CN101685192B - Support and alignment method for inhibiting large mirror astigmatic deformation - Google Patents
Support and alignment method for inhibiting large mirror astigmatic deformation Download PDFInfo
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- CN101685192B CN101685192B CN2008101511314A CN200810151131A CN101685192B CN 101685192 B CN101685192 B CN 101685192B CN 2008101511314 A CN2008101511314 A CN 2008101511314A CN 200810151131 A CN200810151131 A CN 200810151131A CN 101685192 B CN101685192 B CN 101685192B
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- large mirror
- face type
- distortion
- type profile
- wavefront distortion
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/183—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors specially adapted for very large mirrors, e.g. for astronomy, or solar concentrators
Abstract
The invention relates to a support and alignment method for inhibiting large mirror astigmatic deformation, which comprises the following steps: firstly measuring the wavefront distortion of an optical system containing a large mirror or the surface contour of the large mirror to obtain the direction and the size of astigmatic deformation through data fitting; adjusting by a crisscross or an approximately crisscross support and adjustment method, and then measuring the wavefront distortion or the surface contour to obtain the direction and the size of the adjusted astigmatic deformation through data fitting; if the wavefront distortion is reduced or the surface contour is more approximate to a design result, readjusting along a previous adjusting direction; if the wavefront distortion is enlarged or the surface contour is deviated from the design result, readjusting along the direction opposite to the previous adjusting direction; and repeating the adjustment and measurement until design requirements are satisfied. The invention solves the technical problems of complicated support and adjustment, difficult deformation error correction, larger analytical data amount, higher analysis difficulty, slow adjustment process and low adjustment accuracy. The invention has lower design requirements for the assembled structure of the large mirror and can be conveniently realized.
Description
Technical field
The present invention relates to a kind of support that suppresses large mirror distortion and debug method, be specifically related to a kind ofly suppress " ten " font of large mirror astigmatism distortion or method is debug in the support of approximate " ten " font.
Background technology
Debug in the engineering at optics, the astigmatism distortion of large mirror is often to run into the comparison stubborn problem.At the distortion of large mirror, the existing method of debuging mainly contains following three kinds:
A kind of is the method that thoroughly discharges stress.Promptly by reducing external force to the elastomeric effect of mirror embryo, large mirror returned back to be subjected to hardly the desirable face type of external force.This method is difficult to reach the desirable face type that is subjected to external force hardly in the specific implementation, debug the good degree that effect depends primarily on the structural design of assembling large mirror, be subjected to the influence of environment for use bigger simultaneously, any big vibrations, the temperature difference, impact, air-flow all can change expected effect, so it is big to implement difficulty.
Another kind is by the method for simulation calculation at the process segment deformation allowance.This method is by Computer Simulation, calculate debug, the deflection of operational phase, add penalty function in the process segment, best face type is being debug, directly reached when using to deformation allowance in advance.This method depends on simulation accuracy, and simulation calculation is difficult to the mathematical model that foundation really meets engineering reality, in case the penalty function deviation is bigger, not only can't revise distortion inaccuracy, also can directly cause the processing failure of large mirror.
Also having a kind of is the method that positive force is intervened the face type, it adopts complicated multi-point support mode usually, because the measure of supporting and adjusting is too complicated, cause adjustment process slow, large mirror face type changes not direct to the reaction of adjustment amount, be difficult to after the face type changes fast by readjusting recovery, it is bigger to analyze data volume and difficulty.
Summary of the invention
The object of the present invention is to provide a kind of support that suppresses the distortion of large mirror astigmatism to debug method, it has solved the measure complexity that supports and adjust in the background technology, is difficult to revise distortion inaccuracy, and it is bigger to analyze data volume and difficulty, adjustment process is slow, adjusts the low technical matters of precision.
