CN102314023A - Liquid crystal is with alignment films exposure method and device thereof - Google Patents
Liquid crystal is with alignment films exposure method and device thereof Download PDFInfo
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- CN102314023A CN102314023A CN2011101937164A CN201110193716A CN102314023A CN 102314023 A CN102314023 A CN 102314023A CN 2011101937164 A CN2011101937164 A CN 2011101937164A CN 201110193716 A CN201110193716 A CN 201110193716A CN 102314023 A CN102314023 A CN 102314023A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
A kind of liquid crystal is with alignment films exposure method and device thereof.When the linear light pattern that the alignment films of crystal liquid substrate is shone fine pitches and the scanning direction in edge; Alignment films is given and the corresponding same orientation characteristic in this direction of scanning; But to see through in the mode that mask irradiates light pattern makes public the time shutter long existing, and bottleneck is arranged in practicality.Among the present invention; Has the micro mirror element of small movable minute surfaces in a large number to giving the polarized light characteristic from the exposure light of light emitted and it being incided; Project to the pattern of the exposure light of the reflection graphic patterns that forms through small movable minute surface reflection to carry through projection optical system and put on the substrate that forms alignment films from the teeth outwards on the microscope carrier by micro mirror element; The liquid crystal that alignment films is made public is with in the alignment films exposure method; On the substrate that moves continuously in one direction through microscope carrier is moved in one direction continuously, the pattern of exposure moves with the speed slower than the translational speed of microscope carrier alignment films is made public.
Description
Technical field
The present invention relates to the manufacturing approach of liquid crystal display cells, particularly be used for through optical means to liquid crystal orientation film give the orientation characteristic liquid crystal with alignment films exposure method and device thereof.
Background technology
Liquid crystal display cells for more high-quality demonstration more information, requires high image qualityization, high definitionization as the display of large-scale tv machine, 3D televisor, personal computer or portable terminal.
Be high image qualityization, the high definitionization that realizes this liquid crystal display cells, need make the arrangement (orientation) of the molecule of the liquid crystal material between the glass substrate that is sealed in the pair of opposed that constitutes liquid crystal display cells go up homogeneous at the optically transparent electrode (transparency electrode) that is formed on the glass substrate.
Arrangement (orientation) homogeneous for the molecule that makes this liquid crystal material used in the past on the transparency electrode that is formed on the glass substrate and formed alignment films, and ground the method that (rubbing) this alignment films is given the orientation characteristic with cloth.But; In the method, the part of alignment films comes off and produces small dust, becomes the bad reason of element; Perhaps be difficult to give the orientation characteristic of homogeneous, forming existing problems aspect the display element of high definition more across the whole viewing area of glass substrate.
The method of alignment films orientation characteristic is given in replacement through this Ginding process; For example " Kimura is row, the positive first-class people of Tanaka just: the new light orientation process that is used on optical alignment film, causing stable tilt angle: JSR TECHINICAL REVIEW No.111/2004 "; Proposed the alignment films irradiates light, given the light Ginding process of orientation characteristic through the noncontact mode.It is from vertical direction polymkeric substance (polymer) film as aligning film material to be shone a plurality of linear light with the spacing formation of 14 μ m; Move irradiation area simultaneously in one direction continuously, thus the surface of polymer film is given the method for liquid crystal aligning ability.Having put down in writing the orientation characteristic changes according to the direction of scanning of the light of irradiation.In addition, in TOHKEMY 2004-145141 communique, also put down in writing same light Ginding process.
In addition; In japanese kokai publication hei 11-352486 communique, put down in writing following technology: in order to seek the visual angle expansion of liquid crystal indicator, the raising of display quality and the raising of contrast; On each of opposed two pieces of glass substrates, to form two kinds of different orientation area of pre-tilt direction; Make the mode of the border quadrature of the mutual orientation area two pieces of glass substrates of fitting, obtain tetrameric state of orientation thus.In addition,, put down in writing in shielding and do not given under the state in the zone that is orientated characteristic, carried out the method for orientation process through a certain method in polishing, ion beam irradiation method, the rayed method as the method for the orientation process that is directed against alignment films.
" Kimura just the row, the positive first-class people of Tanaka: the new light orientation process that is used for causing on the optical alignment film stable tilt angle: JSR TECHINICAL REVIEW No.111/2004 (below; be recited as people such as Kimura) " in the record method in; The sweep velocity of a plurality of linear light of irradiation is 34 μ m/sec; On the other hand, in the method for philtrums such as Kimura record, the sweep velocity of a plurality of linear light of irradiation is 100 μ m/sec.So for example in order to be that the crystal liquid substrate of 1m is handled to an edge lengths; For making photoscanning once; Cost is 7.5 hours in people's such as Kimura method; Cost is about 2.8 hours in the method for in TOHKEMY 2004-145141 communique, putting down in writing, and repeatedly scans if consider the direction of scanning that changes on the substrate in order it to be given a plurality of orientation characteristics, then reaches practical processing speed far away.
In addition; The method of putting down in writing in the japanese kokai publication hei 11-352486 communique; Need use photomask in order only to give the orientation characteristic to the part of the expectation of substrate; Particularly in the production line that large-scale mother substrate uses, need photomask, aspect manufacturing cost, become very big burden to each production great number.In addition, the liquid crystal panel of making in this way is to turn round the mode of the direction restriction orientation that turn 90 degrees at liquid crystal up and down, to compare the possibility that has response speed to reduce with the direction of orientation mode of giving that limits orientation with up and down parallel or antiparallel direction.
Summary of the invention
The object of the present invention is to provide a kind of liquid crystal with alignment films exposure method and device thereof, it can solve above-mentioned prior art problems, with the processing speed formation optical alignment film of practicality.
