CN101550528A - Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate - Google Patents
Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate Download PDFInfo
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- CN101550528A CN101550528A CNA2009101117524A CN200910111752A CN101550528A CN 101550528 A CN101550528 A CN 101550528A CN A2009101117524 A CNA2009101117524 A CN A2009101117524A CN 200910111752 A CN200910111752 A CN 200910111752A CN 101550528 A CN101550528 A CN 101550528A
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- pattern
- refractive index
- high refractive
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Abstract
The invention discloses a preparing method of plating patterns without prejudice to the line-of-sight on optical substrate, pertaining to the field of lens coated optics fabrication technique. The method includes: cleaning the substrate, sticking the formwork required to hollow out on the substrate, and then fixing the substrate on the jig, and then placing in a vacuum machine whose vacuum degree is pumped to at least 10 [-2] Torr to 10 [-5] Torr, depositing a film with alternated high refractivity film layer and low refractivity coating film layer on the hollow-out part of the substrate (wherein, the film thickness of the low refractivity film layer is controlled between 30-60nm, while the film thickness of the high refractivity film layer is controlled between 650-1200nm), to form a hollow-out pattern without prejudice to the line-of-sight. The lens made by the present invention, first of all does not affect the visual effects of the wearers, to protect the health of the eye, but also can still maintain the beauty of products capable of showing the patterns.
Description
Technical field
The present invention discloses the preparation method that a kind of optical base-substrate plates the pattern of not obstructing the view, and belongs to glasses lens plated optics manufacturing technology field.
Background technology
Common pattern can be obstructed the view at present, influences the normal visual effect of wearer, and can damage eyes, and particularly the children wearer more can produce serious consequence.
General process of plating: first chromium plating powder, plate one deck SiO (silicon oxide) again, interfere to form pattern.But because of chromium is metallic substance, plates out the pattern that comes and on substrate, have background color, and the part that substrate has plated is different with the partial penetration rate of not plating, so wearer's generation is very uncomfortable.
The problem of existing patterned optical mirror slip overslaugh sight line, be those skilled in the art's research topics, optical mirror slip how to develop a not overslaugh sight line reaches purpose attractive in appearance, practical by the human consumer of wearing spectacles, and do not influence wearer's sight line effect, this creator just has proposition of the present invention through long-time research and a large amount of experiments.
Summary of the invention
At the deficiencies in the prior art, the invention provides the preparation method that a kind of optical base-substrate reasonable in design plates the pattern of not obstructing the view, the optical base-substrate of its preparation has safety and Health, visual effect is unaffected, and can reach the aesthetic that eyeglass presents pattern.
The present invention is achieved by the following technical solutions:
A kind of optical base-substrate plates the preparation method of the pattern of not obstructing the view, and its step is as follows:
One), behind the substrate cleaning, needed pierced pattern template is affixed on the substrate, is positioned over vacuum tightness and is evacuated at least 10
-2To 10
-5In the high vacuum board of Torr;
Two), with openwork part on above-mentioned substrate evaporation high refractive index film layer successively and low-index film alternative rete, the high refractive index layer gauge control exists: 650-1200nm; The low-index film gauge control forms the pattern of not obstructing the view on the substrate at 30-60nm, and the vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure.
Described step 2) in, evaporation one deck high refractive index layer and the mutual interference mutually of one deck low-index film at least on the substrate form pattern.
Described step 2) in, high refractive index film is by the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of high refractive index Coating Materials evaporation back with molecule to be steamed in substrate, forms high refractive index layer; The low-refraction plated film is by the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low-refraction Coating Materials evaporation back with molecule to be steamed on high refractive index layer, forms low-index film.
Described high-index material be titanium dioxide (TiO2), zirconium dioxide (ZrO2), three oxidations, two tantalums (Ta2O3), five oxidation Tritanium/Trititaniums (Ti3O5) any one, low-index material is silicon-dioxide (SiO2) or silicon oxide (SiO).
Described high-index material TiO2, ZrO2, Ta2O3, Ti3O5 are wherein any to be used alternatingly mutually with low-index material SiO2, forms mutual alternative high refractive index layer and low-index film.
Described high-index material TiO2, ZrO2, Ta2O3, Ti3O5 are wherein any to be used alternatingly mutually with low-index material SiO, forms mutual alternative high refractive index layer and low-index film.
Described substrate is any one in acryl (AC) substrate, polycarbonate (Polycarbonate) substrate, nylon (Nylon) substrate, CR-39 substrate, the glass substrate.
