CN102046677A - 光敏浆料和烧结层 - Google Patents

光敏浆料和烧结层 Download PDF

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Publication number
CN102046677A
CN102046677A CN2009801201931A CN200980120193A CN102046677A CN 102046677 A CN102046677 A CN 102046677A CN 2009801201931 A CN2009801201931 A CN 2009801201931A CN 200980120193 A CN200980120193 A CN 200980120193A CN 102046677 A CN102046677 A CN 102046677A
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CN
China
Prior art keywords
weight
methyl
content
photosensitive paste
acid ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2009801201931A
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English (en)
Chinese (zh)
Inventor
伊藤和重
黑木正胜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN102046677A publication Critical patent/CN102046677A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN2009801201931A 2008-05-30 2009-05-29 光敏浆料和烧结层 Pending CN102046677A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5734308P 2008-05-30 2008-05-30
US61/057,343 2008-05-30
PCT/US2009/045590 WO2009146400A1 (en) 2008-05-30 2009-05-29 Photosensitive paste and sintered layer

Publications (1)

Publication Number Publication Date
CN102046677A true CN102046677A (zh) 2011-05-04

Family

ID=40972812

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801201931A Pending CN102046677A (zh) 2008-05-30 2009-05-29 光敏浆料和烧结层

Country Status (6)

Country Link
US (1) US8221958B2 (https=)
JP (1) JP2011524023A (https=)
KR (1) KR20110014673A (https=)
CN (1) CN102046677A (https=)
TW (1) TW201005433A (https=)
WO (1) WO2009146400A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120139392A (ko) * 2011-06-17 2012-12-27 삼성디스플레이 주식회사 디스플레이 패널, 그 제조방법 및 이에 사용되는 프릿 조성물
TWI460743B (zh) * 2012-01-12 2014-11-11 Innolux Corp 包含觸控面板之影像顯示系統及觸控面板之製造方法
US20150064479A1 (en) * 2013-08-30 2015-03-05 Guardian Industries Corp. Heat treatable painted glass substrate, and/or method of making the same
JP6729378B2 (ja) * 2015-07-10 2020-07-22 東レ株式会社 導電ペースト、タッチセンサー部材及び導電パターンの製造方法
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5972564A (en) * 1997-03-26 1999-10-26 Taiyo Ink Manufacturing Co., Ltd. Alkali development type photocurable conductive paste composition and plasma display panels having electrodes formed thereof
US6132937A (en) * 1998-03-13 2000-10-17 Taiyo Ink Manufacturing Co., Ltd. Alkali-developing type photocurable composition and calcined pattern obtained by use thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533689A (en) * 1982-09-01 1985-08-06 Mitsubishi Rayon Company, Limited Flame resistant acrylic resin composition and process for its production
US6197480B1 (en) 1995-06-12 2001-03-06 Toray Industries, Inc. Photosensitive paste, a plasma display, and a method for the production thereof
KR100671986B1 (ko) * 1999-07-12 2007-01-23 타이요 잉크 메뉴펙츄어링 컴퍼니, 리미티드 알칼리현상형 광경화성 조성물 및 이를 사용하여 얻을 수 있는 소성물(燒成物) 패턴
JP3827196B2 (ja) 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
JP3757886B2 (ja) 2002-01-25 2006-03-22 株式会社村田製作所 光反応性樹脂組成物、それを用いた回路基板およびセラミック多層基板の製造方法
JP3943057B2 (ja) 2003-07-11 2007-07-11 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
DE10331888B4 (de) * 2003-07-14 2005-11-10 Clariant Gmbh Elastisches Belagmaterial mit verbesserten Flammschutzeigenschaften sowie ein Verfahren zu dessen Herstellung
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5972564A (en) * 1997-03-26 1999-10-26 Taiyo Ink Manufacturing Co., Ltd. Alkali development type photocurable conductive paste composition and plasma display panels having electrodes formed thereof
US6132937A (en) * 1998-03-13 2000-10-17 Taiyo Ink Manufacturing Co., Ltd. Alkali-developing type photocurable composition and calcined pattern obtained by use thereof

Also Published As

Publication number Publication date
TW201005433A (en) 2010-02-01
US8221958B2 (en) 2012-07-17
JP2011524023A (ja) 2011-08-25
WO2009146400A1 (en) 2009-12-03
US20100136484A1 (en) 2010-06-03
KR20110014673A (ko) 2011-02-11

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Legal Events

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20110504