CN101858727B - Parallel confocal measuring system and measuring method based on digital micromirror light source - Google Patents

Parallel confocal measuring system and measuring method based on digital micromirror light source Download PDF

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Publication number
CN101858727B
CN101858727B CN2010101651938A CN201010165193A CN101858727B CN 101858727 B CN101858727 B CN 101858727B CN 2010101651938 A CN2010101651938 A CN 2010101651938A CN 201010165193 A CN201010165193 A CN 201010165193A CN 101858727 B CN101858727 B CN 101858727B
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light source
dmd
micro mirror
parallel confocal
measuring system
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CN2010101651938A
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CN101858727A (en
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余晓芬
余卿
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Hefei University of Technology
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Hefei University of Technology
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Abstract

The invention relates to a parallel confocal measuring system and a measuring method based on a digital micromirror light source. The measuring system is characterized in that a DMD (Digital Mirror Device) system which comprises a DMD micromirror control system and a DMD chip and can control any one micromirror in the DMD chip to deflect is arranged; light beams emitted from an alignment light source are reflected in the DMD system; reflected light formed by the DMD system is formed into a light source required by measurement after passing through an imaging lens; the light source required by measurement is projected to the surface of a measured object on a working table after passing through a spectroscope and a telescope in sequence; and the light beams projected to the surface of the measured object are reflected to an area array CCD (Charge Coupled Device) by the measured object to form the parallel confocal measuring system. In the invention, a flexible digital micromirror light source is constructed by utilizing a DMD, and applied to the parallel confocal measuring system; the deflection state of each micromirror in the a micromirro array can be conveniently and rapidly controlled according to requirements, thereby constructing flexible light sources with different shapes and any size.

