CN102045935A - Plasma discharge and atomization grafting device - Google Patents
Plasma discharge and atomization grafting device Download PDFInfo
- Publication number
- CN102045935A CN102045935A CN2009102363812A CN200910236381A CN102045935A CN 102045935 A CN102045935 A CN 102045935A CN 2009102363812 A CN2009102363812 A CN 2009102363812A CN 200910236381 A CN200910236381 A CN 200910236381A CN 102045935 A CN102045935 A CN 102045935A
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- atomizing
- plasma discharge
- ground electrode
- grafting device
- roller bearing
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Abstract
The invention discloses a plasma discharge and atomization grafting device, which comprises a group of atomization nozzles and two high-voltage electrodes positioned on two sides of the atomization nozzles, wherein the group of atomization nozzles are arranged on a shielding case connected with a bracket and are used for atomizing and spraying various kinds of liquid; the two high-voltage electrodes are connected with one end of a power supply; a shielding case connected with ground is arranged on the outer side of the high-voltage electrodes; a metal round roller ground electrode is arranged on the inner side of the high-voltage electrodes; and when high-frequency or radio-frequency voltage is applied between the high-voltage electrodes and the metal round roller ground electrode, plasma is generated in an area between the high-voltage electrodes and the metal round roller ground electrode. An atomization device is arranged between intervals generating air glow discharge under atmospheric pressure, and plasma discharge and surface atomization grafting technology are integrated. In addition, the device has high timeliness after surface grafting and can be used for performing surface grafting and modification on thin film materials.
Description
Technical field
The present invention relates to plasma applicating technology field, relate in particular to a kind of plasma discharge and atomizing grafting device, is the realization of installing between between two circular arc plasma discharge regions under the normal pressure device to the film surface grafting.
Background technology
Past generally is the surface of adopting naphthalene sodium method corrosion material for the hydrophily that improves material surface, adopts this method can bring serious poisonous and hazardous fluid discharge, brings very big hidden danger to environmental protection.
Utilize atmospheric plasma to handle thin-film material, the hydrophily that improves material surface is in one of plasma application technology that develops rapidly in recent years, but general material generally all keeps not long-time through the ageing of its surface hydrophilic after the plasma treatment, in order to keep hydrophilic ageing of thin-film material surface, after carrying out plasma treatment, also need carry out a kind of new hydrophilic radical of glycerol polymerization at film surface.
The hydrophily that the present invention is based on the maintenance thin-film material is a purpose, again at a kind of hydrophilic radical of its surface grafting, the device of being developed is that a binding plasma discharging surface is handled and the atomizing grafting is a kind of new equipment of continuous combined treatment after the process plasma treatment.
Summary of the invention
(1) technical problem that will solve
In view of this, main purpose of the present invention is to provide a kind of plasma discharge and atomizing grafting device, handle the various thin-film materials that pass this passage with the zone that utilizes the integrated glow plasma discharge and the atomization of liquid, especially graft modification is carried out on the surface of material and handled.
(2) technical scheme
For achieving the above object, the invention provides a kind of plasma discharge and atomizing grafting device, this device comprises one group of atomizer and is positioned at two high-field electrodes of atomizer both sides, this group atomizer be installed in one with radome that support is connected on, being used for atomizing sprays various liquid; These two high-field electrodes are connected with an end of power supply, a radome that is connected with the earth is installed in the outside, the inboard is provided with a round metal roller bearing ground electrode, when adding high frequency or radio-frequency voltage between high-field electrode and metallic cylinder axle ground electrode, the zone between high-field electrode and metallic cylinder axle ground electrode produces plasma.
In the such scheme, the liquid of this group atomizer atomizing ejection constitutes a plane, is sprayed on the surface of film.
In the such scheme, this high-field electrode be shaped as the segmental tile plate shape, the output voltage of the high voltage source that is connected is greater than 5KV, frequency range is 1 to 40KHz.
In the such scheme, this high voltage source is to adopt high frequency electric source, or adopts radio-frequency power supply.
In the such scheme, the circular arc medial surface of this high-field electrode and the outer surface of this round metal roller bearing have certain spacing.
In the such scheme, this round metal roller bearing ground electrode be installed in one with support that the earth is connected on, be separately installed with the film axis of guide at this in round metal roller bearing ground electrode both sides, thin-film material can be by the plasma discharge between high-field electrode and the round metal roller bearing ground electrode.
In the such scheme, these two high-field electrodes and this round metal roller bearing ground electrode adopt aluminum to make.
In the such scheme, this radome adopts aluminum to make.
(3) beneficial effect
This plasma discharge provided by the invention and atomizing grafting device, its advantage is:
1, under atmospheric pressure produces and add an atomising device, integrated and plasma discharge and surface atomizing crosslinking technology between the interval of air glow discharge.
2, ageing good behind the surface grafting, can be used for the surface grafting and the modification of thin-film material are handled.
