CN101619440B - Electron beam deflection device of computer controlled coating machine and control method thereof - Google Patents
Electron beam deflection device of computer controlled coating machine and control method thereof Download PDFInfo
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- CN101619440B CN101619440B CN2009100555536A CN200910055553A CN101619440B CN 101619440 B CN101619440 B CN 101619440B CN 2009100555536 A CN2009100555536 A CN 2009100555536A CN 200910055553 A CN200910055553 A CN 200910055553A CN 101619440 B CN101619440 B CN 101619440B
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Abstract
The invention relates to an electron beam deflection device of a computer controlled coating machine and a control method thereof. The electron beam deflection device of the computer controlled coating machine comprises a scanning control instrument, a manual remote controller, a data collecting card and a computer. The invention has high control precision and reliability on electron beam deflection and widespread adaptability on different electron gun equipment. After carrying out the processes of data collection and data processing once, each kind of electron gun equipment can be automatically run and controlled by the computer by adjusting control data by a user.
Description
Technical field
The present invention relates to optical coating, particularly a kind of device of beam deflection of computer controlled coating machine and control method.
Background technology
Carry out in the process of optical thin film preparation in the method that adopts electron beam evaporation, require certain vaporator rate of maintenance and stable evaporation characteristic, to ensure the quality of prepared film.The bundle spot of beating behind stable vaporator rate and evaporation characteristic and the beam deflection on Coating Materials has direct relation, and the shape of bundle spot and energy size directly influence the vaporator rate of Coating Materials; The bundle spot is beaten in the position on Coating Materials surface, directly has influence on Coating Materials and is subjected to the spatial distribution in whole coating chamber after the thermal evaporation, the shape of promptly evaporating cloud.
For obtaining more stable vaporator rate and evaporation characteristic preferably, in coating process, to make the every bit of bundle spot all have identical energy density, perhaps the material of evaporation equal in quality in the same time on the evaporating materials surface as far as possible; In coating process, material surface will keep smooth as far as possible, reduces the instability of evaporation cloud as far as possible.This just requires in coating process, and what the bundle spot that beam deflection produces need not stop moves, and the speed that beam spot moves depends on the character of evaporating materials, so just might realize above requirement.
Be used for the circular crucible that optical coating system has the electron beam emissive source and is positioned at this electron beam emissive source top, two opposite side of this circle crucible are provided with orthogonal directions X deflector coil and Y direction deflector coil outward, and the deflection system of electron beam evaporation system is made up of two orthogonal directions X deflector coils and Y direction deflector coil.In the electron beam evaporation deposition process, electron beam deflection under the action of a magnetic field that deflector coil produces is incident on the Coating Materials surface of circular crucible, makes the Coating Materials evaporation and condense in substrate surface to form film.The change of beam deflection direction is the voltage that rely on to change two deflector coil two ends, and magnetic field realizes thereby change.
The beam deflection of traditional electron beam coater mainly relies on operator to adjust mechanical potentiometer change deflector coil both end voltage and realizes, the precision and the stability of operation can not guarantee, be difficult to reach the smooth of evaporating materials surface, cause evaporating the cloud instability, be not easy to the control of vaporator rate.To these machines, need a kind of autocontrol method that improves precision and stability.
Summary of the invention
In order to improve the electron beam coating quality, make evaporation coating target process produce good, stable evaporation cloud, thereby when evaporation, obtain more stable speed, the invention provides a kind of device and control method of beam deflection of computer controlled coating machine, to guarantee that the focal spot of beating on the Coating Materials surface behind the beam deflection moves according to user definition, make the Coating Materials surface keep good planeness, obtain stable evaporation cloud.
