CN102114615A - Rare earth polishing disc - Google Patents
Rare earth polishing disc Download PDFInfo
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- CN102114615A CN102114615A CN 201010598755 CN201010598755A CN102114615A CN 102114615 A CN102114615 A CN 102114615A CN 201010598755 CN201010598755 CN 201010598755 CN 201010598755 A CN201010598755 A CN 201010598755A CN 102114615 A CN102114615 A CN 102114615A
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- rare earth
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- polishing disk
- earth polishing
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Abstract
The invention discloses a rare earth polishing disc which has high cutting efficiency, good wear resistance property and high surface brightness. To be different from the existing polishing disc, the rare earth polishing disc mainly comprises rare earth polishing powder, resin, magnesium sulfate or white sugar, curing agent and accelerating agent, wherein the rare earth polishing powder comprises the following compositions in percentage by weight: more than or equal to 60 percent but less than or equal to 99.99 percent of cerium oxide, and more than or equal to 0.01 percent but less than or equal to 40 percent of lanthanum oxide, the content of the rare earth polishing powder can achieve 65 percent, the relative particles of the rare earth polishing powder is small, the brightness of a polished object can be greatly improved compared with the original polishing disc, and the polishing time of the surface of a product can be shortened to be about 0.6 second, so that the working efficiency is improved, the wear resistance property is greatly improved, 1,000-1,200 NO.40 crystal balls can be polished by the original polishing disc with the same size, while the rare earth polishing disc can polish 4,000 NO.40 crystal balls.
Description
Technical field
The present invention relates to a kind of rare earth polishing disk.
Background technology
Polishing disk is mainly in various glass surfaces and side, water bores, use in the polishing such as Crystal ornaments, also be that the high-grade glass handicraft is processed requisite polishing abrasive tool, the at present main practice is polishing disk to be fixed on the rotating disk of polishing machine crystal, Glass Craft etc. are polished processing, can be used for monolithic and become dish process and streamline on processing in batch.Polishing disk is in the past made binding agent mainly based on rare earth cerium oxide with the fiber twine, adds promoter, grinding aid, the PH stabilizing agent is made, and this polishing disk often exists stock removal rate low, the not high shortcoming of surface brightness is polished a product needed long period, inefficiency; And wearability is not high, and service life is shorter, needs often to change the waste ample resources.
Summary of the invention
Technical problem to be solved by this invention is to overcome the deficiencies in the prior art, and a kind of stock removal rate height, wearability is good, surface brightness is high rare earth polishing disk are provided.
The technical solution adopted in the present invention is: the rare earth polishing disk that the present invention relates to is to be made by following component:
A component: polishing powder from rare earth;
B component: resin;
C component: magnesium sulfate or white sugar;
D component: curing agent and promoter;
Wherein the composition of polishing powder from rare earth comprises by mass percentage: 60%≤cerium oxide≤99.99%, 0.01%≤lanthana≤40%.
Polishing disk of the present invention is according to its manufacture craft difference, can be divided into following dual mode, the ratio of the two corresponding each component is also different, wherein cast-type rare earth polishing disk is that each component is mixed, be poured in the mould, be finished product after the moulding, described according to the mass fraction each component ratio of cast-type rare earth polishing disk is: A component 50～60; B component 10～20; C component 17～27; D component 0.05～0.1.
The polishing disk of another kind of production method is a compacting formula rare earth polishing disk, mixes by each component the rare earth polishing disk, and compression moulding under certain process conditions, described according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: A component 55～65; B component 7～13; C component 25～35; D component 0.05～0.15.
In such scheme, described resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like, and the D component: curing agent and promoter are to adopt common curing agent and the promoter in market, also can be identical with promoter with the curing agent that adds in the existing polishing disk manufacture craft, be meant unsaturated polyester resin as common curing agent.
The invention has the beneficial effects as follows: rare earth polishing disk of the present invention adopts new prescription and unique processes to be made, and with respect to polishing disk in the past, following advantage is arranged:
(1) wearability is good: in the past can only polish 1000 ~ 1200 of the crystal balls of 40# of onesize polishing disk, the present invention can reach the level of 4000 of polishings.
Pressure is little when (2) polishing: the present invention adds curing agent, can make polishing disk sturdy and durable, thereby need not to press polishing disk, breaks to prevent polishing disk.
(3) stock removal rate is good: make the polishing time of product surface shorten about 0.6 second, improved operating efficiency.
(4) brightness height: be that the polishing powder from rare earth that main material is made is a primary raw material to contain rare earth in preferred version of the present invention, particle is little, can improve the brightness that needs the polishing object greatly with respect to polishing disk in the past.
