CN102312196B - Mobile arc discharge ion plating equipment and application thereof - Google Patents
Mobile arc discharge ion plating equipment and application thereof Download PDFInfo
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- CN102312196B CN102312196B CN 201010219512 CN201010219512A CN102312196B CN 102312196 B CN102312196 B CN 102312196B CN 201010219512 CN201010219512 CN 201010219512 CN 201010219512 A CN201010219512 A CN 201010219512A CN 102312196 B CN102312196 B CN 102312196B
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Abstract
The invention relates to the field of ion plating equipment, in particular to mobile arc discharge ion plating equipment and application thereof. The mobile arc discharge ion plating equipment can be popularized and applied to functionalization treatment of large-scale members of an airplane, and can be applied to surface wear resisting and corrosion resisting treatment and various functionalization plating treatment of large-scale or heavy devices such as aerospacecrafts, large-scale passenger-cargo vessels or the like. An air bleed port of an air bleed set is connected with an air exhaust port of a vacuum chamber; a positive pole and a negative pole of an evaporation source power supply control unit are connected to a shell of the vacuum chamber and a target of an evaporation source respectively; a positive pole and a negative pole of a bias power supply are connected to the shell of the vacuum chamber and a plated workpiece; high and low vacuum gauge probes of a composite vacuum gauge are connected with an ion vacuum gauge tube and a thermal resistance gauge tube which are arranged at the bottom of the vacuum chamber; and a temperature monitoring unit is connected with a thermocouple arranged at the bottom of the vacuum chamber. The invention solves the problems of partial film plating treatment of large-scale parts which are inconvenient to assemble into the vacuum chamber of the plating equipment and devices are inconvenient to carry and the like.
Description
Technical field:
The present invention relates to the ion beam coating equipment field, be specially a kind of movable type arc discharge ion plating device and application thereof, may be used on the functionalization of aircraft large-scale component, also can promote the use of the large-scale or surface abrasion resistance of heavy component such as aerospacecraft, large-scale vessel, warship, rapid, big machinery equipment, large bridge, Generator Set, Nuclear power plants, anti-corrosion and various functional coating film treatment.
Background technology:
At present, the fixed ion film coating machine that generally uses generally can only carry out coating film treatment to those parts that directly can be installed in vacuum chamber.For the large component in those filming equipment vacuum chambers of can't packing into, can not maybe should not dismantle the local coating film treatment of carrying device and can't realize.In addition, although some parts can be dismantled carrying, because dismounting and reciprocal carrying will be wasted many times, affect the production cycle, bring many unnecessary financial losses to actual production.
Summary of the invention:
For solve those can't or inconvenience pack into large component in the filming equipment vacuum chamber, can not maybe should not dismantle the local coating film treatment of carrying device, reduce due to dismounting as far as possible and back and forth carry caused losing time, the unnecessary problems such as financial loss that affect the production cycle and bring to actual production.The invention provides a kind of movable type arc discharge ion plating device.This equipment not only can deposit elemental metals film, alloy film, but also can deposit the classes of compounds film.
Technical scheme of the present invention is:
A kind of movable type arc discharge ion plating device, this equipment is provided with vacuum cavity, vacuum unit, evaporation source, power control unit, temperature monitoring unit, compound vacuum gauge, the bleeding point of unit of bleeding is connected with the venting port of vacuum cavity, and the positive pole of evaporation source power control unit and negative pole are connected on the target of the shell of vacuum cavity and evaporation source; The positive pole of grid bias power supply and negative pole are connected on the shell and workpiece to be plated of vacuum cavity; The high and low vacuum gauge probe of compound vacuum gauge is regulated to regulate with thermal resistance with the ion vacuum that is arranged on the vacuum cavity bottom respectively and is connected; The thermopair of temperature monitoring unit bottom being arranged on vacuum cavity is connected.
Described movable type arc discharge ion plating device, the bottom of vacuum cavity is equipped with equlizing support.
Described movable type arc discharge ion plating device, vacuum cavity material are stainless steel, and the vacuum cavity wall thickness is 8～10 millimeters, and the vacuum cavity internal diameter is 300～400 millimeters of ￠, and the vacuum cavity height is 200～300 millimeters.