Technical scheme of the present invention is as follows:
A kind of electron beam deflection device of computer controlled coating machine, described coating equipment has the electron beam emissive source and is positioned at the circular crucible of this electron beam emissive source top, two opposite side of this circle crucible are provided with orthogonal directions X deflector coil and Y direction deflector coil outward, and its characteristics are that described device is made up of scan control instrument, manual controller, data collecting card and computer:
Described manual controller has the first rotary resistance device, second rotary resistance device and the record data button;
Described data collecting card has first input end, second input terminus, first output terminal, second output terminal and the 3rd input terminus;
First port is arranged on the shell of described scan control instrument, second port, the 3rd port, the 4th port, manual mode switch, the 6th port, the 7th port, the 8th port, the 9th port, the tenth port, the 11 port, the 12 port, the 13 port, be provided with identical directions X yoke voltage pilot circuit of structure and Y direction yoke voltage pilot circuit in the described scan control instrument, described directions X yoke voltage pilot circuit is by the first channel selector switch, first operational amplifier and second operational amplifier constitute, and described first channel selector switch has first input end, second input terminus, the first channel selecting side, first output terminal and second output terminal; Y direction yoke voltage pilot circuit is made of second passage selector switch, the 3rd operational amplifier and four-operational amplifier; Described second passage selector switch has corresponding the 3rd input terminus, four-input terminal, second passage selecting side, the 3rd output terminal and the 4th output terminal;
The annexation of above-mentioned component is as follows:
Described data collecting card is inserted on the PCI slot of described computer;
The first input end of described first channel selector switch links to each other with the first rotary resistance device of described manual controller by described the 13 port, second input terminus of described first channel selector switch links to each other with first output terminal of described data collecting card by described the 9th port, described first channel selecting side links to each other with described manual mode switch, first output terminal of described first channel selector switch links to each other with an end of described directions X deflector coil with first port through described first operational amplifier, the other end of this directions X deflector coil links to each other with second port of described first channel selector switch and ground connection, and described second output terminal links to each other with second input terminus of described data collecting card with the 8th port through second operational amplifier;
The 3rd input terminus of described second passage selector switch links to each other with the second rotary resistance device of described manual controller by described the 12 port, described four-input terminal links to each other with second output terminal of described data collecting card by described the 7th port, described second passage selecting side links to each other with described manual mode switch, described the 3rd output terminal links to each other with the end of the 3rd port with described Y direction deflector coil through described the 3rd operational amplifier, the other end of this Y direction deflector coil links to each other with described the 4th port and ground connection, and described the 4th output terminal links to each other with the 3rd input terminus of described data collecting card with the 6th port through four-operational amplifier;
The record data button of described manual controller links to each other with the first input end of described data collecting card with the tenth port through the 11 port of described scan control instrument.
Utilize described device to carry out the method for the beam deflection control of coating equipment, comprise the steps:
1. data gathering;
At first manual mode switch is switched to manual mode, regulate the first rotary resistance device on the described manual controller, make the voltage of first output terminal of first channel selector switch through first operational amplifier and the output of first port, promptly regulate the voltage at directions X deflector coil two ends, simultaneously second output terminal of first channel selector switch is through one of second input terminus input of second operational amplifier, the 8th port and the described data collecting card voltage correspondent voltage signal with directions X deflector coil two ends;
Regulate the second rotary resistance device on the described manual controller, make the voltage of the 3rd output terminal of second passage selector switch through the 3rd operational amplifier and the output of the 3rd port, promptly regulate the voltage at Y direction deflector coil two ends, simultaneously the 4th output terminal of second passage selector switch is through one of the 3rd input terminus input of four-operational amplifier and the 6th port and the described data collecting card voltage correspondent voltage signal with Y direction deflector coil two ends;
