CN108135067A - Water fog medium barrier discharge plasma and surface processing device - Google Patents

Water fog medium barrier discharge plasma and surface processing device Download PDF

Info

Publication number
CN108135067A
CN108135067A CN201810055645.3A CN201810055645A CN108135067A CN 108135067 A CN108135067 A CN 108135067A CN 201810055645 A CN201810055645 A CN 201810055645A CN 108135067 A CN108135067 A CN 108135067A
Authority
CN
China
Prior art keywords
barrier discharge
discharge plasma
water fog
medium barrier
fog medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810055645.3A
Other languages
Chinese (zh)
Inventor
陈秉岩
陈玉伟
蒋永锋
何湘
朱昌平
田泽
甘育麟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Campus of Hohai University
Original Assignee
Changzhou Campus of Hohai University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Campus of Hohai University filed Critical Changzhou Campus of Hohai University
Priority to CN201810055645.3A priority Critical patent/CN108135067A/en
Publication of CN108135067A publication Critical patent/CN108135067A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

The invention discloses water fog medium barrier discharge plasma and surface processing devices, high pressure gas is introduced by mass flowmenter in fluidic device, gaseous species can be adjusted according to processing object, using atomizer by liquid handling be aerosol or drop, and high pressure gas effect under injection dielectric barrier discharge in.A large amount of active particles that dielectric barrier discharge generates are diffused into liquid phase, and workpiece surface is handled using activity function special in liquid phase.The various active particles generated by Ultraviolet sensor detection, and data acquisition and control unit are transferred to, show the working condition of present apparatus, and realize that online dynamic in real time adjusts, and then realize the automation handled workpiece surface in liquid phase.Workpiece is controlled to move by two-dimensional stage, realize continuous, uniform outer surface processing.The contact surface area of plasma active species and workpiece produced by it effectively increases dielectric barrier discharge increases the working efficiency of jet apparatus.

