CN101624142A - Transferring device, transferring chamber having same function and vacuum processing system having same functional device - Google Patents
Transferring device, transferring chamber having same function and vacuum processing system having same functional device Download PDFInfo
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- CN101624142A CN101624142A CN200910160775A CN200910160775A CN101624142A CN 101624142 A CN101624142 A CN 101624142A CN 200910160775 A CN200910160775 A CN 200910160775A CN 200910160775 A CN200910160775 A CN 200910160775A CN 101624142 A CN101624142 A CN 101624142A
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- arm unit
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0052—Gripping heads and other end effectors multiple gripper units or multiple end effectors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
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- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention discloses a transferring device for transferring an object to be transferred, such as a substrate, a transferring chamber having same function, and a vacuum processing system having a same functional device. The transferring device comprises: a first transferring assembly which comprises a first handle for supporting the object to be transferred, a first rotary arm unit for transferring the object to be transferred by rotating and linear moving the first handle, and a first drive shaft for driving the first rotary arm unit rotatablely; a second transferring assembly which has interval with the first transferring assembly and comprises a second handle for supporting the object to be transferred, a second rotary arm unit for transferring the object to be transferred by rotating and linear moving the second handle, and a second drive shaft for rotary driving the second rotary arm unit, wherein, a rotary zone of the first rotary arm unit is overlapped with a rotary zone of the second rotary arm unit respectively. The transferring device can reduce an installing space and a size of the transferring chamber, which can reduce time for reducing or increasing an inner pressure of the transferring chamber, accordingly, a production force is increased.
Description
Technical field
The present invention relates to will be to be transmitted the transmission assembling device that transmits of object (for example substrate), have the transfer chamber of identical function, and comprise vacuum flush system with same functional device.
Background technology
Usually, vacuum flush system comprises the vacuum treated process chamber of enforcement; With the transfer chamber that is installed in process chamber one side, be used for from outside reception substrate, the pressure of this transfer chamber is decreased to vacuum state from atmospheric condition, then this substrate is sent in this process chamber, and be used for fetching this substrate from this process chamber, the pressure of this transfer chamber is increased to this atmospheric condition from this vacuum state, then this substrate is sent to the outside.
A pair of transfer robot is installed in this transfer chamber, and these two transfer robots alternately implement the substrate exchange process, for example, and to the recovery and the introducing process of the substrate in this process chamber and this transfer chamber.
Alternately realize this atmospheric condition and this vacuum state when when this transfer chamber and this process chamber exchange this substrate and with the outside, exchanging this substrate.Here, change according to the inner volume of this transfer chamber the pressure in this transfer chamber is converted to time of this vacuum state from atmospheric condition, or (following will being called as " pressure fringe time ") conversely.
With regard to bigger substrate and since this more the transfer chamber of large substrates have relatively bigger volume, this may cause the increase of the pressure fringe time between this atmospheric condition and this vacuum state.And this may cause the increase of the vacuum processing time of substrate, thereby reduces capacity rating.
Therefore, need a kind of method that reduces the inner volume of this transfer chamber.
Summary of the invention
Therefore, an object of the present invention is to provide a kind of conveyer that can reduce the space that a pair of transfer assembly occupies, have the transfer chamber of said function, and the vacuum flush system that comprises the device with said function.
The installing space that another object of the present invention provides a kind of inner volume of transfer chamber that can be by reducing to install this conveyer, this conveyer by reducing to have a pair of transfer assembly reduces the conveyer of pressure fringe time greatly, have the transfer chamber of identical function, and the vacuum flush system that comprises the device with said function.
In order to realize the advantage of these and other, and according to purpose of the present invention, as here embodied with broadly described, a kind of conveyer is provided, comprise: first transfer assembly, comprise the first handle of the object that support will transmit, by linear this first handle that moves of self rotation so that transmit the first pivot arm unit that this waits to transmit object, and first axle drive shaft of this first pivot arm unit of rotary driving; Be set to second transfer assembly that separates with this first transfer assembly, this second transfer assembly comprise support the second handle wait to transmit object, by rotating linear this second handle that moves so that transmit the second pivot arm unit that this waits to transmit object, and second axle drive shaft of this second pivot arm unit of rotary driving, wherein the rotary area of the rotary area of this first pivot arm unit and this second pivot arm unit overlaps each other.
