CN101750649A - Groove spacing accurately adjusting device in holographic grating manufacturing light path - Google Patents
Groove spacing accurately adjusting device in holographic grating manufacturing light path Download PDFInfo
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- CN101750649A CN101750649A CN200910215469A CN200910215469A CN101750649A CN 101750649 A CN101750649 A CN 101750649A CN 200910215469 A CN200910215469 A CN 200910215469A CN 200910215469 A CN200910215469 A CN 200910215469A CN 101750649 A CN101750649 A CN 101750649A
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Abstract
The invention provides a groove spacing accurately adjusting device in a holographic grating manufacturing light path, and relates to a device belonging to the technical field of light spectrum, aiming to solve the technical problem of providing the device for accurately adjusting the groove spacing in the holographic grating manufactured light path. The technical scheme of the device comprises a laser source, a first plane mirror, a second plane mirror, a spatial filter, a collimating mirror, regulating mirror, an interference field, a reference grating, a receiving screen, a support rotating platform and other parts, wherein pitching and rotation of the adjusting mirror and the reference grating can be changed by regulating an upper turn table on the support rotating platform and adjusting a screw group, so that two recording beams are overlapped to generate moire fringe after being diffracted through the reference grating; through inspection on the moire fringe, accurate regulation on the fringe period of the interference field can be realized, and the spacing of the interference fringe can be taken as the groove spacing for manufacturing the holographic grating. The device simplifies the regulating steps, shortens the regulating time, and improving the regulating precision of the holographic grating groove spacing.
Description
Technical field
The invention belongs to the device of accurately adjusting groove density in a kind of holographic grating making optical path that relates in the spectral technique field.
Background technology
When making holographic grating, the grating substrate that scribbles photoresist is placed in the interference field exposes, by the interference fringe in the photoresist record interference field, the density of this interference fringe is promptly made the incisure density of grating.The dispersive power and the resolution of the incisure density decision grating of grating, the accuracy of grating constant directly influences the wavelength accuracy of spectral instrument.Therefore, in holographic grating making, accurately adjusting groove density becomes vital work.
The prior art the most approaching with the present invention is that China Patent No. is CN1544994A, denomination of invention is " method of accurately adjusting groove density in a kind of manufacturing of plane holographic grating ", the holographic grating exposure device that provides in the method comprises LASER Light Source 1, first catoptron 2 and second catoptron 3, expands and restraint wave filter 4, collimating mirror 5, the first adjustment catoptron 6, second adjustment catoptron 7 and the interference field 8 as shown in Figure 1; As the benchmark grating, the interference fringe density of adjusting interference field 8 is consistent with benchmark grating incisure density, makes the nominal value of holographic grating incisure density to be made consistent with the incisure density of machine engraving grating with the machine engraving grating of standard.This method is simple and feasible, easy operating, accurately control plane holographic grating incisure density.But this device is the device at the double mirror exposure with two adjustment catoptrons, is not suitable for Lip river Chinese mugwort mirror exposure optical system.When the Chinese mugwort mirror exposure of accurate adjustment Lip river, need provide a kind of adjusting gear of practicality.
Summary of the invention
In order to overcome the defective that above-mentioned prior art exists, the objective of the invention is to set up the device of the accurate adjustment grating line density of the Lip river Chinese mugwort mirror exposure optical system that a kind of simple and feasible being applicable to have only an adjustment catoptron.