Description

Water fog medium barrier discharge plasma and surface processing device
Technical field
The present invention relates to a kind of Water spray discharge and processing units, and in particular to water fog medium barrier discharge plasma and table Surface treatment device.
Background technology
Compared to the in vitro generation device such as low pressure, atmospheric pressure plasma be under the environment opened in atmospheric pressure generate and Using, because its generated with plasma and maintenance system simply, the manufacture of equipment and maintenance cost is low, plasma source with Preferable mobility, the advantages that material treatment processes process is easy to automate, equipment operation is simple and convenient, the energy with The fields such as environment, biology and medicine, material surface modifying and processing, military affairs and space science all have broad application prospects.
From the angle of practical application, atmospheric pressure plasma research at present be concentrated mainly on gas-liquid two-phase environment it Between.Outside plus under special electric field action, complicated physical and chemical reaction process can occur between gaseous state and liquid, generate a variety of Active group (such as OH-、O、O3、H2O2、NOxDeng), these active groups determine plasma main character.
Gas-liquid two-phase electric discharge active constituent and its dosage, by electric discharge type, structure of reactor, gas-liquid two-phase parameter and The coordinated regulation of multiple physics such as reactive kinetics parameters and chemical parameters, and eventually lead to the significance difference of practical application effect It is different.
According to the electrode structure of plasma discharge, mainly include:Line-line/plate, array, jet stream etc..
According to environment to discharge in vitro is waited, can be divided into it:Gas phase and liquid phase are continuous, the separation of gas phase Continuous Liquid Phase and Liquid phase continuous gas phase separation three types, wherein gas phase Continuous Liquid Phase separation electric discharge device are most widely used, mainly due to A large amount of active particle (such as OH, O, H can be generated in discharge process2O2With ultraviolet radioactive etc.), and active particle longevity in a liquid It orders relatively long.
Atmospheric plasma discharge form mainly has corona discharge, inductively-coupled discharge, dielectric barrier discharge, micro- hollow Cathodic discharge and capacitively coupled discharge etc..Since dielectric barrier discharge can effectively inhibit spark discharge and arc discharge, and discharge It is more uniform to generate plasma, therefore atmospheric pressure plasma dielectric barrier discharge is most widely used.
Design at present and transformation liquid phase atmospheric pressure plasma dielectric barrier discharge device are plasma science research How important directions design liquid phase jet stream processing area bigger, jet source functioning efficiency height, plasma jet Continuous maching The plasmas such as plane jet source has important practical meaning in engineering.
Invention content
To solve the deficiencies in the prior art, the purpose of the present invention is to provide one kind to accurately control, and realizes continuous, equal The liquid of even surface treatment-plasma Water spray discharge and processing unit.
In order to realize above-mentioned target, the present invention adopts the following technical scheme that:
Water fog medium barrier discharge plasma device, the reative cell of bottom opening, bottom of chamber are equipped with the medium close to liquid level Barrier discharge nozzle, chamber top are equipped with atomizer;
The atomizer connects tracheae in parallel and liquid pipe;
Dielectric barrier discharge nozzle includes several parallel, built-in electrode insulated dielectric tubes;High pressure activation power supply is electrode It powers with liquid electrode.
The distance of above-mentioned dielectric barrier discharge nozzle and liquid level is 1~10mm.
The material of above-mentioned insulated dielectric tube includes any one of quartz, mica and poly- fluorine tetrafluoroethene, the material of electrode Including tungsten-molybdenum alloy.
The internal diameter r values of above-mentioned insulated dielectric tube are 0.5~2mm, and outer diameter R values are 1~3mm;The diameter D of electrode for 0.05~ 0.3mm。
The moisture control of above-mentioned atomizer outlet is 1%~20%.
Above-mentioned tracheae and liquid pipe, which are respectively equipped with, connects data acquisition and the flowmeter of control unit, and high pressure activation power supply is by data Acquisition drives with control unit.
Water fog medium barrier discharge plasma surface processing device, above-mentioned water fog medium barrier discharge plasma dress The liquid level put is the tank liquor face in sink, and the sink Inner standpipe is erected at by the iron plate of slot bottom and is acquired by data and controlled On the two-dimensional magnetic workbench of unit driving processed.
Above-mentioned two-dimensional magnetic workbench includes the stage body, display module, key control module and the power supply module that connect microcontroller, The microcontroller connects data acquisition and control unit;
The stage body includes the two-dimensional stage of magnetic table top and bottom;The iron of several winding copper coils built in magnetic table top Core;Two-dimensional stage includes X horizontal axis and the Y longitudinal axis, and top surface is respectively equipped with sliding rail and by motor-driven screw;
Copper coil, motor supply electric drive by microcontroller respectively.
Above-mentioned sink is equipped with the Ultraviolet sensor of monitoring reative cell end, and the Ultraviolet sensor connects data acquisition and control Unit.
Liquid in above-mentioned liquid pipe is tank liquor.
The invention has the beneficial effects that:
The water fog medium barrier discharge plasma and surface processing device of the present invention is generated high using dielectric barrier discharge Bioplast is processing modified to workpiece progress surface in aerosol or drop, solves the dielectric barrier discharge range of work and generally limits to In the range of 0.1~40mm, large sized object problem can not be processed.
