CN105652506A - Color filter and making method thereof and photomask used for making color filter - Google Patents
Color filter and making method thereof and photomask used for making color filter Download PDFInfo
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- CN105652506A CN105652506A CN201610044770.5A CN201610044770A CN105652506A CN 105652506 A CN105652506 A CN 105652506A CN 201610044770 A CN201610044770 A CN 201610044770A CN 105652506 A CN105652506 A CN 105652506A
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- filter film
- colour cell
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
Abstract
The invention discloses a color filter and a making method thereof and a photomask used for making the color filter. The color filter comprises a substrate, a first color filter film, a second color filter film and a third color filter film, wherein the first color filter film, the second color filter film and the third color filter film are formed on the substrate, the first color filter film comprises a first color-resisting pattern which is patterned, the second color filter film comprises a second color-resisting pattern which is patterned, the third color filter film comprises a third color-resisting pattern which is patterned, the edges on the four sides of each color-resisting pattern form a black matrix by means of overlapping of two kinds of color resistance, and the four corners of each color-resisting pattern form a spacer by means of overlapping of three kinds of color resistance. The filter films in three colors are formed through the same photomask, and the required black matrix and spacer are formed by means of interlapping of the filter films in three colors, so that the making process of the color filter is simplified, making time for the color filter is greatly shortened, and production cost is greatly reduced.
Description
Technical field
The present invention relates to Display Technique field, particularly relate to a kind of colored filter and preparation method thereof, and for making the light shield of colored filter.
Background technology
Liquid crystal indicator includes opposed colored filter (ColorFilter, CF) and array base palte (TFTarray) and is interposed in liquid crystal layer (LiquidCrystal, LC) between the two. The basic structure of existing colored filter includes glass substrate (GlassSubstrate), black matrix (BlackMatrix, BM), color filter film (ColorLayer), electrode layer (ITO), alignment film (Polyimide, PI), the composition such as chock insulator matter (PhotoSpacer, PS).
Fig. 1 is the partial cutaway schematic of existing colored filter, please join Fig. 1, and the black matrix 12 of colored filter 10 is arranged on glass substrate 11, and black matrix 12 includes a plurality of cross one another shading strip 12a, and black matrix 12 is used for blocking pixel edge region. The place that glass substrate 11 is not covered by black matrix 12 is separated to form multiple transmission region 11a by cross one another shading strip 12a. Color filter film 13 includes the filter coating of three kinds of colors, such as red filter film R, green filter film G and blue filter film B, filter coating R, G, B of these three kinds of colors is arranged on the transmission region 11a of glass substrate 11 by certain arrangement mode, and color filter film 13 is for the colored display of LCD. Being provided with electrode layer or alignment film 14 on color filter film 13, be provided with chock insulator matter 15 on this electrode layer or alignment film 14, chock insulator matter 15 is used for supporting liquid crystal cell thickness.
Existing colored filter makes through operations such as Multiple depositions, exposure, etchings on glass substrate 11 and is formed, and the general step of its processing technology includes:
(1) one layer of opaque resin of deposition, obtains black matrix 12 after exposure etching;
(2) deposit RGB resin respectively, after exposure etching, obtain color filter film 13;
(3) depositing electrode layer or alignment film 14; And
(4) deposition chock insulator matter, obtains chock insulator matter 15 after exposure etching.
As can be seen here, existing colored filter need through black matrix 12, color filter film 13, chock insulator matter 15 complicated manufacturing process.And when making color filter film 13, it is generally required to use three different light shields (mask), for making the filter coating of tri-kinds of colors of R, G, B respectively. Complicated processing procedure and the use of multiple light shields add Production Time and the production cost of colored filter.
As above-mentioned, first existing color filter producing process forms black matrix 12 on glass substrate 11, and the basic function of black matrix 12 is shading, and effect is to prevent adjacent R, G, B pixel colour mixture. Industry it is proposed that make color filter film 13 time, by two kinds of color blocking overlapping material to realize the idea of black matrix shading, so can save the processing procedure making black matrix 12, reduce by a light shield making black matrix 12 and make the processing time of black matrix 12, but the making of color filter film 13 and chock insulator matter 15 still needs to multiple light shields to be completed, production cost is still significantly high, and making technology is to be improved.
Summary of the invention
It is an object of the invention to provide a kind of colored filter and preparation method thereof, and for making the light shield of colored filter, to simplify the processing procedure of colored filter, reduce Production Time and the production cost of colored filter.
The present invention provides a kind of colored filter, including underlay substrate and the first color filter film formed on this underlay substrate, the second color filter film and the 3rd color filter film, this first color filter film includes the first color blocking pattern of patterning, this second color filter film includes the second color blocking pattern of patterning, 3rd color filter film includes the tertiary color resistance pattern of patterning, the four side edge of each color blocking pattern overlaps to form black matrix by two kinds of color blockings, and four corners of each color blocking pattern overlap to form chock insulator matter by three kinds of color blockings.
