CN106337163A - Solid material surface transparent texture coating technology - Google Patents
Solid material surface transparent texture coating technology Download PDFInfo
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- CN106337163A CN106337163A CN201611033073.6A CN201611033073A CN106337163A CN 106337163 A CN106337163 A CN 106337163A CN 201611033073 A CN201611033073 A CN 201611033073A CN 106337163 A CN106337163 A CN 106337163A
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- Prior art keywords
- transparent
- refractive index
- texture
- plating layer
- reflectance
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Abstract
The invention discloses a solid material surface transparent texture coating technology. The technology comprises the steps that a shielding jig is fixed to the surface of a transparent base material, the shielding jig completely covers the transparent base material to form a shielding region and a hollow region; the transparent base material with the fixed shielding jig is placed into vacuum coating equipment to be vacuumized; working gas is charged, and an ion source is used for performing ion cleaning on the surface of the ion source; on the basis of an evaporation or sputtering coating mode, materials with the high refractive index and materials with the low refractive index are alternately stacked or materials with the high refractive index, materials with the low refractive index and metal materials are alternately stacked on the surface of the shielding jig to obtain a semi-product A; vacuum breaking is performed, the semi-product A is taken out, and after the shielding jig is removed, a finished product B is obtained after being qualified through inspection. The technology can be directly applied on the surface of a product with a window or a display region, the treated transparent base material surface texture transparency is adjustable, the texture effect scarcely affects the light transmission display effect of the base material, and the texture effect is clearly visible in the screen extinguishing state.
Description
Technical field
The invention belongs to vacuum film manufacture field, more particularly to a kind of solid material surface transparent texture coating work
Skill.
Background technology
Portable electronic devices are widely used by modern, for example Smartphone, panel computer, notes type
Computer etc.；And different for the hobby of device appearance according to everyone, manufacturer generally requires outer for portable electronic devices
See and designed, to attract consumer to buy.For example, during manufacturer manufactures portable electronic devices, being capable of mat
By the appearance color of device panel or back shroud or the change of textured pattern or combination, provide diversified selection, and can be rich
The visual experience of rich user.
Textured pattern or font that currently existing technology mainly will need to present using some traditional modes, for example logical
The modes such as printing, printing, engraving of crossing directly are processed in solid material surface, grain effect expected from formation.But the texture made
Effect can have a strong impact on the translucent effect of material.Lead to this technique cannot be directly in the product surface with form or viewing area
Directly use.
For example, Chinese patent literature cn 204695276 discloses a kind of transparent configuration with texture appearance, is attached at
Object.The transparent configuration with texture appearance includes transparent base and optical imagery uv glue-line.Transparent base includes surface；Light
Study and be coated on surface as uv glue-line, and optical imagery uv glue-line forms texture pattern via imaging processing procedure.Wherein transparent
Base material is attached at object so that object assumes the outward appearance with texture pattern by optical imagery uv glue-line.In order to avoid interference
User watches screen picture, and the transparent configuration with texture appearance corresponds to optical imagery uv in the position of touch screen module
The non-imaged area of glue-line, and other bezel locations outside touch screen module then correspond to the imaging area of optical imagery uv glue-line.
When front viewing has the transparent configuration of texture appearance, can see through transparent base and be set to optical imagery uv glue-line
Non-imaged area assume identical texture pattern, and in the position such as touch screen module or button then the presenting of texture-free pattern.
Therefore, this structure cannot directly directly use in the product surface with form or viewing area.
Content of the invention
For above-mentioned technical problem, the present invention seeks to: a kind of solid material surface transparent texture coating is provided
Technique, directly can use in the product surface with form or viewing area, the transparent substrate surface texture transmittance of process
Adjustable, when texture visible ray mean transmittance accomplishes more than 90%, grain effect has little influence on the printing opacity display effect of base material
Really, therefore in bright screen state, texture coating does not affect display effect, and when putting out screen state, the transmittance of texture coating shows relatively
The printing opacity of screen is high, and the reflectance of coating surface also can be lower than the reflectance of display screen.Therefore, on same surface, light line reflection is strong
Under the contrast of degree, grain effect can be high-visible.
