CN102269310A - Rotating joint - Google Patents
Rotating joint Download PDFInfo
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- CN102269310A CN102269310A CN2010101908415A CN201010190841A CN102269310A CN 102269310 A CN102269310 A CN 102269310A CN 2010101908415 A CN2010101908415 A CN 2010101908415A CN 201010190841 A CN201010190841 A CN 201010190841A CN 102269310 A CN102269310 A CN 102269310A
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- cun
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- rotor
- rotating joint
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention relates to a rotating joint, in particular to a rotating joint applied to the field of manufacturing of semiconductor equipment. The rotating joint comprises a joint seat, a stator, a rotor, a sealing ring, a ceramic basic disc and a ceramic sucking disc, wherein a 4-inch channel is formed in the center of the rotor; channels are formed at the periphery of the 4-inch channel and consist of a 5-inch channel, a 6-inch channel and an 8-inch channel; the 5-inch, 6-inch and 8-inch channels enclose the 4-inch channel at an angle of 120 degrees; and the 4-inch channel and the channels are communicated with a pipeline in the ceramic sucking disc respectively. The rotating joint can process wafers of different specifications under the condition of not replacing a fixture, and water, vacuum and gas can pass through the rotating joint simultaneously.
Description
Technical field
The present invention relates to a kind of swivel joint, particularly a kind of swivel joint that is applied to semiconductor equipment manufacturing field.
Background technique
In the semiconductor equipment manufacturing, there are a plurality of technological processes of wafer process, much all need be in the process of worktable rotation in these technological processes, allow passing through of water, vacuum, gas, but existing swivel joint only allows water, vacuum, a kind of medium of gas to pass through mostly, and has only a passage mostly, therefore can only process a kind of wafer of specification, realize passing through of multichannel water, vacuum, gas, just need to adopt more swivel joint, thereby produce the increase of equipment volume, the increase of cost, and the fluctuation of service of equipment or the like.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of swivel joint that jig just can be processed the different size wafer of not changing, and it can realize passing through of water, vacuum, gas simultaneously.
In order to solve the problems of the technologies described above, the technological scheme that the present invention takes is: swivel joint comprises connection block, be arranged on the stator on the connection block, be arranged on the conversion adapter on the connection block, the rotor that is connected with the stator suit, the seal ring that is connected with the rotor suit, ceramic basal disc of fixedlying connected and ceramic sucker with rotor, be provided with 4 cun passages in described centre of rotor, around 4 cun passages, be provided with passage, passage is by 5 cun, 6 cun and 8 cun passages compositions, 5 cun, 6 cun become 120 degree angles around described 4 cun passage settings with 8 cun passages, described 4 cun passages and passage are connected with pipeline in the ceramic sucker respectively.
The invention has the beneficial effects as follows: rotor of the present invention and ceramic basal disc are fixed together, the two is under the driving of drive unit, and rotation is equipped with bearing between stator and the rotor together, can realize relative movement between the two, guarantee the conveying of water, vacuum, gas in the rotary course.
Seal ring has excellent sealing ability, can guarantee in mechanism's rotary course, and vacuum, water, several media of gas do not leak.
The present invention adopts 4 paths, and water, vacuum or gas all can be passed through in each road.By closing control, can realize operations such as vacuum suction, the air blowing to 4,5,6 or 8 cun wafers floated, water flushing respectively to passage.Be described as follows:
Close 5,6,8 cun passages, only open 4 cun passages, this conversion adapter just can be realized operations such as vacuum suction, the air blowing to 4 cun wafers floated, water flushing.
Close 6,8 cun passages, only open 4,5 cun passages, this conversion adapter just can be realized operations such as vacuum suction, the air blowing to 5 cun wafers floated, water flushing.
Close 8 cun passages, open 4,5,6 cun passages, this conversion adapter just can be realized operations such as vacuum suction, the air blowing to 6 cun wafers floated, water flushing.
Open all passages, this conversion adapter just can be realized operations such as vacuum suction, the air blowing to 8 cun wafers floated, water flushing.
Description of drawings
Fig. 1 is a structural representation of the present invention;
Fig. 2 is the partial enlarged drawing of Fig. 1;
Fig. 3 is a ceramic sucker structure schematic representation of the present invention.
In the drawings: 1 ceramic sucker, 2 ceramic basal discs, 3 plug I, 4 rotors, 5 plug II, 6 stators, 7 bearings, 8 back-up rings, 9 connection blocks, 10 conversion adapters, 11 locknuts, 12 seal rings, 134 cun passages, 14 passages, 15 connecting passages, 164 cun sections, 175 cun sections, 186 cun sections, 198 cun sections.
Embodiment
As depicted in figs. 1 and 2, swivel joint comprises connection block 9, be arranged on the stator 6 on the connection block 9, the rotor 4 that is connected with stator 6 suits, the seal ring 12 that is connected with rotor 4 suits, ceramic basal disc 2 of fixedlying connected and ceramic sucker 1 with rotor 4, be provided with between rotor 4 and the stator 6 and use so that the bearing 7 of rotor 4 smooth runnings, thereby with locknut 11 fixing guarantee between the two relative movement and in rotary course water, vacuum, the conveying of gas, connection block 9 is provided with conversion adapter 10, load onto quick release coupling above, it is the inlet of passage, seal ring 12 has excellent sealing ability, can guarantee in mechanism's rotary course vacuum, water, several media of gas do not leak.Be provided with four cun passages 13 at the center of rotor 4, around four cun passages 13, be provided with passage 14, passage is made up of 5 cun, 6 cun and 8 cun passages, 5 cun, 6 cun become 120 degree angles to be provided with around four cun passages 13 with 8 cun passages, 4 cun passages 13 are connected with pipeline in the ceramic sucker 1, and 5 cun, 6 cun and 8 cun passages are connected by connecting passage 15 and ceramic sucker 1 interior pipeline respectively.