Further, this first color filter film, this second color filter film are identical with the pattern of the 3rd color filter film, the pattern of this second color filter film is relative to width along this underlay substrate towards the sub-pixel that offsets to one side of the pattern of this first color filter film, and the pattern of the 3rd color filter film is relative to the pattern of this first color filter film width along this underlay substrate towards contrary opposite side one sub-pixel of skew.
Further, two adjacent in every a line these the first color blocking patterns are spaced along the transverse direction of this underlay substrate, and this first color blocking pattern in neighbouring two row is along the width of the vertical sub-pixel that mutually staggers of this underlay substrate and is connected by a corner.
Further, this the first color blocking pattern being positioned at odd-numbered line is mutually aligned on this is vertical, it is positioned at this first color blocking pattern of even number line to be also mutually aligned on this is vertical, but is positioned at this first color blocking pattern of odd-numbered line and is positioned at this first color blocking pattern of even number line and mutually staggers on this is vertical the width of a sub-pixel.
Further, this first color blocking pattern in neighbouring two row is respectively provided with overlap on this transverse direction and this are vertical, and overlapping dimension is the width of this black matrix.
Further, this colored filter has viewing area and is positioned at the non-display area of this viewing area periphery, this the first color blocking pattern, this the second color blocking pattern and this tertiary color resistance pattern are corresponding to this viewing area, this first color filter film also includes the first periphery color group, this second color filter film also includes the second periphery color group, 3rd color filter film also includes the 3rd periphery color group, this the first periphery color group, this the second periphery colour cell and the 3rd periphery colour cell are corresponding to this non-display area, this the first periphery color group, this the second periphery colour cell and the 3rd periphery colour cell overlap to form black matrix or chock insulator matter at this non-display area by color blocking.
Further, this the first periphery colour cell is pattern structure and includes multiple first periphery colour cell pattern, the width of this first periphery colour cell pattern each is equivalent to the width of two sub-pixels, the width of two adjacent in every a line these spaced sub-pixels of the first periphery colour cell pattern, this the second periphery colour cell is pattern structure and includes multiple second periphery colour cell pattern, and the 3rd periphery colour cell is pattern structure and includes multiple 3rd periphery colour cell pattern.
The present invention also provides for the manufacture method of a kind of colored filter, and this manufacture method comprises the steps:
One light shield is provided, utilize this light to cover on exposure on underlay substrate and make the first color filter film, this first color filter film includes the first color blocking pattern of patterning, defines this light and covers on exposure to make residing exposure position during this first color filter film be reference position;
This same Zhang Guang covers on the width along this underlay substrate towards one sub-pixel of side shifting on the basis of said reference position, and on this underlay substrate, exposure makes the second color filter film, and this second color filter film includes the second color blocking pattern of patterning; And
This same Zhang Guang is covered on the width moving a sub-pixel on the basis of said reference position along this underlay substrate towards contrary opposite side, on this underlay substrate, exposure makes the 3rd color filter film, and the 3rd color filter film includes the tertiary color resistance pattern of patterning;
Wherein, the four side edge of each color blocking pattern overlaps to form black matrix by two kinds of color blockings, and four corners of each color blocking pattern overlap to form chock insulator matter by three kinds of color blockings.
The present invention also provides for a kind of the first light shield for making colored filter, this colored filter includes viewing area, this first light shield includes the first mask pattern, this first mask pattern makes the viewing area of this colored filter for exposing, two adjacent in every a line these first mask pattern are spaced along the transverse direction of this first light shield, this first mask pattern in neighbouring two row is along the width of the vertical sub-pixel that mutually staggers of this first light shield and is connected by a corner, this first mask pattern being positioned at odd-numbered line is mutually aligned on this is vertical, this first mask pattern being positioned at even number line is also mutually aligned on this is vertical, the width of a sub-pixel but this first mask pattern being positioned at odd-numbered line and this first mask pattern being positioned at even number line mutually stagger on this is vertical, this first mask pattern in neighbouring two row this transverse direction and this vertical on be respectively provided with overlap and overlapping dimension is the width of black matrix.
The present invention also provides for a kind of the second light shield for making colored filter, this colored filter includes viewing area, this second light shield includes the second mask pattern, this second mask pattern makes the viewing area of this colored filter for exposing, and this second mask pattern and the first above-mentioned mask pattern are complementary structure relation.
Colored filter provided by the invention and preparation method thereof, utilize same light shield namely to achieve on underlay substrate, make the first color filter film, the second color filter film and the 3rd color filter film, and while making the first color filter film, the second color filter film and the 3rd color filter film, by the black matrix needed for the overlapped formation of the filter coating of these three color and chock insulator matter. Formed owing to the filter coating of three kinds of colors shares same light shield manufacture, and also eliminate the light shield needed for making black matrix and chock insulator matter and processing time simultaneously, simplify the processing procedure of colored filter, greatly reduce Production Time and the production cost of colored filter.
Accompanying drawing explanation
Fig. 1 is the partial cutaway schematic of existing colored filter.
