CN102540554B - A kind of colored optical filtering substrates with scale structure and manufacture method thereof - Google Patents
A kind of colored optical filtering substrates with scale structure and manufacture method thereof Download PDFInfo
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Abstract
The present invention provides a kind of colored optical filtering substrates and manufacture method thereof. For avoiding exposure mask plate benging to cause height and width skewness in whole colored optical filtering substrates face of pattern after exposure, need height and the width of monitoring patterned layer, prior art needs use special large-scale online micro-horizontal metroscope, be unfavorable for that On-line Control too increases cost simultaneously. Altitude datum light-shielding pattern group is added in the present invention, with reference to height light-shielding pattern group, datum width light-shielding pattern group and reference width light-shielding pattern group on the non-display area of transparent glass substrate. In actual production process, by these light-shielding pattern playing scale effect and color filter patterns, maker can be made to pass through change in size that is visual direct and that confirm shielding pattern layer and chromatic filter layer easily, thus the height of quick, convenient and control and adjustment shielding pattern layer and chromatic filter layer economically pattern and width, the quality of the color optical filtering substrate of raising.
Description
Technical field
The present invention relates to display panels field, particularly relate to structure and the manufacture method thereof of colored optical filtering substrates in display panels, specifically, the monitoring of shielding pattern layer (BM layer) and chromatic filter layer (RGB layer) pattern dimension in process of production is related to.
Background technology
In recent years, liquid crystal display not only also rapidly be universal in information communication device, even general electrical equipment. The critical piece of liquid crystal display is display panels, colored optical filtering substrates therein is that its structure generally comprises transparent glass substrate, shielding pattern layer, chromatic filter layer, common electrode layer and spacer etc. to one of very important critical component of display quality. Its structure is shown in Figure 1, and Fig. 1 illustrates a dot structure. As shown in the figure, shielding pattern layer 101 has an open area 102, chromatic filter layer 103 (this chromatic filter layer is one of red filter layer, blue color filter layer or green color filter) covers on this open area 102, and its surrounding has certain lap with shielding pattern layer 101.
The method forming shielding pattern layer and chromatic filter layer on transparent glass substrate generally adopts the pigment dispersion method of light blockage coating, namely first by liquid light blockage coating at glass baseplate surface, then pass through the exposure mask plate with given pattern, use proximity exposure machine to be exposed, form default pattern then through development and baking process. Fig. 2 schematically shows this exposure process.
Along with the development of LCD industry, the size of colored optical filtering substrates is continuously increased, and therefore, the exposure mask board size correspondingly used in exposure process also can increase therewith. When the size of colored optical filtering substrates increases to G5 (i.e. 1100*1300cm) and is above, during exposure, mask plate can be inevitably generated bending (bending) due to gravity, cause after exposure skewness in graph line breadth, cause height and width skewness in whole colored optical filtering substrates face of pattern after exposure, cause optical characteristics skewness, and the skew of shielding pattern layer and chromatic filter layer overlapping region, also can produce light leak when offseting serious.
In order to avoid the generation of problem above, improve the quality of colored optical filtering substrates product, colored optical filtering substrates actual production process needs pattern height and the width of monitoring shielding pattern layer and chromatic filter layer, and makes adjustment in time according to its drift condition. Prior art generally use the long instrument in micro-side measure above-mentioned height and width. This traditional mode needs to take a long time, and needs to buy special large-scale online micro-horizontal metroscope, is unfavorable for that On-line Control too increases cost simultaneously.
Summary of the invention
Based on the problems referred to above existed in background technology, it is an object of the invention to provide a kind of colored optical filtering substrates, substrate is formed the scale structure of the width confirming light-shielding pattern and/or color filter patterns, maker can be made to pass through visual direct and that confirm light-shielding pattern or color filter patterns easily height and change width by this scale structure, thus the height of quick, convenient and control and adjustment shielding pattern layer and chromatic filter layer economically pattern and width, the quality of the color optical filtering substrate of raising.
The present invention also provides a kind of manufacture method manufacturing the above-mentioned colored optical filtering substrates with scale structure simultaneously.
According to above-mentioned purpose, the present invention provides colored optical filtering substrates, including:
Transparent glass substrate;
Shielding pattern layer, is positioned on the viewing area of described transparent glass substrate, and described shielding pattern layer has open area;
Chromatic filter layer, is positioned on the open area of described shielding pattern layer, and with described light-shielding pattern ply;
Altitude datum light-shielding pattern group, comprises the altitude datum light-shielding pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum light-shielding pattern is equal;
With reference to height light-shielding pattern group, comprise the reference height light-shielding pattern that multiple height is different, be vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height light-shielding pattern group and described altitude datum light-shielding pattern group arranged in parallel, further, each described with reference to height light-shielding pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum light-shielding pattern group spacing on a horizontal line;
Datum width light-shielding pattern group, comprises the datum width light-shielding pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width light-shielding pattern is equal;
With reference to width light-shielding pattern group, comprise the reference width light-shielding pattern that multiple width is different, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width light-shielding pattern group and described datum width light-shielding pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width light-shielding pattern respectively with the horizontal direction centrage of described datum width light-shielding pattern group spacing on a vertical line.
In described colored optical filtering substrates, in described reference height light-shielding pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height light-shielding pattern in described altitude datum light-shielding pattern group of height light-shielding pattern; In described reference width light-shielding pattern group, at least one is equal with reference to the spacing between width and adjacent reference width light-shielding pattern in described datum width light-shielding pattern group of width light-shielding pattern group.
In described colored optical filtering substrates, described with reference in height light-shielding pattern group each with reference to height light-shielding pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H (m) with reference to height light-shielding pattern meets lower form:
H (m)=H0+ (m-1) A;
Wherein, H0 is minimum constructive height; M is the described numbering with reference to height light-shielding pattern; A is height increase amount.
At described colored optical filtering substrates, it is characterized in that, described with reference in width light-shielding pattern group each with reference to width light-shielding pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W (n) with reference to width light-shielding pattern meets following form:
W (n)=W0+ (n-1) B;
Wherein, W0 is minimum widith; N is the described numbering with reference to width light-shielding pattern; B is width increase amount.