Described movable type arc discharge ion plating device, vacuum cavity is provided with venting port, peep hole, water-cooled tube, working gas introducing port, thermopair introducing port, evaporation source mounting flange, vacuum gauge open holes, the both sides of vacuum cavity have venting port, peep hole, the sidewall of vacuum cavity is bilayer structure, be provided with water-cooled tube between described bilayer structure, the vacuum cavity bottom has working gas introducing port, thermopair introducing port and vacuum gauge open holes, and vacuum cavity is provided with the evaporation source mounting flange.
described movable type arc discharge ion plating device, the vacuum unit is provided with mechanical pump, diffusion pump, the diffusion pump valve, roughing valve, inferior step valve, the transition bridge piece, the vacuum chamber purging valve, the pumping hole electromagnetic inflation valve, the vacuum gauge open holes, the pumping hole electromagnetic inflation valve directly is connected with the mechanical pump pumping hole, mechanical pump pumping hole electromagnetic inflation valve is connected with roughing valve with the diffusion pump valve respectively by pipe connecting, the vacuum gauge open holes be placed in spread the pipe connecting circumference that pump valve is connected on, roughing valve is connected with the transition bridge piece by pipe connecting, the diffusion pump valve is connected with the venting port of diffusion pump by pipe connecting, one end of inferior step valve and the bleeding point of diffusion pump are direct-connected, the other end of inferior step valve is connected with an end of transition bridge piece, the vacuum chamber purging valve is arranged on the circumference of transition bridge piece.
Described movable type arc discharge ion plating device, evaporation source is provided with evaporation source mounting flange, arc source insulating part, arc source fastening piece, arc source conduit, arc source lid, water coolant ingress pipe, water coolant ingress pipe fastening piece, striking pin, arc source magnet assembly, target, shielding case, it is inboard that the shielding case insulating part is fixed on the evaporation source mounting flange, and keep the gap with the target circumference; Target interconnects by screw thread and arc source conduit, and arc source conduit one end is by sealing-ring and target sealing; Arc source conduit passes evaporation source mounting flange mesopore, and between arc source conduit and evaporation source mounting flange, the installing insulating pad keeps insulation; Arc source conduit arranges arc source insulating part outward, and the other end of arc source insulating part compresses by the arc source fastening piece that is threaded with arc source conduit, and arc source fastening piece is fixed on arc source conduit and target on the evaporation source mounting flange by screw thread; Arc source lid is by being screwed at the other end of arc source conduit, and the afterbody of arc source conduit is by sealing-ring and arc source end cap seal; Arc source magnet assembly is arranged on an end of water coolant ingress pipe by screw thread, the water coolant ingress pipe passes through the mesopore of arc source lid, be connected to the arc source by water coolant ingress pipe fastener threads and cover, arc source magnet assembly reaches hydraulic seal by an end that is placed in the water coolant ingress pipe and the sealing-ring that is tightly placed on water coolant ingress pipe circumference; The striking pin is arranged on the evaporation source mounting flange, and the head of striking pin and target material surface keep the distance of 1.5～2 millimeters.
Described movable type arc discharge ion plating device also is provided with gland, and gland is located on the shoulder of arc source insulating part one end, makes arc source insulating part be fixed in the evaporation source mounting flange outside.
The application of described movable type arc discharge ion plating device, this equipment is applied to the functionalization of aircraft large-scale component, perhaps promotes the use of the surface abrasion resistance of aerospacecraft, large-scale vessel, warship, rapid, big machinery equipment, large bridge, Generator Set or Nuclear power plants, anti-corrosion or various functional coating film treatment.
Advantage of the present invention and beneficial effect are:
1, movable type arc discharge ion plating device of the present invention, this weight of equipment is light, volume is little, is convenient to carrying.
2, the present invention not only can realize carrying out local coating film treatment for the large component in those filming equipment vacuum chambers of can't packing into, on-the-spot can not maybe should not dismantle the carrying device to those and carry out local coating film treatment but also equipment can be transported to, reduce due to dismounting as far as possible and back and forth carry caused losing time, the unnecessary financial loss that affects the production cycle and bring to actual production.
