CN101856753B - Photoelectrochemical three-dimensional processing method and device of laser bubble cavitation - Google Patents
Photoelectrochemical three-dimensional processing method and device of laser bubble cavitation Download PDFInfo
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- CN101856753B CN101856753B CN 201010158801 CN201010158801A CN101856753B CN 101856753 B CN101856753 B CN 101856753B CN 201010158801 CN201010158801 CN 201010158801 CN 201010158801 A CN201010158801 A CN 201010158801A CN 101856753 B CN101856753 B CN 101856753B
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Abstract
The invention relates to a photoelectrochemical three-dimensional processing method and device of laser bubble cavitation, belonging to the non traditional combined machining field of the manufacturing technology. The method utilizes laser beam to irradiate the surface of workpieces in the solution and generate bubbles, as the bubble cavitation caused by bubble-collapsing combines with the electrochemical reaction so as to remove workpiece material under the action of photoelectrochemical reaction and realize etching and processing. In the device of the invention, a liquid crystal display of which the display of the grey level image is controlled by a computer is used as a mask plate, and when laser beam penetrates through the liquid crystal mask, an image with gray feature is generated to perform spatial modulation to the energy distribution in the laser spot. In the areas with higher laser radiation energy on the workpieces, the bubble cavitation is stronger, the speed of the photoelectrochemical reaction is higher and the etching removal rate is higher; in the areas with lower energy, the reverse happens, thus the processing of three-dimensional image can be realized. The device of the invention is applicable to the removal and processing of conductive metal material; and the display of the grey level image of the liquid crystal mask can be controlled by a computer, thus the processing efficiency of complex three-dimensional images can be increased greatly.
Description
Technical field
The present invention relates to the extraordinary Compound Machining field in the manufacturing technology, refer in particular to a kind of Photoelectrochemicalthree three-dimensional processing method and device of laser bubble cavitation, be applicable to the contactless three-dimensional processing of conduction metalloid material.
Background technology
Electrochemistry processing and Laser Processing all belong to special processing technology.Wherein, electrochemistry processing is to utilize the electrochemical reaction dissolving to remove workpiece material, realizes the manufacturing technology of shaping processing.Laser Processing is to utilize the laser beam with high-energy-density to be radiated at surface of the work, makes it that manufacturing technology of form, tissue variation take place.After electrochemical reaction receives the high energy laser irradiation, can produce a series of light, heat, nonlinear effect at electrode surface, make the reaction of material surface generation Optical Electro-Chemistry.Compare with conventional electrochemical reaction, the Optical Electro-Chemistry reaction has outstanding feature:
(1) the activation polarization current potential in laser radiation zone changes, and the equilibrium potential of electrode is shuffled, thereby the activation energy of electrode reaction is reduced, and electrochemical reaction takes place more easily.And laser is strong more, and the forward of current potential moves big more.
(2) suitable optical maser wavelength can cause that the luminous energy in the system absorbs, because the spatial discrimination of laser is high, only excites, induces the Optical Electro-Chemistry reaction in the zone of illumination on matrix, thereby it is played a significant role in the research of localization electrochemical reaction.
(3) electrode material is translated into heat energy after absorbing laser energy, and in electrode/solution interface place formation temperature gradient, the solution temperature near more from the interface is high more, otherwise temperature is low more.Thereby in solution, produce strong microconvection, accelerate the mass transport process of electrochemical reaction ions, reaction speed is accelerated.
Therefore, the essence of Optical Electro-Chemistry processing is that high energy laser beam has changed the electrode state of irradiation area, excites, induces electrochemical reaction, and the zone of action of control electrochemical reaction is improved electrochemical reaction current and reaction speed simultaneously.According to the data that retrieves, be to utilize the photic principle of cathodic protection of metal on the one hand for the Optical Electro-Chemistry Study on Technology both at home and abroad, be applied to the corrosion and protection field of material; Be exactly removal processing on the other hand with Laser Processing and compound type of the conduction material of Electrolyzed Processing.
