CN101840156A - Substrate board treatment - Google Patents
Substrate board treatment Download PDFInfo
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- CN101840156A CN101840156A CN201010143420A CN201010143420A CN101840156A CN 101840156 A CN101840156 A CN 101840156A CN 201010143420 A CN201010143420 A CN 201010143420A CN 201010143420 A CN201010143420 A CN 201010143420A CN 101840156 A CN101840156 A CN 101840156A
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- substrate
- pallet
- retaining member
- top roll
- roll
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a kind of substrate board treatment, can prevent the turning axle distortion of this roller when substrate transmits the temperature rising of using roller.This substrate board treatment comprises: clamping substrate and the lower roll, first top roll and second top roll that transmit; Keep each roller and make each roller rotation roller maintaining body freely; Fluid ejection mechanism towards the upper surface ejecting fluid of the substrate that is transmitted; Convection cell ejection mechanism supplies with the fluid supply mechanism of fluid.The roller maintaining body comprises: separate in two outsides of substrate certain intervals relatively to first pallet and second pallet, this first pallet keeps an end of lower roll and makes this end rotation freely, this second pallet keeps the other end of lower roll, and makes this other end rotation can displacement freely and on axis direction; First retaining member, it is supported by first pallet, and keeps first top roll and make first top roll rotation freely; Second retaining member, it is supported by second pallet, and keeps second top roll and make second top roll rotation freely.
Description
Technical field
The present invention relates to a kind of substrate board treatment that transmits substrate and simultaneously its upper surface supply fluid is handled this substrate.
Background technology
The step that coating developer solution or etching solution, photoresistance stripper are for example arranged in the manufacturing step of substrate, in described step, for example in process chamber, transmit substrate and simultaneously the upper surface of this substrate is supplied with developer solution or etching solution, photoresistance stripper towards the direction of transfer of regulation.
And as employed base plate transfer device in the described step, previously known for example has disclosed transfer roller device in the Japanese patent laid-open 2-144312 communique.This transfer roller device comprises: be configured in the substrate downside and support the lower roll of this substrate; Be configured in the substrate upside and push the top roll of this substrate; Make lower roll and top roll rotary drive mechanism towards mutually different direction rotation; Support lower roll and top roll and make described lower roll and top roll rotation pallet freely.
Described lower roll and top roll have the turning axle that is parallel to each other respectively, are set with the driven wheel that drives by the drive source rotation at an end of the turning axle of lower roll, are set with first transmission gear at the other end.On the other hand, be set with second transmission gear with first transmission gear engagement of lower roll at an end of the turning axle of top roll.Make driven wheel when rotation by drive source, the lower roll rotation, and utilize each transmission gear that revolving force is passed to top roll and make this top roll rotation, thus the direction of transfer of substrate towards regulation transmitted.
Described pallet comprises the member of the other end of the turning axle of the member of an end of the turning axle that supports each roller and each roller of supporting, described member relative with devices spaced apart on the vertical direction of the direction of transfer of substrate to.Be formed with the Embedded Division of the U word shape that top formed by otch on the described member respectively, embed the sleeve at the two ends that each turning axle that is arranged on lower roll and top roll is arranged in this Embedded Division respectively.In addition, be formed with flange part respectively, by the opposite face of described flange part with each member of pallet engaged, and locate each roller respectively with respect to pallet in the end of the central authorities of the close turning axle of each sleeve.
[patent documentation 1] Japanese patent laid-open 2-144312 communique
In addition, treating fluids such as described developer solution or etching solution, photoresistance stripper are heated to uniform temperature effectively to carry out processing substrate.Therefore, supply to that treating fluid on the substrate contacts with lower roll or top roll and, and because this treating fluid rises the environment temperature in the process chamber, the environment that rises because of this temperature heats lower roll or top roll with lower roll or top roll heating.
In addition, in the described previous transfer roller device, because of the flange part of each sleeve engages with the opposite face of each member of pallet, even thereby lower roll or top roll heated and temperature rises, the turning axle of each roller also can't extend.Therefore, if the temperature of lower roll or top roll rises, then can produce the turning axle distortion of described lower roll or top roll and crooked, can't transmit the problem of substrate as the crow flies, or the reason power that acts on substrate in the bending of turning axle causes the problem of substrate fracture towards prescribed direction.
In addition, the substrate of process object maximizes in recent years, follows in this, and it is very long that the turning axle of lower roll or top roll becomes.Therefore, the elongation of this turning axle is also bigger when the turning axle of lower roll or top roll carries out thermal walking, thereby the problems referred to above occur more significantly.In addition, lower roll or top roll etc. usually are made of the vestolit of chemical-resistant excellence, at this moment, because of the linear expansion coefficient of vestolit than metal material etc. greatly, so the elongation during thermal expansion becomes very big.
Summary of the invention
The present invention is in view of above actual conditions, and its purpose is to provide a kind of substrate board treatment that can prevent the turning axle distortion of this roller when substrate transmits the temperature rising of using roller.
Be used to realize that the present invention of above-mentioned purpose is a kind of substrate board treatment,
It is to transmit substrate and simultaneously the upper surface of this substrate is supplied with the device that fluid is handled this substrate, comprising:
Substrate transfer mechanism, it transmits by following lower roll and the described substrate of each top roll clamping, comprise: a plurality of lower rolls, they have the turning axle vertical with the direction of transfer of described substrate respectively, and are set up in parallel below described substrate to support this substrate along this direction of transfer; First top roll and second top roll, they have the turning axle with the rotating shaft parallel of described lower roll, and be configured in the top of at least one described lower roll, described first top roll is pushed an end of the Width of described substrate, and described second top roll is pushed the other end of the Width of described substrate; Rotary drive mechanism, its turning axle at least one described lower roll drive and make its rotation;
The roller maintaining body, it keeps described each roller, and makes described each roller rotation freely;
Fluid ejection mechanism, it is configured in the top of the substrate that is transmitted by described substrate transfer mechanism, and towards the upper surface ejecting fluid of this substrate;
Fluid supply mechanism, it sprays mechanism to described fluid and supplies with fluid;
Supporting device, it supports described fluid ejection mechanism, and this substrate board treatment is characterised in that,
Described roller maintaining body comprises: flat first pallet and second pallet, they separate certain intervals and slenderly form on the direction of transfer of ground at described substrate relatively in two outsides of described substrate, this first pallet keeps an end of the turning axle of described lower roll, and make this end rotation freely, this second pallet keeps the other end of the turning axle of described lower roll, and makes the rotation of this other end can displacement freely and on axis direction; First retaining member, it is supported by described first pallet, and keeps the turning axle of described first top roll and make the rotation of this turning axle freely; Second retaining member, it is supported by described second pallet, and keeps the turning axle of described second top roll and make the rotation of this turning axle freely;
Described first pallet and second pallet constitute first Embedded Division that has the U word shape that top formed by otch respectively, and can embed described first retaining member and second retaining member in this first Embedded Division with loading and unloading,
The two side of described each first Embedded Division, and the corresponding part in the two side with described first Embedded Division of the outside surface of each retaining member on, with along the vertical direction and mode that can be chimeric mutually a square one-tenth is fluted and be formed with projection the opposing party therein
Described each retaining member constitutes, and makes described groove and projection tabling and is embedded into described first Embedded Division, and can move up at upper and lower under the state of described groove and projection tabling.