Description

Parallel confocal measuring system and measuring method based on digital micromirror light source
Technical field
The present invention relates to be applied to measuring system and the measuring method that three-dimensional appearance detects, more specifically say so a kind of parallel confocal measuring system and measuring method thereof.
Background technology
Traditional parallel confocal microscope adopts Nipkow rotating disk, micro hole array, micro-optical device (as microlens array etc.) to realize cutting apart light beam usually, thereby becoming multiple spot by spot measurement measures simultaneously, but in a single day these optical device are made, the parameter of light source is just fixing, just must change optical device if will change the distribution and the size of light source point, this has not only improved cost, has also limited the certain applications of parallel confocal system.
Summary of the invention
The present invention is for avoiding above-mentioned existing in prior technology weak point, a kind of shape, size that can change light source arbitrarily is provided, change parameters such as array of source density, obtain the parallel confocal measuring system and the measuring method based on digital micromirror light source of the ability of surface information to strengthen the parallel confocal measuring system.
Technical solution problem of the present invention adopts following technical scheme
The characteristics that the present invention is based on the parallel confocal measuring system of digital micromirror light source are:
Setting is with the DMD system of DMD micromirror control system and dmd chip deflection that constitute, that can control arbitrary micro mirror in the dmd chip; Receive the collimated light beam that collimated light source sends with described DMD system, and the collimated light source reflected light of imaging len is invested in formation, described collimated light source reflected light is through forming the measuring light that photograph is thrown on the measured object surface on worktable through spectroscope and telescopic system successively as measurement light source behind the imaging len, constitute the measuring light reflex circuit simultaneously by described telescopic system and spectroscope, area array CCD 7 receives the tested folded light beam from the measured object surface through the measuring light reflex circuit.
The measuring method that the present invention is based on the parallel confocal measuring system of digital micromirror light source is:
Setting up departments, the wavelength of collimated light source is λ in the system, and measurements range is L, and the lateral resolution of system requirements is δ, and the magnification of system is M, and dmd chip is that the length of side of each square micro mirror is d by the micro mirror array of m * n micro mirror formation 0, the position d of each micro mirror in array I, jExpression, wherein i and j represent the horizontal ordinate and the ordinate of this micro mirror respectively, i=1,2 ..., m; J=1,2 ..., n; The pointolite size of k * k micro mirror formation is kd so 0* kd 0
It is characterized in that described measuring method carries out as follows:
A, by the formula z=2d/ λ of Taibo spacing, reach L for making system's range, then constructed light source cycle d=d 1, this moment pointolite spacing N 1=d 1/ d 0
i=1+aN 1,2+aN 1,…,k+aN 1
j=1+bN 1,2+bN 1,…,k+bN 1
B, control d IjDeflection+12 °, wherein:
a=0,1,2,…,[m/(k+N 1)]
b=0,1,2,…,[n/(k+N 1)]
The preview light source is constructed in all the other micro mirror deflections-12 °; Determine the positive position of focal plane of pointolite corresponding region by described preview light source;
C, by d 2=δ/M determines light source periodic light source dot spacing N 2=d 2/ d 0
i=1+aN 2,2+aN 2,…,k+aN 2
j=1+bN 2,2+bN 2,…,k+bN 2
D, control d I, jDeflection+12 °, wherein:
a=0,1,2,…,[m/(k+N 2)]
b=0,1,2,…,[n/(k+N 2)]
Measurement light source is constructed in all the other micro mirror deflections-12 °; Under the situation of finding out positive position of focal plane, carry out parallel confocal with measurement light source and measure, obtain the coordinate figure of each sampled point.
Compared with the prior art, beneficial effect of the present invention is embodied in:
The present invention utilizes DMD to make up a kind of digital micromirror light source of flexibility, and be applied to the parallel confocal measuring system, can control the deflection state of each micro mirror in the micro mirror array quickly and easily as required, thereby construct the flexible light source of difformity, any size.
Description of drawings
Fig. 1 is for being used to eliminate Tabo effect is measured influence to parallel confocal DMD control flow chart among the present invention.
Fig. 2 surface measurements has the DMD control flow chart of the measured object of stria.
Fig. 3 is principle of the invention figure.
Number in the figure: 1 collimated light source, 2 is DMD system, 3 imaging lens, 4 spectroscopes, 5 telescopic systems, 6 worktable, 7 area array CCDs 7.
Embodiment
