CN102114615B - Rare earth polishing disc - Google Patents

Rare earth polishing disc Download PDF

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Publication number
CN102114615B
CN102114615B CN2010105987558A CN201010598755A CN102114615B CN 102114615 B CN102114615 B CN 102114615B CN 2010105987558 A CN2010105987558 A CN 2010105987558A CN 201010598755 A CN201010598755 A CN 201010598755A CN 102114615 B CN102114615 B CN 102114615B
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CN
China
Prior art keywords
rare earth
component
polishing
polishing disk
earth polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010105987558A
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Chinese (zh)
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CN102114615A (en
Inventor
朱少武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHUHAI JICHANG RARE EARTH CO Ltd
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ZHUHAI JICHANG RARE EARTH CO Ltd
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Priority to CN2010105987558A priority Critical patent/CN102114615B/en
Publication of CN102114615A publication Critical patent/CN102114615A/en
Application granted granted Critical
Publication of CN102114615B publication Critical patent/CN102114615B/en
Expired - Fee Related legal-status Critical Current
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Abstract

The invention discloses a rare earth polishing disc which has high cutting efficiency, good wear resistance property and high surface brightness. To be different from the existing polishing disc, the rare earth polishing disc mainly comprises rare earth polishing powder, resin, magnesium sulfate or white sugar, curing agent and accelerating agent, wherein the rare earth polishing powder comprises the following compositions in percentage by weight: more than or equal to 60 percent but less than or equal to 99.99 percent of cerium oxide, and more than or equal to 0.01 percent but less than or equal to 40 percent of lanthanum oxide, the content of the rare earth polishing powder can achieve 65 percent, the relative particles of the rare earth polishing powder is small, the brightness of a polished object can be greatly improved compared with the original polishing disc, and the polishing time of the surface of a product can be shortened to be about 0.6 second, so that the working efficiency is improved, the wear resistance property is greatly improved, 1,000-1,200 NO.40 crystal balls can be polished by the original polishing disc with the same size, while the rare earth polishing disc can polish 4,000 NO.40 crystal balls.