According to this invention, at least one of lower roll driven and is rotated by rotary drive mechanism, and the substrate of process object is by lower roll and each top roll clamping and along the transmission of regulation direction of transfer.At this moment, by the fluid that supplies to fluid ejection mechanism from fluid supply mechanism and spray, the substrate of described transmission is implemented predetermined processing from this fluid ejection mechanism.
And, in the time will being heated to set point of temperature from the fluid that fluid sprays mechanism ejection, if carry out processing substrate, then lower roll or top roll are heated because of the fluid that is sprayed, but among the present invention, since by second pallet with the supporting of the other end of the turning axle of lower roll for can displacement on its axis direction, even the therefore turning axle temperature of lower roll rising is also allowed by the rise elongation of caused turning axle of this temperature.In addition, constitute top roll by first top roll of an end of pushing substrate and second top roll of pushing the other end of substrate, and utilize first retaining member to keep first top roll respectively by the supporting of first pallet, utilization keeps second top roll by second retaining member of second pallet supporting, therefore, can not limit by the rise elongation of caused turning axle of this temperature even the turning axle temperature of each top roll rises yet.
Therefore, among the present invention, the turning axle of described roller can extend when each roll temperature rises, and therefore can prevent the turning axle distortion and bending.Thus, can prevent to produce the problem that substrates such as can't transmitting substrate, substrate fracture towards prescribed direction as the crow flies transmits.
In addition, during each top roll of removal, only get final product from first each retaining member of Embedded Division removal when safeguarding etc., this operation is easy.On the other hand, when each top roll is installed, only in the mode of groove and projection tabling each retaining member is embedded into first Embedded Division and gets final product, this operation is easy, and can install with high installation accuracy by the chimeric of groove and projection.
In addition, described each top roll can comprise a roller main body respectively; Described lower roll constitutes has a plurality of roller main bodys on the axis direction of its turning axle, and in the described roller main body, the position the roller main body at two ends relative up and down with the roller main body of described each top roll to; At least for the roller main body of described second top roll and described lower roll with the corresponding roller main body of second top roll, the outer peripheral face of one of them roller main body can form semicircle, the outer peripheral face of another roller main body can form the tabular surface with certain width.
Usually, the outer peripheral face of the roller main body of each roller forms semicircle.At this moment, transmit, then can produce following problem as if utilizing lower roll and top roll clamping substrate.Promptly, if its turning axle elongation owing to the intensification of each roller, the position of the position of the roller main body of lower roll and the roller main body of each top roll is offset on the axis direction of turning axle, then the power of shear direction can act on substrate, is therefore caused producing the problem of substrate breakage or the problem that substrate is transmitted having many bends or curvesly by the power of described shear direction.
In addition, because is can displacement on axis direction by second pallet with the supporting of the other end of the turning axle of lower roll, therefore the roller main body of first top roll and lower roll corresponding to the offset of the roller main body of first top roll and little, and the situation of this offset also can not be considered in existence.
Therefore, as mentioned above, at least for the roller main body of second top roll and lower roll with the corresponding roller main body of second top roll, if make the outer peripheral face of one of them roller main body become semicircle, and the outer peripheral face that makes another roller main body becomes the tabular surface of certain width, even the then turning axle of roller elongation, and the position corresponding to the roller main body of second top roll of the position of the roller main body of second top roll and lower roll is offset on the axis direction of turning axle, can be that the roller main body of tabular surface bears by outer peripheral face by outer peripheral face also is that semicircular roller subjective role is in the power of substrate.Thus, can prevent that the masterpiece that produces shear direction is used for substrate and causes producing the problem of substrate breakage or the problem that substrate is transmitted having many bends or curvesly.
In addition, under the roller up and down with described lower roll and each top roll is set at situation less than the thickness of described substrate at interval, can between described projected front ends and the groove, and the peristome of the root of described projection and groove between be formed with the gap respectively, and can be between described each retaining member and first Embedded Division, the lower side of described groove or below be formed with the interconnecting part that described gap is communicated with space outside described first Embedded Division respectively.
From fluid ejection mechanism ejection treating fluid the time, difference according to this form, the treating fluid of ejection is fallen each retaining member or each pallet and is entered between groove and the projection, this treating fluid that enters does not flow out to the outside and crystallization, and the crystallization that is produced anchors at the inside surface of groove or the outside surface of projection.On the other hand, in the time of between substrate is by lower roll and each top roll, each retaining member and each top roll move by groove and protrusion directs and towards the top.Then, when the treating fluid crystallization and during set, groove and projection are difficult to relatively move and each retaining member is difficult to move towards the top, therefore in the time of between substrate is by lower roll and each top roll, one side or the both sides of each retaining member do not rise, masterpiece is used for substrate, and becomes the reason of substrate fracture or the reason of shortcoming.
Therefore, as mentioned above, if between projected front ends and the groove, and the peristome of the root of projection and groove between be formed with the gap, and between the retaining member and first Embedded Division, the lower side of groove or below be formed with the interconnecting part that described gap is communicated with space outside first Embedded Division, then can make the liquid that flow between groove and the projection via gap and interconnecting part and flow out to effectively outside first Embedded Division.Thus, can prevent to spray the treating fluid crystallization of mechanism's ejection and anchor at the inside surface of groove or the outside surface of projection from fluid.Therefore, in the time of between substrate is by lower roll and each top roll each retaining member is risen reliably, thereby can prevent to produce problems such as substrate fracture, substrate shortcoming.
In addition, described each retaining member can have the hammer that is used for pushing with predefined load described substrate respectively.When substrate being applied the higher load of load that the weight of Billy with the weight of first retaining member and the first top roll integral body or second retaining member and the second top roll integral body can apply, also can use spring, this spring is made of metal usually, need coat because of chemical-resistant is relatively poor.Therefore, also easy if put on the load of substrate than coating spring even then hammer is coated by hammer adjustment, in addition,, then hammer can be set simply if the formation hammer is accommodated the accepting hole of usefulness and hammer is housed in this accepting hole in each retaining member.At this moment, be difficult to be subjected to then also can especially hammer not coated and be provided with if the formation position of accepting hole is made as the side etc. of the opposition side of the substrate-side of each retaining member for example from the position of the influence of the fluid of fluid ejection mechanism ejection.
In addition, preferably, the end of the weight of the hammer of described first retaining member for pushing described substrate with the load of 5N～35N by the weight of described first retaining member and the first top roll integral body, the weight of the hammer of described second retaining member is for pushing the other end of described substrate by the weight of described second retaining member and the second top roll integral body with the load of 5N～35N.
When to pushing the required load of substrate when setting, for example must consider from the kind of the fluid of fluid ejection mechanism ejection, the surface state (for example surfaceness or wettability etc.), the reacting force (pushing back the power of substrate) etc. of impulsive force when touching substrate of kind (for example whether containing interfacial agent etc.), substrate size, substrate of this soup when the fluid from the ejection of fluid ejection mechanism is soup based on fluid from the ejection of fluid ejection mechanism.Wherein, must consider that the reason of the kind of fluid is, if the fluid of ejection is gas, pure water or soup, then roller becomes according to the order of gas, pure water and soup and skids easily and dally, in addition, must consider that the reason of reacting force is, for example when ejection gas removes liquid, when the emission direction with gas is set at respect to the substrate direction of transfer in the other direction and when tiltedly descending direction, it is big especially that reacting force becomes.Then, if make describedly according to described viewpoint, then can transmit substrate reliably and can not produce any bad hammer out for as mentioned above.In addition, in the power of pushing substrate during less than 5N, top roll or lower roll idle running and reliable substrate transmitted to produce hinder, in the power of pushing substrate during greater than 35N, it is bad to produce substrate fracture etc.
