CN101482706A - Focusing leveling device based on confocal measuring technique - Google Patents
Focusing leveling device based on confocal measuring technique Download PDFInfo
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- CN101482706A CN101482706A CNA200910045849XA CN200910045849A CN101482706A CN 101482706 A CN101482706 A CN 101482706A CN A200910045849X A CNA200910045849X A CN A200910045849XA CN 200910045849 A CN200910045849 A CN 200910045849A CN 101482706 A CN101482706 A CN 101482706A
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Abstract
The invention provides a focusing and leveling device based on confocal measuring technology, comprising a lighting source, a confocal measuring sensor, a projection objective, a silicon chip and a control unit. The lighting source send the light ray; the confocal measuring sensor receives the light ray to form an image; the projection objective is connected with the confocal measuring sensor; the silicon chip receives the image; and the control unit is electrically connected with the confocal measuring sensor and controls the movement of the confocal measuring sensor according to the image. The focusing and leveling device based on confocal measuring technology of the invention can implement the paralleling confocal measurement and improve the measurement efficiency.
Description
Technical field
The invention relates to a kind of focusing leveling device, and particularly relevant for a kind of focusing leveling device based on confocal measuring technique.
Background technology
Current, in the lithographic equipment that semiconductor is made, in order to reach desirable exposure image effect, all need focusing leveling device to measure the distance of silicon chip upper surface to the projection objective camera lens, thereby guarantee that in exposure process each exposure field on the silicon chip can both be near the best focal plane of projection objective.
Current, main focusing and leveling technology has two classes.A kind of technology is by some sensors directly being installed on camera lens, directly being detected the elevation information of silicon chip surface; Another kind method as one group of oblique lateral projection of raster graphic is arrived silicon chip surface, obtains the elevation information of silicon chip surface based on structure optics projection measurement technology by the change in location of monitoring its reflection image.
These two kinds of methods exist certain defective respectively, and first method may be subjected to the influence of silicon chip surface operational characteristic, thereby influences measuring accuracy.Though second method belongs to non-cpntact measurement, require projection objective to have bigger work distance, just design has brought difficulty to projection objective for this, and the layout of survey sensor can take bigger space, picture side.
The essence of focusing and leveling is to measure the height of the relative object lens of silicon chip surface, for step photo-etching machine, its Measurement Resolution is usually at submicron order, confocal measurement method can provide such resolution, and has the advantage of non-cpntact measurement, simultaneously, the work of confocal microscope is apart from very little, this has just reduced the requirement for the object lens operating distance, reduces the pressure of objective lens design, therefore can be used as the sensor of focusing and leveling.
Yet, traditional scanning confocal measuring technique need be by object-image conjugate each other between illumination pin hole-reception pin hole-sample three, in the precision of submicron order, obtain the elevation information of sample with the method for sacrificing the visual field, this method need be in sample surfaces point by point scanning to obtain complete three-dimensional appearance information, therefore efficiency of measurement is lower, can't adapt to the productive rate needs that semiconductor is made.
In recent years, development along with spatial light modulation technology, parallel confocal is measured has become possibility, occurred utilizing devices such as pinhole array, microlens array to substitute the technical scheme of single lighting point, realized parallel measurement, improved efficiency of measurement, but because manufacturing process restriction, between pin hole or the microlens array is outwardness and unavoidable at interval, so the actual sampling number of sacrificing the X-Y direction of so-called parallel measurement, thereby make the three-D profile and its actual conditions that record have deviation.And, no matter be pinhole array or microlens array, all be " rigidity " element, in case make moulding, its characteristic all can not change as size, cycle etc., so the axial resolution of these two kinds of methods measurements all can only reach micron order.
Summary of the invention
The present invention proposes a kind of focusing leveling device based on confocal measuring technique, to improve the disappearance of prior art.
The present invention proposes a kind of focusing leveling device based on confocal measuring technique and comprises lighting source, confocal measuring sensor, projection objective, silicon chip and control module.Lighting source emits beam; Confocal measuring sensor receives light, forms image; Projection objective connects confocal measuring sensor; Silicon chip receives image; And control module electrically connects confocal measuring sensor, and according to the motion of image control confocal measuring sensor.