The technical problem to be solved in the present invention is: the device that accurately adjusting groove density in a kind of holographic grating making optical path is provided.The technical scheme of technical solution problem is: as shown in Figure 2, comprise LASER Light Source 11, first plane mirror 12 and second plane mirror 13, spatial filter 14, collimating mirror 15, adjust catoptron 16, come from the second bundle incident light 18, interference field 19, benchmark grating 20, receiving screen 21, support universal stage 22 that first of collimating mirror 15 is restrainted incident light 17, come from adjustment catoptron 16; Wherein support universal stage 22 as shown in Figure 3, comprise lower floor's platform 23, upper strata turntable 24, rotation draw-in groove 25, holding screw 26, rotary middle spindle 27, adjust Reflector base 28, the first adjusting screw group 29, Optical grating base 30, the second adjusting screw group 31 and the 3rd adjusting screw group 32; On the optical axis of the laser beam direction of propagation of LASER Light Source 11, be equipped with first plane mirror 12, first plane mirror 12 is installed with optical axis angle at 45, on the catoptrical light path of first plane mirror 12, be equipped with second plane mirror 13, second plane mirror 13 is installed with optical axis angle at 45, on the catoptrical light path of second plane mirror 13, be equipped with spatial filter 14, form spherical wave through spatial filter 14 backs, place collimating mirror 15 in the spherical wave direction of propagation, and the focal position of collimating mirror 15 is positioned at spherical wave wave source point, the position of spherical wave wave source point is in the exit of spatial filter 14, laser beam becomes collimated light beam behind collimating mirror 15 like this, supports the light path that universal stage 22 places this collimated light beam; Support universal stage 22 at the middle and upper levels turntable 24 is connected by rotary middle spindle 27 with lower floor platform 23, upper strata turntable 24 can center on rotary middle spindle 27 and rotate, and can use holding screw 26 by rotating draw-in groove 25 upper strata turntable 24 to be fixed on lower floor's platform 23; Lay on the upper strata turntable 24 and adjust Reflector base 28 and Optical grating base 30, and these two pedestals become 90 ° of angles to install, the first adjusting screw group 29 is positioned at the both sides of adjusting Reflector base 28, be used to regulate the pitching of adjusting Reflector base 28, the second adjusting screw group 31 is positioned at the both sides of Optical grating base 30, be used to adjust the pitching of Optical grating base 30, the 3rd adjusting screw group 32 is positioned at the both sides of Optical grating base 30 left ends, is used to adjust the rotation of Optical grating base 30; Adjusting catoptron 16 is placed on the adjustment Reflector base 28, benchmark grating 20 is placed on the Optical grating base 30, and adjust catoptron 16 and become 90 ° of angles with the surface of benchmark grating 20, the collimated light beam that collimating mirror 15 is sent shines the surface of adjusting catoptron 16 and benchmark grating 20; The first bundle incident light 17 that comes from collimating mirror 15 intersects with the second bundle incident light 18 that reflects through adjustment catoptron 16, form interference field 19 at intersectional region, and benchmark grating 20 is positioned at interference field 19, the grating line direction of benchmark grating 20 is restrainted the plane that incident light 18 is formed perpendicular to the first bundle incident light 17 and second, and the surface of benchmark grating 20 is towards collimating mirror 15.
Principle of work explanation of the present invention: in holographic grating exposure interference field, place the support universal stage that catoptron and benchmark grating are adjusted in a carrying, change pitching and the rotation of adjusting catoptron and benchmark grating by adjusting the upper strata turntable and the adjusting screw group that support on the universal stage, superimposed generation Moire fringe after making two beam recording light through the benchmark optical grating diffraction, by check, realize accurate adjustment to the interference field fringe period to Moire fringe.In interference field 19, insert one and overlap the device that is used to adjust Lip river Chinese mugwort mirror exposure optical system incisure density, Optical grating base 30 is arranged on the device and adjust Reflector base 28, and can adjust the pitching and the orientation of Optical grating base 30 and adjustment Reflector base 28; To adjust catoptron 16 is placed on the adjustment Reflector base 28, benchmark grating 20 is placed on the Optical grating base 30, adjust the 3rd adjusting screw group 32, angle is 90 ° between change benchmark grating 20 and the adjustment catoptron 16, at this moment, the first bundle incident light 17 and the second bundle incident light 18 shine on the surface of benchmark grating 20; Adjust the first adjusting screw group 29 and the second adjusting screw group 31, the plane that benchmark grating 20 and adjustment catoptron 16 surfaces and the first bundle incident light 17 and the second bundle incident light 18 are formed is vertical; Unclamp holding screw 26, is that the center is along 25 rotations of rotation draw-in groove with upper strata turntable 24 with rotary middle spindle 27,-2 order diffraction light and second that make the first bundle incident light 17 pass through benchmark gratings 20 are restrainted incident light 18 process benchmark gratings 20+1 order diffraction light and are shone on the receiving screen 21 along equidirectional, on receiving screen 21, can form Moire fringe, the careful adjusting adjusted the first adjusting screw group 29 and the second adjusting screw group 31, change the angle of pitch and the position angle of adjusting catoptron 16 and benchmark grating 20, restraint the plane that incident light 18 is formed to guarantee the Moire fringe on receiving screen 21 perpendicular to the first bundle incident light 17 and second, and the width of fringe maximum, locking holding screw 26; At this moment, the interference fringe density in the interference field 19 is identical with the incisure density of benchmark grating 20; As shown in Figure 4, take off benchmark grating 20 shown in Figure 2 and receiving screen 21, the grating substrate 33 that scribbles photoresist is placed on the position at benchmark grating 20 places original shown in Figure 2, photoresist in the grating substrate 33 record by the first bundle incident light 17 and the second bundle incident light 18 forms interference fringe, the density of this interference fringe is by the incisure density of making holographic grating.
