KR20110014673A - 감광성 페이스트 및 소결 층 - Google Patents

감광성 페이스트 및 소결 층 Download PDF

Info

Publication number
KR20110014673A
KR20110014673A KR1020107029429A KR20107029429A KR20110014673A KR 20110014673 A KR20110014673 A KR 20110014673A KR 1020107029429 A KR1020107029429 A KR 1020107029429A KR 20107029429 A KR20107029429 A KR 20107029429A KR 20110014673 A KR20110014673 A KR 20110014673A
Authority
KR
South Korea
Prior art keywords
meth
weight
phosphate
acryloyl
content
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107029429A
Other languages
English (en)
Korean (ko)
Inventor
가즈시게 이토
마사카츠 구로키
Original Assignee
이 아이 듀폰 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 이 아이 듀폰 디 네모아 앤드 캄파니
Publication of KR20110014673A publication Critical patent/KR20110014673A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020107029429A 2008-05-30 2009-05-29 감광성 페이스트 및 소결 층 Ceased KR20110014673A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5734308P 2008-05-30 2008-05-30
US61/057,343 2008-05-30

Publications (1)

Publication Number Publication Date
KR20110014673A true KR20110014673A (ko) 2011-02-11

Family

ID=40972812

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107029429A Ceased KR20110014673A (ko) 2008-05-30 2009-05-29 감광성 페이스트 및 소결 층

Country Status (6)

Country Link
US (1) US8221958B2 (https=)
JP (1) JP2011524023A (https=)
KR (1) KR20110014673A (https=)
CN (1) CN102046677A (https=)
TW (1) TW201005433A (https=)
WO (1) WO2009146400A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120139392A (ko) * 2011-06-17 2012-12-27 삼성디스플레이 주식회사 디스플레이 패널, 그 제조방법 및 이에 사용되는 프릿 조성물
TWI460743B (zh) * 2012-01-12 2014-11-11 Innolux Corp 包含觸控面板之影像顯示系統及觸控面板之製造方法
US20150064479A1 (en) * 2013-08-30 2015-03-05 Guardian Industries Corp. Heat treatable painted glass substrate, and/or method of making the same
JP6729378B2 (ja) * 2015-07-10 2020-07-22 東レ株式会社 導電ペースト、タッチセンサー部材及び導電パターンの製造方法
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533689A (en) * 1982-09-01 1985-08-06 Mitsubishi Rayon Company, Limited Flame resistant acrylic resin composition and process for its production
US6197480B1 (en) 1995-06-12 2001-03-06 Toray Industries, Inc. Photosensitive paste, a plasma display, and a method for the production thereof
JP3510761B2 (ja) 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3920449B2 (ja) 1998-03-13 2007-05-30 太陽インキ製造株式会社 アルカリ現像型光硬化性組成物及びそれを用いて得られる焼成物パターン
KR100671986B1 (ko) * 1999-07-12 2007-01-23 타이요 잉크 메뉴펙츄어링 컴퍼니, 리미티드 알칼리현상형 광경화성 조성물 및 이를 사용하여 얻을 수 있는 소성물(燒成物) 패턴
JP3827196B2 (ja) 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
JP3757886B2 (ja) 2002-01-25 2006-03-22 株式会社村田製作所 光反応性樹脂組成物、それを用いた回路基板およびセラミック多層基板の製造方法
JP3943057B2 (ja) 2003-07-11 2007-07-11 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
DE10331888B4 (de) * 2003-07-14 2005-11-10 Clariant Gmbh Elastisches Belagmaterial mit verbesserten Flammschutzeigenschaften sowie ein Verfahren zu dessen Herstellung
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto

Also Published As

Publication number Publication date
TW201005433A (en) 2010-02-01
CN102046677A (zh) 2011-05-04
US8221958B2 (en) 2012-07-17
JP2011524023A (ja) 2011-08-25
WO2009146400A1 (en) 2009-12-03
US20100136484A1 (en) 2010-06-03

Similar Documents

Publication Publication Date Title
KR101100490B1 (ko) 플라즈마 디스플레이 패널용 전극 페이스트 및 플라즈마 디스플레이 패널용 블랙 버스 전극
US7887992B2 (en) Photosensitive paste and process for production of pattern using the same
US20100039034A1 (en) Photocurable conductive paste and photocurable black paste used in formation of bus electrode having double layer structure, and plasma display panel
JP2003131365A (ja) 光硬化性組成物及びそれを用いて電極形成したプラズマディスプレイパネル
KR20110014673A (ko) 감광성 페이스트 및 소결 층
KR101099183B1 (ko) 흑색 버스 전극용 전도성 조성물 및 플라즈마 디스플레이 패널의 전방 패널
US7781971B2 (en) Conductive composition for black bus electrode, and front panel of plasma display panel
KR20100080624A (ko) 흑색 버스 전극용 전도성 조성물, 및 플라즈마 디스플레이 패널의 전방 패널
KR100799062B1 (ko) 전도성 조성물 및 플라즈마 디스플레이의 배면 기판의 제조방법
JP5421391B2 (ja) Ｐｄｐの前部電極
US8753160B2 (en) Method for forming front electrode of PDP
JP2012073494A (ja) 感光性樹脂組成物

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20101228

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20101228

Comment text: Request for Examination of Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20130122

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20130828

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20130122

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I