The focusing leveling device that the present invention is based on confocal measuring technique has following beneficial effect:
1. confocal measurement method is applied in the focusing and leveling technology of litho machine, in the time of can making the projection objective design, reduce requirement, and it is less to take image space for the work distance;
2. utilize flexible two dimensional spatial light modulator to generate the lighting source of pointolite array as confocal measuring sensor, (Area of Interest, AIO) variable receiving array realize that parallel confocal measures, and have improved efficiency of measurement to be equipped with the receiving area;
3. pointolite array can be realized X-Y to smart scan function simultaneously, thereby improves efficiency of measurement under the prerequisite of not losing measuring accuracy.
For above and other objects of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Figure 1 shows that according to an embodiment of the invention synoptic diagram based on the focusing leveling device of confocal measuring technique.
Figure 2 shows that according to an embodiment of the invention pointolite array based on the focusing leveling device of confocal measuring technique forms and the synoptic diagram of scanning.
Embodiment
Figure 1 shows that according to an embodiment of the invention synoptic diagram based on the focusing leveling device of confocal measuring technique.
Please refer to Fig. 1, the focusing leveling device 10 based on confocal measuring technique of present embodiment comprises lighting source 107, confocal measuring sensor 101, projection objective 102, silicon chip Si and control module 114.Lighting source 107 emits beam; Light enters confocal measuring sensor 101 and as its measuring light source; Projection objective 102 connects confocal measuring sensor 101, and projection objective 102 has first focal plane 106; Silicon chip Si receives image; Control module 114 electrically connects confocal measuring sensor 101, and according to the motion of the position control confocal measuring sensor of image.
In the present embodiment, the focusing leveling device 10 based on confocal measuring technique more comprises transmission channel 115, a measurement substrate 103 and a work stage 104.Transmission channel 115 connects confocal measuring sensor 101; Projection objective 102 is rigidly connected with confocal measuring sensor 101 by measuring substrate 103; Work stage 104 electrically connects control module 114, and work stage 104 carrying silicon chip Si.
The light that lighting source 107 sends is sent to confocal measuring sensor 101 by transmission channel 115.
Silicon chip Si receives image.Ideally, the image on the silicon chip surface 105 should be positioned on the focal plane of microcobjective 111, and this focal plane should overlap with the best focal plane 106 of projection objective 102.Yet actual conditions are really not so.Therefore need by adjust work stage 104Z to position or mobile microcobjective 111 so that the image that silicon chip receives be positioned on the best focal plane 106 of projection objective 102.
Further, in the present embodiment, after pointolite array arrives silicon chip surface 105, reflected along original optical path, arrive receiver 113 behind second catoptron 119, Amici prism 110 and second lens 112, receiver 113 is converted into a digital signal with the image that receives.Receiver 113 is a face formation receiver, and (Area of Interest, AOI) change as required is to form corresponding " receiving array " of pointolite array that is generated with spatial light modulator 108 in its receiving area.
Figure 2 shows that according to an embodiment of the invention pointolite array based on the focusing leveling device of confocal measuring technique forms and the synoptic diagram of scanning.
As shown in Figure 2, control module 114 is connected by interface 205 with spatial light modulator 108, and this interface can be VGA, also can be DVI or USB interface.Data according to interface, adjacent several micro-reflectors 201 of spatial light modulator 108 (micro reflector array) form a pointolite 206 by upset (+12.5 ° or-12.5 °), a plurality of pointolites 206 form pointolite array, play the effect of pinhole array.Because therefore spatial light modulator 108 (micro reflector array) has gone up integrated nearly 1,000,000 micro-reflectors can form an enough big pointolite array and be used for measuring.
