CN102300342A - Support plate heating device and plasma processor using same - Google Patents
Support plate heating device and plasma processor using same Download PDFInfo
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- CN102300342A CN102300342A CN2010102183174A CN201010218317A CN102300342A CN 102300342 A CN102300342 A CN 102300342A CN 2010102183174 A CN2010102183174 A CN 2010102183174A CN 201010218317 A CN201010218317 A CN 201010218317A CN 102300342 A CN102300342 A CN 102300342A
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Abstract
The invention provides a support plate heating device, which is used for heating a support plate in a plasma process chamber. The support plate heating device comprises a first heater with a plurality of heating subregions, and a compensating heater arranged near the first heater; and the compensating heater comprises a compensation heating subregion which can be used for carrying out compensation heating on the junction of each heating subregion on the first heater. By utilizing the support plate heating device provided by the invention, the heating uniformity of the support plate can be effectively improved, and the heating subregions of the support plate heating device can be adjusted in no need of reworking; and the support plate heating device has the advantages of high adjustment efficiency and saved cost and the like.
Description
Technical field
The present invention relates to microelectronics technology, particularly, relate to a kind of support plate heater and use the apparatus for processing plasma of this support plate heater.
Background technology
In the manufacture process of microelectronic products such as solar cell, semiconductor chip and TFT (Thin Film Transistor) panel, adopt a kind of plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition is called for short PECVD) technology to carry out PROCESS FOR TREATMENT widely.
See also Fig. 1, be a kind of schematic diagram of PECVD equipment commonly used.This equipment comprises: successively the loading platform of Lian Jieing, load chamber, processing chamber, unloading chamber and offload platform.Load chamber indoor be provided with warm-up block with so that support plate to be warming up to technology temperature required, correspondingly, be provided with refrigerating module with thinking that support plate lowers the temperature at the unloading chamber.The course of work of the said equipment is: in the loading platform zone workpiece to be processed is loaded on the support plate, and enters warm-up block and carry out The pre-heat treatment via loading chamber; After support plate reaches technological temperature, be transferred into processing chamber and carry out pecvd process; After finishing, technology then workpiece is spread out of by unloading chamber and offload platform.
In said process, support plate is understood more lost heats and temperature is reduced in the process that is transferred to processing chamber by the loading chamber, and carry out also needing to make support plate and workpiece to keep the stationary temperature scope in the process in technology, for this reason, in processing chamber, be provided with heater.
As shown in Figure 2, be the work schematic diagram of heater at present commonly used.Heater 20 is set at the below of support plate 10 usually and keeps certain interval with support plate 10, and it mainly heats support plate 10 by thermal-radiating mode.This is because need in technical process support plate 10 ground connection (carrying out ground connection by earthing rod 30) to form the loop of rf, if heater 20 can cause support plate 10 ground connection instabilities with support plate 10 tight contacts; And, for avoid support plate 10 when entering processing chamber and heater 20 friction takes place damages, also need to make support plate 10 and heater 20 to keep certain distances.Heater commonly used mainly is made of framework and the heater element that is arranged in the framework, and using more heater element at present is heating resistance wire.
See also Fig. 3, be the arrangement mode schematic diagram of resistance wire in the heater.Handle owing to need that in technical process water-cooled cooling is carried out in the processing chamber outside,, cause the rate of heat loss falls of support plate fringe region will be obviously greater than its central area so that the chamber sidewall temperature is scattered and disappeared is very fast.For remedying the thermal loss at support plate edge, the technical staff adopts the method that increases heater fringe region resistance wire winding density to increase being heated of support plate edge; But this canoe can make the overall resistance of resistance wire increase, thereby causes total heating power of heater to descend, and influences the heating efficiency of support plate integral body.
For this reason, the technical staff designs a kind of heater of partitioned organization.As shown in Figure 4, whole heating region is divided into 9 sub regions, distributes different heating powers, thereby reach the purpose that makes the support plate hygral equilibrium according to the rate of heat loss falls of each sub regions.Particularly, the heating power of each sub regions is distributed in the following manner: be numbered 5 subregion and be positioned at the center, thereby its heating power to be minimum; The heating power that is numbered 1,3,7,9 four sub regions about equally, and since the fastest institute of the support plate thermal loss of this four sub regions so that its power maximum; The heating power that is numbered 2,4,6,8 four sub regions about equally and its heating power between subregion 5 and subregion 1,3,7,9.