According to a further aspect in the invention, a kind of conveyer is provided, comprise: first transfer robot comprises: support the first handle of waiting to transmit object, and by rotating linear this first handle that moves so that transmit the first pivot arm unit that this waits to transmit object; Be set to second transfer robot that separates with this first transfer robot, this second transfer assembly comprises and supports the second handle wait to transmit object, and by rotating linear this second handle that moves so that transmit the second pivot arm unit that this waits to transmit object, wherein this first and second pivot arms unit rotates between this first and second transfer robot.
This first pivot arm unit can comprise first link, and it is mounted and makes the one side can be the center rotation with this first axle drive shaft; And with opposite side bonded assembly second connecting bridge of this first link, make that it can be by rotating with cooperatively interacting of this first pontes, be used to support this first handle, and this second pivot arm unit can comprise first link, and it is mounted and makes the one side can be the center rotation with this second axle drive shaft; And with opposite side bonded assembly second link of this first link, make it to be used to support this second handle by rotating with cooperatively interacting of this first link.
This first and second handle can be installed, to prevent that being waited to transmit object disturbs respectively.
This first handle can comprise that supporting this waits to transmit the support component of object; The coupling unit that connects this first pivot arm unit; And this coupling unit and this support component be connected to each other, and transmit the link of object by second handle transmission band,
This first and second handle can be installed makes its direction at this first axle drive shaft have the height that differs from one another.
Can pass through to divide other driver element individual drive this first and second axle drive shaft, or drive in turn by a driver element.
In order to realize the advantage of these and other, and,, also provide a kind of transfer chamber with this conveyer as here embodied with broadly described according to purpose of the present invention.
This transfer chamber can also comprise pressure controller, is used for the interior pressure of this transfer chamber is reduced to vacuum state from atmospheric condition, perhaps is used for the interior pressure of this transfer chamber is increased to this atmospheric condition from this vacuum state, so that transmit this object to be transmitted.
This transfer chamber can comprise that comprising a plurality of being installed to be can move up and down, thereby moves up and down this is transmitted the lifting leg of object by waiting of supporting of first and second handles jacking system; And one or more driver elements up and down that drive this lifting leg up and down.And this transfer chamber can also comprise adjusts the adjuster of installing condition of waiting to transmit object be installed on this first and second handle.
In order to realize the advantage of these and other, and,, also provide a kind of vacuum flush system, having comprised: the thin slice that application of vacuum will transmit or the process chamber of substrate as here embodied with broadly described according to purpose of the present invention; And the transfer chamber that is connected in this process chamber.
This conveyer according to the present invention has following advantage.
At first, because the first and second pivot arm unit of this first and second transfer assembly rotate between this first and second transfer assembly, the installing space of this conveyer can be minimized.And the transfer chamber that this conveyer is installed can have minimized inner volume.
Under the situation of the inner volume that minimizes this transfer chamber, can reduce the pressure fringe time, thereby reduce the time that is used for handling fully this substrate.Therefore, can increase productivity.
Secondly, can have the inner volume that is reduced, therefore can reduce manufacturing cost because the transfer chamber of this conveyer has been installed.This can solve the common difficulty that is occurred when transmitting this substrate by the transfer chamber with bigger inner volume.
The present invention is described in detail below in conjunction with accompanying drawing, makes aforesaid purpose, feature, aspect and the advantage with other of the present invention become more obvious.
Description of drawings
Comprise this accompanying drawing,, this accompanying drawing is comprised wherein, form the part of this specification sheets, illustrate embodiment of the present invention, and explain principle of the present invention with this description with to the invention provides better understanding.
Among the figure:
Fig. 1 is the section plan according to conveyer of the present invention;
Fig. 2 to 5 be respectively with the cooresponding figure of Fig. 1, show according to the process that object transmits that transmits for the treatment of of the present invention;
Fig. 6 is the cutaway view along " A-A " line among Fig. 1; And
Fig. 7 is the transparent view according to the main portion of conveyer of the present invention.
The specific embodiment
The present invention is described in detail below with reference to accompanying drawings.
To provide preferred implementation of the present invention, this embodiment is shown in the drawings.
Hereinafter, will illustrate in greater detail according to conveyer of the present invention, have the transfer chamber of identical function and comprise vacuum flush system with same functional device.
