peak power average value P max through optoelectronic sensor 19; Continue half-twist again, find power minimum, note minimum power average value P min.
Step S3 ": calculation procedure;
The value of Pmax and Pmin for people's formula (1), can be drawn the extinction ratio Ex of PBS crystal to be measured.
Embodiment four, measurement electro-optic crystal material static extinction ratio
Please in the lump with reference to Fig. 1 and Fig. 3, Fig. 3 is a process flow diagram of measuring the measuring method of electro-optic crystal material static extinction ratio.
Step S11: preparation process;
Step S12: measuring process;
After putting into electro-optic crystal to be measured on to be measured the frock 16, make light vertically pass electro-optic crystal to be measured center, analyzer 18 is changeed in rotation, records power maximal value Pmax and minimum value Pmin respectively.
Step S13: calculation procedure;
The value of Pmax and Pmin for people's formula (1), can be drawn the brilliant extinction ratio Ex of electric light to be measured.
When being used for embodiment four, measurement electro-optic crystal material static extinction ratio; Owing to only need rotate analyzer 18; Therefore measurement mechanism 1 also can be designed to only make analyzer 18 to rotate around optical axis, and other optical elements are fixedly mounted on the sliding seat 101.More like this optical elements are installed with the fixed installation mode and are then helped improving measuring accuracy.
For the optical element (like prism, magneto optic isolator etc.) of other types, only need to be measured frock 16 suitably improved (like placement direction, method of clamping etc.), also can be positioned over this open platform and measure.
For the optical parametric of other optical elements (like the dynamic transmitance of electro-optic crystal, dynamic extinction ratio etc.),, carry out after all can suitably improving the light path of measurement mechanism 1 as long as be adapted on the principle measuring in the measurement mechanism 1 shown in Figure 1.
Static quenching ratio measuring method of the present invention and static quenching only need rotate in the analyzer than measurement mechanism just can accomplish measurement, so this method is simple, convenient, and measuring accuracy is higher.
In addition, static quenching of the present invention owing to adopted beam expanding lens and beam-shrinked mirror, therefore can reduce the angle of divergence, and little dispersing (emission angle) can make Gaussian beam focus on better than measurement mechanism, makes that therefore measurement is more accurate.
In addition; Static quenching ratio measuring method of the present invention and static quenching than measurement mechanism owing to adopted above-mentioned guide rail, frock and sliding seat structure; Make it go for the measurement of multiple different optical element; Therefore measurement mechanism of the present invention has guaranteed also that in the while simple in structure, easy to operate, lower-cost it has wide range of applications, limitation is lower.
Above-mentioned embodiment has been described in realization in order to demonstrate the invention.But other variations of the present invention and modification are conspicuous to those skilled in the art, and any modification/variation in disclosed essence of the present invention and cardinal rule scope perhaps imitates conversion all to belong to claim protection domain of the present invention.
Claims (8)
1. static quenching ratio measuring method, it comprises the steps:
A laser instrument, a polarizer, an analyzer and an optoelectronic sensor of being provided with along light path are provided;
Install before the optical element to be measured, rotate said analyzer, record power minimum P
0
Optical element to be measured is installed between the said polarizer and the analyzer, rotates said analyzer, find out power maximal value Pmax, power minimum Pmin through said optoelectronic sensor;
Calculate the extinction ratio Ex of said optical element to be measured according to said Pmax and Pmin.
2. static quenching ratio measuring method according to claim 1 is characterized in that said method is used to measure the electro-optic crystal material.
3. static quenching ratio measuring method according to claim 1 is characterized in that, calculates the static quenching ratio according to equation EX=10lg (Pmax/Pmin).
4. a static quenching is than measurement mechanism, and it comprises that a laser instrument, polarizer, one are used to install the frock of optical element to be measured, an analyzer, an optoelectronic sensor, is characterized in that said analyzer can rotate around optical axis independently.
5. static quenching according to claim 4 compares measurement mechanism; It is characterized in that; Said static quenching also comprises a guide rail with a plurality of sliding seats than measurement mechanism, and at least one in said laser instrument, the polarizer, frock, analyzer, the optoelectronic sensor is arranged on the said sliding seat.
6. static quenching according to claim 4 compares measurement mechanism; It is characterized in that; Said static quenching also comprises a beam expanding lens and a beam-shrinked mirror than measurement mechanism, and said laser instrument, the polarizer, beam expanding lens, frock, beam-shrinked mirror, analyzer, optoelectronic sensor are provided with along light path in regular turn.
7. static quenching according to claim 6 is characterized in that than measurement mechanism, and said static quenching also comprises the diaphragm of an adjustable bore than measurement mechanism, and it is arranged between said beam expanding lens and the frock.
