CN101853114A - 设有电极的电容触摸屏及其制造方法 - Google Patents
设有电极的电容触摸屏及其制造方法 Download PDFInfo
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- CN101853114A CN101853114A CN201010178253A CN201010178253A CN101853114A CN 101853114 A CN101853114 A CN 101853114A CN 201010178253 A CN201010178253 A CN 201010178253A CN 201010178253 A CN201010178253 A CN 201010178253A CN 101853114 A CN101853114 A CN 101853114A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 238000000034 method Methods 0.000 claims abstract description 28
- 238000005516 engineering process Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims description 38
- 238000000576 coating method Methods 0.000 claims description 38
- 238000009413 insulation Methods 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 24
- 238000007639 printing Methods 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 230000035699 permeability Effects 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 239000002002 slurry Substances 0.000 claims description 4
- 238000009500 colour coating Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 22
- 230000008569 process Effects 0.000 abstract description 11
- 230000001681 protective effect Effects 0.000 abstract 2
- 238000003384 imaging method Methods 0.000 abstract 1
- 239000002861 polymer material Substances 0.000 abstract 1
- 230000006698 induction Effects 0.000 description 17
- 239000000243 solution Substances 0.000 description 14
- 239000005341 toughened glass Substances 0.000 description 13
- 230000008878 coupling Effects 0.000 description 12
- 238000010168 coupling process Methods 0.000 description 12
- 238000005859 coupling reaction Methods 0.000 description 12
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 239000010432 diamond Substances 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000012905 input function Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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CN 201010178253 CN101853114B (zh) | 2010-05-18 | 2010-05-18 | 设有电极的电容触摸屏及其制造方法 |
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CN101853114A true CN101853114A (zh) | 2010-10-06 |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102096537A (zh) * | 2011-03-18 | 2011-06-15 | 深圳南玻显示器件科技有限公司 | 电容式触摸屏的加工方法 |
CN102096536A (zh) * | 2010-12-31 | 2011-06-15 | 晟光科技股份有限公司 | 一种单面结构的触摸屏 |
CN102236492A (zh) * | 2011-08-16 | 2011-11-09 | 深圳市宝明科技股份有限公司 | 一种ito过桥电容触摸屏及制造方法 |
CN102279682A (zh) * | 2011-08-30 | 2011-12-14 | 深圳市豪威薄膜技术有限公司 | 新型电容式触摸屏及其制造方法和触摸屏终端 |
CN102331894A (zh) * | 2011-09-27 | 2012-01-25 | 利信光学(苏州)有限公司 | 一种电容式触摸屏结构 |
CN102455819A (zh) * | 2010-10-26 | 2012-05-16 | 乐金显示有限公司 | 触摸屏面板及其制造方法 |
CN102566839A (zh) * | 2010-12-30 | 2012-07-11 | 东莞联胜液晶显示器有限公司 | 表面电容式触控面板及其制造方法 |
CN102830884A (zh) * | 2012-09-14 | 2012-12-19 | 常州裕成光电有限公司 | 电容式触摸屏传感器 |
CN103226419A (zh) * | 2012-09-25 | 2013-07-31 | 中科企业发展(宁德)股份有限公司 | 一种fto导电玻璃用于二屏合一触摸屏的生产方法 |
CN103257762A (zh) * | 2012-01-05 | 2013-08-21 | 矽统科技股份有限公司 | 投射电容式触控面板 |