Vacuum flush system of the present invention is used to implement predetermined process, under vacuum state, for example to thin slice or substrate 2 (as liquid crystal display (Liquid Crystal Display, the etch processes on the surface LCD) glass substrate of plate), perhaps thin slice or and the surface applied of substrate 2 have the processing of the tin thin film of predetermined characteristic.
This vacuum flush system comprises: be used for the process chamber 4 of this thin slice of application of vacuum or substrate 2, and be connected in process chamber 4 a side, be used between process chamber 4 and outside transmitting the transfer chamber 10 of substrate 2.
This transfer chamber 10 can embedded form connection processing chamber 4, is used for the level and smooth transmission of this substrate 2.
In transfer chamber 10, the conveyer that is used to transmit substrate 2 is installed, substrate 2 is introduced this transfer chamber 10 or withdraw from from this transfer chamber 10.And this transfer chamber 10 has a plurality of doors 12 that open or close according to each and this process chamber 4 or the outside gate valve (not shown) that links to each other.
And, this transfer chamber can be configured to have the pressure that is reduced to vacuum state from atmospheric condition, this substrate 2 is sent to this process chamber 4 at vacuum state, or the like, perhaps can be configured to have the pressure that is increased to this atmospheric condition from this vacuum state, this substrate 2 is withdrawed to the outside from this process chamber 4 in this atmospheric condition.
This transfer chamber 10 can comprise: be used to control pressure in the transfer chamber 10 with the pressure controller (not shown) that this substrate 2 is exchanged, the jacking system (not shown) that is used to move up and down this substrate 2, and the adjuster (not shown) of adjusting this substrate 2.
For the transmission of this substrate 2, this pressure controller can be configured to the internal pressure of this transfer chamber 10 is reduced to vacuum state from atmospheric condition, perhaps can be configured to the internal pressure of this transfer chamber 10 is brought up to atmospheric condition from this vacuum state.And this pressure controller can comprise the exhaust gear (not shown) that provides the gas feeder (not shown) to this transfer chamber 10 with gas and be used for getting rid of the gas of this transfer chamber 10.
Jacking system can comprise and is installed to be a plurality of lifting leg (not shown) moving up and down, so that move up and down this substrate 2 that is supported by the first handle 32 that will explain below or second handle 42; And one or more (not shown)s of driver element up and down that are used for driving up and down this lifting leg.
Adjuster is used to adjust the installing condition that is installed on this substrate 2 on this first handle 32 or the second handle 42, and can have multiple structure.
This conveyer is used to transmit this substrate 2, and can have multiple structure according to design.This conveyer can comprise the transfer assembly of this substrate 2 of one or more transmission.
This conveyer can be used as the independent type of being made up of a transfer assembly and realizes.Yet this conveyer preferably realizes as the bigeminy type is made up of a pair of transfer assembly, so that smoothly exchange this substrate in this substrate 2 and this process chamber 4, perhaps arrives this process chamber 4 so that more promptly transmit this substrate 2.
More specifically, this conveyer comprises first transfer assembly 30, and second transfer assembly 40 that is installed in these transfer chamber 10 opposite sides.
This first and second transfer assembly 30,40 can have any structure that transmits this substrate 2.Yet, more preferably minimize the size of this transfer chamber 10.
Hereinafter, be this first and second transfer assembly 30,40 that minimizes these transfer chamber 10 sizes with describing structure in detail.
This first transfer assembly 30 can comprise the first handle 32 that is used to support this substrate 2, and linear this first handle 32 that moves of the rotation of first axle drive shaft 37 by first drive element 36 is so that transmit the first pivot arm unit 34 of this substrate 2.
This first handle 32 is used at linear this substrate 2 that moves of constant direction.And this first handle 32 can be fixedly installed in this first pivot arm unit 34 or be rotated and be coupled to this first pivot arm unit 34, so that smoothly move this substrate 2.In addition, this first handle 32 can be by power transmission component such as band ﹠amp; Pulley and gear cluster are connected with this first pivot arm unit.
Although this first and second transfer assembly 30,40 is installed closer to each otherly, this first handle 32 preferably is configured to prevent disturb this substrate 2 that transmits through second transfer assembly 40, is used for the minimizing of installing space of this conveyer.
