CN103456589B - Multipole lens is utilized to adjust the diaphragm of particle beam and comprise the equipment of this diaphragm - Google Patents
Multipole lens is utilized to adjust the diaphragm of particle beam and comprise the equipment of this diaphragm Download PDFInfo
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- CN103456589B CN103456589B CN201210177109.3A CN201210177109A CN103456589B CN 103456589 B CN103456589 B CN 103456589B CN 201210177109 A CN201210177109 A CN 201210177109A CN 103456589 B CN103456589 B CN 103456589B
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Abstract
The object of this invention is to provide a kind of multipole lens that utilizes adjust the diaphragm of particle beam and comprise the equipment of this diaphragm.According to diaphragm of the present invention, comprise aperture plate, it comprises multiple aperture respectively with different pore size; Multiple multipole lens, comprises the first group of multiple incident multipole lens being positioned at this aperture plate light incident side and the second group of multiple outgoing multipole lens being positioned at this aperture plate exiting side.The invention has the advantages that: electron beam can be made with optimum section profile by aperture plate, thus the good image of quality can be obtained; When diaphragm is switched, only need by adjusting the voltage be added on multipole lens, i.e. the size of adjustable electron beam, therefore the switching of diaphragm is more quick and convenient, only need can complete the switching of diaphragm several seconds zero point in practice, drastically increase the switching efficiency of diaphragm; Further, diaphragm according to the present invention is simpler than the mechanism of diaphragm of the use stepping motors adjustment usually adopted, and cost is more cheap.
Description
Technical field
The present invention relates to electron optics field, particularly relate to and utilize multipole lens adjust the diaphragm of particle beam and comprise the equipment of this diaphragm.
Background technology
In the application in electron optics field, in Electron Beam Focusing lens barrel, often need the size changing electronic beam current.The method of traditional change electronic beam current comprises two kinds, method uses a fixing electron beam diaphragm, by controlling the mutual alignment of beam crossover luminous point and diaphragm, adjusts the size of electron beam, although this method is fairly simple, be reduction of image quality; Another kind method adopts multiple electron beam diaphragm to control the section profile of electron beam, the plurality of electron beam diaphragm is driven by stepping motors and adjusts self position, although this kind of method can ensure image quality, but the conversion of diaphragm is slower, usually the time of several seconds is at least needed, and the device needed for this kind of method of adjustment is comparatively complicated, the higher cost of cost is needed to go to manufacture.
Summary of the invention
The object of this invention is to provide a kind of multipole lens that utilizes adjust the diaphragm of electronic beam current and comprise the equipment of this diaphragm.
According to an aspect of the present invention, provide a kind of diaphragm, it comprises:
-aperture plate, it comprises multiple aperture respectively with different pore size;
-multiple multipole lens, comprises the first group of multiple incident multipole lens being positioned at this aperture plate light incident side and the second group of multiple outgoing multipole lens being positioned at this aperture plate exiting side;
Wherein, described first group of multiple incident multipole lens has applicable electric field and/or magnetic field respectively, for by being adjusted to position that is parallel with initial optical axis and preset distance apart through incoming particle line wherein, to make described incoming particle line by the specific aperture on described aperture plate;
Described second group of multiple outgoing multipole lens has the electric field that be applicable to corresponding with described first group of multiple incident multipole lens and/or magnetic field respectively, with the position making the outgoing particle line through the specific aperture on described aperture plate revert to described initial optical axis.
According to another aspect of the present invention, additionally provide a kind of ESEM, described ESEM comprises described diaphragm.
