CN105652506B - Colored filter and preparation method thereof and light shield for making colored filter - Google Patents
Colored filter and preparation method thereof and light shield for making colored filter Download PDFInfo
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- CN105652506B CN105652506B CN201610044770.5A CN201610044770A CN105652506B CN 105652506 B CN105652506 B CN 105652506B CN 201610044770 A CN201610044770 A CN 201610044770A CN 105652506 B CN105652506 B CN 105652506B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
Abstract
A kind of colored filter and preparation method thereof and the light shield for making colored filter, the colored filter includes underlay substrate and the first color filter film for being formed on the underlay substrate, second color filter film and third color filter film, first color filter film includes patterned first color blocking pattern, second color filter film includes patterned second color blocking pattern, the third color filter film includes patterned third color blocking pattern, the four side edge of each color blocking pattern overlaps to form black matrix by two kinds of color blockings, four corners of each color blocking pattern overlap to form spacer material by three kinds of color blockings.The filter coating of three kinds of colors shares same light shield manufacture and is formed, and pass through the black matrix and spacer material needed for the overlapped formation of the filter coating of three kinds of colors, the processing procedure for simplifying colored filter greatly reduces Production Time and the production cost of colored filter.
Description
Technical field
The present invention relates to display technology fields, more particularly to a kind of colored filter and preparation method thereof, and are used for
Make the light shield of colored filter.
Background technology
Liquid crystal display device includes opposed colored filter (Color Filter, CF) and array substrate (TFTarray)
And sandwiched liquid crystal layer (Liquid Crystal, LC) therebetween.The basic structure of existing colored filter includes glass
Glass substrate (Glass Substrate), black matrix (Black Matrix, BM), color filter film (Color Layer), electrode
The compositions such as layer (ITO), alignment film (Polyimide, PI), spacer material (Photo Spacer, PS).
Fig. 1 is the partial cutaway schematic of existing colored filter (also reference can be made to Chinese utility model patent
No. 201220102188.7), Fig. 1 please be join, the black matrix 12 of colored filter 10 is arranged on glass substrate 11, and black matrix 12 is wrapped
A plurality of cross one another shading strip 12a is included, black matrix 12 is for blocking pixel edge region.Glass substrate 11 is not by black matrix 12
The place of covering is separated to form multiple transmission region 11a by cross one another shading strip 12a.Color filter film 13 includes three kinds of face
The filter coating of color, such as red filter film R, green filter film G and blue filter film B, filter coating R, G, B of three kinds of colors are pressed
Certain arrangement mode is arranged on the transmission region 11a of glass substrate 11, colored display of the color filter film 13 for LCD.
It is provided with electrode layer or alignment film 14 on color filter film 13, spacer material 15 is provided on the electrode layer or alignment film 14, every
Underbed 15 is used to support liquid crystal cell thickness.
Existing colored filter is to make to be formed by processes such as Multiple depositions, exposure, etchings on glass substrate 11
, the general step of manufacture craft includes：
(1) one layer of opaque resin is deposited, black matrix 12 is obtained after exposure etching；
(2) RGB resin is deposited respectively, and color filter film 13 is obtained after exposure etching；
(3) depositing electrode layer or alignment film 14；And
(4) spacer material is deposited, spacer material 15 is obtained after exposure etching.
It can be seen that existing colored filter needs the complexity by black matrix 12, color filter film 13, spacer material 15
Production process.And when making color filter film 13, generally require using three different light shields (mask), for making respectively
Make the filter coating of tri- kinds of colors of R, G, B.The use of complicated processing procedure and multiple light shields increases the Production Time of colored filter
And production cost.
As above-mentioned, existing color filter producing process forms black matrix 12 first on glass substrate 11, black matrix 12
Basic function is shading, and effect is to prevent adjacent R, G, B pixel colour mixture.Industry is incited somebody to action it is proposed that when making color filter film 13
Two kinds of color blocking overlapping materials can save the processing procedure for making black matrix 12 in this way to realize the idea of black matrix shading, reduce one
It makes the light shield of black matrix 12 and makes the processing time of black matrix 12, but the making of color filter film 13 and spacer material 15
Multiple light shields are still needed to complete, production cost is still very high, and making technology is to be improved.
Invention content
The purpose of the present invention is to provide a kind of colored filters and preparation method thereof, and for making colored filter
Light shield reduce Production Time and the production cost of colored filter to simplify the processing procedure of colored filter.
The present invention provides a kind of colored filter, including underlay substrate is filtered with the first colour being formed on the underlay substrate
Light film, the second color filter film and third color filter film, first color filter film include patterned first color blocking pattern,
Second color filter film includes patterned second color blocking pattern, which includes patterned third color blocking
The four side edge of pattern, each color blocking pattern overlaps to form black matrix, four corners of each color blocking pattern by two kinds of color blockings
Spacer material is overlapped to form by three kinds of color blockings.
Further, the pattern phase of first color filter film, second color filter film and the third color filter film
Together, the pattern of second color filter film offsets to one side relative to the pattern of first color filter film along underlay substrate court
The width of one sub-pixel, the pattern of the third color filter film relative to first color filter film pattern along the substrate base
Plate deviates the width of a sub-pixel towards the opposite other side.
