CN102313720B - 用于气体分析的光电装置和方法 - Google Patents
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Abstract
本发明涉及一种改进的用于光学气体分析的光电装置,通过该装置,对于预期的测量降低了包含在气体中的微粒的干扰影响。为此,根据本发明的光电装置具有光发射器和光接收器,其限定出包括位于二者之间的测量区的光学测量路径。光接收器接收到的信号在评价单元中得到评价,以最终由此获得期望的信息,例如,特定气体成分的浓度。根据本发明,还提供布置在光学测量路径上游的离子发生器。离子发生器引起不期望的微粒,即,例如粉尘微粒、烟气微粒或其他类似气溶胶的电离,使得电离的微粒能够通过离子加速装置被电场或磁场偏转。在这方面,离子加速装置和/或其电磁场被调整到使得产生的离子经历偏转以能够从旁边流过测量区。
Description
本发明涉及一种用于光学气体分析的光电装置,以及一种用于气体的光学分析的方法。
这种装置为,例如,光谱仪、一系列视觉传感器、现场气体分析仪、隧道传感器等等。特定气体成分,例如,硫化氢、一氧化碳、SO2、NH3、NO、NO2、HCl、HF或类似气体以这种装置通过光透射或光散射手段来测量。在这方面,就绝大部分而言,这些气体成分的浓度得到测量。
本申请的领域是,例如,工厂的排放测量,其中需要监测废气中某些分子化合物的含量。流动气体常常常具有高微粒负荷的特性,像比如烟气、粉尘或其他气溶胶,光电装置要测量这些想知道的气体组分。这样的高微粒负荷造成大量的光吸收和/或高的光散射,这强烈地阻碍测量本身或导致测量无法实现。这样的话,例如,硫化氢和例如超细粉尘一样,具有非常大的吸收。于是不再能够区分吸收是由硫化氢还是粉尘造成的。
电过滤器用于净化气体已为人们所熟知。这样的电过滤器,例如,根据DE 38 01 262 A1,被用于保护发动机进气通道中的空气流量计的陶瓷测量芯片免受这种微粒污染。DE 100 11 531 A1中公开了一种用于探测提取的装置,来进行焦炉原气或其他已知污染的气体的提取气体分析,其中该气体从焦炉管偏离,被多次过滤、冷却并采用电过滤器进行处理从而最终能够以纯净形式导入气体分析仪。这种提取气体分析技术的缺点是及时更换过滤器,需要清洁过滤器或过滤器调换,以及由气体提取路径、过滤器或滤液而产生的不希望的媒质改性。
另一方面,现场气体分析经常发生在气体不需要和不希望进行附加处理时,即应“直接”测量气体。
从现有技术出发,本发明的目的是提供一种改进的用于光学气体分析的光电装置,通过该装置降低了存在于媒质中的微粒对指定测量的干扰影响。
对于在气流中用于气体分析的光电装置,该目的通过具有权利要求1的特征的装置和具有权利要求8的特征的方法来实现。
根据本发明用于气流中光学气体分析的光电装置具有光发射器和光接收器,它们限定出包括位于相互之间的测量区的光学测量路径。光接收器接收到的信号在评价单元得到评价,最终从中获得所需信息,例如特定气体组分的浓度。根据本发明,进一步提供一种布置在光学测量路径上游的离子发生器。离子发生器引起干扰微粒,即例如粉尘微粒、烟气微粒或类似气溶胶的电离,以便电离的微粒能够在电场或磁场中通过离子加速装置偏转。在这方面,离子加速装置和/或其电磁场被设计为使得产生的离子经历偏转从而能够从旁边流过测量区。
离子发生器优选与电磁场协同工作,以便实际测量成分,例如某一分子不被离子发生器电离,而只有干扰微粒被电离。这样,至少其中大部分干扰微粒通过离子加速装置能够保持在测量区之外,使得测量本身不受干扰或甚至仅由此测量才能够进行。因此即便是现场气体分析,也仍然提供根据本发明的粉尘负载气流的附加处理。
离子发生器优选构造为电离子发生器,以便由于电场效应而发生电离。在这方面优选将离子发生器设计为电过滤器的放电极,且离子加速装置由放电极和电过滤器的集电极组成。这样在放电极周围会形成电晕放电,这导致气体中的微粒电离,从而能够向集电极的方向偏转。典型的电场强度为例如5kV/cm。这种电过滤器的配置是普遍熟知且完善的,因此简化了标注尺寸。
或者,似乎理论上也可以由磁场对离子进行偏转。
在本发明的改进中,从气流方向来看,集电极至少布置在测量区域的侧面来偏转电离的微粒,以便使其,至少其中的大部分,从旁边流过测量区。从气流方向来看,电离和偏转应至少发生在测量区之前。为此,集电极必须至少布置在测量区的侧面。
使用多个放电极能够提高电离的概率,其中多个放电极有利地排布在光学测量路径的上游。
