CN108135067A - Water fog medium barrier discharge plasma and surface processing device - Google Patents
Water fog medium barrier discharge plasma and surface processing device Download PDFInfo
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- CN108135067A CN108135067A CN201810055645.3A CN201810055645A CN108135067A CN 108135067 A CN108135067 A CN 108135067A CN 201810055645 A CN201810055645 A CN 201810055645A CN 108135067 A CN108135067 A CN 108135067A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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Abstract
The invention discloses water fog medium barrier discharge plasma and surface processing devices, high pressure gas is introduced by mass flowmenter in fluidic device, gaseous species can be adjusted according to processing object, using atomizer by liquid handling be aerosol or drop, and high pressure gas effect under injection dielectric barrier discharge in.A large amount of active particles that dielectric barrier discharge generates are diffused into liquid phase, and workpiece surface is handled using activity function special in liquid phase.The various active particles generated by Ultraviolet sensor detection, and data acquisition and control unit are transferred to, show the working condition of present apparatus, and realize that online dynamic in real time adjusts, and then realize the automation handled workpiece surface in liquid phase.Workpiece is controlled to move by two-dimensional stage, realize continuous, uniform outer surface processing.The contact surface area of plasma active species and workpiece produced by it effectively increases dielectric barrier discharge increases the working efficiency of jet apparatus.
Description
Technical field
The present invention relates to a kind of Water spray discharge and processing units, and in particular to water fog medium barrier discharge plasma and table
Surface treatment device.
Background technology
Compared to the in vitro generation device such as low pressure, atmospheric pressure plasma be under the environment opened in atmospheric pressure generate and
Using, because its generated with plasma and maintenance system simply, the manufacture of equipment and maintenance cost is low, plasma source with
Preferable mobility, the advantages that material treatment processes process is easy to automate, equipment operation is simple and convenient, the energy with
The fields such as environment, biology and medicine, material surface modifying and processing, military affairs and space science all have broad application prospects.
From the angle of practical application, atmospheric pressure plasma research at present be concentrated mainly on gas-liquid two-phase environment it
Between.Outside plus under special electric field action, complicated physical and chemical reaction process can occur between gaseous state and liquid, generate a variety of
Active group (such as OH-、O、O3、H2O2、NOxDeng), these active groups determine plasma main character.
Gas-liquid two-phase electric discharge active constituent and its dosage, by electric discharge type, structure of reactor, gas-liquid two-phase parameter and
The coordinated regulation of multiple physics such as reactive kinetics parameters and chemical parameters, and eventually lead to the significance difference of practical application effect
It is different.
According to the electrode structure of plasma discharge, mainly include:Line-line/plate, array, jet stream etc..
According to environment to discharge in vitro is waited, can be divided into it:Gas phase and liquid phase are continuous, the separation of gas phase Continuous Liquid Phase and
Liquid phase continuous gas phase separation three types, wherein gas phase Continuous Liquid Phase separation electric discharge device are most widely used, mainly due to
A large amount of active particle (such as OH, O, H can be generated in discharge process2O2With ultraviolet radioactive etc.), and active particle longevity in a liquid
It orders relatively long.
Atmospheric plasma discharge form mainly has corona discharge, inductively-coupled discharge, dielectric barrier discharge, micro- hollow
Cathodic discharge and capacitively coupled discharge etc..Since dielectric barrier discharge can effectively inhibit spark discharge and arc discharge, and discharge
It is more uniform to generate plasma, therefore atmospheric pressure plasma dielectric barrier discharge is most widely used.
Design at present and transformation liquid phase atmospheric pressure plasma dielectric barrier discharge device are plasma science research
How important directions design liquid phase jet stream processing area bigger, jet source functioning efficiency height, plasma jet Continuous maching
The plasmas such as plane jet source has important practical meaning in engineering.
Invention content
To solve the deficiencies in the prior art, the purpose of the present invention is to provide one kind to accurately control, and realizes continuous, equal
The liquid of even surface treatment-plasma Water spray discharge and processing unit.
In order to realize above-mentioned target, the present invention adopts the following technical scheme that:
Water fog medium barrier discharge plasma device, the reative cell of bottom opening, bottom of chamber are equipped with the medium close to liquid level
Barrier discharge nozzle, chamber top are equipped with atomizer;
The atomizer connects tracheae in parallel and liquid pipe;
Dielectric barrier discharge nozzle includes several parallel, built-in electrode insulated dielectric tubes;High pressure activation power supply is electrode
It powers with liquid electrode.
