CN101609252A - Pattern repairing method - Google Patents
Pattern repairing method Download PDFInfo
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- CN101609252A CN101609252A CNA200810099645XA CN200810099645A CN101609252A CN 101609252 A CN101609252 A CN 101609252A CN A200810099645X A CNA200810099645X A CN A200810099645XA CN 200810099645 A CN200810099645 A CN 200810099645A CN 101609252 A CN101609252 A CN 101609252A
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- pattern
- repair
- repair layer
- patch area
- repairing method
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Abstract
A kind of pattern repairing method includes: purchase a base material, have pattern to be repaired on this base material, this pattern to be repaired has flaw point to be repaired; With laser this flaw point is destroyed, treated patch area and make this position of being struck off of waiting to repair pattern form one; With hot pressing mode one repair layer is needed on this and treats on the patch area, and this repair layer is covered in this and waits to repair pattern and this treats patch area; With ultraviolet ray this repair layer in treating patch area, this is exposed; And remove this repair layer that is not exposed.Thus, the effect that can have complete correction and can not cause additional injuries to pattern.
Description
Technical field
The present invention is relevant with the repairing technique of pattern, is meant a kind of pattern repairing method of repairing pattern by the mode of laser and hot transfer printing especially.
Background technology
Press, known pattern repairing technology, for example TaiWan, China is announced " repairing the defective of pattern and the method for the defective of repairing pattern " patent of invention I286271 number, its expose utilize press mold technology with a film transfer on the defective that pattern and this pattern had, the film that will be positioned at again on the defective is removed, and this defective is coated with it with a repair paint, after being cured, with thin film removing, promptly finish the technology of repairing again.
Yet, in the above-mentioned technology, when repairing, have some shortcomings and have much room for improvement.For example during the film on removing defective, not quite just remove film identically easily with the shape of defective.Therefore when the coating repair paint, probably cause coating can't cover defective fully.Or for example when removing film, being to use the mode of tearing that film is torn, this also may damage other the normal position on this pattern.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of pattern repairing method, but its complete correction waits to repair the flaw point on the pattern.
Of the present invention time a purpose is to provide a kind of pattern repairing method, does not have the possibility of damaging other normal position in the process of its repairing.
Edge is that in order to reach aforementioned purpose, according to a kind of pattern repairing method provided by the present invention, include: purchase a base material, have pattern to be repaired on this base material, this pattern to be repaired has flaw point to be repaired; With laser light this flaw point is destroyed, treated patch area and make this position of being struck off of waiting to repair pattern form one; With hot pressing mode one repair layer is needed on this and treats on the patch area, and this repair layer is covered in this and waits to repair pattern and this treats patch area; With ultraviolet ray this repair layer in treating patch area, this is exposed; And remove this repair layer that is not exposed.Thus, the effect that can have complete correction and can not cause additional injuries to pattern.
Description of drawings
In order to describe structure of the present invention and characteristics place in detail, below enumerate a preferred embodiment and conjunction with figs. the explanation as after, wherein:
Fig. 1 is the action synoptic diagram of a preferred embodiment of the present invention.
Fig. 2 is the action synoptic diagram of a preferred embodiment of the present invention, and the demonstration laser light is destroyed the state of flaw point.
Fig. 3 is the action synoptic diagram of a preferred embodiment of the present invention, shows that repair layer is needed on the state for the treatment of patch area.
Fig. 4 is the action synoptic diagram of a preferred embodiment of the present invention, shows with the state behind the ultraviolet exposure.
Fig. 5 is the action synoptic diagram of a preferred embodiment of the present invention, shows the state after unexposed repair layer removes.
Embodiment
A kind of pattern repairing method that a preferred embodiment of the present invention provided mainly has the following step:
At first, as shown in Figure 1, purchase a base material 11, have on this base material 11 and wait to repair pattern 12, this is waited to repair pattern 12 and has flaw point to be repaired 14.In the present embodiment, this base material 11 can be a light shield, or is a liquid crystal panel, or is a colored filter substrate.
Secondly, as shown in Figure 2, this flaw point 14 is destroyed, and made this wait that the position of the being struck off formation one of repairing pattern 12 treats patch area 16 with laser light.
Come again, as shown in Figure 3, with hot pressing mode one repair layer 18 is needed on this and treats on the patch area 16, and this repair layer 18 is covered in this and waits to repair pattern 12 and this treats patch area 16.
Then, as shown in Figure 4, this repair layer 18 in treating patch area 16 territories, this is exposed with ultraviolet ray.