According to another aspect of the present invention, additionally provide a kind of for regulating the method for ESEM, wherein, described ESEM comprises described diaphragm, said method comprising the steps of:
A controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to the size of required particle beam, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
Compared with prior art, the present invention has the following advantages: 1) according to the solution of the present invention, can make electron beam with optimum section profile by aperture plate, thus can obtain the best image of quality comparation; 2) according to the solution of the present invention, when diaphragm is switched, only need by adjusting the voltage be added on multipole lens, the i.e. size of adjustable electron beam, therefore the switching of diaphragm is more quick and convenient, only need can complete the switching of diaphragm several seconds zero point in practice, drastically increase the switching efficiency of diaphragm; 3) further, diaphragm according to the present invention is simpler than the mechanism of diaphragm of the use stepping motors adjustment usually adopted, and cost is more cheap.
Accompanying drawing explanation
By reading the detailed description done non-limiting example done with reference to the following drawings, other features, objects and advantages of the present invention will become more obvious:
Fig. 1 is the structural representation according to a kind of diaphragm of the present invention;
Fig. 2 be particle beam pass through according to diaphragm of the present invention front portion time deflection schematic diagram;
Fig. 3 is the cross-sectional view of the ESEM comprised according to a kind of diaphragm of the present invention;
Fig. 4 is a kind of method flow diagram comprising the ESEM according to a kind of diaphragm of the present invention for condition.
In accompanying drawing, same or analogous Reference numeral represents same or analogous parts.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail.
Fig. 1 illustrates according to a kind of diaphragm of the present invention.Described diaphragm (BeamAperture) is for regulating the size of the particle beam by self.Wherein, described particle beam includes but not limited to the weak beam stream of the charged particle for imaging.Preferably, described particle beam includes but not limited to any one weak beam stream following:
1) electron beam;
2) ion beam.
Particularly, with reference to Fig. 1, described diaphragm 1 comprises aperture plate 11 (AperturePlate) and multiple multi-stage lens.
Wherein, described aperture plate 11 comprises multiple aperture respectively with different pore size, for intercepting the particle beam through self.
Described multiple multipole lens comprises the first group of multiple incident multipole lens 12 being positioned at this aperture plate 11 light incident side and the second group of multiple outgoing multipole lens 12 ' being positioned at this aperture plate 11 exiting side.
Wherein, described multipole lens of often organizing can make described particle beam move to enter with it optical axis before this group multi-stage lens parallel and at a distance of the position of preset distance.
Preferably, described multi-stage lens comprises even level lens, more preferably, include but not limited to following any one:
1) secondary lens;
2) quadrupole lenses;
3) ends of the earth lens.
As one of preferred version of the present invention, described multi-stage lens comprises ends of the earth lens, and described diaphragm 1 comprises ends of the earth lens stop (OctupoleAssemblyAperture).
Described first group of multiple incident multipole lens 12 has applicable electric field and/or magnetic field respectively, by being adjusted to position that is parallel with initial optical axis and preset distance apart through incoming particle line wherein, to make described incoming particle line by the specific aperture on described aperture plate 11.
Preferably, described preset distance is determined according to the distance between described specific aperture and described initial optical axis.
More preferably, described initial optical axis electron focusing system residing for diaphragm, the axis of such as electronic scanner microscope etc.
Described second group of multiple outgoing multipole lens 12 ' has the applicable electric field corresponding with described first group of multiple incident multipole lens and/or magnetic field respectively, with the position making the outgoing particle line through the specific aperture on described aperture plate 11 revert to described initial optical axis.
One of according to a preferred embodiment of the invention, described particle beam comprises electron beam, and described multipole lens has suitable electric field.Described first group of incident ends of the earth lens comprise two incident ends of the earth lens, and described second group of outgoing ends of the earth lens comprise two outgoing ends of the earth lens.
Wherein, the electric field of described second incident ends of the earth lens is contrary with the direction of an electric field of first incident ends of the earth lens; The electric field of described second outgoing ends of the earth lens is contrary with the direction of an electric field of first outgoing ends of the earth lens.