The present invention after any substrate in the plated film materials such as AC, PC, Nylon, CR-39, glass substrate is cleaned up, is affixed on needed pierced pattern template on the substrate, is positioned over then in the board, and vacuum tightness is evacuated at least 10
-2To 10
-5Torr; Mode with resistive heating or electron beam gun flow of emitted electrons is being steamed high refractive index Coating Materials TiO2, ZrO2, Ta2O3, the wherein any material evaporation of Ti3O5 back on the openwork part substrate with the state of molecule, forms high refractive index layer; Mode with resistive heating or electron beam gun flow of emitted electrons is being steamed the state of the wherein any material evaporation of low-refraction Coating Materials SiO, SiO2 back with molecule on high refractive index layer, form a low refractive index film layer, at least one floor height specific refractory power and the mutual interference mutually of one deck low-index film form pierced pattern.The present invention be plate earlier one deck high-index material: TiO2 (titanium dioxide), ZrO2 (zirconium dioxide), Ta2O3 (three oxidations, two tantalums), Ti3O5 (five oxidation Tritanium/Trititaniums) any one, plate one deck SiO (silicon oxide) again, because of these materials are metal oxide, they do not have background color after being plated on the substrate, just there is not background color so plate out the pattern part that comes, the penetration coefficient of its pattern part and not plating part differs very little, thereby can not influence wearer's sight line.
The eyeglass advantage of the present invention and present general pattern:
Common pattern can be obstructed the view at present; influence the normal visual effect of wearer; and can damage eyes; children wearer particularly; and the product of the pattern of not obstructing the view is made; at first can allow wearer's visual effect unaffected, the health of protection eyes, and still can keep product can present the aesthetic of pattern.
Description of drawings
Fig. 1 is a process flow sheet of the present invention.
Embodiment
The invention will be further described below in conjunction with accompanying drawing:
Embodiment: structure as shown in Figure 1, substantially technological process is for cleaning substrate, and----ready substrate is put in puts in the vacuum board after tool (shelf of fixed substrate) is gone up that--board is evacuated down to certain condition, and--coating process (specific as follows)--after plating is good loses heart board--and takes out substrate into to paste hollow out figure template on substrate.
Coating process: behind substrate cleaning, be positioned in the high vacuum board of certain vacuum tightness, mode with resistive heating or electron beam gun flow of emitted electrons is steaming the state of a kind of high refractive index Coating Materials evaporation back with molecule in the substrate top layer, form high refractive index layer, the high refractive index layer gauge control exists: 650-1200nm; In the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low-refraction Coating Materials evaporation back with molecule steamed on high refractive index layer, forming the low refractive index film layer, the low-index film gauge control is at 30-60nm; Per twice employed Coating Materials be high-index material and low-index material alternately, make on the substrate per two adjacent retes be high refractive index layer and low-index film alternately.
A, high-index material TiO2, ZrO2, Ta2O3, Ti3O5 are wherein any to be used alternatingly mutually with low-index material SiO2
B, high-index material TiO2, ZrO2, Ta2O3, Ti3O5 are wherein any to be used alternatingly mutually with low-index material SiO
Two kinds of methods of above a, b can be used.
The advantage of the pattern that this pattern ratio is at present common: common pattern can be obstructed the view at present; influence the normal visual effect of wearer; and can damage eyes; children wearer particularly; and the product of the pattern of not obstructing the view is made; at first can allow wearer's visual effect unaffected, the health of protection eyes, and still can keep product can present the aesthetic of pattern.
After any substrate in the materials such as AC, PC, Nylon, CR-39, glass cleaned up, needed pierced pattern template is affixed on the substrate, substrate is fixed on the tool, be positioned over then in the vacuum board, vacuum tightness is evacuated at least 10
-2To 10
-5Torr;
In the mode of resistive heating or electron beam gun flow of emitted electrons with high refractive index Coating Materials TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Is steaming on the openwork part substrate with the state of molecule wherein any material evaporation back, forms high refractive index layer; Again in the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials SiO, SiO
2Is steaming on high refractive index layer with the state of molecule wherein any material evaporation back, forms a low-index film; At least one floor height specific refractory power and the mutual interference mutually of one deck low-index film form pierced pattern.
The above record only for utilizing the embodiment of this origination techniques content, anyly is familiar with modification, the variation that this skill person uses this creation to do to do, and all belongs to the claim of this creation opinion, and is not limited to those disclosed embodiments.
Claims (7)
1, a kind of optical base-substrate plates the preparation method of the pattern of not obstructing the view, and it is characterized in that step is as follows:
One), behind the substrate cleaning, needed pierced pattern template is affixed on the substrate, is positioned over vacuum tightness and is evacuated at least 10
-2To 10
-5In the high vacuum board of Torr;
Two), with openwork part on above-mentioned substrate evaporation high refractive index film layer successively and low-refraction coatings alternative rete, the high refractive index layer gauge control exists: 650-1200nm; The low-index film gauge control exists: 30-60nm, form the pattern of not obstructing the view on the substrate, and the vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure.
