CN101899653B - 一种工艺气体的输送法兰 - Google Patents
一种工艺气体的输送法兰 Download PDFInfo
- Publication number
- CN101899653B CN101899653B CN 201010235724 CN201010235724A CN101899653B CN 101899653 B CN101899653 B CN 101899653B CN 201010235724 CN201010235724 CN 201010235724 CN 201010235724 A CN201010235724 A CN 201010235724A CN 101899653 B CN101899653 B CN 101899653B
- Authority
- CN
- China
- Prior art keywords
- process gas
- flange body
- flange
- runner
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010235724 CN101899653B (zh) | 2010-07-23 | 2010-07-23 | 一种工艺气体的输送法兰 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010235724 CN101899653B (zh) | 2010-07-23 | 2010-07-23 | 一种工艺气体的输送法兰 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101899653A CN101899653A (zh) | 2010-12-01 |
CN101899653B true CN101899653B (zh) | 2013-01-23 |
Family
ID=43225559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201010235724 Active CN101899653B (zh) | 2010-07-23 | 2010-07-23 | 一种工艺气体的输送法兰 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101899653B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103924216B (zh) * | 2014-04-10 | 2016-04-20 | 沈阳拓荆科技有限公司 | 等离子发生器混气管路 |
CN111979530B (zh) * | 2020-08-28 | 2022-10-18 | 湖南红太阳光电科技有限公司 | Pecvd设备的加热系统、加热控制方法及pecvd设备 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201778112U (zh) * | 2010-07-23 | 2011-03-30 | 深圳市捷佳伟创微电子设备有限公司 | 一种工艺气体的输送法兰 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100433285B1 (ko) * | 2001-07-18 | 2004-05-31 | 주성엔지니어링(주) | 멀티 홀 앵글드 가스분사 시스템을 갖는 반도체소자제조장치 |
JP5172617B2 (ja) * | 2007-11-12 | 2013-03-27 | シャープ株式会社 | 気相成長装置及び気相成長方法 |
-
2010
- 2010-07-23 CN CN 201010235724 patent/CN101899653B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201778112U (zh) * | 2010-07-23 | 2011-03-30 | 深圳市捷佳伟创微电子设备有限公司 | 一种工艺气体的输送法兰 |
Also Published As
Publication number | Publication date |
---|---|
CN101899653A (zh) | 2010-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN201778112U (zh) | 一种工艺气体的输送法兰 | |
CN115094521B (zh) | 一种硼扩散反应系统及其工艺方法 | |
CN101899653B (zh) | 一种工艺气体的输送法兰 | |
CN209199965U (zh) | 一种晶硅太阳能电池生产用负压湿氧扩散装置 | |
CN210163522U (zh) | 一种炉管及lpcvd设备 | |
CN103924216B (zh) | 等离子发生器混气管路 | |
CN117790631A (zh) | 基于TOPCon电池的二次硼扩常压退火工艺及系统 | |
CN201804848U (zh) | 一种用于制造半导体器件的氧化装置 | |
CN218321630U (zh) | 气路传输系统 | |
CN111139456A (zh) | 一种提高真空镀膜气氛均匀性的辉光区气路布置方法以及气路装置 | |
CN102008874B (zh) | 一种增强废气混合反应装置 | |
CN203360400U (zh) | 一种整体式加氢气化炉喷嘴及气化炉 | |
CN210974871U (zh) | 光伏电池镀膜反应炉 | |
CN111916530A (zh) | 量产型高效光伏电池三合一镀膜设备 | |
CN113249780A (zh) | 导流装置、单晶炉及导流控制方法 | |
CN201381378Y (zh) | 制备太阳电池的石英炉管 | |
CN110158057B (zh) | 一种pecvd工艺腔室支管路装置及其所在的气路系统 | |
CN113151806A (zh) | 一种低压化学气相沉积炉进气装置 | |
CN109778145B (zh) | 一种用于生产太阳能电池的cvd设备供气装置及其供气方法 | |
CN209816273U (zh) | 一种改善管式pecvd气体均匀性的装置 | |
CN210104070U (zh) | 一种tma介质的蒸发系统 | |
CN210261990U (zh) | 一种向管式pecvd的tma介质输送系统 | |
CN217997413U (zh) | 一种扩散炉管抽气管路 | |
CN220926927U (zh) | Mad设备的进气系统 | |
CN205152399U (zh) | 一种扩散炉用石英管 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: 518000, Guangdong, Shenzhen province Baoan District manhole Street oyster four Lin slope pit Industrial Zone A4 and No. A6 workshop Applicant after: SHENZHEN HEADQUARTER: S.C NEW ENERGY TECHNOLOGY Corp. Address before: 1, Shenzhen, Guangdong, Baoan District Province, oyster Town, four Lin Keng Hang industrial zone A4 building Applicant before: Shenzhen Jiejia Weichuang Microelectronics Equipment Co.,Ltd. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: SHENZHEN JIEJIA WEICHUANG MICROELECTRONICS EQUIPMENT CO., LTD. TO: SHENZHEN S.C NEW ENERGY TECHNOLOGY CORPORATION |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230815 Address after: 312000 Area A south of Yuejiang Road, Ma'an Street, Heqiao District, Shaoxing City, Zhejiang Province Patentee after: Zhejiang Riyue Solar Energy Technology Co.,Ltd. Address before: No.a4 and A6 factory buildings of Ho Si Lin Po Keng Industrial Zone, Shajing street, Bao'an District, Shenzhen, Guangdong 518000 Patentee before: SHENZHEN HEADQUARTER: S.C NEW ENERGY TECHNOLOGY Corp. |