Please also refer to Fig. 1 to Fig. 2, when carrying out leveling and focusing, work stage 104 treats that with one on the silicon chip surface 105 exposure field is brought in the scanning area of confocal measuring sensor 101.The light that lighting source 107 sends enters into confocal measuring sensor 101 through transmission channel 115, incides spatial light modulator 108 surfaces through first catoptron 117.Spatial light modulator 108 generates the pointolite array in specific size, cycle according to the order of control module 114, with the light source of this pointolite array as optical imaging system.Pointolite array is behind first lens 109, Amici prism 110, second catoptron 119, microcobjective 111, the picture that becomes to dwindle is on space plane 106, and project silicon chip surface 105, behind second catoptron 119, Amici prism 110 and second lens 112, received again after its surface reflection by CCD113.If silicon chip surface 105 is when being in focal plane of lens 106, the signal intensity that receiver 113 each AOI unit receive is for maximum, in case silicon chip surface 105 has and departs from the focal plane minutely, then the signal intensity that receives of the corresponding AOI of CCD113 unit approaches 0 immediately.After CCD113 finishes and once receives, digital signal is passed to control module 114, generate new pointolite array by control module 114 order spatial light modulators 108 then, each original pointolite is moved by certain path 204, constitute smart scanning area 203 (X-Y to) along each pointolite of this path process, and smart scanning times equals the pointolite number of 204 processes along this path.Utilize confocal measuring sensor 101 to carry out 1 X-Y to be to the overlayable scope of smart scanning process:
M＝β·L
Wherein, β is the enlargement ratio of whole confocal measuring sensor optical system, L is the pointolite array size, if each micro-reflector of spatial light modulator 108 (micro reflector array) all is used, under 60 * magnification, X-Y can reach 0.23 * 0.16mm to the overlayable scope of smart scanning process
2, the spot scan formula of comparing is measured, and has improved efficiency of measurement.
After finishing once smart scanning, vertical scanner driver 121 drives microcobjective 111 and moves a slight distance along the Z direction, and this distance should equal the axial resolution of confocal measuring sensor 101, and axial resolution can utilize following formula to calculate:
Wherein λ is the wavelength of lighting source, and α is the aperture angle of projection objective.When numerical aperture (n*sin α/2, n is the refractive index of medium between object and object lens) is 0.85, during λ=632.8nm, axial resolution can reach 500nm, realizes the axial resolution of submicron order.
Repeat smart scanning process then.X-Y, just can obtain enough data, thereby accurately simulate current height and the inclination situation of surveying the elevation information of silicon chip surface 105 and departing from projection objective 102 best focal planes after several times are carried out in scanning to essence scanning and Z.
In the present embodiment, the focusing leveling device 10 based on confocal measuring technique more comprises a work stage servo control unit 120, electric connection control module 114 and work stage 104.Aforementioned calculation is given an order to work stage servo control unit 120 by control module 114 after finishing, and makes work stage 104 step to new position to be measured, repeats above measuring process.
The focusing leveling device that the present invention is based on confocal measuring technique is applied to confocal measurement method in the focusing and leveling technology of litho machine, in the time of can making the projection objective design, reduction is for the requirement of work distance, and it is less to take image space, and it utilizes flexible two dimensional spatial light modulator to generate the lighting source of pointolite array as confocal measuring sensor, be equipped with receiving area (Area of Interest, AIO) variable receiving array, the realization parallel confocal is measured, improved efficiency of measurement, and pointolite array simultaneously can realize X-Y to smart scan function, thereby improves efficiency of measurement under the prerequisite of not losing measuring accuracy.
Concrete case study on implementation only is a preferable case study on implementation of the present invention described in the present invention, is not to be used for limiting practical range of the present invention.Be that all equivalences of doing according to the content of the present patent application claim change and modification, all should be as technology category of the present invention.
Claims (14)
1. the focusing leveling device based on confocal measuring technique is characterized in that, comprising:
Lighting source emits beam;
Confocal measuring sensor, above-mentioned light enters above-mentioned confocal measuring sensor, forms an image;
Projection objective connects above-mentioned confocal measuring sensor, and above-mentioned projection objective has first focal plane;
Silicon chip receives above-mentioned image;
Control module electrically connects above-mentioned confocal measuring sensor, and the motion of the above-mentioned confocal measuring sensor of position control of the above-mentioned image of foundation.
