CN102034738A - 化学机械研磨的方法和金属互连层的形成方法 - Google Patents
化学机械研磨的方法和金属互连层的形成方法 Download PDFInfo
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- CN102034738A CN102034738A CN2009101968983A CN200910196898A CN102034738A CN 102034738 A CN102034738 A CN 102034738A CN 2009101968983 A CN2009101968983 A CN 2009101968983A CN 200910196898 A CN200910196898 A CN 200910196898A CN 102034738 A CN102034738 A CN 102034738A
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CN2009101968983A CN102034738A (zh) | 2009-09-29 | 2009-09-29 | 化学机械研磨的方法和金属互连层的形成方法 |
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CN2009101968983A CN102034738A (zh) | 2009-09-29 | 2009-09-29 | 化学机械研磨的方法和金属互连层的形成方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106992115A (zh) * | 2017-04-14 | 2017-07-28 | 上海华虹宏力半导体制造有限公司 | 提高集成电路可靠性的方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106992115A (zh) * | 2017-04-14 | 2017-07-28 | 上海华虹宏力半导体制造有限公司 | 提高集成电路可靠性的方法 |
CN106992115B (zh) * | 2017-04-14 | 2019-10-25 | 上海华虹宏力半导体制造有限公司 | 提高集成电路可靠性的方法 |
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PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20121116 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20121116 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Applicant after: Semiconductor Manufacturing International (Shanghai) Corporation Applicant after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Applicant before: Semiconductor Manufacturing International (Shanghai) Corporation |
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C12 | Rejection of a patent application after its publication | ||
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Application publication date: 20110427 |