According to the first example of the present invention, with reference to Fig. 1, wherein, diaphragm 1 is contained in ESEM 1, first group of multiple incident multipole lens 12 of diaphragm 1 comprises two ends of the earth lens Oct1 and Oct2, and second group of multiple outgoing multipole lens 12 ' of diaphragm 1 comprises two ends of the earth lens Oct3 and Oct4; Wherein, the voltage direction of Oct1 and Oct2 is contrary, and the voltage's distribiuting of Oct3 is identical with Oct2, and the voltage's distribiuting of Oct4 is identical with Oct1.
Refer again to Fig. 2, the initial optical axis of electron beam Beam1 is parallel with the electron focusing system axis of this ESEM, when electron beam Beam1 enters first ends of the earth lens Oct1, the deflection of certain angle is produced due to the electric field of Oct1 inside, and keep the tangent trajectory after deflection to enter Oct2, then, electron beam Beam1 owing to being subject to inner contrary with the Oct1 electric field action power of Oct2, and produces second time deflection.Electron beam Beam1 after second time deflection, its trail change to parallel with initial optical axis, but and between initial optical axis distance be the position of d.Then, electron beam is when arrival has the aperture plate 11 of multiple aperture, through on this aperture plate 11, with initial optical axis distance be d, and be positioned at by the aperture H1 on current electron beam trace and the initial determined plane of optical axis, thus be truncated to the electron beam Beam1 ' to the corresponding size of this aperture H1.
Then, when the electron beam Beam1 ' after intercepting is by Oct3 and Oct4, the electric field of Oct3 and Oct4 inside, by the mode similar in Oct1 with Oct2, is adjusted to the initial optical axis position before entering Oct1 by the track of the electron beam Beam1 ' of this required size.
Wherein, those skilled in the art will be understood that, according to diaphragm of the present invention, can by regulating the parameters such as the voltage of each electrode on the voltage that be added on each multipole lens and multipole lens, regulate deviation angle and the distance of particle beam, to make particle beam by aperture suitable on aperture plate, thus obtain the particle beam of required size.
According to the solution of the present invention, electron beam can be made with optimum section profile by aperture plate, thus the best image of quality comparation can be obtained; Secondly, according to the solution of the present invention, when diaphragm is switched, only need by adjusting the voltage be added on multipole lens, the i.e. size of adjustable electron beam, therefore the switching of diaphragm is more quick and convenient, only needs to complete the switching of diaphragm several seconds zero point in practice, drastically increases the switching efficiency of diaphragm; Further, the apparatus structure that diaphragm according to the present invention switches diaphragm than existing employing stepping motors is simpler, and cost is more cheap.
Fig. 3 illustrates a kind of schematic diagram comprising the cross-section structure of the ESEM of diaphragm as shown in Figure 1.Described ESEM includes but not limited to the electronic optical instrument of the law-current beam imaging that can utilize charged particle.
Preferably, described ESEM comprise following any one:
1) conventional sweep Electronic Speculum (scanningelectronmicroscope, SEM);
2) environmental scanning electronic microscope (environmentalscanningelectronmicroscope, ESEM);
3) field emission scanning electron microscope (fieldemissionscanningelectronmicroscope, FESEM);
4) scanning transmission electron microscope (scanningtransmissionelectronmicroscopy, STEM).
With reference to Fig. 3, described ESEM comprises diaphragm 1, electron source 2, the electron lens 3 (comprising first order electron lens 31 and second level electron lens 32) for imaging, imaging device 4, sample stage 5 and deflection scanning device 6.
In ESEM illustrated in Figure 3, from the electron beam of electron source first by diaphragm 1, after intercepting into required size by diaphragm 1, by electron lens 3 and deflection scanning device 6 by the sample imaging on sample stage 5, and be presented to user in imaging device 4.
Wherein, described diaphragm 1 can become arbitrarily angled with the focusing system axis of ESEM, or with axle offset any distance in focusing system.
According to a preferred embodiment of the present invention, described ESEM also comprises deflection control device (not shown).