3, the present invention operate fairly simple, equipment can 360 the degree circumference in every 45 the degree flexible rotatings, be convenient to can't dismantle the adaptive of parts to those.
4, present device power smaller (lower than 6KW) is almost to have the place of 380 volts of electrical source of power just can carry out coating film treatment to parts in the original place.
5, input cost of the present invention is low, and floor space is little, and is pollution-free.
Description of drawings:
Fig. 1 movable type arc discharge ion plating device structural principle schematic diagram.
In figure, 1, vacuum cavity; 2, vacuum unit; 3, evaporation source; 4, power control unit; 5, equlizing support; 6, temperature monitoring unit; 7, compound vacuum gauge; 8, grid bias power supply.
Fig. 2 vacuum cavity schematic diagram.
In figure, 11, venting port; 12, peep hole; 13, water-cooled tube; 14, working gas introducing port; 15, thermopair introducing port; 16, evaporation source mounting flange; 17, vacuum gauge open holes.
Fig. 3 vacuum unit schematic diagram.
In figure, 21, mechanical pump; 22, electromagnetic inflation valve; 23, diffusion pump valve; 24, vacuum gauge open holes; 25, roughing valve; 26, transition bridge piece; 27, purging valve; 28, inferior step valve; 29, diffusion pump.
The assembling schematic diagram of Fig. 4 evaporation source.
In figure, 301, the evaporation source mounting flange; 302, arc source insulating part (tetrafluoroethylene); 303, arc source fastening piece; 304, arc source conduit; 305, arc source lid; 306, water coolant ingress pipe; 307, water coolant ingress pipe fastening piece; 308, gland; 309, striking pin; 310, arc source magnet assembly; 311, target; 312, shielding case.
Fig. 5 large-sized sheet material sealing transition joint.
Fig. 6 large cylinder sealing transition joint.
Embodiment:
The present invention is further described below in conjunction with drawings and Examples.
As shown in Figure 1, movable type arc discharge ion plating device of the present invention mainly comprises: vacuum cavity 1, vacuum unit 2, evaporation source 3, power control unit 4, equlizing support 5, temperature monitoring unit 6, compound vacuum gauge 7, grid bias power supply 8 etc.Concrete structure is as follows:
The bleeding point of unit 2 of bleeding is connected with the venting port of vacuum cavity 1, and plated film opening of vacuum chamber direction can be according to the actual requirements, rotates along circumference by 8 bolt interval 45 degree on joint flange; The positive pole of evaporation source power control unit 4 and negative pole are connected on the target of the shell of vacuum cavity 1 and evaporation source 3; The positive pole of grid bias power supply 8 and negative pole are connected on the shell and workpiece to be plated of vacuum cavity 1; The high and low vacuum gauge probe of compound vacuum gauge 7 is regulated to regulate with thermal resistance with the ion vacuum that is arranged on vacuum cavity 1 bottom respectively and is connected; Temperature monitoring unit 6 is connected with the thermopair that is arranged on vacuum cavity 1 bottom; Equlizing support 5 is installed on the bottom of vacuum cavity 1, to keep the balance of coating system integral body.
As shown in Figure 2, the vacuum cavity material in the present invention is stainless steel, and the cavity wall thickness is 8～10 millimeters, and the cavity internal diameter is 300～400 millimeters of ￠, and housing depth is 200～300 millimeters.In the present embodiment, vacuum cavity 1 material is the 2Cr13 stainless steel, and vacuum cavity 1 wall thickness is 10 millimeters, and vacuum cavity 1 internal diameter is 360 millimeters of ￠, and vacuum cavity 1 is highly 300 millimeters.Mainly comprise: venting port 11, peep hole 12, water-cooled tube 13, working gas introducing port 14, thermopair introducing port 15, evaporation source mounting flange 16, vacuum gauge open holes 17 etc., its concrete structure is as follows:
The both sides of vacuum cavity 1 have venting port 11, peep hole 12, the sidewall of vacuum cavity 1 is bilayer structure, be provided with water-cooled tube 13 between described bilayer structure, vacuum cavity 1 bottom has working gas introducing port 14, thermopair introducing port 15 and vacuum gauge open holes 17, and vacuum cavity 1 is provided with evaporation source mounting flange 16.