Though the heater of said structure can remedy the thermal loss at some support plate edges to a certain extent, but still have the following disadvantages: one, above-mentionedly have the heater of a plurality of partitioned organizations for subregion is set, framework and resistance wire fixed structure need be set at the intersection of each sub regions, thereby in the resistance wire density of intersection the resistance wire density of other position is obviously on the low side relatively, thereby the problem that causes intersection heating power deficiency, this problem will finally influence the uniformity that support plate is heated.Its two, above-mentioned support plate heater just is difficult to again subregion be adjusted or changed after machine-shaping, if find the unreasonable making again of just can only doing over again of subregion, not only wastes a large amount of equipment costs, and inefficiency, influences production process.
Summary of the invention
For addressing the above problem, the invention provides a kind of support plate heater, it can effectively improve the uniformity to the support plate heating, and need not to do over again and can regulate the position of heater, thereby effectively raises the efficiency, saves cost.
For addressing the above problem, the present invention also provides a kind of apparatus for processing plasma, and it can effectively improve the uniformity to the support plate heating equally, and raises the efficiency, saves cost.
For this reason, the invention provides a kind of support plate heater, be used for heating support plate at plasma process cavity, described support plate heater comprises the primary heater with a plurality of heating subregions, be provided with compensating heater near described primary heater, described compensating heater has the compensation heating subregion that compensates heating at the intersection of heating subregion on the primary heater.
Wherein, described compensating heater is arranged on the below of described primary heater.
Wherein, described support plate heater also comprises the edge heater that is arranged on described support plate marginal position place.
Wherein, described compensating heater comprises that framework and removable/dress ground are fixed in the heating element on the described framework, have a plurality of fixed positions of fixing described heating element on the described framework with being used for removable/dress, adjust the position of described compensation heating subregion by the fixed position of the described heating element of conversion on described framework.
Preferably, the adjustable power of the heating of the compensation on described compensating heater subregion.
Preferably, the adjustable power of the heating of each on described primary heater subregion.
Preferably, the power that respectively heats subregion in the described primary heater increases on by the direction at support plate center to edge district by district.
Wherein, in described heating subregion and compensation heating subregion, adopt resistance wire as heater element.
Preferably, described primary heater comprises 9 heating subregions, the described compensating heater that is arranged on the primary heater below comprises 4 compensation heating subregions, and described 4 compensation heating subregions compensate heating corresponding to the intersection that respectively heats subregion of described primary heater.
In addition, the present invention also provides a kind of apparatus for processing plasma, comprises processing chamber and is arranged on the interior support plate of processing chamber, is provided with the support plate heater that the invention described above provides near described support plate, in order to described support plate is evenly heated.
The present invention has following beneficial effect:
Support plate heater provided by the invention, comprise primary heater and be arranged near the compensating heater of described primary heater that this compensating heater comprises that the intersection to each heating subregion on the primary heater compensates the compensation heating subregion of heating with a plurality of heating subregions.Therefore, support plate heater provided by the invention can remedy the not enough problem of intersection heating that respectively heats subregion on primary heater, thereby effectively improves the being heated evenly property in each zone of support plate.In addition, in a preferred embodiment, the position of each compensation heating subregion on the above-mentioned compensating heater all can be conditioned, therefore, can be heated and the Temperature Distribution situation determines that best compensation heating location is to obtain desirable heats according to support plate, because the adjustment process of compensation heating subregion be need not to do over again and makes again, thereby can effectively save equipment cost and enhance productivity.
Apparatus for processing plasma provided by the invention comprises processing chamber, and is arranged on the support plate heater that the invention described above in the processing chamber provides, in order to support plate is heated and each zone of support plate is all remained in the technological temperature scope.Because apparatus for processing plasma provided by the invention is provided with the support plate heater that the invention described above provides, therefore it can effectively improve the being heated evenly property in each zone of support plate equally, and need not to do over again and to regulate the heater position, thereby save cost and raise the efficiency.
