CN102131743A - Process for producing flexible glass substrate, and flexible glass substrate - Google Patents

Process for producing flexible glass substrate, and flexible glass substrate Download PDF

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Publication number
CN102131743A
CN102131743A CN200980116843.5A CN200980116843A CN102131743A CN 102131743 A CN102131743 A CN 102131743A CN 200980116843 A CN200980116843 A CN 200980116843A CN 102131743 A CN102131743 A CN 102131743A
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China
Prior art keywords
glass substrate
supporter
etch processes
opposite side
bonded
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CN200980116843.5A
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Chinese (zh)
Inventor
吉川実
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Micro Technology Co Ltd Japan
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Micro Technology Co Ltd Japan
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/302—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers
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    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/304—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl halide (co)polymers, e.g. PVC, PVDC, PVF, PVDF
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/30—Properties of the layers or laminate having particular thermal properties
    • B32B2307/306—Resistant to heat
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    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/546—Flexural strength; Flexion stiffness
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/355—Temporary coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate

Abstract

The present invention provides a process for producing a flexible glass substrate which is approximately 100% impermeable to gases and water vapor and has excellent flexibility, and a flexible glass substrate. A pattern (P) is formed on one surface of a glass substrate (1), and thereafter a support (3) is provisionally bonded to the surface. The other surface of the glass substrate (1) is etched to reduce the thickness of the glass substrate (1). A film substrate (5) is bonded to the etched surface, and the support (3) provisionally bonded to the surface of the glass substrate (1) is peeled off.