The accurate control to high-pressure gas flow is realized by high-pressure air source, hand-operated valve and gas flow meter;According to processing The high pressure gas type for being passed through reative cell can be changed in object difference;If it is passed through O2, then it is anti-that a series of materializations occur in the reaction chamber Should, final product includes O3Deng some high work, oxidisability particle;If pass through H2, then plasma jet product is high reproducibility hydrogen Ion etc..
Realize that the tank liquor in sink is recycled by water pump, and after the flow velocity by flowmeter adjusting tank liquor, by atomizer Tank liquor is converted into aerosol or droplet.
The design of dielectric barrier discharge optimized parameter is realized by the voltage parameter for adjusting excitation power supply;Between electrode The micro discharge of discharge mode from part is transitioned into dielectric impedance micro discharge, avoids local spark discharge or arc discharge so that logical The gas molecule entered is ionized, and realizes liquid phase-plasma reciprocation, and the high activity particle application environment that can be generated Reparation, material science and medical rehabilitation.
The iron plate glued by bottom of gullet fixes sink in workbench plus magnetic;It is real by two-dimensional magnetic workbench Being accurately positioned for existing workpiece is processed with high precision.
The various active particles generated by Ultraviolet sensor detection, and it is transferred to data acquisition and control unit, display The working condition of present apparatus, and realize that online dynamic in real time adjusts, so realize workpiece surface in liquid phase is handled it is automatic Change.
The water fog medium barrier discharge plasma and surface processing device of the present invention, effectively increases dielectric barrier discharge The contact surface area of produced plasma active species and workpiece increases the working efficiency of jet apparatus.
Description of the drawings
Fig. 1 is the structure diagram of the water fog medium barrier discharge plasma surface processing device of the present invention.
Fig. 2 is the structure diagram of the reative cell of the present invention.
Fig. 3 is the structure diagram of the dielectric barrier discharge nozzle of the present invention.
Fig. 4 is the structure diagram of the MCU of the present invention.
Fig. 5 is the vertical view of the structure diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 6 is the side view of the structure diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 7 is the connection relationship diagram of the two-dimensional magnetic workbench of the present invention.
Fig. 8 is the structure diagram of the magnetic table top of the present invention.
Fig. 9 is the structure diagram of the sink of the present invention.
Figure 10 is the electrical block diagram of the Ultraviolet sensor of the present invention.
Figure 11 is the operation order schematic diagram of the present invention.
Figure 12 is the track schematic diagram of the work pieces process of the present invention.
The meaning marked in attached drawing is as follows:1st, atomizer, 2, flowmeter, 3, hand-operated valve, 4, liquid pump, 5, workpiece, 6, branch Frame, 7, sink, 8, tank liquor, 9, iron plate, 10, magnetic table top, 11, two-dimensional stage, 12, Ultraviolet sensor, 13, high pressure activation electricity Source, 14, reative cell, 15, liquid pipe, 16, tracheae, 17, insulated dielectric tube, 18, electrode, 19, sliding rail, 20, motor, 21, the Y longitudinal axis, 22nd, X horizontal axis, 23, iron core, 24, copper coil, 25, hot melt adhesive.
Specific embodiment
Make specific introduce to the present invention below in conjunction with the drawings and specific embodiments.
As shown in Figure 1, water fog medium barrier discharge plasma device, the bottom of chamber of reative cell 14 is equipped with away from liquid level 1~ The dielectric barrier discharge nozzle of 10mm, chamber top are equipped with and connect tracheae 16 in parallel and the atomizer 1 of liquid pipe 15, tracheae 16 and liquid pipe 15 It is respectively equipped with and connects data acquisition and the flowmeter 2 of control unit, tracheae 16 separately sets hand-operated valve 3;The moisture content control of the jet expansion System is 1%~20%, and moisture content is higher, and droplet particles are bigger.
As shown in Figures 2 and 3, dielectric barrier discharge nozzle is made of several parallel and built-in electrode 18 insulated dielectric tube 17 Horizontal array dielectric barrier discharge, data acquisition are supplied with control unit control high pressure activation power supply 13 for electrode 18 and liquid electrode 18 Electricity.The internal diameter r values of insulated dielectric tube 17 are 0.5~2mm, and outer diameter R values are 1~3mm, and material can use quartz, mica and poly- fluorine four Any one of vinyl fluoride, preferably quartzy, the diameter D of electrode 18 is 0.05~0.3mm, and material is preferably tungsten-molybdenum alloy.
Water fog medium barrier discharge plasma surface processing device, by liquid-plasma Water spray discharge device and water Slot 7 and the two-dimensional magnetic workbench of bottom composition.
The dielectric barrier discharge nozzle of 14 bottom of chamber of reative cell is close to 8 face of tank liquor in sink 7, regular worker built in the sink 7 The stent 6 of part 5 is placed in by the iron plate 9 of slot bottom on two-dimensional magnetic workbench.Iron plate 9 is bonded in slot bottom bottom by hot melt adhesive 25 Portion (such as Fig. 9).The cycle of tank liquor 8 is supplied to atomizer 1 by liquid pump 4.
Two-dimensional magnetic workbench is made of microcontroller, stage body, display module, key control module and power supply module (as schemed 7), microcontroller connects data acquisition and control unit by interface circuit.
Stage body is made of the two-dimensional stage 11 of magnetic table top 10 and bottom;
The iron core 23 (such as Fig. 8) of several winding copper coils 24, is being passed through direct current meeting built in magnetic table top 10 Magnetic field is generated, if power supply disconnects, magnetic table top 10 loses magnetism.When magnetic table top 10 is powered, by adsorbing iron plate 9, Sink 7 and magnetic 10 position of table top are fixed.