As shown in Figure 3, the vacuum unit is by the mechanical pump 21 of 4 liters/second, the formations such as diffusion pump 29, vacuum valve (diffusion pump valve 23, roughing valve 25, inferior step valve 28), transition bridge piece 26, vacuum chamber purging valve 27, pumping hole electromagnetic inflation valve 22, vacuum gauge open holes 24 and pipe connecting that the pumping hole diameter is 100 millimeters, and concrete structure is as follows:
pumping hole electromagnetic inflation valve 22 directly is connected with mechanical pump 21 pumping holes, mechanical pump pumping hole electromagnetic inflation valve 22 is connected with roughing valve 25 with diffusion pump valve 23 respectively by pipe connecting, vacuum gauge open holes 24 be placed in spread the pipe connecting circumference that pump valve 23 is connected on, roughing valve 25 is connected with transition bridge piece 26 by pipe connecting, diffusion pump valve 23 is connected by the venting port of pipe connecting with diffusion pump 29, one end of inferior step valve 28 and the bleeding point of diffusion pump 29 are direct-connected, the other end of inferior step valve 28 is connected with an end of transition bridge piece 26, vacuum chamber purging valve 27 is arranged on the circumference of transition bridge piece 29.
As shown in Figure 4, the evaporation source in the present embodiment is made of evaporation source mounting flange 301, arc source insulating part 302, arc source fastening piece 303, arc source conduit 304, arc source lid 305, water coolant ingress pipe 306, water coolant ingress pipe fastening piece 307, gland 308, striking pin 309, arc source magnet assembly 310, target 311, shielding case 312 etc.Its concrete structure is as follows:
Working process of the present invention is as follows:
at first, start mechanical pump 21, opening diffusion pump valve 23 will spread cavity internal pressure and be evacuated to below 5Pa, then give the logical water coolant of diffusion pump 29 and heating, heat and close diffusion pump valve 23 after 40 minutes, after at first step valve 25 is extracted into 5Pa with the vacuum cavity internal pressure, close roughing valve 25, drive diffusion pump valve 23, drive time step valve 28, after the vacuum cavity internal pressure is extracted into 0.01Pa, give vacuum cavity 1 and the logical water coolant of evaporation source target 311, connect grid bias power supply and adjust to 0～200 volt, pass into high-purity argon gas and make extremely approximately 0.6Pa of vacuum indoor pressure, start 309 strikings of striking pin, adjust the evaporation source electric current and arrive approximately 50～100 peaces, plated film is to required time.
When needing coating film treatment for large flat shape device part, the sealing transition joint between opening of vacuum chamber end and plating piece as shown in Figure 5, material therefor is tetrafluoroethylene, it is shaped as the annulus of 400 millimeters of external diameters, 360 millimeters of internal diameters, 10 millimeters of thickness.Centered by the plated film position, the one side of sealing transition joint is bonded together with 704 silicon rubber (sizing agent) and sheet material, placing in the room temperature of 20 ℃ of left and right, air after 1 hour can be suitable with the sealing-ring of the another side of sealing transition joint and opening of vacuum chamber end, then makes the contact plane of sealing-ring and crossover sub be adjacent to fully and can begin to vacuumize and carry out coating film treatment.
When large cylinder device part needs coating film treatment, sealing transition joint between opening of vacuum chamber end and plating piece as shown in Figure 6, material therefor is tetrafluoroethylene, it is shaped as the right cylinder (ring) of 420 millimeters of external diameters, 360 millimeters of internal diameters, 300 millimeters of height, right cylinder one end is processed into sealing plane, the other end is processed into cambered surface, this cambered surface radius with need the right cylinder device side of plated film suitable.Centered by the plated film position, the cylindrical surface of sealing transition joint is bonded together with the face adapted of 704 silicon rubber (sizing agent) with the right cylinder device, placing in the room temperature of 20 ℃ of left and right, air after 1 hour can be suitable with the sealing-ring of the plane of sealing transition joint and opening of vacuum chamber end, makes the contact plane of sealing-ring and crossover sub be adjacent to fully and can begin to vacuumize and carry out coating film treatment.