In addition, also can be, this end of supporting is set in an end of the turning axle of described lower roll and makes this end rotation clutch shaft bearing freely, and this other end of supporting is set in the other end of the turning axle of described lower roll and makes this other end rotation second bearing freely, first Embedded Division at described first pallet, form the part that described clutch shaft bearing can be embedded with loading and unloading at its downside, and side forms the part that described first retaining member can be embedded with loading and unloading thereon, first Embedded Division at described second pallet, form the part that described second bearing is embedded in the mode that can load and unload and can move on axis direction at its downside, and side forms the part that described second retaining member can be embedded with loading and unloading thereon, have on the part of described each retaining member embedding at least of described first Embedded Division, form described groove or projection, on the described clutch shaft bearing or first pallet, be provided with the mobile limiting member that limits of this clutch shaft bearing on axis direction.
Thus, lower roll also can load and unload with respect to first Embedded Division, so when safeguarding etc., similarly can load and unload lower roll easily with each retaining member and each top roll.In addition, the lower roll of temporary transient removal can be installed on each pallet accurately.
In addition, the embedding of first Embedded Division of described each pallet have described each bearing part, and embed and have between the part of described each retaining member, the distance piece that the height and position of described each top roll is positioned in order to the lower end that is connected to described each retaining member can be set respectively.
Thus, when each retaining member is embedded into first Embedded Division, can limit each retaining member moving by distance piece towards the below, and each retaining member is arranged on the height and position of regulation, therefore not only can carry out the installation of each retaining member more simply, also can after the installation again of each retaining member, make the roller up and down of lower roll and each top roll become high precision at interval.
In addition, also can be, described fluid sprays mechanism and spread all over the whole width of this substrate and formation slenderly on the direction that the direction of transfer with described substrate intersects, described supporting device comprises first supporting member of an end of the length direction of the described fluid of supporting ejection mechanism, second supporting member with the other end of the length direction of the described fluid of supporting ejection mechanism, described first pallet and second pallet constitute second Embedded Division that has the U word shape that top formed by otch respectively, and can embed described first supporting member and second supporting member in this second Embedded Division with loading and unloading.
Interval between fluid ejection mechanism and the substrate is set at best interval according to contents processing, if this changes at interval, and the condition changing of processing substrate then, and can't carry out best processing substrate.Therefore, when the fluid ejection mechanism of temporary transient removal being provided with when safeguarding etc., must be adjusted in the mode that described interval becomes optimal spacing, it is loaded down with trivial details that this adjusts operation.In addition, also roughly touching with the fluid from the ejection of fluid ejection mechanism in the position of substrate direction of transfer of fluid ejection mechanism utilizes the mode of the part that lower roll supported to set, make the described fluid that sprays touch not part by lower roll supported if change this position, then under the effect of the impulsive force when the described fluid that sprays touches substrate, can produce the problem that causes handling inequality according to contents processing.Therefore, with described interval similarly, fluid ejection mechanism also must adjust in the mode that is configured in assigned position when convection cell sprays mechanism and is provided with in the position on the substrate direction of transfer, it is loaded down with trivial details that this adjusts operation.
Therefore, as mentioned above, if utilize the both ends of the length direction of each supporting members supports fluid ejection mechanism, and each supporting member is embedded into second Embedded Division, then only by each supporting member is embedded into second Embedded Division, just can with fluid spray interval between mechanism and the substrate, and the position on the substrate direction of transfer of fluid ejection mechanism become the mode fluid ejection mechanism of predetermined distance and position, be installed in well on each pallet and fluid is sprayed MECHANISM PRECISION.And, can load and unload fluid ejection mechanism simply.
In addition, at least one of second Embedded Division of described each pallet, also can embed described first supporting member or second supporting member in mode that can displacement on the length direction of described fluid ejection mechanism.
In the time will being heated to set point of temperature from the fluid that fluid supply mechanism supplies to fluid ejection mechanism, because the fluid of supplying with, fluid ejection mechanism is heated and thermal expansion.At this moment, if the thermal expansion of limit fluid ejection mechanism, then this fluid sprays deformation, and the interval between fluid ejection mechanism and the substrate becomes unfixing, and the shape of the fluid ejiction opening of fluid ejection mechanism changes.Then, if the interval between fluid ejection mechanism and substrate becomes unfixing, then produce the treatment conditions uneven problem that becomes, if the shape of fluid ejiction opening changes, then produce from the flow of the fluid of this fluid ejiction opening ejection and become inhomogeneous and can't carry out the problem of processing substrate equably.In addition, be accompanied by the maximization of substrate, the length of the length direction of fluid ejection mechanism is elongated, and therefore the elongation of length direction is bigger when fluid ejection mechanism temperature rises, and described problem occurs more significantly.In addition, when constituting fluid ejection mechanism considering chemical-resistant by vestolit, because of the linear expansion coefficient of vestolit is bigger, thereby the elongation during thermal expansion is very big.
Therefore, as mentioned above, if at least one of each supporting member is embedded into second Embedded Division in mode that can displacement on the length direction of fluid ejection mechanism, even then fluid ejection mechanism temperature rises, therefore also can on its length direction, extend, can prevent fluid ejection deformation and interval between this fluid ejection mechanism and the substrate does not become fixing or this fluid sprays the fluid ejiction opening of mechanism shape changes.Thus, can prevent to produce following problem: the interval between fluid ejection mechanism and the substrate does not become fixing and the processing substrate condition becomes that shape inhomogeneous or the fluid ejiction opening changes and the flow of the fluid that sprays from this fluid ejiction opening becomes inhomogeneous, thereby can't implement uniform processing substrate etc.
In addition, described second Embedded Division also can similarly constitute to embed with described first Embedded Division lower roll and each retaining member.
In addition, first Embedded Division of described each pallet and second Embedded Division also can form same shape.Thus, need not difference and form first Embedded Division and second Embedded Division, thereby can realize the facilitation of making.
In addition, as described processing substrate, for example can enumerate ejection gas and going of carrying out liquid is handled, ejection gas and the dried of carrying out, ejection developer solution and the development treatment of carrying out, ejection etching solution and the etch processes of carrying out, ejection photoresistance stripper and the photoresistance lift-off processing of carrying out, ejection cleaning solution and the cleaning of carrying out etc., but be not limited to described processing.In addition, as the substrate of the object of described processing, for example can enumerate silicon substrate or glass substrate etc., but be not limited to described substrate.
[invention effect]
As mentioned above, according to substrate board treatment of the present invention, can prevent the turning axle distortion of this roller when substrate transmits the temperature rising of using roller, and prevent to produce the problem in the substrate transmission.
Description of drawings
Fig. 1 is the sectional view of concise and to the point formation of the substrate board treatment of expression one embodiment of the present invention.
Fig. 2 is the sectional view of arrow A-A direction of Fig. 1.
Fig. 3 is the sectional view of arrow B-B direction of Fig. 1.
Fig. 4 is the sectional view that describes in order to the maintenance structure to lower roll, first top roll and second top roll of present embodiment.
Fig. 5 is the sectional view of arrow C-C direction of Fig. 4.
Fig. 6 is the sectional view of the arrow D-D direction of Fig. 4.
Fig. 7 is the sectional view of arrow E-E direction of Fig. 5.
Fig. 8 is the details drawing of the F part of Fig. 7.
Fig. 9 is the key diagram that expression each retaining member, distance piece, lower roll and each supporting member are embedded into the state before the Embedded Division of each pallet.