Description of drawings
Fig. 1 is the side structure schematic diagram according to the embodiment of the invention plasma discharge that provides and the grafting device that atomizes;
Fig. 2 is the Facad structure schematic diagram according to the embodiment of the invention plasma discharge that provides and the grafting device that atomizes.
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.
Consult side structure schematic diagram and Facad structure schematic diagram that Fig. 1 and Fig. 2 figure are respectively the embodiment of the invention.One group of atomizer 109 be installed in one with radome 104 that support 111 is connected on, this atomizer can atomize and spray various liquid, in the both sides of atomizer two high-field electrodes 103 are installed respectively, this high-field electrode 103 is connected with the high-pressure side of power supply 110, a radome that is connected with the earth 104 is installed in the outside at this high-field electrode 103, these high-field electrode 103 inboards are provided with a round metal roller bearing ground electrode 112, this round metal roller bearing ground electrode 112 is installed on the support that is connected with the earth 113 by bearing 107, this support is installed on the base 101, be separately installed with the film axis of guide 102 in these both sides at round metal roller bearing ground electrode 112, when between high-field electrode 103 and metallic cylinder axle ground electrode 112, adding high frequency or radio-frequency voltage, produce plasma in the zone (slit) between two electrodes 103 and 112.Thin-film material 114 can pass the slit between these two electrodes.
Among Fig. 1 and Fig. 2,105,106,108 and 107 is fixed screws, and wherein 106 is to be connected with dielectric panel, and this dielectric panel is that to be used for fixing electrode 103,113 and 111 are metal fixed connecting plates.
Electrode 112 and 103 is to make with aluminum, and radome 104 can be used aluminum, also can make with other material.
Above-described specific embodiment; purpose of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the above only is specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of being made, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (8)
1. plasma discharge and atomizing grafting device, it is characterized in that: this device comprises one group of atomizer and is positioned at two high-field electrodes of atomizer both sides, this group atomizer be installed in one with radome that support is connected on, be used for the various liquid of atomizing ejection; These two high-field electrodes are connected with an end of power supply, a radome that is connected with the earth is installed in the outside, the inboard is provided with a round metal roller bearing ground electrode, when adding high frequency or radio-frequency voltage between high-field electrode and metallic cylinder axle ground electrode, the zone between high-field electrode and metallic cylinder axle ground electrode produces plasma.
2. plasma discharge according to claim 1 and atomizing grafting device is characterized in that: the liquid of this group atomizer atomizing ejection constitutes a plane, is sprayed on the surface of film.
3. plasma discharge according to claim 1 and atomizing grafting device is characterized in that: this high-field electrode be shaped as the segmental tile plate shape, the output voltage of the high voltage source that is connected is greater than 5KV, frequency range is 1 to 40KHz.
4. plasma discharge according to claim 3 and atomizing grafting device is characterized in that: this high voltage source is to adopt high frequency electric source, or adopts radio-frequency power supply.
5. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: the circular arc medial surface of this high-field electrode and the outer surface of this round metal roller bearing have certain spacing.
6. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: this round metal roller bearing ground electrode be installed in one with support that the earth is connected on, be separately installed with the film axis of guide at this in round metal roller bearing ground electrode both sides, thin-film material can be by the plasma discharge between high-field electrode and the round metal roller bearing ground electrode.
7. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: these two high-field electrodes and this round metal roller bearing ground electrode adopt aluminum to make.
8. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: this radome adopts aluminum to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102363812A CN102045935A (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102363812A CN102045935A (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102045935A true CN102045935A (en) | 2011-05-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009102363812A Pending CN102045935A (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Country Status (1)
| Country | Link |
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| CN (1) | CN102045935A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102869180A (en) * | 2012-02-02 | 2013-01-09 | 中国印刷科学技术研究所 | Barrier discharge plasma surface treatment system for large-breath medium |
| CN108135067A (en) * | 2018-01-19 | 2018-06-08 | 河海大学常州校区 | Water fog medium barrier discharge plasma and surface processing device |
| CN114126182A (en) * | 2021-11-12 | 2022-03-01 | 中国人民解放军空军工程大学 | High-efficiency plasma synthetic jet actuator based on steam pressure enhancement |
-
2009
- 2009-10-21 CN CN2009102363812A patent/CN102045935A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102869180A (en) * | 2012-02-02 | 2013-01-09 | 中国印刷科学技术研究所 | Barrier discharge plasma surface treatment system for large-breath medium |
| CN108135067A (en) * | 2018-01-19 | 2018-06-08 | 河海大学常州校区 | Water fog medium barrier discharge plasma and surface processing device |
| CN114126182A (en) * | 2021-11-12 | 2022-03-01 | 中国人民解放军空军工程大学 | High-efficiency plasma synthetic jet actuator based on steam pressure enhancement |
| CN114126182B (en) * | 2021-11-12 | 2023-05-30 | 中国人民解放军空军工程大学 | High-efficiency plasma synthetic jet exciter based on steam pressure enhancement |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110504 |