2. the focusing leveling device based on confocal measuring technique according to claim 1, it is characterized in that, above-mentioned focusing leveling device based on confocal measuring technique more comprises transmission channel, and above-mentioned transmission channel is sent to above-mentioned confocal measuring sensor with above-mentioned light.
3. the focusing leveling device based on confocal measuring technique according to claim 2 is characterized in that, above-mentioned transmission channel is an optical fiber.
4. the focusing leveling device based on confocal measuring technique according to claim 1 is characterized in that, above-mentioned focusing leveling device based on confocal measuring technique more comprises:
Measure substrate, and above-mentioned projection objective is for to connect above-mentioned confocal measuring sensor by above-mentioned measurement substrate.
5. the focusing leveling device based on confocal measuring technique according to claim 1 is characterized in that, above-mentioned lighting source is an incoherent light source.
6. the focusing leveling device based on confocal measuring technique according to claim 1 is characterized in that, above-mentioned focusing leveling device based on confocal measuring technique more comprises:
Work stage electrically connects above-mentioned control module, and above-mentioned work stage carries above-mentioned silicon chip, and above-mentioned control module is controlled the motion of above-mentioned work stage according to above-mentioned image.
7. the focusing leveling device based on confocal measuring technique according to claim 6, it is characterized in that, above-mentioned focusing leveling device more comprises a work stage servo control unit, connect above-mentioned control module and above-mentioned work stage, and above-mentioned control module is controlled the motion of above-mentioned work stage by above-mentioned work stage servo control unit.
8. the focusing leveling device based on confocal measuring technique according to claim 1 is characterized in that, wherein above-mentioned confocal measuring sensor comprises:
First catoptron reflects above-mentioned light;
Spatial light modulator electrically connects above-mentioned control module, and above-mentioned spatial light modulator receives the emergent ray of above-mentioned first catoptron, first's formation pointolite array of above-mentioned emergent ray; And
Optical imaging device receives above-mentioned pointolite array, and forms above-mentioned image.
9. the focusing leveling device based on confocal measuring technique according to claim 8 is characterized in that above-mentioned confocal measuring sensor comprises a baffle, absorbs the second portion of above-mentioned emergent ray.
10. the focusing leveling device based on confocal measuring technique according to claim 8 is characterized in that, above-mentioned optical imaging device comprises:
First lens;
Amici prism;
Second catoptron;
Microcobjective has second focal plane; And
Vertical scanner driver is arranged at above-mentioned microcobjective, and above-mentioned vertical scanner driver drives above-mentioned microcobjective and move a slight distance in vertical direction,
Wherein, above-mentioned pointolite array forms above-mentioned image through above-mentioned first lens, above-mentioned Amici prism, above-mentioned catoptron and above-mentioned microcobjective successively.
11. the focusing leveling device based on confocal measuring technique according to claim 10 is characterized in that, wherein above-mentioned optical imaging device more comprises:
Second lens; And
Receiver electrically connects above-mentioned control module,
Wherein, after above-mentioned pointolite array arrives above-mentioned silicon chip, behind above-mentioned microcobjective, above-mentioned catoptron, above-mentioned Amici prism and above-mentioned second lens, arrive above-mentioned receiver.
12. the focusing leveling device based on confocal measuring technique according to claim 11 is characterized in that, above-mentioned receiver is a face formation receiver.
13. the focusing leveling device based on confocal measuring technique according to claim 8 is characterized in that, wherein above-mentioned spatial light modulator is a flexible two dimensional spatial light modulator.
14. the focusing leveling device based on confocal measuring technique according to claim 13 is characterized in that, wherein above-mentioned flexible two dimensional spatial light modulator is a micro reflector array.