Description

The manufacture method of flexible glass substrate and flexible glass substrate
Technical field
The present invention relates to a kind of can about 100% barrier gas or water vapour see through and the manufacture method and the flexible glass substrate of the good flexible glass substrate of flexibility.
Background technology
In recent years, in field of flat panel displays such as liquid crystal display device or organic EL display element, in order to cater to, continue carrying out to substitute the research of existing glass substrate by the plastics film that transparent polymer material forms to improving the requirement of resistance to breakage, lightweight, slimming.As the example of this film, comprise the indicating meter transparent conducting film that on the less polyethersulfone film of degree of birefringence, forms the indium oxide film of record in the patent documentation 1.
Yet plastics film and glassy phase ratio because of the size variation of being heated or moisture absorption causes is bigger, and make gas or water vapour see through easily.
Given this, the present inventor invent out can about 100% barrier gas or the glass substrate that sees through of water vapour be adhered to glass film substrate (with reference to non-patent literature 1) on the film.This glass film substrate is by adhering glass and film, and only glass is implemented etching technique, make its thickness be decreased to 0.15mm and become thin plate, realized in view of the above the blocking effect of gas or water vapour higher, and have good flexibility, the glass substrate of the bendability that do not have up to now.
Yet, development such as flat-panel monitors such as liquid crystal display device or organic EL display element or Electronic Paper etc. more is tending towards slimming, and the present inventor has also further advanced the research of the slimming that is recorded in the glass film substrate in the described non-patent literature 1.
Patent documentation 1: the spy opens clear 59-158015 communique
Non-patent literature 1: " curved glass-EL/ Electronic Paper parts-", " online ", in January, 2009, little imperial technical institute of Co., Ltd., " put down into retrieval on October 7th, 21 ", network＜URL:http: //www.microtc.com/randd/index.html 〉
Summary of the invention
Technical problem
The present invention proposes in order to improve above-mentioned glass film substrate, its purpose is to provide a kind of existing substrate of comparing, can realize slimming breakthroughly, and can about 100% barrier gas or water vapour see through, be rich in pliability simultaneously, can be freely the significantly manufacture method and the flexible glass substrate of crooked flexible glass substrate.
Technical scheme
To achieve these goals, the present invention is the manufacture method that glass substrate is bonded in the flexible glass substrate on the film substrate, is characterised in that, may further comprise the steps: temporary transient bonding supporter on a side surface of glass substrate; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the process opposite side surface of this etch processes; Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
And the present invention is the manufacture method that glass substrate is bonded in the flexible glass substrate on the film substrate, is characterised in that, may further comprise the steps: the side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the process opposite side surface of this etch processes; Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
And the present invention is the manufacture method that glass substrate is bonded in the flexible glass substrate on the film substrate, is characterised in that, may further comprise the steps: the side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then; Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m; Adhering film base material on the process opposite side surface of this etch processes; Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
And flexible glass substrate according to the present invention is characterised in that, by temporary transient bonding supporter on a side surface of glass substrate; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
And flexible glass substrate according to the present invention is characterised in that, carries out film forming by the side surface for glass substrate and handles, then temporary transient bonding supporter on this side surface; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
And flexible glass substrate according to the present invention is characterised in that, carries out film forming by the side surface for glass substrate and handles, then temporary transient bonding supporter on this side surface; Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m; Adhering film base material on the process opposite side surface of this etch processes; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
Beneficial effect
For the present invention, temporary transient bonding supporter on a side surface of glass substrate, and the opposite side surface of this glass substrate carried out etch processes and make this glass substrate slimming, and on through the opposite side surface after this etch processes the adhering film base material, and peel off supporter on the side surface that temporarily is bonded in glass substrate.In view of the above, flexible glass substrate of the present invention can about 100% barrier gas or water vapour see through, simultaneously than existing substrate, can realize slimming breakthroughly, improve curved characteristic.
Description of drawings
Fig. 1 is the synoptic diagram that is used to illustrate the manufacture method of flexible glass substrate of the present invention.
Main nomenclature: 1 is glass substrate, and 2 is tackiness agent, and 3 is supporter, and 4 is tackiness agent, and 5 is film substrate, and 10 is the flexible glass substrate, and P is a pattern.
Embodiment
Below, describe in detail with reference to accompanying drawing and to be used to implement the preferred embodiments of the present invention.Fig. 1 is the synoptic diagram that is used to illustrate the manufacture method of flexible glass substrate of the present invention.In addition, in Fig. 1, (f) glass substrate shown in is through the etching removal and substrate after the attenuation, though it compares on thickness differently with the glass substrate shown in (a), because difference on thickness only, so uses identical symbol.
Shown in Fig. 1 (f), flexible glass substrate 10 of the present invention is by adopting tackiness agent 2 to come adhering film base material 5 to form being formed with on the ultrafine glass substrate 1 of pattern P.
Flexible glass substrate 10 of the present invention can be used to make thin displays such as liquid-crystal display, OLED display, plasma display, Electronic Paper etc.
Method as form pattern P on glass substrate 1 can be suitable for existing the whole bag of tricks.For example, comprise indium tin composite oxides (ITO) by come the method for molding such as dry type coating process such as vacuum vapour deposition or sputtering methods as this method.
Material for the film substrate 5 that is adopted among the present invention is not particularly limited.For example, can adopt polycarbonate, polyethylene terephthalate, PEN (polyethylenenaphthalate), polyethersulfone, polyimide, Resins, epoxy, resol, terpolycyantoamino-formaldehyde resin, urethane, polyureas, polyethylene, polypropylene, nylon resin, polyvinyl chloride, acrylate resin, polystyrene, acrylonitrile-butadiene-styrene resin, acrylonitrile styrene resin (AS), polyvinylidene dichloride etc.
And, be not particularly limited for the thickness of film substrate 5 used in the present invention.In order to improve flexibility, thickness is preferably below the 500 μ m; In order to ensure intensity, be preferably more than the 1 μ m; And from the processing ease consideration, more than the preferred 25 μ m.
Then, describe the manufacture method of flexible glass substrate 10 in detail with reference to Fig. 1.
At first, shown in Fig. 1 (a), prepare glass substrate 1.Though the thickness to this glass substrate 1 is not particularly limited, and considers processibility, preferred thickness is the glass substrate of 0.2～0.7mm.For the size of glass substrate 1, can use size to be the substrate of 300mm * 300mm, 400mm * 400mm when for example substrate thickness is for 0.2mm, substrate thickness can use the substrate of size as 1m * 1m during for 0.7mm.For the size of the glass substrate 1 before its processing, if consider operability, then can be according to suitably selecting with the relation of substrate thickness.
Then, on a side surface (in Fig. 1 (b), being upper surface) of this glass substrate 1, after technologies such as chemical vapour deposition (CVD:chemical vapor deposition), sputter, evaporation, plating formation film, adopt photoetching process or typography to form pattern P.Among the present invention, owing to can be directly on the thicker glass substrate 1 of substrate thickness, carry out pattern processing, so can realize the maximization of substrate size.And, when forming pattern, need under 150 °～350 ° high temperature, carry out hot pressing.This has problems on thermotolerance for plastics film.But among the present invention,, therefore aspect thermotolerance, do not have problems owing to before adhering film base material 5, glass substrate 1 is carried out pattern processing.
Then, shown in Fig. 1 (c), on the surface that is formed with pattern P of glass substrate 1, adopt tackiness agent 2 temporary transient bonding supporters 3.Supporter 3 can be suitable for sheet glass or resin board, if still have elasticity to a certain degree, then also can use thin-film material.And tackiness agent 2 is coated on the periphery of glass substrate 1, to peel off supporter 3 easily in subsequent step.This tackiness agent 2 plays and prevents that in etch process etching solution from entering into the function between glass substrate 1 and the supporter 3, therefore selects to possess acid proof material.
Secondly, shown in Fig. 1 (d),, adopt etching solution such as hydrofluoric acid and remove and carry out slimming and process by etching for the opposite side surface (in Fig. 1 (d), be lower surface) of glass substrate 1.Among the present invention, remove, make the substrate thickness of glass substrate 1 reach 2～30 μ m through etching.Among the present invention,, carry out etching and processing, therefore, compare, can realize slimming breakthroughly with the glass film base material that is documented in above-mentioned non-patent literature 1 owing to glass substrate 1 can be supported under the state of supporter 3.
If according to described etching and processing, glass substrate 1 is removed to the thickness of expectation, then shown in Fig. 1 (e), then on the opposite side surface of glass substrate 1 (being lower surface among Fig. 1 (e)), come adhering film base material 5 by tackiness agent 4.Tackiness agent 4 adopts stable on heating acrylic adhesives.
Then, shown in Fig. 1 (f), peel off a side surface upper support body 3 that temporarily is bonded in glass substrate 1 from glass substrate 1.In view of the above, produce flexible glass substrate 10 of the present invention.Can be suitable for without thermoplastic photolysis, method such as peel off with blade.
As described above, flexible glass substrate of the present invention constitutes by following steps.Side surface at glass substrate carries out the film forming processing, temporary transient bonding supporter on this side surface, the opposite side surface of glass substrate is carried out etch processes and made this glass substrate slimming, through adhering film base material on the opposite side surface of this etch processes, peel off the supporter on the side surface that temporarily is bonded in glass substrate.In view of the above, flexible glass substrate of the present invention can about 100% barrier gas or water vapour see through, simultaneously than existing substrate, can realize slimming breakthroughly, improve curved characteristic.That is, the pliability that does not reduce film and had, and reach passivation effect.
In addition, flexible glass substrate of the present invention not only can be applicable to fields such as flat-panel monitor or Electronic Paper, and can the substitute as film widely adapt in fields such as electronics, electric, battery, optics.And, in the above description, though only be illustrated for forming figuratum embodiment on the glass substrate, flexible glass substrate of the present invention is also applicable to the form of only implementing the film forming processing on glass substrate or do not carry out the form of any processing treatment for any surface.
Claims (according to the modification of the 19th of treaty)
1. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then;
Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming;
Adhering film base material on the opposite side surface after this etch processes of process;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
2. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then;
Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m;
Adhering film base material on the opposite side surface after this etch processes of process;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
3. a flexible glass substrate is characterized in that carrying out film forming by the side surface for glass substrate handles, then temporary transient bonding supporter on this side surface; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
4. a flexible glass substrate is characterized in that carrying out film forming by the side surface for glass substrate handles, then temporary transient bonding supporter on this side surface; Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
5. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Side surface for glass substrate carries out the film forming processing, forms pattern then, temporary transient bonding supporter on this side surface;
Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming;
Adhering film base material on the process opposite side surface of this etch processes;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
6. a flexible glass substrate is characterized in that carrying out film forming by the side surface for glass substrate handles, and forms pattern, temporary transient bonding supporter on this side surface then; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.