Design proposal of the present invention is as follows:
Method is debug in a kind of support that suppresses the distortion of large mirror astigmatism, and it mainly comprises following performing step:
Step 1: measure the wavefront distortion of the optical system that comprises large mirror 1, perhaps directly measure the face type profile of large mirror 1;
Step 2: data fitting is carried out in wavefront distortion or face type profile, obtain the size and the astigmatism direction b of astigmatism distortion;
Step 3: on the supporting surface 3 of large mirror 1, the strong point 4 is set, makes the orientation a of the strong point 4 lines perpendicular with astigmatism direction b or convergence is vertical;
Step 4: the top is set on the adjustment face 5 of large mirror 1 draws adjusting mechanism, make the top draw the adjustment direction of adjusting mechanism identical with astigmatism direction b;
Step 5: adjust the top and draw adjusting mechanism; Then, measure large mirror 1 or comprise the wavefront distortion of the optical system of large mirror 1, or measure the face type profile of large mirror 1;
Step 6: judge wavefront distortion or face type profile that whether wavefront distortion or face type profile meet design requirement;
Step 7: data fitting is carried out in wavefront distortion or face type profile, obtain size and astigmatism direction b through the astigmatism distortion after adjusting;
Step 8: if the wavefront distortion of step 7 further reduces with respect to the wavefront distortion of step 1, or the face type profile of step 7 and designing requirement result's error further reduces with respect to the face type profile of step 1 and designing requirement result's error, then adjusts the top once more along the adjustment direction of step 5 and draws adjusting mechanism; If the wavefront distortion of step 7 further increases with respect to the wavefront distortion of step 1, or the face type profile of step 7 and designing requirement result's error further increases with respect to the face type profile of step 1 and designing requirement result's error, then draws adjusting mechanism along adjusting the top in the opposite direction once more with step 5 adjustment side;
Step 9: repeating step five to eight, until wavefront distortion that meets design requirement or face type profile.
The line of the above strong point 4 is straight line or is approximately straight line.
The above measurement comprises the wavefront distortion of large mirror 1 optical system can adopt interferometer 2 or Wavefront sensor etc., and the face type profile of described measurement large mirror 1 can adopt interferometer 2, Wavefront sensor or contour outline measuring set etc.
The contour outline measuring set that the face type profile of the above measurement large mirror 1 is adopted adopts contact profile measuring instrument or noncontact profile measurer all can.
The present invention has following advantage:
1. the present invention can effectively suppress the astigmatism distortion of the symmetrical large mirror of circle, and the astigmatic image error and the coma aberration that make optical system debug the result significantly reduce, thereby optical system wavefront distortion error is restrained fast.
2. adopt the support adjustment of " ten " font or approximate " ten " font, method of adjustment is simple, and large mirror face type changes adjusting quantitative response direct, and it is little to analyze data volume, is easy to realize.
3. lower to the designing requirement of large mirror assembly structure, adjust simple in structurely, realize easy.
4. realize that processing step is simple, the adjustment direction of objective function optimization is judged easily.
5. adjust efficient height, objective function fast convergence rate.
6. be beneficial to the formation automatic regulating apparatus.
7. measure while adjusting,, fast correction timely according to measurement result, the precision height reaches requirement until the effective surface type.
Description of drawings
Fig. 1 measures the synoptic diagram of light path for the present invention.
Schematic layout pattern when Fig. 2 is the invention process.
The explanation of accompanying drawing drawing: the 1-large mirror, the 2-interferometer, the 3-supporting surface, the 4-strong point, 5-adjusts face; The orientation of a-strong point line, b-astigmatism direction.
Embodiment
Principle of the present invention: large mirror is as the optical system of principal reflection mirror, usually mainly cause through the astigmatic image error that still exists after conventional the debuging by large mirror distortion itself, so, the astigmatism direction that analysis obtains to optical system wavefront distortion measurement result, or directly measure the astigmatism direction that large mirror wavefront distortion interpretation of result obtains, all directly related with large mirror self-deformation direction.Any optical material all can be considered elastic body when analyzing its surface deformation, its mechanical deformation relation all satisfies generalized Hooke law.The optical interferometry result can characterize the distortion on laser corrugated after the large mirror reflection, the distortion on laser corrugated can characterize large mirror face type indirectly and change, characterize the elastomeric strain conditions of mirror embryo simultaneously indirectly, therefore, according to generalized Hooke law, distribution, the size and Orientation of the adjustment power of the distortion that can be inhibited.The present invention is according to the essential characteristic of astigmatic image error, to be out of shape large mirror and simply fit to a shape of a saddle quadric surface, then can obtain a pair of application of force and stressed naive model, be that elastomeric support of large mirror mirror embryo and adjusting mechanism will distribute along the direction of " ten " font or approximate " ten " font, abbreviate " ten " font as and distribute.In adjustment process of the present invention, the mirror embryo is elastomeric should change direction factor affecting such as can being subjected to environment temperature, vibration, attitude and change, after each optical detection is finished, again revise the distribution arrangement of support and adjusting mechanism, make it to change, then can guarantee to suppress the lasting effectiveness of means with the astigmatism direction.