Description of drawings
Fig. 1 is a kind of systematic schematic diagram of apparatus for processing plasma;
Fig. 2 is a kind of fundamental diagram of the heater of comparatively using always at present;
Fig. 3 is the canoe schematic diagram of resistance wire in the heater shown in Figure 2;
Fig. 4 is the structural representation of the another kind of heater of comparatively using always at present;
Fig. 5 is the structural representation of a kind of specific embodiment of support plate heater provided by the invention;
Fig. 6 is the vertical view of support plate heater shown in Figure 5; And
Fig. 7 is the structural representation of the another kind of specific embodiment of support plate heater provided by the invention.
Embodiment
Support plate heater provided by the invention is used for heating support plate at plasma process cavity.Described support plate heater comprises a primary heater and is arranged near the compensating heater of primary heater.Wherein, primary heater has a plurality of heating subregions, each heating subregion diverse location of corresponding support plate respectively heats, and the adjustable power of each heating subregion, the heating power that respectively heats subregion is increased on by the direction at support plate center to edge district by district, that is, make the closer to the power of the heating subregion at support plate edge big more, thereby remedy the bigger problem of support plate edge rate of heat loss falls, each regional temperature of support plate is reached unanimity.Compensating heater be arranged on primary heater near, it has at least one compensation heating subregion, be used for compensating heating, to remedy the under powered problem of each heating subregion intersection of primary heater at the intersection that respectively heats subregion on the primary heater.Here, so-called compensation heating is meant the supplementary heating of carrying out at the under powered problem of intersection that respectively heats subregion on the primary heater, obtain enough heats so that be positioned at the support plate of primary heater subregion intersection, thereby each regional temperature of support plate is reached unanimity.Described compensating heater can be arranged on the below or the top of primary heater, and the compensation heating subregion in the compensating heater then is provided with corresponding to the subregion intersection of primary heater.Be understandable that the quantity of compensating heater can be decided according to actual conditions, for example when only adopting a compensating heater can satisfy the uniformity requirement of support plate heating, then need not to be provided with again more compensating heater.But, when a compensating heater is not enough to replenish primary heater and respectively heats the shortage of heat of subregion intersection, then need to be provided with a plurality of compensating heaters with more preferably support plate heating.
Concrete, described primary heater is made up of framework and heating element etc., and here, the heating element that is usually used in the support plate heater in processing chamber is the armouring resistance wire.Owing to primary heater will be divided into a plurality of heating subregions, so its framework is the structure of a plurality of panes, heating element is fixedly installed in each pane.
Described compensating heater comprises that framework and removable/dress ground are fixed in the heating element on the described framework.Have a plurality of fixed positions of fixing described heating element on described framework, each place, fixed position is provided with and is used for fixing the fixed structure that heating element is installed with being used for removable/dress.The said fixing position is dismountable structure, for example can adopt structure such as screw, jig and realizes dismountable fixing to heating element, thereby make heating element tear open/to adorn between a plurality of fixed positions on the said frame.Like this, the distributing position of the compensation heating subregion on the compensating heater depends on the fixed position that heating element connects, and therefore, adjusts the position of described compensation heating subregion by the fixed position of the described heating element of conversion on described framework.
For making those skilled in the art understand technical scheme of the present invention better, support plate heater provided by the invention and the apparatus for processing plasma of using this heater are described in detail below in conjunction with accompanying drawing.
See also Fig. 5 and Fig. 6, be the structural representation of first kind of specific embodiment of support plate heater provided by the invention.This support plate heater is set at the support plate below in the plasma process cavity, and it comprises primary heater 21 and a compensating heater 22.
In the present embodiment, primary heater 21 is made up of nine heating subregions that are numbered 1-9, on each heating subregion, heating element is set respectively, for example can adopt the armouring resistance wire to use as heating element, certainly, the heating element of other type that those skilled in the art used always can be used in the support plate heater provided by the invention equally.Wherein, be numbered 5 heating subregion center corresponding to support plate 10, heat at four angles that are numbered 1,3,7,9 four corresponding respectively support plates 10 of heating subregion, be numbered four heating subregions of 2,4,6,8 correspond respectively to support plate four edges the centre position and heat.Be numbered four heating power maximums that heat subregions of 1,3,7,9 in order to compensate the thermal loss at support plate edge, can to make,, and make its thermal loss the fastest because these four region distance support plate centers farthest; Be numbered 2,4,6,8 four heating subregions because more nearer, thereby its heating power also can be slightly smaller apart from four heating subregions apart from relative numbering 1,3,7,9 at support plate center; At last, be positioned at the positive central area of support plate owing to be numbered 5 heating subregion, support plate is minimum in this regional rate of heat loss falls, thereby can make the heating power that is numbered 5 heating subregion minimum.Be understandable that the power of above-mentioned each heating subregion is all adjustable, specifically can realize by regulating each input power that heats the power supply of subregion.It is to be noted; support plate heater provided by the invention is not limited to the schemes that primary heater in the present embodiment is set to nine heating subregions; in actual applications; can change and adjust according to concrete needs for the subregion of primary heater, the modification of having done without departing from the spirit and substance in the present invention and improve and to be considered as protection scope of the present invention.