Figure 10 is the sectional view of arrow G-G direction of Fig. 3.
Figure 11 is the sectional view of the state that extends on axis direction of expression lower roll.
[symbol description]
1: substrate board treatment
21: lower roll
22,23: top roll
25: rotary driving part
33,34: pallet
35,36: Embedded Division
46,47: groove
50,51: retaining member
50d, 51d: projection
71: the gap nozzle body
72: the spray nozzle body
81,82: supporting member
Embodiment
Below, the specific embodiment of the present invention is described with reference to the accompanying drawings.
As shown in Figure 1 to Figure 3, this routine substrate board treatment 1 constitutes, and comprising: the process chamber 10 with certain internal volume; Substrate transfer mechanism 20, its by horizontal arrangement in process chamber 10 a plurality of lower rolls 21, first top roll 22 and second top roll 23 and transmit substrate K on the direction of transfer in level; Roller maintaining body 30, it is provided in the process chamber 10 and keeps each roller 21,22,23, makes each roller 21,22,23 rotation freely; Treating fluid ejection mechanism 70, it is towards the upper surface ejection treating fluid of the substrate K that is transmitted by substrate transfer mechanism 20; Treating fluid feed mechanism 75, it supplies with treating fluid to treating fluid ejection mechanism 70; Supporting device 80, it is arranged in the process chamber 10 and supports treating fluid ejection mechanism 70; The framework (not shown) of supporting process chamber 10.
As shown in Figures 1 to 4, described substrate transfer mechanism 20 is except that comprising described lower roll 21, first top roll 22 and second top roll 23, comprise also described roller 21,22,23 is driven and makes the rotary driving part 25 of their rotations that and lower roll 21, first top roll 22 and second top roll 23 are provided on the substrate direction of transfer with predetermined distance.In addition, lower roll 21 is to be provided with than each top roll 22,23 shorter interval.In addition, close configuration space at each top roll 22,23, though describe in detail herein, can be to set pushing the identical idea of the idea of the required load of substrate K when setting with described later.
Described lower roll 21 is configured in the downside of substrate K, comprising: be arranged on the turning axle 21a on the horizontal direction vertical with the substrate direction of transfer; Be arranged on the axis direction of turning axle 21a with predetermined distance and a plurality of roller main body 21b of supporting substrates K; The section that is provided with respectively on the peripheral part of the roller main body 21b that is positioned at two ends in a plurality of roller main body 21b is the ring element 21c of the rubber system of rectangle.
Described first top roll 22 and second top roll 23 are configured in the upside of substrate K coaxially, and possess identical formation respectively, comprising: dispose above it turning axle 22a, 23a abreast with the turning axle 21a of lower roll 21; Be arranged on the end of turning axle 22a, 23a and push roller main body 22b, the 23b of substrate K; The section that is arranged on the peripheral part of roller main body 22b, 23b is ring element 22c, the 23c of circular rubber system.
Directly over described each roller main body 22b, 23b are configured in lower roll 21 the described roller main body 21b that is positioned at two ends, come clamping substrate K by described roller main body 21b, 22b, 23b.In addition, the roller up and down of each roller main body 22b, 23b and roller main body 21b is set at the thickness less than substrate K at interval.In addition, described each ring element 21c, 22c are set, 23c transmits substrate K reliably in order to improve holding force.
Described rotary driving part 25 comprises: first transmission gear 26, and it is fixedly installed on the two ends of lower roll 21 respectively; Second transmission gear 27, it is fixedly installed on the other end of each top roll 22,23, and meshes with first transmission gear 26 respectively; Driving mechanism 28, it has and driven wheel 28a in distolateral first transmission gear, 26 engagements that fixedly install of the turning axle 21a of lower roll 21, by making this driven wheel 28a rotation, make each turning axle 21a, 22a, 23a (lower roll 21 and each top roll 22,23) rotation via each transmission gear 26,27.
To shown in Figure 9, described roller maintaining body 30 comprises as Fig. 2: first pedestal 31 and second pedestal 32, and they are provided in the bottom surface of described process chamber 10 in two outsides of the substrate K that is transmitted by described substrate transfer mechanism 20; First pallet 33 and second pallet 34, the end that they are provided on the described pedestal 31,32 and support the turning axle 21a of described lower roll 21 respectively; First retaining member 50, it is by the supporting of first pallet 33, and keep described first top roll 22 turning axle 22a the other end and make this other end rotation freely; Second retaining member 51, it is by the supporting of second pallet 34, and keep described second top roll 23 turning axle 23a the other end and make this other end rotation freely.
Described each pallet 33,34 is made of the flat member that slenderly is formed on the substrate direction of transfer respectively, in the middle of substrate K is clamped in and relatively to.In addition, on each pallet 33,34, be formed with the Embedded Division 35,36 of the U word shape that a plurality of tops are formed by otch in the longitudinal direction, the lower side of described Embedded Division 35,36 is embedded part (lower roll Embedded Division) 35a, the 36a of the turning axle 21a of lower roll 21, upper side is embedded part (top roll Embedded Division) 35b, the 36b of each retaining member 50,51, is embedded part (distance piece Embedded Division) 35c, the 36c of distance piece 37,38 between lower roll Embedded Division 35a, 36a and top roll Embedded Division 35b, the 36b.In addition, as described below, described top roll Embedded Division 35b, 36b also play a role as the embedded part of each supporting member 81,82 of supporting gap nozzle body 71.
On the end of the turning axle 21a of described lower roll 21, be provided with this end of supporting and make this end rotation clutch shaft bearing 39 freely, and on the other end, be provided with this other end of supporting and make this other end rotation second bearing 40 freely, described clutch shaft bearing 39 can be embedded into the lower roll Embedded Division 35a of described first pallet 33 with loading and unloading, and described second bearing 40 is embedded into the lower roll Embedded Division 36a of described second pallet 34 in the mode that can load and unload and can move on axis direction.The clutch shaft bearing 39 that is embedded into described lower roll Embedded Division 35a is screwed into the two sides of first pallet 33 by the mode with this clutch shaft bearing 39 of clamping a plurality of gib screws (limiting member) 41 limit this clutch shaft bearing 39 moving on axis direction.
Described each distance piece Embedded Division 35c, 36c comprise in the mode that forms opening in the two sides of each pallet 33,34 and are formed on through slot 42,43 on the two side of described each Embedded Division 35,36 that flatly embedding in the described through slot 42,43 has flat distance piece 37,38.Be formed with a end from its length direction on the distance piece 37,38 towards laterally projecting teat 37a, 38a, the gib screw 44,45 of the side of this teat 37a, the 38a substrate K side by being threaded into each pallet 33,34 is fixed on each pallet 33,34.
Interval between the two side of described each top roll Embedded Division 35b, 36b forms wideer than the interval between the two side of lower roll Embedded Division 35a, 36a, and is formed with groove 46,47 in the two side in along the vertical direction mode.
Described each retaining member 50,51 is made of the member of rectangular parallelepiped bulk respectively, and is that the mode of above-below direction is provided with the length direction.In addition, each retaining member 50,51 comprises: bearing 52,53, the other end of turning axle 22a, the 23a of described each top roll 22,23 of they supportings and make the rotation of this other end freely; Retaining hole 50a, 51a, they penetrate into the face of its opposition side from the face of substrate K side, and are provided with bearing 52,53 in inside; Hammer 54,55, they are used for pushing substrate K with specified load; Accepting hole 50b, 51b, they are formed on top and accommodate hammer 54,55; Protuberance 50c, 51c, they be formed in the side of lower side relative with the two side of described each Embedded Division 35,36 to part, and be connected to this two side; Projection 50d, 51d, they are formed on protuberance 50c, the 51c in mode along the vertical direction, and can be chimeric with described groove 46,47.