As shown in Figure 3, be arranged on 4 cun passages 13 in the rotor 4 and 5 cun, 6 cun, 8 cun passages and correspond respectively to 18,8 cun sections 19,17,6 cun sections, 16,5 cun sections, 4 cun sections in the ceramic sucker 1, water, vacuum or gas all can be passed through in each road.By closing control, can realize operations such as vacuum suction, the air blowing to 4,5,6 or 8 cun wafers floated, water flushing respectively to passage.Be described as follows:
Close 5,6,8 cun passages, only open 4 cun passages, this conversion adapter 10 just can be realized operations such as vacuum suction, the air blowing to 4 cun wafers floated, water flushing.
Close 6,8 cun passages, only open 4,5 cun passages, this conversion adapter 10 just can be realized operations such as vacuum suction, the air blowing to 5 cun wafers floated, water flushing.
Close 8 cun passages, open 4,5,6 cun passages, this conversion adapter 10 just can be realized operations such as vacuum suction, the air blowing to 6 cun wafers floated, water flushing.
Open all passages, this conversion adapter 10 just can be realized operations such as vacuum suction, the air blowing to 8 cun wafers floated, water flushing.
Claims (1)
1. swivel joint, it is characterized in that it comprises connection block (9), be arranged on the stator (6) on the connection block (9), be arranged on the conversion adapter (10) on the connection block (9), the rotor (4) that is connected with stator (6) suit, the seal ring (12) that is connected with rotor (4) suit, ceramic basal disc (2) of fixedlying connected and ceramic sucker (1) with rotor (4), be provided with 4 cun passages (13) at the center of described rotor (4), around 4 cun passages (13), be provided with passage (14), passage (14) is by 5 cun, 6 cun and 8 cun passages compositions, 5 cun, 6 cun become 120 degree angles to be provided with around described 4 cun passages (13) with 8 cun passages, described 4 cun passages (13) and passage (14) are connected with the interior pipeline of ceramic sucker (1) respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101908415A CN102269310A (en) | 2010-06-03 | 2010-06-03 | Rotating joint |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101908415A CN102269310A (en) | 2010-06-03 | 2010-06-03 | Rotating joint |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102269310A true CN102269310A (en) | 2011-12-07 |
Family
ID=45051693
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101908415A Pending CN102269310A (en) | 2010-06-03 | 2010-06-03 | Rotating joint |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102269310A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104882402A (en) * | 2014-02-28 | 2015-09-02 | 上海微电子装备有限公司 | Substrate carrying device |
| CN105291006A (en) * | 2014-07-29 | 2016-02-03 | 盛美半导体设备（上海）有限公司 | Vacuum chuck |
| CN114179046A (en) * | 2021-11-30 | 2022-03-15 | 深圳市华腾半导体设备有限公司 | Electric conduction workbench capable of realizing free rotation |
| CN115431169A (en) * | 2022-08-24 | 2022-12-06 | 中国电子科技集团公司第十三研究所 | Vacuum connection conversion device, slide polishing method and polishing machine |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101221920A (en) * | 2007-12-25 | 2008-07-16 | 中国电子科技集团公司第四十五研究所 | Wafer adsorption mechanism |
| CN101276776A (en) * | 2007-03-30 | 2008-10-01 | 株式会社迪思科 | Chuck worktable machanism |
| US20090101285A1 (en) * | 2007-10-22 | 2009-04-23 | Semes Co., Ltd. | Wafer spin chuck and an etcher using the same |
| CN101660141A (en) * | 2008-08-29 | 2010-03-03 | 东京毅力科创株式会社 | Film deposition apparatus and substrate process apparatus |
-
2010
- 2010-06-03 CN CN2010101908415A patent/CN102269310A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276776A (en) * | 2007-03-30 | 2008-10-01 | 株式会社迪思科 | Chuck worktable machanism |
| US20090101285A1 (en) * | 2007-10-22 | 2009-04-23 | Semes Co., Ltd. | Wafer spin chuck and an etcher using the same |
| CN101221920A (en) * | 2007-12-25 | 2008-07-16 | 中国电子科技集团公司第四十五研究所 | Wafer adsorption mechanism |
| CN101660141A (en) * | 2008-08-29 | 2010-03-03 | 东京毅力科创株式会社 | Film deposition apparatus and substrate process apparatus |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104882402A (en) * | 2014-02-28 | 2015-09-02 | 上海微电子装备有限公司 | Substrate carrying device |
| CN104882402B (en) * | 2014-02-28 | 2018-03-13 | 上海微电子装备（集团）股份有限公司 | A kind of substrate bearing device |
| CN105291006A (en) * | 2014-07-29 | 2016-02-03 | 盛美半导体设备（上海）有限公司 | Vacuum chuck |
| CN114179046A (en) * | 2021-11-30 | 2022-03-15 | 深圳市华腾半导体设备有限公司 | Electric conduction workbench capable of realizing free rotation |
| CN115431169A (en) * | 2022-08-24 | 2022-12-06 | 中国电子科技集团公司第十三研究所 | Vacuum connection conversion device, slide polishing method and polishing machine |
| CN115431169B (en) * | 2022-08-24 | 2023-09-01 | 中国电子科技集团公司第十三研究所 | Vacuum connection conversion device, slide polishing method and polishing machine |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20111207 |