Chinese patent " spraying liquid bunch electrolysis-laser composite processing method and device thereof "; The patent No.: CN1919514A proposes: the compound high velocity jet electrolyte bundle coaxial with laser beam in Laser Processing; Laser utilizes photo-thermal effect to remove material under the guiding of spraying liquid bunch; Electrolyte bundle by cathodic polarization cools off, washes away and electrochemical dissolution laser processing zone, removes the recast layer of Laser Processing.When this method is passed the electrolyte spray chamber at laser beam; The portion of energy of laser can be absorbed by electrolyte; The refraction of electrolyte, scattering also can influence the conduction of light beam, cause the loss of laser energy inevitably, be difficult to realize laser energy with the electrochemistry process systems in effective transmission.
Summary of the invention
The objective of the invention is to utilize the Optical Electro-Chemistry reaction to carry out the existing problem of Compound Machining to above-mentioned; Proposed a kind ofly to realize that three-dimensional processing, material removal area controllability are good; Graphics processing can change flexibly, is applicable to the processing method and the device of metallic conduction material.
A kind of Photoelectrochemicalthree three-dimensional processing method of laser bubble cavitation; It is characterized in that: the laser of high energy nanosecond pulse sees through solution irradiation when the metal targets surface; The laser irradiation energy makes when the quick superelevation of irradiated region is overheated, and the optical breakdown of solution takes place, and on target/solution interface, produces bubble; Its surperficial barometric gradient can form high-velocity liquid jet when bubble is crumbled and fall, and target is produced the pulsatile impact effect of bubble cavitation.
The Photoelectrochemicalthree three-dimensional processing method of above-mentioned laser bubble cavitation is characterized in that: the liquid crystal display that employing can be shown by the computer control figure is as mask plate.This liquid crystal mask can demonstrate the figure that has gray feature, utilizes in the figure each regional gray scale difference to the difference of laser transmittance, realizes the spatial modulation to the laser facula energy distribution.Thereby make the laser beam that sees through become the hot spot that forms anti-phase with liquid crystal mask figure, and the distribution of laser energy is everywhere controlled by liquid crystal greyscale.
The Photoelectrochemicalthree three-dimensional processing method of above-mentioned laser bubble cavitation; It is characterized in that: in the compound Optical Electro-Chemistry system of processing of laser and electrochemistry, adopt the ITO electro-conductive glass as tool-electrode; It both can be used as the current loop that tool cathode constitutes electrochemical reaction; Can see through the laser beam that laser instrument sent again, guarantee the efficiently compound of laser energy and electrochemical system.Therefore; After the laser beam process liquid crystal mask spatial modulation that laser instrument sent; When being focused and seeing through ITO (indium tin oxide, tin indium oxide) electrode and electrolyte and being radiated on the metal works, the bubble cavitation effect and the electrochemical action that are produced are compound; Make workpiece material under the Optical Electro-Chemistry reagentia, be removed, realize three-dimensional etching processing.
The device of realizing the Photoelectrochemicalthree three-dimensional processing method of laser bubble cavitation comprises laser instrument, delivery optics and Compound Machining and test section.According to the direction of advance of laser beam, be followed successively by laser instrument → beam-expanding system → liquid crystal mask plate → focusing system → conductive glass electrode → electrolyte → workpiece.Compound Machining and test section are made up of conductive glass electrode, workpiece, processing cavity, workbench, electrolyte, voltmeter, ammeter, electrochemistry processing power source; The negative pole of electrochemistry processing power source links to each other with electro-conductive glass as negative electrode, and the series current table detects processing electric current between them; The positive pole of power supply links to each other voltmeter and the parallelly connected detection of workpiece and electro-conductive glass machining voltage with workpiece as anode.Wherein, conductive glass electrode is that laser energy and electrochemical action intercouple, and realizes the critical component of Optical Electro-Chemistry reaction.
A kind of Photoelectrochemicalthree three-dimensional processing method of laser bubble cavitation, realize by following technical scheme:
(1) adopt the liquid crystal display that can show by computer control gray scale figure as mask plate, according to the control instruction of required forming requirements design display graphics, and the computer that its input control liquid crystal display is shown.
(2) want the technological parameter such as size Selection laser energy, beam diameter of the degree of depth, the machining area of machining shape according to surface of the work.