In order to achieve the above object, in the present invention, the exposure device that liquid crystal is made public with alignment films possesses: the microscope carrier unit, put the substrate that is formed with alignment films from the teeth outwards its year, and removable; Light source, its emission exposure light; The polarized light characteristic is given the unit, and it gives the polarized light characteristic to the exposure light from this light emitted; Pattern forms the unit, and it reflects through this polarized light characteristic with the pattern that forms through small movable minute surface gives a part of light that the exposure light of polarized light characteristic has been given in the unit; The projected light department of the Chinese Academy of Sciences, it passes through the pattern that this pattern forms the exposure light of unit reflection to carrying the substrate irradiation of putting on the microscope carrier unit, and alignment films is made public; And the control module that integral body is controlled; Control module control microscope carrier unit and pattern form the unit; On the substrate that moves continuously in one direction through the microscope carrier unit is moved in one direction continuously, the pattern of exposure light moves with the speed slower than the translational speed of microscope carrier unit alignment films is made public.
In addition, in order to achieve the above object, in the present invention, the exposure device that liquid crystal is made public with alignment films possesses: the microscope carrier unit, put the substrate that is formed with alignment films from the teeth outwards its year, and removable; Light source, its emitted in ultraviolet light or the light close with ultraviolet light are as exposure light; The polarized light characteristic is given the unit, and it gives the polarized light characteristic to the exposure light from this light emitted; Pattern forms the unit; It possesses a plurality of small movable minute surfaces; Incident is given the exposure light that the polarized light characteristic has been given in the unit through the polarized light characteristic, reflects through the pattern that is formed by small movable minute surface, forms the linear light pattern of fine pitch thus; And the projected light department of the Chinese Academy of Sciences; It is to carrying the substrate irradiation of putting on the microscope carrier unit forms the fine pitch of unit formation through this pattern linear exposure light pattern; Alignment films is made public, and pattern forms the unit, puts on substrate on the microscope carrier unit, that move continuously in one direction carrying; With than the slow speed of the translational speed of microscope carrier unit with a direction in the opposite direction on move the linear exposure light pattern of fine pitch, come alignment films is made public.
And; In order to achieve the above object, in the present invention, a kind of method that liquid crystal is made public with alignment films is provided; It is to after giving the polarized light characteristic from the exposure light of light emitted; Make it incide the micro mirror element that possesses a plurality of small movable minute surfaces, the pattern of the exposure light of the reflection graphic patterns reflection that forms small movable minute surface through micro mirror element, via projection optical system project to carry put on the microscope carrier, be formed with on the substrate of alignment films from the teeth outwards; Alignment films is made public; Wherein, on the substrate that moves continuously in one direction through microscope carrier is moved in one direction continuously, the pattern of exposure light moves with the speed slower than the translational speed of microscope carrier alignment films is made public.
Liquid crystal of the present invention through formation like this is used the alignment films exposure device; In the sub-pixel of liquid crystal panel, be divided into four zones; Each regional alignment films restriction direction antiparallel on the upper and lower base plate of TFT and colored filter; And through applying toppling over the orientation and can becoming 45 °, 135 °, 225 °, 315 ° of liquid crystal that voltage causes with respect to the vertical end face of substrate; Or with respect to the positive dirction and the negative direction of an axle become respectively ± 22.5 °, therefore, can make the liquid crystal panel that the visual angle is big, response is fast.
According to the present invention, can replace existing Ginding process, form optical alignment film with the processing speed of practicality, can realize more high image quality, the liquid crystal display cells of high definition more.
Shown in following accompanying drawing, can illustrate these characteristics of the present invention and advantage according to the description more specifically of following preferred implementation of the present invention.
Description of drawings
Fig. 1 is the block diagram of expression liquid crystal with the structure of the integral body of alignment films exposure device.
Fig. 2 A is the vertical view of micro mirror element.
Fig. 2 B is the side view of micro mirror element element of action of an element of explanation micro mirror element.
Fig. 3 is the stereographic map of the structure of the expression projected light department of the Chinese Academy of Sciences and microscope carrier portion.
Fig. 4 is the vertical view that schematically is illustrated in the element of the micro mirror element that time of exposure area of element and the substrate shape of micro mirror element in the exposure process changes.
Fig. 5 A is the front view that is formed with the micro mirror element of linear exposing patterns.
Fig. 5 B is the front view of micro mirror element of state that is illustrated in the linear exposing patterns of the amount of having transferred delegation on the Y direction.
Fig. 6 is the block diagram of the structure in second embodiment of the expression projected light department of the Chinese Academy of Sciences.
Fig. 7 is illustrated in second embodiment of the projected light department of the Chinese Academy of Sciences, the 2 dimensional region at 30 μ m angles on the substrate has been shone the vertical view of amount of row of vertical view and the micro mirror element of 30 μ m angular zones on the substrate of state of small some light.
Fig. 8 A is the front view of a pixel of crystal liquid substrate of distribution of the tilt angle of the alignment films in pixel of expression.
Fig. 8 B representes each pixel in the crystal liquid substrate has been given the front view of crystal liquid substrate of state of the tilt angle of four direction.
Fig. 9 A is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving tilt angle in first exposure process.
Fig. 9 B is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving tilt angle in second exposure process.
Fig. 9 C is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving tilt angle in the 3rd exposure process.
Fig. 9 D is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving tilt angle in the 4th exposure process.
Figure 10 A be represent respectively with respect to the X axle of the alignment films in the pixel just and the front view of a pixel of the crystal liquid substrate of the distribution of the tilt angle of negative direction ± 22.5 degree.
Figure 10 B gives the front view with respect to the crystal liquid substrate of the state of the tilt angle of the four direction of X-direction ± 22.5 degree to each pixel in the crystal liquid substrate.