本发明的又一实施例中,当光学测量区位于没有气流的区域时,电过滤器的放电极布置在测量区中而集电极布置在测量区外。那么电离的微粒也就转向集电极的方向加速离开测量区,即,其被偏转。
经常情况是这样,测量区被布置在机械过滤器中,优选地在过滤筛板中。在这种情况下,电过滤器优选整合到过滤筛板中。
在这方面放电极有利地至少部分布置在测量区的中心,且集电极布置在机械过滤器的内表面或由过滤器自身形成。
根据本发明的一种用于气流中气体的光学分析的方法包括以下步骤:
发射进入到测量区的光束,所述测量区穿透气流,
用接收器接收光束并产生接收信号,
评价接收信号,
在电场中电离气流中的微粒,并用电场偏转电离的微粒,使其沿远离测量区方向经历偏转以便能够从旁边流过测量区。
根据本发明中的一个实施例,电场强度是已被调制的且是在考虑了该调制的情况下评价接收信号的。施加到离子加速装置的电场不必然是静电场,而也可以是动态调制的,特别是周期性调制的。通过评价依赖于周期性调制的接收信号,媒质中微粒的总浓度也能被测量或至少部分地被估计。选择调制波形的合适的调制频率和光学测量通道的足够精细的时间分辨率,从对于聚-散微粒大小分布的接收信号中甚至可以得到微粒大小分布的报告。这是基于在电场中不同大小的微粒具有不同迁移率的事实,因此这些不同大小的微粒被加速到不同的程度从光学测量区流出或进入光学测量区,正如通常为人们所熟知的根据O’Brien理论的模拟方式。
下文中将通过参考附图的实施例来详细描述本发明。图中显示:
图1用于气流中气体分析的光电装置的第一实施例的示意图;
图2沿线I-I的图1中的装置;
图3第二实施例的示意图;
图4和5其他实施例的类似图2的图示。
如图1中的第一实施例所示,根据本发明中的用于气流28中的气体分析的光电装置10具有光发射器12,其发射光束14。发射光束14限定测量区16,并且经回射器18和分光镜20反射后被光接收器22接收。由光束14构成的光学测量路径包括测量区16。
光接收器22产生依赖于入射光的接收信号,该接收信号在评价单元24中被评价。
这样的光电装置10可以,例如,被构造为透射仪,以便由光接收器22测量穿过测量区16的光强。通常将光发射器12调谐到可由待测气体组分,例如硫化氢吸收的特定波长。然后,通过光接收器22接收到的光,对于感兴趣的气体组分浓度有多高能够被制作成报告,例如,导入烟囱26的气流28中的硫化氢浓度有多高。
光电装置10包括具有矛状延伸30的外壳29,其中诸如光发射器12、光接收器22和评价单元24的光电单元被布置在外壳29中,且光被引导在矛状延伸30内通过测量区16,而回射器18设置在延伸30的末端。在这方面,矛状延伸30在其投射进入烟囱26的区域自然地具有开口,以便气流28可流经测量区16。
导入烟囱26的气流28,这仅由箭头28指示,可载有微粒32。微粒32可以是粉尘、烟气或其他气溶胶,其中微粒32干扰测量区16中的实际光学测量。
装置10具有离子发生器36和以特定方式布置的离子加速装置38,能够沿期望方向偏转离子,从而使微粒32保持在测量区16之外,即如此偏转它们使其,至少其中大部分,能够从旁边流过测量区16,其中微粒的流向由其各自的箭头34指示。
本实施例中的离子发生器36包括被绝缘体42围绕的放电极40。放电极40也是离子加速装置38的一部分,离子加速装置38还具有集电极44和46。
为了偏转微粒32,现将高电压UB施加到放电极40和集电极44、46之间,其中高电压UB由电压源47提供。放电极40周围形成电晕放电,这导致微粒32在合适的高电压UB下的电离。现在带电微粒32由此受到电场方向的力,以及因此受到布置在至少测量区16侧边的集电极44或集电极46的方向的力的作用。放电极40本身被布置在测量区16前面的上游。结果如图2所示,微粒32由此被导向到左边和右边经过测量区16。其他布置也是可以的,其中必须总是这样选择使得力施加到电离的微粒32以最终使这些微粒远离测量区,即引导微粒从旁边流过测量区。
在图3中示出了光电装置10的第二实施例,其中光电装置10分为两部分,并且第一装置部分50类似于第一实施例来构建,而第二装置部分52被布置在烟囱26的相对侧,并且在其中可以布置,例如反射器18。第二光接收器54也可以被布置在第二装置部分52中,其被这样布置使其能够,例如接收散射光,以便用测量装置10基于光散射测量原理也能对气体组分浓度进行评价。为此,用接收器54测量的散射光在第二评价单元56中得到评价。
本实施例同样具有离子发生器36和离子加速装置38,如同以类似的方式配置和布置的第一实施例一样,用于偏转测量区16附近的微粒32。