The volume of movable type arc discharge ion plating of the present invention system weighs less than 600 kilograms less than 1.2 meters * 1.2 meters * 1.5 meters, and highest attainable vacuum is 3 * 10
-3Pa, maximum service rating is lower than 6KW, and the continuous coating time can reach 120 hours, and plated film opening of vacuum chamber direction can be according to the actual requirements, interval 45 degree carries out left rotation and right rotation, and opening of vacuum chamber end and sealing between plating piece need be connected and seal according to the true form processing crossover sub at plated film position.
The present invention is by the scene of jubilee wagon carrying to actual needs coating film treatment parts, solve those can't or inconvenience pack into large component in the filming equipment vacuum chamber, can not maybe should not dismantle the local coating film treatment of carrying device, may be used on the functionalization of aircraft large-scale component, also can promote the use of the large-scale or surface abrasion resistance of heavy component such as aerospacecraft, large-scale vessel, warship, rapid, big machinery equipment, large bridge, Generator Set, Nuclear power plants, anti-corrosion and various functional coating film treatment.
Claims (6)
1. movable type arc discharge ion plating device, it is characterized in that: this equipment is provided with vacuum cavity, vacuum unit, evaporation source, power control unit, temperature monitoring unit, compound vacuum gauge, the bleeding point of vacuum unit is connected with the venting port of vacuum cavity, and the positive pole of evaporation source power control unit and negative pole are connected on the target of the shell of vacuum cavity and evaporation source; The positive pole of grid bias power supply and negative pole are connected on the shell and workpiece to be plated of vacuum cavity; The high and low vacuum gauge probe of compound vacuum gauge is regulated to regulate with thermal resistance with the ion vacuum that is arranged on the vacuum cavity bottom respectively and is connected; The thermopair of temperature monitoring unit bottom being arranged on vacuum cavity is connected;
Vacuum cavity is provided with venting port, peep hole, water-cooled tube, working gas introducing port, thermopair introducing port, evaporation source mounting flange, vacuum gauge open holes, the both sides of vacuum cavity have venting port, peep hole, the sidewall of vacuum cavity is bilayer structure, be provided with water-cooled tube between described bilayer structure, the vacuum cavity bottom has working gas introducing port, thermopair introducing port and vacuum gauge open holes, and vacuum cavity is provided with the evaporation source mounting flange;
Along the circumference rotation, opening of vacuum chamber end and sealing between plating piece need be connected and seal according to the true form processing crossover sub at plated film position plated film opening of vacuum chamber direction by 8 bolt intervals, 45 degree on joint flange;
Evaporation source is provided with evaporation source mounting flange, arc source insulating part, arc source fastening piece, arc source conduit, arc source lid, water coolant ingress pipe, water coolant ingress pipe fastening piece, striking pin, arc source magnet assembly, target, shielding case, it is inboard that the shielding case insulating part is fixed on the evaporation source mounting flange, and keep the gap with the target circumference; Target interconnects by screw thread and arc source conduit, and arc source conduit one end is by sealing-ring and target sealing; Arc source conduit passes evaporation source mounting flange mesopore, and between arc source conduit and evaporation source mounting flange, the installing insulating pad keeps insulation; Arc source conduit arranges arc source insulating part outward, and the other end of arc source insulating part compresses by the arc source fastening piece that is threaded with arc source conduit, and arc source fastening piece is fixed on arc source conduit and target on the evaporation source mounting flange by screw thread; Arc source lid is by being screwed at the other end of arc source conduit, and the afterbody of arc source conduit is by sealing-ring and arc source end cap seal; Arc source magnet assembly is arranged on an end of water coolant ingress pipe by screw thread, the water coolant ingress pipe passes through the mesopore of arc source lid, be connected to the arc source by water coolant ingress pipe fastener threads and cover, arc source magnet assembly reaches hydraulic seal by an end that is placed in the water coolant ingress pipe and the sealing-ring that is tightly placed on water coolant ingress pipe circumference; The striking pin is arranged on the evaporation source mounting flange, and the head of striking pin and target material surface keep the distance of 1.5～2 millimeters.