The distance of above-mentioned dielectric barrier discharge nozzle and liquid level is 1~10mm.
The material of above-mentioned insulated dielectric tube includes any one of quartz, mica and poly- fluorine tetrafluoroethene, the material of electrode
Including tungsten-molybdenum alloy.
The internal diameter r values of above-mentioned insulated dielectric tube are 0.5~2mm, and outer diameter R values are 1~3mm;The diameter D of electrode for 0.05~
0.3mm。
The moisture control of above-mentioned atomizer outlet is 1%~20%.
Above-mentioned tracheae and liquid pipe, which are respectively equipped with, connects data acquisition and the flowmeter of control unit, and high pressure activation power supply is by data
Acquisition drives with control unit.
Water fog medium barrier discharge plasma surface processing device, above-mentioned water fog medium barrier discharge plasma dress
The liquid level put is the tank liquor face in sink, and the sink Inner standpipe is erected at by the iron plate of slot bottom and is acquired by data and controlled
On the two-dimensional magnetic workbench of unit driving processed.
Above-mentioned two-dimensional magnetic workbench includes the stage body, display module, key control module and the power supply module that connect microcontroller,
The microcontroller connects data acquisition and control unit;
The stage body includes the two-dimensional stage of magnetic table top and bottom;The iron of several winding copper coils built in magnetic table top
Core;Two-dimensional stage includes X horizontal axis and the Y longitudinal axis, and top surface is respectively equipped with sliding rail and by motor-driven screw;
Copper coil, motor supply electric drive by microcontroller respectively.
Above-mentioned sink is equipped with the Ultraviolet sensor of monitoring reative cell end, and the Ultraviolet sensor connects data acquisition and control
Unit.
Liquid in above-mentioned liquid pipe is tank liquor.
The invention has the beneficial effects that:
The water fog medium barrier discharge plasma and surface processing device of the present invention is generated high using dielectric barrier discharge
Bioplast is processing modified to workpiece progress surface in aerosol or drop, solves the dielectric barrier discharge range of work and generally limits to
In the range of 0.1~40mm, large sized object problem can not be processed.
The accurate control to high-pressure gas flow is realized by high-pressure air source, hand-operated valve and gas flow meter;According to processing
The high pressure gas type for being passed through reative cell can be changed in object difference;If it is passed through O2, then it is anti-that a series of materializations occur in the reaction chamber
Should, final product includes O3Deng some high work, oxidisability particle;If pass through H2, then plasma jet product is high reproducibility hydrogen
Ion etc..
Realize that the tank liquor in sink is recycled by water pump, and after the flow velocity by flowmeter adjusting tank liquor, by atomizer
Tank liquor is converted into aerosol or droplet.
The design of dielectric barrier discharge optimized parameter is realized by the voltage parameter for adjusting excitation power supply;Between electrode
The micro discharge of discharge mode from part is transitioned into dielectric impedance micro discharge, avoids local spark discharge or arc discharge so that logical
The gas molecule entered is ionized, and realizes liquid phase-plasma reciprocation, and the high activity particle application environment that can be generated
Reparation, material science and medical rehabilitation.
The iron plate glued by bottom of gullet fixes sink in workbench plus magnetic;It is real by two-dimensional magnetic workbench
Being accurately positioned for existing workpiece is processed with high precision.
The various active particles generated by Ultraviolet sensor detection, and it is transferred to data acquisition and control unit, display
The working condition of present apparatus, and realize that online dynamic in real time adjusts, so realize workpiece surface in liquid phase is handled it is automatic
Change.
The water fog medium barrier discharge plasma and surface processing device of the present invention, effectively increases dielectric barrier discharge
The contact surface area of produced plasma active species and workpiece increases the working efficiency of jet apparatus.
Description of the drawings
Fig. 1 is the structure diagram of the water fog medium barrier discharge plasma surface processing device of the present invention.
Fig. 2 is the structure diagram of the reative cell of the present invention.
Fig. 3 is the structure diagram of the dielectric barrier discharge nozzle of the present invention.
Fig. 4 is the structure diagram of the MCU of the present invention.