Fig. 2 is the part plan schematic diagram of the colored filter of the embodiment of the present invention.
Fig. 3 is the generalized section in Fig. 2 along III-III line.
Fig. 4 is the generalized section in Fig. 2 along IV-IV line.
Fig. 5 a to Fig. 5 c is the manufacturing process part plan schematic diagram of the colored filter of first embodiment of the invention.
Fig. 6 is the enlarged diagram of VI part in Fig. 5 a.
Fig. 7 a to Fig. 7 c is the manufacturing process part plan schematic diagram of the non-display area of the colored filter of second embodiment of the invention.
Fig. 8 is the part plan schematic diagram of first light shield for making colored filter of the present invention.
Fig. 9 is the part plan schematic diagram of second light shield for making colored filter of the present invention.
Detailed description of the invention
For further setting forth that the present invention reaches technical approach and effect that predetermined goal of the invention is taked, below in conjunction with drawings and Examples, to the specific embodiment of the present invention, structure, feature and effect thereof, describe in detail as after.
Fig. 2 is the part plan schematic diagram of the colored filter of the embodiment of the present invention, and Fig. 3 is the generalized section in Fig. 2 along III-III line, and Fig. 4 is the generalized section in Fig. 2 along IV-IV line. Please joining Fig. 2 to Fig. 4, the colored filter 20 of the embodiment of the present invention includes underlay substrate 21 and forms the first color filter film the 22, second color filter film 23 and the 3rd color filter film 24 on underlay substrate 21. First color filter film 22 is such as green filter film G, and the second color filter film 23 is such as red filter film R, and the 3rd color filter film 24 is such as blue filter film B, but is not limited. In the present invention, share to make on underlay substrate 21 respectively after a light shield carries out three exposures and form the first color filter film the 22, second color filter film 23 and the 3rd color filter film 24, and while making first color filter film the 22, second color filter film 23 and the 3rd color filter film 24, overlapped and form required black matrix BM and chock insulator matter PS by the filter coating 22,23,24 of these three color. Specifically, first color filter film 22 includes the first color blocking pattern 22a of patterning, second color filter film 23 includes the second color blocking pattern 23a of patterning, 3rd color filter film 24 includes the tertiary color resistance pattern 24a of patterning, the edge of four side up and down (the C place such as Fig. 2) of each color blocking pattern 22a, 23a, 24a overlaps to form black matrix BM by two kinds of color blockings, by designing the width of overlapping region, the shade function of black matrix can be realized in the color blocking overlay region of panel data line and scan-line direction; Four corners (the D place such as Fig. 2) of each color blocking pattern 22a, 23a, 24a overlap to form chock insulator matter PS by three kinds of color blockings, by designing the height of overlapping region, the overlay region of three kinds of color blockings can realize the liquid crystal cell thickness support function of chock insulator matter in the direction being perpendicular to underlay substrate 21. The filter coating 22,23,24 of these three color is preferably used narrow bandwidth color blocking material, owing to the transmitted spectrum of narrow bandwidth color blocking material is non-overlapping or overlapping area is little, can form good shading concentration by color blocking overlap.
Colored filter 20 provided by the invention, filter coating 22 due to these three kinds of colors, 23, 24 share same light shield manufacture is formed, and making the filter coating 22 of these three kinds of colors, 23, while 24, by the filter coating 22 of these three kinds of colors, 23, black matrix needed for 24 overlapped formation and chock insulator matter, eliminate the light shield needed for making black matrix and chock insulator matter and processing time, namely the filter coating 22 of three kinds of colors is achieved by a light shield, 23, 24 and the processing procedure of black matrix and chock insulator matter, simplify the processing procedure of colored filter 20, greatly reduce Production Time and the production cost of colored filter 20.
Fig. 5 a to Fig. 5 c is the manufacturing process part plan schematic diagram of the colored filter of first embodiment of the invention, and this manufacture method includes:
Step one: as shown in Figure 5 a a, it is provided that light shield, utilizes this light to cover on exposure on underlay substrate 21 and makes the first color filter film 22. underlay substrate 21 is such as transparent glass substrate. first color filter film 22 has the first colour, and the first color filter film 22 is such as green filter film G, but is not limited. when on underlay substrate 21, exposure makes the first color filter film 22, on underlay substrate 21, first it is coated with one layer of first color blocking material (the color blocking material that such as coating is a layer green) with the first colour, then utilize this light shield that this first color blocking material is exposed (define this light cover on exposure to make residing exposure position during this first color filter film 22 be reference position), carry out after exposure developing to remove unwanted first color blocking material, the pattern of remaining the first color blocking material obtained is this first color filter film 22, thus making the first color filter film 22 defining patterning on underlay substrate 21.