Specific implementation step of the present invention is as follows:
Step 1: comprise the wavefront distortion of the optical system of large mirror 1 by interferometer 2 or Wavefront sensor measurement.Perhaps directly measure the face type profile of large mirror by Wavefront sensor, contour outline measuring set or interferometer 2.Contour outline measuring set can be the contact profile measuring instrument, also can be non-contact profile measuring instrument.Referring to Fig. 1.
Step 2: data fitting is carried out in wavefront distortion or face type profile, obtain the size and the astigmatism direction b of astigmatism distortion.Referring to Fig. 2.
Step 3: on the supporting surface 3 of large mirror, the strong point 4 is set, makes the orientation a of the strong point 4 lines perpendicular with astigmatism direction b or convergence is vertical, form " ten " font or approximate " ten " font.The line of the strong point 4 is straight line or is approximately straight line.Referring to Fig. 2.
Step 4: the top is set on the adjustment face 5 of large mirror draws adjusting mechanism, make the top draw the adjustment direction of adjusting mechanism identical with astigmatism direction b.
Step 5: adjust the top and draw adjusting mechanism, adjusting direction can choose at random.Then, measure adjusted large mirror 1 or comprise the wavefront distortion of the optical system of large mirror 1, or directly measure the face type profile of adjusted large mirror 1.
Step 6: judge wavefront distortion or face type profile that whether wavefront distortion or face type profile meet design requirement;
Step 7: data fitting is carried out in wavefront distortion or face type profile, obtain size and astigmatism direction b through the astigmatism distortion after adjusting.
Step 8: further reduce if the wavefront distortion of step 1 is compared in the wavefront distortion of step 7, then adjust the top once more and draw adjusting mechanism along the adjustment direction of step 5.Perhaps, error between the face type profile of the error between the face type profile of the face type profile of step 7 and designing requirement and the face type profile of step 1 and designing requirement, the two is compared, if the former further reduces, then adjusts the top once more along the adjustment direction of step 5 and draws adjusting mechanism.Further increase if the wavefront distortion of step 1 is compared in the wavefront distortion of step 7, then draw adjusting mechanism along adjusting the top in the opposite direction once more with step 5 adjustment side.Perhaps, error between the face type profile of the error between the face type profile of the face type profile of step 7 and designing requirement and the face type profile of step 1 and designing requirement, the two is compared, if the former further increases, then draw adjusting mechanism along adjusting the top in the opposite direction once more with step 5 adjustment side.
Step 9: repeating step five to eight, until wavefront distortion that meets design requirement or face type profile.
Claims (4)
1. method is debug in a support that suppresses the distortion of large mirror astigmatism, and it mainly comprises following performing step:
Step 1: measure the wavefront distortion of the optical system that comprises large mirror (1), perhaps directly measure the face type profile of large mirror (1);
Step 2: data fitting is carried out in wavefront distortion or face type profile, obtain the size and the astigmatism direction (b) of astigmatism distortion;
Step 3: on the supporting surface (3) of large mirror (1), the strong point (4) is set, makes the orientation (a) of the strong point (4) line perpendicular with astigmatism direction (b) or convergence is vertical;
Step 4: the top is set on the adjustment face (5) of large mirror (1) draws adjusting mechanism, make the top draw the adjustment direction of adjusting mechanism identical with astigmatism direction (b);
Step 5: adjust the top and draw adjusting mechanism; Then, measure large mirror (1) or comprise the wavefront distortion of the optical system of large mirror (1), or measure the face type profile of large mirror (1);
Step 6: judge wavefront distortion or face type profile that whether wavefront distortion or face type profile meet design requirement;
Step 7: data fitting is carried out in wavefront distortion or face type profile, obtain size and astigmatism direction (b) through the astigmatism distortion after adjusting;
Step 8: if the wavefront distortion of step 7 further reduces with respect to the wavefront distortion of step 1, or the face type profile of step 7 and designing requirement result's error further reduces with respect to the face type profile of step 1 and designing requirement result's error, then adjusts the top once more along the adjustment direction of step 5 and draws adjusting mechanism; If the wavefront distortion of step 7 further increases with respect to the wavefront distortion of step 1, or the face type profile of step 7 and designing requirement result's error further increases with respect to the face type profile of step 1 and designing requirement result's error, then draws adjusting mechanism along adjusting the top in the opposite direction once more with step 5 adjustment side;
Step 9: repeating step five to eight, until wavefront distortion that meets design requirement or face type profile.