In described colored optical filtering substrates, in described reference height light-shielding pattern group with reference to the number of height light-shielding pattern between 20 to 40; In described reference width light-shielding pattern group with reference to the number of width light-shielding pattern between 20 to 40.
In described colored optical filtering substrates, the value of A is 0.3-2 μm, and the value of B is 0.3-2 μm.
In described colored optical filtering substrates, the value of A is 1 μm, and the value of B is 1 μm.
The present invention also provides for a kind of colored optical filtering substrates, including:
Transparent glass substrate;
Shielding pattern layer, is positioned on the viewing area of described transparent glass substrate, and described shielding pattern layer has open area;
Chromatic filter layer, is positioned on the open area of described shielding pattern layer, and with described light-shielding pattern ply;
Altitude datum filter pattern group, comprises the altitude datum filter pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum filter pattern is equal;
With reference to height filter pattern group, comprise the reference height filter pattern that multiple height is different, be vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height filter pattern group and described altitude datum filter pattern group arranged in parallel, further, each described with reference to height filter pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum filter pattern group spacing on a horizontal line;
Datum width filter pattern group, comprises the datum width filter pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width filter pattern is equal;
With reference to width filter pattern group, comprise the reference width filter pattern that multiple width is different, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width filter pattern group and described datum width filter pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width filter pattern respectively with the horizontal direction centrage of described datum width filter pattern group spacing on a vertical line.
In described colored optical filtering substrates, in described reference height filter pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height filter pattern in described altitude datum filter pattern group of height filter pattern; In described reference width filter pattern group, at least one is equal with reference to the spacing between width and adjacent reference width filter pattern in described datum width filter pattern group of width filter pattern group.
In described colored optical filtering substrates, in described altitude datum filter pattern group, described with reference to height filter pattern group, described benchmark width filter pattern group with described be additionally provided with light-shielding pattern bottom with reference between width filter pattern group and described transparent glass substrate.
In described colored optical filtering substrates, described with reference in height filter pattern group each with reference to height filter pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H ' (m) with reference to height filter pattern meets following form:
H ' (m ')=H ' 0+ (m '-1) A ';
Wherein, H ' 0 is minimum constructive height; M ' is the described numbering with reference to height filter pattern; A ' is height increase amount.
In described colored optical filtering substrates, described with reference in width filter pattern group each with reference to width filter pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W ' (n) with reference to width filter pattern meets following form:
W ' (n ')=W ' 0+ (n '-1) B ';
Wherein, W ' 0 is minimum widith; N ' is the described numbering with reference to width filter pattern; B ' is width increase amount.
In described colored optical filtering substrates, in described reference height filter pattern group with reference to the number of height filter pattern between 20 to 40; In described reference width filter pattern group with reference to the number of width filter pattern between 20 to 40.
In described colored optical filtering substrates, the value of A ' is 0.3-2 μm, and the value of B ' is 0.3-2 μm.
In described colored optical filtering substrates, the value of A ' is 1 μm, and the value of B ' is 1 μm.
According to above-mentioned purpose, the present invention also provides for the manufacture method of a kind of colored optical filtering substrates, including:
One transparent glass substrate is provided;
The viewing area of described transparent glass substrate is formed shielding pattern layer; Simultaneously
The non-display area of described transparent glass substrate is formed altitude datum light-shielding pattern group and datum width light-shielding pattern group; Described altitude datum light-shielding pattern group comprises the altitude datum light-shielding pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum light-shielding pattern is equal; Described datum width light-shielding pattern group comprises the datum width light-shielding pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width light-shielding pattern is equal;
The non-display area of described transparent glass substrate is formed with reference to height light-shielding pattern group with reference to width light-shielding pattern group; Described reference height light-shielding pattern group comprises the reference height light-shielding pattern that multiple height is different, is vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height light-shielding pattern group and described altitude datum light-shielding pattern group arranged in parallel, further, each described with reference to height light-shielding pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum light-shielding pattern group spacing on a horizontal line; Described with reference to width light-shielding pattern group comprise multiple width different with reference to width light-shielding pattern, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width light-shielding pattern group and described datum width light-shielding pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width light-shielding pattern respectively with the horizontal direction centrage of described datum width light-shielding pattern group spacing on a vertical line; And
Chromatic filter layer is formed in the open area of described shielding pattern layer.
In the manufacture method of described colored optical filtering substrates, in described reference height light-shielding pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height light-shielding pattern in described altitude datum light-shielding pattern group of height light-shielding pattern; In described reference width light-shielding pattern group, at least one is equal with reference to the spacing between width and adjacent reference width light-shielding pattern in described datum width light-shielding pattern group of width light-shielding pattern group.
In the manufacture method of described colored optical filtering substrates, it is characterized in that, described with reference in height light-shielding pattern group each with reference to height light-shielding pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H (m) with reference to height light-shielding pattern meets following form:
H (m)=H0+ (m-1) A;
Wherein, H0 is minimum constructive height; M is the described numbering with reference to height light-shielding pattern; A is height increase amount.
In the manufacture method of described colored optical filtering substrates, described with reference in width light-shielding pattern group each with reference to width light-shielding pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W (n) with reference to width light-shielding pattern meets following form:
W (n)=W0+ (n-1) B;
Wherein, W0 is minimum widith; N is the described numbering with reference to width light-shielding pattern; B is width increase amount.
In the manufacture method of described colored optical filtering substrates, in described reference height light-shielding pattern group with reference to the number of height light-shielding pattern between 20 to 40; In described reference width light-shielding pattern group with reference to the number of width light-shielding pattern between 20 to 40.
In the manufacture method of described colored optical filtering substrates, the value of A is 0.3-2 μm, and the value of B is 0.3-2 μm.
In the manufacture method of described colored optical filtering substrates, the value of A is 1 μm, and the value of B is 1 μm.