Fig. 5 is the vertical view of the structure diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 6 is the side view of the structure diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 7 is the connection relationship diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 8 is the structure diagram of the magnetic table top of the present invention.
Fig. 9 is the structure diagram of the sink of the present invention.
Figure 10 is the electrical block diagram of the Ultraviolet sensor of the present invention.
Figure 11 is the operation order schematic diagram of the present invention.
Figure 12 is the track schematic diagram of the work pieces process of the present invention.
The meaning marked in attached drawing is as follows:1st, atomizer, 2, flowmeter, 3, hand-operated valve, 4, liquid pump, 5, workpiece, 6, branch
Frame, 7, sink, 8, tank liquor, 9, iron plate, 10, magnetic table top, 11, two-dimensional stage, 12, Ultraviolet sensor, 13, high pressure activation electricity
Source, 14, reative cell, 15, liquid pipe, 16, tracheae, 17, insulated dielectric tube, 18, electrode, 19, sliding rail, 20, motor, 21, the Y longitudinal axis,
22nd, X horizontal axis, 23, iron core, 24, copper coil, 25, hot melt adhesive.
Specific embodiment
Make specific introduce to the present invention below in conjunction with the drawings and specific embodiments.
As shown in Figure 1, water fog medium barrier discharge plasma device, the bottom of chamber of reative cell 14 is equipped with away from liquid level 1~
The dielectric barrier discharge nozzle of 10mm, chamber top are equipped with and connect tracheae 16 in parallel and the atomizer 1 of liquid pipe 15, tracheae 16 and liquid pipe 15
It is respectively equipped with and connects data acquisition and the flowmeter 2 of control unit, tracheae 16 separately sets hand-operated valve 3;The moisture content control of the jet expansion
System is 1%~20%, and moisture content is higher, and droplet particles are bigger.
As shown in Figures 2 and 3, dielectric barrier discharge nozzle is made of several parallel and built-in electrode 18 insulated dielectric tube 17
Horizontal array dielectric barrier discharge, data acquisition are supplied with control unit control high pressure activation power supply 13 for electrode 18 and liquid electrode 18
Electricity.The internal diameter r values of insulated dielectric tube 17 are 0.5~2mm, and outer diameter R values are 1~3mm, and material can use quartz, mica and poly- fluorine four
Any one of vinyl fluoride, preferably quartzy, the diameter D of electrode 18 is 0.05~0.3mm, and material is preferably tungsten-molybdenum alloy.
Water fog medium barrier discharge plasma surface processing device, by liquid-plasma Water spray discharge device and water
Slot 7 and the two-dimensional magnetic workbench of bottom composition.
The dielectric barrier discharge nozzle of 14 bottom of chamber of reative cell is close to 8 face of tank liquor in sink 7, regular worker built in the sink 7
The stent 6 of part 5 is placed in by the iron plate 9 of slot bottom on two-dimensional magnetic workbench.Iron plate 9 is bonded in slot bottom bottom by hot melt adhesive 25
Portion (such as Fig. 9).The cycle of tank liquor 8 is supplied to atomizer 1 by liquid pump 4.
Two-dimensional magnetic workbench is made of microcontroller, stage body, display module, key control module and power supply module (as schemed
7), microcontroller connects data acquisition and control unit by interface circuit.
Stage body is made of the two-dimensional stage 11 of magnetic table top 10 and bottom;
The iron core 23 (such as Fig. 8) of several winding copper coils 24, is being passed through direct current meeting built in magnetic table top 10
Magnetic field is generated, if power supply disconnects, magnetic table top 10 loses magnetism.When magnetic table top 10 is powered, by adsorbing iron plate 9,
Sink 7 and magnetic 10 position of table top are fixed.
Two-dimensional stage 11 includes X horizontal axis 22 and the Y longitudinal axis 21 (such as Figures 5 and 6), and top surface is respectively equipped with 19 He of dove-tail form sliding rail
The screw driven by stepper motor 20;Stepper motor 20 drives the rotation of X-axis screw so that cunning of the Y longitudinal axis 21 along 22 top of X horizontal axis
Rail 19 slides;Likewise, stepper motor 20 drives the rotation of Y-axis screw so that sliding rail 19 of the magnetic table top 10 along 21 top of the Y longitudinal axis
It slides.Copper coil 24, stepper motor 20 are powered by microcontroller, driven respectively.