Referring to Fig. 3, present embodiment is provided with the DMD system 2 that constitutes with DMD micromirror control system and dmd chip, when the DMD in the parallel confocal measuring system carries out work, each micro mirror can be distinguished with the form of coordinate in length and breadth, by the DMD micromirror control system micro mirror on each coordinate points is programmed again, control their deflection situation respectively.The light beam that collimated light source sends forms reflection in the DMD system, the reflected light that is formed by the DMD system forms the required light source of measurement through imaging len, measure required light source and be projected on measured object surface on the worktable through spectroscope and telescopic system successively, to be projected on its surperficial beam reflection to area array CCD by described measured object, constitute the parallel confocal measuring system.
Shown in Figure 3, present embodiment is to receive the collimated light beam that collimated light source 1 sends with DMD system 2, and the collimated light source reflected light of imaging len 3 is invested in formation, the collimated light source reflected light forms the measuring light that photograph is thrown on the measured object surface on worktable 6 through spectroscope 4 and telescopic system 5 through imaging len 3 backs successively as measurement light source, constitute the measuring light reflex circuit simultaneously by telescopic system 5 and spectroscope 4, area array CCD 7 receives the tested folded light beam from the measured object surface through the measuring light reflex circuit.
Dmd chip is the optical device that is made of 800 * 600 micro mirror array, wherein each micro mirror all have 0 ° ,+12 ° and-12 ° of three kinds of states, micro mirror is in " inoperative " state in the time of 0 °; Under the duty, micro mirror will shine and next light reflection back formation light source point in the time of+12 °, then be absorbed the screen absorption through the micro mirror light reflected in the time of-12 °, not participate in making up light source.DMD micromirror control system involved in the present invention can be programmed to the micro mirror on each coordinate points in the micro mirror array, control their deflection situation respectively, so just can control+position of micro mirror in micro mirror array of 12 ° of deflections distributes arbitrarily, thereby forms required light source.
Setting up departments, the wavelength of collimated light source is λ in the system, and measurements range is L, and the lateral resolution of system requirements is δ, and the magnification of system is M, and dmd chip is that the length of side of each square micro mirror is d by the micro mirror array of m * n micro mirror formation 0, the position d of each micro mirror in array I, jExpression, wherein i and j represent the horizontal ordinate and the ordinate of this micro mirror respectively, i=1,2 ..., m; J=1,2 ..., n; The pointolite size of k * k micro mirror formation is kd so 0* kd 0
Measuring method in the present embodiment is carried out as follows:
A, by the formula z=2d/ λ of Taibo spacing, reach L for making system's range, then constructed light source cycle d=d 1, this moment pointolite spacing N 1=d 1/ d 0
i=1+aN 1,2+aN 1,…,k+aN 1
j=1+bN 1,2+bN 1,…,k+bN 1
B, control d I, jDeflection+12 °, wherein:
a=0,1,2,…,[m/(k+N 1)]
b=0,1,2,…,[n/(k+N 1)]
The preview light source is constructed in all the other micro mirror deflections-12 °; Determine the positive position of focal plane of pointolite corresponding region by described preview light source;
C, by d 2=δ/M determines light source periodic light source dot spacing N 2=d 2/ d 0
i=1+aN 2,2+aN 2,…,k+aN 2
j=1+bN 2,2+bN 2,…,k+bN 2
D, control d I, jDeflection+12 °, wherein:
a=0,1,2,…,[m/(k+N 2)]
b=0,1,2,…,[n/(k+N 2)]
Measurement light source is constructed in all the other micro mirror deflections-12 °; Under the situation of finding out positive position of focal plane, carry out parallel confocal with measurement light source and measure, obtain the coordinate figure of each sampled point.
The control flow of above-mentioned measuring method as shown in Figure 1, this measuring method can be eliminated the influence that Tabo effect is measured parallel confocal.
When if there is stria on the measured object surface, also can measure the surface topography of groove width and all the other positions, surface by this method, measuring method is:
1, control d I, jDeflection+12 °
i=1+aN 2,2+aN 2,…,N 1+aN 2
j=1,2,…,n
a=0,1,2,…,[m/(N 1+N 2)]
All the other micro mirror deflections-12 °, the structure thickness is d 1, spacing is d 2The longitudinal stripe light source;
When 2, the striped light source irradiation is on stria, can two breaks occur, calculate the break width y under the longitudinal stripe at the edge of groove 1
3, control d I, jDeflection+12 °
i=1,2,…,m
j=1+bN 4,2+bN 4,…,N 3+bN 4
b=0,1,2,…,[n/(N 3+N 4)]
All the other micro mirror deflections-12 °, the structure thickness is d 3, spacing is d 4The travers light source;
4, the break width y under the calculating travers 2
5, work as y 1, y 2≠ 0 o'clock, by Calculate the actual width of stria;
And work as y 1=0 o'clock, y=y 2Otherwise, y=y 1
6, determine light source periodic light source dot spacing N=d/d by d=δ/M 0
7, control d I, jDeflection+12 °, wherein
i=1+aN,2+aN,…,k+aN
j=1+bN,2+bN,…,k+bN
a=0,1,2,…,[m/(k+N)]
b=0,1,2,…,[n/(k+N)]
All the other micro mirror deflections-12 ° have made up measurement light source;
8, with measurement light source parallel confocal is carried out in all the other positions, surface and measure, obtain the coordinate figure of each sampled point.
Its control flow as shown in Figure 2.