8. static quenching according to claim 6 is characterized in that than measurement mechanism said static quenching also comprises an attenuator than measurement mechanism, and it is arranged between the said laser instrument and the polarizer.
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|---|---|---|---|
| CN2010102285286A CN102338692A (en) | 2010-07-16 | 2010-07-16 | Device and method for measuring static extinction ratio |
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|---|---|---|---|
| CN2010102285286A CN102338692A (en) | 2010-07-16 | 2010-07-16 | Device and method for measuring static extinction ratio |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102594448A (en) * | 2012-02-13 | 2012-07-18 | 成都优博创技术有限公司 | Extinction ratio measurement device |
| CN102954869A (en) * | 2012-07-04 | 2013-03-06 | 中国电子科技集团公司第四十一研究所 | High extinction ratio calibrating device and high extinction ratio calibrating method of polarization-maintaining optical fiber |
| CN103293606A (en) * | 2013-05-13 | 2013-09-11 | 光库通讯(珠海)有限公司 | Fiber adapter and measurement method for extinction ratio of optical fiber connector |
| CN110849484A (en) * | 2019-10-28 | 2020-02-28 | 西北工业大学 | Extinction ratio testing device and method for infrared polarization camera with split-focus plane |
| CN113340563A (en) * | 2020-10-21 | 2021-09-03 | 南京牧镭激光科技有限公司 | Method for testing dynamic extinction ratio of acousto-optic modulator |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06317498A (en) * | 1993-05-07 | 1994-11-15 | Nec Corp | Extinction ratio measuring method in assembling process of polarization maintaining fiber and semiconductor laser |
| JP2000131193A (en) * | 1998-10-23 | 2000-05-12 | Nec Corp | Device for measuring extinction ratio of light module |
| CN1389720A (en) * | 2002-07-12 | 2003-01-08 | 山东大学 | Measuring device and method for half-wave voltage and optical uniformity of electro-optical crystal material |
| JP2003083843A (en) * | 2001-09-10 | 2003-03-19 | Ando Electric Co Ltd | Extinction ratio measuring device |
-
2010
- 2010-07-16 CN CN2010102285286A patent/CN102338692A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06317498A (en) * | 1993-05-07 | 1994-11-15 | Nec Corp | Extinction ratio measuring method in assembling process of polarization maintaining fiber and semiconductor laser |
| JP2000131193A (en) * | 1998-10-23 | 2000-05-12 | Nec Corp | Device for measuring extinction ratio of light module |
| JP2003083843A (en) * | 2001-09-10 | 2003-03-19 | Ando Electric Co Ltd | Extinction ratio measuring device |
| CN1389720A (en) * | 2002-07-12 | 2003-01-08 | 山东大学 | Measuring device and method for half-wave voltage and optical uniformity of electro-optical crystal material |
Non-Patent Citations (1)
| Title |
|---|
| 张芹芹等: "激光晶体消光比测量仪的一种低成本、小型化设计", 《光学技术》 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102594448A (en) * | 2012-02-13 | 2012-07-18 | 成都优博创技术有限公司 | Extinction ratio measurement device |
| CN102594448B (en) * | 2012-02-13 | 2014-10-01 | 成都优博创技术有限公司 | Extinction ratio measurement device |
| CN102954869A (en) * | 2012-07-04 | 2013-03-06 | 中国电子科技集团公司第四十一研究所 | High extinction ratio calibrating device and high extinction ratio calibrating method of polarization-maintaining optical fiber |
| CN102954869B (en) * | 2012-07-04 | 2016-01-06 | 中国电子科技集团公司第四十一研究所 | A kind of polarization maintaining optical fibre High Extinction Ratio calibrating installation and calibration steps thereof |
| CN103293606A (en) * | 2013-05-13 | 2013-09-11 | 光库通讯(珠海)有限公司 | Fiber adapter and measurement method for extinction ratio of optical fiber connector |
| CN103293606B (en) * | 2013-05-13 | 2015-06-03 | 光库通讯(珠海)有限公司 | Fiber adapter and measurement method for extinction ratio of optical fiber connector |
| CN110849484A (en) * | 2019-10-28 | 2020-02-28 | 西北工业大学 | Extinction ratio testing device and method for infrared polarization camera with split-focus plane |
| CN110849484B (en) * | 2019-10-28 | 2021-03-26 | 西北工业大学 | Extinction ratio testing device and method for infrared polarization camera with split-focus plane |
| CN113340563A (en) * | 2020-10-21 | 2021-09-03 | 南京牧镭激光科技有限公司 | Method for testing dynamic extinction ratio of acousto-optic modulator |
| CN113340563B (en) * | 2020-10-21 | 2024-04-02 | 南京牧镭激光科技股份有限公司 | Test method for dynamic extinction ratio of acousto-optic modulator |
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Application publication date: 20120201 |