CN106711003B - A kind of electronics source generating device and electron beam control method - Google Patents
A kind of electronics source generating device and electron beam control method Download PDFInfo
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- CN106711003B CN106711003B CN201710082088.XA CN201710082088A CN106711003B CN 106711003 B CN106711003 B CN 106711003B CN 201710082088 A CN201710082088 A CN 201710082088A CN 106711003 B CN106711003 B CN 106711003B
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- diaphragm
- electron beam
- electromagnetic lens
- electron
- diaphragm group
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a kind of electronics source generating devices, which is characterized in that described device includes: electron gun, electrode, diaphragm group and electromagnetic lens；Wherein, the electron gun is used for launching electronics beam；The electrode, for accelerating to the electron beam；The diaphragm group includes the diaphragm of a mobile device and multiple and different apertures, controls the electron beam after accelerating by a diaphragm in the diaphragm group by adjusting the mobile device；The electromagnetic lens forms electron source for assembling to by the electron beam of the diaphragm.The embodiment of the invention also discloses a kind of electron beam control methods.
Description
Technical field
The present invention relates to electron microscope field more particularly to a kind of electronics source generating devices and electron beam control method.
Background technique
The tool detected to micro-object is known as observation instrument, and observation instrument experienced to be developed from simple magnifying glass
Development to the Laser Scanning Confocal Microscope of scientific research grade, observation instrument is to be able to observe more and more microcosmic object, i.e., constantly
Improve microscopical resolution ratio；But due to the presence of diffraction effect, the resolution ratio of optical microscopy is limited in half of light wave
Long magnitude, about 200nm.
There is electron microscope in the 1960s, such as scanning electron microscope (Scanning Electron
Microscope, SEM), transmission electron microscope (Transmission Electron Microscope, TEM), scanning transmission
Electron microscope (Scanning Transmission Electron Microscope, STEM) etc.；With optical microscopy phase
Than, the electronics in electron microscope has energy more higher than photon after accelerating, and it is theoretical according to the matter wave of Broglie,
Wavelength possessed by electronics is much smaller than optical wavelength, and therefore, electron microscope has resolution ratio more higher than optical microscopy.
The resolution sizes of electron microscope depend on the size for being irradiated to the beam spot being observed on object；Therefore,
How to reduce the beam spot diameter, on electron irradiation to object is the project for improving electron microscope resolving power and studying always；Usual feelings
Under condition, determine that the factor of electronics convergent beams spot diameter size includes: source electron beam dimensions, lens aberration and convergent mirror diaphragm to electricity
The diffraction size of beamlet；It is desired, however, to obtain the Coulomb interactions between electronics and electronics also become when higher resolution ratio
Particularly important, the Coulomb force between electronics and electronics enables to beam spot to spread；Therefore, the coulomb between electronics and electronics is mutual
Effect is so that electron microscope can not have high-throughput and high-resolution simultaneously.Therefore, how to realize that electron microscope has both height
The problem of flux and high-resolution become urgent need to resolve.
Summary of the invention
In view of this, an embodiment of the present invention is intended to provide a kind of electronics source generating device and electron beam control method, it can
Realize the characteristics of electron microscope of the application electronics source generating device is provided simultaneously with high-throughput and high-resolution.
The technical solution of the embodiment of the present invention is achieved in that
The embodiment of the present invention provides electronics source generating device, and described device includes: electron gun, electrode, diaphragm group and electromagnetism
Lens；Wherein,
The electron gun is used for launching electronics beam；
The electrode, for accelerating to the electron beam；
The diaphragm group includes the diaphragm of a mobile device and multiple and different apertures, by adjusting the mobile device control
Electron beam after system acceleration is by a diaphragm in the diaphragm group；
The electromagnetic lens forms electron source for assembling to by the electron beam of the diaphragm.
In above scheme, the electrode includes drawing pole and anode.
In above scheme, the mobile device includes: the first motor and the second motor；Wherein,
First motor is mobile in X-direction for controlling the diaphragm, and second motor is for controlling the diaphragm
It moves in the Y direction.
In above scheme, the multiple different pore size diaphragm is the diaphragm in at least one multiple and different apertures of column.
In above scheme, the electromagnetic lens is the lens of current excitation, and the size by adjusting exciting current changes institute
State the focus strength of electromagnetic lens.