The specific embodiment
Embodiment 1:
Rare earth polishing disk in the present embodiment is made for the cast manufacture craft, and each component is mixed, and is poured into die for molding, and described according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 50; Resin 10; Magnesium sulfate (or white sugar) 17; Curing agent and promoter 0.05, described resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Described polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, as preferred embodiment, wherein the content of cerium oxide (CEO) can reach 99.99%, and the product surface brightness is very high.
Embodiment 2:
Rare earth polishing disk in the present embodiment is also made for the cast manufacture craft with embodiment 1, and each component is mixed, and is poured into die for molding, and described according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 60; Resin 20; Magnesium sulfate (or white sugar) 27; Curing agent and promoter 0.15, described resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Described polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, wherein the cerium oxide optimum content can reach 99.99%.
Embodiment 3:
Rare earth polishing disk in the present embodiment is with embodiment 1, also make for the cast manufacture craft, be about to each component and mix, be poured into die for molding, difference is that described according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 55; Resin 15; Magnesium sulfate (or white sugar) 22; Curing agent and promoter 0.1, described resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Described polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, wherein the cerium oxide optimum content can reach 99.99%.
Embodiment 4:
Rare earth polishing disk in the present embodiment is that pressing process is made, its prescription is different with cast-type, mix by each component the rare earth polishing disk, compression moulding under certain process conditions, described according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 55; Resin 7; Magnesium sulfate (or white sugar) 25; Curing agent and promoter 0.05, described polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, wherein the cerium oxide optimum content can reach 99.99%, described resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like, the composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin as common curing agent.
Embodiment 5:
Rare earth polishing disk in the present embodiment is with embodiment 4, being all pressing process makes, its prescription is with different, mix by each component the rare earth polishing disk, compression moulding under certain process conditions, described according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 65; Resin 13; Magnesium sulfate (or white sugar) 35; Curing agent and promoter 0.15, described polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, wherein the cerium oxide optimum content can reach 99.99%, described resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like, the composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin as common curing agent.
Embodiment 6:
Rare earth polishing disk in the present embodiment is with embodiment 4, being all pressing process makes, its prescription is with different, mix by each component the rare earth polishing disk, compression moulding under certain process conditions, described according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 60; Resin 10; Magnesium sulfate (or white sugar) 30; Curing agent and promoter 0.1, described polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA
2O
3)≤40%, wherein the cerium oxide optimum content can reach 99.99%, described resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like, the composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin as common curing agent.
The using method of polishing disk in the foregoing description in process is: at first A, B glue (glass cement) are mixed, the equivalent shop is sprinkled upon on the iron pan (rotating disk of polishing machine), then the rare earth polishing disk is placed on the iron pan and compresses, polishing disk can use after waiting for about 30 minutes, in the use, treat that rare earth polishing disk on the iron pan is used up after, the cull on the cleaning iron pan, can glue new rare earth polishing disk usefulness more again, iron pan be can be recycled.
Claims (4)
1. a rare earth polishing disk is characterized in that, is made by following component:
A component: polishing powder from rare earth;
B component: resin;
C component: magnesium sulfate or white sugar;
D component: curing agent and promoter;
Wherein the composition of polishing powder from rare earth comprises by mass percentage: 60%≤cerium oxide≤99.99%, 0.01%≤lanthana≤40%.
2. rare earth polishing disk according to claim 1 is characterized in that, described according to the mass fraction each component ratio of rare earth polishing disk is:
A component 50～60; B component 10～20; C component 17～27; D component 0.05～0.15.
3. rare earth polishing disk according to claim 1 is characterized in that, described according to the mass fraction each component ratio of rare earth polishing disk is:
A component 55～65; B component 7～13; C component 25～35; D component 0.05～0.15.