With reference to figure 6 and 7, this first handle 32 can comprise the support component 32A that supports this substrate 2; Be positioned over below this support component 32A, have with it spacing distance and with the coupling unit 32B of these first pivot arm unit, 34 couplings; And be used to connect this coupling unit 32B and this support component 32A's and transmit the link 32C of these substrates 2 by this second handle 42 of this second transfer assembly 40.
Under these configurations, the substrate 2 that this first handle 32 by this first transfer assembly 30 transmits is moved by linear on this support component 32A of this first handle 32, and the substrate 2 that this second handle 42 by this second transfer assembly 40 transmits is moved by linear between this support component 32A and this coupling unit 32B.Owing to vary in weight, this first and second transfer assembly 30,40, and can avoid interfering with each other by this substrate 2 that this first and second transfer assembly 30,40 transmits.
In order to stop the phase mutual interference of this substrate 2, carry out the different configurations that are provided with as height to this first and second handle 32,42, this first driver element 36 can be configured to have the height different with this second driver element 46.
For this substrate 2 of stable support, this support component 32A of this first handle 32 preferably is formed into longer than this coupling unit 32B.And in order to prevent to disturb this second handle 42 of this second transfer assembly 40 that will illustrate below, this coupling unit 32B of this first handle 32 preferably is formed into shorter than the support component 32A of this first handle 32.That is to say that this first handle 32 can be formed into has the section shape of opening towards " U " of this second transfer assembly 40.In addition, the support component 32A of this first handle 32 can be formed into longer than the coupling unit 32B of this first handle 32.
For this substrate 2 that prevents to transmit by this first transfer assembly 30 disturbs this first and second transfer assembly 30,40, this first handle 32 preferably is connected with this first pivot arm unit 34, the upside of the second link 34B of this first pivot arm unit 34 for example, below will be described.
This first pivot arm unit 34 can have the linear any structure that moves this substrate 2, and its preferred example will be described as follows.
This first pivot arm unit 34 can comprise and this first axle drive shaft 37 bonded assemblys first link 34A, so that be the center rotation with this first axle drive shaft 37; And with the opposite side bonded assembly second link 34B of this first link 34A so that rotate, to support this first handle 32 by mutual action with this first link 34A.
This first link 34A of this first pivot arm unit 34 can be directly connected to this first driver element 36, perhaps can be coupled in this first driver element 36 by the propulsive effort transmitter.
In order to minimize the size of this transfer chamber 10, this first pivot arm unit 34 preferably is configured to rotation between this first and second transfer assembly 30,40.
Specifically, can be installed to be part overlapped for the rotary area of the rotary area of this first pivot arm unit 34 and this second pivot arm unit 44.
As mentioned above, in order to minimize the size of this transfer chamber 10, shown in C1 among Fig. 1, the first link 34A of the first pivot arm unit 34 is set to rotation between first and second transfer assemblies 30,40.Here, as previously mentioned, for the second link 34B of linear moving substrate 2, the first pivot arm unit 34 is set to rotate like that shown in C2 among Fig. 1.
The second link 34B of the first pivot arm unit 34 can be coupled to the upside of the first link 34A of the first pivot arm unit 34, prevents to be subjected to by the substrate 2 that first transfer assembly 30 transmits the interference of first and second transfer assemblies 30,40.
Preferably, this second handle 42 is set to not disturb the substrate 2 that is transmitted by first transfer assembly 30.That is, this second handle 42 can be installed like this so that the substrate 2 that is transmitted by this second handle 42 can be transmitted at the downside of the substrate 2 that is transmitted by first transition components 30.
Preferably, this second handle 42 is fabricated to have than length, so that stable support substrate 2.
This second handle 42 can be coupled to the upside of the second pivot arm unit 44 in the mode identical with first handle 32.
Adopt the mode identical with the first pivot arm unit 34, the second pivot arm unit 44 can comprise the first link 44A and the second link 44B, to rotate between first and second transfer assemblies 30,40., the first link 44A is set to rotate like that shown in C3 among Fig. 1; The second link 44B is set to rotate like that shown in C4 among Fig. 1.
In order to prevent the first and second pivot arm unit 34,44 phase mutual interference, the first and second pivot arm unit 33 of first and second transfer assemblies 30,40, distance between 44 the center (L) can be in contact with one another with the end that prevents the first and second pivot arm unit 33,44 by long enough.