Claims (6)

1. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Temporary transient bonding supporter on a side surface of glass substrate;
Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming;
Adhering film base material on the opposite side surface after this etch processes of process;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
2. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then;
Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming;
Adhering film base material on the opposite side surface after this etch processes of process;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
3. the manufacture method of a flexible glass substrate, this method are used to make glass substrate and are bonded in flexible glass substrate on the film substrate, it is characterized in that may further comprise the steps:
Side surface for glass substrate carries out film forming processing, temporary transient bonding supporter on this side surface then;
Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m;
Adhering film base material on the opposite side surface after this etch processes of process;
Peel off the supporter on the side surface that temporarily is bonded in glass substrate.
4. the manufacture method of a flexible glass substrate is characterized in that this flexible glass substrate is by temporary transient bonding supporter on a side surface of glass substrate; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
5. a flexible glass substrate is characterized in that carrying out film forming by the side surface for glass substrate handles, then temporary transient bonding supporter on this side surface; Etch processes is carried out on opposite side surface for this glass substrate, so that this glass substrate slimming; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
6. a flexible glass substrate is characterized in that carrying out film forming by the side surface for glass substrate handles, then temporary transient bonding supporter on this side surface; Slimming is carried out by etch processes in opposite side surface for this glass substrate, makes this glass substrate be thinned to 2～30 μ m; Adhering film base material on the opposite side surface after this etch processes of process; The supporter of peeling off on the side surface that temporarily is bonded in glass substrate forms.
CN200980116843.5A 2009-10-09 2009-10-09 Process for producing flexible glass substrate, and flexible glass substrate Pending CN102131743A (en)

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