Sink 7 is equipped with the Ultraviolet sensor 12 of 14 end of monitoring reative cell being connect with connecing data acquisition with control unit.
Hardware, principle and the operation of the present invention:
(1), data acquisition and control unit
As shown in figure 4, data acquisition and control unit, contain microprocessor (MCU), gas flow and optical detection number
According to acquisition zone, button control zone, viewing area, the driving of stepper motor 20 area, 13 control zone of high pressure activation power supply, power-supplying circuit
Block region and interface circuit area.
STC12C, STM32, STC89 family chip of STC Corporation may be selected in MCU.Preferred package is SOP-20, built-in 8
ADC and universaling I/O port, speed can reach 100kHZ, and 8 tunnel ADC module may be used as voltage detecting, current detecting, spectrum inspection
Survey etc..
Signal acquisition and the ADC interface for being transmitted to MCU, later MCU judge that electric discharge device is according to the model of inner setting
It is no to be operated in optimal discharge state, so as to control each discharge parameter of the operation of whole system.Display screen is connect with I/O mouthfuls,
Model LCD1602, LCD12864, LCD16864, LCD12232 that display screen can use etc..
(2), two-dimensional magnetic workbench
Microcontroller select operation at 8 and more than, can be selected 8 51 series atm EGA16L microcontrollers, because its have typical case
Structure, numerous logical bit operating functions and abundant instruction system, while there is powerful operational capability and programmable
The characteristics of, it can realize more complicated 20 control function of stepper motor.
Key control module use input module of 4 × 4 matrix keyboards as system, with realize the parameter setting of system,
Changing interface and real-time keying.It is realized by the input of button and the parameters such as shows to circuit setting coordinate, motion mode, array
Setting.
Display module uses LCD liquid crystal displays, and LCD1602 models can be selected, can be real using serial mode circuit connecting
The functions such as setting value, current value, the run duration of existing displaing coordinate.
For the ease of online programming, download and emulation mouth line, it is added to interface circuit.Jtag interface can be used in interface circuit
Mode can support online adjusting function in the piece of extension, while can realize to in-chip FLASH, EEPROM, configuration fuse bit
It is realized with locking encrypted bits and downloads programming.
The DC voltage-stabilizing chip in integrated regulator, such as L7805 voltage stabilizing chips can be used in power supply module, is the confession of system
Power supply.
Position control is carried out as driver using stepper motor 20.20 power of stepper motor is in 50~200W, exchange
CLK (CP), DIR, RST, ERR can be selected in 220V or direct current 24V power supplies, control signaling interface.
As it can be seen in figures 5 and 6, it is followed successively by magnetic table top 10, X horizontal axis 22, the Y longitudinal axis 21 from top to bottom.When y-axis stepper motor 20
During rotation, X horizontal axis 22 drives magnetic table top 10 to be moved along Y direction, and X-axis stepper motor 20 is static;When 20 turns of X-axis stepper motor
When dynamic, magnetic table top 10 is moved along X-axis aspect, and y-axis stepper motor 20 is static at this time.
X-axis and y-axis stepper motor 20 connect microcontroller respectively, and the speed and row of two motors 20 are controlled by microcontroller
Journey, can realize movement speed >=70mm/s of magnetic table top 10, and stroke is in 500 × 500mm, and control accuracy is in 0.1mm.
Two-dimensional magnetic workbench uses the double-layer structure that stepper motor 20 drives, can be each by being carried out under computer system control
Kind precise motion, systemic resolution are high.
(3), Ultraviolet sensor 12
The present invention drives dielectric barrier discharge structure using PDM high voltage power supplies.
Under the action of high voltage electric field, material absorption energy ionizes.Between atom or molecule and electronics in gas
Collision, collided between atom and atom, the interaction of light and atom or molecule generates various discharge products, including height
It can electronics, negative ions, free radical, ozone (O3) and ultraviolet light (UV) and a small amount of nitrogen oxides (NOx) etc., make in exhaust gas
The toxic species such as organic molecule, heavy metal element, germ, Strong oxdiative reaction occurs, is finally reached degradation, sterilizes, disappears
The purpose of malicious.
Gas absorbs electric energy under the action of dielectric barrier discharge, and electron transition occurs, and generates the active specy of excitation state,
Active specy can send out the light of specific wavelength during ground state is become again by excitation state, therefore the concentration for generating active specy can
It is represented with intensity by emission spectrum.
