CN102175314A - Enhanced film bulk acoustic wave resonance ultraviolet detector - Google Patents

Enhanced film bulk acoustic wave resonance ultraviolet detector Download PDF

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Publication number
CN102175314A
CN102175314A CN 201110035317 CN201110035317A CN102175314A CN 102175314 A CN102175314 A CN 102175314A CN 201110035317 CN201110035317 CN 201110035317 CN 201110035317 A CN201110035317 A CN 201110035317A CN 102175314 A CN102175314 A CN 102175314A
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China
Prior art keywords
ultraviolet light
ultraviolet
bulk acoustic
detector
acoustic wave
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Pending
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CN 201110035317
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Chinese (zh)
Inventor
王璟璟
陈达
张玉萍
张会云
干耀国
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Shandong University of Science and Technology
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Shandong University of Science and Technology
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Priority to CN 201110035317 priority Critical patent/CN102175314A/en
Publication of CN102175314A publication Critical patent/CN102175314A/en
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Abstract

The invention discloses an enhanced film bulk acoustic wave resonance ultraviolet detector which comprises a piezoelectric film resonator, an ultraviolet reflecting film and a transparent conductive film, wherein a high-frequency bulk acoustic wave is used as the resonance mode of the detector; the ultraviolet reflecting film and the transparent conductive film are used for enhancing the absorption of the piezoelectric film to the ultraviolet light and increasing the sensitivity of the detector; and a doped zinc oxide material serves as a piezoelectric film layer, so the dosage concentration of magnesium can be adjusted according to the ultraviolet centre wavelength to be measured and the sensitive scope covers a wider spectrum region from low ultraviolet to deep ultraviolet. A bragg reflection layered structure is adopted, thus the mechanical firmness is high and the impact resistance is high. The detector can be applied to the civil and military fields of aerospace engineering, flame detection, biological effect, things of network, environmental monitoring, and the like.