Two-dimensional stage 11 includes X horizontal axis 22 and the Y longitudinal axis 21 (such as Figures 5 and 6), and top surface is respectively equipped with 19 He of dove-tail form sliding rail The screw driven by stepper motor 20;Stepper motor 20 drives the rotation of X-axis screw so that cunning of the Y longitudinal axis 21 along 22 top of X horizontal axis Rail 19 slides;Likewise, stepper motor 20 drives the rotation of Y-axis screw so that sliding rail 19 of the magnetic table top 10 along 21 top of the Y longitudinal axis It slides.Copper coil 24, stepper motor 20 are powered by microcontroller, driven respectively.
Sink 7 is equipped with the Ultraviolet sensor 12 of 14 end of monitoring reative cell being connect with connecing data acquisition with control unit.
Hardware, principle and the operation of the present invention:
(1), data acquisition and control unit
As shown in figure 4, data acquisition and control unit, contain microprocessor (MCU), gas flow and optical detection number According to acquisition zone, button control zone, viewing area, the driving of stepper motor 20 area, 13 control zone of high pressure activation power supply, power-supplying circuit Block region and interface circuit area.
STC12C, STM32, STC89 family chip of STC Corporation may be selected in MCU.Preferred package is SOP-20, built-in 8 ADC and universaling I/O port, speed can reach 100kHZ, and 8 tunnel ADC module may be used as voltage detecting, current detecting, spectrum inspection Survey etc..
Signal acquisition and the ADC interface for being transmitted to MCU, later MCU judge that electric discharge device is according to the model of inner setting It is no to be operated in optimal discharge state, so as to control each discharge parameter of the operation of whole system.Display screen is connect with I/O mouthfuls, Model LCD1602, LCD12864, LCD16864, LCD12232 that display screen can use etc..
(2), two-dimensional magnetic workbench
Microcontroller select operation at 8 and more than, can be selected 8 51 series atm EGA16L microcontrollers, because its have typical case Structure, numerous logical bit operating functions and abundant instruction system, while there is powerful operational capability and programmable The characteristics of, it can realize more complicated 20 control function of stepper motor.
Key control module use input module of 4 × 4 matrix keyboards as system, with realize the parameter setting of system, Changing interface and real-time keying.It is realized by the input of button and the parameters such as shows to circuit setting coordinate, motion mode, array Setting.
Display module uses LCD liquid crystal displays, and LCD1602 models can be selected, can be real using serial mode circuit connecting The functions such as setting value, current value, the run duration of existing displaing coordinate.
For the ease of online programming, download and emulation mouth line, it is added to interface circuit.Jtag interface can be used in interface circuit Mode can support online adjusting function in the piece of extension, while can realize to in-chip FLASH, EEPROM, configuration fuse bit It is realized with locking encrypted bits and downloads programming.
The DC voltage-stabilizing chip in integrated regulator, such as L7805 voltage stabilizing chips can be used in power supply module, is the confession of system Power supply.
Position control is carried out as driver using stepper motor 20.20 power of stepper motor is in 50~200W, exchange CLK (CP), DIR, RST, ERR can be selected in 220V or direct current 24V power supplies, control signaling interface.
As it can be seen in figures 5 and 6, it is followed successively by magnetic table top 10, X horizontal axis 22, the Y longitudinal axis 21 from top to bottom.When y-axis stepper motor 20 During rotation, X horizontal axis 22 drives magnetic table top 10 to be moved along Y direction, and X-axis stepper motor 20 is static;When 20 turns of X-axis stepper motor When dynamic, magnetic table top 10 is moved along X-axis aspect, and y-axis stepper motor 20 is static at this time.
X-axis and y-axis stepper motor 20 connect microcontroller respectively, and the speed and row of two motors 20 are controlled by microcontroller Journey, can realize movement speed >=70mm/s of magnetic table top 10, and stroke is in 500 × 500mm, and control accuracy is in 0.1mm.
Two-dimensional magnetic workbench uses the double-layer structure that stepper motor 20 drives, can be each by being carried out under computer system control Kind precise motion, systemic resolution are high.
(3), Ultraviolet sensor 12
The present invention drives dielectric barrier discharge structure using PDM high voltage power supplies.
Under the action of high voltage electric field, material absorption energy ionizes.Between atom or molecule and electronics in gas Collision, collided between atom and atom, the interaction of light and atom or molecule generates various discharge products, including height It can electronics, negative ions, free radical, ozone (O3) and ultraviolet light (UV) and a small amount of nitrogen oxides (NOx) etc., make in exhaust gas The toxic species such as organic molecule, heavy metal element, germ, Strong oxdiative reaction occurs, is finally reached degradation, sterilizes, disappears The purpose of malicious.
Gas absorbs electric energy under the action of dielectric barrier discharge, and electron transition occurs, and generates the active specy of excitation state, Active specy can send out the light of specific wavelength during ground state is become again by excitation state, therefore the concentration for generating active specy can It is represented with intensity by emission spectrum.
The device of the invention generates ultraviolet radioactive in discharge process, and the wave-length coverage of ultraviolet light is 180-400nm, specifically It is divided into UVC radiation (180-280nm), UVB radiation (280-320nm), UVA radiation (320-400nm).Since human eye does not see purple The atoms such as external radiation, the ultraviolet light for generation of discharging and analysis spectral component and radiation intensity are needed through special optical detector Part measures.