The present invention also provides in the manufacture method of a kind of colored optical filtering substrates, including:
One transparent glass substrate is provided;
The viewing area of described transparent glass substrate is formed shielding pattern layer; Simultaneously
The non-display area of described transparent glass substrate forms altitude datum filter pattern group and with reference to height filter pattern group, described altitude datum filter pattern group comprises the altitude datum filter pattern that multiple height is identical, vertically being distributed on the non-display area of described transparent glass substrate, the spacing between adjacent described altitude datum filter pattern is equal; Described reference height filter pattern group comprises the reference height filter pattern that multiple height is different, is vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height filter pattern group and described altitude datum filter pattern group arranged in parallel, further, each described with reference to height filter pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum filter pattern group spacing on a horizontal line;
The non-display area of described transparent glass substrate forms datum width filter pattern group and with reference to width filter pattern group, described datum width filter pattern group comprises the datum width filter pattern that multiple width is identical, being distributed on the non-display area of described transparent glass substrate in the horizontal direction, the spacing between adjacent described datum width filter pattern is equal; Described with reference to width filter pattern group comprise multiple width different with reference to width filter pattern, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width filter pattern group and described datum width filter pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width filter pattern respectively with the horizontal direction centrage of described datum width filter pattern group spacing on a vertical line; And
Chromatic filter layer is formed in the open area of described shielding pattern layer.
In the manufacture method of described colored optical filtering substrates, in described reference height filter pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height filter pattern in described altitude datum filter pattern group of height filter pattern; In described reference width filter pattern group, at least one is equal with reference to the spacing between width and adjacent reference width filter pattern in described datum width filter pattern group of width filter pattern group.
In the manufacture method of described colored optical filtering substrates, in described altitude datum filter pattern group, described with reference to height filter pattern group, described benchmark width filter pattern group with described be additionally provided with light-shielding pattern bottom with reference between width filter pattern group and described transparent glass substrate.
In the manufacture method of described colored optical filtering substrates, described with reference in height filter pattern group each with reference to height filter pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H ' (m) with reference to height filter pattern meets following form:
H ' (m ')=H ' 00 (m '-1) A ';
Wherein, H ' 0 is minimum constructive height; M ' is the described numbering with reference to height filter pattern; A ' is height increase amount.
In the manufacture method of described colored optical filtering substrates, described with reference in width filter pattern group each with reference to width filter pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W ' (n) with reference to width filter pattern meets following form:
W ' (n ')=W ' 0+ (n '-1) B ';
Wherein, W ' 0 is minimum widith; N ' is the described numbering with reference to width filter pattern; B ' is width increase amount.
In the manufacture method of described colored optical filtering substrates, in described reference height filter pattern group with reference to the number of height filter pattern between 20 to 40; In described reference width filter pattern group with reference to the number of width filter pattern between 20 to 40.
In the manufacture method of described colored optical filtering substrates, the value of A ' is 0.3-2 μm, and the value of B ' is 0.3-2 μm.
In the manufacture method of described colored optical filtering substrates, the value of A ' is 1 μm, and the value of B ' is 1 μm.
Accompanying drawing explanation
Fig. 1 schematically illustrates the structure of shielding pattern layer and chromatic filter layer in traditional colored optical filtering substrates;
Fig. 2 is the schematic diagram adopting light blockage coating pigment dispersion method to form shielding pattern layer and chromatic filter layer;
Fig. 3 is the schematic diagram of the colored optical filtering substrates of the present invention;
Fig. 4 A be the present invention colored optical filtering substrates in the schematic diagram of a kind of chi structure on non-display area;
Fig. 4 B is the design sketch that pattern height change occurs in the process forming shielding pattern layer of the present invention;
Fig. 5 A be the present invention colored optical filtering substrates in the schematic diagram of another kind of chi structure on non-display area;
Fig. 5 B is the design sketch that pattern width change occurs in the process forming shielding pattern layer of the present invention;
Fig. 6 A be the present invention colored optical filtering substrates in the schematic diagram of another chi structure on non-display area;
Fig. 6 B is the design sketch that pattern height change occurs in the process forming filter pattern layer of the present invention;
Fig. 7 A be the present invention colored optical filtering substrates in the schematic diagram of another chi structure on non-display area;
Fig. 7 B is the design sketch that pattern width change occurs in the process forming filter pattern layer of the present invention.
Detailed description of the invention
Below with reference to accompanying drawing, embodiments of the invention are described in detail. It is understood, however, that embodiment described below is the illustration carried out for making the technical thought of the present invention embody, not refer in particular to the present invention. Without departing from the technical thought shown in the scope of present patent application, all can be applied in comparably in various version.
Fig. 3 schematically illustrates the schematic diagram of colored optical filtering substrates on the whole. As it is shown on figure 3, the size according to the display floater finally cut into, monoblock colored optical filtering substrates includes multiple viewing area 301, outside viewing area 301, is all non-display area. In the present invention, shielding pattern layer is formed still identical with conventional art with the structure of chromatic filter layer in viewing area 301, but in non-display area 302, the present invention has done improvement, in the non-display area 302 of colored optical filtering substrates, namely form the scale structure of the present invention.Below in conjunction with accompanying drawing, scale structure and the forming method that the present invention is formed in non-display area 302 is described.
Refer to Fig. 4 A, Fig. 4 A a kind of scale structure illustrated partly in the colored optical filtering substrates of the present invention on non-display area. As shown in Figure 4 A, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, vertically being initially formed altitude datum light-shielding pattern group 401, altitude datum light-shielding pattern group 401 contains the identical altitude datum light-shielding pattern 401A of multiple height, 401B, 401C and 401D. In the present embodiment, illustrate only four altitude datum light-shielding patterns, it is to be understood that, this is only one is not the restriction to altitude datum light-shielding pattern number of the present invention for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40.
In altitude datum light-shielding pattern group 401, each altitude datum light-shielding pattern 401A, 401B... are vertically distributed on the non-display area of transparent glass substrate, and, the spacing between adjacent reference height light-shielding pattern is equal. Namely as shown in Figure 4 A, the spacing between them is I.
