CN101995597A - Color filter for testing - Google Patents

Color filter for testing Download PDF

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Publication number
CN101995597A
CN101995597A CN200910056422XA CN200910056422A CN101995597A CN 101995597 A CN101995597 A CN 101995597A CN 200910056422X A CN200910056422X A CN 200910056422XA CN 200910056422 A CN200910056422 A CN 200910056422A CN 101995597 A CN101995597 A CN 101995597A
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China
Prior art keywords
lap
filter
shielding pattern
pattern layer
layer
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CN200910056422XA
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Chinese (zh)
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CN101995597B (en
Inventor
唐文静
金子若彦
陈颖明
王菁晶
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SAV FUSHI PHOTOELECTRIC MATERIAL CO Ltd
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SAV FUSHI PHOTOELECTRIC MATERIAL CO Ltd
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Publication of CN101995597A publication Critical patent/CN101995597A/en
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Abstract

The invention relates to a color filter for testing, comprising a transparent substrate, a plurality of color filter layers arranged on the transparent substrate and a plurality of shading pattern layers arranged on the transparent substrate, wherein the color filter layers and the shading pattern layers are interlapped to form a plurality of overlapped sections. The overlap amount of the overlapped sections is inconsistent, and the range of the overlap amount is 1-30mum. The application of the color filter for testing can greatly reduce the measurement cost and shortens the measurement time.

Description

A kind of colored filter that is used to test
Technical field
The present invention relates to the display panels field, relate in particular to the colored filter that is used to test in the display panels.
Background technology
In recent years, liquid crystal indicator is not only at information communication device, and all obtained using widely on general electric equipment, popularizes rapidly.Display panels generally is made of pixel electrode substrate and colored filter.
On colored filter, comprise chromatic filter layer and shielding pattern layer.Chromatic filter layer comprises a plurality of red filter units, a plurality of green filter unit and a plurality of blue filter unit, and three kinds of unit distribute fifty-fifty with array format.Shielding pattern layer is used at interval red filter unit, green filter unit and blue filter unit.Pixel electrode substrate is provided with pixel electrode array, and each pixel electrode is corresponding with each filter unit on the colored filter on the position.After injecting liquid crystal between colored filter and the pixel electrode substrate, form display panels.
Shielding pattern layer has lap with filter unit when each filter unit of interval.This lap has been compared tangible projection with peripheral part, and this projection is one of reason that causes LCD alignment state confusion.Because this projection amount (rising height) becomes the key factor that influences the display panels quality, therefore, when research and development and production, need carry out strict management and control to it.
The projection amount of shielding pattern layer and filter unit lap is relevant with the thickness and the lap of shielding pattern layer.Generally, lap increases, and projection amount also increases thereupon; Otherwise lap reduces, and projection reduces the most at any time.But lap is too small, causes light leakage phenomena easily.In addition, projection amount is also relevant with process conditions, material etc.Therefore, in order to control this projection amount, to improve the quality of display, in research and development and production run, mutual relationship (related coefficient) between frequent observation filter unit of all kinds of needs and the shielding pattern layer between lap and the projection amount, this is the important content of colored filter qualitative control.
In order to record this related coefficient, in present technology, generally in the exposure process that forms red filter unit, green filter unit and blue filter unit, specially be offset the contraposition amount of light shield, produce lap continually varying polylith substrate, then the different polylith substrate of lap is measured, obtained the related coefficient between the lap and projection amount between filter unit of all kinds and the shielding pattern layer.
But traditional this method need be made the polylith substrate, and its cost is higher.On the other hand, when measuring, need to replace several substrates and test, it is more to finish the needed time of test.Again on the one hand, because in the exposure process, there is certain instability in the control of light shield when fullying recover from an illness, therefore, obtains not the difference with the consistent lap of imagination sometimes, causes the incorrect of test data.
Summary of the invention
Problem based on the existence of above-mentioned background technology, the object of the present invention is to provide a kind of colored filter that is used to test, in the present invention, only need a substrate, can finish the related coefficient between lap and the projection amount between each color filtering optical layer and the shielding pattern layer.
According to above-mentioned purpose, the colored filter that is used to test provided by the invention comprises: transparency carrier, be arranged on a plurality of chromatic filter layers on the described transparency carrier and be arranged on a plurality of shielding pattern layer on the described transparency carrier, a plurality of described chromatic filter layers and a plurality of laps of the overlapped formation of a plurality of described shielding pattern layer, it is characterized in that the lap of described lap is inconsistent.
In above-mentioned colored filter, the scope of described lap is 1-30 μ m.
In above-mentioned colored filter, the scope of described lap is 3-15 μ m.
In above-mentioned colored filter, the difference of described lap is the interval with 1 μ m.
In above-mentioned colored filter, described chromatic filter layer and described shielding pattern layer are the form shape and arrange
In above-mentioned colored filter, described shielding pattern layer and described chromatic filter layer are arranged on the clear area of transparency carrier.
Description of drawings
Figure 1A shows the structural representation of the colored filter that is used to test of the present invention.
Figure 1B shows the vertical view of the colored filter shown in Figure 1A.
Fig. 2 shows the synoptic diagram of whole substrate.
Embodiment
Figure 1A shows the structural representation of the colored filter that is used to test of the present invention, and Figure 1B shows the vertical view of this colored filter.Please be simultaneously referring to Figure 1A and Figure 1B, colored filter comprises transparency carrier d, transparency carrier d is provided with shielding pattern layer a1, a2, a3, a4... and chromatic filter layer b1, b2, b3....Shielding pattern layer a1, a2, a3, a4... and chromatic filter layer a1, a2, a3, a4... have lap c1, c2, c3... each other.That is, chromatic filter layer b1 and shielding pattern layer a1 and a2 are overlapping, form two lap c1; Chromatic filter layer b2 and shielding pattern layer a2 and a3 are overlapping, form two lap c2; Chromatic filter layer b3 and shielding pattern layer a2 and a3 are overlapping, form two lap c3.Though in the embodiment of Figure 1A and Figure 1B, 3 row chromatic filter layers only are shown, be appreciated that the quantity of chromatic filter layer can be decided as required, the quantity of Figure 1A and Figure 1B chromatic filter layer is only for description and interpretation the present invention.
In the present invention, the size of the lap that chromatic filter layer and shielding pattern layer is overlapped is arranged to inconsistent.Be that c1, c2, c3... width are arranged to inconsistent.If can on a substrate, produce chromatic filter layer and shielding pattern layer simultaneously, thereby only need a substrate, can finish to the related coefficient between lap and the projection amount between each color filtering optical layer and the shielding pattern layer with various laps.
In an embodiment of the present invention, the scope of this lap preferably is 1-30 μ m, and for different application demands, more preferably, this scope is 3-15 μ m.Preferably, the difference of the lap of different laps is the interval with 1 μ m.
See also Figure 1A and Figure 1B again, Figure 1B especially, generally speaking, as described in the background art, chromatic filter layer is divided into three kinds, i.e. red filter layer, green filter layer and blue color filter layer.Among Figure 1B the 1st row shows the structure of red filter layer, and the 2nd row shows the structure of green filter layer, and the 3rd row shows the structure of blue color filter layer, repeats above-mentioned structure from the 4th row.The structure of versicolor filter layer is basic identical.Therefore, from vertical view, chromatic filter layer and shielding pattern layer are the form shape and arrange.But should be appreciated that it not is to be essential to the invention that the form shape is arranged, the arrangement mode of other shape of having used in this area also can use in the present invention.
Fig. 2 shows the synoptic diagram of whole substrate.On a transparency carrier, can arrange a plurality of viewing areas, between each viewing area the clear area.In the present invention, can be arranged on above-mentioned chromatic filter layer b and the shielding pattern layer a that estimates usefulness in this clear area.If the advantage that is provided with is: 1) do not influence the figure of viewing area, can shipment give the client.2) not influencing the measurement of other characteristics, is to need to measure the viewing area as other assessment items such as colourity thickness.
Technique effect of the present invention: in conventional art, in order to obtain multiple test data, need to make 5-10 and open colored filter, then these substrates are carried out cutting sampling and test, this is so that the analysis of experiments cost is very high. When measuring in addition, can only record data, Measuring Time is very long at every turn, probably needs to finish all samples measurement in 1 day. And use colored filter of the present invention, and only need a substrate, just can focus on needed lap. During measurement, one-shot measurement just can obtain desired data, not only greatly reduces the cost of substrate, and Measuring Time was foreshortened to about 1 hour.