The technical scheme is that
A kind of solid material surface transparent texture coating process is it is characterised in that comprise the following steps:
S01: in transparent substrate surface fixed blind tool, described masking tool is completely covered transparent base, formed shielded area and
Vacancy section；
S02: the transparent base of fixed blind tool is placed in evacuation in vacuum coating equipment；
S03: when vacuum coating equipment vacuum reaches and imposes a condition, be filled with working gas, using ion source, its surface entered
Row Ion Cleaning；
S04: will be alternateed with relative low-index material with respect to high-index material by the plated film mode evaporated or sputter
Stack or will alternate and be stacked on masking tool with respect to high-index material, relative low-index material and metal material
Surface, obtains half product a；
S06: vacuum breaker takes out, after removing masking tool, as finished product b after the assay was approved.
Preferably, described masking tool is that silk screen printing peelable glue, metal or plastic cement tool pass through laminating or fixation is depended on
In transparent substrate surface.
Preferably, described step s04 also include by adjustment relatively high-index material, relatively low-index material and
The stack thickness of metal material changes the reflectance of film plating layer, so that the visible ray average reflectance of film plating layer is less than or greater than transparent
The reflectance of base material, or make the reflectance of a certain wavelength band in visible ray for the film plating layer be less than or greater than the anti-of transparent base
Penetrate rate.
Preferably, the time of described Ion Cleaning is more than 30 seconds.
Preferably, described relatively high-index material be refractive index n >=1.51 material include following in any one:
tio2、ti3o5、zro2、nb2o5、al2o3、sio；
Described relatively low-index material be refractive index≤1.5 material include following in any one: sio2、mgf2、
na3alf6；
Described metal material include following in any one: al, ag, au, cr, ni, crni, sn, in, snin, ti.
The invention also discloses a kind of transparent configuration with texture appearance is it is characterised in that include:
One transparent base, and
One film plating layer, is coated on transparent substrate surface, and described film plating layer has pattern outward appearance；
Described film plating layer includes the relative high refractive index material layer of stacking alternate with each other and relative low refractive index material layer, or mutually
The relative high refractive index material layer of the stacking that alternates, relatively low refractive index material layer and metal material layer.
Preferably, the pattern outward appearance of described film plating layer is arranged on viewfinder area or viewing area.
Preferably, the visible ray average reflectance of described film plating layer is less than or greater than the reflectance of transparent base, or makes
The reflectance of a certain wavelength band in visible ray for the film plating layer is less than or greater than the reflectance of transparent base.
Preferably, described relatively high-index material be refractive index n >=1.51 material include following in any one:
tio2、ti3o5、zro2、nb2o5、al2o3、sio；
Described relatively low-index material be refractive index≤1.5 material include following in any one: sio2、mgf2、
na3alf6；
Described metal material include following in any one: al, ag, au, cr, ni, crni, sn, in, snin, ti.
The present invention is based on existing solid material surface optics antireflective anti-reflection film and highly reflecting films technology, by light
In the coating process designed by the color difference that different-waveband is presented, when the thickness of coating reaches the four of a certain wavelength of visible ray
During/mono- optical thickness, the color that coating is presented is exactly the light color of this wavelength.Optimized by coating process, adjustment applies
The average reflectance of layer visible ray, makes coating average reflectance be less than or greater than the reflectance of base material, makes clean mark visible.
Compared with prior art, the invention has the advantage that
1st, the figure layer technique of the present invention can directly in form or viewing area surface coating so as to assume pattern or word.Use
The present invention process transparent substrate surface texture transmittance adjustable, light transmittance from 0% ~ 99.99%, when texture visible ray
When mean transmittance accomplishes more than 90%, grain effect almost can not affect the printing opacity display effect of base material completely.Both can reach
To the effect of outward appearance beautification, and do not affect display effect.
, the present invention can be widely applied to the pattern texture of transparent material surface and process as digital electronic goods, automobile keeps off
Wind glass, building curtain wall glass and other special material treatment industry etc..
Brief description
Below in conjunction with the accompanying drawings and embodiment the invention will be further described:
Fig. 1 is a kind of transparent configuration with texture appearance of the embodiment of the present invention；
Fig. 2 has the transparent configuration of texture appearance for embodiment of the present invention another kind；
Fig. 3 is the flow chart of solid material surface transparent texture coating process of the present invention.