Further, two the first color blocking patterns adjacent in every a line are along the laterally mutual of the underlay substrate
Every, the first color blocking pattern in neighbouring two row along the vertical width for mutually staggering a sub-pixel of the underlay substrate
And it is connected by a corner.
Further, it is mutually aligned on this is vertical positioned at the first color blocking pattern of odd-numbered line, is located at being somebody's turn to do for even number line
First color blocking pattern is also mutually aligned on this is vertical, but being somebody's turn to do positioned at the first color blocking pattern of odd-numbered line and positioned at even number line
First color blocking pattern mutually staggers the width of a sub-pixel on this is vertical.
Further, the first color blocking pattern in neighbouring two row the transverse direction and this it is vertical on all have overlapping,
And overlapping dimension is the width of the black matrix.
Further, which has viewing area and the non-display area positioned at the viewing area periphery, first color
Hinder pattern, the second color blocking pattern and the third color blocking pattern correspond to the viewing area, which further includes the
One periphery colour cell, second color filter film further include the second periphery colour cell, which further includes third periphery
Colour cell, the first periphery colour cell, the second periphery colour cell and the third periphery colour cell correspond to the non-display area, first periphery
Colour cell, the second periphery colour cell and the third periphery colour cell overlap to form black matrix or dottle pin in the non-display area by color blocking
Object.
Further, which is pattern structure and includes multiple first periphery colour cell patterns, each should
The width of first periphery colour cell pattern is equivalent to the width of two sub-pixels, two adjacent the first periphery colour cells in every a line
The width of the spaced sub-pixel of pattern, the second periphery colour cell are pattern structure and include multiple second peripheries colour cell
Pattern, the third periphery colour cell are pattern structure and include multiple third periphery colour cell patterns.
The present invention also provides a kind of production method of colored filter, which includes the following steps：
One light shield is provided, is exposed on underlay substrate using the light shield and makes the first color filter film, first colour
Filter coating includes patterned first color blocking pattern, defines the light shield exposure residing when exposure makes first color filter film
Position on the basis of optical position；
The same light shield is moved into a sub- picture along the underlay substrate on the basis of said reference position towards side
The width of element, on the underlay substrate exposure make the second color filter film, which includes patterned the
Two color blocking patterns；And
The same light shield is moved along the underlay substrate towards the opposite other side on the basis of said reference position
The width of one sub-pixel, the exposure making third color filter film on the underlay substrate, which includes figure
The third color blocking pattern of case；
Wherein, the four side edge of each color blocking pattern overlaps to form black matrix by two kinds of color blockings, each color blocking pattern
Four corners overlap to form spacer material by three kinds of color blockings.
The present invention also provides a kind of the first light shields for making colored filter, which includes viewing area,
First light shield includes the first mask pattern, which is used to expose the viewing area for making the colored filter, often
Adjacent two first mask patterns are spaced along the transverse direction of first light shield in a line, being somebody's turn to do in neighbouring two row
The vertical width that mutually staggers a sub-pixel of first mask pattern along first light shield and connected, the position by a corner
It is mutually aligned on this is vertical in first mask pattern of odd-numbered line, first mask pattern for being located at even number line is vertical at this
On be also mutually aligned, but first mask pattern positioned at odd-numbered line and first mask pattern positioned at even number line are vertical at this
On mutually stagger the width of a sub-pixel, first mask pattern in neighbouring two row this laterally and this is vertical equal
With overlapping and overlapping dimension be black matrix width.
The present invention also provides a kind of the second light shields for making colored filter, which includes viewing area,
Second light shield includes the second mask pattern, which is used to expose the viewing area for making the colored filter, should
Second mask pattern is in complementary structure relationship with the first above-mentioned mask pattern.
Colored filter provided by the invention and preparation method thereof is realized on underlay substrate using same light shield
The first color filter film, the second color filter film and third color filter film are made, and is making the first color filter film, second
While color filter film and third color filter film, pass through the black square needed for the overlapped formation of the filter coating of these three colors
Battle array and spacer material.It is formed since the filter coating of three kinds of colors shares same light shield manufacture, and also eliminates make black square simultaneously
Light shield and processing time needed for battle array and spacer material, simplify the processing procedure of colored filter, greatly reduce colored filter
Production Time and production cost.
Description of the drawings
Fig. 1 is the partial cutaway schematic of existing colored filter.
Fig. 2 is the partial schematic plan view of the colored filter of the embodiment of the present invention.
Fig. 3 is in Fig. 2 along the diagrammatic cross-section of III-III lines.
Fig. 4 is in Fig. 2 along the diagrammatic cross-section of IV-IV lines.
Fig. 5 a to Fig. 5 c are the manufacturing process partial schematic plan view of the colored filter of first embodiment of the invention.
Fig. 6 is the enlarged diagram of the parts VI in Fig. 5 a.
Fig. 7 a to Fig. 7 c are the manufacturing process part plan of the non-display area of the colored filter of second embodiment of the invention
Schematic diagram.
Fig. 8 is the partial schematic plan view of the first light shield for making colored filter of the present invention.