Wherein, described deflection control device controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to the size of required particle beam, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
Particularly, the size of particle beam needed for described basis controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm, with make primary line through the mode of aperture corresponding with required particle beam size on described aperture plate include but not limited to following any one:
1) the first determining device be contained in deflection control device is inquired about according to the size of required particle beam and is preset deflection numerical tabular, to determine the described multipole lens electric field corresponding to the size of required particle beam and/or the relevant adjustment parameter in magnetic field; Then, the first adjusting device be contained in deflection control device controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to described relevant adjustment parameter, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
Wherein, in the default deflection numerical tabular that deflection control device stores, contain the multipole lens electric field corresponding respectively to the magnitude range of multiple particle beam and/or the relevant adjustment parameter in magnetic field, then the first determining device is according to the size of acquired particle beam, determine the current required scope belonging to particle beam size, and obtain the relevant adjustment parameter in the multipole lens electric field corresponding to the magnitude range of this particle beam and/or magnetic field.
2) the second determining device be contained in deflection control device determines the aperture on the described aperture plate that passes needed for primary line according to the size of required particle beam; Then, the second adjusting device be contained in deflection control device correspondingly adjusts the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, to make described primary line and initial optical axis abreast through this determined aperture.
Particularly, described second determining device, according to the size of required particle beam, carrys out the default aperture list that inquiry packet contains the aperture corresponding respectively with the magnitude range of multiple particle beam, to obtain the aperture corresponding with the size of required particle beam.
Wherein, described second adjusting device correspondingly adjusts the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, with make described primary line and initial optical axis abreast through the mode of this determined aperture include but not limited to following any one:
A) when there is the parameter preset table comprised to the electric field of multipole lens described in each aperture respectively corresponding each and/or the relevant adjustment parameter in magnetic field, second adjusting device obtains the electric field of each multipole lens corresponding to this aperture and/or the relevant adjustment parameter in magnetic field according to determined aperture inquiry, and adjust electric field and/or the magnetic field of each multipole lens in described diaphragm according to described relevant adjustment parameter, to make described primary line and initial optical axis abreast through this determined aperture.
B) the second adjusting device obtains the range information of the determined aperture of the second determining device relative to the initial optical axis of particle beam, and using the offset distance of this positional information as particle beam; Then, second adjusting device is according to predetermined formula, determine to need particle beam to be adjusted in the plane that is positioned at and determined by initial optical axis and selected aperture, parallel with initial optical axis and on the track of this deflection distance time, the required electric field of each multipole lens and/or the relevant adjustment parameter in magnetic field, to adjust electric field and/or the magnetic field of each multipole lens in described diaphragm according to described relevant adjustment parameter, to make described primary line and initial optical axis abreast through this determined aperture.
Wherein, described predetermined formula includes but not limited to for for each multi-stage lens, determines that the azimuth relative to initial optical axis of its each electrode, the electrode voltage of each electrode, particle beam are relative to the incidence relation of this demand fulfillment of voltage on the azimuth of initial optical axis and this multi-stage lens.
Preferably, when described multipole lens comprises ends of the earth lens, meet the incidence relation shown in following formula needed for aforementioned four information: V
n=ACos (α
n-θ).
Wherein, n represents the sequence number of this electrode n-th electrode in eight electrodes of ends of the earth lens, V
nrepresent the electrode offset voltage of this n-th electrode, A represents the fundamental voltage on these ends of the earth lens, α
nrepresent the azimuth of this n-th electrode relative to initial optical axis; θ represents the azimuth of the particle beam after deflection relative to initial optical axis.
In one example, the azimuth angle alpha of the 1st electrode in the lens of the ends of the earth
1for from initial optical axis 22.5 °, all the other each azimuths obtain after increasing by 45 ° successively on basis, last azimuth, specific as follows:
α
2＝22.5°+45°＝67.5°；
α
3＝67.5°+45°＝112.5°；
α
4＝112.5°+45°＝157.5°；
α
5＝157.5°+45°＝202.5°；
α
6＝202.5°+45°＝247.5°；
α
7＝247.5°+45°＝292.5°；
α
8＝292.5°+45°＝337.5°。
Wherein, above-mentioned azimuth value is only example, and those skilled in the art should determine the azimuth angle alpha of each electrode in multipole lens according to actual conditions and demand
n.