Specific embodiment
For making the object, technical solutions and advantages of the present invention of greater clarity, with reference to specific embodiment and join
According to accompanying drawing, the present invention is described in more detail.It should be understood that these descriptions are simply exemplary, and it is not intended to limit this
Bright scope.Additionally, in the following description, eliminate the description to known features and technology, to avoid unnecessarily obscuring this
The concept of invention.
As shown in figure 1, the transparent configuration with texture appearance can be attached on object, this object can be that digital electric produces
On product display screen, windshield, building curtain wall glass etc. transparent base, such as glass, sapphire, pet, pc, pmma
Deng.
The transparent configuration with texture appearance of the present invention includes: transparent base 10 and film plating layer 20, and film plating layer 20 passes through
Coating process is coated on transparent base 10 surface, and this film plating layer 20 has pattern outward appearance.The pattern outward appearance of this film plating layer can be straight
Connect and be arranged on viewfinder area or viewing area.Pattern outward appearance can be with word, pattern, decorative pattern etc..
Film plating layer 20 can be by high refractive index material layer 21 stacking alternate with each other with relative low refractive index material layer 22 relatively
Constitute or mutual by high refractive index material layer 21 relatively, relative low refractive index material layer 22 and metal material layer 23
It is alternately stacked composition, as shown in Figure 2.Certainly Fig. 1 and Fig. 2 simply show 2 and 3 layers of interactive stacking it is also possible to 4,5,6 layers etc.
Many interlayers interact stacking.So, the thickness of film plating layer also changes therewith.
Stacked by adjustment high refractive index material layer 21, low refractive index material layer 22 and metal material layer 23 relatively relatively
Thickness can change the reflectance of film plating layer, thus changing the light transmittance of film plating layer.
The visible ray mean transmittance of Common transparent material is 89% ~ 92%.When this structure function is in household electrical appliances or electronic product
During display screen outer surface, as long as by the visible ray mean transmittance of film plating layer, process saturating less than or greater than transparent material itself
Luminosity, or make the reflectance less than or greater than transparent base for the reflectance of a certain wavelength band in visible ray for the film plating layer, that is,
May occur in which obvious grain effect, and film plating layer transmittance differs bigger pattern effects with material itself transmittance of before processing
More obvious.And when the average reflectance of film plating layer visible ray is less than the visible ray average reflectance of transparent base, pattern texture
Do not affect the display effect of transparent base.
When this technology application and display screen surface, if the visible reflectance of film plating layer is less than the visible of display screen base material
During luminous reflectance, the visual effects of texture are only non-lit up or just can be high-visible when brightness of display screen is relatively low in display screen, and
The visible reflectance of coating texture differs bigger with the visible reflectance of display screen base material, and coating grain effect is more obvious.
If the reflectance of film plating layer is more than the reflectance of display screen base material, the visual effects of texture are either lighted still in display screen
During extinguishing, coating texture all can be high-visible, and the visible reflectance of the visible reflectance of coating texture and display screen base material
Rate difference is bigger, and coating grain effect is more obvious.
The process of transparent configuration that present invention making has texture appearance is, in transparent base 10 surface fixed blind
Tool, masking tool uses silk screen printing peelable glue, metal or plastic cement tool directly to fit or the mode such as fixation is in transparent base
Surface formation shielded area and vacancy section.Again by the transparent base covering with tool put in vacuum coating equipment plated film or
It is to soak in plated film medicinal liquid.After plated film, remove the tool of transparent substrate surface, transparent substrate surface has tool shield portions
Coating cannot be attached to transparent substrate surface, and the Partial coatings coating of tool hollow out can be attached to its surface.When masking tool goes
After removing, transparent substrate surface has the part of plated film coating and does not have the part of plated film coating can be contrasted thus producing outside pattern
See effect.Pattern appearance depends on the face shaping of vacancy section.Specifically include following steps:
Embodiment 1:
As shown in figure 3, the process making the film plating layer having average transmittance for 90.1 ~ 99.99% includes:
1. use the mode of silk screen printing peelable in glass surface one layer of waterborne liquid of printing by cleaning clean glass baseplate a
Glue, is then dried.
The peelable glue of glass surface printing forms material b after being dried.Material b is placed in evacuation in vacuum coating equipment
Prepare plated film, the one side having print peelable glue is coated surface.