In order to measure the activated species of region of discharge and concentration, the present invention utilizes 12 detection reaction room of Ultraviolet sensor Optical signalling is converted into electric signal by the spectral intensity of the active matter of 14 region of discharges, the voltage exported with Ultraviolet sensor 12 Signal represents the relative concentration that active specy generates.GS-AB-0603E (detection range 300- can be selected in sensor model number 370nm), GS-ABC-2835 (detection range 210-370nm), GT-UVV-L (detection range 200-440nm) etc..
Since the active specy generated during dielectric barrier discharge can send out the spectrum of multi-wavelength, as hydroxyl ( OH), oxygen radical (O) and nitrogen oxides (NOx), and the spectrum of (OH) (309-318nm) is primarily upon in the present invention, because This places optical filter before Ultraviolet sensor 12 and spectrum is tentatively filtered out.ET313/ may be selected in ultraviolet bandpass-type optical filter 25BP (centre wavelength 313nm, bandwidth 25nm), ET325/20BP (centre wavelength 325nm, bandwidth 20nm), XBPA310, ZBPA310 (centre wavelength 310nm, bandwidth 10nm).
As shown in Figure 10, the voltage signal of Ultraviolet sensor 12 is isolated by voltage follower, due to ultraviolet biography The frequency for the signal that sensor 12 exports is higher, so U7 is used as voltage follow using response time very fast current mode operational amplifier Device.Since the input impedance of rear class operational amplifier is infinitely great, the accumulation of charge is caused, it is therefore desirable to indirect one with the earth Resistance R12 as can release channel, in order to prevent high-voltage oscillation, R12 matched with R13, resistance value is equal.Ultraviolet sensor The voltage signal of 12 outputs contains DC component, if it is full that it is likely to result in amplification directly by the amplifying circuit of rear class And distortion, therefore use the DC component in capacitance C6 isolation sensor output signals.See-saw circuit pair is used in next step The signal amplitude of acquirement is amplified, to amplified voltage signal after signal is isolated again by voltage order one follower It is handled.Later by rectification circuit to AC signal is become direct current signal, the MCU of built-in ADC module is input a signal into, Data are acquired and are shown.
The corresponding equation of amplifying circuit is:
In formula, V represents that the voltage signal that Ultraviolet sensor 12 exports passes through the voltage value of voltage follower, and U8o expressions are put The voltage value of big circuit output.
(4), operating process
As shown in figure 11,6 buttons are shared in the peripheral hardware of the device of the invention,
Button 1 is master switch button, i.e., device just starts to work normally after its closure,
Button 2 is 10 button of magnetic table top, i.e., magnetic worktable adds magnetic after its closure, and 7 position of sink is fixed, and button breaks It opens, sink 7, which is fixed, to be released, and can be moved.
Button 3 is 11 on & off switch of two-dimensional stage, i.e., it is closed post-processing platform and is moved in horizontal plane according to program setting It is dynamic.
Button 4 is high pressure gas ventilation button, and device is passed through gas after connection.
Button 5 is that liquid pump 4 is passed through liquid button, and device is passed through liquid after connection.
Button 6 is plasma jet power switch key (high pressure activation power supply 13), after switch is closed, plasma jet Electrode 18 is powered, and generates high activity plasma jet particle.
First button 1, engaging means general supply, then open button 2 plus magnetic, fix sink 7.It is high opening plasma jet It needs to open 4 and 5 key of button before frequency power, is passed through high pressure gas and liquid, finally pushes button 6, plasma jet is opened Beginning work.
High pressure gas together with flowmeter 2 is controlled with liquid pump 4 controls liquid by flowing into atomizer 1, atomizer 1 Liquid is changed into aerosol or drop, is then injected into dielectric barrier discharge nozzle.
Dielectric barrier discharge is generated between high-frequency exiting power active electrode 18 and liquid electrode 18, is generated with active particle Aerosol or drop, aerosol or drop containing active particle are sprayed at processed material surface under hyperbar effect, so as to fulfill right Processing object material surface is handled.
The stabilization of sink 7 is fixed by magnetic worktable;Processing object (workpiece 5) is realized for 11 times in two-dimensional stage Continuous uniform plasma surface treatment in plane.
When device operates, gas flowmeter 2 and Ultraviolet sensor 12 are by its collected gas flow and gas componant Information, which is changed into analog signal and is sent to MCU, is converted into digital signal, and then the plasma for controlling liquid crystal display current Jet stream handles material surface quality, while carries out phase according to current 13 control zone of high pressure activation power supply and the driving of stepper motor 20 The action answered.Microcontroller is connect with MCU, and pulse signal, direction signal and enable signal are conducted to microcontroller by MCU, and then are controlled Movement velocity, direction and the distance of stepper motor 20 processed.
Surface treatment process is as shown in figure 12, and for plasma jet initial position in O points, then passing through two-dimensional stage 11 will A (a, b) position moves on at plasma jet (O points), opens plasma jet at this time, moves on to table top and is moved in Y direction, B (a, c) position is made to be at plasma jet.Y-axis stepper motor 20 stops, and work top is acted in X-axis stepper motor 20 It is moved to C (d, c) position.Successively according to as shown in fig. 7, processing object processing is completed.
Button is closed to operate according to 6 → 5 → 4 → 3 → 2 → 1 sequence.
The basic principles, main features and advantages of the invention have been shown and described above.The technical staff of the industry should Understand, the invention is not limited in any way above-described embodiment, all to be obtained by the way of equivalent substitution or equivalent transformation Technical solution is all fallen in protection scope of the present invention.