Claims (6)

1. a colored filter that is used to test comprises: transparency carrier, be arranged on a plurality of chromatic filter layers on the described transparency carrier and be arranged on a plurality of shielding pattern layer on the described transparency carrier, a plurality of described chromatic filter layers and a plurality of laps of the overlapped formation of a plurality of described shielding pattern layer, it is characterized in that the lap of described lap is inconsistent.
2. colored filter as claimed in claim 1 is characterized in that, the scope of described lap is 1-30 μ m.
3. colored filter as claimed in claim 2 is characterized in that, the scope of described lap is 3-15 μ m.
4. as claim 2 or 3 described colored filters, it is characterized in that the difference of described lap is the interval with 1 μ m.
5. as claim 1 or 2 or 3 described colored filters, it is characterized in that described chromatic filter layer and described shielding pattern layer are the form shape and arrange.
6. as claim 1 or 2 or 3 described colored filters, it is characterized in that described shielding pattern layer and described chromatic filter layer are arranged on the clear area of transparency carrier.
CN200910056422.XA 2009-08-14 2009-08-14 Color filter for testing Active CN101995597B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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CN101995597A true CN101995597A (en) 2011-03-30
CN101995597B CN101995597B (en) 2014-07-16

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110687704A (en) * 2019-10-23 2020-01-14 深圳市华星光电技术有限公司 Method for detecting defects influencing splicing exposure of COA substrate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06308478A (en) * 1993-04-23 1994-11-04 Toppan Printing Co Ltd Color filter for liquid crystal display
CN101196645A (en) * 2006-12-06 2008-06-11 瀚宇彩晶股份有限公司 RGBW colorful color filter structure and its production method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06308478A (en) * 1993-04-23 1994-11-04 Toppan Printing Co Ltd Color filter for liquid crystal display
CN101196645A (en) * 2006-12-06 2008-06-11 瀚宇彩晶股份有限公司 RGBW colorful color filter structure and its production method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110687704A (en) * 2019-10-23 2020-01-14 深圳市华星光电技术有限公司 Method for detecting defects influencing splicing exposure of COA substrate
CN110687704B (en) * 2019-10-23 2022-09-27 Tcl华星光电技术有限公司 Method for detecting factors influencing splicing exposure defects of COA substrate

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Address after: 201108 Shanghai city Minhang District Huaning road 3306 Lane 160

Applicant after: INESA DISPLAY MATERIALS CO., LTD.

Address before: 201108 Shanghai city Minhang District Huaning road 3306 Lane 160

Applicant before: SAV Fushi Photoelectric Material Co., Ltd.

COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: SVA-FUJIFILM OPTO-ELECTRONIC MATERIALS CO., LTD. TO: SHANGHAI INSTRUMENT DISPLAY MATERIAL CO., LTD.

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