On the described manual controller of manual regulation first, in the time of the second rotary resistance device, the staff monitors the position on hot spot Coating Materials surface in described circular crucible of electron beam by the observation window of coating equipment, by adjusting first, the second rotary resistance device, make the electron beam focal spot move a week along the inwall of described circular crucible, the electron beam hot spot whenever moves once, the record data button of pushing on the described manual controller makes described data collecting card gather the digital voltage signal value Vx at directions X deflector coil two ends and the digital voltage signal value Vy at Y direction deflector coil two ends simultaneously, and after A/D conversion its digital voltage signal is imported in the described computer and store;
2. data processing:
Computer is fastened X coil voltage-Y coil voltage (v-v) curve that forms sealing with the digital voltage signal value Vx of the directions X deflector coil gathered and the digital voltage signal value Vy of Y direction deflector coil at rectangular coordinates, forms VxVy figure; Initial point with rectangular coordinate system is a limit, the XY coordinate diagram is changed to polar plot, according to radius and polar polar radius of electron beam focal spot, calculating is also determined from the crucible inwall to the scanning number of turns N at crucible center and sweep radius and the digital voltage signal value Vx of corresponding directions X deflector coil and the digital voltage signal value Vy of Y direction deflector coil of every circle;
3. the design of control data and adjustment;
The user carries out the control data design and adjusts according to the actual requirements:
According to the difference of Coating Materials, select appropriate electronic beam current to evaporate; According to the degree of depth of the variation on Coating Materials surface in the crucible, the digital voltage signal value Vy revision amount Δ V of Y direction deflector coil is set
y, the focal spot of electron beam is moved on the Coating Materials surface; Select the scanning number of turns, promptly be chosen in the number of turns of crucible surface scanning; Sweep rate is set, promptly selects the scanning crucible surface used time of one circle, form user's control data file;
4. operation: described manual mode switch is switched to automatic mode, computer is according to described user's control data file and corresponding control programs, by described data collecting card after D/A conversion, constantly automatically in real time required voltage is added to the two ends of described directions X deflector coil and Y direction deflector coil by described scan control instrument, the focal spot that makes electron beam moves on the surface of the Coating Materials of described circular crucible all the time, carries out the Coating Materials evaporation;
5. adjust: the user can change the scanning number of turns, sweep rate, revision amount Δ V after the computer controlled coating machine beam deflection stops control
y, and after newly once control begins, computer will be controlled the deflection of electron beam according to new parameter.
Technique effect of the present invention is:
1. apparatus and method used in the present invention have versatility, for different electron beam gun equipment, all can utilize these apparatus and method to realize the deflection of computer controlled coating machine electron beam;
2. method used in the present invention is divided into three steps: data gathering, data processing and control data design and adjustment, each step all is the module with standalone feature, can independent operating.Data gathering, data processing and control data design be with adjust can isolated operation, to same electron beam gun equipment, only need carry out a data gathering and data handling procedure after, the user can move control by computer automatically by the adjustment of control data;
3. after the user definition control data was finished, data were protected, can not be changed in the process of computer control beam deflection, increased the stability of control process;
4. can carry out the modification or the adjustment of control data at any time by User break in the computer controlled process, after the adjustment, computer controlledly under the control of new control data, carry out.
5. because the characteristic of electron gun evaporation, when the height of evaporating materials in crucible not simultaneously, under the same magnetic field effect, the focal spot of beam deflection to the evaporating materials is in the position on evaporating materials surface difference, and the present invention is provided with the digital voltage signal value Vy revision amount Δ V of Y direction deflector coil
y, can in computer controlled process, regulate focal spot position automatically, the focal spot of electron beam is scanned on the surface of described Coating Materials all the time, reach maximum fraction of coverage and vaporization efficiency;
6. the focal spot that generates on the evaporating materials surface behind the computer control beam deflection can be regulated in real time in the translational speed on evaporating materials surface, does not need to stop control process.
7. utilize the present invention can replace artificial scanning, eliminate the stability problem that human factor causes.
8. computer program provides good alternating interface between man and computer, and is easy to operate.
Description of drawings
Fig. 1 is the apparatus structure block diagram of the beam deflection of computer controlled coating machine of the present invention.