Claims (10)

1. water fog medium barrier discharge plasma device, which is characterized in that the dielectric barrier discharge nozzle patch of reative cell bottom of chamber Nearly liquid level, chamber top are equipped with and connect tracheae in parallel and the atomizer of liquid pipe;
Dielectric barrier discharge nozzle is made of several parallel, built-in electrode insulated dielectric tubes;
High pressure activation power supply is powered for electrode and liquid electrode.
2. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the tracheae and liquid Pipe is respectively equipped with flowmeter, and the flowmeter and high pressure activation power supply connect data acquisition and control unit.
3. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric impedance The distance of electric discharge nozzle and liquid level is 1~10mm.
4. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric The material of pipe includes any one of quartz, mica and poly- fluorine tetrafluoroethene, and the material of electrode includes tungsten-molybdenum alloy.
5. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the dielectric The internal diameter r values of pipe are 0.5~2mm, and outer diameter R values are 1~3mm;The diameter D of electrode is 0.05~0.3mm.
6. water fog medium barrier discharge plasma device according to claim 1, which is characterized in that the atomizer The moisture control of outlet is 1%~20%.
7. water fog medium barrier discharge plasma surface processing device, which is characterized in that any water of claim 1-6 The liquid level of mist dielectric barrier discharge plasma device is the tank liquor face in sink, and the sink Inner standpipe passes through slot bottom Iron plate is placed on the two-dimensional magnetic workbench driven by data acquisition with control unit.
8. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that described Two-dimensional magnetic workbench includes the stage body, display module, key control module and the power supply module that connect microcontroller, and the microcontroller connects Data acquire and control unit;
The stage body includes the two-dimensional stage of magnetic table top and bottom;The iron core of several winding copper coils built in magnetic table top;Two It ties up platform and includes X horizontal axis and the Y longitudinal axis, top surface is respectively equipped with sliding rail and by motor-driven screw;
Copper coil, motor supply electric drive by microcontroller respectively.
9. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that described Sink is equipped with the Ultraviolet sensor of monitoring reative cell end, and the Ultraviolet sensor connects data acquisition and control unit.
10. water fog medium barrier discharge plasma surface processing device according to claim 7, which is characterized in that institute It is tank liquor to state the liquid in liquid pipe.
CN201810055645.3A 2018-01-19 2018-01-19 Water fog medium barrier discharge plasma and surface processing device Pending CN108135067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810055645.3A CN108135067A (en) 2018-01-19 2018-01-19 Water fog medium barrier discharge plasma and surface processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810055645.3A CN108135067A (en) 2018-01-19 2018-01-19 Water fog medium barrier discharge plasma and surface processing device