Claims (1)

1. the measuring method based on the parallel confocal measuring system of digital micromirror light source is provided with the DMD system (2) with DMD micromirror control system and dmd chip deflection that constitute, that can control arbitrary micro mirror in the dmd chip; Receive the collimated light beam that collimated light source (1) sends with described DMD system (2), and the collimated light source reflected light of imaging len (3) is invested in formation, described collimated light source reflected light passes through spectroscope (4) through imaging len (3) back successively as measurement light source and telescopic system (5) forms the measuring light that photograph is thrown on the measured object surface on worktable (6), constitute the measuring light reflex circuit simultaneously by described telescopic system (5) and spectroscope (4), area array CCD (7) receives the tested folded light beam from the measured object surface through the measuring light reflex circuit; If the wavelength of collimated light source is λ in the parallel confocal measuring system, the measurement range is L, and the lateral resolution that the parallel confocal measuring system requires is δ, and the magnification of parallel confocal measuring system is M, dmd chip is the micro mirror array that is made of m * n micro mirror, and the length of side of each square micro mirror is d 0, the position d of each micro mirror in array I, jExpression, wherein i and j represent the horizontal ordinate and the ordinate of this micro mirror respectively, i=1,2 ..., m; J=1,2 ..., n; The pointolite size of k * k micro mirror formation is kd so 0* kd 0
It is characterized in that described measuring method carries out as follows:
A, by the formula z=2d/ λ of Taibo spacing, reach L for making parallel confocal measuring system range, then constructed light source cycle d=d 1, this moment pointolite spacing N 1=d 1/ d 0
B, control d I, jDeflection+12 °, wherein: i = 1 + a N 1 , 2 + a N 1 , . . . , k + a N 1 j = 1 + b N 1 , 2 + b N 1 , . . . , k + b N 1 a = 0,1,2 , . . . , [ m / ( k + N 1 ) ] b = 0,1,2 , . . . , [ n / ( k + N 1 ) ]
The preview light source is constructed in all the other micro mirror deflections-12 °; Determine the positive position of focal plane of pointolite corresponding region by described preview light source;
C, by d 2=δ/M determines light source periodic light source dot spacing N 2=d 2/ d 0
D, control d I, jDeflection+12 °, wherein: i = 1 + a N 2 , 2 + a N 2 , . . . , k + a N 2 j = 1 + b N 2 , 2 + b N 2 , . . . , k + b N 2 a = 0,1,2 , . . . , [ m / ( k + N 2 ) ] b = 0,1,2 , . . . , [ n / ( k + N 2 ) ]
Measurement light source is constructed in all the other micro mirror deflections-12 °; Under the situation of finding out positive position of focal plane, carry out parallel confocal with measurement light source and measure, obtain the coordinate figure of each sampled point.
CN2010101651938A 2010-04-30 2010-04-30 Parallel confocal measuring system and measuring method based on digital micromirror light source Expired - Fee Related CN101858727B (en)

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CN102012218A (en) * 2010-11-17 2011-04-13 合肥工业大学 Parallel confocal measurement system based on digital micro-mirror light source and measurement method thereof
CN102213585B (en) * 2011-04-11 2012-07-25 合肥工业大学 Single-light-source dual-light-path parallel confocal measurement system
CN103716538B (en) * 2013-12-16 2017-01-25 天津大学 DMD-based imaging pre-processing device and method
CN103954232A (en) * 2014-04-21 2014-07-30 华侨大学 Flexible surface appearance quick extraction method
CN105043303A (en) * 2015-08-14 2015-11-11 华侨大学 Detection method and system for surface morphology of grinding wheel
CN105091785A (en) * 2015-08-14 2015-11-25 华侨大学 Method and system for detecting surface topography of grinding wheel
DE102018130901A1 (en) * 2018-12-04 2020-06-04 Precitec Optronik Gmbh Optical measuring device
CN111487038B (en) * 2020-04-23 2022-04-08 华侨大学 Integrated micro-dispersion lens array panel and parallel chromatic confocal measurement system

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CN2293844Y (en) * 1997-04-08 1998-10-07 四川联合大学 Micro-array three-dimensional parallel confocal testing apparatus
JP2005024596A (en) * 2003-06-30 2005-01-27 Susumu Terakawa Confocal scanning microscope
CN101482706A (en) * 2009-01-23 2009-07-15 上海微电子装备有限公司 Focusing leveling device based on confocal measuring technique
CN101666620A (en) * 2009-09-27 2010-03-10 合肥工业大学 Multi-source parallel confocal micro detection system
CN201653359U (en) * 2010-04-30 2010-11-24 合肥工业大学 Parallel confocal measuring system based on digital microscope light source

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