Description

The rare earth polishing disk
Technical field
The present invention relates to a kind of rare earth polishing disk.
Background technology
Polishing disk is mainly in various glass surfaces and side; Water bores; Use in the polishing such as Crystal ornaments; Also be that the high-grade glass handicraft is processed requisite polishing abrasive tool, the at present main practice is polishing disk to be fixed on the rotating disk of polishing machine crystal, Glass Craft etc. are polished processing, can be used for monolithic and become dish process and streamline on processing in batch.Polishing disk in the past is main body with the rare earth cerium oxide mainly, makees binding agent with the fiber twine, adds promoter; Grinding aid, the PH stabilizing agent is made, and this polishing disk often exists stock removal rate low; The not high shortcoming of surface brightness is polished a product needed long period, inefficiency; And wearability is not high, and service life is shorter, needs often to change the waste ample resources.
Summary of the invention
Technical problem to be solved by this invention is the deficiency that overcomes prior art, and the rare earth polishing disk that a kind of stock removal rate is high, wearability is good, surface brightness is high is provided.
The technical scheme that the present invention adopted is: the rare earth polishing disk that the present invention relates to is to be made by following component:
A component: polishing powder from rare earth;
B component: resin;
C component: magnesium sulfate or white sugar;
D component: curing agent and promoter;
Wherein the composition of polishing powder from rare earth comprises by mass percentage: 60%≤cerium oxide≤99.99%, 0.01%≤lanthana≤40%.
Polishing disk of the present invention is different according to its manufacture craft; Can be divided into following dual mode; The ratio of the two corresponding each component is also different, and wherein cast-type rare earth polishing disk is that each component is mixed, and is poured in the mould; Be finished product after the moulding, said according to the mass fraction each component ratio of cast-type rare earth polishing disk is: A component 50~60; B component 10~20; C component 17~27; D component 0.05~0.1.
The polishing disk of another kind of production method is a compacting formula rare earth polishing disk, mixes through each component with the rare earth polishing disk, and in certain process conditions pressed moulding, said according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: A component 55~65; B component 7~13; C component 25~35; D component 0.05~0.15.
In such scheme; Said resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like; And the D component: curing agent and promoter are to adopt common curing agent and the promoter in market; Also can be identical with promoter with the curing agent that adds in the existing polishing disk manufacture craft, be meant unsaturated polyester resin like common curing agent.
The invention has the beneficial effects as follows: rare earth polishing disk of the present invention adopts new prescription and unique processes to be made, and with respect to polishing disk in the past, following advantage is arranged:
(1) wearability is good: in the past can only polish 1000 ~ 1200 of the crystal balls of 40# of onesize polishing disk, the present invention can reach the level of 4000 of polishings.
Pressure is little when (2) polishing: the present invention adds curing agent, can make polishing disk sturdy and durable, thereby need not to press polishing disk, breaks to prevent polishing disk.
(3) stock removal rate is good: make the polishing time of product surface shorten about 0.6 second, improved operating efficiency.
(4) brightness is high: in preferred version of the present invention, be that the polishing powder from rare earth that main material is processed is a primary raw material to contain rare earth, particle is little, can improve the brightness that needs the polishing object greatly with respect to polishing disk in the past.
The specific embodiment
Embodiment 1:
Rare earth polishing disk in the present embodiment is made for the cast manufacture craft, and each component is mixed, and is poured into die for molding, and said according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 50; Resin 10; Magnesium sulfate (or white sugar) 17; Curing agent and promoter 0.05, said resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Said polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%, as preferred embodiment, wherein the content of cerium oxide (CEO) can reach 99.99%, and the product surface brightness is very high.
Embodiment 2:
Rare earth polishing disk in the present embodiment is also made for the cast manufacture craft with embodiment 1, and each component is mixed, and is poured into die for molding, and said according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 60; Resin 20; Magnesium sulfate (or white sugar) 27; Curing agent and promoter 0.15, said resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Said polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%, wherein the cerium oxide optimum content can reach 99.99%.
Embodiment 3:
Rare earth polishing disk in the present embodiment is with embodiment 1; Also make for the cast manufacture craft; Be about to each component and mix, be poured into die for molding, difference is that said according to the mass fraction each component ratio of cast-type rare earth polishing disk is: polishing powder from rare earth 55; Resin 15; Magnesium sulfate (or white sugar) 22; Curing agent and promoter 0.1, said resin are meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like.Said polishing powder from rare earth is the important component in this prescription, and its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%, wherein the cerium oxide optimum content can reach 99.99%.
Embodiment 4:
Rare earth polishing disk in the present embodiment is that pressing process is made; Its prescription is different with cast-type; Each component through with the rare earth polishing disk mixes, and in certain process conditions pressed moulding, said according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 55; Resin 7; Magnesium sulfate (or white sugar) 25; Curing agent and promoter 0.05, said polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%; Wherein the cerium oxide optimum content can reach 99.99%; Said resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like; The composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin like common curing agent.
Embodiment 5:
Rare earth polishing disk in the present embodiment is with embodiment 4; Being all pressing process makes; Its prescription is with different; Each component through with the rare earth polishing disk mixes, and in certain process conditions pressed moulding, said according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 65; Resin 13; Magnesium sulfate (or white sugar) 35; Curing agent and promoter 0.15, said polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%; Wherein the cerium oxide optimum content can reach 99.99%; Said resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like; The composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin like common curing agent.
Embodiment 6:
Rare earth polishing disk in the present embodiment is with embodiment 4; Being all pressing process makes; Its prescription is with different; Each component through with the rare earth polishing disk mixes, and in certain process conditions pressed moulding, said according to the mass fraction each component ratio of compacting formula rare earth polishing disk is: polishing powder from rare earth 60; Resin 10; Magnesium sulfate (or white sugar) 30; Curing agent and promoter 0.1, said polishing powder from rare earth is the important component in this prescription, its component percentages content is 60%≤cerium oxide (CEO)≤99.99%, 0.01%≤lanthana (LA 2O 3)≤40%; Wherein the cerium oxide optimum content can reach 99.99%; Said resin is meant the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin or the like; The composition that is added in curing agent and promoter and the existing polishing disk manufacture craft is identical, is unsaturated polyester resin like common curing agent.
The method for using of polishing disk in the foregoing description in process is: at first A, B glue (glass cement) are mixed, the equivalent shop is sprinkled upon on the iron pan (rotating disk of polishing machine), the rare earth polishing disk is placed on the iron pan to compress then; Polishing disk can use after waiting for about 30 minutes; In the use, treat that rare earth polishing disk on the iron pan is used up after, the cull on the cleaning iron pan; Can glue new rare earth polishing disk usefulness more again, iron pan can be recycled.

