CN101903177B - 含显影性增强化合物的辐射敏感性元件 - Google Patents

含显影性增强化合物的辐射敏感性元件 Download PDF

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Publication number
CN101903177B
CN101903177B CN200880121530.4A CN200880121530A CN101903177B CN 101903177 B CN101903177 B CN 101903177B CN 200880121530 A CN200880121530 A CN 200880121530A CN 101903177 B CN101903177 B CN 101903177B
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China
Prior art keywords
replacement
unsubstituted
imageable
base
weight
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CN200880121530.4A
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English (en)
Chinese (zh)
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CN101903177A (zh
Inventor
M·勒瓦农
M·纳卡什
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Eastman Kodak Co
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Eastman Kodak Co
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
CN200880121530.4A 2007-12-19 2008-12-05 含显影性增强化合物的辐射敏感性元件 Active CN101903177B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/959492 2007-12-19
US11/959,492 US8088549B2 (en) 2007-12-19 2007-12-19 Radiation-sensitive elements with developability-enhancing compounds
US11/959,492 2007-12-19
PCT/US2008/013405 WO2009085093A1 (en) 2007-12-19 2008-12-05 Radiation-sensitive elements with developability-enhancing compounds

Publications (2)

Publication Number Publication Date
CN101903177A CN101903177A (zh) 2010-12-01
CN101903177B true CN101903177B (zh) 2013-04-03

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Family Applications (1)

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CN200880121530.4A Active CN101903177B (zh) 2007-12-19 2008-12-05 含显影性增强化合物的辐射敏感性元件

Country Status (5)

Country Link
US (1) US8088549B2 (US08088549-20120103-C00031.png)
EP (1) EP2222469B1 (US08088549-20120103-C00031.png)
JP (1) JP5547652B2 (US08088549-20120103-C00031.png)
CN (1) CN101903177B (US08088549-20120103-C00031.png)
WO (1) WO2009085093A1 (US08088549-20120103-C00031.png)

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US8084189B2 (en) * 2008-05-22 2011-12-27 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8329383B2 (en) * 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
ES2395993T3 (es) * 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US8939080B2 (en) 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US20120129093A1 (en) * 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
US8530143B2 (en) 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US8647811B2 (en) * 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
US9229325B2 (en) 2014-02-25 2016-01-05 Eastman Kodak Company Method for making lithographic printing plates
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2944657B1 (en) 2014-05-15 2017-01-11 Agfa Graphics Nv (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
US9588429B1 (en) 2015-09-03 2017-03-07 Eastman Kodak Company Lithographic developer composition and method of use
US20190079406A1 (en) 2016-03-16 2019-03-14 Agfa Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
US11760081B2 (en) 2020-09-04 2023-09-19 Eastman Kodak Company Lithographic printing plate precursor and method of use

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US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
US6541181B1 (en) * 1999-07-30 2003-04-01 Creo Il. Ltd. Positive acting photoresist composition and imageable element
CN1727996A (zh) * 2004-02-06 2006-02-01 罗姆及海斯电子材料有限公司 改进的成像组合物和方法

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US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
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JP4384575B2 (ja) * 2004-09-27 2009-12-16 富士フイルム株式会社 平版印刷版原版
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US7175969B1 (en) * 2006-07-18 2007-02-13 Eastman Kodak Company Method of preparing negative-working radiation-sensitive elements

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US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
US6541181B1 (en) * 1999-07-30 2003-04-01 Creo Il. Ltd. Positive acting photoresist composition and imageable element
CN1727996A (zh) * 2004-02-06 2006-02-01 罗姆及海斯电子材料有限公司 改进的成像组合物和方法

Also Published As

Publication number Publication date
CN101903177A (zh) 2010-12-01
WO2009085093A1 (en) 2009-07-09
US20090162783A1 (en) 2009-06-25
US8088549B2 (en) 2012-01-03
JP5547652B2 (ja) 2014-07-16
JP2011508259A (ja) 2011-03-10
EP2222469A1 (en) 2010-09-01
EP2222469B1 (en) 2014-01-15

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