Figure 11 A is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1043 directions of Figure 10 A in first exposure process.
Figure 11 B is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1044 directions of Figure 10 A in second exposure process
Figure 11 C is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1042 directions of Figure 10 A in the 3rd exposure process.
Figure 11 D is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1041 directions of Figure 10 A in the 4th exposure process.
Figure 12 is that the operation of the expression Y direction that is used for the repetition crystal liquid substrate is to form the process flow diagram of treatment scheme of exposure process of the tilt angle of four direction to each pixel on alignment films.
Figure 13 is illustrated in directions X motion scan zone time the operation of the Y direction that repeats crystal liquid substrate to be carried out the process flow diagram of treatment scheme of the exposure process of repetition with the processing that on alignment films, forms the tilt angle of four direction to each pixel.
Symbol description
110 microscope carrier portions; 111 X microscope carriers; 112 Y microscope carriers; 113 Z microscope carriers; 114 θ microscope carriers; 120 exposure optical systems; 121 light sources; 122 polarization plates; 123 minute surfaces; 124 micro mirror elements; The 125 projected light departments of the Chinese Academy of Sciences; 130 control parts; 131 light source control portions; 132 micro mirror element control parts; 133 microscope carrier control parts; 134 whole control parts; 140 substrate surface height detection systems; 141 height detection are used light source portion; 142 reflected light detectors
Embodiment
Below use the description of drawings embodiments of the invention.
[embodiment 1]
Fig. 1 representes the structure of the liquid crystal of present embodiment with the integral body of alignment films exposure device.Liquid crystal possesses with the alignment films exposure device: carry the microscope carrier portion 110 of putting substrate 100; Be used for exposure optical system 120 that the lip-deep alignment films that is formed on substrate 100 is made public; The control system 130 of control microscope carrier portion 110 and exposure optical system 120; And substrate surface height detection system 140.
Exposure optical system 120 possesses: the light source 121 of emitted in ultraviolet light (UV light) or the light close with ultraviolet region; Control is from the polarization plates 122 of the polarized state of light of light source 121 emissions; Switch the minute surface 123 of the light path of the light that sees through polarization plates 122; Form the micro mirror element 124 of unit as the pattern that constitutes by a large amount of small movable minute surfaces; And the projected light department of the Chinese Academy of Sciences 125, it is assembled through the light that incides micro mirror element 124 behind minute surface 123 switching-over light paths and reflect through micro mirror element 124, and the lip-deep alignment films that is formed on substrate 100 is made public.
Substrate surface height detection system 140 possesses: height detection is with light source 141; Its with light different wavelengths from light source 121 emission, from oblique substrate 100 surfaces are passed through near the irradiation in zone that exposure optical system 120 shone exposure light to the light of the wavelength that is formed at substrate 100 lip-deep alignment films and do not exert an influence; And reflected light detector 142, it is to detecting from the light (normal reflection light) of this height detection with light source 141 emission and the surface reflection through substrate 100.Carrying out in the exposure process through 120 pairs of substrates of exposure optical system 100; Detecting catoptrical signal from substrate 100 through reflected light detector 142 is sent to whole control part 134 and handles; Obtain the surface height information of substrate 100; Simultaneously, whole control part 134 is controlled via 133 pairs of Z microscope carriers 113 of microscope carrier control part according to this elevation information, is predetermined height so that keep the surface of substrate 100.
Fig. 2 A representes the vertical view of micro mirror element 124.Micro mirror element 124 is configured to array-like to small movable minute surface 1242 in frame portion 1241, control through micro mirror element control part 132, and this small movable minute surface 1242 can switch degree of tilt one by one between two inclination angles.Promptly; Shown in Fig. 2 B; By micro mirror element control part 132 control, (open: on), the light of incident was reflected to the direction of the projected light department of the Chinese Academy of Sciences 125 through movable minute surface 1242 from light source 121 emissions and through minute surface 123 crooked light paths when movable minute surface 1242 was maintained the inclination angle of the state of representing with solid line; See through the projected light department of the Chinese Academy of Sciences 125 backs and arrive substrate 100, the lip-deep alignment films that is formed on substrate 100 is made public.On the other hand; Controlled by micro mirror element control part 132; Movable minute surface 1242 (closes: off) when being maintained the inclination angle of the state that is represented by dotted lines; Light through minute surface 123 reflection back incidents is reflected to the direction away from the projected light department of the Chinese Academy of Sciences 125 through movable minute surface 1242, does not arrive substrate 100, to the not contribution of exposure of the lip-deep alignment films that is formed on substrate 100.
On the Y direction, move the movable minute surface 1242 formed patterns of on directions X, arranging among Fig. 2 A (combination of the Push And Release of each movable minute surface 1242) at interval with preset time; Thus, can be at the pattern that gets by the open/close combination of movable minute surface 1242 on micro mirror element 124 with constant speed feeding on the Y direction.
Promptly; In the structure that Fig. 1 representes; Reflecting through minute surface 123 from light source 121 emission backs and inciding the light of micro mirror element 124; Only through by micro mirror element control part 132 control and the light that is set to small minute surface 1242 reflections of the predetermined angle that the solid line of Fig. 2 B representes incide the projected light department of the Chinese Academy of Sciences 125, arrive substrate 100.
Then, use Fig. 3 and Fig. 4 that first embodiment of the projected light department of the Chinese Academy of Sciences 125 is described.Fig. 3 is the stereographic map that comprises the microscope carrier portion 110 of the projected light department of the Chinese Academy of Sciences 125.Moving direction cant angle theta angle with respect to Y microscope carrier 112 is provided with micro mirror element 124.