Claims (3)

1. a rare earth polishing disk is characterized in that, is made by following component:
A component: polishing powder from rare earth;
B component: resin;
C component: magnesium sulfate or white sugar;
D component: curing agent and promoter;
Wherein the composition of polishing powder from rare earth comprises by mass percentage: 60%≤cerium oxide≤99.99%, 0.01%≤lanthana≤40%;
Said according to the mass fraction each component ratio of rare earth polishing disk is:
A component 50~60; B component 10~20; C component 17~27; D component 0.05~0.15.
2. a rare earth polishing disk is characterized in that, is made by following component:
A component: polishing powder from rare earth;
B component: resin;
C component: magnesium sulfate or white sugar;
D component: curing agent and promoter;
Wherein the composition of polishing powder from rare earth comprises by mass percentage: 60%≤cerium oxide≤99.99%, 0.01%≤lanthana≤40%;
Said according to the mass fraction each component ratio of rare earth polishing disk is:
A component 55~65; B component 7~13; C component 25~35; D component 0.05~0.15.
3. rare earth polishing disk according to claim 1 and 2 is characterized in that, said resin is the wherein a kind of of phenolic resins, epoxy resin, unsaturated polyester resin.
CN2010105987558A 2010-12-21 2010-12-21 Rare earth polishing disc Expired - Fee Related CN102114615B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010105987558A CN102114615B (en) 2010-12-21 2010-12-21 Rare earth polishing disc

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Application Number Priority Date Filing Date Title
CN2010105987558A CN102114615B (en) 2010-12-21 2010-12-21 Rare earth polishing disc

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CN102114615A CN102114615A (en) 2011-07-06
CN102114615B true CN102114615B (en) 2012-08-08

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102528605B (en) * 2012-03-26 2014-04-02 浙江欧源机械科技有限公司 Grinding and polishing processing method of crystal materials and grinding and polishing machine
CN103072097B (en) * 2013-01-19 2016-07-06 河南工业大学 The manufacture method of MC nylon glass polishing disk
CN104354091B (en) * 2014-11-27 2017-02-22 奚经龙 Manufacturing method of burnishing barrel for rhinestone
CN105563354A (en) * 2015-12-21 2016-05-11 南皮县晶钻五金磨具制品有限公司 Unsaturated polyester resin cerium oxide polishing disk and production technology thereof
CN106181789A (en) * 2016-07-20 2016-12-07 庄莹静 A kind of grinding block
JP6822219B2 (en) * 2017-03-01 2021-01-27 Agc株式会社 Glass substrate for display
CN114012515B (en) * 2021-12-02 2022-11-18 日禺光学科技(苏州)有限公司 High-surface high-roughness optical device polishing method
CN114131435B (en) * 2021-12-02 2023-04-25 日禺光学科技(苏州)有限公司 Cold working and polishing process for optical lens

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1291126A (en) * 1998-02-19 2001-04-11 美国3M公司 Adrasive article and method for grinding glass
CN1414051A (en) * 2002-07-12 2003-04-30 和晓宇 Glass polishing material without using grinding paste and its using method
US6755728B2 (en) * 2001-03-29 2004-06-29 Noritake Co., Ltd. Abrasive film in which water-soluble inorganic compound is added to binder
CN101899264A (en) * 2009-05-25 2010-12-01 甘肃稀土新材料股份有限公司 Rare earth polishing powder and preparation method thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5958794A (en) * 1995-09-22 1999-09-28 Minnesota Mining And Manufacturing Company Method of modifying an exposed surface of a semiconductor wafer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1291126A (en) * 1998-02-19 2001-04-11 美国3M公司 Adrasive article and method for grinding glass
US6755728B2 (en) * 2001-03-29 2004-06-29 Noritake Co., Ltd. Abrasive film in which water-soluble inorganic compound is added to binder
CN1414051A (en) * 2002-07-12 2003-04-30 和晓宇 Glass polishing material without using grinding paste and its using method
CN101899264A (en) * 2009-05-25 2010-12-01 甘肃稀土新材料股份有限公司 Rare earth polishing powder and preparation method thereof

Non-Patent Citations (1)

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Title
JP特开2009-76927A 2009.04.09

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