Colored filter 20 has viewing area 20a and is positioned at the non-display area 20b of viewing area 20a periphery. First color filter film 22 includes the first color blocking pattern 22a corresponding to viewing area 20a and the first periphery colour cell 22b, the first color blocking pattern 22a of the first color filter film 22 corresponding to non-display area 20b are necessarily regularly arranged in the 20a of viewing area. In the present embodiment, two the first color blocking pattern 22a adjacent in every a line are spaced along the horizontal X of underlay substrate 21, the first color blocking pattern 22a in neighbouring two row is staggered the width of a sub-pixel and being connected by a corner mutually along the vertical Y of underlay substrate 21, and wherein horizontal X and vertical Y is mutually perpendicular to. In more detail, the the first color blocking pattern 22a being positioned at odd-numbered line is mutually aligned on vertical Y, the the first color blocking pattern 22a being positioned at even number line is also mutually aligned on vertical Y, the width of a sub-pixel but the first color blocking pattern 22a being positioned at odd-numbered line and the first color blocking pattern 22a being positioned at even number line mutually stagger on vertical Y, makes the first color blocking pattern 22a in neighbouring two row mutually stagger on vertical Y the width of a sub-pixel and being connected by a corner.
Please joining Fig. 2, on glass substrate 21, only the place of monolayer color blocking forms transmission region 21a, and the width of each transmission region 21a is W0, each transmission region 21a length is L0, the width of black matrix BM is WBM. Fig. 6 is the enlarged diagram of VI part in Fig. 5 a, please join Fig. 6, for three the first color blocking pattern 22a being connected up and down, the upper right corner of the first color blocking pattern 22a of diagram lower section is connected with the lower left corner of the first middle color blocking pattern 22a, and the middle upper left corner of the first color blocking pattern 22a is connected with the lower right corner of the first color blocking pattern 22a of top. The first color blocking pattern 22a in neighbouring two row is respectively provided with overlap on horizontal X and vertical Y, and overlapping dimension is WBM(i.e. the width of black matrix). Assume that the first color blocking pattern 22a is of a size of W1*L1(width is W1, length is L1), then W1=W0+2WBM, L1=L0+2WBM��
Step 2: as shown in Figure 5 b, covers on the width along underlay substrate 21 towards side (such as towards a left side) mobile sub-pixel on the basis of said reference position by this same Zhang Guang, and on underlay substrate 21, exposure makes the second color filter film 23.Second color filter film 23 has the second colour, and the second color filter film 23 is such as red filter film R, but is not limited. When on underlay substrate 21, exposure makes the second color filter film 23, first it is coated with one layer on the first color filter film 22 and on the underlay substrate 21 not covered by the first color filter film 22 and there is the second colored color blocking material of the second (the color blocking material that such as coating is a layer red), then utilize this light shield that this second color blocking material is exposed, this light cover on expose this second color blocking material time exposure position relative to exposure make the first color filter film 22 reference position move to the left a sub-pixel width (width of a sub-pixel be equal to W0+WBM), carrying out after exposure developing to remove unwanted second color blocking material, the pattern of remaining the second color blocking material obtained is this second color filter film 23, thus making the second color filter film 23 defining patterning on underlay substrate 21.
When making the second color filter film 23, owing to adopting the light shield identical with making the first color filter film 22, therefore the pattern of the second color filter film 23 and the pattern of the first color filter film 22 are identical, and simply the pattern of the second color filter film 23 offsets the width of a sub-pixel to the left relative to the pattern of the first color filter film 22. Second color filter film 23 includes the second color blocking pattern 23a corresponding to viewing area 20a and the second periphery colour cell 23b corresponding to non-display area 20b, the width of a sub-pixel is moved to the left relative to the reference position of exposure making the first color filter film 22 owing to this light covers on exposure position when exposure makes the second color filter film 23, and in the color blocking pattern made by the exposure of this light shield, the color blocking pattern in neighbouring two row mutually staggers the width of a sub-pixel and be respectively provided with overlapping dimension W on horizontal X and vertical Y on vertical YBM(as shown in Figure 6), therefore the second color blocking pattern 23a and the first color blocking pattern 22a all has imbricate on horizontal X and vertical Y, and the second periphery colour cell 23b and the first periphery colour cell 22b there is also lap simultaneously, specifically as shown in Figure 5 b.
Step 3: as shown in Figure 5 c, this same Zhang Guang covers on the width along underlay substrate 21 towards the mobile sub-pixel of contrary opposite side (such as towards right side) on the basis of said reference position, and on underlay substrate 21, exposure makes the 3rd color filter film 24. 3rd color filter film 24 has the third colour, and the 3rd color filter film 24 is such as blue filter film B, but is not limited. when on underlay substrate 21, exposure makes three color filter films 24, first at the first color filter film 22, one layer of tertiary color resistance material (being such as coated with the color blocking material of blue layer) with the third colour it is coated with on second color filter film 23 and on the underlay substrate 21 not covered by the first color filter film 22 and the second color filter film 23, then utilize this light shield that this tertiary color is hindered material to be exposed, this light cover on expose this tertiary color resistance material time exposure position relative to exposure make the first color filter film 22 reference position move to the right a sub-pixel width (width of a sub-pixel be equal to W0+WBM), carrying out developing to remove unwanted tertiary color resistance material after exposure, the pattern of the remaining tertiary color resistance material obtained is the 3rd color filter film 24, thus making the 3rd color filter film 24 defining patterning on underlay substrate 21.