Fig. 2 is that the mutual alignment of electron beam emissive source among Fig. 1, circular crucible, directions X deflector coil and Y direction deflector coil concerns that A is to side-view
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing.
See also Fig. 1 and Fig. 2 earlier, Fig. 1 is the apparatus structure block diagram of the beam deflection of computer controlled coating machine of the present invention, and Fig. 2 is that the mutual alignment of electron beam emissive source among Fig. 1, circular crucible, directions X deflector coil and Y direction deflector coil concerns that A is to side-view.As seen from the figure, the electron beam deflection device of computer controlled coating machine of the present invention, described coating equipment has electron beam emissive source 4 and is positioned at the circular crucible 3 of these electron beam emissive source 4 tops, two opposite side of this circle crucible 3 are provided with orthogonal directions X deflector coil 1 and Y direction deflector coil 2 outward, and its characteristics are that described device is made up of scan control instrument 5, manual controller 6, data collecting card 7 and computer 8:
Described manual controller 6 has first rotary resistance device 61, second rotary resistance device 62 and the record data button 63;
Described data collecting card 7 has first input end 71, first output terminal 72, second input terminus 73, second output terminal 74 and the 3rd input terminus 75;
First port 521 is arranged on the shell of described scan control instrument 5, second port 522, the 3rd port 523, the 4th port 524, manual mode switch 525, the 6th port 526, the 7th port 527, the 8th port 528, the 9th port 529, the tenth port 530, the 11 port 531, the 12 port 532, the 13 port 533, be provided with identical directions X yoke voltage pilot circuit of structure and Y direction yoke voltage pilot circuit in the described scan control instrument 5, described directions X yoke voltage pilot circuit is by first channel selector switch 50, first operational amplifier 52 and second operational amplifier 53 constitute, and described first channel selector switch 50 has first input end 501, second input terminus 502, first channel selecting side 503, first output terminal 504 and second output terminal 505; Y direction yoke voltage pilot circuit is made of second passage selector switch 51, the 3rd operational amplifier 54 and four-operational amplifier 55; Described second passage selector switch 51 has corresponding the 3rd input terminus 511, four-input terminal 512, second passage selecting side 513, the 3rd output terminal 514 and the 4th output terminal 515;
The annexation of above-mentioned component is as follows:
Described data collecting card 7 is inserted on the PCI slot of described computer 8;
The first input end 501 of described first channel selector switch 50 links to each other with the first rotary resistance device 61 of described manual controller 6 by described the 13 port 533, described second input terminus 502 links to each other with first output terminal 72 of described data collecting card 7 by described the 9th port 529, described first channel selecting side 503 links to each other with described manual mode switch 525, described first output terminal 504 links to each other with an end of described directions X deflector coil 1 with first port 521 through described first operational amplifier 52, the other end of this directions X deflector coil 1 links to each other with described second port 522 and ground connection, and described second output terminal 505 links to each other with second input terminus 73 of described data collecting card 7 with the 8th port 528 through second operational amplifier 53;
The 3rd input terminus 511 of described second passage selector switch 51 links to each other with the second rotary resistance device 62 of described manual controller 6 by described the 12 port 532, described four-input terminal 512 links to each other with second output terminal 74 of described data collecting card 7 by described the 7th port 527, described second passage selecting side 513 links to each other with described manual mode switch 525, described the 3rd output terminal 514 links to each other with the end of the 3rd port 523 with described Y direction deflector coil 2 through described the 3rd operational amplifier 54, the other end of this Y direction deflector coil 2 links to each other with described the 4th port 524 and ground connection, and described the 4th output terminal 515 links to each other with the 3rd input terminus 75 of described data collecting card 7 with the 6th port 526 through four-operational amplifier 55;
The record data button 63 of described manual controller 6 links to each other with the first input end 71 of described data collecting card 7 with the tenth port 530 through the 11 port 531 of described scan control instrument 5.