Equally, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, vertically formation is with reference to height light-shielding pattern group 402, and comparison height light-shielding pattern group 402 also contains reference height light-shielding pattern 402A, 402B, 402C and the 402D that multiple height is different. In the present embodiment, illustrate only four with reference to height light-shielding pattern, it is to be understood that, this is only one is not the restriction to present invention reference height light-shielding pattern number for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40. With reference in height light-shielding pattern group 402, each is vertically distributed on the non-display area of transparent glass substrate with reference to height light-shielding pattern 402A, 402B....
On arrangement mode, each with reference to height light-shielding pattern 402A, 402B... in vertical direction with height value order arrangement from small to large (it is of course also possible in vertical direction with height value order arrangement from big to small). Each height value with reference to height light-shielding pattern 402A, 402B... meets below equation:
H (m)=H0+ (m-1) A;
Wherein, H (m) is the height value of m-th reference height light-shielding pattern; H0 is minimum constructive height; M is the described numbering with reference to height light-shielding pattern; A is height increase amount. Those skilled in the art are appreciated that in the present invention, and H0 and A numerical value can be determined according to practical situation, and generally its order of magnitude is μm.
Arranged in parallel between altitude datum light-shielding pattern group 401 and reference height light-shielding pattern group 402, further, each with reference to height light-shielding pattern 401A, 401B... vertical direction centrage respectively with the vertical direction centrage of altitude datum light-shielding pattern group spacing on a horizontal line (in Fig. 4 A X-X ').
Refer to Fig. 4 B, Fig. 4 B and illustrate the design sketch of the pattern height change occurred in the process forming shielding pattern layer. As shown in Figure 4 A, in original design, it is possible to equal with the spacing I between adjacent reference height light-shielding pattern in altitude datum light-shielding pattern group 401 with reference to the height design of at least one reference height light-shielding pattern in height light-shielding pattern group 402;Such as, the height with reference to height light-shielding pattern 402B in Fig. 4 A is equal with spacing I. If owing to various situations make the change that the height of light-shielding pattern occurs, then also can correspondingly change with reference to height with reference to height light-shielding pattern 402A, 402B... each in height light-shielding pattern group 402. Due to each highly inconsistent with reference to height light-shielding pattern 402A, 402B, therefore, the amount that their height changes is also inconsistent. If creating result as shown in Figure 4 B, namely actually obtaining and becoming equal with spacing I with reference to the height with reference to height light-shielding pattern 402C in height light-shielding pattern group, then can deduce the change of the unit that light-shielding pattern occurs in the height direction. The position of exposure mask plate and exposure machine can be adjusted as benchmark in time, eliminate this height change. If what actually obtain becomes equal with spacing I with reference in height light-shielding pattern group with reference to the height of height light-shielding pattern 402D, then can deduce the change of two units that light-shielding pattern occurs in the height direction, by that analogy.
In the embodiment of Fig. 4 A and Fig. 4 B, solving the problem measuring light-shielding pattern change in the height direction, similarly, light-shielding pattern there is also same problem in the direction of the width.
Refer to Fig. 5 A, Fig. 5 A another kind of scale structure illustrated partly in the colored optical filtering substrates of the present invention on non-display area. As shown in Figure 5A, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, being initially formed datum width light-shielding pattern group 501 in the horizontal direction, datum width light-shielding pattern group 501 contains the identical datum width light-shielding pattern 501A of multiple width, 501B, 501C and 501D. In the present embodiment, illustrate only four datum width light-shielding patterns, it is to be understood that, this is only one is not the restriction to datum width light-shielding pattern number of the present invention for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40.
In datum width light-shielding pattern group 501, each datum width light-shielding pattern 501A, 501B... are distributed on the non-display area of transparent glass substrate in the horizontal direction, and, the spacing between adjacent reference width light-shielding pattern is equal. Namely as shown in Figure 5A, the spacing between them is I '.
Equally, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, being formed with reference to width light-shielding pattern group 502 in the horizontal direction, comparison width light-shielding pattern group 502 also contains reference width light-shielding pattern 502A, 502B, 502C and the 502D that multiple width is different. In the present embodiment, illustrate only four with reference to width light-shielding pattern, it is to be understood that, this is only one is not the restriction to present invention reference width light-shielding pattern number for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40. With reference in width light-shielding pattern group 502, each is distributed on the non-display area of transparent glass substrate in the horizontal direction with reference to width light-shielding pattern 502A, 502B....
On arrangement mode, each with reference to width light-shielding pattern 502A, 502B... in the horizontal direction with width value order arrangement from small to large (it is of course also possible in the horizontal direction with width value order arrangement from big to small).Each width value with reference to width light-shielding pattern 502A, 502B... meets below equation:
W (n)=W0+ (n-1) B;
Wherein, W (n) is the width value of the n-th reference width light-shielding pattern; W0 is minimum widith; N is the described numbering with reference to width light-shielding pattern; B is width increase amount. Those skilled in the art are appreciated that in the present invention, and W0 and B numerical value can be determined according to practical situation, and generally its order of magnitude is μm.
Arranged in parallel between datum width light-shielding pattern group 501 and reference width light-shielding pattern group 502, further, each horizontal direction centrage with reference to width light-shielding pattern 501A, 501B... respectively with the horizontal direction centrage of datum width light-shielding pattern group spacing on a vertical line (in Fig. 5 A Y-Y ').
Refer to Fig. 5 B, Fig. 5 B and illustrate the design sketch of the pattern width change occurred in the process forming shielding pattern layer. As shown in Figure 5A, in original design, it is possible to equal with the spacing I ' between adjacent reference width light-shielding pattern in datum width light-shielding pattern group 501 with reference to the width design of at least one reference width light-shielding pattern in width light-shielding pattern group 502; Such as, the width with reference to width light-shielding pattern 502B in Fig. 5 A is equal with spacing I '. If owing to various situations make the change that the width of light-shielding pattern occurs, then also can correspondingly change with reference to width with reference to width light-shielding pattern 502A, 502B... each in width light-shielding pattern group 502. Due to each inconsistent with reference to width light-shielding pattern 502A, 502B width, therefore, the amount that their width changes is also inconsistent. If creating result as shown in Figure 5 B, namely actually obtaining and becoming equal with spacing I with reference to the width with reference to width light-shielding pattern 502C in width light-shielding pattern group, then can deduce the change of the unit that light-shielding pattern occurs in the direction of the width. The position of exposure mask plate and exposure machine can be adjusted as benchmark in time, eliminate this change width. If what actually obtain becomes equal with spacing I with reference in width light-shielding pattern group with reference to the width of width light-shielding pattern 502D, then can deduce the change of two units that light-shielding pattern occurs in the direction of the width, by that analogy.