4. according to claim 1 or 2 or 3 described rare earth polishing disks, it is characterized in that described resin is the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105987558A CN102114615B (en) | 2010-12-21 | 2010-12-21 | Rare earth polishing disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105987558A CN102114615B (en) | 2010-12-21 | 2010-12-21 | Rare earth polishing disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102114615A true CN102114615A (en) | 2011-07-06 |
| CN102114615B CN102114615B (en) | 2012-08-08 |
Family
ID=44213596
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105987558A Expired - Fee Related CN102114615B (en) | 2010-12-21 | 2010-12-21 | Rare earth polishing disc |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102114615B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102528605A (en) * | 2012-03-26 | 2012-07-04 | 浙江欧源机械科技有限公司 | Grinding and polishing processing method of crystal materials and grinding and polishing machine |
| CN103072097A (en) * | 2013-01-19 | 2013-05-01 | 河南工业大学 | MC (Monomer Casting) nylon glass polishing disc and manufacturing method thereof |
| CN104354091A (en) * | 2014-11-27 | 2015-02-18 | 奚经龙 | Burnishing barrel for rhinestone and manufacturing method for burnishing barrel |
| CN105563354A (en) * | 2015-12-21 | 2016-05-11 | 南皮县晶钻五金磨具制品有限公司 | Unsaturated polyester resin cerium oxide polishing disk and production technology thereof |
| CN106181789A (en) * | 2016-07-20 | 2016-12-07 | 庄莹静 | A kind of grinding block |
| CN108549168A (en) * | 2017-03-01 | 2018-09-18 | 旭硝子株式会社 | glass substrate for display |
| CN114012515A (en) * | 2021-12-02 | 2022-02-08 | 日禺光学科技(苏州)有限公司 | High-surface high-roughness optical device polishing method |
| CN114131435A (en) * | 2021-12-02 | 2022-03-04 | 日禺光学科技(苏州)有限公司 | Cold machining polishing process for optical lens |
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| CN1291126A (en) * | 1998-02-19 | 2001-04-11 | 美国3M公司 | Adrasive article and method for grinding glass |
| CN1414051A (en) * | 2002-07-12 | 2003-04-30 | 和晓宇 | Glass polishing material without using grinding paste and its using method |
| US6755728B2 (en) * | 2001-03-29 | 2004-06-29 | Noritake Co., Ltd. | Abrasive film in which water-soluble inorganic compound is added to binder |
| JP2009076927A (en) * | 1995-09-22 | 2009-04-09 | 3M Co | Method for reforming exposed surface of semiconductor wafer |
| CN101899264A (en) * | 2009-05-25 | 2010-12-01 | 甘肃稀土新材料股份有限公司 | Rare earth polishing powder and preparation method thereof |
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2010
- 2010-12-21 CN CN2010105987558A patent/CN102114615B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2009076927A (en) * | 1995-09-22 | 2009-04-09 | 3M Co | Method for reforming exposed surface of semiconductor wafer |
| CN1291126A (en) * | 1998-02-19 | 2001-04-11 | 美国3M公司 | Adrasive article and method for grinding glass |
| US6755728B2 (en) * | 2001-03-29 | 2004-06-29 | Noritake Co., Ltd. | Abrasive film in which water-soluble inorganic compound is added to binder |
| CN1414051A (en) * | 2002-07-12 | 2003-04-30 | 和晓宇 | Glass polishing material without using grinding paste and its using method |
| CN101899264A (en) * | 2009-05-25 | 2010-12-01 | 甘肃稀土新材料股份有限公司 | Rare earth polishing powder and preparation method thereof |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102528605A (en) * | 2012-03-26 | 2012-07-04 | 浙江欧源机械科技有限公司 | Grinding and polishing processing method of crystal materials and grinding and polishing machine |
| CN103072097A (en) * | 2013-01-19 | 2013-05-01 | 河南工业大学 | MC (Monomer Casting) nylon glass polishing disc and manufacturing method thereof |
| CN103072097B (en) * | 2013-01-19 | 2016-07-06 | 河南工业大学 | The manufacture method of MC nylon glass polishing disk |
| CN104354091A (en) * | 2014-11-27 | 2015-02-18 | 奚经龙 | Burnishing barrel for rhinestone and manufacturing method for burnishing barrel |
| CN105563354A (en) * | 2015-12-21 | 2016-05-11 | 南皮县晶钻五金磨具制品有限公司 | Unsaturated polyester resin cerium oxide polishing disk and production technology thereof |
| CN106181789A (en) * | 2016-07-20 | 2016-12-07 | 庄莹静 | A kind of grinding block |
| CN108549168A (en) * | 2017-03-01 | 2018-09-18 | 旭硝子株式会社 | glass substrate for display |
| CN108549168B (en) * | 2017-03-01 | 2022-03-01 | Ａｇｃ株式会社 | Glass substrate for display |
| CN114012515A (en) * | 2021-12-02 | 2022-02-08 | 日禺光学科技(苏州)有限公司 | High-surface high-roughness optical device polishing method |
| CN114131435A (en) * | 2021-12-02 | 2022-03-04 | 日禺光学科技(苏州)有限公司 | Cold machining polishing process for optical lens |
| CN114012515B (en) * | 2021-12-02 | 2022-11-18 | 日禺光学科技(苏州)有限公司 | High-surface high-roughness optical device polishing method |
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|---|---|
| CN102114615B (en) | 2012-08-08 |
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Granted publication date: 20120808 Termination date: 20171221 |