Good effect of the present invention: by the simple and feasible device that can accurately adjust grating line density of a cover, adopt Moire fringe technique accurately to adjust incisure density in the holographic grating making optical path, will be converted to measurement the period measurement of micron-sized interference field interference fringe to millimetre-sized Moire fringe; Use this device to simplify set-up procedure, shortened the adjustment time, improved the adjustment precision of holographic grating incisure density.
Description of drawings
Fig. 1 is that the prior art patent No. is the holographic grating exposure device structural representation of CN 1544994A;
Fig. 2 is an apparatus structure synoptic diagram of accurately adjusting grating line density in the holographic grating making optical path of the present invention;
Fig. 3 is the structural representation that supports universal stage 22 among Fig. 2;
Fig. 4 is the light path synoptic diagram that adds the grating substrate 33 that scribbles photoresist in the holographic grating exposure device light path shown in Figure 2.
Embodiment
The present invention presses Fig. 2,3, structure shown in 4 is implemented, wherein, LASER Light Source 11 adopts krypton ion laser, wavelength is 413.1nm, first plane mirror 12 and second plane mirror 13 are the substrate of glass aluminum reflector, spatial filter 14 is made up of microcobjective and pin hole, the bore of collimating mirror 15 is φ 320mm, focal distance f=1.2m, adjusting catoptron 16 is the substrate of glass aluminum reflector, benchmark grating 20 need be according to the actual reflection grating that requires the choice criteria incisure density, receiving screen 21 adopts ordinary white frosted glass, K9 optical glass is adopted in grating substrate 33, the photoresist that applies on the K9 optical glass is the Shipley1805 type photoresist that Japan produces, and adjusts accurately that each mechanical structured member all adopts steel to complete through machining in the device of holographic grating incisure density.
Claims (1)
1. the device of accurately adjusting groove density in the holographic grating making optical path comprises LASER Light Source (11), first plane mirror (12) and second plane mirror (13), spatial filter (14), collimating mirror (15), interference field (19); It is characterized in that also comprising the first bundle incident light (17) of adjusting catoptron (16), coming from collimating mirror (15), the second bundle incident light (18) that comes from adjustment catoptron (16), benchmark grating (20), receiving screen (21), support universal stage (22); Wherein supporting universal stage (22) comprises lower floor's platform (23), upper strata turntable (24), rotation draw-in groove (25), holding screw (26), rotary middle spindle (27), adjusts Reflector base (28), the first adjusting screw group (29), Optical grating base (30), the second adjusting screw group (31) and the 3rd adjusting screw group (32); On the optical axis of the laser beam direction of propagation of LASER Light Source (11), be equipped with first plane mirror (12), first plane mirror (12) is installed with optical axis angle at 45, on the catoptrical light path of first plane mirror (12), be equipped with second plane mirror (13), second plane mirror (13) is installed with optical axis angle at 45, on the catoptrical light path of second plane mirror (13), be equipped with spatial filter (14), form spherical wave through spatial filter (14) back, place collimating mirror (15) in the spherical wave direction of propagation, and the focal position of collimating mirror (15) is positioned at spherical wave wave source point, the position of spherical wave wave source point is in the exit of spatial filter (14), laser beam becomes collimated light beam behind collimating mirror (15), support the light path that universal stage (22) places this collimated light beam; Support universal stage (22) turntable (24) at the middle and upper levels is connected by rotary middle spindle (27) with lower floor's platform (23), upper strata turntable (24) can center on rotary