2. method is debug in the support of inhibition large mirror astigmatism distortion according to claim 1, and it is characterized in that: the line of the described strong point (4) is straight line or is approximately straight line.
3. method is debug in the support of inhibition large mirror astigmatism distortion according to claim 1 and 2, it is characterized in that: the wavefront distortion that described measurement comprises large mirror (1) optical system is to adopt interferometer (2) or Wavefront sensor, and the face type profile of described measurement large mirror (1) is to adopt interferometer (2), Wavefront sensor or contour outline measuring set.
4. method is debug in the support of inhibition large mirror astigmatism distortion according to claim 3, and it is characterized in that: the contour outline measuring set that the face type profile of described measurement large mirror (1) is adopted is contact profile measuring instrument or noncontact profile measurer.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101511314A CN101685192B (en) | 2008-09-26 | 2008-09-26 | Support and alignment method for inhibiting large mirror astigmatic deformation |
| PCT/CN2008/002127 WO2010034144A1 (en) | 2008-09-26 | 2008-12-30 | Supporting and adjusting method for restraining astigmatism of a large mirror surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101511314A CN101685192B (en) | 2008-09-26 | 2008-09-26 | Support and alignment method for inhibiting large mirror astigmatic deformation |
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| Publication Number | Publication Date |
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| CN101685192A CN101685192A (en) | 2010-03-31 |
| CN101685192B true CN101685192B (en) | 2011-02-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2008101511314A Expired - Fee Related CN101685192B (en) | 2008-09-26 | 2008-09-26 | Support and alignment method for inhibiting large mirror astigmatic deformation |
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| Country | Link |
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| CN (1) | CN101685192B (en) |
| WO (1) | WO2010034144A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI641875B (en) * | 2016-12-16 | 2018-11-21 | 日商三菱電機股份有限公司 | Deformable mirror and laser processing apparatus |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105676409B (en) * | 2016-02-23 | 2018-06-19 | 中国科学院长春光学精密机械与物理研究所 | The adjusting method and regulating system of space optical camera principal reflection mirror and main frame |
| CN110095858B (en) * | 2018-12-12 | 2021-06-08 | 中国科学院紫金山天文台 | Self-adaptive optical deformable mirror elastic modal aberration characterization method |
| CN112033302B (en) * | 2020-08-25 | 2021-11-23 | 长春长光智欧科技有限公司 | Optical system installation and adjustment equipment capable of compensating in real time and installation and adjustment method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1162754A (en) * | 1996-04-18 | 1997-10-22 | 三菱电机株式会社 | Shape contorl apparatus for reflecting mirrors |
| CN2473625Y (en) * | 2001-03-28 | 2002-01-23 | 中国科学院长春光学精密机械与物理研究所 | Thin film type reflective mirror shape mechanical regulator |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958402A (en) * | 1982-09-29 | 1984-04-04 | Hitachi Ltd | Mirror surface correcting method of reflection mirror |
| US6411426B1 (en) * | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
| JP2003234269A (en) * | 2002-02-07 | 2003-08-22 | Nikon Corp | Method of supporting reflecting mirror, supporting member therefor, and exposure apparatus |
| JP3787556B2 (en) * | 2003-02-17 | 2006-06-21 | キヤノン株式会社 | Holding apparatus, exposure apparatus, and device manufacturing method |
| JP4565908B2 (en) * | 2004-06-25 | 2010-10-20 | 株式会社大日本科研 | Adjustment method of aspherical collimating mirror |
-
2008
- 2008-09-26 CN CN2008101511314A patent/CN101685192B/en not_active Expired - Fee Related
- 2008-12-30 WO PCT/CN2008/002127 patent/WO2010034144A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1162754A (en) * | 1996-04-18 | 1997-10-22 | 三菱电机株式会社 | Shape contorl apparatus for reflecting mirrors |
| CN2473625Y (en) * | 2001-03-28 | 2002-01-23 | 中国科学院长春光学精密机械与物理研究所 | Thin film type reflective mirror shape mechanical regulator |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI641875B (en) * | 2016-12-16 | 2018-11-21 | 日商三菱電機股份有限公司 | Deformable mirror and laser processing apparatus |
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| Publication number | Publication date |
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| WO2010034144A1 (en) | 2010-04-01 |
| CN101685192A (en) | 2010-03-31 |
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