In above scheme, the convergence magnetic field that the electromagnetic lens generates covers the electron gun and the diaphragm group, and institute
It states diaphragm group and is located at the center for assembling magnetic field Distribution of Magnetic Field.
The embodiment of the present invention also provides a kind of electron beam control method, which comprises the electron beam of electron gun transmitting
Accelerated through electrode；
The diaphragm in multiple and different aperture diaphragms that electron beam after controlling the acceleration passes through diaphragm group；
The electron beam Jing Guo the diaphragm group is assembled using electromagnetic lens.
In above scheme, the diaphragm group further includes mobile device, and the electron beam after the control acceleration passes through light
A diaphragm in multiple and different aperture diaphragms of door screen group, comprising:
It controls the mobile device to move with Y-direction in X direction, so that the electron beam after the acceleration passes through the diaphragm
One diaphragm of group.
In above scheme, the multiple different pore size diaphragm is the diaphragm in at least one multiple and different apertures of column.
It is described that the electron beam Jing Guo the diaphragm group is assembled using electromagnetic lens in above scheme, comprising:
The exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens；
Electron beam is formed after the electromagnetic lens with the focus strength is assembled by the electron beam of the diaphragm group.
In above scheme, the convergence magnetic field that the electromagnetic lens generates covers the electron gun and the diaphragm group, and institute
It states diaphragm group and is located at the center for assembling magnetic field Distribution of Magnetic Field.
Electronics source generating device and electron beam control method provided by the embodiment of the present invention, described device include: electronics
Rifle, electrode, diaphragm group and electromagnetic lens；Wherein, the electron gun is used for launching electronics beam；The electrode, for the electricity
Beamlet is accelerated；The diaphragm group includes the diaphragm of a mobile device and multiple and different apertures, adjusts the mobile device
A diaphragm of the electron beam Jing Guo the diaphragm group after control acceleration；The electromagnetic lens, for by the diaphragm
Electron beam is assembled, and electron source is formed；In this way, being controlled described in the electron beam process after accelerating by adjusting the mobile device
A diaphragm in diaphragm group in multiple and different aperture diaphragms adjusts the size of the electron beam spot；The electromagnetic lens produces
Raw convergence magnetic field covers the electron gun and the diaphragm group, so that when electron gun generates electron beam just by electromagnetic lens
The effect in the convergence magnetic field of generation and assembled, be provided simultaneously with high throughput using the electron microscope of the electronics source generating device
And the characteristics of high-resolution.
Detailed description of the invention
Fig. 1 is the composed structure schematic diagram of scanning electron microscope；
Fig. 2 is the composed structure schematic diagram of electronics of embodiment of the present invention source generating device；
Fig. 3 a is a kind of composed structure schematic diagram of diaphragm of the embodiment of the present invention；
Fig. 3 b is a kind of composed structure schematic diagram of diaphragm of the embodiment of the present invention；
Fig. 4 is the schematic diagram that mobile device of the embodiment of the present invention carries out mobile control to the diaphragm；
Fig. 5 is the composed structure and electron beam using the scanning electron microscope of electronics source generating device of the embodiment of the present invention
Path schematic diagram；
Fig. 6 is the processing flow schematic diagram that the present invention implements electron beam control method.
Specific embodiment
Embodiment in order to better understand the present invention below carries out scanning electron microscope in the prior art simple
Explanation；The composed structure schematic diagram of scanning electron microscope 100 in the prior art, as shown in Figure 1, electron gun 101 launches electricity
Beamlet 103, electron beam 103 are accelerated through drawing pole and anode (not shown in figure 1), utilize the diaphragm that a pore size is fixed
102 pairs of electron beams limit；Electron beam is assembled using electromagnetic lens (i.e. rifle mirror), the center of the electron beam after convergence
Part passes through lens barrel diaphragm 106；It is shone after the focusing of electromagnetic lens (i.e. object lens) 108 again by the electron beam 107 of lens barrel diaphragm 106
It is incident upon on sample 109.When scanning electron microscope has high current, the electronics in electron beam is moved to from rifle diaphragm 102
During lens barrel diaphragm 106, since the Coulomb interactions between electronics spread the electron beam spot finally focused, electricity
Beamlet is relatively fuzzyyer.