Use Fig. 4 explanation in zonule of moving on the Y direction 101 and the relation that is replicated in the pattern of pixels on this zonule 101.In Fig. 4; For the purpose of simplifying the description, be illustrated in movable minute surface 1242-1～1242-6 that is arranged in a row on the Y direction of micro mirror element 124 and the change of time that goes up the relation in the zone of shining successively by this movable minute surface 1242-1～1242-6 on the substrate 100 that moves continuously 111 (representing) in Y direction (direction of arrow 50) through two dot-and-dash lines.The Pt1 to Pt6 in the left side of Fig. 4 is illustrated in the position of the equally spaced moment t1 to t6 in the zone 111 on the substrate 100 that moves with constant speed on the Y direction.
Be made as P to the spacing between each movable minute surface of the movable minute surface 1242-1～1242-6 that is arranged in a row of micro mirror element 124, be made as PP to the substrate 100 the equally spaced time from moment t1 to moment t6 to the pitch of feed of Y direction.In the present embodiment, be set at the spacing P that is a bit larger tham between each movable minute surface to substrate 100 to the pitch of feed PP of Y direction.As a result, depart from slightly the position of the movable minute surface 1242-1～1242-6 that is arranged in a row of the position from moment t1 to moment t6 in the zone 111 on the substrate 100 and micro mirror element 124.
That is, when, its state becomes shown in the right side of Fig. 4 such in the 111 last times of zone that project to successively from moment t1 to t6 at the point of marking and drawing on the last same position of each movable minute surface 1242-1～1242-6 1243 on the substrate 100 that the Y direction moves.As a result, in the zone 111 on the substrate 100 that on the Y direction, moves, slowly move from moment t1 to moment t6 through the irradiated successively zone of movable minute surface 1242-1～1242-6 that micro mirror element 124 is arranged in a row on the Y direction with constant speed.Therefore, through the pitch of feed PP of the corresponding substrate 100 of the spacing P between the movable minute surface of suitable setting and each, the time shutter in the zone on the substrate 100 111 can be set at the value of hope to the Y direction.
For example, when the copy pixel of establishing micro mirror element 124 is of a size of C, be 21/21C if establish pitch of feed PP, then duplicating spacing TP is 1/20C.Therefore, when microscope carrier speed V was 2mm/s, the sweep velocity of copy pixel was 100 μ m/s.
Be replaced into the point of representing among Fig. 4 1243 the linear light pattern of representing through Fig. 5 A and Fig. 5 B that forms by a plurality of movable minute surfaces 1242; And be applied to whole base plate 100; Can scan linear light pattern thus, whole base plate 100 made public with the desirable time.In the example that Fig. 5 A and Fig. 5 B represent; Each movable minute surface 1242-1,1242-2 about alignment arrangements on the XY of micro mirror element 124 direction ... 1242n; On directions X, whenever arrange the pattern of opening and closing at a distance from row; At state that substrate 100 is represented from Fig. 5 A after the Y direction moves PP, shown in Fig. 5 B such on the Y direction to its amount of repeat feed one row successively.Thus, represented the structure that scans whole base plate 100 with linear repeat patterns to the difference of the amount of movement of Y direction to the amount of feeding and the substrate 100 of Y direction according to the pattern of opening and closing of the micro mirror element in the identical time 124.In addition, in the example that Fig. 5 A and Fig. 5 B represent, represented the identical state of pattern of directions X, but in fact,, on directions X, also formed the zone of opening and closing according to the exposed areas on the substrate 100.In the example shown in Fig. 5 A and Fig. 5 B; Represented that respectively the arrangement to the delegation of the directions X of micro mirror element forms the example of linear repeat patterns; But also can perhaps can also change out pattern and the width that closes pattern for the pattern of per two row or triplex row repetition.
In the example that Fig. 3 and Fig. 4 represent, the direction of the arrangement of the movable minute surface 1242-1～1242-6 that is arranged in a row of micro mirror element 124 is with respect to direction of feed (Y direction) tilt angle theta of substrate 100.This is the copy pixel of arranging micro mirror element 124 for the position resolution below the copy pixel spacing C.For example, during copy pixel spacing 10 μ m, can duplicate with the position resolution of 10/256=0.039 μ m through selecting copy pixel as θ=1/256rad.
Then, use Fig. 6 that second embodiment of the projected light department of the Chinese Academy of Sciences 125 is described.The projected light department of the Chinese Academy of Sciences 125 possesses: amplify the amplifying lens 1251 through the light of micro mirror element 124 reflections; The array lens of respectively light after amplifying through amplifying lens 1251 being assembled through small lens 1,252 1253; With etc. multiplying power make the point (spot) of the light of assembling through array lens 1253 project to the object lens 1254 on the lip-deep alignment films that is formed on substrate 100.
At this, with 10.8 μ m spacing two-dimensional arrangements the movable minute surface 1242 of micro mirror element 124, when being set at 2.78 times to the magnification of amplifying lens 1251, each micro lens 1252 that forms array lens 1253 with 30 μ m spacings gets final product.In addition, be made as 0.07 to the NA of each micro lens 1252, when light source 121 wavelength of light emitted are made as 365nm, point (spot) diameter of the light of assembling through each micro lens 1252 reaches 6.4 μ m.
If do not have array lens 1253 then become the copy pixel size of 30 μ m, but duplicate through the pattern that this structure can be carried out 6.4 μ m resolution.Make optical convergence through array lens 1253, be irradiated on the alignment films that forms on the surface of substrate 100 as the set of point (spot) light of 6.4 μ m through micro mirror element 124 reflection.