Fig. 9 is the partial schematic plan view of the second light shield for making colored filter of the present invention.
Specific implementation mode
It is of the invention to reach the technical approach and effect that predetermined goal of the invention is taken further to illustrate, below in conjunction with
Specific implementation mode, structure, feature and its effect of the present invention is described in detail as after in accompanying drawings and embodiments.
Fig. 2 is the partial schematic plan view of the colored filter of the embodiment of the present invention, and Fig. 3 is in Fig. 2 along III-III lines
Diagrammatic cross-section, Fig. 4 are in Fig. 2 along the diagrammatic cross-section of IV-IV lines.It please join Fig. 2 to Fig. 4, the colored filter of the embodiment of the present invention
Mating plate 20 includes underlay substrate 21 and the first color filter film 22,23 and of the second color filter film that are formed on underlay substrate 21
Third color filter film 24.First color filter film 22 is, for example, green filter film G, and the second color filter film 23 is, for example, red
Filter coating R, third color filter film 24 are, for example, blue filter film B, and but not limited to this.In the present invention, a light is shared
Cover, which made on underlay substrate 21 respectively after exposing three times, forms the first color filter film 22,23 and of the second color filter film
Third color filter film 24, and making the first color filter film 22, the second color filter film 23 and third color filter film 24
While, required black matrix BM and spacer material PS is formed by the filter coating 22,23,24 of these three colors is overlapped.
Specifically, the first color filter film 22 includes patterned first color blocking pattern 22a, and the second color filter film 23 includes patterning
The second color blocking pattern 23a, third color filter film 24 include patterned third color blocking pattern 24a, each color blocking pattern
The edge of four side up and down (at the C of such as Fig. 2) of 22a, 23a, 24a overlap to form black matrix BM by two kinds of color blockings, by setting
The width for counting overlapping region, the shade function of black matrix can be realized in the color blocking overlay region of panel data line and scanning line direction；
Four corners (at the D of such as Fig. 2) of each color blocking pattern 22a, 23a, 24a overlap to form spacer material PS by three kinds of color blockings, lead to
The height of design overlapping region is crossed, the overlay region of three kinds of color blockings is in the liquid that can realize spacer material perpendicular to the direction of underlay substrate 21
Brilliant box thickness support function.It is preferable to use narrow bandwidth color blocking materials for the filter coating 22,23,24 of these three colors, due to narrow bandwidth color
The transmitted spectrum of resistance material is non-overlapping or overlapping area is small, and good shading concentration can be formed by color blocking overlapping.
Colored filter 20 provided by the invention, since the filter coating 22,23,24 of three kinds of colors shares same light shield
Make formed, and make three kinds of colors filter coating 22,23,24 while, by the filter coating 22 of three kinds of colors,
23, the black matrix and spacer material needed for 24 overlapped formation eliminates the light shield and system made needed for black matrix and spacer material
The journey time realizes the filter coating 22,23,24 of three kinds of colors and the processing procedure of black matrix and spacer material by a light shield,
The processing procedure for simplifying colored filter 20 greatly reduces Production Time and the production cost of colored filter 20.
Fig. 5 a to Fig. 5 c are the manufacturing process partial schematic plan view of the colored filter of first embodiment of the invention, the system
Include as method：
Step 1：As shown in Figure 5 a, a light shield is provided, exposes the first coloured silk of making on underlay substrate 21 using the light shield
Color filter coating 22.The for example, transparent glass substrate of underlay substrate 21.First color filter film 22 is colored with the first, and first
Color filter film 22 is, for example, green filter film G, and but not limited to this.Exposure makes the first colorized optical filtering on underlay substrate 21
When film 22, one layer is first coated on underlay substrate 21 with the first the first colored color blocking material (such as one layer of green of coating
Color blocking material), then the first color blocking material is exposed using the light shield (define the light shield exposure make this first
Position on the basis of residing exposure position when color filter film 22), develop after exposure to remove unwanted first color
Material is hindered, the pattern of remaining the first obtained color blocking material is first color filter film 22, on underlay substrate 21
Making forms patterned first color filter film 22.
Colored filter 20 has the viewing area 20a and non-display area 20b positioned at the viewing area peripheries 20a.First colored filter
Light film 22 includes the first periphery colour cell corresponding to the first color blocking pattern 22a of viewing area 20a and corresponding to non-display area 20b
The first color blocking pattern 22a of 22b, the first color filter film 22 are in certain regularly arranged in the 20a of viewing area.In the present embodiment,
Two adjacent the first color blocking pattern 22a are spaced along the lateral X of underlay substrate 21 in per a line, in neighbouring two row
The first color blocking pattern 22a along the vertical Y of underlay substrate 21 mutually stagger the width of a sub-pixel and by a corner
It is connected, wherein transverse direction X and vertical Y is mutually perpendicular to.In more detail, be located at odd-numbered line the first color blocking pattern 22a on vertical Y phase
Mutually alignment, the first color blocking pattern 22a positioned at even number line are also mutually aligned on vertical Y, but positioned at the first color blocking of odd-numbered line
Pattern 22a and the width for mutually staggering a sub-pixel on vertical Y positioned at the first color blocking pattern 22a of even number line make up and down
The first color blocking pattern 22a in adjacent rows mutually staggers the width of a sub-pixel on vertical Y and by a corner phase
Even.