Below according to Figure of description and embodiment, the present invention is further elaborated.
The embodiment of the present invention provides a kind of electronics source generating device, the composed structure of the electronics source generating device, such as Fig. 2
It is shown, comprising: electron gun 21, electrode 22, diaphragm group 23 and electromagnetic lens 24；Wherein,
The electron gun 21 is used for launching electronics beam；
The electrode 22, for accelerating to the electron beam, the electrode includes: to draw pole 221 and anode 222；
The diaphragm group 23 includes the diaphragm 232 of a mobile device 231 and multiple and different apertures, by adjusting the shifting
Electron beam after the dynamic control of device 231 acceleration is by a diaphragm in the diaphragm group 23；
The electromagnetic lens 24 forms electron source for assembling to by the electron beam of the diaphragm.
In a specific embodiment, the mobile device 231 includes the first motor 2311 and the second motor 2312；Its
In, first motor is mobile in X-direction for controlling the diaphragm, and second motor is for controlling the diaphragm in the side Y
To movement；
Here, the mobile device passes through a movable sealing device and first motor 2311 and second motor
2312 are attached；The movable sealing device can be bellows.
In a specific embodiment, the electromagnetic lens 24 is the lens of current excitation, by adjusting exciting current
Size changes the focus strength of the electromagnetic lens；The convergence magnetic field that the electromagnetic lens generates covers the rifle of the electron gun 21
The sharp and described diaphragm group 23 so that electron gun when generating electron beam just because electromagnetic lens generate convergence magnetic field effect due into
Line convergence is advantageously implemented bigger current density, that is, realizes high-throughput.
In a specific embodiment, the diaphragm group is located at the center for assembling magnetic field Distribution of Magnetic Field, so that
When the magnetic field of electromagnetic lens changes, it can be changed in the larger context by the electron beam of diaphragm.
In the embodiment of the present invention, a kind of composed structure schematic diagram of the diaphragm 232 has as shown in Figure 3a for a column
The diaphragm in multiple and different apertures, and the center of multiple apertures 301 is conllinear；The diameter range of aperture 301 is 5 microns to 500
Micron, the diameter of aperture 301 can be distributed by arithmetic progression, and the number of aperture 301 can flexibly be set according to actual needs.
Another composed structure schematic diagram of the diaphragm 232, as shown in Figure 3b, for the identical light with multiple and different apertures of two column
Door screen, each column diaphragm has the diaphragm in multiple and different apertures, and the center of multiple apertures is conllinear；The diameter range of aperture is 5
Micron is to 500 microns, and the diameter of aperture can be distributed by arithmetic progression, and the number of aperture can flexibly be set according to actual needs
It is fixed.
In the embodiment of the present invention, the mobile device carries out the schematic diagram of mobile control to the diaphragm, as shown in figure 4,
Make the diaphragm mobile in X-direction by controlling the first motor 2311, makes the diaphragm by controlling the second motor 2312
The diaphragm for moving in the Y direction, and then choosing a certain aperture is in the optical axial center of electron beam, to regulate and control electron beam spot
Size and size of current.
Using the composed structure and electronics of the scanning electron microscope 500 of electronics source generating device described in the embodiment of the present invention
Beam path schematic diagram, as shown in Figure 5；Wherein, electron gun 501 generates an electron beam 503, and the electron beam 503 passes through diaphragm group
In a diaphragm after, then pass through lens barrel diaphragm 506；It is focused by the electron beam 507 of the lens barrel diaphragm 506 through object lens 508
After be irradiated on sample 509 to be scanned.With in scanning electron microscope in the prior art shown in Fig. 1 be located at shown rifle diaphragm
102 compared with the quantity of the electronics 105 between lens barrel diaphragm 106, electron scanning electron microscope described in the embodiment of the present invention
In the electronics 505 between rifle diaphragm 510 and lens barrel diaphragm 506 negligible amounts, and then reduce electronics and electronics it
Between Coulomb interactions reduce so that converging to beam spot on sample 509, improve the resolution of scanning electron microscope
Rate.
Above-mentioned electronics source generating device based on the embodiment of the present invention, the embodiment of the present invention also provide a kind of electron beam control
Method, the process flow of the electron beam control method, as shown in Figure 6, comprising the following steps:
The electron beam of step S101, electron gun transmitting are accelerated through electrode；
Here, the electrode includes drawing pole and anode.