(3) regulate the focal length of beam-expanding system according to the damaging thresholding of laser energy and liquid crystal display.
(4) regulate the focal length of focusing system according to the appearance and size of surface of the work working position.
(5) laser that sends of laser instrument is undertaken arriving liquid crystal mask after the energy process by beam-expanding system, because mask graph has gray feature, promptly the different parts gray scale of figure is different, and is also different to the transmitance of laser beam, realizes the adjustment of Spatial Energy Distribution of Laser Beam.The laser that sees through liquid crystal mask becomes the hot spot with gray scale graphic feature, and the figure that spot pattern and liquid crystal mask show forms inverse relation, and final laser beam is imaged on surface of the work by focusing system again.
(6) workpiece to be machined is installed in the processing cavity, and the ITO conductive glass electrode is fixed on the workpiece top.Workpiece and electrochemistry processing power source positive pole are linked to each other, and electro-conductive glass links to each other with power cathode, and adding voltmeter and ammeter are used to detect machining state in the circuit, thereby constitutes the electrochemistry system of processing.
(7) after circuit connects, start cell liquor pump and in processing cavity, charge into electrolyte, the circulating between electrode of the glass substrate of submergence workpiece to ITO electrode, and maintenance electrolyte fully.Laser beam sees through the ITO conductive glass electrode through delivery optics, and shines surface of the work after passing electrolyte; The energising of electrochemistry processing power source, the surface of the work machining area issues third contact of a total solar or lunar eclipse electrochemical reaction in the laser irradiation effect.Under the adjustment of liquid crystal mask gray scale figure, the zone that laser energy is high, the bubble cavitation effect is strong, and the Optical Electro-Chemistry reaction speed is fast, and it is big that erosion removes amount; The zone that energy is low, a little less than the bubble cavitation effect, the Optical Electro-Chemistry reaction speed is slow, and it is little that erosion removes amount, finally realizes the Photoelectrochemicalthree three-dimensional processing of laser bubble cavitation.
The present invention has following technical advantage:
(1) but the liquid crystal display that in the delivery optics of laser, adopts the display gray scale figure as mask plate; Utilize the gray scale difference of figure different to the transmitance of laser beam; Can realize the adjustment of the space of laser beam energy distribution, i.e. the dark more position of gray scale, the laser beam energy that sees through is few more; The position that gray scale is shallow more, the laser beam energy that sees through is just many more.When the laser beam through the Energy distribution adjustment was radiated at surface of the work, the regional reaction speed that energy is high was fast, and it is big that the material erosion removes amount; The regional reaction speed that energy is low is slow, and it is little that erosion removes amount, can process the different solid figure of the depth, thereby realizes the three-dimensional processing of Optical Electro-Chemistry reaction.
(2) owing to the figure that liquid crystal mask showed can be controlled with computer; When the figure of required processing changes; Needn't make mask plate in addition; Only need to revise the control instruction of computer, just can change mask graph fast, realize the laser electrochemistry Compound Machining of various complex figures.Machining area is effectively controlled by the high-resolution laser that sees through liquid crystal mask, and the various figures of processing that therefore just can be convenient, flexible when shortening the mask manufacture cycle, have guaranteed the precision and the efficient of processing.
(3) with the tool cathode of ITO conductive glass electrode, just can in the electrolyte between instrument and the workpiece, form electric field behind the power turn-on as electrochemistry processing; While can also see through and have the high energy laser beam of mask graph, thereby guarantees the efficient coupling of laser energy and electrochemical action, realizes that the material of area to be machined on the workpiece is removed.
Description of drawings
Fig. 1 is the Photoelectrochemicalthree three-dimensional processing method schematic block diagram of laser bubble cavitation.
Fig. 2 is the oval three-dimensional pit instance that processes, and gradually changes along working depth on the transverse direction.
Label title among Fig. 1: 1, laser instrument, 2, laser beam 3, beam-expanding system, 4, liquid crystal mask, 5, focusing system; 6, ITO conductive glass electrode, 7, nonlinear electrolyte, 8, workpiece, 9, processing cavity; 10, workbench, 11, voltmeter, 12, ammeter; 13, electrochemistry processing power source, 14, control signal, 15, computer.