离子发生器36和离子加速装置38的构造存在着大量的可能性。图4示出了这些可能性中的另一种,其中离子发生器36具有多个放电极40,在本例中四个放电极40中的三个布置在测量区16之前的流动方向28上,一个布置在测量区16之后。集电极44和46依次布置在侧面。由于提供了多个放电极40,微粒32的电离的概率应该增加,使得微粒32能够被更有效地偏转。
最后,图5示出了根据本发明的装置的另一个实施例,其中测量区16被在本例中结构为过滤筛板62的机械过滤器60围绕。过滤筛板62能够,例如由多孔陶瓷或多孔金属制造,并且能够,例如被布置在第一实施例的矛状延伸30中。尽管有过滤器60,超细灰尘微粒也会经扩散到达测量区16并干扰那里的测量。现在放电极40被布置在过滤器60的圆筒对称装置的中心,即测量区16的中心,以使微粒32保持在测量区16之外。集电极64形成在过滤器60的内侧,当过滤器60由金属组成时由过滤器60本身作为集电极,或者集电极64具有应用于过滤器60内侧的多孔金属层。可选地,栅极(未示出)也可被提供在过滤器内表面。
由于气体只扩散到达过滤器60的内部空间,内部空间中的气体几乎是稳定的。因此,电离的微粒32沿集电极64的方向离开测量区而被加速,并且不再干扰测量区16中的光学测量。
根据本发明的装置10以如下方式工作:
光发射器12发射穿透存在于气流中的测量区的光束14。取决于测量区中的气体组分,一部分光被吸收,而其余的光被光接收器22接收,其产生对应于接收到的光总量的接收信号。接收信号在评价单元24中得到评价并最终获得感兴趣气体组分的浓度。
为了使干扰微粒32保持在测量区16之外,微粒32被离子发生器36电离,并且电离的微粒32被由放电极40与集电极44、46和/或62组成的离子加速装置38偏转,使得微粒中的至少大部分能够从旁边流过测量区16和/或保持在测量区16之外。
在根据本发明的该方法的一种改进中,场强能够被调制且接收信号能够在考虑该调制的情况下被评价。因此施加到离子加速装置的电场不必然是静态调制的,而可以是动态调制的,特别是周期性调制的。通过评价依赖于周期性调制的接收信号,媒质中微粒的总浓度能够被测量或至少被估计。适当选择调制频率、调制波形和光学测量通道的足够精细的时间分辨率,从用于聚-散微粒大小分布的接收信号中甚至可以推导出微粒大小分布的报告。这是基于在电场中不同大小的微粒具有不同迁移速率的事实,因此不同大小的微粒加速离开光学测量区或进入光学测量区的程度不同。
Claims (1)
1.一种用于光学分析气流中的气体的方法,所述气流除了将要确定其浓度的待测气体成分之外还包含干扰浓度测量的微粒,所述微粒是粉尘微粒、烟气微粒或气溶胶,具有以下步骤:
-发射进入测量区的光束,所述测量区穿透所述气流,
-用接收器接收所述光束并产生接收信号,
-评价所述接收信号,以及
-在电场中电离所述气流中的微粒并用所述电场偏转所述电离的微粒,使得它们沿离开测量区的方向经历偏转,以便它们能够从旁边流过所述测量区,
其中,调制所述电场的场强,且在考虑所述调制的情况下评价所述接收信号。
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CN102590055B (zh) * | 2012-02-08 | 2013-10-23 | 杨英杰 | 锅炉一次风煤粉浓度在线测量装置 |
CN102706782B (zh) * | 2012-05-18 | 2014-01-15 | 北京金铠星科技有限公司 | 汽油车排放微颗粒物重量检测方法 |
CN102706783B (zh) * | 2012-05-18 | 2014-02-26 | 北京金铠星科技有限公司 | 柴油车排放微颗粒物重量检测方法 |
DE102013009642B4 (de) | 2013-06-08 | 2019-10-10 | Dräger Safety AG & Co. KGaA | Messsystem, Reaktionsträger, Messverfahren und optischer Strömungssensor |
KR101504061B1 (ko) * | 2014-02-17 | 2015-03-19 | 한국기술교육대학교 산학협력단 | 시료의 광흡수계수 측정시스템 및 측정방법 |
KR101602068B1 (ko) * | 2014-12-02 | 2016-03-09 | 한국기술교육대학교 산학협력단 | 편광 및 간섭을 이용한 에어로졸의 광흡수계수 측정시스템 |
JP6523840B2 (ja) * | 2015-07-16 | 2019-06-05 | 株式会社堀場製作所 | ガス成分検出装置 |