Then, the second adjusting device, according to deflection distance and aperture position, can be determined to deflect the azimuth angle theta of rear particle beam relative to initial optical axis, and and then can know relative to each current V
nwith the adjustment information of A.Such as, according to new Cos (α
n-θ) value correspondingly adjust each V
nvalue, to make each new V
nstill V can be met
n=ACos (α
n-θ); Or, by adjusting A and V simultaneously
nmake new A and V
nv can be met
n=ACos (α
n-θ) etc.; Or, directly by predetermined many groups A and V
nmiddle selection and current Cos (α
n-θ) corresponding one group of A and V
ndeng.
It should be noted that, the mode of above-mentioned concrete incidence relation and corresponding adjustment parameter is only example, those skilled in the art should determine according to actual conditions and demand or select the predetermined formula of incidence relation and the correspondence used, and correspondingly adopt selected predetermined formula to obtain the mode of relevant adjustment parameter, and be not limited to the mode described in citing of this specification, any mode that can obtain the electric field of each multipole lens and/or the relevant adjustment parameter in magnetic field according to the offset information of particle beam, all should be within the scope of the present invention.
Those skilled in the art should determine the position of this deflection control device according to actual conditions and demand, such as, this deflection control device is contained in the mode etc. in the control chip of described ESEM, therefore repeats no more.
Fig. 4 illustrates a kind of for the flow chart of adjustment kit containing the method for the ESEM of diaphragm as shown in Figure 1.Wherein, described ESEM includes but not limited to the electronic optical instrument of the law-current beam imaging that can utilize charged particle.
Preferably, described ESEM comprise following any one:
1) conventional sweep Electronic Speculum (scanningelectronmicroscope, SEM);
2) environmental scanning electronic microscope (environmentalscanningelectronmicroscope, ESEM);
3) field emission scanning electron microscope (fieldemissionscanningelectronmicroscope, FESEM);
4) scanning transmission electron microscope (scanningtransmissionelectronmicroscopy, STEM).
Described method comprises step S1.
Particularly, with reference to Fig. 4, in step sl, ESEM controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to the size of required particle beam, to make primary line through aperture corresponding with required particle beam size on described aperture plate.Wherein, described diaphragm can become arbitrarily angled with the focusing system axis of ESEM, or with axle offset any distance in focusing system.
Particularly, the size of particle beam needed for described basis controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm, with make primary line through the mode of aperture corresponding with required particle beam size on described aperture plate include but not limited to following any one:
1) ESEM is inquired about according to the size of required particle beam and is preset deflection numerical tabular, to determine the described multipole lens electric field corresponding to the size of required particle beam and/or the relevant adjustment parameter in magnetic field; Then, ESEM controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to described relevant adjustment parameter, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
Wherein, in the default deflection numerical tabular that ESEM stores, contain the multipole lens electric field corresponding respectively to the magnitude range of multiple particle beam and/or the relevant adjustment parameter in magnetic field, then ESEM is according to the size of acquired particle beam, determine the current required scope belonging to particle beam size, and obtain the relevant adjustment parameter in the multipole lens electric field corresponding to the magnitude range of this particle beam and/or magnetic field.
2) ESEM determines the aperture on the described aperture plate that passes needed for primary line according to the size of required particle beam; Then, ESEM correspondingly adjusts the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, to make described primary line and initial optical axis abreast through this determined aperture.
Particularly, ESEM, according to the size of required particle beam, carrys out the default aperture list that inquiry packet contains the aperture corresponding respectively with the magnitude range of multiple particle beam, to obtain the aperture corresponding with the size of required particle beam.
