CN103794462A - Ultrasonic atomization plasma processing device - Google Patents
Ultrasonic atomization plasma processing device Download PDFInfo
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- CN103794462A CN103794462A CN201310718577.1A CN201310718577A CN103794462A CN 103794462 A CN103794462 A CN 103794462A CN 201310718577 A CN201310718577 A CN 201310718577A CN 103794462 A CN103794462 A CN 103794462A
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- ultrasonic transducer
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Abstract
The invention relates to an ultrasonic atomization plasma processing device which includes a power supply, an ultrasonic transducer, an ultrasonic nozzle and an electrode holder. The ultrasonic nozzle is connected with the ultrasonic transducer; an insulating layer is arranged between the ultrasonic transducer and the electrode holder; the electrode holder is grounded; and the ultrasonic transducer is connected with a positive pole of the high-frequency power supply. An electric field discharge is generated between the electrode holder and the ultrasonic transducer; and a sprayer discharges an atomized reaction raw material, so that plasma is generated. The ultrasonic atomization makes the generated plasma more evenly-distributed; and the ultrasonic transducer can convert the electric energy into the mechanical energy, so as to effectively promote the uniform distribution of gas and help the discharge to generate the plasma.
Description
Technical field
The invention belongs to plasma processing apparatus, be specifically related to a kind of ultrasonic atomization plasma processing apparatus.
Background technology
Material surface modifying treatment technology is one of current material preparation technology generally using, it is under certain external condition, material exterior materials and material surface generation physics or chemical reaction, thereby material surface state changed or produce new element and new group at material surface, finally meeting the needs of practical application.
But, the fast development of modern industry is had higher requirement to material wear-resistant wiping, wearing and tearing and the performance such as anticorrosive, meanwhile, also more and more higher to the requirement of environmental protection, thus effectively promote to be called as the development of material plasma process for modifying surface of green production process.Under vacuum, apply high-frequency electric field to reacting gas environment, gas ionizes and produces plasma under the excitation of high-frequency electric field.
Process inhomogeneous hidden danger but have during due to plasma treatment material, therefore need a kind of plasma device that can atomization again can discharge generation plasma forms atomization badly.
Summary of the invention
In order to solve the above-mentioned problems in the prior art, provide a kind of ultrasonic atomization plasma processing apparatus.
The technical solution adopted in the present invention is: a kind of ultrasonic atomization plasma processing apparatus, comprise power supply, ultrasonic transducer, ultrasonic nozzle and electrode tip holder, on above-mentioned ultrasonic transducer, offer air vent hole, in above-mentioned ultrasonic transducer, also offer liquid injection hole, above-mentioned ultrasonic nozzle is connected setting with above-mentioned ultrasonic transducer, above-mentioned ultrasonic transducer and above-mentioned ultrasonic nozzle are arranged on above-mentioned electrode tip holder, above-mentioned ultrasonic transducer connects high frequency electric source positive pole, above-mentioned electrode tip holder ground connection, between above-mentioned ultrasonic transducer and above-mentioned ultrasonic nozzle and above-mentioned electrode tip holder, be provided with insulating barrier.
Preferably, above-mentioned liquid injection hole is connected with syringe pump by fluid-through tube road.
Preferably, above-mentioned air vent hole connects breather line.
Preferably, on above-mentioned breather line, be also provided with flow control valve.
Preferably, the frequency range of above-mentioned high frequency electric source is 10Khz-100Khz.
Adopt the beneficial effect of the technical program to be: the electrode of the present invention using ultrasonic transducer as plasma, using electrode tip holder as another electrode, electrode tip holder and ultrasonic waves produce electric field between growing up to be a useful person, filling liquid in ultrasonic transducer, gas is at electric field discharge generation plasma, the liquid passing into is by ultrasonic atomization, by spraying in ultrasonic nozzle.Ultrasonic transducer can convert electric energy to vibration mechanical energy, is more conducive to gas discharge and produces plasma.This device can be by liquid charging stock atomization, and the raw material after atomization is easy to diffusion, and material plasma treatment can be obtained more evenly, effectively.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is the cross-sectional view of the embodiment of the present invention 1;
Fig. 2 is the cross-sectional view of the embodiment of the present invention 2.