At last, as shown in Figure 5, remove this repair layer 18 that is not exposed.Be to come this repair layer 18 of flush away when removing by developer solution.And again this developer solution is removed it cleaning with pure water, with roasting mode residual water is dried again at last.
Said method in simple terms, earlier destroys flaw point 14 exactly and forms one and treat patch area 16, and it is fixing with ultraviolet exposure to be coated with last layer repair layer 18 afterwards, again 18 removals of unnecessary repair layer, promptly finishes the repairing to this flaw point 14.
Owing to use ultraviolet ray to expose, its irradiation area is controlled easily, therefore the repair layer 18 that can effectively treat on the patch area 16 is exposed, with this repair layer 18 in the fixing exposure area, and this kind mode can guarantee to be positioned at that this this repair layer 18 for the treatment of patch area 16 can be complete is exposed and fixes, and can reach complete repairing.And when removing this repair layer 18, be to remove or clean with lotion (developer solution, pure water), therefore can not hurt pattern itself.
As from the foregoing, the attainable effect of the present invention is:
One, complete reparation: by technology provided by the present invention, this waits to repair flaw point on the pattern reparation that can be complete, does not have the infull problem of repairing.
Two, can not cause damage:, therefore can not cause damage to other normal position on the pattern because the present invention when removing unnecessary repair layer, is to remove or clean with lotion (developer solution, pure water) to normal position.
Claims (5)
1. a pattern repairing method is characterized in that, includes:
Purchase a base material, have pattern to be repaired on this base material, this pattern to be repaired has flaw point to be repaired;
With laser light this flaw point is destroyed, treated patch area and make this position of being struck off of waiting to repair pattern form one;
With hot pressing mode one repair layer is needed on this and treats on the patch area, and this repair layer is covered in this and waits to repair pattern and this treats patch area;
With ultraviolet ray this repair layer in treating patch area, this is exposed; And
Remove this repair layer that is not exposed.
2. according to the described pattern repairing method of claim 1, it is characterized in that, wherein: when removing the repair layer that is not exposed, be to come this repair layer of flush away by developer solution.
3. according to the described pattern repairing method of claim 2, it is characterized in that, wherein: again this developer solution is removed on this substrate.
4. according to the described pattern repairing method of claim 3, it is characterized in that, wherein: when removing the developer solution on this substrate, be with pure water this developer solution to be cleaned to remove.
5. according to the described pattern repairing method of claim 4, it is characterized in that wherein: the pure water that will retain in again on this substrate removes in the mode of toasting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200810099645XA CN101609252A (en) | 2008-06-17 | 2008-06-17 | Pattern repairing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200810099645XA CN101609252A (en) | 2008-06-17 | 2008-06-17 | Pattern repairing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101609252A true CN101609252A (en) | 2009-12-23 |
Family
ID=41483056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA200810099645XA Pending CN101609252A (en) | 2008-06-17 | 2008-06-17 | Pattern repairing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101609252A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102307434A (en) * | 2011-08-30 | 2012-01-04 | 东莞美维电路有限公司 | UV adding line instrument and adding line method |
| CN103091878A (en) * | 2013-01-15 | 2013-05-08 | 深圳市华星光电技术有限公司 | Repairing method of glass substrate |
| CN106569387A (en) * | 2015-10-09 | 2017-04-19 | 中芯国际集成电路制造(北京)有限公司 | Mask and repair method thereof |
| CN107255872A (en) * | 2017-07-19 | 2017-10-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of bad desalination method of display device line |
-
2008
- 2008-06-17 CN CNA200810099645XA patent/CN101609252A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102307434A (en) * | 2011-08-30 | 2012-01-04 | 东莞美维电路有限公司 | UV adding line instrument and adding line method |
| CN103091878A (en) * | 2013-01-15 | 2013-05-08 | 深圳市华星光电技术有限公司 | Repairing method of glass substrate |
| CN103091878B (en) * | 2013-01-15 | 2015-03-25 | 深圳市华星光电技术有限公司 | Repairing method of glass substrate |
| CN106569387A (en) * | 2015-10-09 | 2017-04-19 | 中芯国际集成电路制造(北京)有限公司 | Mask and repair method thereof |
| CN106569387B (en) * | 2015-10-09 | 2021-03-23 | 中芯国际集成电路制造(北京)有限公司 | Photomask and repairing method thereof |
| CN107255872A (en) * | 2017-07-19 | 2017-10-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of bad desalination method of display device line |
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| C06 | Publication | ||
| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20091223 |