CN101550533A - Antistatic optical substrate preparation method - Google Patents
Antistatic optical substrate preparation method Download PDFInfo
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- CN101550533A CN101550533A CNA200910111751XA CN200910111751A CN101550533A CN 101550533 A CN101550533 A CN 101550533A CN A200910111751X A CNA200910111751X A CN A200910111751XA CN 200910111751 A CN200910111751 A CN 200910111751A CN 101550533 A CN101550533 A CN 101550533A
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- refractive index
- electrostatic
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Abstract
The invention discloses an antistatic optical substrate preparation method, pertaining to the lens coated optics manufacturing technology. The method includes: cleaning the substrate and then placing in a fine vacuum machine whose vacuum degree is pumped to1*10 [-5] Torr to 5*10 [-5] Torr, depositing a film with alternated high refractivity film layer and low refractivity coating film layer in sequence on the substrate, and then evaporating a super water proof coating material WR5 and then evaporating and placing on the film layer in molecular status to form a new layer of film (wherein, the film thickness is 120-220nm), and then removing the substrate to form an antistatic optical substrate. The optical lens can play an antistatic (electrostatic isolation) role, which is not liable to adsorb dust and can remain cleanly and sanitary for a long time.
Description
Technical field
The present invention discloses a kind of optical substrate preparation method of anti-electrostatic, belongs to glasses lens plated optics manufacturing technology field.
Background technology
Static is a kind of objective spontaneous phenomenon, and the mode of generation is multiple, as contact, friction etc.The electrostatic characteristics be high-voltage, low electric weight, little electric current and action time short characteristics.It is the abbreviation of Electro-Static discharge that static discharges.When two kinds of materials, and though be by pressure or by friction contact separately after, the electronics surface of material of will dissociating, thus produce the static district.The material surface that electronics reduces is positive polarity, and the material surface of band excess electron is electronegativity, these two kinds of charged materials can attract the material of paripheral zone opposite charges so that electrically neutralization, if charged materials is an electroconductibility, then static charge very soon can be by material transfer to ground, if material is in press charged, then static charge can be transferred to machine surface.If material is an isolator, then static charge can be missed later on gradually at several hrs, a few week even some months.Electrostatics is mainly studied the static utilisation technology, and as electrostatic precipitation, xerox, static biological effect etc., main is the electrostatic protection technology.Static can be described as ubiquitous in our daily life, on our body and just have very high electrostatic potential on every side, several kilovolts even several ten thousand volts.May know from experience less than the pass by carpet static of chemical fibre of, people at ordinary times approximately is 35000 volts, about 7000 volts of the plastics specification sheets of browsing, and for some responsive instruments, this voltage may be fatal harm.
At present, static electricity on human body's safeguard system mainly contains ESD-preventive wrist strap, the ankle band, and compositions such as working suit, footgear, cap, gloves or fingerstall have static and reveal, functions such as neutralization and shielding.The at present common optical base-substrate through plated film easily adsorbs dust, and the optical base-substrate that does not also have on the market to occur by plated film plays anti-static effect.
Summary of the invention
At the deficiencies in the prior art, the invention provides a kind of optical substrate preparation method of reasonable in design, the simple anti-electrostatic of technology, can play the effect of anti-electrostatic through the optical base-substrate of this processing, and be difficult for the absorption dust, can keep clean the long period.
The present invention is achieved by the following technical solutions:
A kind of optical substrate preparation method of anti-electrostatic, its step is as follows:
After substrate cleans up, be positioned over vacuum tightness and be evacuated to 1x10
-5Torr is to 5x10
-5In the high vacuum board of Torr, evaporation high refractive index film layer and low-refraction coatings alternative rete successively on substrate, then the state of super waterproof Coating Materials WR5 evaporation back with molecule steamed in thin film layer, form new WR5 rete, this WR5 thicknesses of layers is at 120-220nm, and the optical base-substrate of formation anti-electrostatic takes out substrate.
Described low-index film of one deck at least and the mutual interference mutually of one deck high refractive index layer.