Utilize above-mentioned device to carry out the method for the beam deflection control of coating equipment, comprise the steps:
1. data gathering;
At first manual mode switch 525 is switched to manual mode, regulate the first rotary resistance device 61 on the described manual controller 6, make the voltage of first output terminal 504 of first channel selector switch 50 through first operational amplifier 52 and 521 outputs of first port, promptly regulate the voltage at directions X deflector coil 1 two ends, simultaneously second output terminal 505 of first channel selector switch 50 is through one of second input terminus, 73 input of second operational amplifier 53 the 8th port 528 and the described data collecting card 7 voltage correspondent voltage signal with directions X deflector coil 1 two ends;
Regulate the second rotary resistance device 62 on the described manual controller 6, make the voltage of the 3rd output terminal 514 of second passage selector switch 51 through the 3rd operational amplifier 54 and 523 outputs of the 3rd port, promptly regulate the voltage at Y direction deflector coil 2 two ends, simultaneously the 4th output terminal 515 of second passage selector switch 51 is through one of the 3rd input terminus 75 input of four-operational amplifier 55 and the 6th port 526 and the described data collecting card 7 voltage correspondent voltage signal with Y direction deflector coil 2 two ends;
On the described manual controller 6 of manual regulation first, in the time of the second rotary resistance device, the staff monitors the position on hot spot Coating Materials surface in described circular crucible 3 of electron beam by the observation window of coating equipment, by adjusting first, the second rotary resistance device, make the electron beam focal spot move a week along the inwall of described circular crucible 3, the electron beam focal spot whenever moves once, push the record data button 63 on the described manual controller 6, make described data collecting card 7 gather the digital voltage signal value Vx at directions X deflector coil 1 two ends and the digital voltage signal value Vy at Y direction deflector coil 2 two ends simultaneously, and after A/D conversion, its digital voltage signal imported storage in the described computer 8;
2. data processing:
3. the design of control data and adjustment; The user carries out parameter adjustment according to the actual requirements:
According to the difference of Coating Materials, select appropriate electronic beam current to evaporate; According to the degree of depth of the variation on Coating Materials surface in the crucible, the digital voltage signal value Vy revision amount Δ V of Y direction deflector coil 2 is set
y, the focal spot of electron beam is moved on the Coating Materials surface; Select the scanning number of turns, promptly be chosen in the number of turns of crucible surface scanning; Sweep rate is set, promptly selects the scanning crucible surface used time of one circle, form user's control data file;
4. operation: described manual mode switch 525 is switched to automatic mode, computer 8 is according to described user's control data file and corresponding control programs, by described data collecting card 7 after D/A conversion, constantly automatically in real time required voltage is added to the two ends of described directions X deflector coil 1 and Y direction deflector coil 2 by described scan control instrument 5, the focal spot that makes electron beam moves on the surface of the Coating Materials of described circular crucible 3 all the time, carries out the Coating Materials evaporation;
5. adjust: the user can change the scanning number of turns, sweep rate, revision amount Δ V after the computer controlled coating machine beam deflection stops control
y, and newly once after the control beginning, computer will be controlled the deflection of electron beam according to new parameter.