The device of the invention generates ultraviolet radioactive in discharge process, and the wave-length coverage of ultraviolet light is 180-400nm, specifically
It is divided into UVC radiation (180-280nm), UVB radiation (280-320nm), UVA radiation (320-400nm).Since human eye does not see purple
The atoms such as external radiation, the ultraviolet light for generation of discharging and analysis spectral component and radiation intensity are needed through special optical detector
Part measures.
In order to measure the activated species of region of discharge and concentration, the present invention utilizes 12 detection reaction room of Ultraviolet sensor
Optical signalling is converted into electric signal by the spectral intensity of the active matter of 14 region of discharges, the voltage exported with Ultraviolet sensor 12
Signal represents the relative concentration that active specy generates.GS-AB-0603E (detection range 300- can be selected in sensor model number
370nm), GS-ABC-2835 (detection range 210-370nm), GT-UVV-L (detection range 200-440nm) etc..
Since the active specy generated during dielectric barrier discharge can send out the spectrum of multi-wavelength, as hydroxyl (
OH), oxygen radical (O) and nitrogen oxides (NOx), and the spectrum of (OH) (309-318nm) is primarily upon in the present invention, because
This places optical filter before Ultraviolet sensor 12 and spectrum is tentatively filtered out.ET313/ may be selected in ultraviolet bandpass-type optical filter
25BP (centre wavelength 313nm, bandwidth 25nm), ET325/20BP (centre wavelength 325nm, bandwidth 20nm), XBPA310,
ZBPA310 (centre wavelength 310nm, bandwidth 10nm).
As shown in Figure 10, the voltage signal of Ultraviolet sensor 12 is isolated by voltage follower, due to ultraviolet biography
The frequency for the signal that sensor 12 exports is higher, so U7 is used as voltage follow using response time very fast current mode operational amplifier
Device.Since the input impedance of rear class operational amplifier is infinitely great, the accumulation of charge is caused, it is therefore desirable to indirect one with the earth
Resistance R12 as can release channel, in order to prevent high-voltage oscillation, R12 matched with R13, resistance value is equal.Ultraviolet sensor
The voltage signal of 12 outputs contains DC component, if it is full that it is likely to result in amplification directly by the amplifying circuit of rear class
And distortion, therefore use the DC component in capacitance C6 isolation sensor output signals.See-saw circuit pair is used in next step
The signal amplitude of acquirement is amplified, to amplified voltage signal after signal is isolated again by voltage order one follower
It is handled.Later by rectification circuit to AC signal is become direct current signal, the MCU of built-in ADC module is input a signal into,
Data are acquired and are shown.
The corresponding equation of amplifying circuit is:
In formula, V represents that the voltage signal that Ultraviolet sensor 12 exports passes through the voltage value of voltage follower, and U8o expressions are put
The voltage value of big circuit output.
(4), operating process
As shown in figure 11,6 buttons are shared in the peripheral hardware of the device of the invention,
Button 1 is master switch button, i.e., device just starts to work normally after its closure,
Button 2 is 10 button of magnetic table top, i.e., magnetic worktable adds magnetic after its closure, and 7 position of sink is fixed, and button breaks
It opens, sink 7, which is fixed, to be released, and can be moved.
Button 3 is 11 on & off switch of two-dimensional stage, i.e., it is closed post-processing platform and is moved in horizontal plane according to program setting
It is dynamic.
Button 4 is high pressure gas ventilation button, and device is passed through gas after connection.
Button 5 is that liquid pump 4 is passed through liquid button, and device is passed through liquid after connection.
Button 6 is plasma jet power switch key (high pressure activation power supply 13), after switch is closed, plasma jet
Electrode 18 is powered, and generates high activity plasma jet particle.
First button 1, engaging means general supply, then open button 2 plus magnetic, fix sink 7.It is high opening plasma jet
It needs to open 4 and 5 key of button before frequency power, is passed through high pressure gas and liquid, finally pushes button 6, plasma jet is opened
Beginning work.
High pressure gas together with flowmeter 2 is controlled with liquid pump 4 controls liquid by flowing into atomizer 1, atomizer 1
Liquid is changed into aerosol or drop, is then injected into dielectric barrier discharge nozzle.