It please join Fig. 2, only the local of single layer color blocking forms transmission region 21a, each transmission region 21a on glass substrate 21
Width be W0, each transmission region 21a length is L0, the width of black matrix BM is WBM.Fig. 6 is the amplification of the parts VI in Fig. 5 a
Schematic diagram please join Fig. 6, by taking three connected up and down the first color blocking pattern 22a as an example, it is illustrated that the first color blocking pattern 22a of lower section
The upper right corner be connected with the lower left corner of the first intermediate color blocking pattern 22a, the upper left corner of the first intermediate color blocking pattern 22a with it is upper
The lower right corner of first color blocking pattern 22a of side is connected.The first color blocking pattern 22a in neighbouring two row is in lateral X and vertical Y
On all have overlapping, and overlapping dimension is WBM(i.e. the width of black matrix).Assuming that the size of the first color blocking pattern 22a is W1*
L1(width W1, length L1), then W1=W0+2WBM, L1=L0+2WBM。
Step 2：As shown in Figure 5 b, by the same light shield on the basis of said reference position along 21 court of underlay substrate
To the width of side (such as towards a left side) mobile sub-pixel, on underlay substrate 21 exposure make the second color filter film
23.Second color filter film 23 has second of colored, the second color filter film 23 for example, red filter film R, but not with this
It is limited.When exposure makes the second color filter film 23 on underlay substrate 21, first on the first color filter film 22 and not by
One layer of coating (such as is applied with second the second colored color blocking material on the underlay substrate 21 of first color filter film 22 covering
Cover one layer of red color blocking material), then the second color blocking material is exposed using the light shield, the light shield expose this
The reference position that exposure position when two color blocking materials makes the first color filter film 22 relative to exposure moves one to the left
(width of a sub-pixel is equal to W to the width of a sub-pixel0+WBM), develop after exposure to remove unwanted second
The pattern of color blocking material, remaining the second obtained color blocking material is second color filter film 23, in underlay substrate 21
Upper making forms patterned second color filter film 23.
When making the second color filter film 23, due to using light shield identical with the first color filter film 22 is made, because
The pattern of this second color filter film 23 is identical as the pattern of the first color filter film 22, only the figure of the second color filter film 23
Case deviates the width of a sub-pixel relative to the pattern of the first color filter film 22 to the left.Second color filter film 23 includes
The second color blocking pattern 23a corresponding to viewing area 20a and the second periphery colour cell 23b corresponding to non-display area 20b, due to the light
Cover on the benchmark that exposure position when exposure makes the second color filter film 23 makes the first color filter film 22 relative to exposure
Position moves the width of a sub-pixel to the left, and is exposed in the color blocking pattern made by the light shield, neighbouring two
Color blocking pattern in row mutually staggers the width of a sub-pixel on vertical Y and all has overlapping ruler on lateral X and vertical Y
Very little WBM(as shown in Figure 6), thus the second color blocking pattern 23a and the first color blocking pattern 22a on lateral X and vertical Y there are
Imbricate, while the second periphery colour cell 23b and the first periphery colour cell 22b is there is also there is lap, it is specific as shown in Figure 5 b.
Step 3：As shown in Figure 5 c, by the same light shield on the basis of said reference position along 21 court of underlay substrate
To the width of the opposite other side (such as towards a right side) mobile sub-pixel, on underlay substrate 21 exposure it is color to make third
Color filter coating 24.It is, for example, blue filter film B that third color filter film 24, which has the third colour, third color filter film 24,
But not limited to this.When exposure makes third color filter film 24 on underlay substrate 21, first in the first color filter film 22, the
On the underlay substrate 21 not covered on two color filter films 23 and by the first color filter film 22 and the second color filter film 23
One layer of coating then utilizes the light with the third colored third color blocking material (such as color blocking material of coating blue layer)
Cover is exposed the third color blocking material, and exposure position of the light shield when exposing the third color blocking material is made relative to exposure
The reference position for making the first color filter film 22 moves the width of a sub-pixel (width of a sub-pixel is equal to the right
W0+WBM), develop after exposure to remove unwanted third color blocking material, the figure of remaining obtained third color blocking material
Case is the third color filter film 24, and patterned third color filter film is formd to be made on underlay substrate 21
24。
When making third color filter film 24, due to using and making the first color filter film 22 and the second colorized optical filtering
23 identical light shield of film, therefore the pattern of third color filter film 24 and the first color filter film 22, the second color filter film 23
Pattern it is identical, only the pattern of third color filter film 24 deviates one to the right relative to the pattern of the first color filter film 22
The width of a sub-pixel.Third color filter film 24 includes corresponding to the third color blocking pattern 24a of viewing area 20a and corresponding to non-
The third periphery colour cell 24b of viewing area 20b, due to exposure position phase of the light shield when exposure makes third color filter film 24
The reference position that the first color filter film 22 is made for exposure moves the width of a sub-pixel to the right, and passes through the light
In the color blocking pattern that cover exposure makes, the color blocking pattern in neighbouring two row all has overlapping dimension on lateral X and vertical Y
WBM(as shown in Figure 6), therefore third color blocking pattern 24a and the first color blocking pattern 22a, the second color blocking pattern 23a in lateral X and are erected
To on Y there are imbricate, while third periphery colour cell 24b and the first periphery colour cell 22b, the second periphery colour cell 23b
It is specific as shown in Figure 5 c there are lap.