In the embodiment of Fig. 4 A and Fig. 5 A, the problem solving the change measuring light-shielding pattern on height and width. Equally, in the process manufacturing colored optical filtering substrates, further comprises the formation of color filter patterns, it equally exists filter pattern width and the change of height in forming process. Therefore, present invention also offers the technical scheme solving to measure filter pattern in the problem of the change highly and on width.
Refer to Fig. 6 A, Fig. 6 A another scale structure illustrated partly in the colored optical filtering substrates of the present invention on non-display area. As shown in Figure 6A, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, vertically being initially formed altitude datum filter pattern group 601, altitude datum filter pattern group 601 contains the identical altitude datum filter pattern 601A of multiple height, 601B, 601C and 601D. In the present embodiment, illustrate only four altitude datum filter pattern, it is to be understood that, this is only one is not the restriction to altitude datum filter pattern number of the present invention for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 60.
In altitude datum filter pattern group 601, each altitude datum filter pattern 601A, 601B... are vertically distributed on the non-display area of transparent glass substrate, and, the spacing between adjacent reference height filter pattern is equal. Namely as shown in Figure 6A, the spacing between them is J.
Equally, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, vertically formation is with reference to height filter pattern group 602, and comparison height filter pattern group 602 also contains reference height filter pattern 602A, 602B, 602C and the 602D that multiple height is different. In the present embodiment, illustrate only four with reference to height filter pattern, it is to be understood that, this is only one is not the restriction to present invention reference height filter pattern number for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 60. With reference in height filter pattern group 602, each is vertically distributed on the non-display area of transparent glass substrate with reference to height filter pattern 602A, 602B....
On arrangement mode, each with reference to height filter pattern 602A, 602B... in vertical direction with height value order arrangement from small to large (it is of course also possible in vertical direction with height value order arrangement from big to small). Each height value with reference to height filter pattern 602A, 602B... meets below equation:
H ' (m ')=H ' 0+ (m '-1) A ';
Wherein, H ' (m ') is the individual height value with reference to height filter pattern of m '; H ' 0 is minimum constructive height; M ' is the described numbering with reference to height filter pattern; A ' is height increase amount. Those skilled in the art are appreciated that in the present invention, and H ' 0 and A ' numerical value can be determined according to practical situation, and generally its order of magnitude is μm.
Arranged in parallel between altitude datum filter pattern group 601 and reference height filter pattern group 602, further, each with reference to height filter pattern 601A, 601B... vertical direction centrage respectively with the vertical direction centrage of altitude datum filter pattern group spacing on a horizontal line (in Fig. 6 A O-O ').
Refer to Fig. 6 B, Fig. 6 B and illustrate the design sketch of the pattern height change occurred in the process forming filter pattern layer. As shown in Figure 6A, in original design, it is possible to equal with the spacing J between adjacent reference height filter pattern in altitude datum filter pattern group 601 with reference to the height design of at least one reference height filter pattern in height filter pattern group 602; Such as, the height with reference to height filter pattern 602B in Fig. 6 A is equal with spacing J. If owing to various situations make the change that the height of filter pattern occurs, then also can correspondingly change with reference to height with reference to height filter pattern 602A, 602B... each in height filter pattern group 602. Due to each highly inconsistent with reference to height filter pattern 602A, 602B, therefore, the amount that their height changes is also inconsistent. If creating result as shown in Figure 6B, namely actually obtaining and becoming equal with spacing J with reference to the height with reference to height filter pattern 602C in height filter pattern group, then can deduce the change of the unit that filter pattern occurs in the height direction. The position of exposure mask plate and exposure machine can be adjusted as benchmark in time, eliminate this height change. If what actually obtain becomes equal with spacing J with reference in height filter pattern group with reference to the height of height filter pattern 602D, then can deduce the change of two units that filter pattern occurs in the height direction, by that analogy.
In the embodiment of Fig. 6 A and Fig. 6 B, solving the problem measuring filter filter pattern change in the height direction, similarly, filter pattern there is also same problem in the direction of the width.
Refer to Fig. 7 A, Fig. 7 A another kind of scale structure illustrated partly in the colored optical filtering substrates of the present invention on non-display area. As shown in Figure 7 A, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, being initially formed datum width filter pattern group 701 in the horizontal direction, datum width filter pattern group 701 contains the identical datum width filter pattern 701A of multiple width, 701B, 701C and 701D. In the present embodiment, illustrate only four datum width filter pattern, it is to be understood that, this is only one is not the restriction to datum width filter pattern number of the present invention for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40.
In datum width filter pattern group 701, each datum width filter pattern 701A, 701B... are distributed on the non-display area of transparent glass substrate in the horizontal direction, and, the spacing between adjacent reference width filter pattern is equal. Namely as shown in Figure 7 A, the spacing between them is J '.
Equally, on the non-display area 302 of the colored optical filtering substrates shown in Fig. 3, being formed with reference to width filter pattern group 702 in the horizontal direction, comparison width filter pattern group 702 also contains reference width filter pattern 702A, 702B, 702C and the 702D that multiple width is different. In the present embodiment, illustrate only four with reference to width filter pattern, it is to be understood that, this is only one is not the restriction to present invention reference width filter pattern number for one embodiment of the present of invention is described, this number can be decided according to the actual requirements. In another embodiment of the present invention, this number can be arranged between 20 to 40. With reference in width filter pattern group 702, each is distributed on the non-display area of transparent glass substrate in the horizontal direction with reference to width filter pattern 702A, 702B....