When making three color filter films 24, owing to adopting the light shield identical with making the first color filter film 22 and the second color filter film 23, therefore the pattern of the 3rd color filter film 24 and the pattern of first color filter film the 22, second color filter film 23 are identical, and simply the pattern of the 3rd color filter film 24 offsets the width of a sub-pixel to the right relative to the pattern of the first color filter film 22. 3rd color filter film 24 includes hindering pattern 24a and the 3rd periphery colour cell 24b corresponding to non-display area 20b corresponding to the tertiary color of viewing area 20a, the width of a sub-pixel is moved to the right relative to the reference position of exposure making the first color filter film 22 owing to this light covers on exposure position when exposure makes three color filter films 24, and in the color blocking pattern by the exposure making of this light shield, the color blocking pattern in neighbouring two row is respectively provided with overlapping dimension W on horizontal X and vertical YBM(as shown in Figure 6), therefore tertiary color resistance pattern 24a and the first color blocking pattern 22a, the second color blocking pattern 23a all have imbricate on horizontal X and vertical Y, 3rd periphery colour cell 24b and the first periphery colour cell 22b, the second periphery colour cell 23b there is also lap simultaneously, specifically as shown in Figure 5 c.
Please join Fig. 2 to Fig. 5 c, after above-mentioned steps one to step 3, namely achieve to make on underlay substrate 21 after a shared light shield carries out three exposures and form the first color filter film the 22, second color filter film 23 and the 3rd color filter film 24, and while making first color filter film the 22, second color filter film 23 and the 3rd color filter film 24, by the black matrix BM needed for the overlapped formation of filter coating 22,23,24 of these three color and chock insulator matter PS. specifically, the edge of four side up and down (the C place such as Fig. 2) of each color blocking pattern 22a, 23a, 24a overlaps to form required black matrix BM by two kinds of color blockings, to play the effect preventing light leak, four corners (the D place such as Fig. 2) of each color blocking pattern 22a, 23a, 24a overlap to form required chock insulator matter PS by three kinds of color blockings, support, to play, the effect that liquid crystal cell is thick. filter coating 22 due to these three kinds of colors, 23, 24 share same light shield manufacture is formed, and making the filter coating 22 of these three kinds of colors, 23, while 24, by the filter coating 22 of these three kinds of colors, 23, black matrix needed for 24 overlapped formation and chock insulator matter, eliminate the light shield needed for making black matrix and chock insulator matter and processing time, namely the filter coating 22 of three kinds of colors is achieved by a light shield, 23, 24 and the processing procedure of black matrix and chock insulator matter, simplify the processing procedure of colored filter 20, greatly reduce Production Time and the production cost of colored filter 20.
In the embodiment of Fig. 5 a to Fig. 5 c, when in step 2, exposure makes the second color filter film 23, this same Zhang Guang is covered on the width moving a sub-pixel on the basis, reference position of step one to the left, when exposure makes three color filter films 24 in step 3, this same Zhang Guang is covered on the width moving a sub-pixel on the basis, reference position of step one to the right. Understandably, can also select to be covered on by this same Zhang Guang in step 2 the width moving a sub-pixel on the basis, reference position of step one to the right, and in step 3, this same Zhang Guang is covered on the width moving a sub-pixel on the basis, reference position of step one to the left, equally possible realize the purpose of the present invention.
Please join Fig. 5 a to Fig. 5 c, at the non-display area 20b of colored filter 20, by the overlap of the first periphery colour cell 22b, the second periphery colour cell 23b and the three periphery colour cell 24b, be also formed with black matrix BM and chock insulator matter PS. Specifically, at non-display area 20b, it is formed simultaneously with black matrix and chock insulator matter by color blocking overlap, the region formation black matrix that two of which color blocking is overlapping, the region formation chock insulator matter that three kinds of color blockings are overlapping, prevents light leak thus playing at non-display area 20b and supports the effect that liquid crystal cell is thick.
On panel designs, the highly preferred chock insulator matter height not higher than viewing area 20a of chock insulator matter of peripheral non-display area 20b, otherwise panel easily occurs that under ambient pressure some displays are bad. in the present embodiment, preferably, for exposing these three kinds of filter coatings 22 of making, 23, the light shield of 24 selects halftone mask (half-tonemask), this light covers on the position corresponding to non-display area 20b and arranges semi-transmissive film, the exposure energy of the color blocking to non-display area 20b is reduced by this semi-transmissive film, namely these three kinds of filter coatings 22 are being made, 23, when 24, color blocking on non-display area 20b is taked half-exposure by this semi-transmissive film, so after exposure imaging, at the non-display area 20b color blocking thickness stayed less than the color blocking thickness stayed at viewing area 20a, namely utilize halftone mask that peripheral non-display area 20b is taked half-exposure mode, realize the chock insulator matter of non-display area 20b and viewing area 20a by controlling the intensity of light transmission capacity and there is certain difference in height (the chock insulator matter height making the chock insulator matter height of non-display area 20b lower than viewing area 20a), to avoid product to occur, display is bad.