Until filming equipment vacuum reaches, during plating conditions, (general plated film vacuum is in 5.0e-2 torr or 6.5 pa
Above that is to say, that the pressure value in filming equipment is the smaller the better), first it is filled with working gas using ion source, working gas is
Noble gases.Ion Cleaning is carried out to material b surface, (scavenging period more than 30 seconds, but between 120 seconds ~ 200 seconds
Most preferably).
After the completion of Ion Cleaning, print peelable glue surface according to the optical film technique designing in advance in material b and plated
Film.Alternate superposition plated film using high-index material relatively with relative low-index material, for example,
a.tio2-sio2；
b.sio2-tio2-sio2；
c.tio2-sio2-tio2-sio2……；
d.sio2-tio2-sio2-tio2-sio2... etc..
Wherein sio2Represent low-index material, tio2Represent high-index material.
Reach and need by the material of relative high index of refraction or the thickness of low-index material relatively calculating each layer
The light transmittance wanted, for example, can use optical coating design software tfcalc or macleod, Film Design optimization aim is set
Surely become the transmittance that visible ray mean transmittance is higher than base material, with glass baseplate visible ray mean transmittance for 90% be
Example, it will be seen that light mean transmittance optimization aim is designed into 90.1% ~ 99.99% during design film structure, you can realize fenestra
Road effect.Then the film structure out of design is imported in filming equipment control system and execute, after obtaining plated film
Material c.
After the completion of plated film, filming equipment is filled with air, takes out the material c after plated film, and the action using washing or wiping removes
Fall the peelable glue on material c surface, because peelable glue is aqueouss, can dissolve after contact liq water, therefore be attached to peelable glue table
The film plating layer in face also can together come off, and the film plating layer being attached to glass surface then will not be affected, and therefore decorative pattern is in
Now form material d.
Embodiment 2:
As shown in figure 3, the process making the film plating layer having average transmittance for 90.1 ~ 99.99% includes:
1. clean glass baseplate will be cleaned, be fixed on glass substrate surface using metal or plastic cement tool and form material b.
Material b is placed in evacuation in vacuum coating equipment and prepares plated film, the one side of fixed jig is coated surface.
Until filming equipment vacuum reaches, during plating conditions, (general plated film vacuum is in 5.0e-2 torr or 6.5 pa
Above that is to say, that the pressure value in filming equipment is the smaller the better), first it is filled with working gas using ion source, working gas is
Noble gases, carry out Ion Cleaning to material b surface, (scavenging period more than 30 seconds, but between 120 seconds ~ 200 seconds
Most preferably).
After the completion of Ion Cleaning, print peelable glue surface according to the optical film technique designing in advance in material b and plated
Film.Alternate superposition plated film using high-index material relatively with relative low-index material, for example,
a.tio2-sio2；
b.sio2-tio2-sio2；
c.tio2-sio2-tio2-sio2……；
d.sio2-tio2-sio2-tio2-sio2... etc..
Wherein sio2Represent low-index material, tio2Represent high-index material.
Reach and need by the material of relative high index of refraction or the thickness of low-index material relatively calculating each layer
The light transmittance wanted, for example, can use optical coating design software tfcalc or macleod, Film Design optimization aim is set
Surely become the transmittance that visible ray mean transmittance is higher than base material, with glass baseplate visible ray mean transmittance for 90% be
Example, it will be seen that light mean transmittance optimization aim is designed into 90.1% ~ 99.99% during design film structure, you can realize fenestra
Road effect.Then the film structure out of design is imported in filming equipment control system and execute, after obtaining plated film
Material c.
After the completion of plated film, filming equipment is filled with air, takes out the material c after plated film, removes the masking tool on material c surface
Form material d.The Partial coatings that material surface has tool masking are directly affixed on tool, plate therefore after tool removes
Film layer also can be removed therewith, and the Partial coatings layer of tool hollow out is directly affixed to glass substrate surface.Therefore when tool goes
The pattern outward appearance falling rear glass surface will present.
Embodiment 3:
As shown in figure 3, the process making the film plating layer having average transmittance for 0 ~ 90% includes:
1. clean glass baseplate a will be cleaned, print one layer of waterborne liquid using the mode of silk screen printing in glass surface peelable
Glue 2, is then dried.
The peelable glue of glass surface printing forms material b after being dried.Material b is placed in evacuation in vacuum coating equipment
Prepare plated film, the one side having print peelable glue is coated surface.
