CN102056390B - 一种组合等离子体放电装置 - Google Patents
一种组合等离子体放电装置 Download PDFInfo
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- CN102056390B CN102056390B CN200910236723A CN200910236723A CN102056390B CN 102056390 B CN102056390 B CN 102056390B CN 200910236723 A CN200910236723 A CN 200910236723A CN 200910236723 A CN200910236723 A CN 200910236723A CN 102056390 B CN102056390 B CN 102056390B
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CN200910236723A CN102056390B (zh) | 2009-10-28 | 2009-10-28 | 一种组合等离子体放电装置 |
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CN200910236723A CN102056390B (zh) | 2009-10-28 | 2009-10-28 | 一种组合等离子体放电装置 |
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CN102056390A CN102056390A (zh) | 2011-05-11 |
CN102056390B true CN102056390B (zh) | 2012-10-03 |
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Families Citing this family (1)
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CN109905954A (zh) * | 2019-03-26 | 2019-06-18 | 西安交通大学 | 沿面放电等离子体装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0818801A2 (en) * | 1996-07-12 | 1998-01-14 | The Boc Group, Inc. | Plasma treating apparatus |
CN1283076A (zh) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | 用于产生等离子体的电极、使用该电极的等离子体处理设备以及利用该设备的等离子体处理 |
JP2004319221A (ja) * | 2003-04-15 | 2004-11-11 | Air Water Inc | 大気圧プラズマ処理装置 |
CN1643997A (zh) * | 2002-04-10 | 2005-07-20 | 陶氏康宁爱尔兰有限公司 | 大气压等离子体组件 |
JP2006068576A (ja) * | 2004-08-31 | 2006-03-16 | Hitachi Industries Co Ltd | プラズマ処理装置 |
CN101277576A (zh) * | 2007-03-26 | 2008-10-01 | 中国科学院光电研究院 | 双介质阻挡放电处理薄膜材料表面的系统 |
CN201515547U (zh) * | 2009-10-28 | 2010-06-23 | 中国科学院微电子研究所 | 一种组合等离子体放电装置 |
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2009
- 2009-10-28 CN CN200910236723A patent/CN102056390B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0818801A2 (en) * | 1996-07-12 | 1998-01-14 | The Boc Group, Inc. | Plasma treating apparatus |
CN1283076A (zh) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | 用于产生等离子体的电极、使用该电极的等离子体处理设备以及利用该设备的等离子体处理 |
CN1643997A (zh) * | 2002-04-10 | 2005-07-20 | 陶氏康宁爱尔兰有限公司 | 大气压等离子体组件 |
JP2004319221A (ja) * | 2003-04-15 | 2004-11-11 | Air Water Inc | 大気圧プラズマ処理装置 |
JP2006068576A (ja) * | 2004-08-31 | 2006-03-16 | Hitachi Industries Co Ltd | プラズマ処理装置 |
CN101277576A (zh) * | 2007-03-26 | 2008-10-01 | 中国科学院光电研究院 | 双介质阻挡放电处理薄膜材料表面的系统 |
CN201515547U (zh) * | 2009-10-28 | 2010-06-23 | 中国科学院微电子研究所 | 一种组合等离子体放电装置 |
Non-Patent Citations (1)
Title |
---|
张晓丹 等.常压等离子体处理对羊毛结构性能的影响.《毛纺科技》.2006,(第1期),9-13. * |
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Effective date of registration: 20160706 Address after: 830002, the Xinjiang Uygur Autonomous Region Urumqi economic and Technological Development Zone, 499 West Road, Longhai Kashi property building, room 628 Patentee after: Xinjiang Zhongke Silk Road Technology Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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Denomination of invention: A Combined Plasma Discharge Device Effective date of registration: 20230925 Granted publication date: 20121003 Pledgee: Agricultural Bank of China Limited Urumqi Branch Pledgor: Xinjiang Zhongke Silk Road Technology Co.,Ltd. Registration number: Y2023980058617 |