It please join Fig. 2 to Fig. 5 c, after by above-mentioned steps one to step 3, that is, realize a shared light shield and carry out three
It is made on underlay substrate 21 after secondary exposure and forms the first color filter film 22, the second color filter film 23 and third colorized optical filtering
Film 24, and while making the first color filter film 22, the second color filter film 23 and third color filter film 24, pass through this
Black matrix BM needed for the filter coating 22 of three kinds of colors, 23,24 overlapped formation and spacer material PS.Specifically, each color blocking
The edge of four side up and down (at the C of such as Fig. 2) of pattern 22a, 23a, 24a overlap to form required black matrix by two kinds of color blockings
BM, to play the role of preventing light leakage；Four corners of each color blocking pattern 22a, 23a, 24a pass through three kinds (at the D of such as Fig. 2)
Color blocking overlaps to form required spacer material PS, to play the effect of support liquid crystal cell thickness.Due to the filter coating 22 of three kinds of colors,
23,24 share same light shield manufactures formed, and make three kinds of colors filter coating 22,23,24 while, by this three
Black matrix needed for the filter coating 22 of kind of color, 23,24 overlapped formation and spacer material, eliminate and make black matrix and dottle pin
Light shield needed for object and processing time realize the filter coating 22,23,24 and black matrix of three kinds of colors by a light shield
With the processing procedure of spacer material, the processing procedure of colored filter 20 is simplified, greatly reduces Production Time and the life of colored filter 20
Produce cost.
In the embodiment of Fig. 5 a to Fig. 5 c, when exposure makes the second color filter film 23 in step 2, by this same
Light shield moves the width of a sub-pixel to the left on the basis of the reference position of step 1, the exposure making third in step 3
When color filter film 24, which is moved to the width of a sub-pixel to the right on the basis of the reference position of step 1
Degree.It is to be appreciated that selection in step 2 by the same light shield on the basis of reference position of step 1 to the right
Side move a sub-pixel width, and in step 3 by the same light shield on the basis of reference position of step 1 to the left
The width of a sub-pixel is moved in side, and the purpose of the present invention equally may be implemented.
It please join Fig. 5 a to Fig. 5 c, in the non-display area 20b of colored filter 20, pass through the first periphery colour cell 22b, second week
The overlapping of side colour cell 23b and third periphery colour cell 24b, are also formed with black matrix BM and spacer material PS.Specifically, in non-display area
20b is formed simultaneously with black matrix and spacer material by color blocking overlapping, the region formation black matrix that two of which color blocking is overlapped, and three
The region of kind color blocking overlapping forms spacer material, to play the effect for preventing light leakage and support liquid crystal cell thickness in non-display area 20b.
In panel design, the highly preferred spacer material not higher than viewing area 20a of spacer material of peripheral non-display area 20b is high
Degree, otherwise it is bad easily to there are some displays under ambient pressure for panel.In the present embodiment, it is preferable that for expose make this three
The light shield of kind filter coating 22,23,24 selects halftone mask (half-tone mask), and the light shield is corresponding to non-display area
Semi-transmissive film is arranged in the position of 20b, reduces the exposure energy to the color blocking of non-display area 20b by the semi-transmissive film, that is, is making
When making three kinds of filter coatings 22,23,24, half-exposure is taken by the semi-transmissive film to the color blocking on non-display area 20b, is existed in this way
After exposure imaging, the color blocking thickness left in viewing area 20a is less than in the color blocking thickness that non-display area 20b leaves, that is, utilizes half
Halftone mask takes half-exposure mode to peripheral non-display area 20b, by control light transmission capacity intensity realize non-display area 20b with
The spacer material of viewing area 20a have certain difference in height (make the spacer material height of non-display area 20b less than viewing area 20a every
Underbed height), it is bad to there is display to avoid product.