In addition, each retaining member 50,51 is by making groove 46,47 and projection 50d, 51d tabling, and can be embedded into described each top roll Embedded Division 35b, 36b, and under the state of groove 46,47 and projection 50d, 51d tabling, can move up at upper and lower with loading and unloading.The lower surface that is embedded into each retaining member 50,51 of each top roll Embedded Division 35b, 36b is connected to the upper surface of distance piece 37,38, height and position to this each retaining member 50,51 positions thus, and the roller about each roller main body 22b, 23b and the roller main body 21b is set at predetermined distance at interval.
The overhang of described projection 50d, 51d is lower than the degree of depth of described groove 46,47, and chamfering is carried out in two bights of the front end face of this projection 50d, 51d, is formed with gap 56,57 between the leading section of projection 50d, 51d and the groove 46,47 thus.In addition, chamfering is carried out in the opening bight of groove 46,47, between the peristome of the root of projection 50d, 51d and groove 46,47, be formed with gap 58,59 thus.Near the lower end of described each retaining member 50,51 side is not provided with described protuberance 50c, 51c, between the two side of this side and described each Embedded Division 35,36, be formed with the gap (interconnecting part) 60,61 of the external communications that makes described gap 56,57,58,59 and each Embedded Division 35,36 thus.
The weight of described hammer 54 is set at and can pushes substrate K with the load of 5N～35N by the overall weight of first retaining member 50 and first top roll 22, and the weight of described hammer 55 is set at and can pushes substrate K with the load of 5N～35N by the overall weight of second retaining member 51 and second top roll 23.
In addition, preferred also the pars intermedia of the axis direction of the turning axle 21a of described lower roll 21 is kept, in this example, for example a plurality of pars intermedia retaining members 65 of the bottom surface by being provided in described process chamber 10 rotate freely and can be kept with displacement on axis direction.In addition, be provided with installing plate 67 in the side of the opposition side of the side of the substrate K of described each pallet 33,34 side, this installing plate 67 is connected with supporting member 68 on the sidewall that is arranged on described process chamber 10.
As Fig. 1, Fig. 3 and shown in Figure 10, described treating fluid ejection mechanism 70 comprise the top that is configured in the substrate K that is transmitted by each roller 21,22,23 and lower roll 21 directly over gap nozzle body 71, and a plurality of spray nozzle bodies 72, gap nozzle body 71 is configured in than spray nozzle body 72 by substrate direction of transfer upstream side.
Described gap nozzle body 71 slenderly forms on parallel with the upper surface of substrate K and vertical with substrate direction of transfer direction in the mode of the whole width of the substrate K that spreads all over the direction vertical with the substrate direction of transfer.In addition, gap nozzle body 71 comprises hollow bulb 71a and forms opening and the squit hole 71b of the slit-shaped that is connected with hollow bulb 71a at lower surface, will from described treating fluid feed mechanism 75 supply in the hollow bulb 71a treating fluid from squit hole 71b towards the substrate K of below under spray.
Described spray nozzle body 72 is configured in than described gap nozzle body 71 by the top, and is set up in parallel on substrate direction of transfer and the direction vertical with the substrate direction of transfer, will spray from the substrate K for the treatment of fluid towards the below that described treating fluid feed mechanism 75 is supplied with.
Described treating fluid feed mechanism 75 comprises: first supply pipe 76 that is used for described gap nozzle body 71 is supplied with treating fluid; A plurality of connecting pipes 77 that first supply pipe 76 is connected with the hollow bulb 71a of gap nozzle body 71; Be used for described each spray nozzle body 72 is supplied with a plurality of second supply pipes 78 for the treatment of fluid; Described supply pipe 76,78 is supplied with the treating fluid supply unit 79 for the treatment of fluid.
The part of described first supply pipe 76 in described process chamber 10 with the substrate direction of transfer vertically be arranged on gap nozzle body 71 above.Described connecting pipe 77 is arranged on the axis direction of first supply pipe 76 at certain intervals.The part of described each second supply pipe 78 described process chamber 10 in and the substrate direction of transfer vertically be provided with, and separate that certain intervals ground is parallel to be configured on the substrate direction of transfer.In addition, on the axis direction of the bottom of described second supply pipe 78, be set with described spray nozzle body 72 at certain intervals.
As Fig. 3, Fig. 5, Fig. 6, Fig. 9 and shown in Figure 10, the described gap nozzle body 71 of described supporting device 80 supportings, and comprise second supporting member 82 of the other end of first supporting member 81 of an end of the length direction that supports this gap nozzle body 71 and bearing length direction.
Described each supporting member 81,82 is made of the member of rectangular flat shape respectively, and is that the mode of above-below direction is provided with the length direction.In addition, the end that each supporting member 81,82 supports the length direction of gap nozzle body 71 via installation component 83,84 respectively, and described each supporting member 81,82 can be embedded into described each top roll Embedded Division 35b, 36b with loading and unloading.In addition, each supporting member 81,82 is under the state that is embedded into each top roll Embedded Division 35b, 36b, and outside surface is connected to the two side of described each Embedded Division 35,36, and can move on the length direction of gap nozzle body 71.
In addition, be formed with towards the extension 81a, the 82a that cross out on the top of the vertical two sides of the length direction with gap nozzle body 71 of each supporting member 81,82, in described extension 81a, 82a, it is outstanding and be connected to the height control screw 85,86 of the upper surface of each pallet 33,34 to be screwed with the lower end from upside respectively.Be connected to the upper surface of each pallet 33,34 by the lower end that makes each height control screw 85,86, and the height and position that is embedded into each supporting member 81,82 in each top roll Embedded Division 35b, 36b is positioned, thus the interval between gap nozzle body 71 and the substrate K is set at predetermined distance.
In addition, preferred also the pars intermedia of the length direction of described gap nozzle body 71 is supported, in this example, for example the bottom of a plurality of the 3rd supporting members 87 that are connected with the end face of process chamber 10 by the upper end is supported.In addition, the pars intermedia with the 3rd supporting member 87 supports described first supply pipe 76.
According to this routine substrate board treatment 1 that constitutes in this way, lower roll 21 and each top roll 22,23 are subjected to the driving of rotary driving part 25 and are rotated, and the direction of transfer along regulation in process chamber 10 transmits substrate K.At this moment, in the time of between substrate K is by lower roll 21 and each top roll 22,23, each retaining member 50,51 and each top roll 22,23 are subjected to the guiding of groove 46,47 and projection 50d, 51d and after move the top, push substrate K with the weight of each retaining member 50,51 and each top roll 22,23.
Herein, the hammer 54,55 that the load that can make each top roll 22,23 push substrate K becomes 5N～35N respectively is arranged in each retaining member 50,51, therefore can be not too small because of pressing force, top roll 22,23 or lower roll 21 dally and reliable substrate are transmitted generation hinder, otherwise it is bad also can not produce substrate K fracture etc. because of pressing force is excessive.Therefore, can transmit substrate K reliably and not produce any bad.