Described high refractive index Coating Materials is tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) wherein any one, in the mode of resistive heating or electron beam gun flow of emitted electrons with above-mentioned high refractive index Coating Materials tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) after wherein any evaporation, steaming on substrate with the state of molecule, form a high refractive index layer.
Described low-index material is silicon-dioxide (SiO
2), in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials silicon-dioxide (SiO
2) evaporation back steaming on thin film layer with the state of molecule, forms a low refractive index film layer.
Described super waterproof Coating Materials WR5 is evaporated the back in the mode of resistive heating or electron beam gun flow of emitted electrons and is steaming in thin film layer with the state of molecule, forms new one deck rete, this thicknesses of layers 120-220nm.
Described substrate is a kind of in acryl (AC) substrate, PC polycarbonate substrate (Polycarbonate), nylon (Nylon) substrate, the CR-39 substrate.
After any substrate in the materials such as AC, PC, Nylon, CR-39 cleaned up, be positioned over vacuum tightness then and be evacuated to 3.0*10 at least
-5In the high vacuum board of handkerchief, in the mode of resistive heating or electron beam gun flow of emitted electrons with high refractive index Coating Materials Ta
2O
5, TiO
2, Ti
3O
5After wherein any evaporation, steaming on substrate, forming a high refractive index layer with the state of molecule, again in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials SiO
2Is steaming on high refractive index layer with the state of molecule the evaporation back, forms a low refractive index film layer, at least one floor height specific refractory power and the mutual interference mutually of one deck low-index film.In the mode of resistive heating or electron beam gun flow of emitted electrons the state of super waterproof Coating Materials WR5 evaporation back with molecule steamed in thin film layer, forming new one deck rete, thicknesses of layers is being 120-220nm.Super waterproof Coating Materials WR5 is produced by Merck KGaA company, buys in city's field energy at present, and this Coating Materials is bragged about and had good waterproof effect.
The present invention has following advantage: common product through plated film, easily adsorb dust, and through this product processed, can play the effect of anti-electrostatic, and be difficult for the absorption dust, can make eyeglass keep clean, sanitary the long period.
Description of drawings
Fig. 1 is a process flow sheet of the present invention.
Embodiment
The invention will be further described below in conjunction with accompanying drawing:
Embodiment: structure as shown in Figure 1, a kind of optical substrate preparation method of anti-electrostatic, its technology is as follows: cleaning substrate--is placed on substrate on the tool (shelf of fixed substrate) that--tool is put into the vacuum board, and--the vacuum board is evacuated down to certain condition, and--coating process (detailed process is as follows)--board lose heart--takes out substrate.
Coating process: after substrate cleans up, be positioned over vacuum tightness and be evacuated to 1x10
-5Torr is to 5x10
-5In the high vacuum board of Torr, evaporation high refractive index film layer and low-refraction coatings alternative rete successively on substrate, then the state of super waterproof Coating Materials WR5 evaporation back with molecule steamed in thin film layer, form new one deck rete, and the thickness of the new rete of this WR5 is being 120-220nm, takes out substrate and forms the optical base-substrate of anti-electrostatic.
Above-mentioned at least one floor height refractivity film layer and the mutual interference mutually of one deck low-index film.Wherein, the high refractive index Coating Materials is tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) wherein any one, in the mode of resistive heating or electron beam gun flow of emitted electrons with above-mentioned high refractive index Coating Materials tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) after wherein any evaporation, steaming on substrate with the state of molecule, form a high refractive index layer.Low-index material is SiO
2, in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials SiO
2Is steaming on thin film layer with the state of molecule the evaporation back, forms a low refractive index film layer.
Super waterproof Coating Materials WR5 is evaporated the back in the mode of resistive heating or electron beam gun flow of emitted electrons and is steaming in thin film layer with the state of molecule, forms new one deck rete, and thicknesses of layers is at 120-220nm.
Substrate is a kind of in acryl (AC) substrate, PC polycarbonate substrate (Polycarbonate), nylon (Nylon) substrate, the CR-39 substrate.