middle spindle (27) rotation, and can use holding screw (26) by rotation draw-in groove (25) upper strata turntable (24) to be fixed on lower floor's platform (23); Lay on the upper strata turntable (24) and adjust Reflector base (28) and Optical grating base (30), and these two pedestals become 90 ° of angles to install, the first adjusting screw group (29) is positioned at the both sides of adjusting Reflector base (28), the second adjusting screw group (31) is positioned at the both sides of Optical grating base (30), and the 3rd adjusting screw group (32) is positioned at the both sides of Optical grating base (30) left end; Adjusting catoptron (16) is placed on the adjustment Reflector base (28), benchmark grating (20) is placed on the Optical grating base (30), and adjust catoptron (16) and become 90 ° of angles with the surface of benchmark grating (20), the collimated light beam that collimating mirror (15) is sent shines the surface of adjusting catoptron (16) and benchmark grating (20); The first bundle incident light (17) that comes from collimating mirror (15) intersects with the second bundle incident light (18) that reflects through adjustment catoptron (16), form interference field (19) at intersectional region, and benchmark grating (20) is positioned at interference field (19), the grating line direction of benchmark grating (20) is restrainted the plane that incident light (18) is formed perpendicular to the first bundle incident light (17) and second, and the surface of benchmark grating (20) is towards collimating mirror (15).
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| Application Number | Priority Date | Filing Date | Title |
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| CN200910215469A CN101750649A (en) | 2009-12-31 | 2009-12-31 | Groove spacing accurately adjusting device in holographic grating manufacturing light path |
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| Application Number | Priority Date | Filing Date | Title |
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| CN200910215469A CN101750649A (en) | 2009-12-31 | 2009-12-31 | Groove spacing accurately adjusting device in holographic grating manufacturing light path |
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| CN101750649A true CN101750649A (en) | 2010-06-23 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102540298A (en) * | 2012-02-01 | 2012-07-04 | 中国科学技术大学 | Soft X-ray double-frequency gratings and manufacture method thereof |
| CN102681366A (en) * | 2012-05-28 | 2012-09-19 | 上海理工大学 | Exposure light path system in production of concave holographic grating and method for adjusting gyration center |
| CN109407194A (en) * | 2018-12-19 | 2019-03-01 | 清华大学 | It is used to form the device of grating |
| CN112285872A (en) * | 2020-10-29 | 2021-01-29 | 中国航空工业集团公司洛阳电光设备研究所 | Laser mirror unit adjustment method applied to 1064nm |
| CN115185100A (en) * | 2022-06-22 | 2022-10-14 | 成都飞机工业（集团）有限责任公司 | Method for generating encrypted dot-matrix light field |
-
2009
- 2009-12-31 CN CN200910215469A patent/CN101750649A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102540298A (en) * | 2012-02-01 | 2012-07-04 | 中国科学技术大学 | Soft X-ray double-frequency gratings and manufacture method thereof |
| CN102681366A (en) * | 2012-05-28 | 2012-09-19 | 上海理工大学 | Exposure light path system in production of concave holographic grating and method for adjusting gyration center |
| CN102681366B (en) * | 2012-05-28 | 2014-12-17 | 上海理工大学 | Exposure light path system in production of concave holographic grating and method for adjusting gyration center |
| CN109407194A (en) * | 2018-12-19 | 2019-03-01 | 清华大学 | It is used to form the device of grating |
| CN112285872A (en) * | 2020-10-29 | 2021-01-29 | 中国航空工业集团公司洛阳电光设备研究所 | Laser mirror unit adjustment method applied to 1064nm |
| CN115185100A (en) * | 2022-06-22 | 2022-10-14 | 成都飞机工业（集团）有限责任公司 | Method for generating encrypted dot-matrix light field |
| CN115185100B (en) * | 2022-06-22 | 2023-08-04 | 成都飞机工业（集团）有限责任公司 | Encryption lattice type light field generation method |
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Open date: 20100623 |