Description

The ultraviolet light detector of enhanced film bulk acoustic resonator
Technical field
The present invention relates to the ultraviolet light detector technical field, specifically, relate to the ultraviolet light detector of a kind of enhanced film bulk acoustic resonator.
Background technology
Ultraviolet light detector is a kind of very important optoelectronic device, is applied to civilian, military domain such as aerospace engineering, flame detecting, biological effect, communication and environmental monitoring.At present, the ultraviolet detector that has put it into commercial operation, mainly contain ultraviolet vacuum diode, ultravioplet photomultiplier, ultraviolet enhancer, ultraviolet pick-up tube and solid violet external detector etc., wherein Chang Yong photoconduction that is based on wide bandgap semiconductor materials and p-n junction device.Photoconduction and the ultraviolet light detector of p-n junction type all are to utilize the photo-generated carrier of semiconductor material to detect, and generally need the epitaxial semiconductor monocrystal thin films of high-crystal quality, and manufacturing cost is higher.
Resonant transducer is a kind of to detect its resonance frequency, phase place or the amplitude sensor that is changed to response with detection material, has been applied to multiple biochemistry detection field at present., existing literature finds that people such as the upright X.Qiu of university of State of Arizona, US have announced a kind of bulk acoustic wave ultraviolet light detector in 2009 for 191517 pages at Applied Physics Letters (applied physics wall bulletin) the 94th volume through being retrieved.This bulk acoustic wave ultraviolet light detector is a core devices with a kind of piezoelectric thin film vibrator, excites high frequency bulk acoustic wave resonance about 1.46 GHzs by extra electric field in zno piezoelectric thin film.When UV-irradiation, the partial oxygen composition in the zno piezoelectric thin film breaks away from, and density changes, and causes that resonance frequency raises.Can detect ultraviolet ray intensity by the amplitude of measuring the rising of detector resonance frequency.Detector based on this principle only needs the polycrystalline piezoelectric membrane, and cost is lower.In addition, the high-frequency signal response speed is fast, noise is low, resolution is high, and is more conducive to digitizing and wireless transmission, more is applicable to wireless sensor network.But still there are many defectives in above-mentioned bulk acoustic wave ultraviolet light detector, as adopting the lower gold of ultraviolet transmission rate as top electrode, has influenced the sensitivity of piezoelectric membrane to ultraviolet light; Adopt intrinsic zinc paste as piezoelectric film material, the response spectrum interval is narrower and can't adjust; Adopt unsettled diaphragm structure, mechanical fastness is relatively poor.
Summary of the invention
The present invention is directed to the deficiencies in the prior art and defective, proposed the ultraviolet light detector of a kind of enhanced film bulk acoustic resonator.This detector utilizes existing microelectric technique to make, and it is interval wide and can adjust to have highly sensitive a, response spectrum, and mechanical fastness is strong, and detection signal is easy to advantages such as digitized processing, and is easy to realize array and as the sensor terminal of Internet of Things.
The present invention is achieved by the following technical solutions:
The ultraviolet light detector of a kind of enhanced film bulk acoustic resonator, comprise piezoelectric thin film vibrator, ultraviolet light reflectance coating and nesa coating, it is characterized in that, have the ultraviolet light reflectance coating and, set gradually substrate, sound wave Bragg reflecting layer, metal bottom electrode, ultraviolet light reflectance coating, piezoelectric membrane, nesa coating from bottom to top as the nesa coating of top electrode.
Described piezoelectric membrane is magnesium-doped zinc oxide material, and its preferred thickness is the 1-1.5 micron, and the doping content of magnesium is 1% to 3%.
Described ultraviolet light reflectance coating is magnesium fluoride or aluminium nitride film, its thickness be required measurement ultraviolet light centre wavelength 1/2nd.
Described nesa coating is the zinc oxide material of adulterated al, its thickness be required measurement ultraviolet light centre wavelength 1/4th, the doping content of aluminium is 1% to 10%.
The present invention utilizes extra electric field to be activated at and produces bulk acoustic wave resonance in the piezoelectric thin film vibrator, when UV-irradiation, partial oxygen composition in the zno piezoelectric thin film that is adsorbed on doping is broken away from, thereby its density is changed, this will cause that the bulk acoustic wave resonance frequency raises.The desorption rate of oxygen composition depends on incident uv intensity, and therefore the amplitude that raises by the survey sensor resonance frequency just can detect the intensity of incident uv.