Fig. 7 a to Fig. 7 c is the manufacturing process part plan schematic diagram of the non-display area of the colored filter of second embodiment of the invention. please join Fig. 7 a, the first color filter film 22 (position of now light shield exposure is reference position) formed is made for utilizing light to cover on exposure on underlay substrate, figure only illustrates this first color filter film 22 structure corresponding to the first periphery colour cell 22b of non-display area 20b, it is that monoblock color blocking is different from the first periphery colour cell 22b corresponding to non-display area 20b shown in Fig. 5 a, in second embodiment, the first periphery colour cell 22b corresponding to non-display area 20b is pattern structure and includes multiple first periphery colour cell pattern 22b ', the width of each first periphery colour cell pattern 22b ' is equivalent to the width of two sub-pixels, the width of two the first periphery spaced sub-pixels of colour cell pattern 22b ' adjacent in every a line. please join Fig. 7 b, for this same Zhang Guang is covered on the width moving a sub-pixel on the basis of reference position towards left side, on underlay substrate, exposure makes the second periphery colour cell 23b formed and is superimposed on the structure of the first periphery colour cell 22b, and multiple first periphery colour cell pattern 22b ' of multiple second periphery colour cell pattern 23b ' and the first periphery colour cell 22b of the second periphery colour cell 23b have lap. please join Fig. 7 c, for this same Zhang Guang is covered on the width moving a sub-pixel on the basis of reference position towards right side, on underlay substrate, exposure makes the 3rd periphery colour cell 24b formed and is superimposed on the first periphery colour cell 22b and the structure of the second periphery colour cell 23b, and multiple second periphery colour cell pattern 23b ' of multiple first periphery colour cell pattern 22b ' and the second periphery colour cell 23b of multiple 3rd periphery colour cell pattern 24b ' and the first periphery colour cell 22b of the 3rd periphery colour cell 24b have lap.So complete after first color filter film the 22, second color filter film 23 and the 3rd color filter film 24 on underlay substrate, these three filter coating 22,23,24 only there will be maximum two kinds of color blockings overlap at the non-display area 20b of colored filter 20 and forms black matrix BM, do not have the situation (namely not havinging chock insulator matter PS at non-display area 20b) that three kinds of color blockings are overlapping, and be capable of the shade function of black matrix at non-display area 20b by two kinds of color blocking overlaps. The present embodiment makes for the filter coating of viewing area 20a and is referred to the embodiment shown in Fig. 5 a to Fig. 5 c, omit at this and repeat no more.
Fig. 8 is the part plan schematic diagram of first light shield for making colored filter of the present invention, please join Fig. 8, this first light shield 30 has and makes, with exposure in Fig. 5 a, the pattern that the first color filter film 22 of obtaining is identical, or this first light shield 30 has and makes the identical pattern of the first color filter film 22 of obtaining (Fig. 8 show and makes, with exposure in Fig. 5 a, the pattern that the first color filter film 22 obtained is identical) with exposure in Fig. 7 a, but it is not limited to this. This first light shield 30 includes the first mask pattern 30a corresponding with viewing area 20a and the first frame portion 30b corresponding with non-display area 20b, first mask pattern 30a makes the viewing area 20a of this colored filter for exposing, two the first mask pattern 30a adjacent in every a line are spaced along the horizontal X of the first light shield 30, the first mask pattern 30a in neighbouring two row is staggered the width of a sub-pixel and being connected by a corner mutually along the vertical Y of the first light shield 30, and wherein horizontal X and vertical Y is mutually perpendicular to. The the first mask pattern 30a being positioned at odd-numbered line is mutually aligned on vertical Y, the the first mask pattern 30a being positioned at even number line is also mutually aligned on vertical Y, the width of a sub-pixel but the first mask pattern 30a being positioned at odd-numbered line and the first mask pattern 30a being positioned at even number line mutually stagger on vertical Y, makes the first mask pattern 30a in neighbouring two row mutually stagger on vertical Y the width of a sub-pixel and being connected by a corner. The first mask pattern 30a in neighbouring two row is respectively provided with overlap on horizontal X and vertical Y, and overlapping dimension is WBM(i.e. the width of black matrix). Assume that this first mask pattern 30a is of a size of W*L (width is W, and length is L), then W=W0+2WBM, L=L0+2WBM��
When utilizing this first light shield 30 to expose making first color filter film the 22, second color filter film 23 and three color filter films 24 on underlay substrate 21, first color filter film the 22, second color filter film 23 and the 3rd color filter film 24 all select positivity color blocking material (the color blocking material being exposed region is removed, and the color blocking material not being exposed region leaves the pattern forming filter coating). That is, positivity color blocking material is used by arranging in pairs or groups, utilize same light shield (this first light shield 30) can expose on underlay substrate 21 and make the filter coating 22,23,24 forming these three kinds of colors, and simultaneously by the black matrix BM needed for the overlapped formation of filter coating 22,23,24 of these three color and chock insulator matter PS.