DE102015118208B4 (de) * | 2015-10-26 | 2022-11-10 | Sick Ag | Analysevorrichtung zum Analysieren einer Gasprobe sowie Verfahren zum Analysieren einer Gasprobe |
KR101948975B1 (ko) * | 2016-05-30 | 2019-02-15 | 한국기술교육대학교 산학협력단 | 측정 체적이 확장된 에어로졸의 광흡수계수 측정시스템 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3801262A1 (de) * | 1988-01-19 | 1989-07-27 | Pierburg Gmbh | Verfahren und einrichtung zum schuetzen von in gasstroemen angeordneten messgliedern vor verschmutzung |
US5808299A (en) * | 1996-04-01 | 1998-09-15 | Syagen Technology | Real-time multispecies monitoring by photoionization mass spectrometry |
CA2704114A1 (en) * | 2007-11-07 | 2009-05-14 | Toyota Jidosha Kabushiki Kaisha | Hydrocarbon concentration measuring apparatus and hydrocarbon concentration measuring method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3626179A (en) * | 1970-04-03 | 1971-12-07 | Franklin Gno Corp | High temperature method and apparatus for analyzing gaseous samples |
JPS53115978A (en) * | 1977-03-21 | 1978-10-09 | Shiyunji Matsumoto | Electrostatic filter |
DD263927A1 (de) * | 1987-08-26 | 1989-01-18 | Univ Berlin Humboldt | Wechselspannungsfilter zur abscheidung von schwebstoffen aus stroemenden gasen |
JP3126759B2 (ja) * | 1991-08-20 | 2001-01-22 | 日本碍子株式会社 | 光学式分析装置 |
US6407382B1 (en) * | 1999-06-04 | 2002-06-18 | Technispan Llc | Discharge ionization source |
US6333632B1 (en) * | 1999-09-16 | 2001-12-25 | Rae Systems, Inc. | Alternating current discharge ionization detector |
DE10011531A1 (de) | 2000-03-13 | 2001-09-27 | Montan Tech Gmbh | Vorrichtung zur Probenahme für Gasanalysen von Koksofenrohgasen und anderen verunreinigten Gasen sowie Verfahren zur Gasanalyse dieser Gase |
US7375319B1 (en) * | 2000-06-09 | 2008-05-20 | Willoughby Ross C | Laser desorption ion source |
US20030015045A1 (en) * | 2001-07-23 | 2003-01-23 | Takehito Yoshida | Particle counting method and particle counter |