Step S102, the light in multiple and different aperture diaphragms that the electron beam after controlling the acceleration passes through diaphragm group
Door screen；
Here, the diaphragm group includes the diaphragm of a mobile device and multiple and different apertures, by adjusting the movement
Electron beam after device control acceleration is by a diaphragm in the diaphragm group；
Wherein, the mobile device includes the first motor and the second motor, and first motor is for controlling the diaphragm
Mobile in X-direction, second motor moves in the Y direction for controlling the diaphragm；And then it chooses at the diaphragm in a certain aperture
In the optical axial center of electron beam, to regulate and control electron beam spot size and size of current；The mobile device can by one
Moving sealing device is attached with first motor and second motor；The movable sealing device can be ripple
Pipe.
In the embodiment of the present invention, a kind of composed structure schematic diagram of the diaphragm has multiple as shown in Figure 3a for a column
The diaphragm of different pore size, and the center of multiple apertures is conllinear；The diameter range of aperture is 5 microns to 500 microns, aperture
Diameter can be distributed by arithmetic progression, the number of aperture can flexibly be set according to actual needs.A kind of group of the diaphragm
At structural schematic diagram, as shown in Figure 3b, for the two identical diaphragms with multiple and different apertures of column, each column diaphragm with it is multiple not
With the diaphragm in aperture, and the center of multiple apertures is conllinear；The diameter range of aperture is 5 microns to 500 microns, aperture
Diameter can be distributed by arithmetic progression, and the number of aperture can flexibly be set according to actual needs.
Step S103 assembles the electron beam that electron gun is launched using electromagnetic lens；
Specifically, the exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens, it is right
The electronics that electron gun is launched is assembled；.
Here, the convergence magnetic field that the electromagnetic lens generates covers the electron gun and the diaphragm group, so that electron gun
It is just assembled because of the effect in the convergence magnetic field of electromagnetic lens generation when generating electron beam, is advantageously implemented bigger electric current
Density is realized high-throughput；The diaphragm group is located at the magnetic that the center for assembling magnetic field field distribution makes electromagnetic lens
When field changes, it can be changed in the larger context by the electron beam of diaphragm.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the scope of the present invention.
Claims (9)
1. a kind of electronics source generating device, which is characterized in that described device includes: that electron gun, electrode, diaphragm group and electromagnetism are saturating
Mirror；Wherein,
The electron gun is used for launching electronics beam；
The electrode, for accelerating to the electron beam；
The diaphragm group includes the diaphragm of a mobile device and multiple and different apertures, is added by adjusting the mobile device control
Electron beam after speed is by a diaphragm in the diaphragm group；
The electromagnetic lens forms electron source for assembling to by the electron beam of the diaphragm；
The convergence magnetic field that the electromagnetic lens generates covers the electron gun and the diaphragm group, and the diaphragm group is positioned at described
Assemble the center of Distribution of Magnetic Field.
2. the apparatus according to claim 1, which is characterized in that the electrode includes drawing pole and anode.
3. device according to claim 1 or 2, which is characterized in that the mobile device includes: the first motor and the second horse
It reaches；Wherein,
First motor is mobile in X-direction for controlling the diaphragm, and second motor is for controlling the diaphragm in the side Y
To movement.
4. device according to claim 1 or 2, which is characterized in that the diaphragm of the multiple different pore size is at least one column
The diaphragm in multiple and different apertures.
5. device according to claim 1 or 2, which is characterized in that the electromagnetic lens is the lens of current excitation, is passed through
The size for adjusting exciting current changes the focus strength of the electromagnetic lens.
6. a kind of electron beam control method, which is characterized in that the described method includes:
The electron beam of electron gun transmitting is accelerated through electrode；
The diaphragm in multiple and different aperture diaphragms that electron beam after controlling the acceleration passes through diaphragm group；
The electron beam Jing Guo the diaphragm group is assembled using electromagnetic lens；Wherein,
The convergence magnetic field that the electromagnetic lens generates covers the electron gun and the diaphragm group, and the diaphragm group is positioned at described
Assemble the center of Distribution of Magnetic Field.