The specific embodiment
Embodiment: specify working condition of the present invention and embodiment below in conjunction with Fig. 1.
The device of implementing this method comprises laser instrument 1, delivery optics and Compound Machining and the test section that links to each other successively.Delivery optics comprises: beam-expanding system 3, liquid crystal mask 4, focusing system 5 and ITO conductive glass electrode 6; Compound Machining and test section are made up of conductive glass electrode 6, workpiece 8, processing cavity 9, workbench 10, voltmeter 11, ammeter 12 and processing power source 13.
The laser instrument produce power is the laser beam 2 of 5 nanoseconds, wavelength 1064 nanometers in 0.1～erg-ten, burst length, and the facular model of laser is selected basic mode or multimode.Laser action is to control the zone of action of Optical Electro-Chemistry reaction, improves kinetic current and reaction speed, and is therefore less demanding to power density, thereby reduced the cost of equipment of laser instrument, and can improve the efficient of processing.
The laser beam 2 that laser instrument sends makes its energy density be lower than the damaging thresholding of liquid crystal display after beam-expanding system is handled, and has just overcome the flimsy defective of mask after the laser radiation; What simultaneously liquid crystal display showed is the amplification figure of machining shape, can avoid processing live width and hour produce diffraction very much and make machining shape smudgy.Liquid crystal display is selected the transmissive twisted nematic LCD panel for use, and the laser beam that laser instrument sends is 2.5J/cm to the damaging thresholding of this liquid crystal display
2Laser beam is radiated on the liquid crystal mask 4; Gray-scale displayed figure and manuscript form inverse correlation system on the liquid crystal display; Be that the position that need not process in the graphics processing shows black on liquid crystal display; Need the position of processing to be colourless, the more shallow position of working depth shows light color, and the darker position of working depth shows dark.Laser beam forms energy density and the corresponding to figure hot spot of surface of the work graphics processing after passing through the different liquid crystal mask figure of each position gray scale.Then utilize focusing system 5 that laser beam is assembled, make that spot diameter dwindles, energy density improves, and see through ITO conductive glass electrode 6 and the nonlinear electrolyte 7 that circulates, finally be radiated at surface of the work.Greater than 85%, resistivity is 1～5 * 10 to the ITO electro-conductive glass of conduction printing opacity to the transmitance of laser
-4Ω/cm.
The circuit of electrochemistry processing part connects and comprises that workpiece 8 links to each other with the positive pole of processing power source 13, and the series current table is used to detect processing electric current between them; Conductive glass electrode 6 links to each other with the negative pole of power supply 13, keeps the distance of 2～3mm between electro-conductive glass and the workpiece, and voltmeter and the parallelly connected detection of workpiece and electro-conductive glass machining voltage utilize voltmeter and ammeter just can detect the various states of process.The NaNO of the solution service property (quality) concentration 10%～15% of Optical Electro-Chemistry reaction
3Electrolyte, the glass substrate of the complete submergence workpiece of electrolyte to ITO electrode, and keep electrolyte circulating between workpiece and electrode.
After the electrochemistry processing power source energising, the surface of the work machining area is under the compound action of bubble cavitation effect that laser irradiation causes and electrochemical reaction, and the reagentia of workpiece material generation Optical Electro-Chemistry is removed, and realizes that three-dimensional etching processes.The pulse frequency of processing power source is 1kHz～10kHz, and voltage magnitude is 5V.Under the adjustment of liquid crystal mask gray scale figure, the zone that laser energy is high, electrochemical reaction rates is fast, and it is big that the erosion of workpiece material removes amount; The zone that energy is low, electrochemical reaction rates is slow, and it is little that the erosion of workpiece material removes amount, can process the different three-dimensional shape of each position depth, thereby realize the liquid crystal mask 3-D graphic processing based on the Optical Electro-Chemistry reaction.Fig. 2 is exactly the oval three-dimensional pit instance that processes, and can find out gradually changing along working depth on the direction of transverse.
