CN102117729B - 离子束传输装置 - Google Patents
离子束传输装置 Download PDFInfo
- Publication number
- CN102117729B CN102117729B CN200910248008.9A CN200910248008A CN102117729B CN 102117729 B CN102117729 B CN 102117729B CN 200910248008 A CN200910248008 A CN 200910248008A CN 102117729 B CN102117729 B CN 102117729B
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- ion beam
- magnet
- electrode
- electrodes
- electronics
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN200910248008.9A CN102117729B (zh) | 2009-12-31 | 2009-12-31 | 离子束传输装置 |
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CN200910248008.9A CN102117729B (zh) | 2009-12-31 | 2009-12-31 | 离子束传输装置 |
Publications (2)
Publication Number | Publication Date |
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CN102117729A CN102117729A (zh) | 2011-07-06 |
CN102117729B true CN102117729B (zh) | 2014-03-19 |
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Family Applications (1)
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CN200910248008.9A Active CN102117729B (zh) | 2009-12-31 | 2009-12-31 | 离子束传输装置 |
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CN (1) | CN102117729B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102708931B (zh) * | 2012-05-07 | 2015-05-20 | 华中科技大学 | 强磁场下电子束注入约束装置 |
CN106783691A (zh) * | 2016-12-30 | 2017-05-31 | 昆山龙腾光电有限公司 | 一种离子传输装置及气相沉积设备 |
CN108231523A (zh) * | 2018-01-18 | 2018-06-29 | 德淮半导体有限公司 | 离子植入机及其使用方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0097535A2 (en) * | 1982-06-23 | 1984-01-04 | Fujitsu Limited | Crossed-field velocity filter and ion-beam processing system |
JP2003257356A (ja) * | 2002-02-27 | 2003-09-12 | Nissin Electric Co Ltd | イオンビーム照射装置 |
CN101285167A (zh) * | 2008-06-03 | 2008-10-15 | 西安工业大学 | 能输出单一离子能量的离子束发射源 |
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2009
- 2009-12-31 CN CN200910248008.9A patent/CN102117729B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0097535A2 (en) * | 1982-06-23 | 1984-01-04 | Fujitsu Limited | Crossed-field velocity filter and ion-beam processing system |
JP2003257356A (ja) * | 2002-02-27 | 2003-09-12 | Nissin Electric Co Ltd | イオンビーム照射装置 |
CN101285167A (zh) * | 2008-06-03 | 2008-10-15 | 西安工业大学 | 能输出单一离子能量的离子束发射源 |
Also Published As
Publication number | Publication date |
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CN102117729A (zh) | 2011-07-06 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee after: KINGSTONE SEMICONDUCTOR COMPANY LTD. Address before: 201203 Shanghai City Newton Road, Zhangjiang High Tech Park of Pudong New Area No. 200 Building No. 7, No. 1 Patentee before: Shanghai Kaishitong Semiconductor Co., Ltd. |
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PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Ion beam transmission device Effective date of registration: 20160714 Granted publication date: 20140319 Pledgee: Pudong Shanghai technology financing Company limited by guarantee Pledgor: KINGSTONE SEMICONDUCTOR COMPANY LTD. Registration number: 2016310000029 |
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PLDC | Enforcement, change and cancellation of contracts on pledge of patent right or utility model | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20180601 Granted publication date: 20140319 Pledgee: Pudong Shanghai technology financing Company limited by guarantee Pledgor: KINGSTONE SEMICONDUCTOR COMPANY LTD. Registration number: 2016310000029 |