Until filming equipment vacuum reaches, during plating conditions, (general plated film vacuum is in 5.0e-2 torr or 6.5 pa
Above that is to say, that the pressure value in filming equipment is the smaller the better), first it is filled with working gas using ion source, working gas is
Noble gases.Ion Cleaning is carried out to material b surface, (scavenging period more than 30 seconds, but between 120 seconds ~ 200 seconds
Most preferably).
After the completion of Ion Cleaning, print peelable glue surface according to the optical film technique designing in advance in material b and plated
Film.Coating Materials using high index of refraction relatively is alternateed with the Coating Materials of relative low-refraction and metal coating material
Superposition plated film, including but not limited to following film layer structure:
a.al-tio2；
b.al-sio2；
c.sio2-al；
d.tio2-al；
e.al-tio2-sio2；
f.al-sio2-tio2；
g.sio2-al-sio2；
h.tio2-al-sio2；
i.tio2-sio2-al；
j.sio2-tio2-al
……
Wherein sio2Represent low-index material, tio2Represent high-index material, al represents metal material.Using optical film
Design software tfcalc or macleod, Film Design optimization aim is set becomes the requirement reaching required for technique.Its
In, the Main Function of metal material is the integral light-transmitting degree adjusting film plating layer, the thicker overall plating of monolayer film plating layer of metal material
The transmittance of film layer is lower, otherwise transmittance is higher.General transmittance can be adjusted from 0% ~ 90% scope.
After the completion of plated film, filming equipment is filled with air, takes out the material c after plated film, and the action using washing or wiping removes
Fall the peelable glue on material c surface, because peelable glue is aqueouss, can dissolve after contact liq water, therefore be attached to peelable glue table
The film plating layer in face also can together come off, and the film plating layer being attached to glass surface then will not be affected, and therefore decorative pattern is in
Now form material d.
Illustrate: when carrying out plated film to semi-finished product c, plated film is that whole face covers, but because semi-finished product c covers tool
Part is not covered by plated film, the simply masking tool of covering, after masking tool removes, has the part of plated film and does not have plated film
Part can be contrasted, thus setting off out the lines effect of plated film.The visible reflectance of plated film and glass baseplate itself
Visible reflectance difference is bigger, and effect on base material for the film plating layer pattern outward appearance is more obvious.
The transparent substrate surface texture transmittance being processed using the present invention is adjustable, light transmittance from 0% ~ 99.99%,
When texture visible ray mean transmittance accomplishes more than 90%, the printing opacity that grain effect almost can not affect base material completely shows
Effect.Both the effect of outward appearance beautification can have been reached, and do not affected display effect.
It should be appreciated that the above-mentioned specific embodiment of the present invention is used only for exemplary illustration or explains the present invention's
Principle, and be not construed as limiting the invention.Therefore, that is done in the case of without departing from the spirit and scope of the present invention is any
Modification, equivalent, improvement etc., should be included within the scope of the present invention.Additionally, claims purport of the present invention
Covering the whole changes falling in scope and border or the equivalents on this scope and border and repair
Change example.
Claims (9)
1. a kind of solid material surface transparent texture coating process is it is characterised in that comprise the following steps:
S01: in transparent substrate surface fixed blind tool, described masking tool is completely covered transparent base, formed shielded area and
Vacancy section；
S02: the transparent base of fixed blind tool is placed in evacuation in vacuum coating equipment；
S03: when vacuum coating equipment vacuum reaches and imposes a condition, be filled with working gas, using ion source, its surface entered
Row Ion Cleaning；
S04: will be alternateed with relative low-index material with respect to high-index material by the plated film mode evaporated or sputter
Stack or will alternate and be stacked on masking tool with respect to high-index material, relative low-index material and metal material
Surface, obtains half product a；
S06: vacuum breaker takes out, after removing masking tool, as finished product b after the assay was approved.
2. solid material surface transparent texture coating process according to claim 1 is it is characterised in that described masking tool
Pass through laminating for silk screen printing peelable glue, metal or plastic cement tool or fixation is attached to transparent substrate surface.