Fig. 7 a to Fig. 7 c are the manufacturing process part plan of the non-display area of the colored filter of second embodiment of the invention
Schematic diagram.It please join Fig. 7 a, to expose the 22 (light shield at this time of the first color filter film for making and being formed on underlay substrate using light shield
Position on the basis of the position of exposure), only show that first color filter film 22 corresponds to the first periphery of non-display area 20b in figure
The structure of colour cell 22b is that monoblock color blocking is different from the first periphery colour cell 22b of non-display area 20b is corresponded to shown in Fig. 5 a, the
It is pattern structure corresponding to the first periphery colour cell 22b of non-display area 20b in two embodiments and includes multiple first peripheries color
The width of group pattern 22b ', each first periphery colour cell pattern 22b ' are equivalent to the width of two sub-pixels, adjacent in every a line
Two the first spaced sub-pixels of periphery colour cell pattern 22b ' width.It please join Fig. 7 b, for by the same light shield
The width for moving a sub-pixel towards left side on the basis of reference position, exposure making is formed on underlay substrate second
Periphery colour cell 23b is superimposed on the structure of the first periphery colour cell 22b, multiple second periphery colour cell patterns of the second periphery colour cell 23b
Multiple first periphery colour cell pattern 22b ' of 23b ' and the first periphery colour cell 22b have lap.It please join Fig. 7 c, be that this is same
One light shield moves the width of a sub-pixel on the basis of reference position towards right side, the exposure making shape on underlay substrate
At third periphery colour cell 24b be superimposed on the structure of the first periphery colour cell 22b and the second periphery colour cell 23b, third periphery colour cell
Multiple first periphery colour cell pattern 22b ' of the multiple third periphery colour cell pattern 24b ' and the first periphery colour cell 22b of 24b and
Multiple second periphery colour cell pattern 23b ' of two periphery colour cell 23b have lap.It completes on underlay substrate in this way
After first color filter film 22, the second color filter film 23 and third color filter film 24, these three filter coatings 22,23,24
It only will appear most two kinds of color blockings overlappings in the non-display area 20b of colored filter 20 and form black matrix BM, be not in three
The case where kind color blocking overlapping (being not in spacer material PS in non-display area 20b), and pass through two kinds of color blockings in non-display area 20b
Overlapping can realize the shade function of black matrix.Optical filtering film production in the present embodiment for viewing area 20a is referred to
Embodiment shown in Fig. 5 a to Fig. 5 c is omitted repeat no more herein.
Fig. 8 is the partial schematic plan view of the first light shield for making colored filter of the present invention, please join Fig. 8, should
First light shield 30 has pattern identical with prepared first color filter film 22 is exposed in Fig. 5 a or first light shield
30 have pattern identical with prepared first color filter film 22 is exposed in Fig. 7 a, and (Fig. 8 is shown to expose with Fig. 5 a
22 identical pattern of prepared first color filter film), but not limited to this.First light shield 30 includes and viewing area 20a
Corresponding first mask pattern 30a and first frame portion 30b corresponding with non-display area 20b, the first mask pattern 30a are used for
Exposure makes the viewing area 20a of the colored filter, and often two the first mask pattern 30a adjacent in a line are along the first light shield
30 lateral X is spaced, and the first mask pattern 30a in neighbouring two row is mutually wrong along the vertical Y of the first light shield 30
It opens the width of a sub-pixel and is connected by a corner, wherein transverse direction X and vertical Y is mutually perpendicular to.Positioned at the of odd-numbered line
One mask pattern 30a is mutually aligned on vertical Y, and the first mask pattern 30a for being located at even number line is also mutually right on vertical Y
Together, but the first mask pattern 30a positioned at odd-numbered line and the first mask pattern 30a positioned at even number line are mutually wrong on vertical Y
The width for opening a sub-pixel makes the first mask pattern 30a in neighbouring two row mutually stagger a sub- picture on vertical Y
Element width and by a corner be connected.The first mask pattern 30a in neighbouring two row is equal on lateral X and vertical Y
With overlapping, and overlapping dimension is WBM(i.e. the width of black matrix).Assuming that the size of first mask pattern 30a is W*L (wide
Degree is W, length L), then W=W0+2WBM, L=L0+2WBM。
It is exposed on underlay substrate 21 using first light shield 30 and makes the first color filter film 22, the second color filter film
23 and when third color filter film 24, the first color filter film 22, the second color filter film 23 and third color filter film 24 are equal
Selecting positivity color blocking material, (the color blocking material for being exposed region is removed, and the color blocking material for not being exposed region leaves to form filter
The pattern of light film).It also, can be using same light shield (first light shield 30) that is, using positivity color blocking material by collocation
Exposure makes the filter coating 22,23,24 for forming three kinds of colors on underlay substrate 21, and passes through the optical filtering of these three colors simultaneously
Black matrix BM needed for film 22,23,24 overlapped formation and spacer material PS.
First light shield 30 can be halftone mask (half-tone mask), and first light shield 30 is in the first frame portion
Divide 30b (position for corresponding to non-display area 20b) setting semi-transmissive film, is reduced to non-display area 20b by the semi-transmissive film
The exposure energy of upper color blocking, i.e., when making three kinds of filter coatings 22,23,24, to the color blocking on non-display area 20b by this half
Transmission film takes half-exposure, in this way after exposure imaging, is less than in viewing area 20a in the color blocking thickness that non-display area 20b leaves
The color blocking thickness left makes the spacer material for being eventually formed in peripheral non-display area 20b be not higher than the dottle pin for being formed in viewing area 20a
It is bad to there is display to avoid product for object.