On arrangement mode, each with reference to width filter pattern 702A, 702B... in the horizontal direction with width value order arrangement from small to large (it is of course also possible in the horizontal direction with width value order arrangement from big to small). Each width value with reference to width filter pattern 702A, 702B... meets below equation:
W ' (n ')=W ' 0+ (n '-1) B ';
Wherein, W ' (n ') is the n-th ' individual width value with reference to width filter pattern; W ' 0 is minimum widith; N ' is the described numbering with reference to width filter pattern; B ' is width increase amount. Those skilled in the art are appreciated that in the present invention, and W ' 0 and B ' numerical value can be determined according to practical situation, and generally its order of magnitude is μm.
Arranged in parallel between datum width filter pattern group 701 and reference width filter pattern group 702, further, each with reference to width filter pattern 701A, 701B... horizontal direction centrage respectively with the horizontal direction centrage of datum width filter pattern group spacing on a horizontal line (in Fig. 7 A P-P ').
Refer to Fig. 7 B, Fig. 7 B and illustrate the design sketch of the pattern width change occurred in the process forming filter pattern layer. As shown in Figure 7 A, in original design, it is possible to equal with the spacing J between adjacent reference width filter pattern in datum width filter pattern group 701 with reference to the width design of at least one reference width filter pattern in width filter pattern group 702;Such as, the width with reference to width filter pattern 702B in Fig. 7 A is equal with spacing J. If owing to various situations make the change that the width of filter pattern occurs, then also can correspondingly change with reference to width with reference to width filter pattern 702A, 702B... each in width filter pattern group 702. Due to each inconsistent with reference to width filter pattern 702A, 702B width, therefore, the amount that their width changes is also inconsistent. If creating result as shown in Figure 7 B, namely actually obtaining and becoming equal with spacing J ' with reference to the width with reference to width filter pattern 702C in width filter pattern group, then can deduce the change of the unit that filter pattern occurs in the direction of the width. The position of exposure mask plate and exposure machine can be adjusted as benchmark in time, eliminate this change width. If what actually obtain becomes equal with spacing J ' with reference to width with reference to width filter pattern 702D in width filter pattern group, then can deduce the change of two units that filter pattern occurs in the direction of the width, by that analogy.
In the embodiment of Fig. 6 A and Fig. 7 A, optical filtering altitude datum filter pattern group 601, with reference to height filter pattern group 602, optical filtering datum width filter pattern group 701 and be formed directly on the glass substrate of non-display area with reference to width filter pattern group 702, in another embodiment, in altitude datum filter pattern group 601, with reference to height filter pattern group 602, datum width filter pattern group 710 and with reference to arranging a light-shielding pattern bottom (not shown) between width filter pattern group 702 and transparent glass substrate. The effect of this embodiment is in that, test environment is closer to practical situation, it is possible to test the change width of filter pattern more accurately.
As mentioned above, analyze the embodiment describing the change measuring light-shielding pattern on height and width and the embodiment measuring filter pattern change on height and width in the above-described embodiment, it is appreciated that, these embodiments can be implemented individually, to solve respective problem, it is also possible to combination is implemented in one embodiment.
Claims (30)
1. a colored optical filtering substrates, including:
Transparent glass substrate;
Shielding pattern layer, is positioned on the viewing area of described transparent glass substrate, and described shielding pattern layer has open area;
Chromatic filter layer, is positioned on the open area of described shielding pattern layer, and with described light-shielding pattern ply;
Altitude datum light-shielding pattern group, comprises the altitude datum light-shielding pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum light-shielding pattern is equal;
With reference to height light-shielding pattern group, comprise the reference height light-shielding pattern that multiple height is different, be vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height light-shielding pattern group and described altitude datum light-shielding pattern group arranged in parallel, further, each described with reference to height light-shielding pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum light-shielding pattern group spacing on a horizontal line;
Datum width light-shielding pattern group, comprises the datum width light-shielding pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width light-shielding pattern is equal;
With reference to width light-shielding pattern group, comprise the reference width light-shielding pattern that multiple width is different, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width light-shielding pattern group and described datum width light-shielding pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width light-shielding pattern respectively with the horizontal direction centrage of described datum width light-shielding pattern group spacing on a vertical line.
2. colored optical filtering substrates as claimed in claim 1, it is characterised in that in described reference height light-shielding pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height light-shielding pattern in described altitude datum light-shielding pattern group of height light-shielding pattern;In described reference width light-shielding pattern group, at least one is equal with reference to the spacing between width and adjacent reference width light-shielding pattern in described datum width light-shielding pattern group of width light-shielding pattern group.
3. colored optical filtering substrates as claimed in claim 2, it is characterized in that, described with reference in height light-shielding pattern group each with reference to height light-shielding pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H (m) with reference to height light-shielding pattern meets lower form:
H (m)=H0+ (m-1) A;
Wherein, H0 is minimum constructive height; M is the described numbering with reference to height light-shielding pattern, and wherein the number order of m from top to bottom or is from the bottom to top numbered in vertical direction; A is height increase amount.
4. colored optical filtering substrates as claimed in claim 2, it is characterized in that, described with reference in width light-shielding pattern group each with reference to width light-shielding pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W (n) with reference to width light-shielding pattern meets following form:
W (n)=W0+ (n-1) B;
Wherein, W0 is minimum widith; N is the described numbering with reference to width light-shielding pattern, and wherein the number order of n from left to right or is from right to left numbered in the horizontal direction; B is width increase amount.
5. the colored optical filtering substrates as described in claim 2,3 or 4, it is characterised in that in described reference height light-shielding pattern group with reference to the number of height light-shielding pattern between 20 to 40; In described reference width light-shielding pattern group with reference to the number of width light-shielding pattern between 20 to 40.
6. the colored optical filtering substrates as described in claim 3 or 4, it is characterised in that the value of A is 0.3-2 μm, the value of B is 0.3-2 μm.
7. the colored optical filtering substrates as described in claim 3 or 4, it is characterised in that the value of A is 1 μm, the value of B is 1 μm.