Publications (1)

Publication Number Publication Date
CN108135067A true CN108135067A (en) 2018-06-08

Family

ID=62399963

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810055645.3A Pending CN108135067A (en) 2018-01-19 2018-01-19 Water fog medium barrier discharge plasma and surface processing device

Country Status (1)

Country Link
CN (1) CN108135067A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111559790A (en) * 2020-05-21 2020-08-21 重庆工商大学 Venturi type water mist discharge plasma pollutant treatment device

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1953822A (en) * 2004-05-14 2007-04-25 陶氏康宁爱尔兰有限公司 Coating compositions
CN102045935A (en) * 2009-10-21 2011-05-04 中国科学院微电子研究所 Plasma discharge and atomization grafting device
CN102333412A (en) * 2011-09-08 2012-01-25 陈固明 High-energy multi-state low-temperature ionizer
CN103159287A (en) * 2013-03-30 2013-06-19 山东大学 Radial flow type DBD (Dielectric Barrier Discharge) thiamethoxam pesticide wastewater treatment equipment
CN103496761A (en) * 2013-09-09 2014-01-08 河海大学常州校区 Plasma-supersonic wave combined water processing apparatus and process flow thereof
CN103523856A (en) * 2013-09-09 2014-01-22 河海大学常州校区 Water mist discharge and ultrasound synergetic degradation wastewater treatment device and running method thereof
CN105297126A (en) * 2015-10-15 2016-02-03 北京科技大学 Method for continuously treating surface of large-area metal material through liquid plasma
CN105611711A (en) * 2015-12-24 2016-05-25 河南理工大学 Gas-liquid two-phase plasma generating device for polymer surface modification
CN105858814A (en) * 2016-03-28 2016-08-17 大连民族大学 Array-type medium-preventing-discharge wastewater treatment device for high-density water
CN206173024U (en) * 2016-08-29 2017-05-17 荣烜曼 Plasma activated water is used for sterile device of hospital or house
WO2017161153A1 (en) * 2016-03-18 2017-09-21 The George Washington University Compositions for treatment of cancer, methods and systems for forming the same
CN206879179U (en) * 2017-04-23 2018-01-12 河南理工大学 A kind of gas-liquid two-phase plasma generating device of improvement