Fig. 9 is the partial schematic plan view of the second light shield for making colored filter of the present invention, please join Fig. 9, should
Second light shield 40 includes and the corresponding second mask pattern 40a of viewing area 20a and the second frame portion corresponding with non-display area 20b
Point 40b, the second mask pattern 40a are used to expose the viewing area 20a for making the colored filter, the second mask pattern 40a and
The first mask pattern 30a in Fig. 8 is in complementary structure relationship, and the detailed construction of the second mask pattern 40a repeats no more herein.Profit
It is exposed on underlay substrate 21 with second light shield 40 and makes the first color filter film 22, the second color filter film 23 and third coloured silk
When color filter coating 24, the first color filter film 22, the second color filter film 23 and third color filter film 24 select negativity color
(the color blocking material for not being exposed region is removed resistance material, and the color blocking material for being exposed region leaves the figure to form filter coating
Case).It also, can be in underlay substrate using same light shield (first light shield 40) that is, using negativity color blocking material by collocation
Exposure, which makes, on 21 forms the filter coatings 22,23,24 of three kinds of colors, and simultaneously by the filter coating of these three colors 22,23,
Black matrix BM needed for 24 overlapped formation and spacer material PS.
The colored filter and preparation method thereof that the above embodiment of the present invention provides is realized using same light shield
The first color filter film, the second color filter film and third color filter film are made on underlay substrate, and colored making first
While filter coating, the second color filter film and third color filter film, pass through the overlapped shape of the filter coating of these three colors
At required black matrix and spacer material.It is formed since the filter coating of three kinds of colors shares same light shield manufacture, and also saved simultaneously
It has gone to make the light shield and processing time needed for black matrix and spacer material, has simplified the processing procedure of colored filter, greatly reduce
The Production Time of colored filter and production cost.
The above described is only a preferred embodiment of the present invention, be not intended to limit the present invention in any form, though
So the present invention has been disclosed as a preferred embodiment, and however, it is not intended to limit the invention, any technology people for being familiar with this profession
Member, without departing from the scope of the present invention, when the technology contents using the disclosure above make a little change or modification
For the equivalent embodiment of equivalent variations, as long as be without departing from technical solution of the present invention content, it is right according to the technical essence of the invention
Any simple modification, equivalent change and modification made by above example, in the range of still falling within technical solution of the present invention.
Claims (10)
1. a kind of colored filter (20), including underlay substrate (21) and the first colored filter for being formed on the underlay substrate (21)
Light film (22), the second color filter film (23) and third color filter film (24), which includes pattern
The the first color blocking pattern (22a) changed, which includes patterned second color blocking pattern (23a), this
Three color filter films (24) include patterned third color blocking pattern (24a), which is characterized in that each color blocking pattern (22a,
23a, 24a) four side edge overlap to form black matrix (BM) by two kinds of color blockings, each color blocking pattern (22a, 23a, 24a)
Four corners overlap to form spacer material (PS) by three kinds of color blockings.
2. colored filter (20) as described in claim 1, which is characterized in that first color filter film (22), this second
Color filter film (23) is identical with the pattern of the third color filter film (24), and the pattern of second color filter film (23) is opposite
In first color filter film (22) pattern along the underlay substrate (21) towards the width of a sub-pixel of offseting to one side, this
The pattern of three color filter films (24) relative to first color filter film (22) pattern along the underlay substrate (21) towards phase
The anti-other side deviates the width of a sub-pixel.
3. colored filter (20) as claimed in claim 2, which is characterized in that two adjacent first color blockings in per a line
Pattern (22a) is spaced along the transverse direction (X) of the underlay substrate (21), the first color blocking pattern in neighbouring two row
(22a) mutually staggers the width of a sub-pixel along vertical (Y) of the underlay substrate (21) and is connected by a corner.
4. colored filter (20) as claimed in claim 3, which is characterized in that be located at the first color blocking pattern of odd-numbered line
(22a) is mutually aligned on vertical (Y), and the first color blocking pattern (22a) for being located at even number line is also mutual on vertical (Y)
Alignment, but the first color blocking pattern (22a) positioned at odd-numbered line and the first color blocking pattern (22a) positioned at even number line are perpendicular at this
The width of a sub-pixel is mutually staggered on (Y).
5. colored filter (20) as claimed in claim 4, which is characterized in that the first color blocking figure in neighbouring two row
Case (22a) all has overlapping in the transverse direction (X) and vertical (Y), and overlapping dimension is the width of the black matrix (BM).
6. colored filter (20) as claimed in claim 2, which is characterized in that the colored filter (20) has viewing area
(20a) and the non-display area (20b) for being located at the periphery viewing area (20a), the first color blocking pattern (22a), the second color blocking figure
Case (23a) and the third color blocking pattern (24a) correspond to the viewing area (20a), which further includes the
One periphery colour cell (22b), second color filter film (23) further include the second periphery colour cell (23b), the third color filter film
(24) further include third periphery colour cell (24b), the first periphery colour cell (22b), the second periphery colour cell (23b) and third week
Side colour cell (24b) correspond to the non-display area (20b), the first periphery colour cell (22b), the second periphery colour cell (23b) and this
Third periphery colour cell (24b) overlaps to form black matrix (BM) or spacer material (PS) in the non-display area (20b) by color blocking.
7. colored filter (20) as claimed in claim 6, which is characterized in that the first periphery colour cell (22b) is patterning
The width of structure and include multiple first periphery colour cell patterns (22b '), each first periphery colour cell pattern (22b ') is equivalent to
The width of two sub-pixels, per adjacent two spaced sub-pixels in first periphery colour cell pattern (22b ') in a line
Width, which is pattern structure and include multiple second periphery colour cell patterns (23b '), the third
Periphery colour cell (24b) is pattern structure and includes multiple third periphery colour cell patterns (24b ').