Wherein, ESEM correspondingly adjusts the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, with make described primary line and initial optical axis abreast through the mode of this determined aperture include but not limited to following any one:
A) when there is the parameter preset table comprised to the electric field of multipole lens described in each aperture respectively corresponding each and/or the relevant adjustment parameter in magnetic field, ESEM obtains the electric field of each multipole lens corresponding to this aperture and/or the relevant adjustment parameter in magnetic field according to determined aperture inquiry, and adjust electric field and/or the magnetic field of each multipole lens in described diaphragm according to described relevant adjustment parameter, to make described primary line and initial optical axis abreast through this determined aperture.
B) the determined aperture of ESEM is relative to the range information of the initial optical axis of particle beam, and using the offset distance of this positional information as particle beam; Then, ESEM is according to predetermined formula, determine to need particle beam to be adjusted in the plane that is positioned at and determined by initial optical axis and selected aperture, parallel with initial optical axis and on the track of this deflection distance time, the required electric field of each multipole lens and/or the relevant adjustment parameter in magnetic field, to adjust electric field and/or the magnetic field of each multipole lens in described diaphragm according to described relevant adjustment parameter, to make described primary line and initial optical axis abreast through this determined aperture.
Wherein, described predetermined formula includes but not limited to for for each multi-stage lens, determines that the azimuth relative to initial optical axis of its each electrode, the electrode voltage of each electrode, particle beam are relative to the incidence relation of this demand fulfillment of voltage on the azimuth of initial optical axis and this multi-stage lens.
Preferably, when described multipole lens comprises ends of the earth lens, meet the incidence relation shown in following formula needed for aforementioned four information: V
n=ACos (α
n-θ).
Wherein, n represents the sequence number of this electrode n-th electrode in eight electrodes of ends of the earth lens, V
nrepresent the electrode offset voltage of this n-th electrode, A represents the voltage on these ends of the earth lens, α
nrepresent the azimuth of this n-th electrode relative to initial optical axis; θ represents the azimuth of the particle beam after deflection relative to initial optical axis.
In one example, the azimuth angle alpha of the 1st electrode in the lens of the ends of the earth
1for from initial optical axis 22.5 °, all the other each azimuths obtain after increasing by 45 ° successively on basis, last azimuth, specific as follows:
α
2＝22.5°+45°＝67.5°；
α
3＝67.5°+45°＝112.5°；
α
4＝112.5°+45°＝157.5°；
α
5＝157.5°+45°＝202.5°；
α
6＝202.5°+45°＝247.5°；
α
7＝247.5°+45°＝292.5°；
α
8＝292.5°+45°＝337.5°。
Wherein, above-mentioned azimuth value is only example, and those skilled in the art should determine the azimuth angle alpha of each electrode in multipole lens according to actual conditions and demand
n.
Then, ESEM, according to deflection distance and aperture position, can be determined to deflect the azimuth angle theta of rear particle beam relative to initial optical axis, and and then can know relative to each current V
nwith the adjustment information of A.Such as, according to new Cos (α
n-θ) value correspondingly adjust each V
nvalue, to make each new V
nstill V can be met
n=ACos (α
n-θ); Or, by adjusting A and V simultaneously
nmake new A and V
nv can be met
n=ACos (α
n-θ); Or, directly by predetermined many groups A and V
nmiddle selection and current Cos (α
n-θ) corresponding one group of A and V
ndeng.
It should be noted that, the mode of above-mentioned concrete incidence relation and corresponding adjustment parameter is only example, those skilled in the art should determine according to actual conditions and demand or select the predetermined formula of incidence relation and the correspondence used, and correspondingly adopt selected predetermined formula to obtain the mode of relevant adjustment parameter, and be not limited to the mode described in citing of this specification, any mode that can obtain the electric field of each multipole lens and/or the relevant adjustment parameter in magnetic field according to the offset information of particle beam, all should be within the scope of the present invention.