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101858727A (en) * | 2010-04-30 | 2010-10-13 | 合肥工业大学 | Parallel confocal measuring system and measuring method based on digital micromirror light source |
| CN102207694A (en) * | 2010-03-31 | 2011-10-05 | 上海微电子装备有限公司 | Imaging adjustment unit and focusing and leveling control system using the unit |
| CN102231051A (en) * | 2011-05-20 | 2011-11-02 | 合肥芯硕半导体有限公司 | Pneumatic automatic focusing device and method of photoetching machine |
| CN103168275A (en) * | 2010-11-04 | 2013-06-19 | 株式会社Orc制作所 | Exposure device |
| CN103365097A (en) * | 2012-03-27 | 2013-10-23 | 上海微电子装备有限公司 | Focusing and levelling measurement device |
| CN103631098A (en) * | 2013-12-23 | 2014-03-12 | 成都虹博宇光电科技有限公司 | Photo-etching machine and non-contact type leveling and focusing system and method thereof |
| CN104375383A (en) * | 2013-08-13 | 2015-02-25 | 上海微电子装备有限公司 | Focusing and leveling device and method for photo-etching equipment |
| CN106443998A (en) * | 2016-11-04 | 2017-02-22 | 清华大学深圳研究生院 | Microscopy imaging method and system based on FPM (Fast Page Mode) algorithm |
| CN104950583B (en) * | 2014-03-24 | 2017-08-25 | 上海微电子装备有限公司 | Focusing and leveling system for lithographic equipment |
| CN110196232A (en) * | 2019-06-03 | 2019-09-03 | 中北大学 | A kind of confocal imaging device and confocal imaging method |
| CN111521617A (en) * | 2020-04-30 | 2020-08-11 | 上海御微半导体技术有限公司 | Optical detection apparatus, control method of optical detection apparatus, and storage medium |
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2009
- 2009-01-23 CN CNA200910045849XA patent/CN101482706A/en active Pending
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102207694A (en) * | 2010-03-31 | 2011-10-05 | 上海微电子装备有限公司 | Imaging adjustment unit and focusing and leveling control system using the unit |
| CN101858727A (en) * | 2010-04-30 | 2010-10-13 | 合肥工业大学 | Parallel confocal measuring system and measuring method based on digital micromirror light source |
| CN103168275A (en) * | 2010-11-04 | 2013-06-19 | 株式会社Orc制作所 | Exposure device |
| CN103168275B (en) * | 2010-11-04 | 2015-06-24 | 株式会社Orc制作所 | Exposure device |
| CN102231051A (en) * | 2011-05-20 | 2011-11-02 | 合肥芯硕半导体有限公司 | Pneumatic automatic focusing device and method of photoetching machine |
| CN103365097B (en) * | 2012-03-27 | 2015-06-17 | 上海微电子装备有限公司 | Focusing and levelling measurement device |
| CN103365097A (en) * | 2012-03-27 | 2013-10-23 | 上海微电子装备有限公司 | Focusing and levelling measurement device |
| CN104375383A (en) * | 2013-08-13 | 2015-02-25 | 上海微电子装备有限公司 | Focusing and leveling device and method for photo-etching equipment |
| CN104375383B (en) * | 2013-08-13 | 2017-08-29 | 上海微电子装备有限公司 | Focusing-levelling detection device and method for lithographic equipment |
| CN103631098A (en) * | 2013-12-23 | 2014-03-12 | 成都虹博宇光电科技有限公司 | Photo-etching machine and non-contact type leveling and focusing system and method thereof |
| CN104950583B (en) * | 2014-03-24 | 2017-08-25 | 上海微电子装备有限公司 | Focusing and leveling system for lithographic equipment |
| CN106443998A (en) * | 2016-11-04 | 2017-02-22 | 清华大学深圳研究生院 | Microscopy imaging method and system based on FPM (Fast Page Mode) algorithm |
| CN106443998B (en) * | 2016-11-04 | 2022-06-10 | 清华大学深圳研究生院 | Micro-imaging method and system based on FPM algorithm |
| CN110196232A (en) * | 2019-06-03 | 2019-09-03 | 中北大学 | A kind of confocal imaging device and confocal imaging method |
| CN111521617A (en) * | 2020-04-30 | 2020-08-11 | 上海御微半导体技术有限公司 | Optical detection apparatus, control method of optical detection apparatus, and storage medium |
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