Claims (2)
1. the control device of the beam deflection of a computer controlled coating machine, described coating equipment has electron beam emissive source (4) and is positioned at the circular crucible (3) of this electron beam emissive source (4) top, two opposite side of this circle crucible (3) are provided with orthogonal directions X deflector coil (1) and Y direction deflector coil (2) outward, it is characterized in that described device is made up of scan control instrument (5), manual controller (6), data collecting card (7) and computer (8):
Described manual controller (6) has the first rotary resistance device (61), the second rotary resistance device (62) and record data button (63);
Described data collecting card (7) has first input end (71), second input terminus (73), first output terminal (72), second output terminal (74) and the 3rd input terminus (75);
First port (521) is arranged on the shell of described scan control instrument (5), second port (522), the 3rd port (523), the 4th port (524), manual mode switch (525), the 6th port (526), the 7th port (527), the 8th port (528), the 9th port (529), the tenth port (530), the 11 port (531), the 12 port (532), the 13 port (533), be provided with identical directions X yoke voltage pilot circuit of structure and Y direction yoke voltage pilot circuit in the described scan control instrument (5), described directions X yoke voltage pilot circuit is by first channel selector switch (50), first operational amplifier (52) and second operational amplifier (53) constitute, and described first channel selector switch (50) has first input end (501), second input terminus (502), first channel selecting side (503), first output terminal (504) and second output terminal (505); Y direction yoke voltage pilot circuit is made of second passage selector switch (51), the 3rd operational amplifier (54) and four-operational amplifier (55); Described second passage selector switch (51) has corresponding the 3rd input terminus (511), four-input terminal (512), second passage selecting side (513), the 3rd output terminal (514) and the 4th output terminal (515);
The annexation of each element is as follows:
Described data collecting card (7) is inserted on the PCI slot of described computer (8);
The first input end (501) of described first channel selector switch (50) links to each other with the first rotary resistance device (61) of described manual controller (6) by described the 13 port (533), second input terminus (502) of described first channel selector switch (50) links to each other with first output terminal (72) of described data collecting card (7) by described the 9th port (529), described first channel selecting side (503) links to each other with described manual mode switch (525), first output terminal (504) of described first channel selector switch (50) links to each other with the end of first port (521) with described directions X deflector coil (1) through described first operational amplifier (52), the other end of this directions X deflector coil (1) links to each other with described second port (522) and ground connection, and second output terminal (505) of described first channel selector switch (50) links to each other with second input terminus (73) of described data collecting card (7) with the 8th port (528) through second operational amplifier (53);
The 3rd input terminus (511) of described second passage selector switch (51) links to each other with the second rotary resistance device (62) of described manual controller (6) by described the 12 port (532), described four-input terminal (512) links to each other with second output terminal (74) of described data collecting card (7) by described the 7th port (527), described second passage selecting side (513) links to each other with described manual mode switch (525), described the 3rd output terminal (514) links to each other with the end of the 3rd port (523) with described Y direction deflector coil (2) through described the 3rd operational amplifier (54), the other end of this Y direction deflector coil (2) links to each other with described the 4th port (524) and ground connection, and described the 4th output terminal (515) links to each other with the 3rd input terminus (75) of described data collecting card (7) with the 6th port (526) through four-operational amplifier (55);
The record data button (63) of described manual controller (6) links to each other with the first input end (71) of described data collecting card (7) with the tenth port (530) through the 11 port (531) of described scan control instrument (5).
2. utilize the described device of claim 1 to carry out the method for the beam deflection control of coating equipment, comprise the steps:
1. data gathering;
At first manual mode switch (525) is switched to manual mode, regulate the first rotary resistance device (61) on the described manual controller (6), change the voltage of first output terminal (504) of first channel selector switch (50) through first operational amplifier (52) and first port (521) output, promptly regulate the voltage at directions X deflector coil (1) two ends, second output terminal (505) of first channel selector switch (50) is through second operational amplifier (53) simultaneously, the voltage correspondent voltage signal at one of second input terminus (73) of the 8th port (528) and described data collecting card (7) input and directions X deflector coil (1) two ends;