In the present embodiment, compensating heater 22 is arranged on the below of primary heater 21, and this compensating heater 22 is respectively 221,222,223,224 four compensation heating subregions by numbering and constitutes.Wherein, each compensation heating subregion is provided with corresponding to the intersection that respectively heats subregion on the primary heater 21, particularly, compensation heating subregion 221 is arranged on being numbered 1 heating subregion and being numbered two intersections that heat subregions of 2 and 4 on the primary heater 21; Compensation heating subregion 222 is arranged on being numbered 3 heating subregion and being numbered two intersections that heat subregions of 2 and 6 on the primary heater 21; Compensation heating subregion 223 is arranged on being numbered 7 heating subregion and being numbered two intersections that heat subregions of 4 and 8 on the primary heater 21; Compensation heating subregion 224 is arranged on being numbered 9 heating subregion and being numbered two intersections that heat subregions of 8 and 6 on the primary heater 21.Like this, intersection corresponding to all heating subregions of support plate 10 fringe regions on the primary heater 21 is all covered by above-mentioned compensating heater 22, thereby has avoided causing because of the heating subregion intersection on the primary heater 21 heating subregion intersection of support plate edge (especially near) heating is not enough the support plate uneven problem of being heated.
In addition, the position of the compensation of each on the above-mentioned compensating heater 22 heating subregion all can be adjusted according to the heating needs of reality.Particularly, each compensation heating subregion on the compensating heater 22 can be arranged on the framework with a plurality of fixed positions, and a plurality of fixed structures that are used for removable/dress ground fixed compensations heating subregion are set on each fixed position, in the time need adjusting to the position of a certain compensation heating subregion, then will compensate the heating subregion and take off, be installed in then on the fixed structure in precalculated position from the fixed structure of current position.Perhaps, on the framework of compensating heater 22, be provided with a plurality of removable/dress the fixing fixed structure of heating element, position according to required compensation heating subregion is fixed on corresponding heating element on the framework then, when the position of subregion is heated in needs adjustment compensation, corresponding heating element is taken off, and the desired location that reinstalls on the framework gets final product.The framework of above-mentioned primary heater and compensating heater can adopt metal materials such as reinforcing bar, processes by modes such as bending and welding.
In addition, the power of above-mentioned each compensation heating subregion also is adjustable, and the power of all compensation heating subregions is all equated, the power of part compensation heating subregion is equated, perhaps can also make the power of each compensation heating subregion all different with other compensation heating subregion.
It is pointed out that support plate heater provided by the invention is not limited thereto, at first, the compensating heater that in the foregoing description, is adopted, can also set up a plurality of compensating heaters, in order to better support plate is compensated heating.In addition; dividing mode for the heating subregion on the primary heater also can have various deformation; for example primary heater is set to have the structure of more or less heating number of partitions; perhaps change shared ratio of each heating subregion or the like; and no matter how the heating subregion of primary heater changes; as long as make the compensation heating subregion on the compensating heater compensate heating, and all distortion and improvement of having done based on above-mentioned thought all should be considered as the scope that the present invention protects corresponding to the intersection of each heating subregion on the primary heater.
In sum, support plate heater provided by the invention comprises primary heater and compensating heater, wherein, a plurality of heating subregions on the primary heater can realize the support plate zones of different is carried out the heating of different capacity, and the power of each heating subregion increases district by district along with the increase of each heating subregion and support plate centre distance, thereby efficiently solves support plate edge thermal loss problem faster; Simultaneously, compensating heater compensates heating at intersection of each heating subregion on the primary heater, makes to be positioned at the support plate zone that primary heater respectively heats the subregion intersection and fully to be heated, thereby each regional temperature of support plate is reached unanimity.And the position of each the compensation heating subregion on the above-mentioned compensating heater also can be adjusted according to actual needs, thereby can be heated and the Temperature Distribution situation determines that the compensation heating location of the best is to obtain desirable heats according to support plate; Again because the adjustment process of compensation heating subregion be need not to do over again and makes again, therefore, can effectively save equipment cost and enhance productivity.