7. according to the method described in claim 6, it is characterized in that, the diaphragm group further includes mobile device, the control institute
State a diaphragm in multiple and different aperture diaphragms that the electron beam after accelerating passes through diaphragm group, comprising:
It controls the mobile device to move with Y-direction in X direction, so that the electron beam after the acceleration is by the diaphragm group
One diaphragm.
8. method according to claim 6 or 7, which is characterized in that the multiple different pore size diaphragm is that at least one column are more
The diaphragm of a different pore size.
9. method according to claim 6 or 7, which is characterized in that described to utilize electromagnetic lens to by the diaphragm group
Electron beam assembled, comprising:
The exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens；
Electron beam is formed after the electromagnetic lens with the focus strength is assembled by the electron beam of the diaphragm group.
Priority Applications (1)
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| CN201710082088.XA CN106711003B (en) | 2017-02-15 | 2017-02-15 | A kind of electronics source generating device and electron beam control method |
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| CN201710082088.XA CN106711003B (en) | 2017-02-15 | 2017-02-15 | A kind of electronics source generating device and electron beam control method |
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| CN106711003B true CN106711003B (en) | 2019-03-19 |
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| CN109300760B (en) * | 2017-07-25 | 2020-10-09 | 东方晶源微电子科技（北京）有限公司 | Electron beam control device and method, electron beam imaging module, and electron beam inspection apparatus |
| CN107919258B (en) * | 2017-09-28 | 2020-06-05 | 浙江大学 | Device and method for generating controllable vortex electron beam |
| US11561284B2 (en) | 2018-11-02 | 2023-01-24 | Waymo Llc | Parallax compensating spatial filters |
| CN110676147A (en) * | 2019-11-14 | 2020-01-10 | 河南河大科技发展有限公司 | Diaphragm device of movable diaphragm of transmission electron microscope |
| CN114242550A (en) * | 2021-09-03 | 2022-03-25 | 聚束科技（北京）有限公司 | Electron beam generating device and electron microscope |
| CN114200504B (en) * | 2021-12-13 | 2024-04-30 | 中国核动力研究设计院 | Electron beam generator for simulating beta radiation source and testing method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05182624A (en) * | 1992-01-07 | 1993-07-23 | Jeol Ltd | Objective diaphragm |
| JPH05217536A (en) * | 1992-02-03 | 1993-08-27 | Hitachi Ltd | Throttle device for electron microscope |
| JPH09167591A (en) * | 1995-12-15 | 1997-06-24 | Hitachi Ltd | Scanning emission electron microscope |
| CN101388317A (en) * | 2008-03-21 | 2009-03-18 | 北京威孚物理科技有限公司 | Scanning electronic microscope |
| CN102163529A (en) * | 2011-03-15 | 2011-08-24 | 北京航空航天大学 | Movable diaphragm device for condensing mirror of electron microscope |
| CN103456589A (en) * | 2012-05-31 | 2013-12-18 | 睿励科学仪器（上海）有限公司 | Diaphragm for adjusting particle beam with multipole lenses and device including same |
| CN206451682U (en) * | 2017-02-15 | 2017-08-29 | 聚束科技（北京）有限公司 | A kind of electronics source generating device |
-
2017
- 2017-02-15 CN CN201710082088.XA patent/CN106711003B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05182624A (en) * | 1992-01-07 | 1993-07-23 | Jeol Ltd | Objective diaphragm |
| JPH05217536A (en) * | 1992-02-03 | 1993-08-27 | Hitachi Ltd | Throttle device for electron microscope |
| JPH09167591A (en) * | 1995-12-15 | 1997-06-24 | Hitachi Ltd | Scanning emission electron microscope |
| CN101388317A (en) * | 2008-03-21 | 2009-03-18 | 北京威孚物理科技有限公司 | Scanning electronic microscope |
| CN102163529A (en) * | 2011-03-15 | 2011-08-24 | 北京航空航天大学 | Movable diaphragm device for condensing mirror of electron microscope |
| CN103456589A (en) * | 2012-05-31 | 2013-12-18 | 睿励科学仪器（上海）有限公司 | Diaphragm for adjusting particle beam with multipole lenses and device including same |
| CN206451682U (en) * | 2017-02-15 | 2017-08-29 | 聚束科技（北京）有限公司 | A kind of electronics source generating device |
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