Install like this when first and second transfer assemblies 30,40, make it under not disturbing mutually when farthest closer to each other, substrate 2 can linearly very glibly move, and can minimize the size of transfer chamber 10.
At this, the centre of gration of the first and second pivot arm unit 34,44 can be set on the diverse location of a direction of transfer of substrate 2, perhaps is set at along on the same straight line perpendicular to substrate 2 direction of transfers.
In the present invention, first and second transfer assemblies 30,40 are by first and second driver elements, 36,46 difference individual drive.But first and second axle drive shafts 37,47 can be by a drive unit drives.
Under the situation by a drive unit drives, driver element can have a power-transfer clutch to be waited and drives first axle drive shaft 37 or second axle drive shaft 47 selectively.
This conveyer is used for transmitting substrate 2, and the minimized installing space that provides for a pair of transfer assembly is provided simultaneously.This conveyer need can be applied to that substrate transmits is used for all types of substrate board treatments of treatment substrate and a vacuum flush system.
Hereinafter, will be to the transport process that substrate 2 carries out being made an explanation by conveyer according to the present invention.
Fig. 1 shows such state, and the substrate 2 that transmits from the outside has been installed in first and second transfer assemblies 30,40 (hereinafter, being called first transfer assembly for simplicity) one.In order to exchange substrate 2 glibly, substrate 2 is installed in first and second handles 32,42 one, and this handle is positioned at upside.
In case be opened with the door 12 of exterior, experience vacuum treated substrate 2 fully and from process chamber 4, withdraw from by an additional transfer assembly (not shown).And the substrate 2 of application of vacuum is installed in above in first and second handles 32,42 one, and this handle is positioned at upside.
In case transfer chamber 10 has been finished the process with outside exchange substrate 2, close by gate valve again with the door 12 of exterior.Next, as shown in Figure 1, before the substrate 2 that will introduce transfer chamber 10 was sent to process chamber 4, the air pressure inside of transfer chamber 10 was lowered to default vacuum state, and in this state, transfer chamber 10 is opened by gate valve and process chamber 4 and external isolation.
In case the air pressure inside of transfer chamber 10 becomes the predefined vacuum pressure that equates with the air pressure of process chamber 4 substantially, the door 12 between process chamber 4 and the transfer chamber 10 is unlocked.Correspondingly, transfer chamber 10 and process chamber 4 communicate with each other.
Next, as shown in Figures 2 and 3, vacuum treated substrate 2 withdraws from from transfer chamber 10 thus in the process chamber 4.As shown in Figure 4 and Figure 5, support by first transfer assembly 30, will carry out vacuum treated substrate 2 and introduce process chambers 4 from transfer chamber 10.
At this moment, first and second transfer assemblies 30,40 can be driven simultaneously, are perhaps one after the other driven, and perhaps drive at interval with preset time.
Withdraw from from process chamber 4 in case experienced vacuum treated substrate 2 in process chamber 4, and will carry out vacuum treated substrate 2 and be introduced into process chamber 4, transfer chamber 10 will be opened by gate valve and process chamber 4 and external isolation.In this state, the air pressure inside of transfer chamber 10 has been elevated to atmospheric condition, and transfer chamber 10 is carried out and outside process of carrying out substrate exchange once more then.
Above-mentioned embodiment and advantage only are exemplary illustration, can not be interpreted as limitation of the present invention.This religious doctrine can be applied to the device of other type easily.This description only is used for illustrative purposes, is not used for limiting the scope of claim.There are multiple conspicuous replacement, modifications and variations for a person skilled in the art.The feature of illustrative embodiments described here, structure, method and other characteristics can obtain embodiment extra and/or that change by combined in various manners.
Because existing feature can be specialized by different modes under the situation that does not break away from its characteristics, it is also understood that, the restriction of any details of describing before above-mentioned embodiment is not subjected to, unless offer some clarification on, otherwise that should summarize in the scope of additional claim regulation makes an explanation, therefore fall into claim and define in the scope with boundary, perhaps define the qualification that all variations in the equivalency range with boundary and distortion all should be subjected to accessory claim.