See also Fig. 7, be the structural representation of second kind of specific embodiment of support plate heater provided by the invention.Support plate heater shown in the present embodiment is on the basis of structure shown in above-mentioned first kind of specific embodiment, increased an edge heater 23, this edge heater 23 be arranged on support plate 10 edges around, thereby can directly heat support plate 10 edges, with the thermal loss at compensation support plate 10 edges.Except that having increased edge heater 23, the structure of the support plate heater shown in the present embodiment and characteristics are all similar with above-mentioned first kind of embodiment, do not repeat them here.
As another kind of technical scheme, the present invention also provides a kind of apparatus for processing plasma, comprise processing chamber and be arranged on the interior support plate of processing chamber, near described support plate, be provided with the support plate heater that the invention described above provides, in order to described support plate is evenly heated.
Apparatus for processing plasma provided by the invention, because the support plate heater that has adopted the invention described above to provide, therefore, it can evenly heat support plate equally, and can change the position and the power of compensation heating subregion according to actual needs, thereby have higher adjustment efficient, and can save great amount of manpower and equipment cost.
Be understandable that above execution mode only is the illustrative embodiments that adopts for principle of the present invention is described, yet the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement also are considered as protection scope of the present invention.
Claims (10)
1. support plate heater, described support plate heater comprises the primary heater with a plurality of heating subregions, it is characterized in that, be provided with compensating heater near described primary heater, described compensating heater has the compensation heating subregion that compensates heating at the intersection of heating subregion on the primary heater.
2. support plate heater according to claim 1 is characterized in that described compensating heater is arranged on the below of described primary heater.
3. support plate heater according to claim 1 and 2 is characterized in that, also comprises the edge heater that is arranged on described support plate marginal position place.
4. support plate heater according to claim 1, it is characterized in that, described compensating heater comprises that framework and removable/dress ground are fixed in the heating element on the described framework, have a plurality of fixed positions of fixing described heating element on the described framework with being used for removable/dress, adjust the position of described compensation heating subregion by the fixed position of the described heating element of conversion on described framework.
5. support plate heater according to claim 1 is characterized in that, the adjustable power of the compensation heating subregion on the described compensating heater.
6. support plate heater according to claim 1 is characterized in that, the adjustable power of each heating subregion on the described primary heater.
7. support plate heater according to claim 1 is characterized in that, the power that respectively heats subregion in the described primary heater increases on by the direction at support plate center to edge district by district.
8. support plate heater according to claim 1 is characterized in that, adopts resistance wire as heating element in described heating subregion and compensation heating subregion.
9. support plate heater according to claim 2, it is characterized in that, described primary heater comprises 9 heating subregions, the described compensating heater that is arranged on the primary heater below comprises 4 compensation heating subregions, and described 4 compensation heating subregions compensate heating corresponding to the intersection that respectively heats subregion of described primary heater.
10. apparatus for processing plasma, comprise processing chamber and be arranged on the interior support plate of processing chamber, it is characterized in that, near described support plate, be provided with any described support plate heater among the claim 1-9, in order to described support plate is evenly heated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102183174A CN102300342A (en) | 2010-06-24 | 2010-06-24 | Support plate heating device and plasma processor using same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102183174A CN102300342A (en) | 2010-06-24 | 2010-06-24 | Support plate heating device and plasma processor using same |
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| CN102300342A true CN102300342A (en) | 2011-12-28 |
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| CN2010102183174A Pending CN102300342A (en) | 2010-06-24 | 2010-06-24 | Support plate heating device and plasma processor using same |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107761077A (en) * | 2017-10-20 | 2018-03-06 | 京东方科技集团股份有限公司 | A kind of film plating process, device and PECVD device |
| CN110867403A (en) * | 2019-11-27 | 2020-03-06 | 湖南红太阳光电科技有限公司 | Substrate heating system |
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Application publication date: 20111228 |