At this, Fig. 7 is illustrated in the situation of duplicating a row pixel of micro mirror element 124 in the 2 dimensional region at 30 μ m angles.Such shown in the left side of Fig. 7; When a row pixel of micro mirror element 124 is 1024 pixels; Be made as inclination angle theta 2 in the 1/1024rad (place of distance 1024 amount of pixels in the vertical to the column direction of micro mirror element 124; The inclination angle of departing from an amount of pixels in the horizontal), the spacing (size of a pixel region on the substrate 100) of the pixel of duplicating micro mirror element 124 is made as C * 33/32 through the pitch of feed PP substrate 100 when being made as C; Such shown in Fig. 7 right side, in the 2 dimensional region of 32 * 32 amount of pixels that are replicated in 30 μ m angles on the substrate 100.
Promptly; When a pixel region is of a size of 30 μ m; If establishing the pitch of feed PP of substrate 100 is 30 * 30/32=30.9375 μ m; Then luminous point in a pixel region at 30 μ m angles on the direction of feed (above-below direction of Fig. 7) of substrate 100, with the spacing of 0.9375 μ m across the length of 30 μ m direction of feed tilt angle theta ground irradiation 32 points (spot) with respect to substrate 100.For the irradiation position that makes the luminous point on the substrate 100 departs from the amount of a pixel with respect to the irradiation area of first luminous point on the direction of feed of substrate 100, duplicate the 33rd irradiated luminous point on the position apart from irradiation area 30 * 32/1024=0.9375 μ m of first luminous point on respect to the rectangular direction of the direction of feed of substrate 100.Through on respect to the rectangular direction of the direction of feed of substrate 100, repeating such scanning successively, to the point of 1024 amount of pixels of the column direction of a pixel region irradiation micro mirror element 124 of substrate 100 with 0.9375 μ m spacing.
The each point on the right side of Fig. 7 is corresponding with the pixel of micro mirror element, through the ON/OFF (ON/OFF) of each pixel, can in 2 dimensional region, describe the pattern of 6.4 μ m point light.If be made as 30 * 33/32=30.9375 μ m to pitch of feed PP, then microscope carrier speed is 30: 0.9375 with the ratio of light-spot speed, can realize the low-velocity scanning of microscope carrier speed 3.2mm/s, luminous point 100 μ m/s.
Then, use exposure device explanation shown in Figure 1 the lip-deep alignment films that is formed on substrate 100 to be carried out the method for light milled processed.
Fig. 8 A and Fig. 8 B are illustrated in the interior zone of alignment films being given the orientation characteristic, zone of an amount of pixels of the liquid crystal indicator that is formed on the substrate 100.
In japanese kokai publication hei 11-352486 communique, put down in writing the both sides' of a pair of glass substrate that constitutes liquid crystal indicator alignment films has been given respectively after the orientation characteristic that direction differs 180 degree they combinations; Form the method for four kinds of state of orientation thus; But in the present embodiment; On a glass substrate, form four kinds of state of orientation, do not carry out another substrate is given the processing of orientation characteristic.
Promptly; In the present embodiment; Shown in Fig. 8 A, be divided into 1011,1012,1013,1,014 four zonules to the zone that is equivalent to an amount of pixels 101 on the substrate 100, the alignment films of each zonule after respectively this being cut apart is given different orientation characteristic (being set at different tilt angles). Arrow 1021,1022,1023,1024 among Fig. 8 A representes to be orientated the direction (giving the direction of tilt angle) of characteristic respectively.
Fig. 8 B schematically is illustrated in the state that forms the zone 101 that is equivalent to an amount of pixels in a large number on the substrate 100.Transversely arranged 1920 pixels have vertically been arranged 1080 pixels (full HD standard) on the crystal liquid substrate of reality.
Then, use the process flow diagram of Fig. 9 A～Fig. 9 D and Figure 12 and Figure 13, the method for the different separately direction of 1021,1022,1023,1024 expressions of the arrow among Fig. 8 A being given the orientation characteristic is described.
When to the linear light pattern of alignment films irradiation fine pitches and along a scanning direction, alignment films is given and the corresponding same orientation characteristic (tilt angle) of the direction of this scanning.In the present embodiment; Utilize this character; At first shown in Fig. 9 A; (the linear light pattern for the area illumination fine pitches that is equivalent to zonule 1011 of the inside of 101-2～101-9) in the example of Fig. 9 A scans simultaneously, thus the alignment films that on the surface of substrate 100, forms is made public via the zonule 1011 among the regional 101-1 that is equivalent to an amount of pixels on 125 pairs of substrates 100 of the projected light department of the Chinese Academy of Sciences and each adjacent pixel region corresponding with regional 101-1.Through being moved with constant speed with respect to the projected light department of the Chinese Academy of Sciences 125, the Y microscope carrier scans linear light pattern.In addition; Follow moving of Y microscope carrier; Each movable minute surface 1242 through micro mirror element control part 132 control micro mirror elements 124; Zonule 1011 in the zone that is equivalent to an amount of pixels 101 on substrate 100 and with the zone that is equivalent to zonule 1011 of zone 101 corresponding each adjacent pixel region in, linear light pattern is shone in mobile continuously on the Y direction in appearance.
Returning Fig. 9 A and Figure 12 describes.Make the substrate 100 that is arranged on the θ microscope carrier 114 under the state of the angle θ that tilted with respect to the Y direction, drive Y microscope carriers 112 through microscope carrier driver element 133, make substrate 100 move (S1201) with constant speed to the Y direction.At this moment; Substrate 100 to the translational speed of Y direction be set at each the movable minute surface 1242 that is a bit larger tham micro mirror element 124 the pattern translational speed to the Y direction (set the translational speed and the Y directional patterns speed of feed of micro mirror element 124 of Y axle microscope carrier 112, make the pattern that forms each movable minute surface 1242 of the directions X through micro mirror element 124 transferring on the Y direction amount that is listed as during the distance that moves to the Y direction of substrate 100 be a bit larger tham the amount of each movable minute surface 1242 of micro mirror element 124 to a spacing of the arrangement of Y direction).The result; In Fig. 9 A, charged to each tiny area (zone of 1011 that is equivalent to Fig. 8 A: the first area) of arrow in inside; Also scan through the equally spaced linear light pattern that micro mirror element 124 forms through irradiation; For the alignment films that on the surface of substrate 100, forms, in each zone, can give tilt angle to the direction shown in the arrow.