In figure, 1. ultrasonic nozzle 2. insulating barrier 3. ultrasonic power 4. syringe pump 5. electrode tip holder 6. ultrasonic transducer 7. breather line 8. fluid-through tube road 9 flow valves.
Embodiment
Describe specific embodiments of the invention in detail below in conjunction with accompanying drawing.
Embodiment 1
As shown in Figure 1, a kind of ultrasonic atomization plasma processing apparatus, comprise power supply, ultrasonic transducer 6, ultrasonic nozzle 1 and electrode tip holder 5, on ultrasonic transducer 6, offer air vent hole, air vent hole connects breather line 7, in ultrasonic transducer, also offer liquid injection hole, liquid injection hole connects fluid-through tube road 8, ultrasonic nozzle 1 connection is arranged on electrode tip holder 5 bottoms, and form and be communicated with in the middle of ultrasonic transducer 6 and ultrasonic nozzle 1, ultrasonic transducer 6 is arranged on electrode tip holder 5 with ultrasonic nozzle 1, ultrasonic transducer 6 connects high frequency electric source positive pole, the frequency range of high frequency electric source is 10Khz-100Khz, electrode tip holder 5 ground connection, between ultrasonic transducer 6 and ultrasonic nozzle and electrode tip holder 5, be provided with insulating barrier 2, be part employing insulating barrier 2 isolated the opening that ultrasonic transducer 6 contacts with electrode tip holder 5.
When work, switch on power, in ultrasonic transducer, pass into reacting gas and pass into liquid from fluid-through tube road from breather line simultaneously, owing to forming electric field between ultrasonic transducer 6 and electrode tip holder 5, when electric field that the reacting gas that passes into forms through ultrasonic transducer 6 and electrode tip holder 5, discharge generation plasma, ultrasonic transducer 6 can convert electric energy to vibration mechanical energy, is more conducive to gas discharge and produces plasma; Meanwhile, the liquid charging stock after ultrasonic atomization produces plasma through high-frequency electric field, and sprays by ultrasonic nozzle 1, for the treatment for the treatment of processed material, material plasma treatment can be obtained more even.
Embodiment 2
All the other are identical with embodiment 1, and difference is, is also provided with flow control valve 9 on breather line, and for controlling the flow that passes into of gas, flow control valve 9 can effectively regulate the flow of the gas passing into.Avoid the gas that passes into too much gas discharge effect to be weakened, or avoid gas to pass into very few and make that the plasma that produces is very few can not effectively process processed material.
The invention has the beneficial effects as follows: the electrode of the present invention using ultrasonic transducer as plasma, using electrode tip holder as another electrode, electrode tip holder and ultrasonic waves produce electric field between growing up to be a useful person, filling liquid in ultrasonic transducer, gas is at electric field discharge generation plasma, the liquid passing into is by ultrasonic atomization, by spraying in ultrasonic nozzle.Ultrasonic transducer can convert electric energy to vibration mechanical energy, is more conducive to gas discharge and produces plasma.This device can be by liquid charging stock atomization, and the raw material after atomization is easy to diffusion, and material plasma treatment can be obtained more evenly, effectively.
Above-described is only the preferred embodiment of the present invention, it should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise of the invention, can also make some distortion and improvement, and these all belong to protection scope of the present invention.
Claims (5)
1. a ultrasonic atomization plasma processing apparatus, it is characterized in that, comprise power supply, ultrasonic transducer, ultrasonic nozzle and electrode tip holder, on described ultrasonic transducer, offer air vent hole, in described ultrasonic transducer, also offer liquid injection hole, described ultrasonic nozzle is connected setting with described ultrasonic transducer, described ultrasonic transducer and described ultrasonic nozzle are arranged on described electrode tip holder, described ultrasonic transducer connects high frequency electric source positive pole, described electrode tip holder ground connection, between described ultrasonic transducer and described ultrasonic nozzle and described electrode tip holder, be provided with insulating barrier.
2. ultrasonic atomization plasma processing apparatus according to claim 1, is characterized in that, described liquid injection hole is connected with syringe pump by fluid-through tube road.