According to method of the present invention, ESEM is by adjusting the voltage of multipole lens to realize the switching of diaphragm, described adjustment process can only be controlled by the signal of telecommunication, calculated in real time by the ESEM chip with computing function, or, the mode of the configuration parameter of direct acquisition pre-stored, realizes diaphragm fast and switches, drastically increase the efficiency that diaphragm switches.
Deflection control device described in the present invention and described method, can software program form realize, such as perform to realize step mentioned above or function by processor.Further, its software program (comprising relevant data structure) can be stored in computer readable recording medium storing program for performing, such as, and RAM memory, magnetic or CD-ROM driver or floppy disc and similar devices.In addition, steps more of the present invention or function can adopt hardware to realize, such as, as coordinating with processor thus performing the circuit of each function or step.
In addition, can computer program be applied to according to deflection control device of the present invention, such as computer program instructions, when it is performed by computer, by the operation of this computer, can call or provide according to method of the present invention and/or technical scheme.And call the program command of method of the present invention, may be stored in fixing or moveable recording medium, and/or be transmitted by the data flow in broadcast or other signal bearing medias, and/or be stored in the working storage of the computer equipment run according to described program command.
To those skilled in the art, obviously the invention is not restricted to the details of above-mentioned one exemplary embodiment, and when not deviating from spirit of the present invention or essential characteristic, the present invention can be realized in other specific forms.Therefore, no matter from which point, all should embodiment be regarded as exemplary, and be nonrestrictive, scope of the present invention is limited by claims instead of above-mentioned explanation, and all changes be therefore intended in the implication of the equivalency by dropping on claim and scope are included in the present invention.Any Reference numeral in claim should be considered as the claim involved by limiting.In addition, obviously " comprising " one word do not get rid of other unit or step, odd number does not get rid of plural number.Multiple unit of stating in system claims or device also can be realized by software or hardware by a unit or device.First, second word such as grade is used for representing title, and does not represent any specific order.
Claims (14)
1. a diaphragm, it comprises:
-aperture plate, it comprises multiple aperture respectively with different pore size;
-multiple multipole lens, comprises the first group of multiple incident multipole lens being positioned at this aperture plate light incident side and the second group of multiple outgoing multipole lens being positioned at this aperture plate exiting side;
Wherein, described first group of multiple incident multipole lens has applicable electric field and/or magnetic field respectively, for by being adjusted to position that is parallel with initial optical axis and preset distance apart through incoming particle line wherein, to make described incoming particle line by the specific aperture on described aperture plate;
Described second group of multiple outgoing multipole lens has the applicable electric field corresponding with described first group of multiple incident multipole lens and/or magnetic field respectively, with the position making the outgoing particle line through the specific aperture on described aperture plate revert to described initial optical axis.
2. diaphragm according to claim 1, wherein, described particle beam comprises electron beam, and described multipole lens has applicable electric field.
3. diaphragm according to claim 2, wherein, described multipole lens comprises ends of the earth lens.
4. diaphragm according to claim 3, wherein, described first group of multiple incident ends of the earth lens comprise two incident ends of the earth lens, and described second group of multiple outgoing ends of the earth lens comprise two outgoing ends of the earth lens.
5. diaphragm according to claim 4, wherein,
The electric field of second incident ends of the earth lens is contrary with the direction of an electric field of first incident ends of the earth lens;
The electric field of second outgoing ends of the earth lens is contrary with the direction of an electric field of first outgoing ends of the earth lens.
6. an ESEM, it comprises the diaphragm according to any one of claim 1 to 5.