When Y microscope carrier 112 continues to move and when arriving the mobile terminal (terminal point: not shown) of Y direction (S1202), temporarily stop to move of Y microscope carrier to the Y direction.Then; The same during with Fig. 9 A, Y microscope carrier 112 is gone up with constant speed opposite direction (reverse) with Fig. 9 A the time is moved, simultaneously through the linear repeat patterns that forms by micro mirror element 124 to the zone (second area) of each pixel on 1012 the substrate 100 that is equivalent to Fig. 8 A make public (S1203); Thus; Shown in Fig. 9 B, for the alignment films that on the surface of substrate 100, forms, in each zone can to give tilt angle through the illustrated direction in the opposite direction of Fig. 9 A.
Y microscope carrier 112 is reverse to be moved and when arriving mobile terminal (starting point: not shown) (S1204), θ microscope carrier 114 is revolved turn 90 degrees (S1205) when making.
Then; Y microscope carrier 112 is moved with constant speed on the direction identical with the situation of Fig. 9 A; Simultaneously through the linear repeat patterns that forms by micro mirror element 124 to the zone (the 3rd zone) of each pixel on 1013 the substrate 100 that is equivalent to Fig. 8 A make public (S1206); Thus, for the alignment films that on the surface of substrate 100, forms, in each zone, can give tilt angle to the direction shown in Fig. 9 C.
When Y microscope carrier 112 arrives the mobile terminal (terminal point: not shown) of Y direction (S1207), temporarily stop to move of Y microscope carrier.Then; Y microscope carrier 112 and the situation of Fig. 9 B are likewise upward moved in the direction (reverse) opposite with the situation of Fig. 9 C with constant speed; Through the linear repeat patterns that forms by micro mirror element 124 made public (S1208) in the zone of each pixel on 1014 the substrate 100 that is equivalent to Fig. 8 A simultaneously, thus, shown in Fig. 9 D; For the alignment films that on the surface of substrate 100, forms, in each zone can to give tilt angle through the illustrated direction in the opposite direction of Fig. 9 C.When Y microscope carrier 112 arrives the mobile terminal (starting point: not shown) of Y direction (S1209), stop to move of Y microscope carrier.
When under the state shown in Fig. 9 A; The width of the directions X of substrate 100 is during greater than the exposure width of the directions X that carries out through single exposure; Drive X microscope carrier 111 before in the flow process of Figure 12, θ microscope carrier 114 being revolved turn 90 degrees through S1205; Make adjacent exposure area on the substrate 100 be positioned at the below of the projected light department of the Chinese Academy of Sciences 125, repeat the step of S1201～S1204, make public across the whole first area and the second area of substrate 100 in the face of each pixel.Figure 13 representes this flow process.
[embodiment 2]
Another embodiment of tilt angle is described through Figure 10 and Figure 11.Apparatus structure in the present embodiment or treatment scheme are identical with the situation of embodiment 1.
In Figure 10 A, the direction of giving of tilt angle is an arrow 1041,1042,1043,1044, for example is the direction of plus or minus direction ± 22.5 degree with respect to the X axle.Through being set at such angle, can improve the observability corresponding with the visual angle.Figure 10 B is illustrated on the substrate 100 ± direction of the tilt angle of 22.5 degree.Figure 11 A～Figure 11 D gives direction through the tilt angle that microscope carrier scanning obtains.Figure 11 A is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1043 the direction of Figure 10 A in first exposure process; Figure 11 B is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1044 the direction of Figure 10 A in second exposure process; Figure 11 C is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1042 the direction of Figure 10 A in the 3rd exposure process, and Figure 11 D is the front view that schematically is illustrated in the crystal liquid substrate of the direction of giving the tilt angle corresponding with 1041 the direction of Figure 10 A in the 4th exposure process.
Under the state of Figure 11 B, the S1205 of the flow process through Figure 12 makes θ microscope carrier rotation 45 degree, can give tilt angle of each zone 22.5 degree direction thus.
Like this,, can set the direction of the tilt angle of hope, can improve corresponding with the visual angle of each product through the rotation amount of microscope carrier 114.
In the process flow diagram that Figure 13 representes, the processing from S1201 to S1204 illustrated with passing through Figure 12 from S1301 to S1304 is identical.In the processing from S1201 to S1204; When to initial zone, when the first area on the alignment films and the end exposure of second area, check whether the scanning of directions X accomplishes (S1305) along directions X; When also imperfect tense; Drive X microscope carrier 111, directions X make next exposure area be positioned at the projected light department of the Chinese Academy of Sciences 125 below (S1306), carry out the processing from S1301 to S1304.Repeat above-mentioned processing, till finishing to the whole processing in the zone of the directions X on the substrate 100.
When the scanning that is judged to be directions X is accomplished, θ microscope carrier 114 is revolved turn 90 degrees (S1307), S1308 carry out in the S1311 with the S1206 that explains through Figure 12 to the identical processing of the step of S1209.In the processing from S1308 to S1311; When to initial zone, when zone of the 3rd on the alignment films and four-range end exposure, check whether the scanning of directions X accomplishes (S1312) along directions X; When also imperfect tense; Drive X microscope carrier 111, directions X make next exposure area be positioned at the projected light department of the Chinese Academy of Sciences 125 below (S1313), carry out the processing from S1308 to S1311.Repeat above-mentioned processing, up to Zone Full, till the 3rd zone and four-range end exposure of each pixel to the directions X on the substrate 100.When the scanning that is judged to be directions X has been accomplished, finish all processing.