Dielectric barrier discharge is generated between high-frequency exiting power active electrode 18 and liquid electrode 18, is generated with active particle
Aerosol or drop, aerosol or drop containing active particle are sprayed at processed material surface under hyperbar effect, so as to fulfill right
Processing object material surface is handled.
The stabilization of sink 7 is fixed by magnetic worktable;Processing object (workpiece 5) is realized for 11 times in two-dimensional stage
Continuous uniform plasma surface treatment in plane.
When device operates, gas flowmeter 2 and Ultraviolet sensor 12 are by its collected gas flow and gas componant
Information, which is changed into analog signal and is sent to MCU, is converted into digital signal, and then the plasma for controlling liquid crystal display current
Jet stream handles material surface quality, while carries out phase according to current 13 control zone of high pressure activation power supply and the driving of stepper motor 20
The action answered.Microcontroller is connect with MCU, and pulse signal, direction signal and enable signal are conducted to microcontroller by MCU, and then are controlled
Movement velocity, direction and the distance of stepper motor 20 processed.
Surface treatment process is as shown in figure 12, and for plasma jet initial position in O points, then passing through two-dimensional stage 11 will
A (a, b) position moves on at plasma jet (O points), opens plasma jet at this time, moves on to table top and is moved in Y direction,
B (a, c) position is made to be at plasma jet.Y-axis stepper motor 20 stops, and work top is acted in X-axis stepper motor 20
It is moved to C (d, c) position.Successively according to as shown in fig. 7, processing object processing is completed.
Button is closed to operate according to 6 → 5 → 4 → 3 → 2 → 1 sequence.
The basic principles, main features and advantages of the invention have been shown and described above.The technical staff of the industry should
Understand, the invention is not limited in any way above-described embodiment, all to be obtained by the way of equivalent substitution or equivalent transformation
Technical solution is all fallen in protection scope of the present invention.
Claims (10)
1. water fog medium barrier discharge plasma device, which is characterized in that the dielectric barrier discharge nozzle patch of reative cell bottom of chamber
Nearly liquid level, chamber top are equipped with and connect tracheae in parallel and the atomizer of liquid pipe;
Dielectric barrier discharge nozzle is made of several parallel, built-in electrode insulated dielectric tubes;
High pressure activation power supply is powered for electrode and liquid electrode.
2. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the tracheae and liquid
Pipe is respectively equipped with flowmeter, and the flowmeter and high pressure activation power supply connect data acquisition and control unit.
3. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric impedance
The distance of electric discharge nozzle and liquid level is 1~10mm.
4. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric
The material of pipe includes any one of quartz, mica and poly- fluorine tetrafluoroethene, and the material of electrode includes tungsten-molybdenum alloy.
5. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric
The internal diameter r values of pipe are 0.5~2mm, and outer diameter R values are 1~3mm;The diameter D of electrode is 0.05~0.3mm.
6. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the atomizer
The moisture control of outlet is 1%~20%.
7. water fog medium barrier discharge plasma surface processing device, which is characterized in that any water of claim 1-6
The liquid level of mist dielectric barrier discharge plasma device is the tank liquor face in sink, and the sink Inner standpipe passes through slot bottom
Iron plate is placed on the two-dimensional magnetic workbench driven by data acquisition with control unit.
8. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that described
Two-dimensional magnetic workbench includes the stage body, display module, key control module and the power supply module that connect microcontroller, and the microcontroller connects
Data acquire and control unit;
The stage body includes the two-dimensional stage of magnetic table top and bottom;The iron core of several winding copper coils built in magnetic table top;Two
It ties up platform and includes X horizontal axis and the Y longitudinal axis, top surface is respectively equipped with sliding rail and by motor-driven screw;
Copper coil, motor supply electric drive by microcontroller respectively.
9. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that described
Sink is equipped with the Ultraviolet sensor of monitoring reative cell end, and the Ultraviolet sensor connects data acquisition and control unit.
10. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that institute
It is tank liquor to state the liquid in liquid pipe.