Regulate the second rotary resistance device (62) on the described manual controller (6), make the voltage of the 3rd output terminal (514) of second passage selector switch (51) through the 3rd operational amplifier (54) and the 3rd port (523) output, promptly regulate the voltage at Y direction deflector coil (2) two ends, simultaneously the 4th output terminal (515) of second passage selector switch (51) is imported a voltage correspondent voltage signal with Y direction deflector coil (2) two ends through the 3rd input terminus (75) of four-operational amplifier (55), the 6th port (526) and described data collecting card (7);
On the described manual controller of manual regulation (6) first, in the time of the second rotary resistance device, the staff monitors the position on hot spot Coating Materials surface in described circular crucible (3) of electron beam by the observation window of coating equipment, by adjusting first, the second rotary resistance device, make the electron beam focal spot move a week along the inwall of described circular crucible (3), the electron beam focal spot whenever moves once, the record data button of pushing on the described manual controller (6) (63) makes described data collecting card (7) gather the voltage signal at directions X deflector coil (1) two ends and the voltage signal at Y direction deflector coil (2) two ends simultaneously, and after A/D conversion its digital voltage signal value is imported in described computer (8) and store;
2. data processing:
Computer (8) is fastened the X coil voltage-Y coil voltage curve that forms sealing with the digital voltage signal value Vx of the directions X deflector coil (1) gathered and the digital voltage signal value Vy of Y direction deflector coil (2) at rectangular coordinates, forms VxVy figure; Initial point with rectangular coordinate system is a limit, the XY coordinate diagram is changed to polar plot, according to radius and polar polar radius of electron beam focal spot, calculating is also determined from the crucible inwall to the scanning number of turns N at crucible center and sweep radius and the digital voltage signal value Vx of corresponding directions X deflector coil (1) and the digital voltage signal value Vy of Y direction deflector coil (2) of every circle;
3. control data design and adjustment
The user carries out parameter adjustment according to the actual requirements:
According to the difference of Coating Materials, select appropriate electronic beam current to evaporate; According to the degree of depth of the variation on Coating Materials surface in the crucible, the digital voltage signal value Vy revision amount Δ V of Y direction deflector coil (2) is set
y, the focal spot of electron beam is moved on the Coating Materials surface; Select the scanning number of turns, promptly be chosen in the number of turns of crucible surface scanning; Sweep rate is set, promptly selects the scanning crucible surface used time of one circle, form user's control data file;
4. operation: described manual mode switch (525) is switched to automatic mode, computer (8) is according to described user's control data file and corresponding control programs, by described data collecting card (7) after D/A conversion, constantly automatically in real time required voltage is added to the two ends of described directions X deflector coil (1) and Y direction deflector coil (2) by described scan control instrument (5), the focal spot that makes electron beam moves on the surface of the Coating Materials of described circular crucible (3) all the time, carries out the Coating Materials evaporation;
5. adjust: the user can change the scanning number of turns, sweep rate, revision amount Δ V after the computer controlled coating machine beam deflection stops control
y, and after newly once control begins, computer will be controlled the deflection of electron beam according to new parameter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100555536A CN101619440B (en) | 2009-07-29 | 2009-07-29 | Electron beam deflection device of computer controlled coating machine and control method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100555536A CN101619440B (en) | 2009-07-29 | 2009-07-29 | Electron beam deflection device of computer controlled coating machine and control method thereof |
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| CN101619440A CN101619440A (en) | 2010-01-06 |
| CN101619440B true CN101619440B (en) | 2010-11-03 |
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| CN2009100555536A Expired - Fee Related CN101619440B (en) | 2009-07-29 | 2009-07-29 | Electron beam deflection device of computer controlled coating machine and control method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102191475B (en) * | 2011-04-15 | 2012-10-10 | 中国科学院上海光学精密机械研究所 | Film thickness monitoring method capable of increasing spectral characteristics of film |
| CN105714252B (en) * | 2016-04-28 | 2018-09-28 | 中国工程物理研究院激光聚变研究中心 | A kind of optical thin film deposition scan control method and system |
| CN106676480B (en) * | 2017-03-10 | 2019-11-08 | 南京大学 | A kind of electron beam evaporation source that evaporation rate is controllable |
| CN107267950A (en) * | 2017-04-25 | 2017-10-20 | 苏州同冠微电子有限公司 | A kind of evaporator beam spot remote-control box and its control method |
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