Above-mentioned processing is carried out in whole viewing areas through to substrate 100; For the alignment films that on the surface of each pixel, forms; Can give Fig. 9 A to Fig. 9 the tilt angle that D representes to each zone that is divided into four, the result, such shown in Fig. 8 B; Can obtain to possess respectively in four zones in a pixel liquid crystal display cells of different polarized light characteristics across whole of substrate 100.
More than, according to the invention that the clear specifically inventor of embodiment is made, still, the present invention is not limited to said embodiment, certainly in the scope that does not break away from its purport, carries out various changes.
Under the prerequisite that does not break away from purport of the present invention and essential characteristic, can pass through other ad hoc fashion embodiment of the present invention.Said embodiment only is illustration rather than restriction that the present invention is carried out, and scope of the present invention shows rather than shown by foregoing description by additional claim, therefore, comprises all changes in the scope that the scope with the claim protection is equal to.
Claims (16)
1. a liquid crystal is used the alignment films exposure device, is the exposure device that liquid crystal is made public with alignment films, and this liquid crystal is characterised in that to possess with the alignment films exposure device:
Its year put the substrate that is formed with alignment films from the teeth outwards in the microscope carrier unit, and removable;
Light source, its emission exposure light;
The polarized light characteristic is given the unit, and it gives the polarized light characteristic to the exposure light from this light emitted;
Pattern forms the unit, and it reflects through this polarized light characteristic with the pattern that forms through small movable minute surface gives a part of light that the exposure light of polarized light characteristic has been given in the unit;
The projected light department of the Chinese Academy of Sciences, it passes through the pattern that this pattern forms the exposure light of unit reflection to carrying the substrate irradiation of putting on said microscope carrier unit, and said alignment films is made public; And
The control module that integral body is controlled,
This control module controls said microscope carrier unit and said pattern forms the unit; On the said substrate that moves continuously in one direction through said microscope carrier unit is moved in one direction continuously, the pattern of said exposure light moves with the slow speed of translational speed than said microscope carrier unit said alignment films is made public.
2. liquid crystal according to claim 1 is used the alignment films exposure device, it is characterized in that,
Said control module controls said microscope carrier unit and said pattern forms the unit; When said microscope carrier unit is moved in one direction continuously; Through said exposure light made public in the first area of the alignment films on the said substrate; Make said microscope carrier unit with a said direction in the opposite direction on move continuously in, make public through the second area different of said exposure light with said first area to the alignment films on the said substrate.
3. liquid crystal according to claim 1 is used the alignment films exposure device, it is characterized in that,
Said microscope carrier unit possesses the straight line microscope carrier and the rotatable θ microscope carrier that can on straight line, move back and forth.
4. a liquid crystal is used the alignment films exposure device, is the exposure device that liquid crystal is made public with alignment films, and this liquid crystal is characterised in that to possess with the alignment films exposure device:
Its year put the substrate that is formed with alignment films from the teeth outwards in the microscope carrier unit, and removable;
Light source, its emitted in ultraviolet light or the light close with ultraviolet light are as exposure light;
The polarized light characteristic is given the unit, and it gives the polarized light characteristic to the exposure light from this light emitted;
Pattern forms the unit; It possesses a plurality of small movable minute surfaces; Incident is given the exposure light that the polarized light characteristic has been given in the unit through said polarized light characteristic, reflects through the pattern that is formed by said small movable minute surface, forms the linear light pattern of fine pitch thus; And
The projected light department of the Chinese Academy of Sciences, it shines the linear exposure light pattern that forms the fine pitch of unit formation through said pattern to carrying the substrate of putting on said microscope carrier unit, said alignment films is made public,
Said pattern forms the unit; Put on said substrate on the said microscope carrier unit, that move continuously in one direction carrying; With than the slow speed of the translational speed of said microscope carrier unit with a said direction in the opposite direction on move the linear exposure light pattern of said fine pitch, come said alignment films is made public.
5. liquid crystal according to claim 4 is used the alignment films exposure device, it is characterized in that,
When said microscope carrier unit is moved in one direction continuously; Through said exposure light made public in the first area of the alignment films on the said substrate; Make said microscope carrier unit with a said direction in the opposite direction on move continuously in, make public through the second area different of said exposure light with said first area to the alignment films on the said substrate.
6. liquid crystal according to claim 4 is used the alignment films exposure device, it is characterized in that,
Said microscope carrier unit possesses the straight line microscope carrier and the rotatable θ microscope carrier that can on straight line, move back and forth.
7. use the alignment films exposure device according to each the described liquid crystal in the claim 1～6, it is characterized in that,
Said pattern forms the unit and is configured to two-dimensional shapes to said small movable minute surface, and the arrangement on the rectilinear direction that this small movable minute surface that is arranged in two-dimensional shapes moves back and forth in said microscope carrier unit is obliquely installed with respect to the direction of this straight line.
8. use the alignment films exposure device according to each the described liquid crystal in the claim 1～6, it is characterized in that,
Also possess and detect the height detection unit that carries the surface height of putting the substrate on said microscope carrier unit.