In addition, getting final product pushing the required load of substrate K when setting, for example setting: from the kind of the fluid of gap nozzle body 71 and 72 ejections of each spray nozzle body according to the following; The kind of this soup when the fluid from gap nozzle body 71 and 72 ejections of each spray nozzle body is soup
(for example whether containing interfacial agent etc.); Substrate size; The surface state of substrate K (for example surfaceness or wettability etc.); The reacting force (pushing back the power of substrate K) of the impulsive force when touching substrate K etc. based on fluid from gap nozzle body 71 and 72 ejections of each spray nozzle body.In addition, the reason that must consider the fluid of ejection is, if the fluid of ejection is gas, pure water or soup, then roller progressively becomes according to the order of gas, pure water and soup and skids easily and dally, in addition, must consider that the reason of reacting force is, when for example removing liquid at ejection gas, when the emission direction with gas is set at respect to the substrate direction of transfer in the other direction and when tiltedly descending direction, it is big especially that reacting force becomes.
In addition, for substrate K being applied the higher load of load that Billy can apply with the overall weight of the overall weight of first retaining member 50 and first top roll 22 or second retaining member 51 and second top roll 23, also can use spring, this spring is made of metal usually, relatively poor because of chemical-resistant, thereby must coat.Therefore, adjust the load that puts on substrate K if utilize hammer 54,55, even then coat to hammering 54,55 into shape, also easy than coating spring, in addition, if the formation hammer is accommodated accepting hole 50b, the 51b of usefulness and hammer is housed in this accepting hole 50b, the 51b in each retaining member 50,51, hammer 54,55 can be set simply then.At this moment, as shown in this example, be difficult to be subjected to from the position of the influence of the treating fluid of gap nozzle body 71 and 72 ejections of each spray nozzle body if the formation position of accepting hole 50b, 51b is made as the side etc. of the opposition side of the substrate K side of each retaining member 50,51 for example, then also can be not do not coat and be provided with hammering 54,55 into shape especially.
Then, on the upper surface of the substrate K that is transmitted in this way, from treating fluid supply unit 79 via first supply pipe 76 and connecting pipe 77 and supply to the treating fluid of gap nozzle body 71, reach the treating fluid that supplies to each spray nozzle body 72 from treating fluid supply unit 79 via second supply pipe 78, can from described gap nozzle body 71 and each spray nozzle body 72, spray, thus substrate K be implemented predetermined process.
Fall each retaining member 50 from the treating fluid of each spray nozzle body 72 ejection, 51 or each pallet 33,34 and enter into groove 46,47 with projection 50d, between the 51d, in this example, at described projection 50d, the leading section of 51d and groove 46, be formed with gap 56 between 47,57, at projection 50d, the root of 51d and groove 46, be formed with gap 58 between 47 the peristome, 59, at each retaining member 50, side and each Embedded Division 35 near 51 the lower end, be formed with between 36 the two side and make described gap 56,57,58,59 with each Embedded Division 35, the gap 60 of 36 external communications, 61, therefore can make and flow into groove 46,47 with projection 50d, treating fluid between the 51d is via described gap 56,57,58,59,60,61 and flow out to Embedded Division 35 effectively, 36 outside can prevent the treating fluid crystallization that sprays and anchors at groove 46,47 inside surface or projection 50d, the outside surface of 51d.Thus, in the time of can be between substrate K is by lower roll 21 and each top roll 22,23 each retaining member 50,51 be risen reliably, can prevent to produce the problem of substrate fracture, substrate shortcoming.
In addition, second bearing 40 of the other end of supporting lower roll 21 is embedded into the lower roll Embedded Division 36a of second pallet 34 in the mode that can move on axis direction, therefore even because the environment in the process chamber 10 that heats up from the treating fluid of gap nozzle body 71 and 72 ejections of each spray nozzle body or because of this treating fluid, and with lower roll 21 heating, temperature rises, and also allows the rise elongation of caused turning axle 21a of this temperature.On the other hand, about each top roll 22,23, first retaining member 50 that keeps first top roll 22 is by 33 supportings of first pallet, second retaining member 51 that keeps second top roll 23 is by 34 supportings of second pallet, therefore, can not limit the rise elongation of caused turning axle 22a, 23a of this temperature even each top roll 22,23 temperature rises yet.
Therefore, when each roller 21,22,23 temperature rose, described turning axle 21a, 22a, 23a can extend, and can prevent that therefore turning axle 21a, 22a, 23a are out of shape and bending.Thus, can prevent to produce and to transmit the problem of substrate K as the crow flies towards the direction of transfer of regulation, and can prevent substrate K fracture.
In addition, as mentioned above, if the turning axle 21a of lower roll 21 elongation, then as shown in figure 11, the position of the roller main body 21b of lower roll 21 and the roller main body 22b of each top roll 22,23, the position of 23b are offset on the axis direction of turning axle 21a, 22a, 23a.At this moment, if the roller main body 21b of each roller 21,22,23, the outer peripheral face of 22b, 23b form semicircle, the masterpiece that then produces shear direction is used for substrate K and causes producing the problem that substrate K breakage, ring element 21c, 22c, 23c damage, substrate K are transmitted having many bends or curvesly.In addition, among Figure 11, symbol, β represent the position offset of axis direction respectively.
Therefore, on lower roll 21 and peripheral parts each top roll 22,23 corresponding roller main body 21b, it is the ring element 21c of rectangle that section is set, and makes the outer peripheral face of roller main body 21b become the tabular surface of certain width.Therefore, even produce described offset, also can bear by the roller main body 22b of each top roll 22,23, the power that 23b acts on substrate K by described ring element 21c.Thus, can prevent that masterpiece by shear direction is used for substrate K and causes producing the problem that substrate K breakage or ring element 21c, 22c, 23c damage, substrate K are transmitted having many bends or curvesly.
In addition, first supporting member 81 and second supporting member 82 that the both ends of the length direction of gap nozzle body 71 are supported are embedded into lower roll Embedded Division 35a, 36a in the mode that can move on the length direction of gap nozzle body 71, even therefore owing to supply to the treating fluid of gap nozzle body 71 from treating fluid supply unit 79, this gap nozzle body 71 is heated and thermal expansion, and gap nozzle body 71 also can extend on its length direction.
Therefore, can prevent to be restricted this gap nozzle body 71 distortion because of the thermal expansion of gap nozzle body 71, the interval between gap nozzle body 71 and the substrate K becomes unfixing; Or the shape of the squit hole 71b of gap nozzle body 71 changes.Thus, can prevent that interval between gap nozzle body 71 and the substrate K from cannot not become fixingly and the processing substrate condition becomes inhomogeneous, or the shape of squit hole 71b changes and becomes inhomogeneous from the flow of the treating fluid of squit hole 71b ejection, thereby can't implement uniform processing substrate.
In addition, each top roll of removal is 22,23 o'clock when safeguarding etc., only each retaining member 50,51 is got final product from each top roll Embedded Division 35b, 36b removal, and this operation is easy.On the other hand, when each top roll 22,23 is installed, only so that the mode of groove 46,47 and projection 50d, 51d tabling is embedded into each top roll Embedded Division 35b, 36b with each retaining member 50,51 gets final product, this operation is easy, and, can install accurately by the chimeric of groove 46,47 and projection 50d, 51d.In addition, lower roll 21 also similarly can be embedded into lower roll Embedded Division 35a, 36a with each top roll 22,23 with loading and unloading, therefore can obtain effect same as described above.