Compare with technology in the past, the invention has the beneficial effects as follows: (1) utilizes the ultraviolet light reflectance coating that unabsorbed ultraviolet light is reflected once more and enters piezoelectric membrane, and use the less nesa coating alternative metals of UV Absorption as top electrode, strengthened the absorption of piezoelectric membrane, thereby improved detector sensitivity ultraviolet light; (2) use the zinc oxide material of doping as the piezoelectric sensitivity layer, can adjust the doping content of magnesium according to the ultraviolet light centre wavelength of required measurement, its sensitive range covers the broad spectrum range of low ultraviolet to deep ultraviolet, and this all has extremely important using value in the civilian and military field; (3) adopt the sound wave Bragg reflecting layer to substitute the diaphragm structure, mechanical fastness height, anti-impact force is strong.
Description of drawings
Accompanying drawing 1 is a cross-sectional view of the present invention
Accompanying drawing 2 is the resonance frequency of the embodiment of the invention 1 is subjected to energy when being 0.35 micron UV-irradiation of 0.1 to 0.3 milliwatt device.
Accompanying drawing 3 is the impedance frequency response before and after the embodiment of the invention 2 irradiating ultraviolet light.
Drawing explanation: 1, substrate; 2, sound wave Bragg reflecting layer; 3, metal bottom electrode; 4, ultraviolet light reflectance coating; 5, piezoelectric sensitivity layer; 6, nesa coating
Embodiment
The ultraviolet light detector of a kind of enhanced film bulk acoustic resonator, comprise piezoelectric thin film vibrator, ultraviolet light reflectance coating and nesa coating, it is characterized in that, have ultraviolet light reflectance coating 4 and, set gradually substrate 1, sound wave Bragg reflecting layer 2, metal bottom electrode 3, ultraviolet light reflectance coating 4, piezoelectric membrane 5, nesa coating 6 from bottom to top as the nesa coating 6 of top electrode.
Embodiment 1
Present embodiment is for being 0.35 micron ultraviolet light detector at surveying centre wavelength.
Substrate 1 is the silicon chip of (100) orientation.
Sound wave Bragg reflecting layer 2 is the tungsten in three cycles and the crossover layer of monox.
Metal bottom electrode 3 is an aluminium.
Ultraviolet light reflectance coating 4 is a magnesium fluoride film, and thickness is 0.175 micron.
Piezoelectric membrane 5 is magnesium-doped zinc oxide material, and its thickness is 1.2 microns, and the doping content of magnesium is 2%.
Nesa coating 6 is the zinc oxide material of adulterated al, and its thickness is 0.0875 micron, and the doping content of aluminium is 8%.
During work, apply the radio frequency alternate electrical signal between metal bottom electrode 3 and the nesa coating 6, excitation bulk acoustic wave resonance in piezoelectric membrane.As shown in Figure 2, during no UV-irradiation, the device resonance frequency is 2530 megahertzes.When energy is that 0.35 micron ultraviolet lighting of 0.1 to 0.3 milliwatt is mapped to device constantly, make to be adsorbed on oxygen generation desorption in the magnesium-doped zinc paste, cause its density to change, thereby cause that the bulk acoustic wave resonance frequency raises.By external frequency detection circuit, can detect change of resonance frequency, obtain the energy value of ultraviolet light.
Embodiment 2
Present embodiment is for being 0.3 micron ultraviolet light detector at surveying centre wavelength.
Substrate 1 is the silicon chip of (100) orientation.
Sound wave Bragg reflecting layer 2 is the tungsten in three cycles and the crossover layer of monox.
Metal bottom electrode 3 is an aluminium.
Ultraviolet light reflectance coating 4 is an aluminium nitride film, and thickness is 0.15 micron.
Piezoelectric membrane 5 is magnesium-doped zinc oxide material, and its thickness is 1.5 microns, and the doping content of magnesium is 2%.
Nesa coating 6 is the zinc oxide material of adulterated al, and its thickness is 0.075 micron, and the doping content of aluminium is 4%.
During work, apply the radio frequency alternate electrical signal between metal bottom electrode 3 and the nesa coating 6, excitation bulk acoustic wave resonance in piezoelectric membrane.As shown in Figure 3, during no UV-irradiation, the device resonance frequency is 2011 megahertzes.When energy is that 0.35 micron ultraviolet lighting of 0.1 to 0.3 milliwatt is mapped to device constantly, make to be adsorbed on oxygen generation desorption in the magnesium-doped zinc paste, cause its density to change, thereby cause that the bulk acoustic wave resonance frequency raises.By external frequency detection circuit, can detect change of resonance frequency, obtain the energy value of ultraviolet light.