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---|---|---|---|---|
CN111559790A (en) * | 2020-05-21 | 2020-08-21 | 重庆工商大学 | Venturi type water mist discharge plasma pollutant treatment device |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1953822A (en) * | 2004-05-14 | 2007-04-25 | 陶氏康宁爱尔兰有限公司 | Coating compositions |
CN102045935A (en) * | 2009-10-21 | 2011-05-04 | 中国科学院微电子研究所 | Plasma discharge and atomization grafting device |
CN102333412A (en) * | 2011-09-08 | 2012-01-25 | 陈固明 | High-energy multi-state low-temperature ionizer |
CN103159287A (en) * | 2013-03-30 | 2013-06-19 | 山东大学 | Radial flow type DBD (Dielectric Barrier Discharge) thiamethoxam pesticide wastewater treatment equipment |
CN103496761A (en) * | 2013-09-09 | 2014-01-08 | 河海大学常州校区 | Plasma-supersonic wave combined water processing apparatus and process flow thereof |
CN103523856A (en) * | 2013-09-09 | 2014-01-22 | 河海大学常州校区 | Water mist discharge and ultrasound synergetic degradation wastewater treatment device and running method thereof |
CN105297126A (en) * | 2015-10-15 | 2016-02-03 | 北京科技大学 | Method for continuously treating surface of large-area metal material through liquid plasma |
CN105611711A (en) * | 2015-12-24 | 2016-05-25 | 河南理工大学 | Gas-liquid two-phase plasma generating device for polymer surface modification |
CN105858814A (en) * | 2016-03-28 | 2016-08-17 | 大连民族大学 | Array-type medium-preventing-discharge wastewater treatment device for high-density water |
CN206173024U (en) * | 2016-08-29 | 2017-05-17 | 荣烜曼 | Plasma activated water is used for sterile device of hospital or house |
WO2017161153A1 (en) * | 2016-03-18 | 2017-09-21 | The George Washington University | Compositions for treatment of cancer, methods and systems for forming the same |
CN206879179U (en) * | 2017-04-23 | 2018-01-12 | 河南理工大学 | A kind of gas-liquid two-phase plasma generating device of improvement |
-
2018
- 2018-01-19 CN CN201810055645.3A patent/CN108135067A/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1953822A (en) * | 2004-05-14 | 2007-04-25 | 陶氏康宁爱尔兰有限公司 | Coating compositions |
CN102045935A (en) * | 2009-10-21 | 2011-05-04 | 中国科学院微电子研究所 | Plasma discharge and atomization grafting device |
CN102333412A (en) * | 2011-09-08 | 2012-01-25 | 陈固明 | High-energy multi-state low-temperature ionizer |
CN103159287A (en) * | 2013-03-30 | 2013-06-19 | 山东大学 | Radial flow type DBD (Dielectric Barrier Discharge) thiamethoxam pesticide wastewater treatment equipment |
CN103496761A (en) * | 2013-09-09 | 2014-01-08 | 河海大学常州校区 | Plasma-supersonic wave combined water processing apparatus and process flow thereof |
CN103523856A (en) * | 2013-09-09 | 2014-01-22 | 河海大学常州校区 | Water mist discharge and ultrasound synergetic degradation wastewater treatment device and running method thereof |
CN105297126A (en) * | 2015-10-15 | 2016-02-03 | 北京科技大学 | Method for continuously treating surface of large-area metal material through liquid plasma |
CN105611711A (en) * | 2015-12-24 | 2016-05-25 | 河南理工大学 | Gas-liquid two-phase plasma generating device for polymer surface modification |
WO2017161153A1 (en) * | 2016-03-18 | 2017-09-21 | The George Washington University | Compositions for treatment of cancer, methods and systems for forming the same |
CN105858814A (en) * | 2016-03-28 | 2016-08-17 | 大连民族大学 | Array-type medium-preventing-discharge wastewater treatment device for high-density water |
CN206173024U (en) * | 2016-08-29 | 2017-05-17 | 荣烜曼 | Plasma activated water is used for sterile device of hospital or house |
CN206879179U (en) * | 2017-04-23 | 2018-01-12 | 河南理工大学 | A kind of gas-liquid two-phase plasma generating device of improvement |
Non-Patent Citations (2)
Title |
---|
CHEN BINGYAN ET AL.: "Water Content E®ect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray", 《PLASMA SCIENCE AND TECHNOLOGY》 * |
万顺疆: "等离子体引发雾聚合制备功能化表面的研究", 《中国优秀硕士学位论文全文数据库 工程科技I辑》 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111559790A (en) * | 2020-05-21 | 2020-08-21 | 重庆工商大学 | Venturi type water mist discharge plasma pollutant treatment device |
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