8. a colored optical filtering substrates, including:
Transparent glass substrate;
Shielding pattern layer, is positioned on the viewing area of described transparent glass substrate, and described shielding pattern layer has open area;
Chromatic filter layer, is positioned on the open area of described shielding pattern layer, and with described light-shielding pattern ply;
Altitude datum filter pattern group, comprises the altitude datum filter pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum filter pattern is equal;
With reference to height filter pattern group, comprise the reference height filter pattern that multiple height is different, be vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height filter pattern group and described altitude datum filter pattern group arranged in parallel, further, each described with reference to height filter pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum filter pattern group spacing on a horizontal line;
Datum width filter pattern group, comprises the datum width filter pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width filter pattern is equal;
With reference to width filter pattern group, comprise the reference width filter pattern that multiple width is different, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width filter pattern group and described datum width filter pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width filter pattern respectively with the horizontal direction centrage of described datum width filter pattern group spacing on a vertical line.
9. colored optical filtering substrates as claimed in claim 8, it is characterised in that in described reference height filter pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height filter pattern in described altitude datum filter pattern group of height filter pattern; In described reference width filter pattern group, at least one is equal with reference to the spacing between width and adjacent reference width filter pattern in described datum width filter pattern group of width filter pattern group.
10. colored optical filtering substrates as claimed in claim 8, it is characterized in that, in described altitude datum filter pattern group, described with reference to height filter pattern group, described datum width filter pattern group with described be additionally provided with light-shielding pattern bottom with reference between width filter pattern group and described transparent glass substrate.
11. colored optical filtering substrates as claimed in claim 9, it is characterized in that, described with reference in height filter pattern group each with reference to height filter pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H'(m with reference to height filter pattern) meet following form:
H'(m')=H'0+ (m'-1) A';
Wherein, H'0 is minimum constructive height; M' is the described numbering with reference to height filter pattern, and wherein the number order of m ' from top to bottom or is from the bottom to top numbered in vertical direction; A' is height increase amount.
12. colored optical filtering substrates as claimed in claim 9, it is characterized in that, described with reference in width filter pattern group each with reference to width filter pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W'(n with reference to width filter pattern) meet following form:
W'(n')=W'0+ (n'-1) B';
Wherein, W'0 is minimum widith; N' is the described numbering with reference to width filter pattern, and wherein the number order of n ' from left to right or is from right to left numbered in the horizontal direction; B' is width increase amount.
13. colored optical filtering substrates as claimed in claim 9, it is characterised in that in described reference height filter pattern group with reference to the number of height filter pattern between 20 to 40; In described reference width filter pattern group with reference to the number of width filter pattern between 20 to 40.
14. the colored optical filtering substrates as described in claim 11 or 12, it is characterised in that the value of A' is 0.3-2 μm, the value of B' is 0.3-2 μm.
15. the colored optical filtering substrates as described in claim 11 or 12, it is characterised in that the value of A' is 1 μm, the value of B' is 1 μm.
16. a manufacture method for colored optical filtering substrates, including:
One transparent glass substrate is provided;
The viewing area of described transparent glass substrate is formed shielding pattern layer; Simultaneously
The non-display area of described transparent glass substrate is formed altitude datum light-shielding pattern group and datum width light-shielding pattern group; Described altitude datum light-shielding pattern group comprises the altitude datum light-shielding pattern that multiple height is identical, is vertically distributed on the non-display area of described transparent glass substrate, and the spacing between adjacent described altitude datum light-shielding pattern is equal; Described datum width light-shielding pattern group comprises the datum width light-shielding pattern that multiple width is identical, is distributed on the non-display area of described transparent glass substrate in the horizontal direction, and the spacing between adjacent described datum width light-shielding pattern is equal;
The non-display area of described transparent glass substrate is formed with reference to height light-shielding pattern group with reference to width light-shielding pattern group; Described reference height light-shielding pattern group comprises the reference height light-shielding pattern that multiple height is different, is vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height light-shielding pattern group and described altitude datum light-shielding pattern group arranged in parallel, further, each described with reference to height light-shielding pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum light-shielding pattern group spacing on a horizontal line; Described with reference to width light-shielding pattern group comprise multiple width different with reference to width light-shielding pattern, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width light-shielding pattern group and described datum width light-shielding pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width light-shielding pattern respectively with the horizontal direction centrage of described datum width light-shielding pattern group spacing on a vertical line; And
Chromatic filter layer is formed in the open area of described shielding pattern layer.
17. the manufacture method of colored optical filtering substrates as claimed in claim 16, it is characterized in that, in described reference height light-shielding pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height light-shielding pattern in described altitude datum light-shielding pattern group of height light-shielding pattern; In described reference width light-shielding pattern group, at least one is equal with reference to the spacing between width and adjacent reference width light-shielding pattern in described datum width light-shielding pattern group of width light-shielding pattern group.
18. the manufacture method of colored optical filtering substrates as claimed in claim 17, it is characterized in that, described with reference in height light-shielding pattern group each with reference to height light-shielding pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H (m) with reference to height light-shielding pattern meets following form:
H (m)=H0+ (m-1) A;
Wherein, H0 is minimum constructive height; M is the described numbering with reference to height light-shielding pattern, and wherein the number order of m from top to bottom or is from the bottom to top numbered in vertical direction; A is height increase amount.
19. the manufacture method of colored optical filtering substrates as claimed in claim 17, it is characterized in that, described with reference in width light-shielding pattern group each with reference to width light-shielding pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W (n) with reference to width light-shielding pattern meets following form:
W (n)=W0+ (n-1) B;
Wherein, W0 is minimum widith; N is the described numbering with reference to width light-shielding pattern, and wherein the number order of n from left to right or is from right to left numbered in the horizontal direction; B is width increase amount.
20. the manufacture method of the colored optical filtering substrates as described in claim 17,18 or 19, it is characterised in that in described reference height light-shielding pattern group with reference to the number of height light-shielding pattern between 20 to 40; In described reference width light-shielding pattern group with reference to the number of width light-shielding pattern between 20 to 40.