Claims (4)

1. enhanced film bulk acoustic resonator ultraviolet light detector, comprise piezoelectric thin film vibrator, ultraviolet light reflectance coating and nesa coating, it is characterized in that, have ultraviolet light reflectance coating (4) and, set gradually substrate (1), sound wave Bragg reflecting layer (2), metal bottom electrode (3), ultraviolet light reflectance coating (4), piezoelectric membrane (5) and nesa coating (6) from bottom to top as the nesa coating (6) of top electrode.
2. enhanced film bulk acoustic resonator according to claim 1 ultraviolet light detector is characterized in that, described piezoelectric membrane (5) is magnesium-doped zinc oxide material, and its preferred thickness is the 1-1.5 micron, and the doping content of magnesium is 1% to 3%.
3. enhanced film bulk acoustic resonator according to claim 1 ultraviolet light detector is characterized in that, described ultraviolet light reflectance coating (4) is magnesium fluoride or aluminium nitride film, its thickness be required measurement ultraviolet light centre wavelength 1/2nd.
4. enhanced film bulk acoustic resonator according to claim 1 ultraviolet light detector, it is characterized in that, described nesa coating (6) is the zinc oxide material of adulterated al, its thickness be required measurement ultraviolet light centre wavelength 1/4th, the doping content of aluminium is 1% to 10%.
CN 201110035317 2011-02-10 2011-02-10 Enhanced film bulk acoustic wave resonance ultraviolet detector Pending CN102175314A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104030234A (en) * 2014-06-04 2014-09-10 江苏艾伦摩尔微电子科技有限公司 MEMS (Micro Electro Mechanical System) infrared sensor based on film bulk acoustic resonator and preparation method of MEMS infrared sensor
CN107007287A (en) * 2017-05-23 2017-08-04 中国科学院电子学研究所 Biomolecule detection devices and method
CN107850486A (en) * 2015-07-17 2018-03-27 电子部品研究院 Multiple optical sensor and its manufacture method
CN109052312A (en) * 2018-07-20 2018-12-21 中国电子科技集团公司第四十四研究所 Enhance the low-light grid optical cavity structure and its manufacturing method of the response of silicon detector near-infrared

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CN1638036A (en) * 2004-01-09 2005-07-13 Tdk株式会社 Structural body for producing electronic device and method for producing electronic device using the same
CN101005105A (en) * 2007-01-19 2007-07-25 南京大学 Gallium nitride base resonant chamber reinforced ultravivlet photoelectric detector and preparing method
CN101634643A (en) * 2008-07-24 2010-01-27 鸿富锦精密工业(深圳)有限公司 Surface acoustic wave sensor
CN101958696A (en) * 2010-09-27 2011-01-26 张�浩 Temperature compensation film bulk wave resonator and processing method thereof
CN202008402U (en) * 2011-02-10 2011-10-12 山东科技大学 Enhanced film body acoustic wave resonance ultraviolet detector

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1638036A (en) * 2004-01-09 2005-07-13 Tdk株式会社 Structural body for producing electronic device and method for producing electronic device using the same
CN101005105A (en) * 2007-01-19 2007-07-25 南京大学 Gallium nitride base resonant chamber reinforced ultravivlet photoelectric detector and preparing method
CN101634643A (en) * 2008-07-24 2010-01-27 鸿富锦精密工业(深圳)有限公司 Surface acoustic wave sensor
CN101958696A (en) * 2010-09-27 2011-01-26 张�浩 Temperature compensation film bulk wave resonator and processing method thereof
CN202008402U (en) * 2011-02-10 2011-10-12 山东科技大学 Enhanced film body acoustic wave resonance ultraviolet detector

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104030234A (en) * 2014-06-04 2014-09-10 江苏艾伦摩尔微电子科技有限公司 MEMS (Micro Electro Mechanical System) infrared sensor based on film bulk acoustic resonator and preparation method of MEMS infrared sensor
CN104030234B (en) * 2014-06-04 2016-01-13 江苏艾伦摩尔微电子科技有限公司 The MEMS infrared sensor preparation method of based thin film bulk acoustic wave resonator
CN107850486A (en) * 2015-07-17 2018-03-27 电子部品研究院 Multiple optical sensor and its manufacture method
CN107850486B (en) * 2015-07-17 2020-06-16 电子部品研究院 Multiple light sensor and method for manufacturing the same
CN107007287A (en) * 2017-05-23 2017-08-04 中国科学院电子学研究所 Biomolecule detection devices and method
CN109052312A (en) * 2018-07-20 2018-12-21 中国电子科技集团公司第四十四研究所 Enhance the low-light grid optical cavity structure and its manufacturing method of the response of silicon detector near-infrared
CN109052312B (en) * 2018-07-20 2020-08-18 中国电子科技集团公司第四十四研究所 Micro-grating optical cavity structure for enhancing near-infrared response of silicon detector and manufacturing method thereof

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Application publication date: 20110907