Claims (13)
1, a kind of conveyer comprises:
First transfer assembly comprises: be used to support the first handle of waiting to transmit object, linear move described first handle transmitting the described first pivot arm unit of waiting to transmit object by rotating, and rotation drive first axle drive shaft of the described first pivot arm unit; And
Be set to and described first transfer assembly second transfer assembly separately, described second transfer assembly comprises: be used to support the second handle of waiting to transmit object, by rotating linear mobile described second handle to transmit the described second pivot arm unit of waiting to transmit object, and second axle drive shaft of the described second pivot arm unit of rotary driving
Wherein, the rotary area of the rotary area of the described first pivot arm unit and the described second pivot arm unit is overlapped.
2, a kind of conveyer comprises:
First transfer robot comprises: be used to support and wait to transmit the first handle of object and move described first handle to transmit the described first pivot arm unit of waiting to transmit object by rotating linearity; And
Be set to and described first transfer robot second transfer robot separately, described second transfer robot comprises: be used to support the second handle of waiting to transmit object, and by rotating linear mobile described second handle to transmit the described second pivot arm unit of waiting to transmit object
Wherein, the described first and second pivot arm unit rotate between described first and second transfer robots.
3, conveyer as claimed in claim 1 or 2 is characterized in that, the described first pivot arm unit comprises:
First link, described first link is set to: the one side can be the center rotation with described first axle drive shaft; And
Second link, described second link is coupled to the opposite side of described first link, thereby makes it to rotate by the mutual action with described first link, is used to support described first handle; And
The described second pivot arm unit comprises:
First link, described first link is set to: the one side can be the center rotation with described second axle drive shaft; And
Second link, described second link is coupled to the opposite side of described first link, thereby makes it to rotate by the mutual action with described first link, is used to support described second handle.
4, conveyer as claimed in claim 1 or 2 is characterized in that, described first and second handles be set to prevent its with separately wait to transmit object mutual interference mutually.
5, conveyer as claimed in claim 4 is characterized in that, described first handle comprises:
Be used to support the described support component of waiting to transmit object;
Be coupled to the coupling unit of the described first pivot arm unit; And
Be used to make described coupling unit and described support component to interconnect and transmit the link of the object that sends by described second handle.
6, conveyer as claimed in claim 4 is characterized in that, described first and second handles are set to have different height mutually along the direction of described first axle drive shaft.
7, conveyer as claimed in claim 1 or 2 is characterized in that, described first and second axle drive shafts are by separately driver element individual drive, or is driven in turn by a driver element.
8, a kind of transfer chamber with conveyer as claimed in claim 3.
9, transfer chamber as claimed in claim 8, comprise that also the internal pressure that is used for described transfer chamber is reduced to vacuum state with transmission object to be transmitted from atmospheric condition, or be used for the internal pressure of described transfer chamber is increased to from vacuum state the pressure controller of atmospheric condition.
10, Transmission Room as claimed in claim 8 also comprises jacking system, and described jacking system comprises:
A plurality of lifting legs, it is set to and can moves up and down, moving up and down by described first or the object described to be transmitted that supports of second handle, and
One or more driver elements up and down are used for driving up and down described lifting leg.
11, transfer chamber as claimed in claim 8, also comprise be used to adjust be installed in described first or second handle on the described adjuster of waiting to transmit the installing condition of object.
12, transfer chamber as claimed in claim 8 comprises:
Be used for the internal pressure of described transfer chamber is reduced to vacuum state with transmission object to be transmitted from atmospheric condition, or be used for the internal pressure of described transfer chamber is increased to from vacuum state the pressure controller of atmospheric condition;
Jacking system comprises a plurality of lifting legs, and described lifting leg is set to and can moves up and down, moving up and down by described first or the object described to be transmitted that supports of second handle, and one or more driver element up and down, be used for driving up and down described lifting leg; And
Be used to adjust be installed in described first or second handle on the described adjuster of waiting to transmit the installing condition of object.