7. ESEM according to claim 6, also comprises:
Deflection control device, for controlling electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to the size of required particle beam, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
8. ESEM according to claim 7, wherein, described deflection control device comprises:
First determining device, presets deflection numerical tabular, to determine the described multipole lens electric field corresponding to the size of required particle beam and/or the relevant adjustment parameter in magnetic field for inquiring about according to the size of required particle beam;
First adjusting device, for controlling electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to described relevant adjustment parameter, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
9. ESEM according to claim 7, wherein, described deflection control device comprises:
Second determining device, for determining the aperture on the described aperture plate passed needed for primary line according to the size of required particle beam;
Second adjusting device, for correspondingly adjusting the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, to make described primary line and initial optical axis abreast through this determined aperture.
10. the ESEM according to any one of claim 6 to 9, described ESEM comprise following any one:
-conventional sweep Electronic Speculum;
-environmental scanning electronic microscope;
-field emission scanning electron microscope;
-scanning transmission electron microscope.
11. 1 kinds for regulating the method for ESEM, wherein, described ESEM comprises the diaphragm according to any one of claim 1 to 5, wherein, said method comprising the steps of:
A controls electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to the size of required particle beam, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
12. methods according to claim 11, described steps A comprises the following steps:
-inquire about default deflection numerical tabular, to determine the described multipole lens electric field corresponding to the size of required particle beam and/or the relevant adjustment parameter in magnetic field according to the size of required particle beam;
-control electric field and/or the magnetic field of multiple multipole lens in described diaphragm according to described relevant adjustment parameter, to make primary line through aperture corresponding with required particle beam size on described aperture plate.
13. methods according to claim 11, described steps A comprises the following steps:
-the aperture determining on the described aperture plate that passes needed for primary line according to the size of required particle beam;
-correspondingly adjust the electric field of multiple multipole lens and/or the voltage in magnetic field according to determined aperture, to make described primary line and initial optical axis abreast through this determined aperture.
14. according to claim 11 to the method according to any one of 13, wherein, described ESEM comprise following any one:
-conventional sweep Electronic Speculum;
-environmental scanning electronic microscope;
-field emission scanning electron microscope;
-scanning transmission electron microscope.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210177109.3A CN103456589B (en) | 2012-05-31 | 2012-05-31 | Multipole lens is utilized to adjust the diaphragm of particle beam and comprise the equipment of this diaphragm |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210177109.3A CN103456589B (en) | 2012-05-31 | 2012-05-31 | Multipole lens is utilized to adjust the diaphragm of particle beam and comprise the equipment of this diaphragm |
Publications (2)
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| CN106711003B (en) * | 2017-02-15 | 2019-03-19 | 聚束科技（北京）有限公司 | A kind of electronics source generating device and electron beam control method |
| CN109300760B (en) * | 2017-07-25 | 2020-10-09 | 东方晶源微电子科技（北京）有限公司 | Electron beam control device and method, electron beam imaging module, and electron beam inspection apparatus |
| JP7047076B2 (en) | 2017-09-29 | 2022-04-04 | エーエスエムエル ネザーランズ ビー．ブイ． | Methods and devices for adjusting the beam state of charged particles |
| CN109698103B (en) * | 2017-10-24 | 2021-03-26 | 中国科学院上海应用物理研究所 | Stream intensity adjusting device for charged particle beam |
| CN110542700B (en) * | 2018-05-28 | 2022-01-28 | 中国科学院上海微系统与信息技术研究所 | Low-energy electron diffractometer |
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| CN1866461A (en) * | 2006-04-07 | 2006-11-22 | 北京中科信电子装备有限公司 | Ion beam transmission control optimizing method |
| CN101996839A (en) * | 2009-07-24 | 2011-03-30 | 卡尔蔡司Nts有限责任公司 | Particle beam apparatus, aperture unit and method for setting a beam current in a particle beam apparatus |
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Denomination of invention: Diaphragm for adjusting particle beam with multipole lenses and device including same Effective date of registration: 20190121 Granted publication date: 20160406 Pledgee: Shanghai Xingcheng Investment Management Co., Ltd. Pledgor: Raintree Scientific Instruments (Shanghai) Corporation Registration number: 2019310000002 |
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