3. solid material surface transparent texture coating process according to claim 1 is it is characterised in that described step s04
Also include changing plated film by the stack thickness of adjustment high-index material, relative low-index material and metal material relatively
The reflectance of layer, makes the visible ray average reflectance of film plating layer be less than or greater than the reflectance of transparent base, or makes film plating layer
It is less than or greater than the reflectance of transparent base in the reflectance of a certain wavelength band of visible ray.
4. solid material surface transparent texture coating process according to claim 1 is it is characterised in that described Ion Cleaning
Time more than 30 seconds.
5. solid material surface transparent texture coating process according to claim 1 is it is characterised in that described relatively high folding
Penetrate rate material be refractive index n >=1.51 material include following in any one: tio2、ti3o5、zro2、nb2o5、al2o3、sio；
Described relatively low-index material be refractive index≤1.5 material include following in any one: sio2、mgf2、
na3alf6；
Described metal material include following in any one: al, ag, au, cr, ni, crni, sn, in, snin, ti.
6. a kind of transparent configuration with texture appearance is it is characterised in that include:
One transparent base, and
One film plating layer, is coated on transparent substrate surface, and described film plating layer has pattern outward appearance；
Described film plating layer includes the relative high refractive index material layer of stacking alternate with each other and relative low refractive index material layer, or mutually
The relative high refractive index material layer of the stacking that alternates, relatively low refractive index material layer and metal material layer.
7. the transparent configuration with texture appearance according to claim 6 is it is characterised in that outside the pattern of described film plating layer
Sight is arranged on viewfinder area or viewing area.
8. the transparent configuration with texture appearance according to claim 6 is it is characterised in that the visible ray of described film plating layer
Average reflectance is less than or greater than the reflectance of transparent base, or the reflection making a certain wavelength band in visible ray for the film plating layer
Rate is less than or greater than the reflectance of transparent base.
9. solid material surface transparent texture coating process according to claim 6 is it is characterised in that described relatively high folding
Penetrate rate material be refractive index n >=1.51 material include following in any one: tio2、ti3o5、zro2、nb2o5、al2o3、sio；
Described relatively low-index material be refractive index≤1.5 material include following in any one: sio2、mgf2、
na3alf6；
Described metal material include following in any one: al, ag, au, cr, ni, crni, sn, in, snin, ti.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611033073.6A CN106337163A (en) | 2016-11-22 | 2016-11-22 | Solid material surface transparent texture coating technology |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611033073.6A CN106337163A (en) | 2016-11-22 | 2016-11-22 | Solid material surface transparent texture coating technology |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201611033073.6A Pending CN106337163A (en) | 2016-11-22 | 2016-11-22 | Solid material surface transparent texture coating technology |
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| CN106893985A (en) * | 2017-03-30 | 2017-06-27 | 刘林兴 | A kind of surface treatment method, the composite material of magnesium alloy of the highlighted minute surface of magnesium alloy |
| CN110747432A (en) * | 2019-11-28 | 2020-02-04 | 维沃移动通信有限公司 | Electronic equipment, shell of electronic equipment and machining method of shell |
| CN111778483A (en) * | 2019-04-04 | 2020-10-16 | 北京小米移动软件有限公司 | Coating treatment method, substrate and electronic equipment |
| CN111866241A (en) * | 2020-08-26 | 2020-10-30 | 广东星星光电科技有限公司 | LOGO hiding preparation method for glass window protective screen and prepared protective screen |
| CN112458412A (en) * | 2020-09-30 | 2021-03-09 | 昆山华冠商标印刷有限公司 | Coating process of semitransparent color layer |
| CN115505884A (en) * | 2021-06-23 | 2022-12-23 | 江西华派光电科技有限公司 | High-light-transmission sapphire panel and manufacturing method thereof |
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| CN111778483A (en) * | 2019-04-04 | 2020-10-16 | 北京小米移动软件有限公司 | Coating treatment method, substrate and electronic equipment |
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| CN111866241A (en) * | 2020-08-26 | 2020-10-30 | 广东星星光电科技有限公司 | LOGO hiding preparation method for glass window protective screen and prepared protective screen |
| CN112458412A (en) * | 2020-09-30 | 2021-03-09 | 昆山华冠商标印刷有限公司 | Coating process of semitransparent color layer |
| CN115505884A (en) * | 2021-06-23 | 2022-12-23 | 江西华派光电科技有限公司 | High-light-transmission sapphire panel and manufacturing method thereof |
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Application publication date: 20170118 |