13, a kind of vacuum flush system comprises:
The substrate or the substrate that are used to treat transmission carry out vacuum treated process chamber; And
Transfer chamber as claimed in claim 12, described transfer chamber is connected with described process chamber.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080067119A KR101502130B1 (en) | 2008-07-10 | 2008-07-10 | Transfer apparatus, Transfer chamber having the same and vacuum processing system including the same |
| KR1020080067119 | 2008-07-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101624142A true CN101624142A (en) | 2010-01-13 |
Family
ID=41520165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910160775A Pending CN101624142A (en) | 2008-07-10 | 2009-07-10 | Transferring device, transferring chamber having same function and vacuum processing system having same functional device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101502130B1 (en) |
| CN (1) | CN101624142A (en) |
| TW (1) | TWI386353B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103219261A (en) * | 2012-01-21 | 2013-07-24 | 圆益Ips股份有限公司 | Substrate processing device and substrate processing method |
| CN103227132A (en) * | 2012-01-31 | 2013-07-31 | 株式会社安川电机 | Conveying system |
| CN104503073A (en) * | 2014-12-19 | 2015-04-08 | 爱威科技股份有限公司 | Microscope and driving device thereof |
| CN105127996A (en) * | 2012-08-09 | 2015-12-09 | 日本电产三协株式会社 | Industrial robot and control method thereof |
| CN107585550A (en) * | 2017-08-28 | 2018-01-16 | 北京华夏视科技术股份有限公司 | The transmission device and printed circuit board testing device of printed circuit board testing device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7303686B2 (en) * | 2019-07-26 | 2023-07-05 | ニデックインスツルメンツ株式会社 | Work position detection method for robots |
| CN114628311B (en) * | 2022-05-17 | 2022-08-02 | 智程半导体设备科技(昆山)有限公司 | Wafer transmission device and semiconductor equipment |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5957651A (en) * | 1995-06-08 | 1999-09-28 | Kokusai Electric Co., Ltd. | Substrate carrying apparatus |
| JP3973006B2 (en) * | 2000-03-23 | 2007-09-05 | 日本電産サンキョー株式会社 | Double arm robot |
| JPWO2004088741A1 (en) * | 2003-03-28 | 2006-07-06 | 平田機工株式会社 | Substrate transfer system |
| JP2005044981A (en) * | 2003-07-28 | 2005-02-17 | Tokyo Electron Ltd | Carrying device |
| JP4907077B2 (en) * | 2004-11-30 | 2012-03-28 | 株式会社Ｓｅｎ | Wafer processing apparatus, wafer processing method, and ion implantation apparatus |
| WO2006093133A1 (en) * | 2005-02-28 | 2006-09-08 | Nidec Sankyo Corporation | Robot arm and robot |
| WO2007061603A2 (en) * | 2005-11-21 | 2007-05-31 | Applied Materials, Inc. | Methods and apparatus for transferring substrates during electronic device manufacturing |
| JP4933789B2 (en) * | 2006-02-13 | 2012-05-16 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, and storage medium |
-
2008
- 2008-07-10 KR KR1020080067119A patent/KR101502130B1/en active IP Right Grant
-
2009
- 2009-07-08 TW TW098123122A patent/TWI386353B/en not_active IP Right Cessation
- 2009-07-10 CN CN200910160775A patent/CN101624142A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103219261A (en) * | 2012-01-21 | 2013-07-24 | 圆益Ips股份有限公司 | Substrate processing device and substrate processing method |
| CN103227132A (en) * | 2012-01-31 | 2013-07-31 | 株式会社安川电机 | Conveying system |
| CN105127996A (en) * | 2012-08-09 | 2015-12-09 | 日本电产三协株式会社 | Industrial robot and control method thereof |
| CN105127996B (en) * | 2012-08-09 | 2017-05-10 | 日本电产三协株式会社 | Industrial robot and control method thereof |
| CN104503073A (en) * | 2014-12-19 | 2015-04-08 | 爱威科技股份有限公司 | Microscope and driving device thereof |
| CN104503073B (en) * | 2014-12-19 | 2017-07-04 | 爱威科技股份有限公司 | Microscope and its drive device |
| CN107585550A (en) * | 2017-08-28 | 2018-01-16 | 北京华夏视科技术股份有限公司 | The transmission device and printed circuit board testing device of printed circuit board testing device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI386353B (en) | 2013-02-21 |
| KR101502130B1 (en) | 2015-03-13 |
| TW201002590A (en) | 2010-01-16 |
| KR20100006763A (en) | 2010-01-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent for invention or patent application | ||
| CB02 | Change of applicant information |
Address after: Gyeonggi Do, South Korea Applicant after: Yuanyi IPS Corp. Address before: Gyeonggi Do, South Korea Applicant before: IPS Co., Ltd. |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: INTEGRATED PROCESS SYSTEMS LTD. TO: WONIK IPS CO., LTD. |
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| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20100113 |