8. a kind of production method of colored filter, which is characterized in that the production method includes the following steps：
One light shield is provided, is exposed on underlay substrate (21) using the light shield and makes the first color filter film (22), this first
Color filter film (22) includes patterned first color blocking pattern (22a), defines the light shield and makes the first colored filter in exposure
Position on the basis of residing exposure position when light film (22)；
The same light shield is moved into a sub- picture along the underlay substrate (21) on the basis of said reference position towards side
The width of element, exposure the second color filter film of making (23) on the underlay substrate (21), second color filter film (23) packet
Include patterned second color blocking pattern (23a)；And
The same light shield is moved along the underlay substrate (21) towards the opposite other side on the basis of said reference position
The width of one sub-pixel, exposure making third color filter film (24), the third colorized optical filtering on the underlay substrate (21)
Film (24) includes patterned third color blocking pattern (24a)；
Wherein, the four side edge of each color blocking pattern (22a, 23a, 24a) overlaps to form black matrix (BM) by two kinds of color blockings, often
Four corners of a color blocking pattern (22a, 23a, 24a) overlap to form spacer material (PS) by three kinds of color blockings.
9. a kind of the first light shield (30) for making colored filter, which includes viewing area (20a), feature
It is, which includes the first mask pattern (30a), which makes the coloured silk for exposing
The viewing area (20a) of colo(u)r filter, often two first mask patterns (30a) adjacent in a line are along first light shield (30)
Transverse direction (X) it is spaced, first mask pattern (30a) in neighbouring two row is along the vertical of first light shield (30)
(Y) it mutually staggers the width of a sub-pixel and is connected by a corner, be located at first mask pattern (30a) of odd-numbered line
It being mutually aligned on vertical (Y), first mask pattern (30a) for being located at even number line is also mutually aligned on vertical (Y),
But first mask pattern (30a) positioned at odd-numbered line and first mask pattern (30a) positioned at even number line are at vertical (Y)
On mutually stagger the width of a sub-pixel, first mask pattern (30a) in neighbouring two row this laterally (X) and this
Vertically all have overlapping on (Y) and overlapping dimension be black matrix (BM) width.
10. a kind of the second light shield (40) for making colored filter, which includes viewing area (20a), special
Sign is that second light shield (40) includes the second mask pattern (40a), which is somebody's turn to do for exposing to make
The viewing area (20a) of colored filter, second mask pattern (40a) and the first mask pattern (30a) described in claim 9
In complementary structure relationship.
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| CN201610044770.5A CN105652506B (en) | 2016-01-22 | 2016-01-22 | Colored filter and preparation method thereof and light shield for making colored filter |
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| CN201610044770.5A CN105652506B (en) | 2016-01-22 | 2016-01-22 | Colored filter and preparation method thereof and light shield for making colored filter |
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| CN106154634A (en) * | 2016-09-21 | 2016-11-23 | 上海中航光电子有限公司 | Array base palte and the display floater and the display device that comprise it |
| CN106773245A (en) * | 2016-12-23 | 2017-05-31 | 深圳市华星光电技术有限公司 | Light shade assembly, liquid crystal display panel, colored optical filtering substrates and preparation method thereof |
| CN107065428B (en) * | 2016-12-29 | 2021-01-15 | Tcl华星光电技术有限公司 | Spliced unit photomask for forming color resistance layer and black matrix |
| CN106707602A (en) * | 2017-01-23 | 2017-05-24 | 厦门天马微电子有限公司 | Color film substrate and display device |
| CN107065281B (en) * | 2017-04-12 | 2020-07-03 | 深圳市华星光电技术有限公司 | Method for manufacturing color resistor |
| TWI623792B (en) * | 2017-08-07 | 2018-05-11 | 友達光電股份有限公司 | Display panel |
| CN108279524B (en) * | 2018-03-28 | 2021-02-02 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method thereof, display device and mask |
| CN111413823A (en) | 2019-01-07 | 2020-07-14 | 群创光电股份有限公司 | Electronic device |
| CN109739045A (en) * | 2019-03-13 | 2019-05-10 | 惠科股份有限公司 | The manufacturing method and display panel of display panel |
| CN110764169A (en) * | 2019-11-06 | 2020-02-07 | 京东方科技集团股份有限公司 | Lens structure, preparation method and display device |
| KR20220037042A (en) | 2020-09-16 | 2022-03-24 | 삼성디스플레이 주식회사 | Display device |
| CN112099122A (en) * | 2020-09-24 | 2020-12-18 | 深圳市奥视微科技有限公司 | Filter film and display device |
| WO2023077419A1 (en) * | 2021-11-05 | 2023-05-11 | 京东方科技集团股份有限公司 | Display panel, fabrication method therefor, and display device |
| CN114005865B (en) * | 2021-12-30 | 2022-03-22 | 北京京东方技术开发有限公司 | Display substrate, preparation method thereof and electronic device |
| CN114815373B (en) * | 2022-05-12 | 2024-01-09 | 广州华星光电半导体显示技术有限公司 | Color film substrate and display panel |
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