This first light shield 30 can be halftone mask (half-tonemask), this first light shield 30 arranges semi-transmissive film at the first frame portion 30b (namely corresponding to the position of non-display area 20b), reduced the exposure energy of color blocking on non-display area 20b by this semi-transmissive film, namely these three kinds of filter coatings 22 are being made, 23, when 24, color blocking on non-display area 20b is taked half-exposure by this semi-transmissive film, so after exposure imaging, at the non-display area 20b color blocking thickness stayed less than the color blocking thickness stayed at viewing area 20a, make the chock insulator matter being eventually formed in peripheral non-display area 20b not higher than forming the chock insulator matter at viewing area 20a, to avoid product to occur, display is bad.
Fig. 9 is the part plan schematic diagram of second light shield for making colored filter of the present invention, please join Fig. 9, this second light shield 40 includes the second mask pattern 40a corresponding with viewing area 20a and the second frame portion 40b corresponding with non-display area 20b, second mask pattern 40a makes the viewing area 20a of this colored filter for exposing, the first mask pattern 30a in this second mask pattern 40a and Fig. 8 is complementary structure relation, and the detailed construction at this second mask pattern 40a repeats no more. When utilizing this second light shield 40 to expose making first color filter film the 22, second color filter film 23 and three color filter films 24 on underlay substrate 21, first color filter film the 22, second color filter film 23 and the 3rd color filter film 24 all select negativity color blocking material (the color blocking material not being exposed region is removed, and the color blocking material being exposed region leaves the pattern forming filter coating). That is, negativity color blocking material is used by arranging in pairs or groups, utilize same light shield (this first light shield 40) can expose on underlay substrate 21 and make the filter coating 22,23,24 forming these three kinds of colors, and simultaneously by the black matrix BM needed for the overlapped formation of filter coating 22,23,24 of these three color and chock insulator matter PS.
Colored filter that the above embodiment of the present invention provides and preparation method thereof, utilize same light shield namely to achieve on underlay substrate, make the first color filter film, the second color filter film and the 3rd color filter film, and while making the first color filter film, the second color filter film and the 3rd color filter film, by the black matrix needed for the overlapped formation of the filter coating of these three color and chock insulator matter. Formed owing to the filter coating of three kinds of colors shares same light shield manufacture, and also eliminate the light shield needed for making black matrix and chock insulator matter and processing time simultaneously, simplify the processing procedure of colored filter, greatly reduce Production Time and the production cost of colored filter.
The above, it it is only presently preferred embodiments of the present invention, not the present invention is done any pro forma restriction, although the present invention is disclosed above with preferred embodiment, but it is not limited to the present invention, any those skilled in the art, without departing within the scope of technical solution of the present invention, when the technology contents of available the disclosure above makes a little change or is modified to the Equivalent embodiments of equivalent variations, in every case it is without departing from technical solution of the present invention content, according to any simple modification that above example is made by the technical spirit of the present invention, equivalent variations and modification, all still fall within the scope of technical solution of the present invention.
Claims (10)
1. a colored filter (20), the first color filter film (22) on this underlay substrate (21) including underlay substrate (21) and formation, second color filter film (23) and the 3rd color filter film (24), this first color filter film (22) includes the first color blocking pattern (22a) of patterning, this second color filter film (23) includes the second color blocking pattern (23a) of patterning, 3rd color filter film (24) includes tertiary color resistance pattern (24a) of patterning, it is characterized in that, each color blocking pattern (22a, 23a, four side edge 24a) overlaps to form black matrix (BM) by two kinds of color blockings, each color blocking pattern (22a, 23a, four corners 24a) overlap to form chock insulator matter (PS) by three kinds of color blockings.
2. colored filter (20) as claimed in claim 1, it is characterized in that, this first color filter film (22), this second color filter film (23) is identical with the pattern of the 3rd color filter film (24), the pattern of this second color filter film (23) relative to the pattern of this first color filter film (22) along this underlay substrate (21) towards offseting to one side the width of a sub-pixel, the pattern of the 3rd color filter film (24) offsets the width of a sub-pixel relative to the pattern of this first color filter film (22) along this underlay substrate (21) towards contrary opposite side.
3. colored filter (20) as claimed in claim 2, it is characterized in that, two adjacent in every a line these the first color blockings pattern (22a) are spaced along the transverse direction (X) of this underlay substrate (21), and this first color blocking pattern (22a) in neighbouring two row is staggered the width of a sub-pixel and being connected by a corner mutually along vertical (Y) of this underlay substrate (21).