2, the optical base-substrate according to claim 1 plating preparation method of pattern that do not obstruct the view is characterized in that: described step 2), evaporation one deck high refractive index layer and the mutual interference mutually of one deck low-index film at least on the substrate form pierced pattern.
3, optical base-substrate according to claim 1 and 2 plates the preparation method of the pattern of not obstructing the view, it is characterized in that: described step 2), high refractive index layer is by the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of high refractive index Coating Materials evaporation back with molecule to be steamed in the openwork part substrate, forms high refractive index layer; Low-index film is by the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low-refraction Coating Materials evaporation back with molecule to be steamed in high refractive index layer, forms low-index film.
4, optical base-substrate according to claim 3 plates the preparation method of the pattern of not obstructing the view, and it is characterized in that: described high-index material is titanium dioxide (TiO
2), zirconium dioxide (ZrO
2), three oxidations, two tantalum (Ta
2O
3), five oxidation Tritanium/Trititanium (Ti
3O
5) any one, low-index material is silicon-dioxide (SiO
2) or silicon oxide (SiO).
5, optical base-substrate according to claim 4 plates the preparation method of the pattern of not obstructing the view, and it is characterized in that: described high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any and low-index material SiO
2Be used alternatingly mutually, form mutual alternative high refractive index film layer and low refractive index film layer.
6, optical base-substrate according to claim 4 plates the preparation method of the pattern of not obstructing the view, and it is characterized in that: described high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any and low-index material SiO is used alternatingly mutually, forms mutual alternative high refractive index film layer and low-refraction coatings.
7, optical base-substrate according to claim 1 plates the preparation method of the pattern of not obstructing the view, and it is characterized in that: described substrate is any one in acryl (AC) substrate, polycarbonate (Polycarbonate) substrate, nylon (Nylon) substrate, CR-39 substrate, the glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009101117524A CN101550528A (en) | 2009-05-07 | 2009-05-07 | Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009101117524A CN101550528A (en) | 2009-05-07 | 2009-05-07 | Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate |
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| Publication Number | Publication Date |
|---|---|
| CN101550528A true CN101550528A (en) | 2009-10-07 |
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ID=41155013
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2009101117524A Pending CN101550528A (en) | 2009-05-07 | 2009-05-07 | Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102505108A (en) * | 2011-12-21 | 2012-06-20 | 厦门美澜光电科技有限公司 | Method for preparing lens plated with patterns without sight obstruction |
| CN103439803A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Anti-blue-light lens |
| CN103439802A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Manufacturing method for blue-light resistant lens |
| CN104335076A (en) * | 2012-02-17 | 2015-02-04 | 保谷透镜制造菲律宾股份有限公司 | Optical member and method for manufacturing optical member |
| CN104498876A (en) * | 2014-12-25 | 2015-04-08 | 江西昌佳鑫科技有限公司 | Vacuum coating method of camera cover plate |
| CN104561899A (en) * | 2014-12-25 | 2015-04-29 | 江西昌佳鑫科技有限公司 | Vacuum coating camera cover plate and preparation method thereof |
| CN106337163A (en) * | 2016-11-22 | 2017-01-18 | 陈浩 | Solid material surface transparent texture coating technology |
| CN112458412A (en) * | 2020-09-30 | 2021-03-09 | 昆山华冠商标印刷有限公司 | Coating process of semitransparent color layer |
-
2009
- 2009-05-07 CN CNA2009101117524A patent/CN101550528A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102505108A (en) * | 2011-12-21 | 2012-06-20 | 厦门美澜光电科技有限公司 | Method for preparing lens plated with patterns without sight obstruction |
| CN104335076A (en) * | 2012-02-17 | 2015-02-04 | 保谷透镜制造菲律宾股份有限公司 | Optical member and method for manufacturing optical member |
| CN103439803A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Anti-blue-light lens |
| CN103439802A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Manufacturing method for blue-light resistant lens |
| CN103439802B (en) * | 2013-09-04 | 2015-12-23 | 杏晖光学（厦门）有限公司 | The method for making of anti-blue light eyeglass |
| CN104498876A (en) * | 2014-12-25 | 2015-04-08 | 江西昌佳鑫科技有限公司 | Vacuum coating method of camera cover plate |
| CN104561899A (en) * | 2014-12-25 | 2015-04-29 | 江西昌佳鑫科技有限公司 | Vacuum coating camera cover plate and preparation method thereof |
| CN104498876B (en) * | 2014-12-25 | 2017-02-08 | 江西昌佳鑫科技有限公司 | Vacuum coating method of camera cover plate |
| CN106337163A (en) * | 2016-11-22 | 2017-01-18 | 陈浩 | Solid material surface transparent texture coating technology |
| CN112458412A (en) * | 2020-09-30 | 2021-03-09 | 昆山华冠商标印刷有限公司 | Coating process of semitransparent color layer |
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Open date: 20091007 |