21. the manufacture method of the colored optical filtering substrates as described in claim 18 or 19, it is characterised in that the value of A is 0.3-2 μm, the value of B is 0.3-2 μm.
22. the manufacture method of colored optical filtering substrates as claimed in claim 21, it is characterised in that the value of A is 1 μm, and the value of B is 1 μm.
23. a manufacture method for colored optical filtering substrates, including:
One transparent glass substrate is provided;
The viewing area of described transparent glass substrate is formed shielding pattern layer; Simultaneously
The non-display area of described transparent glass substrate forms altitude datum filter pattern group and with reference to height filter pattern group, described altitude datum filter pattern group comprises the altitude datum filter pattern that multiple height is identical, vertically being distributed on the non-display area of described transparent glass substrate, the spacing between adjacent described altitude datum filter pattern is equal; Described reference height filter pattern group comprises the reference height filter pattern that multiple height is different, is vertically distributed on the non-display area of described transparent glass substrate; Described with reference to height filter pattern group and described altitude datum filter pattern group arranged in parallel, further, each described with reference to height filter pattern vertical direction centrage respectively with the vertical direction centrage of described altitude datum filter pattern group spacing on a horizontal line;
The non-display area of described transparent glass substrate forms datum width filter pattern group and with reference to width filter pattern group, described datum width filter pattern group comprises the datum width filter pattern that multiple width is identical, being distributed on the non-display area of described transparent glass substrate in the horizontal direction, the spacing between adjacent described datum width filter pattern is equal; Described with reference to width filter pattern group comprise multiple width different with reference to width filter pattern, be distributed on the non-display area of described transparent glass substrate in the horizontal direction; Described reference width filter pattern group and described datum width filter pattern group arranged in parallel, further, each described horizontal direction centrage with reference to width filter pattern respectively with the horizontal direction centrage of described datum width filter pattern group spacing on a vertical line; And
Chromatic filter layer is formed in the open area of described shielding pattern layer.
24. the manufacture method of colored optical filtering substrates as claimed in claim 23, it is characterized in that, in described reference height filter pattern group, at least one is equal with reference to the spacing between height and the adjacent reference height filter pattern in described altitude datum filter pattern group of height filter pattern; In described reference width filter pattern group, at least one is equal with reference to the spacing between width and adjacent reference width filter pattern in described datum width filter pattern group of width filter pattern group.
25. the manufacture method of colored optical filtering substrates as claimed in claim 23, it is characterized in that, in described altitude datum filter pattern group, described with reference to height filter pattern group, described datum width filter pattern group with described be additionally provided with light-shielding pattern bottom with reference between width filter pattern group and described transparent glass substrate.
26. the manufacture method of colored optical filtering substrates as claimed in claim 24, it is characterized in that, described with reference in height filter pattern group each with reference to height filter pattern in vertical direction with height value order arrangement from small to large, wherein each described height value H'(m with reference to height filter pattern) meet following form:
H'(m')=H'0+ (m'-1) A';
Wherein, H'0 is minimum constructive height; M' is the described numbering with reference to height filter pattern, and wherein the number order of m ' from top to bottom or is from the bottom to top numbered in vertical direction; A' is height increase amount.
27. the manufacture method of colored optical filtering substrates as claimed in claim 24, it is characterized in that, described with reference in width filter pattern group each with reference to width filter pattern in the horizontal direction with width value order arrangement from small to large, wherein each described width value W'(n with reference to width filter pattern) meet following form:
W'(n')=W'0+ (n'-1) B';
Wherein, W'0 is minimum widith; N' is the described numbering with reference to width filter pattern, and wherein the number order of n ' from left to right or is from right to left numbered in the horizontal direction; B' is width increase amount.
28. the manufacture method of the colored optical filtering substrates as described in claim 24,25,26 or 27, it is characterised in that in described reference height filter pattern group with reference to the number of height filter pattern between 20 to 40; In described reference width filter pattern group with reference to the number of width filter pattern between 20 to 40.
29. the manufacture method of the colored optical filtering substrates as described in claim 26 or 27, it is characterised in that the value of A' is 0.3-2 μm, the value of B' is 0.3-2 μm.
30. the manufacture method of the colored optical filtering substrates as described in claim 26 or 27, it is characterised in that the value of A' is 1 μm, the value of B' is 1 μm.
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| CN103487969A (en) * | 2013-09-26 | 2014-01-01 | 深圳市华星光电技术有限公司 | Color filter unit width measuring method and liquid crystal panel manufacturing method |
| CN104345484B (en) * | 2014-11-04 | 2017-03-29 | 京东方科技集团股份有限公司 | Test cell, array base palte and its manufacture method, display floater and display device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10115702A (en) * | 1996-10-11 | 1998-05-06 | Dainippon Printing Co Ltd | Color filter with color slurring quantity confirmation mark |
| JP2007212939A (en) * | 2006-02-13 | 2007-08-23 | Hitachi High-Technologies Corp | Inspection method of positional deviation, program and inspection device of positional deviation |
| JP2009109398A (en) * | 2007-10-31 | 2009-05-21 | Toppan Printing Co Ltd | Method of inspecting color filter defect in color filter substrate |
| JP2010108967A (en) * | 2008-10-28 | 2010-05-13 | Toppan Printing Co Ltd | Vernier and method of measuring exposure position |
-
2010
- 2010-12-31 CN CN201010622149.5A patent/CN102540554B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10115702A (en) * | 1996-10-11 | 1998-05-06 | Dainippon Printing Co Ltd | Color filter with color slurring quantity confirmation mark |
| JP2007212939A (en) * | 2006-02-13 | 2007-08-23 | Hitachi High-Technologies Corp | Inspection method of positional deviation, program and inspection device of positional deviation |
| JP2009109398A (en) * | 2007-10-31 | 2009-05-21 | Toppan Printing Co Ltd | Method of inspecting color filter defect in color filter substrate |
| JP2010108967A (en) * | 2008-10-28 | 2010-05-13 | Toppan Printing Co Ltd | Vernier and method of measuring exposure position |
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