9. a liquid crystal is used the alignment films exposure method; It is the method that liquid crystal is made public with alignment films; It is to after giving the polarized light characteristic from the exposure light of light emitted, makes it incide the pattern that possesses a plurality of small movable minute surfaces and forms the unit, the pattern of the exposure light that reflects the reflection graphic patterns that forms through the small movable minute surface that is formed the unit by this pattern; Via projection optical system project to carry put on the microscope carrier, be formed with on the substrate of alignment films from the teeth outwards; Said alignment films is made public, and this liquid crystal is characterised in that with the alignment films exposure method
On the said substrate that moves continuously in one direction through said microscope carrier is moved in one direction continuously, the pattern of said exposure light moves with the speed slower than the translational speed of said microscope carrier said alignment films is made public.
10. liquid crystal according to claim 9 is used the alignment films exposure method, it is characterized in that,
When said microscope carrier is moved in one direction continuously; Through said exposure light made public in the first area of the alignment films on the said substrate; Make said microscope carrier with a said direction in the opposite direction on move continuously in, make public through the second area different of said exposure light with said first area to the alignment films on the said substrate.
11. liquid crystal according to claim 9 is used the alignment films exposure method, it is characterized in that,
After the said first area of the alignment films on the said substrate and said second area are made public, make said substrate rotate angle arbitrarily, made public in zone of the 3rd on the said substrate and the 4th zone.
12. each the described liquid crystal according in the claim 9～11 is used the alignment films exposure method, it is characterized in that,
On said substrate, arrange to form a large amount of pixels, the direction that the orientation of the pixel through this substrate is moved with respect to said microscope carrier tilt at any angle mode said substrate-placing on said microscope carrier.
13. liquid crystal according to claim 9 is used the alignment films exposure method, it is characterized in that,
After the said first area of the alignment films on the said substrate and said second area are made public, said substrate is revolved turn 90 degrees, made public in zone of the 3rd on the said substrate and the 4th zone.
14. each the described liquid crystal according in the claim 9～11 is used the alignment films exposure method, it is characterized in that,
On said substrate, arrange to form a large amount of pixels, the direction that the orientation of the pixel through this substrate is moved with respect to said microscope carrier tilt the mode of 45 degree said substrate-placing on said microscope carrier.
15. each the described liquid crystal according in the claim 9～11 is used the alignment films exposure method, it is characterized in that,
Be arranged in two-dimensional shapes constituting the small movable minute surface that said pattern forms the unit obliquely with respect to the direction that said microscope carrier is moved continuously, make public to carrying the alignment films of putting the substrate on said microscope carrier with the exposing patterns of the small movable direct reflection through this oblique arrangement.
16. each the described liquid crystal according in the claim 9～11 is used the alignment films exposure method, it is characterized in that,
In the process that the alignment films on the said substrate is made public, carry the surface height of putting the substrate on said microscope carrier through the optical mode detection, adjust the surface height of said substrate according to the result of this detection.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010154794A JP2012018256A (en) | 2010-07-07 | 2010-07-07 | Method for exposing alignment film for liquid crystal and device for the same |
| JP2010-154794 | 2010-07-07 |
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| CN102314023A true CN102314023A (en) | 2012-01-11 |
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| CN2011101937164A Pending CN102314023A (en) | 2010-07-07 | 2011-07-05 | Liquid crystal is with alignment films exposure method and device thereof |
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| JP (1) | JP2012018256A (en) |
| KR (1) | KR101346388B1 (en) |
| CN (1) | CN102314023A (en) |
| TW (1) | TW201202787A (en) |
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| CN104395832A (en) * | 2012-07-05 | 2015-03-04 | 株式会社V技术 | Photo-alignment exposure device and photo-alignment exposure method |
| CN104950521A (en) * | 2014-03-31 | 2015-09-30 | 优志旺电机株式会社 | Polarized light irradiation device |
| CN105068321A (en) * | 2015-02-10 | 2015-11-18 | 优志旺电机株式会社 | Light irradition device and light irradiation method thereof |
| CN105487301A (en) * | 2016-02-15 | 2016-04-13 | 深圳市华星光电技术有限公司 | Vertical photo-alignment method and liquid crystal display panel manufacturing method |
| CN108139619A (en) * | 2015-10-23 | 2018-06-08 | 株式会社 V 技术 | Light irradiation device |
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| TW201243506A (en) * | 2011-03-25 | 2012-11-01 | Hitachi High Tech Corp | Method and system for exposing alignment film for liquid crystal, and liquid crystal panel manufactured using system for exposing alignment film for liquid crystal |
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| CN104246550A (en) * | 2012-03-26 | 2014-12-24 | 株式会社有泽制作所 | Method for manufacturing phase-shift plate |
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| CN104395832B (en) * | 2012-07-05 | 2016-08-17 | 株式会社V技术 | Light orientation exposure device and light orientation exposure method |
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| CN108139619A (en) * | 2015-10-23 | 2018-06-08 | 株式会社 V 技术 | Light irradiation device |
| CN105487301A (en) * | 2016-02-15 | 2016-04-13 | 深圳市华星光电技术有限公司 | Vertical photo-alignment method and liquid crystal display panel manufacturing method |
| US10120239B2 (en) | 2016-02-15 | 2018-11-06 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Vertical photo alignment method with maintaining position of mask unchanged and manufacture method of liquid crystal display panel utilizing the same |
| CN105487301B (en) * | 2016-02-15 | 2018-11-23 | 深圳市华星光电技术有限公司 | The production method of vertical light alignment method and liquid crystal display panel |
| CN109884823A (en) * | 2017-12-01 | 2019-06-14 | 夏普株式会社 | The manufacturing method of polarized light illumination device and the substrate with light-sensitive surface |
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Also Published As
| Publication number | Publication date |
|---|---|
| KR101346388B1 (en) | 2014-01-02 |
| JP2012018256A (en) | 2012-01-26 |
| KR20120004927A (en) | 2012-01-13 |
| TW201202787A (en) | 2012-01-16 |
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Application publication date: 20120111 |