Control section is mainly accomplished the commands for controlling that the liquid crystal mask figure is shown, and the control of the switch of the motion control of workbench and electrochemistry processing power source.For the bigger figure of appearance and size; Both can adopt after beam-expanding system is handled larger-diameter hot spot repeatedly to process; Also can adopt the high-octane laser beam subregion processing of minor diameter, through moving of control workbench, the zone processes successively one by one; The graphics shape that processes is clear, and has the 3 D stereo characteristic.
Claims (2)
1. the Photoelectrochemicalthree three-dimensional processing method of a laser bubble cavitation; The Optical Electro-Chemistry reaction that utilizes laser to cause at electrode surface irradiation realizes the removal processing of workpiece material; It is characterized in that: the laser beam that laser instrument sent is through seeing through solution irradiation when metal works is surperficial behind the mask plate; Cause the solution optical breakdown to produce bubble; The crumble and fall pulse shock effect and the electrochemical reaction that form bubble cavitation of bubble is compound, makes workpiece material under the Optical Electro-Chemistry reagentia, be removed, and realizes that etching processes; Mask plate adopts the liquid crystal display that is shown by computer control gray scale figure, can utilize in the figure each regional gray scale difference that the difference of laser transmittance is realized the spatial modulation to the laser facula energy distribution; The high zone of laser irradiation energy on the workpiece, the bubble cavitation effect is strong, and the Optical Electro-Chemistry reaction speed is fast, and it is big that erosion removes amount; The zone that energy is low, a little less than the bubble cavitation effect, the Optical Electro-Chemistry reaction speed is slow, and it is little that erosion removes amount, thereby realize Photoelectrochemicalthree three-dimensional processing; The figure that the liquid crystal display mask shows is controlled with computer; When the figure of required processing changes, needn't make mask plate in addition, only need to revise the control instruction of computer; Just can change mask graph fast, realize the Optical Electro-Chemistry Compound Machining of various complex figures.
2. the Photoelectrochemicalthree three-dimensional processing method of a kind of laser bubble cavitation according to claim 1; It is characterized in that: the optical maser wavelength that laser instrument sent is 1064 nanometers; Burst length was 5 nanoseconds, and laser energy is 0.1～erg-ten, and facular model is basic mode or multimode.
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| CN101856753B true CN101856753B (en) | 2012-08-15 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4283259A (en) * | 1979-05-08 | 1981-08-11 | International Business Machines Corporation | Method for maskless chemical and electrochemical machining |
| US4608138A (en) * | 1984-02-16 | 1986-08-26 | Mitsubishi Denki Kabushiki Kaisha | Electrolytic method and apparatus |
| DE19503983A1 (en) * | 1995-02-07 | 1996-08-08 | Koenen Gmbh | Laser-perforated metal mask prodn. esp. for SMD technology |
| CN1919514A (en) * | 2006-09-18 | 2007-02-28 | 南京航空航天大学 | Spraying liquid bunch electrolysis-laser composite processing method and apparatus thereof |
| CN101249580A (en) * | 2008-03-14 | 2008-08-27 | 江苏大学 | Electrochemistry-laser mask focusing micro etch method for processing and device thereof |
-
2010
- 2010-04-27 CN CN 201010158801 patent/CN101856753B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4283259A (en) * | 1979-05-08 | 1981-08-11 | International Business Machines Corporation | Method for maskless chemical and electrochemical machining |
| US4608138A (en) * | 1984-02-16 | 1986-08-26 | Mitsubishi Denki Kabushiki Kaisha | Electrolytic method and apparatus |
| DE19503983A1 (en) * | 1995-02-07 | 1996-08-08 | Koenen Gmbh | Laser-perforated metal mask prodn. esp. for SMD technology |
| CN1919514A (en) * | 2006-09-18 | 2007-02-28 | 南京航空航天大学 | Spraying liquid bunch electrolysis-laser composite processing method and apparatus thereof |
| CN101249580A (en) * | 2008-03-14 | 2008-08-27 | 江苏大学 | Electrochemistry-laser mask focusing micro etch method for processing and device thereof |
Non-Patent Citations (2)
| Title |
|---|
| 谢兴盛等.半导体激光诱导液相腐蚀精度的提高.<<激光加工>>.2006,第43卷(第11期), * |
| 龙芋宏等.准分子激光电化学刻蚀金属的研究.《光学技术》.2008,第34卷 * |
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