After any substrate in the materials such as AC, PC, Nylon, CR-39 cleaned up, be positioned over vacuum tightness then and be evacuated to 1x10
-5Torr is to 5x10
-5Torr, the high vacuum board in, in the mode of resistive heating or electron beam gun flow of emitted electrons with high refractive index Coating Materials Ta
2O
5, TiO
2, Ti
3O
5After wherein any evaporation, steaming on substrate, forming a high refractive index layer with the state of molecule, again in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials SiO
2Is steaming on thin film layer with the state of molecule the evaporation back, forms a low refractive index film layer, at least one floor height specific refractory power and the mutual interference mutually of one deck low-index film.In the mode of resistive heating or electron beam gun flow of emitted electrons the state of super waterproof Coating Materials WR5 evaporation back with molecule steamed in thin film layer, forming new one deck rete, WR5 tunic layer thickness is at 120-220nm.
The present invention has following advantage: common product through plated film, easily adsorb dust, and through this product processed, can play the effect of anti-electrostatic, and be difficult for the absorption dust, can keep clean the long period.
Below be concrete experimental data: (used electrostatic test instrument is the COSMI brand SC-STD series that Taiwan produces)
The contrast reference table:
The above record only for utilizing the embodiment of this origination techniques content, anyly is familiar with modification, the variation that this skill person uses this creation to do to do, and all belongs to the claim of this creation opinion, and is not limited to those disclosed embodiments.
Claims (6)
1, a kind of optical substrate preparation method of anti-electrostatic is characterized in that step is as follows:
After substrate cleans up, be positioned over vacuum tightness and be evacuated to 1 * 10
-5Torr to 5 * 10
-5In the high vacuum board of Torr, evaporation high refractive index film layer and low refractive index film layer alternative rete successively on substrate, then the state of super waterproof Coating Materials WR5 evaporation back with molecule steamed in thin film layer, form a new WR5 rete, this WR5 thicknesses of layers is 120-220nm, takes out substrate and forms the optical base-substrate of anti-electrostatic.
2, the optical substrate preparation method of anti-electrostatic according to claim 1 is characterized in that: described at least one floor height refractivity film layer and the mutual interference mutually of one deck low-index film.
3, the optical substrate preparation method of anti-electrostatic according to claim 1 is characterized in that: described high refractive index Coating Materials is tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) wherein any one, in the mode of resistive heating or electron beam gun flow of emitted electrons with above-mentioned high refractive index Coating Materials tantalum pentoxide (Ta
2O
5), titanium dioxide (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5) after wherein any evaporation, steaming on substrate with the state of molecule, form a high refractive index layer.
4, the optical substrate preparation method of anti-electrostatic according to claim 1 is characterized in that: described low-index material is silicon-dioxide (SiO
2), in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials silicon-dioxide (SiO
2) evaporation back steaming on thin film layer with the state of molecule, forms a low refractive index film layer.
5, the optical substrate preparation method of anti-electrostatic according to claim 1, it is characterized in that: described super waterproof Coating Materials WR5 is evaporated the back in the mode of resistive heating or electron beam gun flow of emitted electrons and is steaming in thin film layer with the state of molecule, form new one deck rete, thicknesses of layers is being 120-220nm.
6, the optical substrate preparation method of anti-electrostatic according to claim 1 is characterized in that: described substrate is a kind of in acryl (AC) substrate, PC polycarbonate substrate (Polycarbonate), nylon (Nylon) substrate, the CR-39 substrate.
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|---|---|---|---|
| CN200910111751XA CN101550533B (en) | 2009-05-07 | 2009-05-07 | Antistatic optical substrate preparation method |
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|---|---|---|---|
| CN200910111751XA CN101550533B (en) | 2009-05-07 | 2009-05-07 | Antistatic optical substrate preparation method |
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| CN101550533A true CN101550533A (en) | 2009-10-07 |
| CN101550533B CN101550533B (en) | 2011-04-13 |
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