CN102112438B - 肟酯光敏引发剂 - Google Patents

肟酯光敏引发剂 Download PDF

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Publication number
CN102112438B
CN102112438B CN200980130100.3A CN200980130100A CN102112438B CN 102112438 B CN102112438 B CN 102112438B CN 200980130100 A CN200980130100 A CN 200980130100A CN 102112438 B CN102112438 B CN 102112438B
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CN
China
Prior art keywords
alkyl
phenyl
meth
formula
acrylate
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200980130100.3A
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English (en)
Chinese (zh)
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CN102112438A (zh
Inventor
松本亮
仓久敏
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BASF SE
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BASF SE
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/34—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • C07C251/48—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with the carbon atom of at least one of the oxyimino groups bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70—Sulfur atoms
    • C07D277/74—Sulfur atoms substituted by carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
CN200980130100.3A 2008-06-06 2009-05-27 肟酯光敏引发剂 Expired - Fee Related CN102112438B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08157706 2008-06-06
EP08157706.6 2008-06-06
PCT/EP2009/056397 WO2009147031A2 (en) 2008-06-06 2009-05-27 Oxime ester photoinitiators

Publications (2)

Publication Number Publication Date
CN102112438A CN102112438A (zh) 2011-06-29
CN102112438B true CN102112438B (zh) 2014-07-23

Family

ID=40042788

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980130100.3A Expired - Fee Related CN102112438B (zh) 2008-06-06 2009-05-27 肟酯光敏引发剂

Country Status (7)

Country Link
US (1) US8507725B2 (https=)
EP (1) EP2303833B1 (https=)
JP (1) JP5566378B2 (https=)
KR (1) KR101626172B1 (https=)
CN (1) CN102112438B (https=)
TW (1) TWI466853B (https=)
WO (1) WO2009147031A2 (https=)

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JP5553827B2 (ja) * 2008-06-06 2014-07-16 ビーエーエスエフ ソシエタス・ヨーロピア 光開始剤混合物
JP5623416B2 (ja) * 2008-11-03 2014-11-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 光開始剤混合物
JP5799799B2 (ja) * 2011-10-20 2015-10-28 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
CN107652383A (zh) * 2011-10-20 2018-02-02 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法
EP2788325B1 (en) 2011-12-07 2016-08-10 Basf Se Oxime ester photoinitiators
CN103698976A (zh) * 2012-09-27 2014-04-02 李妤 新型激光数字全息高密度存储显示材料的制备
WO2014097595A1 (ja) * 2012-12-21 2014-06-26 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、それを用いたパターン硬化膜の製造方法及び半導体装置
CN105531260B (zh) * 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
CN104672354A (zh) * 2015-02-04 2015-06-03 天津墨森科技有限公司 一种双肟酯类光引发剂及其制备方法和应用
WO2017033880A1 (ja) * 2015-08-24 2017-03-02 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
JP6713112B2 (ja) * 2016-04-27 2020-06-24 東京応化工業株式会社 化合物及びその製造方法
TWI664500B (zh) * 2016-06-30 2019-07-01 奇美實業股份有限公司 黑色感光性樹脂組成物及其應用
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
KR102355406B1 (ko) * 2017-06-29 2022-01-25 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
JP2020200272A (ja) * 2019-06-11 2020-12-17 株式会社Adeka カルバモイルオキシム化合物並びに該化合物を含有する重合開始剤及び重合性組成物
WO2025225376A1 (ja) * 2024-04-23 2025-10-30 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、光学フィルタ、固体撮像素子、画像表示装置および光重合開始剤

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US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
CN1514845A (zh) * 2001-06-11 2004-07-21 �������⻯ѧƷ�ع����޹�˾ 具有复合结构的肟酯光引发剂
CN101014569A (zh) * 2004-08-18 2007-08-08 西巴特殊化学品控股有限公司 肟酯光引发剂

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KR101351286B1 (ko) 2005-12-20 2014-02-17 시바 홀딩 인크 옥심 에스테르 광개시제
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JP4874659B2 (ja) * 2006-01-24 2012-02-15 富士フイルム株式会社 アニリン化合物及びその製造方法、並びに、感光性組成物
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WO2008138733A1 (en) * 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
JP5535064B2 (ja) * 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
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JP2009040762A (ja) 2007-08-09 2009-02-26 Ciba Holding Inc オキシムエステル光開始剤
JP5553827B2 (ja) * 2008-06-06 2014-07-16 ビーエーエスエフ ソシエタス・ヨーロピア 光開始剤混合物
JP5623416B2 (ja) * 2008-11-03 2014-11-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 光開始剤混合物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
CN1514845A (zh) * 2001-06-11 2004-07-21 �������⻯ѧƷ�ع����޹�˾ 具有复合结构的肟酯光引发剂
CN101014569A (zh) * 2004-08-18 2007-08-08 西巴特殊化学品控股有限公司 肟酯光引发剂

Also Published As

Publication number Publication date
CN102112438A (zh) 2011-06-29
KR101626172B1 (ko) 2016-05-31
JP2011525480A (ja) 2011-09-22
WO2009147031A3 (en) 2010-07-08
WO2009147031A2 (en) 2009-12-10
US20110170209A1 (en) 2011-07-14
JP5566378B2 (ja) 2014-08-06
TW201000434A (en) 2010-01-01
EP2303833A2 (en) 2011-04-06
EP2303833B1 (en) 2013-10-16
TWI466853B (zh) 2015-01-01
KR20110015683A (ko) 2011-02-16
US8507725B2 (en) 2013-08-13

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Termination date: 20190527