CN101993037A - 制造半导体集成电路的纳米晶硅结构的方法 - Google Patents
制造半导体集成电路的纳米晶硅结构的方法 Download PDFInfo
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- CN101993037A CN101993037A CN2009100567336A CN200910056733A CN101993037A CN 101993037 A CN101993037 A CN 101993037A CN 2009100567336 A CN2009100567336 A CN 2009100567336A CN 200910056733 A CN200910056733 A CN 200910056733A CN 101993037 A CN101993037 A CN 101993037A
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- amorphous silicon
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- silicon
- insulating barrier
- silicon layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02488—Insulating materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02595—Microstructure polycrystalline
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
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Abstract
Description
Claims (21)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009100567336A CN101993037A (zh) | 2009-08-20 | 2009-08-20 | 制造半导体集成电路的纳米晶硅结构的方法 |
US12/704,495 US8748260B2 (en) | 2009-08-20 | 2010-02-11 | Method for manufacturing nano-crystalline silicon material for semiconductor integrated circuits |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009100567336A CN101993037A (zh) | 2009-08-20 | 2009-08-20 | 制造半导体集成电路的纳米晶硅结构的方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101993037A true CN101993037A (zh) | 2011-03-30 |
Family
ID=43605702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009100567336A Pending CN101993037A (zh) | 2009-08-20 | 2009-08-20 | 制造半导体集成电路的纳米晶硅结构的方法 |
Country Status (2)
Country | Link |
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US (1) | US8748260B2 (zh) |
CN (1) | CN101993037A (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102024756A (zh) * | 2009-09-18 | 2011-04-20 | 中芯国际集成电路制造(上海)有限公司 | 形成用于制造集成电路器件的纳米晶态硅结构的方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6093243A (en) * | 1992-04-30 | 2000-07-25 | Kabushiki Kaisha Toshiba | Semiconductor device and its fabricating method |
US20040197943A1 (en) * | 2003-03-27 | 2004-10-07 | Tokai University Educational System | Nanosilicon light-emitting element and manufacturing method thereof |
US20060278580A1 (en) * | 2005-04-29 | 2006-12-14 | University Of Rochester | Ultrathin porous nanoscale membranes, methods of making, and uses thereof |
US20070123004A1 (en) * | 2005-09-26 | 2007-05-31 | Nissin Electric Co., Ltd. | Method and apparatus for forming a crystalline silicon thin film |
CN101399190A (zh) * | 2007-09-30 | 2009-04-01 | 中芯国际集成电路制造(上海)有限公司 | 制作硅纳米点及非易失性存储器的方法 |
US20090161438A1 (en) * | 2005-07-20 | 2009-06-25 | Micron Technology, Inc. | Methods of forming and programming floating-gate memory cells having carbon nanotubes |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6207502B1 (en) * | 1999-10-25 | 2001-03-27 | Advanced Micro Devices, Inc. | Method of using source/drain nitride for periphery field oxide and bit-line oxide |
JP2003023114A (ja) * | 2001-07-05 | 2003-01-24 | Fujitsu Ltd | 半導体集積回路装置およびその製造方法 |
US6586797B2 (en) * | 2001-08-30 | 2003-07-01 | Micron Technology, Inc. | Graded composition gate insulators to reduce tunneling barriers in flash memory devices |
DE102004031950A1 (de) * | 2003-06-26 | 2005-02-10 | Kyocera Corp. | Halbleiter/Elektroden-Kontaktstruktur und eine solche verwendendes Halbleiterbauteil |
JP2005268621A (ja) * | 2004-03-19 | 2005-09-29 | Toshiba Corp | 半導体集積回路装置 |
US7341907B2 (en) * | 2005-04-05 | 2008-03-11 | Applied Materials, Inc. | Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon |
US20080000521A1 (en) * | 2006-05-15 | 2008-01-03 | Siva Sivoththaman | Low-temperature doping processes for silicon wafer devices |
US20100032639A1 (en) * | 2008-08-07 | 2010-02-11 | Sandisk 3D Llc | Memory cell that includes a carbon-based memory element and methods of forming the same |
-
2009
- 2009-08-20 CN CN2009100567336A patent/CN101993037A/zh active Pending
-
2010
- 2010-02-11 US US12/704,495 patent/US8748260B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6093243A (en) * | 1992-04-30 | 2000-07-25 | Kabushiki Kaisha Toshiba | Semiconductor device and its fabricating method |
US20040197943A1 (en) * | 2003-03-27 | 2004-10-07 | Tokai University Educational System | Nanosilicon light-emitting element and manufacturing method thereof |
US20060278580A1 (en) * | 2005-04-29 | 2006-12-14 | University Of Rochester | Ultrathin porous nanoscale membranes, methods of making, and uses thereof |
US20090161438A1 (en) * | 2005-07-20 | 2009-06-25 | Micron Technology, Inc. | Methods of forming and programming floating-gate memory cells having carbon nanotubes |
US20070123004A1 (en) * | 2005-09-26 | 2007-05-31 | Nissin Electric Co., Ltd. | Method and apparatus for forming a crystalline silicon thin film |
CN101399190A (zh) * | 2007-09-30 | 2009-04-01 | 中芯国际集成电路制造(上海)有限公司 | 制作硅纳米点及非易失性存储器的方法 |
Also Published As
Publication number | Publication date |
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US20110045661A1 (en) | 2011-02-24 |
US8748260B2 (en) | 2014-06-10 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20121108 |
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Effective date of registration: 20121108 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Applicant after: Semiconductor Manufacturing International (Shanghai) Corporation Applicant after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Applicant before: Semiconductor Manufacturing International (Shanghai) Corporation |
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Application publication date: 20110330 |