In addition, when each retaining member 50,51 is embedded into each top roll Embedded Division 35b, 36b, utilize distance piece 37,38, can limit each retaining member 50,51 of being embedded into each top roll Embedded Division 35b, 36b towards the moving of below, each retaining member 50,51 can be positioned at the height and position of regulation.Thus, not only can carry out the installation of each retaining member 50,51 more simply, also can after the installation again of each retaining member 50,51, make the roller up and down of lower roll 21 and each top roll 22,23 become high precision at interval.
In addition, interval between gap nozzle body 71 and the substrate K is set at optimal spacing according to contents processing, if this changes at interval, the condition changing of processing substrate and can't carry out best processing substrate then, therefore the mode that must be when gap nozzle body 71 is provided with again becomes optimal spacing with described interval is adjusted, in addition, the position on the substrate direction of transfer of gap nozzle body 71 is also set in the mode that the treating fluid from gap nozzle body 71 ejection roughly touches the part that is supported by lower roll 21, if this position change and the treating fluid of described ejection touches the part that is not supported by lower roll 21, then because the treating fluid of the described ejection impulsive force when touching substrate K, difference according to contents processing produces the processing inequality, therefore the mode that must be when gap nozzle body 71 is provided with again becomes the position of described setting with described position is adjusted, in this example, each supporting member 81 at the both ends by will supporting gap nozzle body 71,82 are embedded into each top roll Embedded Division 35b, 36b, or with each supporting member 81,82 from each top roll Embedded Division 35b, the 36b removal, can load and unload gap nozzle body 71, therefore this loading and unloading operation is easy, and gap nozzle body 71 precision can be installed in well each pallet 33, on 34.
In addition, since can embed among each top roll Embedded Division 35b, 36b each retaining member 50,51 and each supporting member 81,82 the two, therefore need not to form respectively the Embedded Division of retaining member 50,51 usefulness and the Embedded Division of supporting member 81,82 usefulness, thereby can realize the facilitation of making.
More than, one embodiment of the present invention has been described, the adoptable concrete form of the present invention is not limited thereto.
For example, from the emission direction of the treating fluid of gap nozzle body 71 ejection also can not be under, and the length direction of gap nozzle body 71 can be not vertical with the substrate direction of transfer yet.And the substrate K that is transmitted also can not be level.
In addition, described processing substrate there is no any qualification, for example can enumerate ejection gas and going of carrying out liquid is handled, ejection gas and the dried of carrying out, ejection developer solution and the development treatment of carrying out, ejection etching solution and the etch processes of carrying out, ejection photoresistance stripper and the photoresistance lift-off processing of carrying out, ejection cleaning solution and the cleaning of carrying out etc.And, there is not any qualification as the substrate K of the object of described processing yet, for example can enumerate silicon substrate or glass substrate etc.
Claims (11)
1. substrate board treatment, it transmits substrate and simultaneously the upper surface of this substrate is supplied with fluid and handle this substrate, comprising:
Substrate transfer mechanism, it comprises: a plurality of lower rolls, they have the turning axle vertical with the direction of transfer of described substrate respectively, and are set up in parallel below described substrate to support this substrate along this direction of transfer; First top roll and second top roll, they have the turning axle with the rotating shaft parallel of described lower roll, and be configured in the top of at least one described lower roll, this first top roll is pushed an end of the Width of described substrate, and this second top roll is pushed the other end of the Width of described substrate; Rotary drive mechanism, its turning axle at least one described lower roll drive and make its rotation; This substrate transfer mechanism is come clamping and is transmitted described substrate by described lower roll and each top roll;
The roller maintaining body, it keeps described each roller, and makes described each roller rotation freely;
Fluid ejection mechanism, it is configured in the top of the substrate that is transmitted by described substrate transfer mechanism, and towards the upper surface ejecting fluid of this substrate;
Fluid supply mechanism, it sprays mechanism to described fluid and supplies with fluid;
Supporting device, it supports described fluid ejection mechanism, and described substrate board treatment is characterised in that,
Described roller maintaining body comprises: flat first pallet and second pallet, they separate certain intervals in two outsides of described substrate and slenderly form on the direction of transfer of ground at described substrate relatively, this first pallet keeps an end of the turning axle of described lower roll, and make this end rotation freely, this second pallet keeps the other end of the turning axle of described lower roll, and makes the rotation of this other end can displacement freely and on axis direction; First retaining member, it is supported by described first pallet, and keeps the turning axle of described first top roll and make the rotation of this turning axle freely; Second retaining member, it is supported by described second pallet, and keeps the turning axle of described second top roll and make the rotation of this turning axle freely,
Described first pallet and second pallet constitute, and have first Embedded Division of the U word shape that top formed by otch respectively, and can embed described first retaining member and second retaining member in this first Embedded Division with loading and unloading,
The two side of described each first Embedded Division, and the corresponding part in the two side with described first Embedded Division of the outside surface of each retaining member on, with along the vertical direction and mode that can be chimeric mutually a square one-tenth is fluted and be formed with projection the opposing party therein
Described each retaining member constitutes, and makes described groove and projection tabling and is embedded into described first Embedded Division, and can move up at upper and lower under the state of described groove and projection tabling.
2. substrate board treatment as claimed in claim 1 is characterized in that,
Described each top roll has a roller main body respectively,
Described lower roll constitutes, and has a plurality of roller main bodys on the axis direction of its turning axle, and in the described roller main body, be positioned at the roller main body at two ends relative up and down with the roller main body of described each top roll to,
At least for the roller main body of described second top roll and described lower roll with the corresponding roller main body of second top roll, the outer peripheral face of one of them roller main body forms semicircle, the outer peripheral face of another roller main body forms the tabular surface with certain width.
3. substrate board treatment as claimed in claim 1 is characterized in that,
Under the roller up and down with described lower roll and each top roll is set at situation less than the thickness of described substrate at interval,
Between described projected front ends and the groove, and the peristome of the root of described projection and groove between, be formed with the gap respectively, and between described each retaining member and first Embedded Division, the lower side of described groove or below be formed with the interconnecting part that described gap is communicated with space outside described first Embedded Division respectively.
4. substrate board treatment as claimed in claim 1 is characterized in that,
Described each retaining member has the hammer that is used for pushing with predefined load described substrate respectively.
5. substrate board treatment as claimed in claim 4 is characterized in that,
The end of the weight of the hammer of described first retaining member for pushing described substrate with the load of 5N～35N by the weight of described first retaining member and the first top roll integral body, the weight of the hammer of described second retaining member is for pushing the other end of described substrate by the weight of described second retaining member and the second top roll integral body with the load of 5N～35N.
6. substrate board treatment as claimed in claim 1 is characterized in that,
On an end of the turning axle of described lower roll, be provided with this end of supporting and make this end rotation clutch shaft bearing freely, and on the other end of the turning axle of described lower roll, be provided with this other end of supporting and make this other end rotation second bearing freely
At first Embedded Division of described first pallet, be formed with the part that described clutch shaft bearing can be embedded with loading and unloading at its downside, and side is formed with the part that described first retaining member can be embedded with loading and unloading thereon,
First Embedded Division at described second pallet, be formed with the part that described second bearing is embedded in the mode that can load and unload and can move on axis direction at its downside, and side is formed with the part that described second retaining member can be embedded with loading and unloading thereon
Have on the part of described each retaining member embedding at least of described first Embedded Division, be formed with described groove or projection,
On the described clutch shaft bearing or first pallet, be provided with and limit the limiting member that this clutch shaft bearing moves on axis direction.
7. substrate board treatment as claimed in claim 6 is characterized in that,
The embedding of first Embedded Division of described each pallet have described each bearing part, and embed and have between the part of described each retaining member, be respectively arranged with the lower end that is used to be connected to described each retaining member and distance piece that the height and position of described each top roll is positioned.