2. according to movable type arc discharge ion plating device claimed in claim 1, it is characterized in that: the bottom of vacuum cavity is equipped with equlizing support.
3. according to movable type arc discharge ion plating device claimed in claim 1, it is characterized in that: the vacuum cavity material is stainless steel, the vacuum cavity wall thickness is 8～10 millimeters, and the vacuum cavity internal diameter is 300～400 millimeters of φ, and the vacuum cavity height is 200～300 millimeters.
4. according to movable type arc discharge ion plating device claimed in claim 1, it is characterized in that: the vacuum unit is provided with mechanical pump, diffusion pump, the diffusion pump valve, roughing valve, inferior step valve, the transition bridge piece, the vacuum chamber purging valve, the pumping hole electromagnetic inflation valve, the vacuum gauge open holes, the pumping hole electromagnetic inflation valve directly is connected with the mechanical pump pumping hole, mechanical pump pumping hole electromagnetic inflation valve is connected with roughing valve with the diffusion pump valve respectively by pipe connecting, the vacuum gauge open holes be placed in spread the pipe connecting circumference that pump valve is connected on, roughing valve is connected with the transition bridge piece by pipe connecting, the diffusion pump valve is connected with the venting port of diffusion pump by pipe connecting, one end of inferior step valve and the bleeding point of diffusion pump are direct-connected, the other end of inferior step valve is connected with an end of transition bridge piece, the vacuum chamber purging valve is arranged on the circumference of transition bridge piece.
5. according to movable type arc discharge ion plating device claimed in claim 1, it is characterized in that: also be provided with gland, gland is located on the shoulder of arc source insulating part one end, makes arc source insulating part be fixed in the evaporation source mounting flange outside.
6. according to the application of movable type arc discharge ion plating device claimed in claim 1, it is characterized in that: this equipment is applied to the functionalization of aircraft large-scale component, perhaps promotes the use of the various functional coating film treatment of aerospacecraft, large-scale vessel, warship, rapid, large bridge or Nuclear power plants.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010219512 CN102312196B (en) | 2010-07-07 | 2010-07-07 | Mobile arc discharge ion plating equipment and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010219512 CN102312196B (en) | 2010-07-07 | 2010-07-07 | Mobile arc discharge ion plating equipment and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102312196A CN102312196A (en) | 2012-01-11 |
| CN102312196B true CN102312196B (en) | 2013-06-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010219512 Expired - Fee Related CN102312196B (en) | 2010-07-07 | 2010-07-07 | Mobile arc discharge ion plating equipment and application thereof |
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| Country | Link |
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| CN (1) | CN102312196B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002371351A (en) * | 2001-06-14 | 2002-12-26 | Hitachi Metals Ltd | Film forming apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1068068A (en) * | 1996-08-26 | 1998-03-10 | Nissin Electric Co Ltd | Formation of compound thin coating |
| JPH10140335A (en) * | 1996-11-08 | 1998-05-26 | Nissin Electric Co Ltd | Formation of chromium nitride film |
| JP4062582B2 (en) * | 2001-07-23 | 2008-03-19 | 株式会社神戸製鋼所 | Hard coating for cutting tool, method for producing the same, and target for forming hard coating |
-
2010
- 2010-07-07 CN CN 201010219512 patent/CN102312196B/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002371351A (en) * | 2001-06-14 | 2002-12-26 | Hitachi Metals Ltd | Film forming apparatus |
Non-Patent Citations (4)
| Title |
|---|
| JP特开2002-371351A 2002.12.26 |
| JP特开2003-34858A 2003.02.07 |
| JP特开平10-140335A 1998.05.26 |
| JP特开平10-68068A 1998.03.10 |
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| CN102312196A (en) | 2012-01-11 |
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