CN104166476A (zh) * | 2014-07-28 | 2014-11-26 | 京东方科技集团股份有限公司 | 触控显示面板及其控制方法、触控显示装置 |
CN104317471A (zh) * | 2014-11-27 | 2015-01-28 | 中环高科(天津)股份有限公司 | 一种低成本制作电容触摸屏玻璃双层图案功能片的方法 |
TWI499952B (zh) * | 2013-08-08 | 2015-09-11 | Innolux Corp | 陣列基板及應用其之顯示面板 |
CN108776558A (zh) * | 2018-08-08 | 2018-11-09 | 意力(广州)电子科技有限公司 | 触控传感器的制作方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1361465A (zh) * | 2000-12-28 | 2002-07-31 | 国际竞争力股份有限公司 | 触控屏线性图案的制造方法 |
CN101271373A (zh) * | 2008-04-03 | 2008-09-24 | 中山微视显示器有限公司 | 非接触式电容感应触摸屏 |
CN201266369Y (zh) * | 2008-06-12 | 2009-07-01 | 比亚迪股份有限公司 | 一种电容式触摸屏 |
CN101692193A (zh) * | 2009-09-07 | 2010-04-07 | 苏州超联光电有限公司 | 电容式触摸屏及其制造方法 |
-
2010
- 2010-05-18 CN CN 201010178253 patent/CN101853114B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1361465A (zh) * | 2000-12-28 | 2002-07-31 | 国际竞争力股份有限公司 | 触控屏线性图案的制造方法 |
CN101271373A (zh) * | 2008-04-03 | 2008-09-24 | 中山微视显示器有限公司 | 非接触式电容感应触摸屏 |
CN201266369Y (zh) * | 2008-06-12 | 2009-07-01 | 比亚迪股份有限公司 | 一种电容式触摸屏 |
CN101692193A (zh) * | 2009-09-07 | 2010-04-07 | 苏州超联光电有限公司 | 电容式触摸屏及其制造方法 |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102455819A (zh) * | 2010-10-26 | 2012-05-16 | 乐金显示有限公司 | 触摸屏面板及其制造方法 |
CN102455819B (zh) * | 2010-10-26 | 2015-11-25 | 乐金显示有限公司 | 触摸屏面板及其制造方法 |
KR101779594B1 (ko) | 2010-10-26 | 2017-09-19 | 엘지디스플레이 주식회사 | 터치 스크린 패널과 이의 제조방법 |
CN102566839A (zh) * | 2010-12-30 | 2012-07-11 | 东莞联胜液晶显示器有限公司 | 表面电容式触控面板及其制造方法 |
CN102096536A (zh) * | 2010-12-31 | 2011-06-15 | 晟光科技股份有限公司 | 一种单面结构的触摸屏 |
CN102096537B (zh) * | 2011-03-18 | 2013-04-10 | 深圳南玻显示器件科技有限公司 | 电容式触摸屏的加工方法 |
CN102096537A (zh) * | 2011-03-18 | 2011-06-15 | 深圳南玻显示器件科技有限公司 | 电容式触摸屏的加工方法 |
CN102236492B (zh) * | 2011-08-16 | 2012-07-18 | 深圳市宝明科技股份有限公司 | 一种ito过桥电容触摸屏及制造方法 |
CN102236492A (zh) * | 2011-08-16 | 2011-11-09 | 深圳市宝明科技股份有限公司 | 一种ito过桥电容触摸屏及制造方法 |
CN102279682A (zh) * | 2011-08-30 | 2011-12-14 | 深圳市豪威薄膜技术有限公司 | 新型电容式触摸屏及其制造方法和触摸屏终端 |
CN102331894A (zh) * | 2011-09-27 | 2012-01-25 | 利信光学(苏州)有限公司 | 一种电容式触摸屏结构 |
TWI467460B (zh) * | 2012-01-05 | 2015-01-01 | Silicon Integrated Sys Corp | 投射電容式觸控面板 |
CN103257762A (zh) * | 2012-01-05 | 2013-08-21 | 矽统科技股份有限公司 | 投射电容式触控面板 |
CN102830884A (zh) * | 2012-09-14 | 2012-12-19 | 常州裕成光电有限公司 | 电容式触摸屏传感器 |
CN103226419A (zh) * | 2012-09-25 | 2013-07-31 | 中科企业发展(宁德)股份有限公司 | 一种fto导电玻璃用于二屏合一触摸屏的生产方法 |
TWI499952B (zh) * | 2013-08-08 | 2015-09-11 | Innolux Corp | 陣列基板及應用其之顯示面板 |
CN104166476A (zh) * | 2014-07-28 | 2014-11-26 | 京东方科技集团股份有限公司 | 触控显示面板及其控制方法、触控显示装置 |
CN104317471A (zh) * | 2014-11-27 | 2015-01-28 | 中环高科(天津)股份有限公司 | 一种低成本制作电容触摸屏玻璃双层图案功能片的方法 |
CN108776558A (zh) * | 2018-08-08 | 2018-11-09 | 意力(广州)电子科技有限公司 | 触控传感器的制作方法 |
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Assignee: Shanghai Uiworks Electronic Tech. Co., Ltd. Assignor: Cheng Shuyi Contract record no.: 2011310000010 Denomination of invention: Capacitive touch screen with electrodes and manufacturing method thereof License type: Exclusive License Open date: 20101006 Record date: 20110221 |
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