US7091481B2 (en) * | 2001-08-08 | 2006-08-15 | Sionex Corporation | Method and apparatus for plasma generation |
KR20060113669A (ko) | 2003-09-19 | 2006-11-02 | 사르노프 코포레이션 | 부유 입자를 분류하는 방법 및 장치 |
EP1913379A2 (en) * | 2005-07-26 | 2008-04-23 | Sionex Corporation | Ultra compact ion mobility based analyzer apparatus, method, and system |
JP4958258B2 (ja) * | 2006-03-17 | 2012-06-20 | 株式会社リガク | ガス分析装置 |
US7605389B1 (en) * | 2006-06-12 | 2009-10-20 | Verionix, Inc. | Particle detector with particle trapping device |
EP2046488A4 (en) * | 2006-06-29 | 2013-09-18 | Ionwerks Inc | NEUTRAL / ION REACTOR IN AN ADIABATIC ULTRASONIC GAS FLOW FOR TIME-OF-FLIGHT MASS SPECTROMETRY OF ION MOBILITIES |
US7733490B2 (en) * | 2007-11-16 | 2010-06-08 | Schlumberger Technology Corporation | Apparatus and methods to analyze downhole fluids using ionized fluid samples |
US8071938B2 (en) * | 2008-03-20 | 2011-12-06 | The Mitre Corporation | Multi-modal particle detector |
EP2373765B1 (en) * | 2008-12-08 | 2018-05-30 | Plagazi AB | Flexible modular system for the production of hydrogen by plasma gasification |
-
2010
- 2010-07-05 EP EP10168397.7A patent/EP2405254B1/de not_active Not-in-force
-
2011
- 2011-05-31 US US13/118,618 patent/US8749788B2/en active Active
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- 2011-07-04 KR KR1020110066063A patent/KR101247689B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3801262A1 (de) * | 1988-01-19 | 1989-07-27 | Pierburg Gmbh | Verfahren und einrichtung zum schuetzen von in gasstroemen angeordneten messgliedern vor verschmutzung |
US5808299A (en) * | 1996-04-01 | 1998-09-15 | Syagen Technology | Real-time multispecies monitoring by photoionization mass spectrometry |
CA2704114A1 (en) * | 2007-11-07 | 2009-05-14 | Toyota Jidosha Kabushiki Kaisha | Hydrocarbon concentration measuring apparatus and hydrocarbon concentration measuring method |
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