8. substrate board treatment as claimed in claim 1 is characterized in that,
Described fluid sprays mechanism and spread all over the whole width of this substrate and formation slenderly on the direction that the direction of transfer with described substrate intersects;
Described supporting device comprises: first supporting member, and second supporting member of the other end of the length direction of the described fluid ejection of supporting mechanism of an end that supports the length direction of described fluid ejection mechanism;
Described first pallet and second pallet constitute, and have second Embedded Division of the U word shape that top formed by otch respectively, and can embed described first supporting member and second supporting member in this second Embedded Division with loading and unloading.
9. substrate board treatment as claimed in claim 8 is characterized in that,
In one of them of second Embedded Division of described each pallet, described first supporting member or second supporting member have been embedded in mode that can displacement on the length direction of described fluid ejection mechanism.
10. substrate board treatment as claimed in claim 8 is characterized in that,
On an end of the turning axle of described lower roll, be provided with this end of supporting and make this end rotation clutch shaft bearing freely, and on the other end of the turning axle of described lower roll, be provided with this other end of supporting and make this other end rotation second bearing freely
At second Embedded Division of described first pallet, be formed with the part that described clutch shaft bearing can be embedded with loading and unloading at its downside, and side is formed with the part that described first retaining member can be embedded with loading and unloading thereon,
Second Embedded Division at described second pallet, be formed with the part that described second bearing is embedded in the mode that can load and unload and can move on axis direction at its downside, and side is formed with the part that described second retaining member can be embedded with loading and unloading thereon
On the described clutch shaft bearing or first pallet, be provided with and limit the limiting member that this clutch shaft bearing moves on axis direction.
11. substrate board treatment as claimed in claim 8 is characterized in that,
First Embedded Division and second Embedded Division of described each pallet form same shape.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009067785A JP5260370B2 (en) | 2009-03-19 | 2009-03-19 | Substrate processing equipment |
| JP2009-067785 | 2009-03-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101840156A true CN101840156A (en) | 2010-09-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010143420A Pending CN101840156A (en) | 2009-03-19 | 2010-03-17 | Substrate board treatment |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5260370B2 (en) |
| CN (1) | CN101840156A (en) |
| TW (1) | TWI514498B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103359464A (en) * | 2012-04-04 | 2013-10-23 | 李在圭 | Elastic O-ring and method for manufacturing method thereof |
| CN103910176A (en) * | 2013-01-07 | 2014-07-09 | 李在圭 | Elastic O-ring |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5524388B1 (en) * | 2013-05-07 | 2014-06-18 | 株式会社フジ機工 | Substrate transfer device |
| KR102351697B1 (en) * | 2017-09-14 | 2022-01-17 | 주식회사 디엠에스 | Apparatus for treating substrate |
| KR102656981B1 (en) * | 2018-03-27 | 2024-04-11 | 가부시키가이샤 에바라 세이사꾸쇼 | Cleaning appratus, plating apparatus including the same, and cleaning method |
| JP2019175933A (en) * | 2018-03-27 | 2019-10-10 | 株式会社荏原製作所 | Cleaning apparatus, plating apparatus including the same, and cleaning method |
| JP7257742B2 (en) * | 2018-03-27 | 2023-04-14 | 株式会社荏原製作所 | CLEANING APPARATUS, PLATING APPARATUS INCLUDING THE SAME, AND CLEANING METHOD |
| JP7166817B2 (en) * | 2018-07-12 | 2022-11-08 | 株式会社荏原製作所 | SUBSTRATE TRANSPORTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE TRANSPORTER |
| KR20200123349A (en) * | 2019-04-19 | 2020-10-29 | 주식회사 디엠에스 | Guide apparatus for substrate transfer |
| JP7324734B2 (en) * | 2019-07-25 | 2023-08-10 | 芝浦メカトロニクス株式会社 | Substrate transfer device and substrate processing device |
| JP7056972B2 (en) * | 2020-06-04 | 2022-04-19 | 株式会社ケミトロン | Board processing equipment |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1205771A (en) * | 1983-03-17 | 1986-06-10 | Ppg Industries Ohio, Inc. | Conveyor roll having a flexible drive shaft coupling to minimize vibration |
| JPH02144312A (en) * | 1988-11-22 | 1990-06-04 | Shibaura Eng Works Co Ltd | Carrying roller device |
| US5111930A (en) * | 1991-03-18 | 1992-05-12 | International Rolling Mill Consultants, Inc. | Non-warping table rolls |
| US5927477A (en) * | 1997-10-02 | 1999-07-27 | Engineering Design Services, Inc. | Conveyor roller with axial direct drive |
| JP2004074021A (en) * | 2002-08-19 | 2004-03-11 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus and substrate cleaning unit |
| CN1582202A (en) * | 2001-12-11 | 2005-02-16 | 住友精密工业株式会社 | Nozzle device and substrate treating apparatus having using the device |
| JP2005322779A (en) * | 2004-05-10 | 2005-11-17 | Tokyo Kakoki Kk | Surface processor for substrate material |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05190519A (en) * | 1992-01-17 | 1993-07-30 | Hitachi Ltd | Washing device |
| JP4681441B2 (en) * | 2004-12-22 | 2011-05-11 | 芝浦メカトロニクス株式会社 | Conveying shaft, roll brush shaft and substrate processing apparatus |
-
2009
- 2009-03-19 JP JP2009067785A patent/JP5260370B2/en not_active Expired - Fee Related
-
2010
- 2010-01-22 TW TW099101848A patent/TWI514498B/en active
- 2010-03-17 CN CN201010143420A patent/CN101840156A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1205771A (en) * | 1983-03-17 | 1986-06-10 | Ppg Industries Ohio, Inc. | Conveyor roll having a flexible drive shaft coupling to minimize vibration |
| JPH02144312A (en) * | 1988-11-22 | 1990-06-04 | Shibaura Eng Works Co Ltd | Carrying roller device |
| US5111930A (en) * | 1991-03-18 | 1992-05-12 | International Rolling Mill Consultants, Inc. | Non-warping table rolls |
| US5927477A (en) * | 1997-10-02 | 1999-07-27 | Engineering Design Services, Inc. | Conveyor roller with axial direct drive |
| CN1582202A (en) * | 2001-12-11 | 2005-02-16 | 住友精密工业株式会社 | Nozzle device and substrate treating apparatus having using the device |
| JP2004074021A (en) * | 2002-08-19 | 2004-03-11 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus and substrate cleaning unit |
| JP2005322779A (en) * | 2004-05-10 | 2005-11-17 | Tokyo Kakoki Kk | Surface processor for substrate material |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103359464A (en) * | 2012-04-04 | 2013-10-23 | 李在圭 | Elastic O-ring and method for manufacturing method thereof |
| CN103359464B (en) * | 2012-04-04 | 2016-03-09 | 李在圭 | Elastomeric O-type circle and preparation method thereof |
| CN103910176A (en) * | 2013-01-07 | 2014-07-09 | 李在圭 | Elastic O-ring |
| CN103910176B (en) * | 2013-01-07 | 2016-06-22 | 李在圭 | Resilient, elastomeric |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI514498B (en) | 2015-12-21 |
| JP5260370B2 (en) | 2013-08-14 |
| JP2010222063A (en) | 2010-10-07 |
| TW201036096A (en) | 2010-10-01 |
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Application publication date: 20100922 |