4. colored filter (20) as claimed in claim 3, it is characterized in that, this first color blocking pattern (22a) being positioned at odd-numbered line is mutually aligned on this vertical (Y), it is positioned at this first color blocking pattern (22a) of even number line to be also mutually aligned on this vertical (Y), but is positioned at this first color blocking pattern (22a) of odd-numbered line and is positioned at this first color blocking pattern (22a) of even number line and mutually staggers on this vertically (Y) width of a sub-pixel.
5. colored filter (20) as claimed in claim 4, it is characterized in that, this first color blocking pattern (22a) in neighbouring two row is respectively provided with overlap in this transverse direction (X) and this vertical (Y), and overlapping dimension is the width of this black matrix (BM).
6. colored filter (20) as claimed in claim 2, it is characterized in that, this colored filter (20) has viewing area (20a) and is positioned at the non-display area (20b) of this viewing area (20a) periphery, this first color blocking pattern (22a), this the second color blocking pattern (23a) and this tertiary color resistance pattern (24a) are corresponding to this viewing area (20a), this first color filter film (22) also includes the first periphery colour cell (22b), this second color filter film (23) also includes the second periphery colour cell (23b), 3rd color filter film (24) also includes the 3rd periphery colour cell (24b), this first periphery colour cell (22b), this second periphery colour cell (23b) and the 3rd periphery colour cell (24b) are corresponding to this non-display area (20b), this first periphery colour cell (22b), this second periphery colour cell (23b) and the 3rd periphery colour cell (24b) overlap to form black matrix (BM) or chock insulator matter (PS) at this non-display area (20b) by color blocking.
7. colored filter (20) as claimed in claim 6, it is characterized in that, this first periphery colour cell (22b) is for pattern structure and includes multiple first periphery colour cell pattern (22b '), the width of this first periphery colour cell pattern each (22b ') is equivalent to the width of two sub-pixels, the width of two adjacent in every a line these the first periphery colour cell patterns (22b ') spaced sub-pixel, this second periphery colour cell (23b) is for pattern structure and includes multiple second periphery colour cell pattern (23b '), 3rd periphery colour cell (24b) is for pattern structure and includes multiple 3rd periphery colour cell pattern (24b ').
8. the manufacture method of a colored filter, it is characterised in that this manufacture method comprises the steps:
One light shield is provided, utilize this light to cover on the upper exposure of underlay substrate (21) and make the first color filter film (22), this first color filter film (22) includes the first color blocking pattern (22a) of patterning, defines this light and covers on exposure to make residing exposure position during these the first color filter film (22) be reference position;
This same Zhang Guang is covered on the width along this underlay substrate (21) towards one sub-pixel of side shifting on the basis of said reference position, making the second color filter film (23) in the upper exposure of this underlay substrate (21), this second color filter film (23) includes the second color blocking pattern (23a) of patterning; And
This same Zhang Guang is covered on the width moving a sub-pixel on the basis of said reference position along this underlay substrate (21) towards contrary opposite side, making the 3rd color filter film (24) in the upper exposure of this underlay substrate (21), the 3rd color filter film (24) includes tertiary color resistance pattern (24a) of patterning;
Wherein, the four side edge of each color blocking pattern (22a, 23a, 24a) overlaps to form black matrix (BM) by two kinds of color blockings, and four corners of each color blocking pattern (22a, 23a, 24a) overlap to form chock insulator matter (PS) by three kinds of color blockings.
9. first light shield (30) being used for making colored filter, this colored filter includes viewing area (20a), it is characterized in that, this first light shield (30) includes the first mask pattern (30a), this first mask pattern (30a) makes the viewing area (20a) of this colored filter for exposing, two adjacent in every a line these the first mask pattern (30a) are spaced along the transverse direction (X) of this first light shield (30), this first mask pattern (30a) in neighbouring two row is staggered the width of a sub-pixel and being connected by a corner mutually along vertical (Y) of this first light shield (30), this first mask pattern (30a) being positioned at odd-numbered line is mutually aligned on this vertical (Y), this first mask pattern (30a) being positioned at even number line is also mutually aligned on this vertical (Y), the width of a sub-pixel but this first mask pattern (30a) being positioned at odd-numbered line and this first mask pattern (30a) being positioned at even number line mutually stagger on this vertical (Y), this first mask pattern (30a) in neighbouring two row is respectively provided with overlap in this transverse direction (X) and this vertical (Y) and overlapping dimension is the width of black matrix (BM).
10. second light shield (40) being used for making colored filter, this colored filter includes viewing area (20a), it is characterized in that, this second light shield (40) includes the second mask pattern (40a), this second mask pattern (40a) makes the viewing area (20a) of this colored filter for exposing, and this second mask pattern (40a) and the first mask pattern (30a) described in claim 9 are in complementary structure relation.
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Address after: 215301 No. 1, Longteng Road, Kunshan, Jiangsu Patentee after: Kunshan Longteng Au Optronics Co Address before: 215301 No. 1, Longteng Road, Kunshan, Jiangsu Patentee before: Kunshan Longteng Optronics Co., Ltd. |