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1953822A (en) * 2004-05-14 2007-04-25 陶氏康宁爱尔兰有限公司 Coating compositions
CN102045935A (en) * 2009-10-21 2011-05-04 中国科学院微电子研究所 Plasma discharge and atomization grafting device
CN102333412A (en) * 2011-09-08 2012-01-25 陈固明 High-energy multi-state low-temperature ionizer
CN103159287A (en) * 2013-03-30 2013-06-19 山东大学 Radial flow type DBD (Dielectric Barrier Discharge) thiamethoxam pesticide wastewater treatment equipment
CN103496761A (en) * 2013-09-09 2014-01-08 河海大学常州校区 Plasma-supersonic wave combined water processing apparatus and process flow thereof
CN103523856A (en) * 2013-09-09 2014-01-22 河海大学常州校区 Water mist discharge and ultrasound synergetic degradation wastewater treatment device and running method thereof
CN105297126A (en) * 2015-10-15 2016-02-03 北京科技大学 Method for continuously treating surface of large-area metal material through liquid plasma
CN105611711A (en) * 2015-12-24 2016-05-25 河南理工大学 Gas-liquid two-phase plasma generating device for polymer surface modification
WO2017161153A1 (en) * 2016-03-18 2017-09-21 The George Washington University Compositions for treatment of cancer, methods and systems for forming the same
CN105858814A (en) * 2016-03-28 2016-08-17 大连民族大学 Array-type medium-preventing-discharge wastewater treatment device for high-density water
CN206173024U (en) * 2016-08-29 2017-05-17 荣烜曼 Plasma activated water is used for sterile device of hospital or house
CN206879179U (en) * 2017-04-23 2018-01-12 河南理工大学 A kind of gas-liquid two-phase plasma generating device of improvement

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
CHEN BINGYAN ET AL.: "Water Content E®ect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray", 《PLASMA SCIENCE AND TECHNOLOGY》 *
万顺疆: "等离子体引发雾聚合制备功能化表面的研究", 《中国优秀硕士学位论文全文数据库 工程科技I辑》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111559790A (en) * 2020-05-21 2020-08-21 重庆工商大学 Venturi type water mist discharge plasma pollutant treatment device

Similar Documents

Publication Publication Date Title
CN108337797A (en) Gas-liquid two-phase discharge plasma material surface processing unit
CN106449349A (en) Compound ion source based on low temperature plasma discharge
NO20041816L (en) Process for the preparation of ultrafine dispersion water of ultrafine metal particles
CN108848604A (en) A kind of portable micro-hollow cathode discharge plasma fluidic device
CN108684131A (en) High-frequency ac rotational slide arc discharging plasma generating system for methane dry reforming
CN111145623B (en) Device and method for experimental research on positive and negative corona and substance action of different parameters
CN108135067A (en) Water fog medium barrier discharge plasma and surface processing device
CN108298504A (en) Absorbance monitors bar array automatic energy adaptation water mist and synthesizes hydrogen peroxide plant
CN108421638A (en) Catalytic association corona and dielectric barrier discharge air purification regulator control system
CN105670024B (en) A method of surface modification is carried out to pipe inside and outside wall using atmospheric pressure plasma
CN108112152A (en) Volume discharge generation device and its method in a kind of temperature control water
CN110436686A (en) A kind of water treatment facilities using liquid injection technology
CN108289365A (en) A kind of atmosphere pressure discharging multi-modes device
CN108147371B (en) Device and method for synthesizing hydrogen peroxide from water mist through direct-current corona discharge
CN207227171U (en) Small-sized dielectric barrier discharge water treatment device
CN108283868A (en) The frequency of supply regulator control system and method for high pressure activation power drives volume DBD air cleaning units under PDM operating modes
CN211999868U (en) Gas-liquid phase pulse spark discharge strengthened uranium leaching device
CN208158968U (en) High-frequency ac rotational slide arc discharging plasma generating system for methane dry reforming
CN102497720B (en) Atmospheric pressure optical plasma brush-type device and electric discharge method thereof
CN106984146A (en) Light strengthens water smoke plasma emission-control equipment
CN207573692U (en) A kind of metal cup atmospheric low-temperature plasma processing unit
CN206941308U (en) A kind of portable paper deacidification machine
CN110092356A (en) The surface dielectric barrier discharge ozone generating-device and method of gas flowing control
CN109874220A (en) A kind of metal cup atmospheric low-temperature plasma processing unit and application method
CN106245312A (en) Normal atmosphere low temperature plasma continuous tow arrangement in fibre process and processing method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20180608

RJ01 Rejection of invention patent application after publication