3. ultrasonic atomization plasma processing apparatus according to claim 1, is characterized in that, described air vent hole connects breather line.
4. ultrasonic atomization plasma processing apparatus according to claim 3, is characterized in that, is also provided with flow control valve on described breather line.
5. ultrasonic atomization plasma processing apparatus according to claim 1, is characterized in that, the frequency range of described high frequency electric source is 10Khz-100Khz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310718577.1A CN103794462B (en) | 2013-12-24 | 2013-12-24 | A kind of ultrasonic atomization plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310718577.1A CN103794462B (en) | 2013-12-24 | 2013-12-24 | A kind of ultrasonic atomization plasma processing apparatus |
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| CN103794462A true CN103794462A (en) | 2014-05-14 |
| CN103794462B CN103794462B (en) | 2016-11-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310718577.1A Active CN103794462B (en) | 2013-12-24 | 2013-12-24 | A kind of ultrasonic atomization plasma processing apparatus |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109692637A (en) * | 2019-01-22 | 2019-04-30 | 华中科技大学 | A kind of integral type electric discharge device and liquid discharge system |
| CN111239106A (en) * | 2019-08-07 | 2020-06-05 | 广西科技大学鹿山学院 | Coaxial atomization and ultrasonic atomization series atomization device |
| CN115041074A (en) * | 2022-06-20 | 2022-09-13 | 安徽中科大禹科技有限公司 | Ultrasonic atomization plasma processing device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010024700A1 (en) * | 1997-05-01 | 2001-09-27 | Asbish Shah | Ruthenium-containing ultrasonically coated substrate for use in a capacitor and method of manufacture |
| CN1468154A (en) * | 2000-10-04 | 2004-01-14 | Method and apparatus for forming a coating | |
| JP2007031550A (en) * | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | Method for high pressure plasma surface treatment |
| CN201524640U (en) * | 2009-11-02 | 2010-07-14 | 邱永红 | Efficient atomizer combining pneumatic atomization with ultrasonic atomization |
| CN203659796U (en) * | 2013-12-24 | 2014-06-18 | 苏州市奥普斯等离子体科技有限公司 | Ultrasonic atomization plasma processing device |
-
2013
- 2013-12-24 CN CN201310718577.1A patent/CN103794462B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010024700A1 (en) * | 1997-05-01 | 2001-09-27 | Asbish Shah | Ruthenium-containing ultrasonically coated substrate for use in a capacitor and method of manufacture |
| CN1468154A (en) * | 2000-10-04 | 2004-01-14 | Method and apparatus for forming a coating | |
| JP2007031550A (en) * | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | Method for high pressure plasma surface treatment |
| CN201524640U (en) * | 2009-11-02 | 2010-07-14 | 邱永红 | Efficient atomizer combining pneumatic atomization with ultrasonic atomization |
| CN203659796U (en) * | 2013-12-24 | 2014-06-18 | 苏州市奥普斯等离子体科技有限公司 | Ultrasonic atomization plasma processing device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109692637A (en) * | 2019-01-22 | 2019-04-30 | 华中科技大学 | A kind of integral type electric discharge device and liquid discharge system |
| CN111239106A (en) * | 2019-08-07 | 2020-06-05 | 广西科技大学鹿山学院 | Coaxial atomization and ultrasonic atomization series atomization device |
| CN115041074A (en) * | 2022-06-20 | 2022-09-13 | 安徽中科大禹科技有限公司 | Ultrasonic atomization plasma processing device |
| CN115041074B (en) * | 2022-06-20 | 2023-09-29 | 安徽中科大禹科技有限公司 | Ultrasonic atomization plasma treatment device |
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| CN103794462B (en) | 2016-11-23 |
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Effective date of registration: 20200318 Address after: 215000 room 630, no.959, Jiayuan Road, Yuanhe street, Xiangcheng District, Suzhou City, Jiangsu Province Patentee after: Suzhou de Ruiyuan plasma Research Institute Co., Ltd Address before: Taishan road Suzhou City, Jiangsu province 215011 Suzhou high tech Industrial Development Zone No. 2 (Canton Science Park) Patentee before: SUZHOU OPS PLASMA TECHNOLOGY Co.,Ltd. |
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